CN217009185U

CN217009185U - Photoetching alignment mark pattern structure and semiconductor wafer

Info

Publication number: CN217009185U
Application number: CN202220532836.6U
Authority: CN
Inventors: 张曼; 黄浩玮; 吴秋果
Original assignee: Nexchip Semiconductor Corp
Current assignee: Nexchip Semiconductor Corp
Priority date: 2022-03-11
Filing date: 2022-03-11
Publication date: 2022-07-19
Anticipated expiration: 2032-03-11

Abstract

The utility model provides a photoetching alignment mark pattern structure, which comprises: a plurality of outer alignment mark grooves arranged on the surface of the wafer; the inner alignment mark grooves are formed in the surface of the wafer; the outer alignment mark groove comprises a plurality of connecting grooves which are connected in sequence, is of a centrosymmetric structure and is in a shape that the middle part protrudes outwards; the inner alignment mark groove comprises a plurality of communicated grooves which are connected in sequence, the outer alignment mark groove is of a central symmetrical structure, and the inner alignment mark groove is of a shape with a middle part protruding outwards. The photoetching alignment mark pattern structure and the semiconductor wafer can effectively reduce the profile distortion generated in the epitaxial growth process.

Description

Photoetching alignment mark pattern structure and semiconductor wafer

Technical Field

The utility model relates to the technical field of semiconductor epitaxial growth, in particular to a photoetching alignment mark pattern structure and a semiconductor wafer.

Background

The photolithography alignment mark pattern structure is used to define the position and direction between the mask and the wafer, and plays a key role in the manufacturing process of the wafer. In the preparation of high-voltage or high-power devices, an epitaxial layer growth technology is generally adopted to meet the requirement, and in the epitaxial growth process, the temperature or the epitaxial growth rate can influence the photoetching alignment mark structure to generate deformation and profile distortion, so that a distorted profile is generated. When the photoetching alignment mark structure has a distorted contour, the alignment precision can be seriously influenced, thereby influencing the quality of products

SUMMERY OF THE UTILITY MODEL

In view of the above-mentioned shortcomings of the prior art, it is an object of the present invention to provide a lithographic alignment mark pattern structure and a semiconductor wafer, which can effectively reduce the profile distortion generated during the epitaxial growth process, thereby improving the alignment accuracy.

To achieve the above and other related objects, the present invention provides a lithographic alignment mark pattern structure, comprising:

a plurality of outer alignment mark grooves formed on the wafer; and

a plurality of inner alignment mark slots disposed on the wafer;

the outer alignment mark groove comprises a plurality of connecting grooves which are connected in sequence, is of a centrosymmetric structure and is in a shape that the middle part protrudes outwards;

the inner alignment mark groove comprises a plurality of communicated grooves which are sequentially connected, the inner alignment mark groove is of a central symmetrical structure, and the outer alignment mark groove is of a shape with the middle part protruding outwards.

In an embodiment of the present invention, the outer alignment mark groove includes a first outer groove, a third outer groove, a second outer groove, and a fourth outer groove, which are sequentially connected.

In an embodiment of the utility model, the third outer groove has a convex structure.

In an embodiment of the utility model, the fourth outer groove has a convex structure.

In an embodiment of the utility model, the inner alignment mark slot includes a first inner slot, a third inner slot, a second inner slot and a fourth inner slot connected in sequence.

In an embodiment of the utility model, the third inner groove has a convex structure.

In an embodiment of the utility model, the fourth inner groove has a convex structure.

In an embodiment of the present invention, the plurality of inner alignment mark slots are arranged equidistantly.

In an embodiment of the present invention, a distance between adjacent outer alignment mark grooves and adjacent inner alignment mark grooves is equal to a distance between two adjacent inner alignment mark grooves.

The present invention also provides a semiconductor wafer comprising:

a wafer;

a photoetching alignment mark pattern structure arranged on the wafer; and

the epitaxial layer covers the wafer and the photoetching alignment mark pattern structure;

wherein the photoetching alignment mark pattern structure comprises

A plurality of outer alignment mark grooves formed on the wafer; and

a plurality of inner alignment mark slots disposed on the wafer;

As described above, the present invention provides a lithographic alignment mark pattern structure and a semiconductor wafer, in which an epitaxial layer is uniformly covered in the lithographic alignment mark pattern structure during an epitaxial growth process, so that profile distortion generated during the epitaxial growth process can be effectively reduced, thereby improving alignment accuracy and improving product quality to a certain extent.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic structural diagram of a lithographic alignment mark pattern structure according to the present invention.

FIG. 2 is a schematic view of another perspective structure of a lithographic alignment mark pattern according to the present invention.

Fig. 3 is shown in a front view in fig. 2.

Fig. 4 is an enlarged schematic view of a portion a of fig. 3.

Element number description:

10. a wafer;

20. an outer alignment mark slot; 21. a first outer tank; 22. a second outer tank; 23. a third outer tank; 231. a first outer L-shaped slot; 232. a second outer L-shaped slot; 233. a first outer connecting groove; 24. a fourth outer tank; 241. a third outer L-shaped slot; 242. a fourth outer L-shaped slot; 243. a second outer connecting groove;

30. an inner alignment mark slot; 31. a first inner tank; 32. a second inner tank; 33. a third inner tank; 331. a first inner L-shaped slot; 332. a second inner L-shaped slot; 333. a first inner connection trench; 34. a fourth inner tank; 341. a third inner L-shaped slot; 342. a fourth inner L-shaped slot; 343. the second interconnection trench.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. The embodiments of the present invention, and all other embodiments obtained by those skilled in the art without any inventive step, are within the scope of the present invention.

Please refer to fig. 1-4. It should be noted that the drawings provided in the present embodiment are only for illustrating the basic idea of the present invention, and the components related to the present invention are only shown in the drawings rather than drawn according to the number, shape and size of the components in actual implementation, and the type, quantity and proportion of the components in actual implementation may be changed freely, and the layout of the components may be more complicated.

Referring to fig. 1 and 2, the present invention provides a lithographic alignment mark pattern structure, which can be applied to a wafer. Wafer refers to a wafer used for manufacturing semiconductor circuits, and the material of the wafer may be silicon or other semiconductor materials. The photolithographic alignment mark pattern structure is a visible pattern structure which is arranged on the mask plate and the wafer and is used for determining the position and the direction of the mask plate and the wafer. The lithographic alignment mark pattern structure may include a plurality of outer alignment mark slots 20 and a plurality of inner alignment mark slots 30. Wherein the number of outer alignment mark slots 20 may be, for example, two, and the number of inner alignment mark slots 30 may be, for example, four. The outer alignment mark slot 20 may be formed in the wafer 10, and the inner alignment mark slot 30 may be formed in the wafer 10.

Referring to fig. 1 and 2, in one embodiment of the present invention, the distance between the adjacent outer alignment mark grooves 20 and the inner alignment mark grooves 30 is not limited, for example, the distance between the two grooves may be in a range of 1-5 um. Specifically, the distance between the adjacent outer alignment mark slot 20 and the inner alignment mark slot 30 may be, for example, 2um, or may also be, for example, 3um, or may also be, for example, 4 um. In this embodiment, the distance between adjacent outer alignment mark slots 20 and inner alignment mark slots 30 is optionally, for example, 3 um. The distance between two adjacent inner alignment mark slots 30 may not be limited, for example, the distance between the two inner alignment mark slots may be in the range of 1-5 um. Specifically, the distance between two adjacent inner alignment mark slots 30 may be, for example, 2um, or, for example, 3um, or, for example, 4 um. In this embodiment, the distance between two adjacent inner alignment mark slots 30 is optionally, for example, 3 um.

Referring to fig. 3, in one embodiment of the present invention, the outer alignment mark groove 20 has a central symmetrical structure, and the outer alignment mark groove 20 has a shape with a middle portion protruding outwards. Specifically, the outer alignment mark groove 20 may include four connecting grooves connected in sequence, and the four connecting grooves may be a first outer groove 21, a third outer groove 23, a second outer groove 22, and a fourth outer groove 24 in sequence. The third outer groove 23 may be a convex groove, and the fourth outer groove 24 may also be a convex groove. The first outer groove 21 and the second outer groove 22 may correspond to each other, and the third outer groove 23 and the fourth outer groove 24 may correspond to each other, so that the corresponding two coupling grooves of the outer alignment mark groove 20 protrude outward with respect to the whole body, so that the whole body of the outer alignment mark groove 20 takes a shape in which the middle portion protrudes outward. Therefore, the outer alignment mark groove 20 is set to be in the shape that the middle part protrudes outwards, so that in the epitaxial growth process, the epitaxial layer can be uniformly covered in the outer alignment mark groove 20, the profile distortion generated in the epitaxial growth process can be effectively reduced, and the product quality can be improved to a certain extent. In the embodiment, the third outer groove 23 and the fourth outer groove 24 are both convex grooves, and in other embodiments, the third outer groove 23 may be a convex groove, the fourth outer groove 24 may be a strip-shaped groove, or the third outer groove 23 may be a strip-shaped groove and the fourth outer groove 24 may be a convex groove, as long as at least one of the third outer groove 23 and the fourth outer groove 24 is ensured to be a convex groove.

Referring to fig. 4, in an embodiment of the present invention, the first outer groove 21 may be a strip groove. The length of the first outer groove 21 is not limited, for example, in the present embodiment, the length of the first outer groove 21 may be in a range of 16 to 20 um. Specifically, the length of the first outer groove 21 may be, for example, 17um, 18um, or 19 um. In this embodiment, the length of the first outer groove 21 may be, for example, 18 um. The width of the first outer groove 21 is not limited, for example, in the present embodiment, the width of the first outer groove 21 may be in a range of 0.5 to 2 um. Specifically, the width of the first outer groove 21 may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the first outer groove 21 may be, for example, 1 um. The depth of the first outer groove 21 is not limited, for example, in the present embodiment, the depth of the first outer groove 21 may be in the range of 0.5-1 um. Specifically, the depth of the first outer groove 21 may be, for example, 0.5um, or, for example, 0.7um, or, for example, 1 um. In the present embodiment, optionally, the width of the first outer groove 21 may be, for example, 0.7 um. The specific size of the length, width and depth of the first outer groove 21 may not be limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, the second outer groove 22 may also be, for example, a strip-shaped groove, and the second outer groove 22 may correspond to the first outer groove 21, so that the second outer groove 22 and the first outer groove 21 may have the same structure or different structures. The length of the second outer slot 22 is not limited, for example, in the present embodiment, the length of the second outer slot 22 may be in the range of 16-20 um. The length of the specific second outer slot 22 may be, for example, 17um, 18um, or 19 um. In this embodiment, the length of the second outer slot 22 may be, for example, 18um, optionally. The width of the second outer slot 22 is not limited, for example, in the present embodiment, the width of the second outer slot 22 may be in the range of 0.5 to 2 um. Specifically, the width of the second outer slot 22 may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the second outer slot 22 may be, for example, 1 um. The depth of the second outer groove 22 is not limited, for example, in the present embodiment, the depth of the second outer groove 22 may be in the range of 0.5-1 um. Specifically, the depth of the second outer groove 22 may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, the width of the second outer slot 22 may be, for example, 0.7 um. The specific size of the length, width and depth of the second outer groove 22 may not be limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, the third outer groove 23 may be a convex groove, and the third outer groove 23 may include a first outer L-shaped groove 231, a first outer connecting groove 233, and a second outer L-shaped groove 232 which are connected in sequence. Wherein the first outer L-shaped groove 231 may communicate with the first outer groove 21, and the second outer L-shaped groove 232 may communicate with the second outer groove 22, so that one end of the first outer groove 21 may communicate with one end of the second outer groove 22 through the third outer groove 23.

Referring to fig. 4, in an embodiment of the utility model, the first outer L-shaped groove 231 may be divided into a first outer bar-shaped groove and a second outer bar-shaped groove. Wherein, the length of the first outer strip-shaped groove is longer than that of the second outer strip-shaped groove, so that one end of the first outer strip-shaped groove can be communicated with one end of the second outer strip-shaped groove to form a first outer L-shaped groove 231. The length of the first outer strip-shaped groove may not be limited, for example, in the present embodiment, the length of the first outer strip-shaped groove may be in the range of, for example, 6 to 8 um. Specifically, the length of the first outer strip-shaped groove may be, for example, 6um, 7um, or 8 um. In this embodiment, optionally, the length of the first outer strip-shaped groove may be, for example, 7 um. The width of the first outer strip-shaped groove is not limited, for example, in the embodiment, the width of the first outer strip-shaped groove can be in the range of 0.5-2 um. Specifically, the width of the first outer strip-shaped groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the first outer strip-shaped groove may be, for example, 1 um. The depth of the first outer strip-shaped groove is not limited, for example, in the present embodiment, the depth of the first outer strip-shaped groove may be in the range of 0.5-1 um. Specifically, the depth of the first outer stripe-shaped groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the first outer strip-shaped groove may be, for example, 0.7 um. The specific size of the length, width and depth of the first outer strip-shaped groove can be unlimited as long as the actual requirement can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the second outer groove is not limited, and specifically, the length of the second outer groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the second outer stripe groove may be, for example, 0.5um, or may be, for example, 1um, or may be, for example, 1.5 um. In this embodiment, optionally, the length of the second outer stripe groove may be, for example, 1 um. The width of the second outer strip-shaped groove is not limited, for example, in this embodiment, the width of the second outer strip-shaped groove can also be in the range of 0.5-1.5 um. Specifically, the width of the second outer stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the second outer stripe groove may be, for example, 1 um. The depth of the second outer stripe groove is not limited, for example, in this embodiment, the depth of the second outer stripe groove may be, for example, in a range of 0.5 to 1 um. Specifically, the depth of the second outer stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the second outer stripe groove may be, for example, 0.7 um. The specific size of the length, width and depth of the second outer strip-shaped groove can be unlimited as long as the actual requirement can be met.

Referring to fig. 4, in an embodiment of the utility model, the second outer L-shaped groove 232 may be divided into a third outer strip-shaped groove and a fourth outer strip-shaped groove. Wherein, the length of the third outer strip-shaped groove is longer than that of the fourth outer strip-shaped groove, so that one end of the third outer strip-shaped groove can be communicated with one end of the fourth outer strip-shaped groove to form a second outer L-shaped groove 232. Thus, the structure of the second outer L-shaped groove 232 may or may not be the same as the structure of the third outer L-shaped groove 241. The length of the third outer strip-shaped groove may not be limited, for example, in the present embodiment, the length of the third outer strip-shaped groove may be in the range of, for example, 6 to 8 um. Specifically, the length of the third outer strip-shaped groove may be, for example, 6um, 7um, or 8 um. In this embodiment, optionally, the length of the third outer strip-shaped groove may be, for example, 7 um. The width of the third outer strip-shaped groove is not limited, for example, in the present embodiment, the width of the third outer strip-shaped groove may be in the range of 0.5-2 um. Specifically, the width of the third outer stripe-shaped groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the third outer strip-shaped groove may be, for example, 1 um. The depth of the third outer strip-shaped groove is not limited, for example, in the present embodiment, the depth of the third outer strip-shaped groove may be in the range of 0.5-1 um. Specifically, the depth of the third outer stripe-shaped groove may be, for example, 0.5um, or, for example, 0.7um, or, for example, 1 um. In this embodiment, optionally, the width of the third outer strip-shaped groove may be, for example, 0.7 um. The length, width and depth of the third outer strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the fourth outer stripe groove may not be limited, and specifically, the length of the fourth outer stripe groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the fourth outer stripe groove may be, for example, 0.5um, or may be, for example, 1um, or may be, for example, 1.5 um. In this embodiment, optionally, the length of the fourth outer stripe groove may be, for example, 1 um. The width of the fourth outer stripe groove is not limited, for example, in this embodiment, the width of the fourth outer stripe groove can be in the range of 0.5-1.5 um. Specifically, the width of the fourth outer stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the fourth outer stripe groove may be, for example, 1 um. The depth of the fourth outer stripe groove is not limited, for example, in the present embodiment, the depth of the fourth outer stripe groove may be in a range of 0.5-1 um. Specifically, the depth of the fourth outer stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the fourth outer stripe groove may be, for example, 0.7 um. The specific size of the length, the width and the depth of the fourth outer strip-shaped groove can be unlimited as long as the actual requirement can be met.

Referring to fig. 4, in an embodiment of the present invention, one end of the first outer connecting groove 233 may communicate with one end of the first outer bar-shaped groove, and the other end of the first outer connecting groove 233 may communicate with one end of the third outer bar-shaped groove, so that a convex-shaped groove may be formed by the first outer L-shaped groove 231, the first outer connecting groove 233, and the second outer L-shaped groove 232 which are connected in sequence. In the present embodiment, the length of the first outer connecting groove 233 may not be limited, and specifically, the length of the first outer connecting groove 233 may be in a range of, for example, 3 to 5 um. For example, the length of the first outer connecting trench 233 may be, for example, 3um, or may be, for example, 4um, or may be, for example, 5 um. In the present embodiment, the length of the first outer connecting groove 233 may be, for example, 4um, optionally. The width of the first outer connecting trench 233 is not limited, for example, in the embodiment, the width of the first outer connecting trench 233 may be in the range of 0.5 to 1.5 um. Specifically, the width of the first outer connecting groove 233 may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In the present embodiment, optionally, the width of the first outer connection groove 233 may be, for example, 1 um. The depth of the first outer connecting groove 233 may not be limited, for example, in the present embodiment, the depth of the first outer connecting groove 233 may be in a range of 0.5 to 1um, for example. Specifically, the depth of the first outer connecting groove 233 may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In the present embodiment, optionally, the width of the first outer connection trench 233 may be, for example, 0.7 um. The specific size of the length, width and depth of the first outer connecting groove 233 may not be limited as long as the actual requirements can be satisfied.

Referring to fig. 4, in an embodiment of the present invention, the fourth outer groove 24 may be a convex groove, and the fourth outer groove 24 may include a third outer L-shaped groove 241, a second outer connecting groove 243 and a fourth outer L-shaped groove 242 which are connected in sequence. Wherein the third outer L-shaped groove 241 may communicate with the first outer groove 21 and the fourth outer L-shaped groove 242 may communicate with the second outer groove 22. So that one end of the first outer groove 21 can communicate with one end of the second outer groove 22 through the third outer groove 23. The fourth outer tub 24 may have the same structure as the third outer tub 23 or may have a different structure.

Referring to fig. 4, in an embodiment of the utility model, the third outer L-shaped groove 241 may be divided into a fifth outer bar-shaped groove and a sixth outer bar-shaped groove. Wherein the length of the fifth outer bar-shaped groove is longer than that of the sixth outer bar-shaped groove, so that one end of the fifth outer bar-shaped groove can communicate with one end of the sixth outer bar-shaped groove to form a third outer L-shaped groove 241. The length of the fifth outer strip-shaped groove may not be limited, for example, in the present embodiment, the length of the fifth outer strip-shaped groove may be in a range of, for example, 6 to 8 um. Specifically, the length of the fifth outer strip-shaped groove may be, for example, 6um, 7um, or 8 um. In this embodiment, optionally, the length of the fifth outer strip-shaped groove may be, for example, 7 um. The width of the fifth outer strip-shaped groove is not limited, for example, in the present embodiment, the width of the fifth outer strip-shaped groove may be in the range of 0.5 to 2 um. Specifically, the width of the fifth outer stripe-shaped groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the fifth outer strip-shaped groove may be, for example, 1 um. The depth of the fifth outer stripe-shaped groove is not limited, for example, in the present embodiment, the depth of the fifth outer stripe-shaped groove may be in a range of 0.5-1 um, for example. Specifically, the depth of the fifth outer stripe-shaped groove may be, for example, 0.5um, or, for example, 0.7um, or, for example, 1 um. In this embodiment, optionally, the width of the fifth outer strip-shaped groove may be, for example, 0.7 um. The length, width and depth of the fifth outer strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, the length of the sixth outer strip-shaped groove may not be limited, and specifically, the length of the sixth outer strip-shaped groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the sixth outer strip-shaped groove may be, for example, 0.5um, or may be, for example, 1um, or may be, for example, 1.5 um. In this embodiment, optionally, the length of the sixth outer strip-shaped groove may be, for example, 1 um. The width of the sixth outer strip-shaped groove is not limited, for example, in this embodiment, the width of the sixth outer strip-shaped groove may also be in the range of 0.5-1.5 um. Specifically, the width of the sixth outer stripe-shaped groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the sixth outer strip-shaped groove may be, for example, 1 um. The depth of the sixth outer strip-shaped groove is not limited, for example, in the present embodiment, the depth of the sixth outer strip-shaped groove may be in a range of 0.5-1 um. Specifically, the depth of the sixth outer stripe-shaped groove may be, for example, 0.5um, or, for example, 0.7um, or, for example, 1 um. In this embodiment, optionally, the width of the sixth outer strip-shaped groove may be, for example, 0.7 um. The length, width and depth of the sixth outer strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the fourth outer L-shaped groove 242 may be divided into a seventh outer bar groove and an eighth outer bar groove. Wherein the length of the seventh outer strip-shaped groove is longer than that of the eighth outer strip-shaped groove, so that one end of the seventh outer strip-shaped groove can communicate with one end of the eighth outer strip-shaped groove to form a fourth outer L-shaped groove 242. Thus, the structure of the fourth outer L-shaped groove 242 may or may not be the same as the structure of the third outer L-shaped groove 241. The length of the seventh outer strip-shaped groove is not limited, for example, in the present embodiment, the length of the seventh outer strip-shaped groove may be in the range of 6-8 um. Specifically, the length of the seventh outer strip-shaped groove may be, for example, 6um, 7um, or 8 um. In this embodiment, optionally, the length of the seventh outer strip-shaped groove may be, for example, 7 um. The width of the seventh outer strip-shaped groove is not limited, for example, in the embodiment, the width of the seventh outer strip-shaped groove can be in the range of 0.5-2 um. Specifically, the width of the seventh outer stripe-shaped groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the seventh outer strip-shaped groove may be, for example, 1 um. The depth of the seventh outer stripe-shaped groove is not limited, for example, in the present embodiment, the depth of the seventh outer stripe-shaped groove may be in the range of 0.5-1 um. Specifically, the depth of the seventh outer stripe-shaped groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the seventh outer strip-shaped groove may be, for example, 0.7 um. The length, width and depth of the seventh outer strip-shaped groove may be any length, width or depth.

Referring to fig. 4, in an embodiment of the present invention, the length of the eighth outer strip-shaped groove may not be limited, and specifically, the length of the eighth outer strip-shaped groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the eighth outer strip-shaped groove may be, for example, 0.5um, or may be, for example, 1um, or may be, for example, 1.5 um. In this embodiment, optionally, the length of the eighth outer strip-shaped groove may be, for example, 1 um. The width of the eighth outer strip-shaped groove is not limited, for example, in the embodiment, the width of the eighth outer strip-shaped groove can also be in the range of 0.5-1.5 um. Specifically, the width of the eighth outer stripe-shaped groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the eighth outer strip-shaped groove may be, for example, 1 um. The depth of the eighth outer stripe-shaped groove is not limited, for example, in the present embodiment, the depth of the eighth outer stripe-shaped groove may be in a range of 0.5 to 1um, for example. Specifically, the depth of the eighth outer stripe-shaped groove may be, for example, 0.5um, or, for example, 0.7um, or, for example, 1 um. In this embodiment, optionally, the width of the eighth outer strip-shaped groove may be, for example, 0.7 um. The length, width and depth of the eighth outer strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, one end of the second outer connecting groove 243 may communicate with one end of the fifth outer bar-shaped groove, and the other end of the second outer connecting groove 243 may communicate with one end of the seventh outer bar-shaped groove, so that a convex-shaped groove may be formed by the third outer L-shaped groove 241, the second outer connecting groove 243, and the fourth outer L-shaped groove 242 which are connected in sequence. In this embodiment, the length of the second outer connecting groove 243 may not be limited, and specifically, the length of the second outer connecting groove 243 may be, for example, in a range of 3 to 5 um. For example, the length of the second outer connecting groove 243 may be, for example, 3um, 4um, or 5 um. In this embodiment, the length of the second outer connecting groove 243 may be, for example, 4 um. The width of the second outer connecting groove 243 is not limited, for example, in the embodiment, the width of the second outer connecting groove 243 may also be in the range of 0.5-1.5 um. Specifically, the width of the second outer connecting groove 243 may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the second outer connecting groove 243 may be, for example, 1 um. The depth of the second outer connecting groove 243 is not limited, for example, in the present embodiment, the depth of the second outer connecting groove 243 may be in a range of 0.5 to 1 um. Specifically, the depth of the second outer connecting groove 243 may be, for example, 0.5um, or may be, for example, 0.7um, or may be, for example, 1 um. In this embodiment, optionally, the width of the second outer connecting groove 243 may be, for example, 0.7 um. The specific size of the length, width and depth of the second outer connecting groove 243 may not be limited as long as the practical requirements can be satisfied.

Referring to fig. 4, in an embodiment of the present invention, the inner alignment mark groove 30 is a central symmetrical structure, and the inner alignment mark groove 30 is a shape with a middle portion protruding outward. Specifically, the inner alignment mark slot 30 may include four communication slots connected in sequence, and the four communication slots may be a first inner slot 31, a second inner slot 32, a third inner slot 33, and a fourth inner slot 34 in sequence. The third inner groove 33 may be, for example, a convex groove, and the fourth inner groove 34 may be, for example, a convex groove. The first inner groove 31 and the second inner groove 32 may correspond to each other, and the third inner groove 33 and the fourth inner groove 34 may correspond to each other, so that the corresponding two communicating grooves of the inner alignment mark groove 30 protrude outward with respect to the whole, so that the whole of the inner alignment mark groove 30 takes a shape in which a middle portion protrudes outward. In this embodiment, the shape of the inner alignment mark slot 30 may be the same as the shape of the outer alignment mark slot 20, but the size is different, while in other embodiments, the shape of the inner alignment mark slot 30 may also be different from the shape of the outer alignment mark slot 20, and the specific shape of the inner alignment mark slot 30 may be set according to actual requirements. Therefore, the inner alignment mark groove 30 is designed to be in a shape that the middle part protrudes outwards, so that in the epitaxial growth process, the epitaxial layer can uniformly cover the inner alignment mark groove 30, the profile distortion generated in the epitaxial growth process can be effectively reduced, and the product quality can be improved to a certain extent. In an embodiment, the third inner groove 33 and the fourth inner groove 34 are both convex grooves, while in other embodiments, the third inner groove 33 may be, for example, a convex groove, the fourth inner groove 34 may be, for example, a strip groove, or the third inner groove 33 may be, for example, a strip groove, and the fourth inner groove 34 may be, for example, a convex groove, as long as at least one of the third inner groove 33 and the fourth inner groove 34 is guaranteed to be a convex groove.

Referring to fig. 4, in one embodiment of the present invention, the first inner groove 31 may be a strip-shaped groove, for example. The length of the first inner tank 31 is not limited, for example, in the embodiment, the length of the first inner tank 31 may be in a range of 14-18 um. Specifically, the length of the first inner tank 31 may be, for example, 15um, 16um, or 17 um. In this embodiment, the length of the first inner tank 31 may be, for example, 16 um. The width of the first inner tank 31 is not limited, for example, in the embodiment, the width of the first inner tank 31 may be in the range of 0.5-2 um. Specifically, the width of the first inner tank 31 may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the first inner tank 31 may be, for example, 1 um. The depth of the first inner tank 31 is not limited, and in this embodiment, the depth of the first inner tank 31 may be, for example, in the range of 0.5-1 um. Specifically, the depth of the first inner tank 31 may be, for example, 0.5um, or may be, for example, 0.7um, or may be, for example, 1 um. In the present embodiment, optionally, the width of the first inner tank 31 may be, for example, 0.7 um. The specific size of the length, width and depth of the first inner tank 31 may not be limited as long as the practical requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, the second inner tank 32 may also be a strip-shaped tank, and the second inner tank 32 may correspond to the first inner tank 31, so that the structures of the second inner tank 32 and the first inner tank 31 may be the same or different. The length of the second inner tank 32 is not limited, for example, in the embodiment, the length of the second inner tank 32 may be in the range of 14-18 um. The length of the second inner tank 32 may be, for example, 15um, 16um, or 17 um. In this embodiment, second inner tank 32 may optionally have a length of, for example, 16 um. The width of the second inner tank 32 is not limited, for example, in the embodiment, the width of the second inner tank 32 may be in the range of 0.5-2 um. Specifically, the width of the second inner tank 32 may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, the width of the second inner groove 32 may be, for example, 1 um. The depth of inner second tank 32 is not limited, for example, in the present embodiment, the depth of inner second tank 32 may be in the range of 0.5-1 um. Specifically, the depth of the second inner tank 32 may be, for example, 0.5um, or may be, for example, 0.7um, or may be, for example, 1 um. In this embodiment, the width of second inner tank 32 may be, for example, 0.7 um. The specific size of the length, width and depth of second inner tank 32 may not be limited as long as the practical requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the third inner groove 33 may be, for example, a convex groove, and the third inner groove 33 may include a first inner L-shaped groove 331, a first inner connecting groove 333, and a second inner L-shaped groove 332 connected in sequence. Wherein the first inner L-shaped slot 331 may communicate with the first inner slot 31 and the second inner L-shaped slot 332 may communicate with the second inner slot 32 such that an end of the first inner slot 31 may communicate with an end of the second inner slot 32 via the third inner slot 33.

Referring to fig. 4, in an embodiment of the utility model, the first inner L-shaped groove 331 may be divided into a first inner groove and a second inner groove. The length of the first inner strip-shaped groove is longer than that of the second inner strip-shaped groove, so that one end of the first inner strip-shaped groove is communicated with one end of the second inner strip-shaped groove to form a first inner L-shaped groove 331. The length of the first inner stripe groove is not limited, for example, in the embodiment, the length of the first inner stripe groove can be in the range of 5-7 um. Specifically, the length of the first inner stripe groove may be, for example, 5um, or may also be, for example, 6um, or may also be, for example, 7 um. In this embodiment, optionally, the length of the first inner stripe groove may be, for example, 6 um. The width of the first inner stripe groove is not limited, for example, in the embodiment, the width of the first inner stripe groove can be in the range of 0.5-2 um. Specifically, the width of the first inner stripe groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the first inner stripe groove may be, for example, 1 um. The depth of the first inner stripe groove is not limited, for example, in the embodiment, the depth of the first inner stripe groove can be in the range of 0.5-1 um. Specifically, the depth of the first inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the first inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the first inner strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the second inner stripe groove may not be limited, and specifically, the length of the second inner stripe groove may be in a range of, for example, 0.5 to 1.5 um. For example, the length of the second inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the length of the second inner stripe groove may be, for example, 1 um. The width of the second inner stripe groove is not limited, for example, in the embodiment, the width of the second inner stripe groove can be in the range of 0.5-1.5 um. Specifically, the width of the second inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the second inner stripe groove may be, for example, 1 um. The depth of the second inner stripe groove is not limited, for example, in the embodiment, the depth of the second inner stripe groove can be in the range of 0.5-1 um. Specifically, the depth of the second inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the second inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the second inner strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the second inner L-shaped groove 332 may be divided into a third inner groove and a fourth inner groove. The length of the third inner strip-shaped groove is longer than that of the fourth inner strip-shaped groove, so that one end of the third inner strip-shaped groove can be communicated with one end of the fourth inner strip-shaped groove to form a second inner L-shaped groove 332. Thus, the structure of the second inner L-shaped groove 332 may or may not be the same as the structure of the third inner L-shaped groove 241. The length of the third inner stripe groove is not limited, for example, in the embodiment, the length of the third inner stripe groove can be in the range of 5-7 um. Specifically, the length of the third inner stripe groove may be, for example, 5um, or may also be, for example, 6um, or may also be, for example, 7 um. In this embodiment, optionally, the length of the third inner stripe groove may be, for example, 6 um. The width of the third inner stripe groove is not limited, for example, in this embodiment, the width of the third inner stripe groove may be in a range of 0.5-2 um, for example. Specifically, the width of the third inner stripe groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the third inner stripe groove may be, for example, 1 um. The depth of the third inner stripe groove is not limited, for example, in the present embodiment, the depth of the third inner stripe groove may be in a range of 0.5-1 um. Specifically, the depth of the third inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the third inner stripe groove may be, for example, 0.7 um. The length, width and depth of the third inner strip-shaped groove can be not limited, so long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the fourth inner stripe groove may not be limited, and specifically, the length of the fourth inner stripe groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the fourth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the length of the fourth inner stripe groove may be, for example, 1 um. The width of the fourth inner stripe groove is not limited, for example, in the embodiment, the width of the fourth inner stripe groove can be in the range of 0.5-1.5 um. Specifically, the width of the fourth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the fourth inner stripe groove may be, for example, 1 um. The depth of the fourth inner stripe groove is not limited, for example, in the embodiment, the depth of the fourth inner stripe groove can be in the range of 0.5-1 um. Specifically, the depth of the fourth inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the fourth inner stripe groove may be, for example, 0.7 um. The length, width and depth of the fourth inner strip-shaped groove can be not limited, and the actual requirements can be met.

Referring to fig. 4, in an embodiment of the present invention, one end of the first inner connecting groove 333 may communicate with one end of the first inner groove, and the other end of the first inner connecting groove 333 may communicate with one end of the third inner groove, so that a convex groove may be formed by the first inner L-shaped groove 331, the first inner connecting groove 333, and the second inner L-shaped groove 332 connected in sequence. In the present embodiment, the length of the first inner connecting groove 333 is not limited, and specifically, the length of the first inner connecting groove 333 may be, for example, in a range of 3 to 5 um. For example, the length of the first inner connecting groove 333 may be, for example, 3um, 4um, or 5 um. In the present embodiment, the length of the first inner connecting groove 333 may be, for example, 4 um. The width of the first inner connecting trench 333 is not limited, for example, in the embodiment, the width of the first inner connecting trench 333 may be in the range of 0.5 to 1.5 um. Specifically, the width of the first inner connecting trench 333 may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In the present embodiment, optionally, the width of the first inner connecting groove 333 may be, for example, 1 um. The depth of the first inner connecting trench 333 is not limited, for example, in the embodiment, the depth of the first inner connecting trench 333 may be in the range of 0.5 to 1 um. Specifically, the depth of the first inner connecting trench 333 may be, for example, 0.5um, or may be, for example, 0.7um, or may be, for example, 1 um. In the present embodiment, optionally, the width of the first inner connecting groove 333 may be, for example, 0.7 um. The length, width and depth of the first inner connecting groove 333 may be not limited as long as the practical requirements can be satisfied.

Referring to fig. 4, in an embodiment of the utility model, the fourth inner groove 34 may be, for example, a convex groove, and the fourth inner groove 34 may include a third inner L-shaped groove 341, a second inner connecting groove 343, and a fourth inner L-shaped groove 342 connected in sequence. Wherein the third inner L-shaped groove 341 may communicate with the first inner groove 31 and the fourth inner L-shaped groove 342 may communicate with the second inner groove 32 such that one end of the first inner groove 31 may communicate with one end of the second inner groove 32 through the fourth inner groove 34. The structure of the fourth inner tank 34 may be the same as or different from that of the third inner tank 33.

Referring to fig. 4, in an embodiment of the utility model, the third inner L-shaped groove 341 may be divided into a fifth inner groove and a sixth inner groove. The length of the fifth inner strip groove is longer than that of the sixth inner strip groove, so that one end of the fifth inner strip groove can be communicated with one end of the sixth inner strip groove to form a third inner L-shaped groove 341. The length of the fifth inner stripe groove is not limited, for example, in this embodiment, the length of the fifth inner stripe groove may be in the range of, for example, 5 to 7 um. Specifically, the length of the fifth inner stripe groove may be, for example, 5um, or may also be, for example, 6um, or may also be, for example, 7 um. In this embodiment, optionally, the length of the fifth inner stripe groove may be, for example, 5 um. The width of the fifth inner stripe groove is not limited, for example, in the embodiment, the width of the fifth inner stripe groove can be in the range of 0.5-2 um. Specifically, the width of the fifth inner stripe groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the fifth inner stripe groove may be, for example, 1 um. The depth of the fifth inner stripe groove is not limited, for example, in the present embodiment, the depth of the fifth inner stripe groove may be in a range of 0.5-1 um, for example. Specifically, the depth of the fifth inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the fifth inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the fifth inner strip-shaped groove can be not limited, so long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the sixth inner stripe groove may not be limited, and specifically, the length of the sixth inner stripe groove may be in a range of 0.5 to 1.5um, for example. For example, the length of the sixth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the length of the sixth inner stripe groove may be, for example, 1 um. The width of the sixth inner stripe groove is not limited, for example, in this embodiment, the width of the sixth inner stripe groove may also be in the range of 0.5-1.5 um. Specifically, the width of the sixth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the sixth inner stripe groove may be, for example, 1 um. The depth of the sixth inner stripe groove is not limited, for example, in this embodiment, the depth of the sixth inner stripe groove may be in a range of 0.5-1 um, for example. Specifically, the depth of the sixth inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the sixth inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the sixth inner strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the fourth inner L-shaped groove 342 may be divided into a seventh inner groove and an eighth inner groove. The length of the seventh inner strip groove is longer than that of the eighth inner strip groove, so that one end of the seventh inner strip groove is communicated with one end of the eighth inner strip groove to form a fourth inner L-shaped groove 342. Thus, the structure of the fourth inner L-shaped groove 342 may or may not be the same as the structure of the third inner L-shaped groove 341. The length of the seventh inner stripe groove is not limited, for example, in the embodiment, the length of the seventh inner stripe groove may be in a range of 5-7 um. Specifically, the length of the seventh inner stripe groove may be, for example, 5um, also may be, for example, 6um, and also may be, for example, 7 um. In this embodiment, optionally, the length of the seventh inner stripe groove may be, for example, 6 um. The width of the seventh inner stripe groove is not limited, for example, in this embodiment, the width of the seventh inner stripe groove may be, for example, in a range of 0.5 to 2 um. Specifically, the width of the seventh inner stripe groove may be, for example, 0.8um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the seventh inner stripe groove may be, for example, 1 um. The depth of the seventh inner stripe groove is not limited, for example, in this embodiment, the depth of the seventh inner stripe groove may be in a range of 0.5-1 um, for example. Specifically, the depth of the seventh inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the seventh inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the seventh inner strip-shaped groove can be not limited, so long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, the length of the eighth inner stripe groove may not be limited, and specifically, the length of the eighth inner stripe groove may be in a range of, for example, 0.5 to 1.5 um. For example, the length of the eighth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the length of the eighth inner stripe groove may be, for example, 1 um. The width of the eighth inner stripe groove is not limited, for example, in this embodiment, the width of the eighth inner stripe groove can be in the range of 0.5-1.5 um. Specifically, the width of the eighth inner stripe groove may be, for example, 0.5um, or may also be, for example, 1um, or may also be, for example, 1.5 um. In this embodiment, optionally, the width of the eighth inner stripe groove may be, for example, 1 um. The depth of the eighth inner stripe groove is not limited, for example, in this embodiment, the depth of the eighth inner stripe groove may be in a range of 0.5-1 um, for example. Specifically, the depth of the eighth inner stripe groove may be, for example, 0.5um, or may also be, for example, 0.7um, or may also be, for example, 1 um. In this embodiment, optionally, the width of the eighth inner stripe groove may be, for example, 0.7 um. The length, the width and the depth of the eighth inner strip-shaped groove can be not limited as long as the actual requirements can be met.

Referring to fig. 4, in an embodiment of the utility model, one end of the second inner connecting groove 343 may be communicated with one end of the fifth inner groove, and the other end of the second inner connecting groove 343 may be communicated with one end of the seventh inner groove, so that a convex groove may be formed by the third inner L-shaped groove 341, the second inner connecting groove 343, and the fourth inner L-shaped groove 342 which are connected in sequence. In the present embodiment, the length of the second inner connecting groove 343 is not limited, and specifically, the length of the second inner connecting groove 343 may be in a range of 3 to 5um, for example. For example, the length of the second inner connecting groove 343 may be, for example, 3um, or may be, for example, 4um, or may be, for example, 5 um. In this embodiment, the length of the second inner connecting groove 343 may be, for example, 4um, which is optional. The width of the second inner connecting groove 343 is not limited, for example, in the embodiment, the width of the second inner connecting groove 343 may be in the range of 0.5 to 1.5 um. Specifically, the width of the second inner connecting groove 343 may be, for example, 0.5um, or may be, for example, 1um, or may be, for example, 1.5 um. In this embodiment, optionally, the width of the second inner connecting groove 343 may be, for example, 1 um. The depth of the second inner connecting groove 343 is not limited, for example, in the embodiment, the depth of the second inner connecting groove 343 may be in a range of 0.5 to 1um, for example. Specifically, the depth of the second inner connecting groove 343 may be, for example, 0.5um, or may be, for example, 0.7um, or may be, for example, 1 um. In the present embodiment, optionally, the width of the second inner connecting groove 343 may be, for example, 0.7 um. The length, width and depth of the second inner connecting groove 343 are not limited as long as the practical requirements can be met.

The present invention also provides a semiconductor chip, which may include a wafer 10, a photolithographic alignment mark pattern structure, and an epitaxial layer. The photolithography alignment mark pattern structure may be formed on the wafer 10, and the epitaxial layer may cover the wafer 10 and the photolithography alignment mark pattern structure. The thickness of the wafer 10 is not limited, and the thickness of the wafer 10 may be, for example, in a range of 100 to 500um, for example, 200um, for example, 300um, or for example, 400 um. In this embodiment, the thickness of the wafer 10 is, for example, 300 um. The thickness of the epitaxial layer is not limited, and the thickness of the epitaxial layer may be, for example, in the range of 5 to 12um, for example, 5um, 8um, or 12 um. In this embodiment, the thickness of the epitaxial layer is optionally, for example, 8 um.

In summary, according to the photolithography alignment mark pattern structure and the semiconductor wafer provided by the present invention, during the epitaxial growth process, the epitaxial layer can uniformly cover the photolithography alignment mark pattern structure, so that the profile distortion generated during the epitaxial growth process can be effectively reduced, thereby improving the alignment accuracy and improving the product quality to a certain extent.

In the description of the present specification, reference to the description of the terms "present embodiment," "example," "specific example," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the utility model. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The embodiments of the utility model disclosed above are intended merely to aid in the explanation of the utility model. The examples are not intended to be exhaustive or to limit the utility model to the precise forms disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the utility model and the practical application, to thereby enable others skilled in the art to best understand the utility model for and utilize the utility model. The utility model is limited only by the claims and their full scope and equivalents.

Claims

1. A lithographic alignment mark pattern structure, comprising:

a plurality of outer alignment mark grooves arranged on the surface of the wafer; and

the inner alignment mark grooves are arranged on the surface of the wafer;

the inner alignment mark groove comprises a plurality of communicated grooves which are connected in sequence, the inner alignment mark groove is of a central symmetrical structure, and the inner alignment mark groove is of a shape with a middle part protruding outwards.

2. The lithographic alignment mark pattern structure of claim 1, wherein said outer alignment mark trench comprises a first outer trench, a third outer trench, a second outer trench and a fourth outer trench connected in sequence.

3. The lithographic alignment mark pattern structure of claim 2, wherein said third outer groove is a convex structure.

4. The lithographic alignment mark pattern structure of claim 2, wherein said fourth outer groove is a convex structure.

5. The lithographic alignment mark pattern structure of claim 1, wherein said inner alignment mark slots comprise a first inner slot, a third inner slot, a second inner slot and a fourth inner slot connected in sequence.

6. The lithographic alignment mark pattern structure of claim 5, wherein said third inner groove is a convex structure.

7. The lithographic alignment mark pattern structure of claim 5, wherein said fourth inner groove is a convex structure.

8. The lithographic alignment mark pattern structure of claim 1, wherein a plurality of said inner alignment mark slots are arranged equidistantly.

9. The lithographic alignment mark pattern structure of claim 1, wherein the pitch between adjacent outer alignment mark grooves and inner alignment mark grooves is equal to the pitch between two adjacent inner alignment mark grooves.

10. A semiconductor wafer, comprising:

a wafer;

a photoetching alignment mark pattern structure arranged on the wafer; and

wherein the photoetching alignment mark pattern structure comprises

the inner alignment mark grooves are arranged on the surface of the wafer;