CN217393147U - Liquid storage tank and cleaning machine with same - Google Patents
Liquid storage tank and cleaning machine with same Download PDFInfo
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- CN217393147U CN217393147U CN202221479273.5U CN202221479273U CN217393147U CN 217393147 U CN217393147 U CN 217393147U CN 202221479273 U CN202221479273 U CN 202221479273U CN 217393147 U CN217393147 U CN 217393147U
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Abstract
The utility model provides a liquid storage tank, which comprises a body with an inner cavity, wherein a first liquid storage area and a second liquid storage area are arranged in the body, and a partition plate is arranged between the first liquid storage area and the second liquid storage area; a heating device for heating the solution is constructed in the first liquid storage area; and a liquid outlet is arranged in the second liquid storage area. The utility model also provides an adopt the cleaning machine of this reservoir. The utility model adopts the liquid storage mode of the partition arrangement, so that the heating and the spraying are separately arranged, and simultaneously, the structure of the liquid storage area II with the spraying function is improved, the water is continuously used when the overflow is ensured, and simultaneously, the solution in the liquid storage area II can be heated for the second time, thereby improving the cleaning quality; and meanwhile, a liquid storage area III is additionally arranged to prevent the liquid storage level from being overhigh and overflowing the liquid storage tank.
Description
Technical Field
The utility model belongs to the technical field of auxiliary assembly is used in the washing, especially, relate to a liquid storage tank is used in silicon chip washing and is equipped with cleaning machine of this liquid storage tank.
Background
Cleaning a silicon wafer is one of important processes in silicon wafer processing, and one process in the cleaning process is quick-draining cleaning, namely, a solution with a certain temperature needs to be quickly sprayed into a cleaning tank in 1-2s for defoaming, and meanwhile, the cleaning tank needs to be continuously overflowed for water change. The existing water storage tank is only provided with one inner cavity, heating and water storage are integrated, when the water storage tank and the overflow work synchronously, the solution in the water storage tank is quickly discharged, the heating device is caused to dry burn, the overflow water cut-off can be caused sometimes, the safety risk can be generated, and the silicon wafer cleaning effect is influenced.
SUMMERY OF THE UTILITY MODEL
The utility model provides a reservoir and be equipped with cleaning machine of this reservoir has solved easy dry combustion method heating device, the disconnected technical problem of overflow water in the current reservoir.
For solving at least one above-mentioned technical problem, the utility model discloses a technical scheme be:
a liquid storage tank comprises a body with an inner cavity, wherein a first liquid storage area and a second liquid storage area are arranged in the body, and a partition plate is arranged between the first liquid storage area and the second liquid storage area;
a heating device for heating the solution is constructed in the first liquid storage area;
and a liquid outlet is arranged in the second liquid storage area.
Further, the heating device is arranged at the end part of the first liquid storage area and inserted into the first liquid storage area.
Furthermore, the heating device is also arranged in the second liquid storage area, and the heating device in the second liquid storage area and the heating device in the first liquid storage area are both arranged on the same end face of the body.
Further, the heating device comprises a plurality of heating pipes, and the number of the heating pipes in the second liquid storage area is not more than that of the heating pipes in the first liquid storage area;
all the heating devices are positioned lower than the height of the partition plate;
and the height of the partition plate is lower than the height of the wall surface of the body.
Further, liquid level controls are arranged in the first liquid storage area and the second liquid storage area;
the height of the liquid level control in the first liquid storage area is higher than that of the heating device in the first liquid storage area and lower than that of the partition plate;
the height of the liquid level control in the second liquid storage area is higher than that of the heating device in the second liquid storage area and lower than that of the partition plate.
Furthermore, the body is only provided with one liquid inlet, and the liquid inlet is arranged in the inner cavity of the first liquid storage area;
the liquid inlet and the liquid outlet which are arranged in the first liquid storage area are positioned on the bottom surface of the first liquid storage area;
and the diameter of the liquid inlet in the first liquid storage area is larger than that of the liquid outlet thereof.
Furthermore, two liquid discharge ports are formed in the second liquid storage area and are positioned on the bottom surface of the second liquid storage area;
in the inner cavities of the two liquid storage areas, the height of one liquid discharge port is lower than that of the other liquid discharge port.
