CN217459570U - Heating device of electron beam evaporation source - Google Patents

Heating device of electron beam evaporation source Download PDF

Info

Publication number
CN217459570U
CN217459570U CN202220901806.8U CN202220901806U CN217459570U CN 217459570 U CN217459570 U CN 217459570U CN 202220901806 U CN202220901806 U CN 202220901806U CN 217459570 U CN217459570 U CN 217459570U
Authority
CN
China
Prior art keywords
electron beam
fixedly connected
evaporation source
beam evaporation
heating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202220901806.8U
Other languages
Chinese (zh)
Inventor
胡善玮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hefei Warta Electronic Technology Co ltd
Original Assignee
Hefei Warta Electronic Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hefei Warta Electronic Technology Co ltd filed Critical Hefei Warta Electronic Technology Co ltd
Priority to CN202220901806.8U priority Critical patent/CN217459570U/en
Application granted granted Critical
Publication of CN217459570U publication Critical patent/CN217459570U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The utility model discloses a heating device of an electron beam evaporation source, which relates to the field of electron beam heating and aims at the problems that the existing electron beam has a complicated structure, is not beneficial to the installation, the disassembly and the fuel addition and has more troublesome operation; the utility model discloses a ceramic pipe makes connecting rod and water-cooling cover carry out separation treatment, utilizes the tungsten filament to carry out heat treatment simultaneously to carry out high-pressure treatment through high-pressure subassembly, the effectual effect and the efficiency that improve the heating of electron beam evaporation source have improved electron beam evaporation source installation simultaneously and have dismantled and add fuel.

