CN217134324U - Manufacturing device of display device - Google Patents

Manufacturing device of display device Download PDF

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Publication number
CN217134324U
CN217134324U CN202220546309.0U CN202220546309U CN217134324U CN 217134324 U CN217134324 U CN 217134324U CN 202220546309 U CN202220546309 U CN 202220546309U CN 217134324 U CN217134324 U CN 217134324U
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China
Prior art keywords
cover member
cvm1
surface portion
disposed
display device
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Active
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CN202220546309.0U
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Chinese (zh)
Inventor
郑秀泳
金伦我
朴商万
朴贞恩
李政原
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Samsung Display Co Ltd
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Samsung Display Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

Disclosed is a manufacturing apparatus for a display device. The manufacturing device of the display device includes: a working platform for placing the substrate; and a work table driving unit that moves the work table in a first direction, the work table including: a table portion including a first side surface portion disposed in the first direction and a second side surface portion disposed in a direction opposite to the first direction, and defining an inner space between the first side surface portion and the second side surface portion; a first covering member that is disposed on the first side surface portion and that defines an opening portion that communicates with the internal space of the table portion; and a second covering member disposed on the second side surface portion and defining an opening portion communicating with the internal space of the table portion.

Description

Manufacturing device of display device
Technical Field
The utility model relates to a display device's manufacturing installation.
Background
As a method for crystallizing a substrate or a thin film, an ELA (Excimer Laser Annealing) method is conceivable. For example, in a manufacturing process of a display device, an a-Si (Amorphous Silicon) TFT (Thin Film Transistor) may be converted into an LTPS (Low Temperature polysilicon) TFT (Thin Film Transistor) by an ELA method.
The ELA method mounts a substrate or a thin film on a stage inside a cavity and instantaneously heats the substrate or the thin film by an annealing process using a laser in a high temperature state to induce crystallization. In order to improve the yield of the ELA method, it is important to appropriately control foreign matters generated in the process.
SUMMERY OF THE UTILITY MODEL
The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a manufacturing apparatus for a display device, which can minimize contamination of a substrate due to foreign matter.
The problems of the present invention are not limited to the above-mentioned problems, and those skilled in the art will be able to clearly understand the technical problems that are not mentioned or are otherwise mentioned from the following description.
An apparatus for manufacturing a display device according to an embodiment for solving the above-described problems includes: a working platform for placing the substrate; and a work table driving unit that moves the work table in a first direction, the work table including: a table portion including a first side surface portion disposed in the first direction and a second side surface portion disposed in a direction opposite to the first direction, and defining an inner space between the first side surface portion and the second side surface portion; a first covering member that is disposed on the first side surface portion and that defines an opening portion that communicates with the internal space of the table portion; and a second covering member disposed on the second side surface portion and defining an opening portion communicating with the internal space of the table portion.
The first covering member and the second covering member may be arranged in parallel with the first direction.
The opening portion of the first covering member and the opening portion of the second covering member may be open toward a lower direction.
The table portion may include a flat upper surface and a lower surface opposite to the upper surface, and the opening portion of the first covering member and the opening portion of the second covering member may be disposed to be spaced apart from the lower surface of the table portion in an upper direction.
The opening portion of the first covering member and the opening portion of the second covering member may be arranged so as not to protrude from the table portion in a lower direction.
The first cover member and the second cover member may be arranged to protrude from the first side surface portion and the second side surface portion of the table portion, respectively.
The first side surface portion and the second side surface portion may be inclined such that the width of the table portion in the first direction becomes smaller as the width of the table portion in the first direction increases from the upper surface of the table portion toward a lower direction.
The first cover member and the second cover member may each further include a side surface portion arranged to be inclined with respect to a normal line of the upper surface of the table portion.
The side surface portion of the first cover member may be parallel to the first side surface portion of the table, and the side surface portion of the second cover member may be parallel to the second side surface portion of the table.
The side surface portion of the first cover member may be disposed to be inclined with respect to the first side surface portion of the table portion, and the side surface portion of the second cover member may be disposed to be inclined with respect to the second side surface portion of the table portion.
The first covering member may further include: an upper surface portion that is disposed above the opening portion of the first cover member and is inclined with respect to the side surface portion of the first cover member.
The opening portion of the first cover member may be disposed to be spaced apart from the lower surface of the table portion by a first distance in an upper direction, and the upper end of the first cover member may be disposed to be spaced apart from the upper surface of the table portion by a second distance different from the first distance in the lower direction.
The first cover member may have a pipe shape protruding from the first side surface of the table portion, and the second cover member may have a pipe shape protruding from the second side surface of the table portion.
The table part may include: the substrate placing part is used for placing the substrate and is defined with a plurality of pin holes.
The work table may include a substrate lifting/lowering member disposed to be movable in a vertical direction in the internal space of the table portion, and the substrate lifting/lowering member may include a plurality of lifting pins disposed below the plurality of pin holes so as to overlap the plurality of pin holes, respectively.
At least a portion of the substrate lifting member may overlap the first covering member and the second covering member in the first direction.
When the substrate lifting/lowering member is lifted, air in the internal space of the table portion may flow out through the opening of the first covering member and the opening of the second covering member.
An air flow may be formed through the inner space of the table portion when the work table moves.
When the work table moves in the first direction, air may be introduced toward the internal space of the table through the opening portion of the first cover member, and air of the internal space of the table may flow out through the opening portion of the second cover member.