Further, the heating device also comprises a liquid storage area III which is arranged at one end of the body far away from the heating device;
the liquid storage area III is arranged across the width of the liquid storage area I and the width of the liquid storage area II and is connected with the liquid storage area I and the liquid storage area II through a connecting plate;
and the height of the connecting plate is higher than that of the partition plate.
Furthermore, liquid discharge ports are formed in the bottom surface and the side wall surface of the liquid storage area III.
A cleaning machine is provided with the liquid storage tank.
By adopting the liquid storage tank designed by the utility model, the heating and the spraying are separately arranged by adopting the liquid storage mode of the partition arrangement, and simultaneously, the structure of the liquid storage area II with the spraying function is improved, so that the water is continuously used during the overflow, and meanwhile, the solution in the liquid storage area II can be heated for the second time, thereby improving the cleaning quality; and meanwhile, a liquid storage area III is additionally arranged to prevent the liquid storage level from being overhigh and overflowing the liquid storage tank. The utility model discloses still provide a dispose the cleaning machine of this reservoir.
Drawings
Fig. 1 is a perspective view of a reservoir in an embodiment of the present invention;
FIG. 2 is a front perspective view of the reservoir;
FIG. 3 is a schematic cross-sectional view of a first reservoir region and a second reservoir region in a reservoir;
FIG. 4 is a rear perspective view of the reservoir;
fig. 5 is a perspective view of a reservoir equipped with a cap in another embodiment of the present invention.
In the figure:
100. liquid storage tank 10, body 11 and partition plate
20. Liquid storage area I21, heating device 22 and mounting hole
23. Liquid level control 24, liquid inlet 25 and liquid outlet I
30. A second liquid storage area 31, a second liquid discharge port 32 and a third liquid discharge port
40. Liquid storage area three 41, connecting plate 42 and liquid outlet four
50. Cap cap
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
The embodiment provides a liquid storage tank 100, as shown in fig. 1, which includes a body 10 having an inner cavity, a first liquid storage area 20 having a heating function and a second liquid storage area 30 capable of spraying and overflowing water rapidly are configured in the body 10, and a partition plate 11 is disposed between the first liquid storage area 20 and the second liquid storage area 30; at least in the first liquid storage area 20, a heating device 21 for heating the solution is provided, and in the second liquid storage area 30, a liquid discharge port for discharging the liquid is provided. In the same liquid storage tank 100, two different areas are divided to separate heating from spraying of fast water supply, liquid storage and heating are continuously carried out in a liquid storage area I20, and a heating device 21 cannot be dried; the second liquid storage area 20 is mainly used for rapid spraying and buffering overflow, and when the first liquid storage area 20 is full of solution, the solution can overflow the partition plate 11 and enter the second liquid storage area 30; the slow overflow is continuously carried out in the second liquid storage area 30, when the water quantity in the second liquid storage area 30 reaches a state of being capable of being rapidly sprayed, the spraying is rapidly started, and meanwhile, the overflow is still carried out; because the overflow speed is low and the spraying speed is high, the solution in the second liquid storage area 30 is enough to quickly wash and clean the silicon wafer, so that the cleaning quality is ensured, and the cleaning efficiency is ensured.
In the present embodiment, the body 10 is a rectangular parallelepiped structure, which is not only simple to process, but also has a larger volume of solution for other types of structures with the same upper port; at the same time, it is also easy to divide the zones, each zone having enough space to insert the heating means 21; there is also sufficient flatness to mount the heating device 21. The partition 11 is disposed along the length direction of the body 10, that is, the partition 11 divides the body 10 into two rectangular liquid storage areas one 20 and two liquid storage areas two 30. The setting of baffle 11 makes and has held solution in reservoir area 20 all the time, just opens leakage fluid dram 25 when clearing up its interior solution in reservoir area 20, and reservoir area 20 is the feed liquor continuously all the time and not the flowing back, also has solution all the time, so, heating device 21 in reservoir area 20 can not appear dry combustion method problem in the setting of baffle 11 can guarantee.
Further, as shown in fig. 2, the heating device 21 includes a plurality of elongated and independently disposed heating pipes, all of which are disposed at an end of the first liquid storage area 20 and inserted into the first liquid storage area 20; due to the long length of the heating tube, the heating device 21 needs to be arranged along the length direction of the first liquid storage area 20. Because the temperature of the first liquid storage area 20 serving as the heating area is different based on different process requirements, the heating temperature is different, and therefore a group of heating pipes are required to be arranged in at least the first liquid storage area 20; or a plurality of groups of heating pipes arranged side by side can be arranged. A plurality of mounting holes 22 are processed at one end of the body 10, and when a plurality of heating pipes need to be configured, the mounting holes 22 can be opened to enable the heating pipes to be matched with the mounting holes 22; when the heating pipes are not required to be configured excessively, part of the mounting holes 22 are blocked, and only part of the mounting holes 22 are opened to be matched with the heating pipes. These may be determined based on actual conditions, and are not particularly limited herein.
Furthermore, for the solution in the second liquid storage area 30 for supplying water rapidly, when the solution is used by spraying, the temperature of the solution therein will be reduced, and secondary heating is required in the second liquid storage area 30, and for secondary heating in the second liquid storage area 30, a spare mounting hole 22 for mounting a heating device 21 is also additionally arranged in the second heating liquid storage area, so as to configure and mount a heating pipe. In order to ensure the installation and maintenance of the heating tube, the heating tube in the second liquid storage area 30 and the heating tube in the first liquid storage area 20 are required to be arranged on the same end surface of the body 10. Of course, in the second liquid storage area 30, the heating pipe can be installed on the installation hole 22 during the second heating use; when the secondary heating is not needed, only the mounting hole 22 needs to be sealed, and the second liquid storage area 30 is still a closed area.
Since the magnitude of the second heating in the second liquid storage region 30 is not greater than the magnitude of the first heating in the first liquid storage region 20, the number of heating pipes in the second liquid storage region 30 is not greater than the number of heating pipes in the first liquid storage region 20.
Further, in order to ensure that the installation positions of the heating pipes in the first and second liquid storage regions 20 and 30 do not affect the flow of the solution, it is required that all the heating devices 21 are positioned below the height of the partition 11. That is, the position of the uppermost heating tube in the first liquid storage zone 20 and the position of the uppermost heating tube in the second liquid storage zone 30 are both lower than the height of the partition plate 11, so as to prevent the influence on the flow of the solution. Meanwhile, in order to prevent the safety of the solution loading in the reservoir 100, the height of the partition 11 is lower than the wall height of the body 10.
Further, as shown in fig. 3, a liquid level control 23 for monitoring the position of the solution is disposed in both the first liquid storage area 20 and the second liquid storage area 30, and the liquid level control 23 may be a monitoring float or a liquid level sensor. The liquid level control 23 in the first liquid storage area 20 is higher than the heating pipe at the uppermost end in the first liquid storage area 20 and lower than the partition plate 11; and the liquid level control 23 in the second liquid storage area 30 is higher than the heating pipe at the uppermost end in the second liquid storage area 30 and lower than the partition plate 11. The purpose of the structural arrangement is to prevent all heating pipes from generating dry burning phenomenon; meanwhile, the solution in the first liquid storage area 20 and the solution in the second liquid storage area 30 can be continuously used.
Specifically, level control 23 in reservoir region one 20 is used to monitor where solution can be heated, i.e., the heatable level limit in reservoir region one 20. When the liquid level control 23 in the first liquid storage area 20 monitors the position of the solution, it indicates that the solution in the first liquid storage area 20 can be heated, and the solution in the first liquid storage area 20 protects the heating pipe in the first liquid storage area 20. When the position is lower than the above position, all the heating pipes in the heating device 21 cannot work, and the heating pipes are prevented from being dried. Certainly, a temperature monitor is further arranged in the first liquid storage area 20 to monitor the stability of the temperature of the solution therein, and if the temperature of the solution is not qualified, an external controller is informed to inform the heating device 21 to heat the solution; if the solution temperature is qualified, the controller informs the heating device 21 to keep the temperature of the solution.
The liquid level control 23 in the second liquid storage area 30 is used for monitoring whether spraying is available, and when the liquid level in the second liquid storage area 30 reaches the position of the liquid level control 23, a rapid spraying instruction can be provided; when the liquid level in the second liquid storage area 30 does not reach the position of the liquid level control 23, the water needs to be stored into the second liquid storage area 30 continuously. Meanwhile, in the second liquid storage area 30, the liquid level control 23 can also be used for monitoring whether the secondary heating can be performed, that is, only when the solution surface in the second liquid storage area 30 exceeds the position of the liquid level control 23, the heating pipe in the second liquid storage area 30 can be controlled to perform the secondary heating on the solution; when the liquid level is lower than the position of the liquid level control 23, the secondary heating cannot be performed. The height of the liquid level control 23 in the second liquid storage area 30 is higher than the height of the uppermost heating pipe in the second liquid storage area 30, so that the dry burning phenomenon of the heating pipe in the second liquid storage area 30 can be prevented.
Preferably, since the amount of the solution in the first storage area 20 is always larger than that in the second storage area 30, the volume in the first storage area 20 is required to be larger than that in the second storage area 30, and in order to further ensure the continuous circulation of the solution in the first storage area 20 and the second storage area 30, the height of the liquid level control 23 in the first storage area 20 is required to be higher than that of the liquid level control 23 in the second storage area 30.
Furthermore, the whole liquid storage tank 100 is provided with only one liquid inlet 24, the liquid inlet 24 is only arranged in the first liquid storage area 20, the first liquid storage area 20 is also provided with a first liquid outlet 25 for discharging liquid, and the liquid inlet 24 and the first liquid outlet 25 are both positioned on the bottom surface of the body 10, so that the purpose of arranging wiring is facilitated; meanwhile, the first liquid outlet 25 is arranged on the bottom surface of the body 10, so that the impurities in the first liquid storage area 20 can be discharged conveniently. And the diameter of the liquid inlet 24 in the first liquid storage area 20 is larger than that of the first liquid outlet 25, because the liquid needs to be continuously stored in the first liquid storage area 20, and the first liquid storage area 20 is only used for heating the stored liquid, and only when the stored liquid is not used, the first liquid outlet 25 is used.
Furthermore, a second drain port 31 for spraying and a third drain port 32 for overflowing are arranged on the bottom surface in the second liquid storage area 30, and the height of the third drain port 32 for overflowing is lower than that of the second drain port 31 for spraying in the inner cavity of the second liquid storage area 30. Because the time consumption is short and the dosage is large during spraying, the overflow is continuous and slow circulation; when the liquid level is lower than the height of the second spraying liquid outlet 31, spraying from the second liquid storage area 30 cannot be performed, and the residual solution can continuously overflow without cutoff. After the spraying is finished, the solution in the first liquid storage area 20 continues to continue to flow to the second liquid storage area 30 through the partition plate 11, so that the continuous overflow and the intermittent spraying of the silicon wafer can be ensured.
Further, as shown in fig. 4, in order to prevent the solution in the first liquid storage area 20 and the second liquid storage area 30 from overflowing out of the body 10 too much, a third liquid storage area 40 for storing the mixture of the solution overflowing from the first liquid storage area 20 and the second liquid storage area 30 is provided at an end of the body 10 away from the heating device 21. The third liquid storage area 40 is only used as a transition area to discharge redundant solution without storing any solution, so that the height of the third liquid storage area 40 is not required to be too high, the upper end face of the third liquid storage area 40 is only required to be flush with the upper end face of the body 10, and the height of the third liquid storage area 40 is smaller than the heights of the first liquid storage area 20 and the second liquid storage area 30. The third liquid storage area 30 is arranged across the width of the first liquid storage area 20 and the width of the second liquid storage area 30 and is connected with the first liquid storage area 20 and the second liquid storage area 30 through a connecting plate 41; and the height of the connecting plate 41 is higher than that of the partition plate 11, so that the solution in the first liquid storage area 30 is prevented from returning to the first liquid storage area 20 and the second liquid storage area 30.
Further, the four discharge ports 42 of the third reservoir area 40 have two four discharge ports 42, one disposed on the bottom surface of the third reservoir area 40 and one disposed on the side wall surface thereof on the side away from the second reservoir area 30, in order to ensure that if one of the four discharge ports 42 is blocked, the other four discharge port 42 can continue to operate.
In this embodiment, the solution in the reservoir 100 may be a chemical solution or a pure water solution.
As shown in fig. 5, in another embodiment of the present invention, a cap 50 adapted to the body 10 is further disposed on the body 10 to ensure that the whole liquid storage tank 100 is in a closed space for internal circulation, so as to prevent the solution from overflowing or leaking, avoid resource waste, improve the production efficiency, and reduce the production cost.
A cleaning machine provided with a reservoir 100 as defined in any one of the above.