Description

Heating device of electron beam evaporation source
Technical Field
The utility model relates to an electron beam heating technique, concretely relates to heating device of electron beam evaporation source.
Background
In the vacuum coating equipment, although the electron beam evaporation source is far more complicated than the resistance heating type evaporation source, the electron beam evaporation source can evaporate refractory materials, the purity of the film is high, and the evaporation source of the electron beam heating is superior to the resistance heating evaporation source, the evaporation source of the electron beam heating is a direct gun type electron gun and an e type electron gun, and comprises an electron emission source, an electron acceleration power supply, a orange accident, a magnetic field coil, a cooling water jacket and the like, the film material is placed in a water cooling accident increasing device, the electron beam is emitted from the source, and the magnetic field coil is used for focusing and deflecting the electron beam to bombard and heat the film material.
The thin film technology is widely applied in industry, and especially plays an important role in the fields of electronic materials, magnetic materials and component industry, and the method for preparing the thin film with various performances is also dramatically developed to the present in recent decades, and the preparation method of the thin film is developed as follows: physical vapor deposition: comprises a vacuum evaporation coating method, a sputtering coating method, an ion coating method, molecular beam epitaxial growth and the like; chemical vapor deposition; an oxidation process; electroplating; coating, sedimentation method, etc. use physical vapor deposition method and chemical vapor deposition method more, and current electron beam source structure is complicated, and it is more loaded down with trivial details to dismantle the installation when changing and maintaining, is unfavorable for the installation to dismantle and add fuel simultaneously, and the operation is more troublesome, for this reason, we have proposed a heating device of electron beam evaporation source.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a heating device of electron beam evaporation source to solve the above-mentioned weak point among the prior art.
In order to achieve the above object, the present invention provides the following technical solutions: the utility model provides a heating device of electron beam evaporation source, includes casing and connecting plate, the inside top fixedly connected with heated warehouses of casing, the inside fixedly connected with tungsten filament of heated warehouses, the top fixedly connected with connecting rod of connecting plate, fixed cover is equipped with the ceramic pipe on the connecting rod, the top fixedly connected with connecting piece of connecting rod, screw fixedly connected with crucible is passed through at the top of connecting piece.
Further, the inside below fixedly connected with high-pressure subassembly of casing, the mounting hole has been seted up on the high-pressure subassembly, the inside of mounting hole is run through in the connecting rod activity.
Further, the inside fixedly connected with water-cooling cover of casing, the water-cooling has covered and has seted up the activity hole, the ceramic tube activity cover is established in the inside in activity hole.
Further, the outside left side fixedly connected with sleeve pipe of casing, sheathed tube inside activity cover is equipped with the action bars, the top fixedly connected with fixed block of action bars, the right side fixedly connected with control flap of fixed block.
Furthermore, a moving groove is formed in the left side of the upper portion of the shell, and the control baffle is movably sleeved in the moving groove and closely attached to the inside of the shell.
Further, a through hole is formed in the top of the shell, the heating bin corresponds to the through hole and is provided with an opening, a plurality of threaded holes are formed in the bottom of the shell and the connecting plate, and the threaded holes are connected with fixing bolts through internal threads.
Compared with the prior art, the utility model provides a pair of heating device of electron beam evaporation source, the device make connecting rod and water-cooling cover carry out separation treatment through ceramic pipe, utilize the tungsten filament to carry out heat treatment simultaneously to carry out high-pressure treatment through high-pressure subassembly, the effectual effect and the efficiency that improve the heating of electron beam evaporation source have improved electron beam evaporation source installation simultaneously and have dismantled and add fuel.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present invention, and other drawings can be obtained by those skilled in the art according to these drawings.
Fig. 1 is a schematic view of an overall front-view cross-sectional structure provided by an embodiment of the present invention;
fig. 2 is a schematic view of a connecting rod structure provided in an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a point a in fig. 1 according to an embodiment of the present invention.
Description of reference numerals:
1. a housing; 2. a heating chamber; 3. a tungsten filament; 4. a high voltage component; 5. a water-cooled hood; 6. a connecting plate; 7. a connecting rod; 8. a ceramic tube; 9. a connecting member; 10. a crucible; 11. a sleeve; 12. an operating lever; 13. a fixed block; 14. a control baffle.
Detailed Description
In order to make the technical solution of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to the accompanying drawings.
The first embodiment is as follows:
referring to fig. 1-3, a heating device for an electron beam evaporation source includes a housing 1 and a connecting plate 6, a heating chamber 2 is fixedly connected to the upper portion of the inside of the housing 1, a tungsten filament 3 is fixedly connected to the inside of the heating chamber 2, a connecting rod 7 is fixedly connected to the top of the connecting plate 6, a ceramic tube 8 is fixedly sleeved on the connecting rod 7, a connecting member 9 is fixedly connected to the top of the connecting rod 7, and a crucible 10 is fixedly connected to the top of the connecting member 9 through a screw.
In this embodiment, casing 1's inside below fixedly connected with high voltage assembly 4 has seted up the mounting hole on the high voltage assembly 4, and connecting rod 7 activity runs through the inside of mounting hole, carries out high-pressure treatment through high voltage assembly 4 to the raw materials.
In this embodiment, the inside fixedly connected with water-cooling cover 5 of casing 1 has seted up the activity hole on the water-cooling cover 5, and the inside in activity hole is established to ceramic pipe 8 activity cover, can make water-cooling cover 5 and connecting rod 7 keep apart through ceramic pipe 8 and handle.
In this embodiment, a sleeve 11 is fixedly connected to the left side of the exterior of the housing 1, an operating rod 12 is movably sleeved inside the sleeve 11, a fixed block 13 is fixedly connected to the top of the operating rod 12, and a control baffle 14 is fixedly connected to the right side of the fixed block 13, so that the electron beam evaporation source can be opened and closed through the control baffle 14.
In this embodiment, a moving slot is formed in the left side above the casing 1, and the control baffle 14 is movably sleeved in the moving slot and closely attached to the inside of the casing 1.
In this embodiment, the through-hole has been seted up at casing 1's top, and heated warehouses 2 corresponds the through-hole and has seted up the opening, and a plurality of screw holes have all been seted up to casing 1's bottom and connecting plate 6, and the inside threaded connection of a plurality of screw holes has fixing bolt, can make connecting plate 6 and casing 1 carry out fixed processing fast through fixing bolt.
The working principle is as follows: during the use, fuel is placed and is inserted connecting rod 7 in the inside of casing 1 behind the inside of crucible 10, make connecting rod 7 and water-cooling cover 5 carry out the separation treatment through ceramic tube 8, play isolated effect, the rotation of action bars 12 can drive fixed block 13 and rotate, fixed block 13 can drive control baffle 14 and move when rotating, the removal of control baffle 14 can break away from the inside of casing 1, the through-hole that makes casing 1 through the removal of control baffle 14 is opened, outside high-voltage apparatus is connected with high voltage component 4, the start-up of outside high voltage apparatus can drive the start-up of high voltage component 4, carry out high-pressure treatment through high voltage component 4 to fuel simultaneously, and utilize tungsten filament 3 to carry out the heat treatment, incide the substrate surface to condense the membrane after making the atom or the molecule in the membrane material from the surface vaporization.
While certain exemplary embodiments of the present invention have been described above by way of illustration only, it will be apparent to those of ordinary skill in the art that the described embodiments may be modified in various different ways without departing from the spirit and scope of the present invention. Accordingly, the drawings and description are illustrative in nature and should not be construed as limiting the scope of the invention.