The manufacturing apparatus of the display device may further include: and a chamber for housing the work table and the work table driving unit, wherein the chamber includes a substrate inlet and a gas outlet below the substrate inlet and the work table.
The manufacturing apparatus of the display device may further include: and a laser light source unit that irradiates laser light into the cavity.
The manufacturing apparatus of the display device may further include: a plurality of gas injection parts arranged in the first direction inside the chamber.
At least one of the plurality of gas injection portions may overlap the work table in a second direction intersecting the first direction.
The work table may further include: an optical module; an optical module housing unit that houses the optical module; and an optical module opening portion formed in the optical module housing portion.
A manufacturing apparatus of a display device according to another embodiment for solving the above-described problem includes a table configured to be movable in a first direction, the table including: a table portion defining an inner space; and a plurality of covering members disposed on a side surface of the table portion and defining an opening portion communicating with the internal space of the table portion.
It may be that the plurality of covering members include: a first covering member disposed facing the first direction; and a second covering member disposed in a direction opposite to the first direction.
The work table may include: and a substrate lifting member configured to be movable in a vertical direction in the internal space of the table.
Other embodiments are specifically included in the detailed description and the accompanying drawings.
(effects of utility model)
The manufacturing apparatus of the display device according to an embodiment can minimize the foreign matter discharged toward the substrate, and can smoothly discharge the foreign matter in the work table, thereby increasing the yield.
The effects according to the embodiments are not limited to those exemplified above, and further effects are included in the present specification.
Drawings
Fig. 1 is a perspective view of a manufacturing apparatus of a display device according to an embodiment.
Fig. 2 is a sectional view taken along a-a' of fig. 1.
Fig. 3 is an enlarged perspective view of the first side surface part according to the embodiment.
Fig. 4 and 5 are enlarged sectional views of the work table according to the embodiment.
Fig. 6 is a side view of a work table according to another embodiment.
Fig. 7 is a side view of a work table according to still another embodiment.
Fig. 8 is a side view of a work table according to still another embodiment.
Fig. 9 is a side view of a work table according to still another embodiment.
Fig. 10 is a side view of a work table according to still another embodiment.
Fig. 11 is a simulation result showing the discharge path of the foreign matter when the first covering member and the second covering member are not applied.
Fig. 12 is a simulation result showing the discharge path of the foreign matter when the first covering member and the second covering member are applied.
Description of the symbols:
1: a manufacturing apparatus of a display device; CBR: a cavity; WT: an operation table; WTD: a work table moving section; TP: a table part; CVM 1: a first covering member; CVM 2: a second covering member.
Detailed Description
The advantages and features of the present invention and methods of achieving the advantages and features will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and may be realized in different forms, and the embodiments are provided only to complete the disclosure of the present invention and to inform the scope of the present invention to those skilled in the art, and the present invention should be defined only by the scope of the claims.
The case where elements or layers are located on other elements or layers (on) includes not only the case where they are directly located on other elements but also the case where other layers or other elements are present therebetween. Throughout the specification, the same reference numerals denote the same constituent elements. The shapes, sizes, ratios, angles, numbers, and the like disclosed in the drawings for describing the embodiments are examples, and the present invention is not limited to the illustrated cases.
Specific embodiments are described below with reference to the drawings.
Fig. 1 is a perspective view of a manufacturing apparatus of a display device according to an embodiment. Fig. 2 is a sectional view taken along a-a' of fig. 1.
Hereinafter, the first direction X, the second direction Y, and the third direction Z are different directions from each other, and intersect each other. For example, the first direction X may be a length direction, the second direction Y may be a width direction, and the third direction Z may be a height direction. The first direction X, the second direction Y, and the third direction Z may include two directions. For example, the third direction Z may include an upper side direction indicating an upper side on the drawing plane and a lower side direction indicating a lower side on the drawing plane. It is to be understood, however, that the directions and names are relative and are not to be considered limiting.
Referring to fig. 1 and 2, the manufacturing apparatus 1 of the display device may be an ELA (Excimer Laser Annealing) apparatus that irradiates a Laser LB onto a substrate SUB or a thin film to guide crystallization of the substrate SUB or the thin film on the substrate SUB. For example, a Poly-Si (polysilicon) layer for forming an active layer of a thin film transistor TFT constituting the display device may be formed from an a-Si (Amorphous Silicon) layer on the substrate SUB by the display device manufacturing apparatus 1, but the object to be processed by the display device manufacturing apparatus 1 is not limited thereto.
The display device manufacturing apparatus 1 may include a chamber CBR, a table WT, a table moving part WTD, and a gas injection part GP.
The cavity CBR may provide a process space sealed from the outside. The interior of the cavity CBR may be vacuum or filled with an inert gas. The interior of the chamber CBR may be a vacuum environment or a nitrogen environment. For example, as shown in fig. 1, the cavity CBR may have a substantially rectangular parallelepiped shape long in the first direction X, and may include two long sidewalls extending in the first direction X and two short sidewalls extending in the second direction Y, but the shape of the cavity CBR is not limited thereto.
The chamber CBR may include a substrate inlet and outlet SE and at least one gas flow outlet G _ OUT.
The substrate inlet SE may be disposed at a short sidewall of the chamber CBR. The substrate SUB may be introduced into the chamber CBR through the substrate inlet SE to be placed on the table WT. The substrate inlet and outlet SE may be disposed at substantially the same height as the work table WT or at a position slightly higher than the work table WT.
Through the gas outflow port G _ OUT, the gas inside the cavity CBR can flow OUT to the outside. When the gas inside flows out, the foreign substances inside the cavity CBR may be discharged to the outside together.
The gas outlet G _ OUT may be disposed at a position lower than the substrate inlet SE and the table WT. The height of the gas outflow port G _ OUT can be set to be smaller than the height of the substrate inlet/outlet SE and the height of the positioning table WT. The gas flow outlet G _ OUT may be located at a lower portion of a short sidewall of the cavity CBR, but the position of the gas flow outlet G _ OUT is not limited thereto.
A plurality of gas flow outlets G _ OUT may also be arranged. For example, as shown in fig. 1 and 2, two gas flow outlets G _ OUT may be respectively disposed at lower portions of two short sidewalls of the cavity CBR. However, the present invention is not limited to this, and any one of the two gas outflow ports G _ OUT may be omitted.
The table WT may be disposed inside the cavity CBR. A substrate SUB may be placed on the table WT. The table WT may be disposed on a stage WTD _ ST described later. The table WT is connected to the stage WTD _ ST and can move together with the stage WTD _ ST.
The table WT may include a table portion TP, a first cover member CVM1, and a second cover member CVM 2.
The table TP may have a substantially rectangular parallelepiped shape. The table TP may include an upper surface TP _ US on which the substrate SUB is placed, a lower surface TP _ LS opposite to the upper surface TP _ US and disposed on the stage WTD _ ST, and a plurality of sides TP _ SS1, TP _ SS2 extending between the upper surface TP _ US and the lower surface TP _ LS.
The table TP may have an inner space NS. The inner space NS of the table TP may be at least partially enclosed by an upper surface TP _ US, a lower surface TP _ LS and a plurality of side surfaces TP _ SS1, TP _ SS2 of said table TP. The internal space NS of the table TP may be sealed from the outside except for a plurality of pin holes PH, opening portions of the cover members CVM1 and CVM2 (see "CVM 1_ OP" and "CVM 2_ OP" in fig. 4), and an optical module opening portion OM _ OP, which will be described later. A substrate elevation member SLP described later may be disposed in the internal space NS of the table TP.
The table part TP may include a first side part TP _ SS1 facing the first direction X and a second side part TP _ SS2 opposite to the first side part TP _ SS 1.
The first direction X may indicate a process proceeding direction or a traveling direction of the table WT (stage WTD _ ST). The process proceeding direction may include a direction from the substrate inlet/outlet SE toward the laser transmission window LBW and a direction opposite thereto.
The first side portion TP _ SS1 and the second side portion TP _ SS2 may be configured to be opposite to the short sidewalls of the cavity CBR. As shown in fig. 1 and 2, in a case where the table WT is closely attached to the short side wall of the chamber CBR providing the substrate port SE, the first side surface portion TP _ SS1 may be opposed to the inner space of the chamber CBR, and the second side surface portion TP _ SS2 may be opposed to the short side wall of the chamber CBR providing the substrate port SE.
The first side portion TP _ SS1 and the second side portion TP _ SS2 may extend in the second direction Y, respectively. The first side portion TP _ SS1 and the second side portion TP _ SS2 may be configured to be inclined with respect to the third direction Z. For example, the first side portion TP _ SS1 and the second side portion TP _ SS2 may be configured to form an angle greater than about 0 ° and less than about 90 ° with respect to the third direction Z.
The first and second sides TP _ SS1 and TP _ SS2 may be configured to be inclined with respect to an upper surface TP _ US of the table TP parallel to the first and second directions X and Y or a lower surface TP _ LS of the table TP parallel to the upper surface TP _ US of the table TP. The first side portion TP _ SS1 and the second side portion TP _ SS2 may be inclined such that the width of the table TP in the first direction X becomes smaller as going from the upper surface TP _ US of the table TP to the lower surface TP _ LS of the table TP.
The table part TP may include a substrate placing part SMP, a substrate lifting member SLP, an optical module OM, an optical module receiving part TP _ OM, and an optical module opening part OM _ OP.
The substrate mounting portion SMP may be disposed on the upper surface TP _ US of the table portion TP. For example, the substrate placing portion SMP may have a rectangular planar shape, but is not limited thereto. The substrate placement portion SMP may indicate a specific region of the upper surface TP _ US of the table portion TP on which the substrate SUB is placed. The substrate placing portion SMP may include, for example, a fixing member such as a vacuum suction passage for fixing the substrate SUB.
A plurality of pin holes PH may be formed in the substrate placing portion SMP. The inner space NS of the table TP may communicate with the inner space of the cavity CBR through a plurality of pin holes PH.
The substrate elevating member SLP may be disposed in the inner space NS of the table TP. The substrate lifting and lowering member SLP may be configured such that at least a portion overlaps the first side face portion TP _ SS1, the first cover member CVM1, the second side face portion TP _ SS2 and the second cover member CVM2 in the first direction X.
The substrate elevation member SLP may be configured to be elevatable in the third direction Z. For example, the substrate elevation member SLP may be disposed in the internal space NS of the table TP and may be elevated by a cylinder, a motor, or the like connected to the substrate elevation member SLP, but is not limited thereto.
The substrate elevation part SLP may include a pin fixing part PLT and a plurality of elevation pins PN.
The pin fixing part PLT may support a plurality of elevating pins PN. For example, the pin fixing member PLT may be a plate-shaped member in which a plurality of rising and falling pins PN are arranged on one surface, but is not limited thereto.
The plurality of elevating pins PN may be configured to protrude from the pin fixing part PLT along the third direction Z. The plurality of riser pins PN may be configured to overlap the plurality of pin holes PH in the third direction Z, respectively.
The substrate lifting part SLP may be configured to be lifted up and down so that the substrate SUB may be stably placed on the substrate placing portion SMP. When the substrate SUB is transferred from the outside to the inside of the cavity CBR, the substrate elevation member SLP is raised, and the plurality of elevation pins PN protrude upward from the substrate placing portion SMP, so that the substrate SUB can be supported. Then, the substrate elevation member SLP is lowered so that the substrate SUB can be placed on the upper surface of the substrate placing portion SMP (the upper surface TP _ US of the table portion TP).
The optical module OM may include, for example, an imaging part such as a vision camera or the like for optically imaging and inspecting alignment of the substrate SUB, defect or non-defect of the annealing process, or the like.
The optical module OM and the optical module receiving part TP _ OM may be provided at a side of the table part TP opposite to the long sidewall of the cavity CBR. The optical module OM and the optical module receiving portion TP _ OM may be located between the substrate placing portion SMP and the long sidewalls of the cavity CBR. The optical module accommodating portion TP _ OM accommodates an optical module OM including a vision camera, for example. The optical module receiving portion TP _ OM may be configured to be separated from the internal space NS of the table portion TP, or the optical module receiving portion TP _ OM may be configured to form a part of the internal space NS of the table portion TP.
The optical module opening part OM _ OP may be defined in a partial area of the upper surface TP _ US of the table part TP forming the upper surface of the optical module receiving part TP _ OM. The optical module opening part OM _ OP may be formed to overlap the optical module OM in the third direction Z. For example, the optical module opening portion OM _ OP may have a long slit shape extending in the first direction X, but is not limited thereto.
The first cover member CVM1 and the second cover member CVM2 may be disposed at the first side portion TP _ SS1 and the second side portion TP _ SS2 of the table portion TP, respectively.
As shown in fig. 2, in cross section, the first cover member CVM1 and the second cover member CVM2 may be arranged in the first direction X so as to sandwich the table portion TP therebetween. The first cover part CVM1 and the second cover part CVM2 may be aligned parallel to the moving direction or moving path of the work table WT (object WT _ ST). The first cover part CVM1 may be configured to face in a first direction X, and the second cover part CVM2 may be configured to face in an opposite direction of the first direction X. The first cover part CVM1 and the second cover part CVM2 may be configured to be opposed to both short sidewalls of the cavity CBR, respectively. The first cover member CVM1 and the second cover member CVM2 may be configured to be symmetrical in cross section with respect to the table TP. The first cover part CVM1 and the second cover part CVM2 may be located at substantially the same height. The first cover part CVM1 and the second cover part CVM2 may overlap each other in the first direction X. The first and second cover members CVM1 and CVM2 may have the lower side open such that the internal space NS of the table TP communicates with the inside of the cavity CBR. The first cover member CVM1 and the second cover member CVM2 may also be referred to as a first ventilation member and a second ventilation member, respectively.
The table moving unit WTD may be disposed below the table WT. The table moving unit WTD is connected to the table WT and can move the table WT in a process proceeding direction (first direction X). For example, table mover WTD may include a linear stage or a multi-axis stage, but is not limited thereto.
The table moving unit WTD may include a stage unit WTD _ ST and a base unit WTD _ BS.
The table WT is placed on the stage WTD _ ST. The carrying portion WTD _ ST may be slidably coupled to the base portion WTD _ BS. When the stage WTD _ ST moves, the table WT may also move together.
The gas injection part GP may inject an inert gas to the inside of the cavity CBR. For example, the gas injection part GP may inject nitrogen gas to the inside of the cavity CBR, but is not limited thereto.
A plurality of gas injection portions GP may be disposed inside the chamber CBR. The plurality of gas injection portions GP may be disposed to be opposed to both long side walls of the chamber CBR inside the chamber CBR. The plurality of gas injection portions GP may be arranged in the first direction X. The plurality of gas injection portions GP may be disposed at substantially the same height as the work table WT. The at least one gas injection portion GP may overlap the work table WT in the second direction Y. As will be described later, the gas can be uniformly injected along the moving path of the substrate SUB and the scattering of foreign substances due to the gas can be prevented by disposing the window (see "WD" in fig. 3) instead of forming the opening on the third side surface portion ("TP _ SS 3" in fig. 3) of the table portion TP facing the gas injection portion GP.
The manufacturing apparatus 1 of the display device may further include a light source section LS.
The light source section LS may be disposed outside so as to emit the laser light LB toward the inside of the cavity CBR. The laser beam LB emitted from the light source unit LS may be emitted into the cavity CBR through the laser transmission window LBW disposed above the cavity CBR. In some embodiments, the manufacturing apparatus 1 of the display device may further include an optical system that is disposed on an emission path of the laser beam LB to control a direction of the laser beam LB or characteristics of the laser beam LB.
The manufacturing apparatus 1 of the display device may further include a guide member GW disposed adjacent to the loading unit WTD _ ST.
The guide member GW may be configured to extend in the first direction X, so that the movement of the carrying part WTD _ ST may be guided. The guide member GW may be a guide wall, for example, but is not limited thereto. In an embodiment, the two guide members GW may be configured to sandwich the carrying part WTD _ ST therebetween. In some embodiments, at least one of the two guiding members GW may be omitted.
The substrate SUB can be carried into the chamber CBR through the substrate inlet SE and placed on the substrate placing portion SMP of the table WT. The substrate SUB may include a material crystallized through an annealing process using the laser LB. The substrate SUB is shown as a single layer in fig. 2, but is not limited thereto. The substrate SUB may include a glass layer and an a-Si layer disposed on the glass layer. The substrate SUB may also further comprise a buffer layer between the glass layer and the a-Si layer.
Fig. 3 is an enlarged perspective view of the first side surface part according to the embodiment. Fig. 4 and 5 are enlarged sectional views of the work table according to the embodiment. Fig. 6 is a side view of a work table according to another embodiment.
As described above, the first cover member CVM1 and the second cover member CVM2 may be configured to be symmetrical with respect to the table TP. The second cover member CVM2 has substantially the same or similar structure as the first cover member CVM1, and therefore, the first cover member CVM1 is mainly described below.
Referring to fig. 1 to 3, a plurality of first cover members CVM1 may be disposed in the first side surface portion TP _ SS 1. In the first side portion TP _ SS1, a plurality of first cover members CVM1 may be arranged in the second direction Y. The plurality of first cover parts CVM1 may be configured to protrude from the first side portions TP _ SS1, respectively. However, the present invention is not limited to this, and only one first cover member CVM1 that is long in the second direction Y may be disposed on the first side surface portion TP _ SS 1.
As described above, the opening CVM1_ OP of the first cover member CVM1 may be disposed below the first cover member CVM 1. The opening CVM1_ OP of the first cover member CVM1 may be open toward the lower direction.
The first cover member CVM1 may further include an upper surface portion CVM1_ US and a side surface portion CVM1_ SS.
The upper surface portion CVM1_ US of the first cover member CVM1 may be configured to be inclined with respect to the side surface portion CVM1_ SS of the first cover member CVM 1. The upper surface portion CVM1_ US of the first cover part CVM1 may extend substantially parallel to the upper surface TP _ US of the table TP or the lower surface TP _ LS of the table TP.
The upper surface portion CVM1_ US of the first cover part CVM1 may denote an upper surface of the first cover part CVM1, but is not limited thereto. The upper surface portion CVM1_ US of the first cover member CVM1 may indicate the upper surface of the first cover member CVM1 and a portion adjacent thereto, or the upper portion, upper end, or uppermost end of the first cover member CVM 1.
The side face portion CVM1_ SS of the first cover member CVM1 may be configured to extend in the third direction Z. The side portion CVM1_ SS of the first cover member CVM1 may be configured to be inclined with respect to an upper surface TP _ US of the table TP (or a lower surface TP _ LS of the table TP). As shown in fig. 3, the side surface portion CVM1_ SS of the first cover member CVM1 may be substantially parallel to the first side surface portion TP _ SS1 of the table portion TP, but is not limited thereto.
The first cover part CVM1 may be configured to be spaced apart from a lower surface TP _ LS of the table TP in the third direction Z. For example, the opening portion CVM1_ OP of the first cover member CVM1 may be disposed to be spaced apart from the lower surface TP _ LS of the table portion TP by a first distance D1 in the upper direction.
The first cover part CVM1 may be configured to be spaced apart from an upper surface TP _ US of the table part TP in the third direction Z. For example, the upper surface portion CVM1_ US of the first cover member CVM1 may be configured to be spaced apart from the upper surface TP _ US of the table portion TP by a second distance D2 in the downward direction.
The first cover part CVM1 is configured not to protrude from the upper surface TP _ US of the table TP or the lower surface TP _ LS of the table TP, so that the movement resistance may be reduced when the table WT moves.
The opening portion CVM1_ OP of the first cover member CVM1 may be disposed closer to the lower surface TP _ LS of the table TP than the upper surface TP _ US of the table TP. For example, the first distance D1 may be less than half the thickness (height) of the table TP in the third direction Z. For another example, the first distance D1 may be less than the second distance D2. Accordingly, when the table WT moves (an open arrow shown along the first direction X in fig. 2), foreign substances in the internal space NS of the table TP can be discharged through the opening CVM1_ OP of the first cover member CVM1 by being spaced apart from the upper surface TP _ US of the table TP in the downward direction. However, without being limited thereto, the first distance D1 may be the same as the second distance D2, or the first distance D1 may be larger than the second distance D2. By adjusting the first distance D1 and the second distance D2, the path of the airflow (e.g., the height or the degree of diffusion of the airflow) formed in the internal space NS of the table TP may be adjusted.
Referring to fig. 3, the table TP may further include a third side surface portion TP _ SS3 extending in the first direction X.
The third side portion TP _ SS3 may be disposed between the first side portion TP _ SS1 and the second side portion TP _ SS 2. The third side part TP _ SS3 may be configured to be inclined with respect to the third direction Z similarly to the first and second side parts TP _ SS1 and TP _ SS2, but is not limited thereto. At least one window WD for observing the internal space NS of the table TP may be disposed at the third side portion TP _ SS 3.
Referring to fig. 1 to 5, similarly to the first side face portion TP _ SS1, a plurality of second cover members CVM2 may be arranged at the second side face portion TP _ SS 2.
The second cover member CVM2 may have substantially the same or similar structure as the first cover member CVM 1. As shown in fig. 4 and 5, the second cover member CVM2 may include an upper surface CVM2_ US, a side surface CVM2_ SS, and an opening portion CVM2_ OP, as in the first cover member CVM 1. In this case, like the first cover part CVM1, the second cover part CVM2 may be spaced apart from the upper surface TP _ US of the table TP and the lower surface TP _ LS of the table TP in the third direction Z.
For example, the upper surface CVM2_ US of the second cover member CVM2 may be spaced apart from the upper surface TP _ US of the table TP by a second distance D2, and the opening portion CVM2_ OP of the second cover member CVM2 may be spaced apart from the lower surface TP _ LS of the table TP by a first distance D1. The second cover member CVM2 is substantially the same as or similar to the first cover member CVM1 except that the second cover member CVM2 is disposed on the second side portion TP _ SS2, and therefore, a repetitive description thereof will be omitted below.
Referring to fig. 4 and 5, since the display device is manufactured through a fine process, when the substrate SUB is exposed to foreign substances, the yield of the display device may be reduced, and a defect of the display device may be caused. Therefore, in the manufacturing process of the display device, the cleanliness of the inside of the cavity CBR after the completion of the process is very important. The exposure of the substrate SUB to the foreign matter as described above can be alleviated by the first cover member CVM1 and the second cover member CVM2 described above.
Referring to fig. 1, 2 and 4, the substrate SUB introduced into the cavity CBR may be placed on the table WT. Specifically, as shown in fig. 4, when the substrate SUB is positioned on the substrate placing portion SMP of the table WT, the substrate elevation member SLP may be raised upward so that the plurality of elevation pins PN penetrate the plurality of pin holes PH, respectively, to support the lower surface of the substrate SUB. After the substrate SUB is placed on the plurality of lift pins PN, the substrate lift member SLP may be lowered toward a lower direction so that the substrate SUB is placed on the substrate placing portion SMP. The above process is represented in fig. 4 by a double-headed hollow arrow and a dashed line.
By the elevation of the substrate elevation member SLP as described above, the pressure of the internal space NS of the table TP may be changed. When the substrate elevation member SLP is raised, the air pressure in the internal space NS of the table portion TP (for example, between the substrate placing portion SMP and the substrate elevation member SLP) may increase. In this case, as indicated by the two-dot chain line arrows in fig. 4, the air in the internal space NS of the table TP can be discharged in the lower direction through the opening CVM1_ OP of the first cover member CVM1 and the opening CVM2_ OP of the second cover member CVM 2. Accordingly, the pressure of the internal space NS of the table TP formed by the elevation of the substrate elevation member SLP is removed, and thus it is possible to prevent foreign substances (for example, foreign substances generated by separation of the substrate elevation member SLP and a member for driving the same) existing in the internal space NS of the table TP from being discharged through the plurality of pin holes PH and the optical module opening portion OM _ OP. Further, the foreign substances discharged toward the lower portion of the cavity CBR may be discharged to the outside through the gas outlet port G _ OUT provided at the lower portion of the cavity CBR so as not to contact the substrate SUB on the table WT again. That is, in the manufacturing apparatus 1 of the display device according to the embodiment, the substrate SUB is not located on the main discharge path of the foreign substance, and therefore, contamination of the substrate SUB due to the foreign substance can be minimized.
Referring to fig. 1, 2, and 5, after the substrate SUB is placed on the table WT, the table WT may be moved to a position where the laser beam LB is irradiated. The table WT can be moved in a process proceeding direction (for example, the first direction X) by the table moving unit WTD. Then, the substrate SUB may be irradiated with the laser beam LB to perform an annealing process. After the annealing process is completed, the table WT may be moved again in the direction in which the substrate inlet SE is located, and the substrate SUB is transferred to the outside of the chamber CBR through the substrate inlet SE.
As shown in fig. 5, while the table WT is moving, the air in the internal space NS of the table TP can be naturally ventilated through the opening CVM1_ OP of the first cover member CVM1 and the opening CVM2_ OP of the second cover member CVM 2. Specifically, while the table WT is moving in the first direction X (the hollow arrow shown in the first direction X in fig. 5), a positive pressure may be formed in front of the first cover member CVM1 disposed toward the first direction X, and a negative pressure may be formed in front of the second cover member CVM2 disposed in the opposite direction to the first direction X, so that a natural airflow may be formed across the internal space NS of the table TP. By the air flow, foreign substances in the internal space NS of the table TP can be discharged through the opening CVM2_ OP of the second cover member CVM2, as indicated by the two-dot chain line arrow in fig. 5. In contrast, while the table WT is moving in the direction opposite to the first direction X, a positive pressure may be formed in front of the second cover member CVM2 disposed in the direction opposite to the first direction X, and a negative pressure may be formed in front of the first cover member CVM1 disposed in the direction opposite to the first direction X, so that foreign substances in the internal space NS of the table TP may be discharged through the opening portion CVM1_ OP of the first cover member CVM 1. This makes it possible to easily remove foreign matter in the internal space NS of the table TP.
During the movement of the table WT as described above, the down flow can be formed by the opening portion CVM1_ OP of the first cover member CVM1 and the opening portion CVM2_ OP of the second cover member CVM2 which are opened in the lower direction. Thereby, the foreign matter is discharged in the lower direction toward the lower portion of the cavity CBR adjacent to the gas outlet port G _ OUT, so that the substrate SUB can be prevented from being exposed to the foreign matter. Further, the foreign matter in the internal space NS of the table TP is effectively discharged toward the gas outlet G _ OUT located at the lower portion of the cavity CBR, so that the discharge gas flow for ventilating the inert gas in the cavity CBR can be minimized to reduce the process cost.
Fig. 6 is a side view of a work table according to another embodiment. Fig. 7 is a side view of a work table according to still another embodiment. Fig. 8 is a side view of a work table according to still another embodiment. Fig. 9 is a side view of a work table according to still another embodiment. Fig. 10 is a side view of a work table according to still another embodiment.
Referring to fig. 7 to 10, the shapes of the first cover part CVM1 and the second cover part CVM2 may be changed in various ways.
As described above, the first cover member CVM1 and the second cover member CVM2 have a symmetrical structure with respect to the table portion TP, and therefore the first cover member CVM1 will be mainly described below.
Referring to fig. 6, the opening CVM1_ OP of the first cover member CVM1 is located above the lower surface TP _ LS of the table TP, and a second distance D2 from the upper surface portion CVM1_ US of the first cover member CVM1 to the upper surface TP _ US of the table TP may be greater than a first distance D1 from the lower surface TP _ LS of the table TP to the opening CVM1_ OP of the first cover member CVM 1. In this case, the negative pressure generated by the air flow as shown in fig. 3 may be more intensively formed at the lower portion of the internal space NS of the table TP, and the volumes of the internal space of the first cover member CVM1 and the internal space of the second cover member CVM2 communicating with the internal space NS of the table TP may be relatively reduced, so that the internal space NS of the table TP may be more efficiently ventilated.
Referring to fig. 6, the side surface portion CVM1_ SS of the first cover member CVM1 may be disposed substantially parallel to the first side surface portion TP _ SS1 of the table portion TP, and the upper surface portion CVM1_ US of the first cover member CVM1 may be disposed substantially perpendicular to the first side surface portion TP _ SS1 of the table portion TP. In this case, when the table WT moves, the eddy currents generated in the first side surface portion TP _ SS1 and the second side surface portion TP _ SS2 of the table TP and the scattering of foreign substances caused by the eddy currents can be reduced.
Referring to fig. 7, the side portion CVM1_ SS of the first cover member CVM1 and the first side portion TP _ SS1 of the table portion TP may be inclined in different directions from each other in a side view (or a sectional view). The side surface portion CVM1_ SS of the first cover member CVM1 may be configured to be inclined in a direction opposite to the inclination direction of the first side surface portion TP _ SS1 of the table portion TP. The width of the first cover part CVM1 in the first direction X may be increased toward the lower side. For example, as shown in fig. 7, the first side surface portion TP _ SS1 of the table portion TP may be inclined from the right upper end toward the left lower end, and the side surface portion CVM1_ SS of the first cover member CVM1 may be inclined from the left upper end toward the right lower end.
Referring to fig. 7, a corner portion formed by the intersection of the upper surface portion CVM1_ US of the first cover member CVM1 and the upper surface portion CVM1_ US of the first cover member CVM1 and the side surface portion CVM1_ SS of the first cover member CVM1 may be omitted. Thus, when the table WT moves, the movement resistance and the generation of eddy current can be reduced.
Referring to fig. 8, unlike the embodiment of fig. 7, the side portion CVM1_ SS of the first cover member CVM1 and the first side portion TP _ SS1 of the table portion TP may be inclined in the same direction. In this case, the angle at which the side portion CVM1_ SS of the first cover member CVM1 is inclined and the angle at which the first side portion TP _ SS1 of the table portion TP is inclined may be different from each other. As shown in fig. 8, the first side portion TP _ SS1 of the table portion TP may be inclined at a larger angle with respect to the third direction Z than the side portion CVM1_ SS of the first cover member CVM 1. The width of the first cover part CVM1 in the first direction X may be increased toward the lower side.
As shown in fig. 7 and 8, the second distance D2 may be greater than the first distance D1 or less than the first distance D1. The first distance D1 may also be the same as the second distance D2. The first distance D1 and the second distance D2 may be varied in various ways according to a path of an air flow desired to be formed in the internal space NS of the table TP, a vortex formed by movement of the table TP, a movement resistance of the table TP, or the like.
Referring to fig. 9, the opening portion CVM1_ OP of the first cover member CVM1 may be disposed to be spaced apart from the first side portion TP _ SS1 of the table portion TP in the first direction X. For example, as shown in fig. 9, the first cover member CVM1 may have a shape like a tube protruding from the first side surface portion TP _ SS1 of the table portion TP.
The first cover member CVM1 may include a first side portion CVM1_ SS1 connected to the opening portion CVM1_ OP of the first cover member CVM1 and a second side portion CVM1_ SS2 connected to the opening portion CVM1_ OP of the first cover member CVM1 and located below the first side portion CVM1_ SS 1. The first side portion CVM1_ SS1 of the first cover member CVM1 and the second side portion CVM1_ SS2 of the first cover member CVM1 may be arranged to be inclined in a direction intersecting with an extending direction of the first side portion TP _ SS1 of the table portion TP. The first side portion CVM1_ SS1 of the first cover member CVM1 and the second side portion CVM1_ SS2 of the first cover member CVM1 may be arranged parallel to each other, but are not limited thereto.
Referring to fig. 9, the opening portion CVM1_ OP of the first cover member CVM1 may be configured to open toward the first direction X. The opening portion CVM2_ OP of the second cover member CVM2 may be configured to open in a direction opposite to the first direction X. Thus, the air inside the cavity CBR can smoothly flow in and out through the opening portion CVM1_ OP of the first cover member CVM1 and the opening portion CVM2_ OP of the second cover member CVM 2.
Referring to fig. 10, the upper surface portion CVM1_ US of the first cover member CVM1 may be omitted, and the side surface portion CVM1_ SS of the first cover member CVM1 may include a curved surface. The air flowing into the inner space NS of the table TP may flow along the shape of the curved surface, and thus, a vortex formed by the movement of the table TP and the movement resistance of the table TP may be reduced.
Fig. 11 is a simulation result showing the discharge path of the foreign matter when the first covering member and the second covering member are not applied. Fig. 12 is a simulation result showing the discharge path of the foreign matter when the first covering member and the second covering member are applied.
Referring to fig. 11, in the case of the manufacturing apparatus 900 for a display device in which the first cover member CVM1 and the second cover member CVM2 are not applied to the table WT, foreign substances discharged from the plurality of pin holes PH and the optical module opening OM _ OP may scatter toward the upper portion of the table WT and spread in the upper region of the cavity CBR (indicated by the broken line in fig. 11). As a result of the computer simulation of the movement path of the foreign substances, about 38% of the foreign substances discharged from the table WT are discharged toward the upper portion of the cavity CBR to overlap the movement path of the substrate SUB. Thus, when the substrate SUB moves, the substrate SUB may be easily contaminated by foreign substances scattered in an upper region (indicated by a dotted line in fig. 11) of the cavity CBR.
Referring to fig. 12, in contrast, in the case of the manufacturing apparatus 1 for a display device in which the first cover member CVM1 and the second cover member CVM2 are applied to the table WT, foreign substances in the internal space of the table WT can be naturally discharged to the lower region of the cavity CBR (indicated by the broken line in fig. 12) that does not overlap the movement path of the substrate SUB through the opening portion CVM1_ OP of the first cover member CVM1 and the opening portion CVM2_ OP of the second cover member CVM 2. As a result of the computer simulation of the movement path of the foreign matter, only about 8% of the foreign matter released from the table WT flies into the upper region of the cavity CBR. That is, in the case where the first cover member CVM1 and the second cover member CVM2 are applied to the table WT, scattering of foreign substances toward the upper region of the cavity CBR overlapping the movement path of the substrate SUB is greatly reduced, whereby contamination of the substrate SUB can be minimized.
While the embodiments of the present invention have been described with reference to the drawings, it will be understood by those skilled in the art that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. Therefore, it should be understood that the above-described embodiments are illustrative in all aspects and are not restrictive.

Claims (10)

1. An apparatus for manufacturing a display device, comprising:
a working platform for placing the substrate; and
a table driving unit configured to move the table in a first direction,
the work table includes:
a table portion including a first side surface portion disposed in the first direction and a second side surface portion disposed in a direction opposite to the first direction, and defining an inner space between the first side surface portion and the second side surface portion;
a first covering member that is disposed on the first side surface portion and that defines an opening portion that communicates with the internal space of the table portion; and
and a second covering member disposed on the second side surface portion and defining an opening portion communicating with the internal space of the table portion.
2. The manufacturing apparatus of a display device according to claim 1,
the first covering member and the second covering member are arranged in parallel with the first direction,
the opening portion of the first covering member and the opening portion of the second covering member are open toward a lower side direction.
3. The manufacturing apparatus of a display device according to claim 1,
the table portion includes a flat upper surface and a lower surface opposite to the upper surface, and the opening portion of the first covering member and the opening portion of the second covering member are arranged to be spaced apart from the lower surface of the table portion in an upper direction.
4. The manufacturing apparatus of a display device according to claim 1,
the opening portion of the first covering member and the opening portion of the second covering member are arranged so as not to protrude from the table portion toward a lower side direction.
5. The manufacturing apparatus of a display device according to claim 1,
the first covering member and the second covering member are arranged to protrude from the first side surface portion and the second side surface portion of the table portion, respectively.
6. The manufacturing apparatus of a display device according to claim 3,
the first cover member and the second cover member each further include a side surface portion arranged to be inclined with respect to a normal line of the upper surface of the table portion.
7. The manufacturing apparatus of a display device according to claim 6,
the side surface portion of the first cover member is parallel to the first side surface portion of the table, and the side surface portion of the second cover member is parallel to the second side surface portion of the table.
8. The manufacturing apparatus of a display device according to claim 6,
the side surface portion of the first cover member is disposed to be inclined with respect to the first side surface portion of the table, and the side surface portion of the second cover member is disposed to be inclined with respect to the second side surface portion of the table.
9. The manufacturing apparatus of a display device according to claim 3,
the opening portion of the first cover member is disposed to be spaced apart from the lower surface of the table portion by a first distance in the upper side direction, and the upper end of the first cover member is disposed to be spaced apart from the upper surface of the table portion by a second distance different from the first distance in the lower side direction.
10. The manufacturing apparatus of a display device according to claim 1,
the first cover member has a tubular shape protruding from the first side surface of the table, and the second cover member has a tubular shape protruding from the second side surface of the table.
CN202220546309.0U 2021-05-06 2022-03-14 Manufacturing device of display device Active CN217134324U (en)

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