By adopting the liquid storage tank designed by the utility model, the heating and the spraying are separately arranged by adopting the liquid storage mode of the partition arrangement, and simultaneously, the structure of the liquid storage area II with the spraying function is improved, so that the water is continuously used during the overflow, and meanwhile, the solution in the liquid storage area II can be heated for the second time, thereby improving the cleaning quality; and meanwhile, a liquid storage area III is additionally arranged to prevent the liquid storage level from being overhigh and overflowing the liquid storage tank. The utility model discloses still provide a dispose the cleaning machine of this reservoir.
The above detailed description of the embodiments of the present invention is only for the purpose of illustrating the preferred embodiments of the present invention, and should not be taken as limiting the scope of the present invention. All the equivalent changes and improvements made according to the application scope of the present invention should still fall within the patent coverage of the present invention.
Claims (10)
1. A liquid storage tank is characterized by comprising a body with an inner cavity, wherein a first liquid storage area and a second liquid storage area are arranged in the body, and a partition plate is arranged between the first liquid storage area and the second liquid storage area;
a heating device for heating the solution is constructed in the first liquid storage area;
and a liquid outlet is arranged in the second liquid storage area.
2. A reservoir according to claim 1, wherein said heating means is disposed at an end of said first reservoir region and is interposed within said first reservoir region.
3. A reservoir according to claim 1 or 2, wherein said heating means is also provided in said second reservoir region, and said heating means in said second reservoir region and said heating means in said first reservoir region are both provided on the same end surface of said body.
4. A reservoir according to claim 3, wherein said heating means comprises a plurality of heating pipes, the number of said heating pipes in said second reservoir area being no greater than the number of said heating pipes in said first reservoir area;
all the heating devices are positioned lower than the height of the partition plate;
and the height of the partition plate is lower than the height of the wall surface of the body.
5. The liquid storage tank as claimed in any one of claims 1-2 and 4, wherein liquid level control members are arranged in the first liquid storage area and the second liquid storage area;
the height of the liquid level control in the first liquid storage area is higher than that of the heating device in the first liquid storage area and lower than that of the partition plate;
the height of the liquid level control in the second liquid storage area is higher than that of the heating device in the second liquid storage area and lower than that of the partition plate.
6. A reservoir according to claim 5, wherein said body is configured with only one inlet port, and said inlet port is disposed in an inner cavity of said first reservoir region;
the liquid inlet and the liquid outlet which are arranged in the first liquid storage area are both positioned on the bottom surface of the first liquid storage area;
and the diameter of the liquid inlet in the first liquid storage area is larger than that of the liquid outlet thereof.
7. The liquid storage tank as claimed in claim 1, wherein two liquid discharge ports are formed in the second liquid storage area and are positioned on the bottom surface of the second liquid storage area;
in the inner cavities of the two liquid storage areas, the height of one liquid discharge port is lower than that of the other liquid discharge port.
8. A reservoir according to any one of claims 1-2, 4 and 6-7, further comprising a third reservoir region formed in an end of said body remote from said heating means;
the liquid storage area III is arranged across the width of the liquid storage area I and the width of the liquid storage area II and is connected with the liquid storage area I and the liquid storage area II through a connecting plate;
and the height of the connecting plate is higher than that of the partition plate.
9. A liquid storage tank as claimed in claim 8, wherein a liquid discharge port is provided on each of the bottom surface and the side wall surface of the third liquid storage region.
10. A cleaning machine provided with a reservoir according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221479273.5U CN217393147U (en) | 2022-06-14 | 2022-06-14 | Liquid storage tank and cleaning machine with same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221479273.5U CN217393147U (en) | 2022-06-14 | 2022-06-14 | Liquid storage tank and cleaning machine with same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217393147U true CN217393147U (en) | 2022-09-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221479273.5U Active CN217393147U (en) | 2022-06-14 | 2022-06-14 | Liquid storage tank and cleaning machine with same |
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| Country | Link |
|---|---|
| CN (1) | CN217393147U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023241733A1 (en) * | 2022-06-14 | 2023-12-21 | Tcl Zhonghuan Renewable Energy Technology Co., Ltd. | Liquid storage tanks and cleaners including the same |
-
2022
- 2022-06-14 CN CN202221479273.5U patent/CN217393147U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023241733A1 (en) * | 2022-06-14 | 2023-12-21 | Tcl Zhonghuan Renewable Energy Technology Co., Ltd. | Liquid storage tanks and cleaners including the same |
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