CN217058260U

CN217058260U - Rotary dryer for wafer

Info

Publication number: CN217058260U
Application number: CN202220038220.3U
Authority: CN
Inventors: 张小春; 吴端; 刘鹏; 叶信广
Original assignee: Crystal Core Semiconductor Huangshi Co ltd
Current assignee: Crystal Core Semiconductor Huangshi Co ltd
Priority date: 2022-01-09
Filing date: 2022-01-09
Publication date: 2022-07-26
Anticipated expiration: 2032-01-09

Abstract

The utility model discloses a spin dryer for wafers in the technical field of wafer processing, which comprises a shell, wherein an inner tube is fixedly arranged on the inner wall of the shell, a discharging tool is connected on the inner wall of the inner tube in a rotating way, a driving mechanism is arranged at the bottom of the inner cavity of the shell, and a drying mechanism is arranged at the left side of the inner cavity of the shell, a wafer workpiece is placed in a discharging groove in the inner tube, the inner tube is fixed in an outer cover through a baffle cover, when the driving mechanism drives the outer cover to rotate, the inner tube can synchronously follow the rotation, the moisture on the wafers is fully thrown out through the action of centrifugal force, and in the process of throwing water, the drying mechanism can continuously spray high-temperature gas to the inner tube to further accelerate the evaporation of the moisture on the surfaces of the wafers, and because the inner tube is a rotating device, the gas can dry any position of the wafers, thereby avoiding the water stain residue phenomenon, and being very worthy of popularization.

Description

Rotary dryer for wafer

Technical Field

The utility model relates to a wafer processing technology field specifically is a spin dryer for wafer.

Background

The wafer is a silicon wafer used for manufacturing a silicon semiconductor circuit, the raw material of the wafer is silicon, high-purity polycrystalline silicon is dissolved and doped into a silicon crystal seed crystal, then the silicon crystal seed crystal is slowly pulled out to form cylindrical monocrystalline silicon, and a silicon crystal rod is ground, polished and sliced to form a silicon wafer, namely the wafer.

Need cut process such as polishing at the in-process of wafer processing, at the in-process that the cutting was polished, the surface of wafer can adhere to a large amount of stains, consequently need wash the scrubbing to the surface of wafer after processing is accomplished, and need carry out the drying after wasing in addition, present drying mode adopts the drying-machine to carry out the drying, the drying efficiency of this kind of mode is lower, because lack the structure of adjusting the wafer position at dry in-process, lead to the stoving angle single, the edge that makes the wafer easily produces water stain and remains, and then influences subsequent processing.

Based on this, the utility model designs a spin dryer for wafer to solve above-mentioned problem.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a spin dryer for wafer to solve the problem that proposes in the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme: a spin dryer for wafers comprises a shell, wherein an inner cylinder is fixedly mounted on the inner wall of the shell, and a discharging tool is rotatably connected inside the inner cylinder;

the bottom of the inner cavity of the shell is provided with a driving mechanism, and the left side of the inner cavity of the shell is provided with a drying mechanism;

the bottom of the inner cylinder is communicated with a drain pipe, and the bottom of the drain pipe penetrates through the lower portion of the shell.

Preferably, the discharging tool comprises an outer cover, a rotating rod is fixedly mounted on the back of the outer cover, the back of the rotating rod penetrates through the outer portion of the inner barrel, the back of the rotating rod is rotatably connected with the inner wall of the shell, the front of the outer cover penetrates through the outer portion of the shell, the surface of the outer cover is rotatably connected with the inner wall of the shell, an inner container is inserted into the front of the outer cover, and a discharging groove is formed in the front of the inner container.

Preferably, actuating mechanism includes the motor, motor fixed mounting is in the bottom of shell inner chamber, the output shaft fixed mounting of motor has the action wheel, the surface of action wheel is around being equipped with the belt, the action wheel is connected with from the driving wheel through belt transmission, from the surface of driving wheel fixed mounting at the bull stick.

Preferably, the front surface of the outer cover is in threaded connection with a blocking cover, and the blocking cover is blocked on the front surface of the discharging groove.

Preferably, stoving mechanism includes the heat insulation box, heat insulation box fixed mounting is in the left side of shell inner chamber, the inside fixed mounting of heat insulation box has the heat exchange tube, the equal fixed mounting in position has electric heater around the inner chamber of heat insulation box, the one end intercommunication of heat exchange tube has the conveyer pipe, the other end intercommunication of conveyer pipe has the gas spray board, the inside of inner tube is extended to the bottom of gas spray board, the left side fixed mounting of shell inner chamber has the air exhauster, the exhaust end of air exhauster and the other end intercommunication of heat exchange tube.

Preferably, the heat exchange tube is arranged in a snake shape, the number of the electric heaters is two, and the two electric heaters are distributed at the front and rear positions of the heat exchange tube.