Claims (6)

1. The utility model provides a heating device of electron beam evaporation source, includes casing (1) and connecting plate (6), its characterized in that, inside top fixedly connected with heated warehouses (2) of casing (1), the inside fixedly connected with tungsten filament (3) of heated warehouses (2), the top fixedly connected with connecting rod (7) of connecting plate (6), fixed cover is equipped with ceramic pipe (8) on connecting rod (7), the top fixedly connected with connecting piece (9) of connecting rod (7), screw fixedly connected with crucible (10) are passed through at the top of connecting piece (9).
2. The heating device of an electron beam evaporation source according to claim 1, wherein a high voltage assembly (4) is fixedly connected to a lower portion inside the housing (1), a mounting hole is formed in the high voltage assembly (4), and the connecting rod (7) movably penetrates through the inside of the mounting hole.
3. The heating device of an electron beam evaporation source according to claim 1, wherein a water cooling cover (5) is fixedly connected to the inside of the housing (1), a movable hole is formed in the water cooling cover (5), and the ceramic tube (8) is movably sleeved in the movable hole.
4. The heating device of an electron beam evaporation source according to claim 1, wherein a sleeve (11) is fixedly connected to the left side of the outer portion of the housing (1), an operating rod (12) is movably sleeved inside the sleeve (11), a fixed block (13) is fixedly connected to the top of the operating rod (12), and a control baffle (14) is fixedly connected to the right side of the fixed block (13).
5. The heating device of an electron beam evaporation source according to claim 4, wherein a moving slot is formed in the left side of the upper portion of the housing (1), and the control baffle (14) is movably sleeved in the moving slot and closely attached to the inside of the housing (1).
6. The heating device of an electron beam evaporation source according to claim 1, wherein a through hole is opened at the top of the housing (1), the heating chamber (2) is opened with a through hole corresponding to the through hole, a plurality of threaded holes are opened at the bottom of the housing (1) and the connecting plate (6), and a fixing bolt is screwed into the threaded holes.
CN202220901806.8U 2022-04-19 2022-04-19 Heating device of electron beam evaporation source Active CN217459570U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202220901806.8U CN217459570U (en) 2022-04-19 2022-04-19 Heating device of electron beam evaporation source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202220901806.8U CN217459570U (en) 2022-04-19 2022-04-19 Heating device of electron beam evaporation source

Publications (1)

Publication Number Publication Date
CN217459570U true CN217459570U (en) 2022-09-20

Family

ID=83269596

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202220901806.8U Active CN217459570U (en) 2022-04-19 2022-04-19 Heating device of electron beam evaporation source

Country Status (1)

Country Link
CN (1) CN217459570U (en)

Similar Documents

Publication Publication Date Title
US8387561B2 (en) Method and apparatus for cathodic arc ion plasma deposition
US3329524A (en) Centrifugal-type vapor source
CN106480420A (en) A kind of high-density plasma sputtering coating equipment
JPH0477072B2 (en)
CN105200381B (en) The auxiliary magnetic control sputtering film plating device of anodic field
PT2041331E (en) Method for depositing electrically insulating layers
CN1063128A (en) Utilize the method for material depositing treatment metal and realize the vaporizer of this method
CN101285167A (en) Ion beam emission source for outputting single ionic energy
CN206553621U (en) Magnetic deflection electron beam evaporation source
CN105714256A (en) Method for low-temperature preparation of DLC film through magnetron sputtering
CN217459570U (en) Heating device of electron beam evaporation source
Glebovsky et al. Unit for electron-beam zone melting of refractory materials
CN110042356A (en) A kind of cluster based on magnetron sputtering efficiently prepares the cluster beam source system with size adjustable
CN102703867A (en) Electron bombardment coating machine
CN1160477C (en) Hall type ion auxiliary evaporation source
CN218321597U (en) Ultrahigh vacuum magnetron sputtering target and magnetron sputtering device
WO1996027689A1 (en) Method and apparatus for cooling a sputtering target
CN215163066U (en) Large-capacity crucible structure of vacuum evaporation machine
CN205152320U (en) Magnetron sputtering coating film device is assisted to anodic field
KR100327835B1 (en) Appartus for physical vapor deposition and sputtering
CN204779787U (en) Magnetron sputtering target rifle
CN113265622A (en) Correction plate system of vacuum evaporation machine
Cao et al. Research on metallic ion beam production at IMP
CN105862005A (en) Plasma enhanced magnetron sputtering system and method
JPH0554809A (en) Silicon ion source with built-in crucible

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant