CN216788867U - Bellows exhaust apparatus in magnetron sputtering equipment - Google Patents
Bellows exhaust apparatus in magnetron sputtering equipment Download PDFInfo
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- CN216788867U CN216788867U CN202220262009.XU CN202220262009U CN216788867U CN 216788867 U CN216788867 U CN 216788867U CN 202220262009 U CN202220262009 U CN 202220262009U CN 216788867 U CN216788867 U CN 216788867U
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- base
- bellows
- guide rod
- corrugated pipe
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Abstract
The utility model discloses a bellows exhaust device in magnetron sputtering equipment, which comprises an air cylinder and a base fixed on the top of the air cylinder, wherein the base is formed by integrally communicating a square base at the bottom, a cylindrical base at the middle and a disc base at the top, a guide rod is fixedly sleeved on a movable rod of the air cylinder and penetrates through the base, a round table is fixed on the top of the guide rod, a bellows base is arranged on the top of the disc base, the bottom end of a bellows is fixed on the top of the bellows base, the bellows is sleeved on the upper part of the guide rod, the top of the bellows is fixed with the bottom of the round table, a circular ring gap is arranged on the inner side of the top of the disc base and is positioned right below the bellows base along the circumference of the guide rod, so that the top of the disc base forms a step structure, a vertical air guide groove is arranged in one side of the cylindrical base and is positioned below the circular ring gap, the air guide groove is communicated with the circular ring gap, and an exhaust hole is arranged on one side of the cylindrical base from inside to outside, the exhaust hole is communicated with the air guide groove.
Description
Technical Field
The utility model relates to the technical field of magnetron sputtering equipment, in particular to a corrugated pipe exhaust device in magnetron sputtering equipment.
Background
The vacuum coating technology belongs to a physical vapor deposition film-forming method, has the advantages of simple operation, high sputtering rate, compact film layer and the like, and has wide application in scientific research and production. In the field of thin film sputtering, the control of particles is particularly strict, and the existence of particles can generate fatal defects for integrated circuits. The magnetron sputtering equipment is represented by an RNDURA 5500 applied material, the control of particles in the wafer transfer process is very strict, and the film sputtering is carried out in a vacuum environment, so that a large number of bellows are applied to a moving part of a cavity, particularly a lifting mechanism, to isolate the internal vacuum from the external environment, the upper part and the lower part of the bellows are isolated from the vacuum by sealing rings, and the bellows can move along with the movement of a cylinder. But there is not enough in current design, and structural defect makes the bellows when the up-and-down motion, and its inside gas can't in time discharge, and leads to the bellows to appear the problem of deformation very easily, and then influences mechanical transmission, influences the product quality because the production of granule at last.
SUMMERY OF THE UTILITY MODEL
The utility model provides an exhaust device for a corrugated pipe in magnetron sputtering equipment, aiming at solving the problem of mechanical transmission caused by the fact that the corrugated pipe cannot exhaust in time.
The utility model solves the technical problems through the following technical scheme:
the utility model provides a bellows exhaust device in magnetron sputtering equipment, which comprises a cylinder and a base fixed on the top of the cylinder, and is characterized in that the base is formed by integrally communicating a square base at the bottom, a cylindrical base at the middle and a disc base at the top, a guide rod is fixedly sleeved on a movable rod of the cylinder and penetrates through the base, a round table is fixedly arranged at the top of the guide rod, a bellows base is arranged at the top of the disc base, the bottom end of a bellows is fixed at the top of the bellows base, the bellows is sleeved at the upper part of the guide rod, the top of the bellows is fixed with the bottom of the round table, a circular ring notch is arranged on the inner side of the top of the disc base and under the bellows base along the circumference of the guide rod, so that the top of the disc base forms a step structure, a gas guide groove in the vertical direction is arranged in one side of the cylindrical base and under the circular ring notch, the air guide groove is communicated with the circular ring gap, one side of the cylindrical seat body is provided with an exhaust hole from inside to outside, and the exhaust hole is communicated with the air guide groove.
Preferably, the shape of the square seat body is matched with the shape of the top of the cylinder.
The positive progress effects of the utility model are as follows:
the utility model changes the design of the base and is additionally provided with the exhaust hole, so that when the corrugated pipe moves up and down, the gas in the corrugated pipe can be exhausted in time, and the influence caused by the deformation of the corrugated pipe is avoided.
Drawings
Fig. 1 is a perspective view of a bellows exhaust device in a magnetron sputtering apparatus according to a preferred embodiment of the present invention.
FIG. 2 is a cross-sectional view of a base in accordance with a preferred embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
As shown in fig. 1 and fig. 2, this embodiment provides a bellows exhaust apparatus in a magnetron sputtering apparatus, which includes a cylinder 1 and a base 2 fixed on the top of the cylinder 1, where the base 2 is formed by integrally communicating a square base 21 at the bottom, a cylindrical base 22 at the middle, and a disc base 23 at the top, the shape of the square base 21 matches the shape of the top of the cylinder 1, a movable rod of the cylinder 1 is sleeved and fixed with a guide rod 3 and penetrates through the base 2, a circular truncated cone 4 is fixed on the top of the guide rod 3, a bellows base 5 is arranged on the top of the disc base 23, the bottom end of a bellows 6 is fixed on the top of the bellows base 5, the bellows 6 is sleeved on the upper portion of the guide rod 3, the top of the bellows 6 is fixed on the bottom of the circular truncated cone 4, a circular ring notch 24 is formed along the circumference of the guide rod 3 on the inner side of the top of the disc base 23 and under the bellows base 5, so that the top of the disc seat 23 forms a step structure, a vertical air guide groove 25 is formed inside one side of the cylindrical seat 22 and below the circular ring gap 24, the air guide groove 25 is communicated with the circular ring gap 24, an exhaust hole 26 is formed in one side of the cylindrical seat 22 from inside to outside, and the exhaust hole 26 is communicated with the air guide groove 25.
During operation, the movable rod of the cylinder 1 moves up and down to drive the guide rod 3 and the circular truncated cone 4 to move up and down together, so that the bellows is driven to extend or shorten along the length direction of the guide rod 3, generated gas enters a space formed by the circular ring notch 24, enters the gas guide groove 25 from the space and is discharged from the exhaust hole 26, and the influence caused by the deformation of the bellows is avoided.
The device is through improving the base structure to increase the exhaust hole on the base, make the inside gas of cylinder bellows can get into smoothly or discharge in the up-and-down motion process, thereby avoided because too big, the emergence of the condition of bellows deformation of the unable timely release pressure production of bellows inside, and then avoided because the mechanical transmission that the bellows warp and lead to is unusual, improved the quality of wafer production.
While specific embodiments of the utility model have been described above, it will be understood by those skilled in the art that these are by way of example only, and that the scope of the utility model is defined by the appended claims. Various changes and modifications to these embodiments may be made by those skilled in the art without departing from the spirit and scope of the utility model, and these changes and modifications are within the scope of the utility model.
Claims (2)
1. A corrugated pipe exhaust device in magnetron sputtering equipment comprises a cylinder and a base fixed on the top of the cylinder, and is characterized in that the base is formed by integrally communicating a square base at the bottom, a cylindrical base at the middle and a disc base at the top, a guide rod is fixedly sleeved on a movable rod of the cylinder and penetrates through the base, a round table is fixedly arranged on the top of the guide rod, a corrugated pipe seat is arranged on the top of the disc base, the bottom end of a corrugated pipe is fixed on the top of the corrugated pipe seat, the corrugated pipe is sleeved on the upper part of the guide rod, the top of the corrugated pipe is fixed with the bottom of the round table, a circular ring notch is arranged on the inner side of the top of the disc base and under the corrugated pipe seat along the circumference of the guide rod, so that the top of the disc base forms a step structure, an air guide groove in the vertical direction is arranged in one side of the cylindrical base and under the circular ring notch, the air guide groove is communicated with the circular ring gap, one side of the cylindrical seat body is provided with an exhaust hole from inside to outside, and the exhaust hole is communicated with the air guide groove.
2. The magnetron sputtering apparatus as claimed in claim 1, wherein the square base has a shape matching the shape of the top of the cylinder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202220262009.XU CN216788867U (en) | 2022-02-09 | 2022-02-09 | Bellows exhaust apparatus in magnetron sputtering equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202220262009.XU CN216788867U (en) | 2022-02-09 | 2022-02-09 | Bellows exhaust apparatus in magnetron sputtering equipment |
Publications (1)
Publication Number | Publication Date |
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CN216788867U true CN216788867U (en) | 2022-06-21 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202220262009.XU Active CN216788867U (en) | 2022-02-09 | 2022-02-09 | Bellows exhaust apparatus in magnetron sputtering equipment |
Country Status (1)
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CN (1) | CN216788867U (en) |
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2022
- 2022-02-09 CN CN202220262009.XU patent/CN216788867U/en active Active
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