Compared with the prior art, the beneficial effects of the utility model are that: the utility model discloses put the wafer work piece in the inside storing trough of inner bag, and fix the inner bag in the dustcoat through keeping off the lid, when actuating mechanism drives dustcoat pivoted, the inner bag also can follow the rotation in step, fully throw away the moisture on the wafer through the effect of centrifugal force, and at the in-process of throwing away water, stoving mechanism can be continuous sprays high-temperature gas to inner bag department, be used for further accelerating the evaporation of wafer surface moisture, and because the inner bag is rotatory dress, consequently, gas can carry out the drying to any position of wafer, and then avoid producing the water stain residual phenomenon, consequently, be worth promoting very much.

Through the setting of keeping off the lid, can carry out the shutoff to the inside material of inner bag, prevent that the material from dropping at rotatory in-process, keep off the lid and be detachable design moreover, for taking and installing of inner bag provides convenience, can increase gaseous flow path through the heat exchange tube for snakelike setting, and then promote the residence time of gas in the pipeline, make electric heater can fully heat gas, electric heater in the device is provided with two moreover, can further promote gaseous heating efficiency.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a left side sectional view of the heat insulation box of the present invention;

FIG. 3 is a left side sectional view of the housing of the present invention;

FIG. 4 is a left side sectional view of the outer cover and the inner container of the present invention;

fig. 5 is a perspective view of the inner container of the present invention.

In the drawings, the components represented by the respective reference numerals are listed below:

1. a housing; 2. an inner barrel; 3. a material discharging tool; 31. a housing; 32. a rotating rod; 33. an inner container; 4. a drive mechanism; 41. a motor; 42. a driving wheel; 43. a driven wheel; 5. a drying mechanism; 51. a heat insulation box; 52. a heat exchange pipe; 53. an electric heater; 54. a delivery pipe; 55. an air jet plate; 56. an air extractor; 6. and (7) blocking the cover.

Detailed Description

The technical solution in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, but not all embodiments, and all other embodiments obtained by a person of ordinary skill in the art without creative work belong to the protection scope of the present invention based on the embodiments of the present invention.

Example one

Referring to the drawings, the utility model provides a technical scheme: a spin dryer for wafers comprises a shell 1, wherein an inner cylinder 2 is fixedly arranged on the inner wall of the shell 1, and a discharging tool 3 is rotatably connected inside the inner cylinder 2;

the bottom of the inner cavity of the shell 1 is provided with a driving mechanism 4, and the left side of the inner cavity of the shell 1 is provided with a drying mechanism 5;

the bottom of the inner cylinder 2 is communicated with a drain pipe, and the bottom of the drain pipe penetrates below the shell 1.

Specifically, the emptying tool 3 comprises an outer cover 31, a rotating rod 32 is fixedly mounted on the back of the outer cover 31, the back of the rotating rod 32 penetrates through the outer part of the inner barrel 2, the back of the rotating rod 32 is rotatably connected with the inner wall of the shell 1, the front of the outer cover 31 penetrates through the outer part of the shell 1, the surface of the outer cover 31 is rotatably connected with the inner wall of the shell 1, an inner container 33 is inserted into the front of the outer cover 31, a emptying groove is formed in the front of the inner container 33, firstly, a worker fills a wafer in the emptying groove, the inner container 33 is integrally inserted into the outer cover 31, finally, a blocking cover 6 rotates in front of the outer cover 31, and the blocking cover 6 is fully fastened, as the surfaces of the inner container 33 and the outer cover 31 are both in a net shape, in the high-speed rotation process, water stains on the surface of the wafer can be fully thrown away, and hot air sprayed by a drying mechanism 5 can be blown onto the surface of the wafer, so that moisture evaporation is accelerated.

Specifically, actuating mechanism 4 includes motor 41, motor 41 fixed mounting is in the bottom of 1 inner chamber of shell, motor 41's output shaft fixed mounting has action wheel 42, action wheel 42's surface is around being equipped with the belt, action wheel 42 is connected with from driving wheel 43 through belt transmission, from driving wheel 43 fixed mounting on the surface of bull stick 32, motor 41's output shaft drives action wheel 42 rotatory, action wheel 42 drives from driving wheel 43 rotatory through the belt, it is rotatory to drive bull stick 32 from driving wheel 43, it is rotatory to drive dustcoat 31 and inner bag 33 through bull stick 32, actuating mechanism 4 can provide power for the rotation of dustcoat 31, it is high-speed rotatory to make it drive the wafer, under the effect of centrifugal force, the water stain on wafer surface can be thrown away, and then promote drying efficiency, and can avoid the water stain under the wafer rotation state to remain.

Specifically, the drying mechanism 5 includes a heat insulation box 51, the heat insulation box 51 is fixedly installed at the left side of the inner cavity of the casing 1, a heat exchange pipe 52 is fixedly installed inside the heat insulation box 51, electric heaters 53 are fixedly installed at the front and rear positions of the inner cavity of the heat insulation box 51, one end of the heat exchange pipe 52 is communicated with a delivery pipe 54, the other end of the delivery pipe 54 is communicated with an air injection plate 55, the bottom of the air injection plate 55 extends into the inner cylinder 2, an air extractor 56 is fixedly installed at the left side of the inner cavity of the casing 1, the exhaust end of the air extractor 56 is communicated with the other end of the heat exchange pipe 52, the air extractor 56 extracts outside air and discharges the air into the heat exchange pipe 52, the electric heaters 53 can sufficiently heat the air in the heat exchange pipe 52, the heated air enters the air injection plate 55 through the delivery pipe 54 and uniformly sprays hot air on the surface of the outer cover 31 through the air injection plate 55, moisture on the wafer surface inside the inner container 33 is sufficiently dried through the action of high-temperature air flow, so as to achieve the purpose of quick drying.

Example two

The structure of this embodiment is the same basically as embodiment one, and the difference lies in, and the front threaded connection of dustcoat 31 has fender cover 6, and the shutoff of fender cover 6 is in the front of storage tank, through the setting of fender cover 6, can carry out the shutoff to the inside material of inner bag 33, prevents that the material from dropping at rotatory in-process, keeps off cover 6 in addition for detachable design, provides convenience for taking and installing of inner bag 33.

EXAMPLE III

The structure of the present embodiment is substantially the same as that of the first embodiment, except that the heat exchange tube 52 is in a serpentine shape, the number of the electric heaters 53 is two, the two electric heaters 53 are distributed at the front and rear positions of the heat exchange tube 52, the flow path of the gas can be increased by the serpentine shape of the heat exchange tube 52, and the residence time of the gas in the pipeline is further increased, so that the electric heaters 53 can sufficiently heat the gas, and the gas heating efficiency can be further increased by the two electric heaters 53 in the device.

In the description herein, references to the description of "one embodiment," "an example," "a specific example," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The preferred embodiments of the present invention disclosed above are intended to be illustrative only. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise forms disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and its practical applications, thereby enabling others skilled in the art to best understand the invention and its practical application. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A spin dryer for wafers, comprising a housing (1), characterized in that: an inner cylinder (2) is fixedly mounted on the inner wall of the shell (1), and a discharging tool (3) is rotatably connected inside the inner cylinder (2);

the bottom of the inner cavity of the shell (1) is provided with a driving mechanism (4), and the left side of the inner cavity of the shell (1) is provided with a drying mechanism (5);

the bottom of the inner cylinder (2) is communicated with a drain pipe, and the bottom of the drain pipe penetrates below the shell (1).

2. The spinner for wafers as claimed in claim 1, wherein: blowing frock (3) are including dustcoat (31), the back fixed mounting of dustcoat (31) has bull stick (32), the outside of inner tube (2) is run through to the back of bull stick (32), the back of bull stick (32) rotates with the inner wall of shell (1) to be connected, the outside of shell (1) is run through to the front of dustcoat (31), the surface of dustcoat (31) rotates with the inner wall of shell (1) to be connected, inner bag (33) have been inserted in the front of dustcoat (31), the storing trough has been seted up in the front of inner bag (33).

3. The spinner for wafers as claimed in claim 2, wherein: actuating mechanism (4) include motor (41), motor (41) fixed mounting is in the bottom of shell (1) inner chamber, the output shaft fixed mounting of motor (41) has action wheel (42), the surface of action wheel (42) is around being equipped with the belt, action wheel (42) are connected with from driving wheel (43) through belt transmission, from the surface of driving wheel (43) fixed mounting at bull stick (32).

4. The spinner for wafers as claimed in claim 2, wherein: the front face of the outer cover (31) is in threaded connection with a blocking cover (6), and the blocking cover (6) is blocked on the front face of the discharging groove.

5. The spinner for wafers as claimed in claim 1, wherein: drying mechanism (5) are including hot box (51), hot box (51) fixed mounting is in the left side of shell (1) inner chamber, the inside fixed mounting of hot box (51) has heat exchange tube (52), the equal fixed mounting in front and back position of the inner chamber of hot box (51) has electric heater (53), the one end intercommunication of heat exchange tube (52) has conveyer pipe (54), the other end intercommunication of conveyer pipe (54) has gas injection board (55), the bottom of gas injection board (55) extends to the inside of inner tube (2), the left side fixed mounting of shell (1) inner chamber has aspirator (56), the exhaust end of aspirator (56) and the other end intercommunication of heat exchange tube (52).

6. The spinner for wafers as claimed in claim 5, wherein: the heat exchange tube (52) is arranged in a snake shape, the number of the electric heaters (53) is two, and the two electric heaters (53) are distributed at the front and back positions of the heat exchange tube (52).