CN216585221U

CN216585221U - Etching solution send liquid subassembly and etching machine

Info

Publication number: CN216585221U
Application number: CN202123250816.4U
Authority: CN
Inventors: 关家彬; 郑健成; 潘然楷; 谭健福
Original assignee: Guangdong Detong Environmental Protection Technology Co ltd
Current assignee: Guangdong Detong Environmental Protection Technology Co ltd
Priority date: 2021-12-21
Filing date: 2021-12-21
Publication date: 2022-05-24
Anticipated expiration: 2031-12-21

Abstract

The utility model provides an etching solution send liquid subassembly for in inputing the etching solution into etching machine, including install etching solution storage tank in the etching machine and be used for inputing the etching solution the input device of etching solution storage tank, still include the feed liquor structure, input device has the jet outlet, jet outlet with the feed liquor structure intercommunication, and through the feed liquor structure with the etching solution inputed in the etching solution storage tank; the liquid inlet structure comprises a main pipe and a spray head used for spraying the etching liquid into a plurality of strands of subdivided fluids, one end of the main pipe is communicated with the spraying hole, the other end of the main pipe is communicated with the spray head, and the spray head is positioned in the etching liquid storage cylinder. The spray head divides the etching solution into a plurality of strands of subdivided fluids, so that the effects of buffering and stabilizing are achieved, the etching solution is prevented from generating large oscillation and uneven distribution in the etching solution storage cylinder, the chlorine solubility of the etching solution is ensured to be relatively stable, and the stability of the etching effect of the etching solution is ensured.

Description

Etching solution send liquid subassembly and etching machine

Technical Field

The utility model belongs to circuit board field of making, more specifically say, relate to an etching solution send liquid subassembly and etching machine.

Background

Acid etching is an essential key process in the manufacturing process of the printed circuit board, a large amount of acid etching waste liquid is generated after the acid etching of the printed circuit board, an electrolytic method is generally adopted at present for recovering metal copper in the acid etching waste liquid, a large amount of strong oxidizing gas chlorine is generated at an anode when the electrolytic method is adopted for copper recovery, and most of the chlorine is recycled to the etching process. Meanwhile, after the etching waste liquid is electrolyzed to extract copper, a blending regeneration system is used for blending the regeneration liquid to be recycled, and in the process, chlorine generated in electrolysis is blended with the regeneration liquid, so that on one hand, the recycling of the etching waste liquid is realized, and on the other hand, the chlorine generated in electrolysis is recycled, and the process is favorable for reducing the cost. Because the solubility of the chlorine is not large, the regenerated etching solution generated by the redissolution of the chlorine can keep an unstable gas-liquid mixed state, and the solubility of the chlorine in the etching solution often has great influence on the etching effect of the etching solution in the etching process of the circuit board. The etching solution liquid inlet mode of the existing etching machine is that regenerated solution is prepared and then directly injected into an etching solution storage cylinder, and the etching solution is in an unstable gas-liquid mixing state at the moment, so that the solubility of chlorine cannot be relatively stably ensured, and the etching effect of the etching solution in the using process is deviated from the expected etching effect.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an etching solution send liquid subassembly to the etching solution that exists among the solution prior art stores in the jar can't guarantee the technical problem of the chlorine solubility of relatively stable.

In order to achieve the above object, the utility model adopts the following technical scheme: providing an etching liquid conveying assembly, which is used for conveying etching liquid into an etching machine, and comprises an etching liquid storage cylinder installed in the etching machine, an input device used for conveying the etching liquid into the etching liquid storage cylinder, and a liquid inlet structure, wherein the input device is provided with an ejection outlet which is communicated with the liquid inlet structure and used for conveying the etching liquid into the etching liquid storage cylinder through the liquid inlet structure; the liquid inlet structure comprises a main pipe and a spray head used for spraying the etching liquid into a plurality of strands of subdivided fluids, one end of the main pipe is communicated with the spraying hole, the other end of the main pipe is communicated with the spray head, and the spray head is positioned in the etching liquid storage cylinder.

Furthermore, the spray head is provided with a spray surface, the spray surface is in a disc shape, and a plurality of through holes for the etching solution to flow out are formed in the spray surface.

Further, still include a plurality of branch pipes, the quantity of shower nozzle is a plurality of, and is a plurality of the shower nozzle with a plurality of the branch pipe one-to-one intercommunication, it is a plurality of the branch pipe all with be responsible for the intercommunication.

Further, the spray head is positioned at the bottom of the etching solution storage cylinder.

Further, the input device is a jet ejector, and the jet outlet is a jet outlet of the jet ejector.

Furthermore, the shower nozzle is spherical, be formed with a plurality of through-holes on the sphere of shower nozzle, it is a plurality of the through-hole is equidistant to be set up.

Further, still include the circulation subassembly, the circulation subassembly includes circulating pump and circulation pipeline, circulation pipeline intercommunication the top bottom both ends of etching solution storage cylinder, the circulating pump is installed in the circulation pipeline.

Further, the etching liquid feeding assembly further comprises a control valve for controlling the flow, and the control valve is installed on the main pipe.

An etching machine comprises an etching machine body and further comprises one or more etching liquid conveying assemblies, wherein the etching liquid conveying assemblies are mounted on the etching machine body.

The utility model provides a liquid subassembly and etching machine are sent to etching solution's beneficial effect lies in: compared with the prior art, the utility model discloses during etching solution send liquid subassembly passes through feed liquor structure and inputs etching solution storage cylinder with the etching solution, be responsible for the flow path that can effectively prolong the etching solution, the shower nozzle falls into the stranded segmentation fluid with the etching solution, plays the effect of buffering and stationary flow, has avoided the great oscillation and the inhomogeneous distribution of production of etching solution in etching solution storage cylinder, has guaranteed the chlorine solubility relatively stable of etching solution to guarantee the stability of the etching effect of etching solution.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the embodiments or the prior art descriptions will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without inventive labor.

Fig. 1 is a schematic view of an overall assembly of an etching solution delivery assembly according to an embodiment of the present invention;

FIG. 2 is an exploded view of FIG. 1;

fig. 3 is a schematic diagram of a liquid inlet structure provided by the embodiment of the present invention.

Wherein, in the figures, the respective reference numerals:

1-an input device; 2-liquid inlet structure; 21-main tube; 22-a spray head; 221-a spray surface; 222-a via hole; 3-etching solution storage cylinder.

Detailed Description

In order to make the technical problem, technical solution and advantageous effects to be solved by the present invention more clearly understood, the following description is given in conjunction with the accompanying drawings and embodiments to illustrate the present invention in further detail. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.

It is to be understood that the terms "upper", "lower", "top", "bottom", "inner", "outer", and the like, are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the present invention.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.

Referring to fig. 1 to 3, an etching solution feeding assembly according to the present invention will now be described.

The etching liquid conveying assembly is used for conveying etching liquid into the etching machine, and comprises an etching liquid storage cylinder 3 arranged in the etching machine, an input device 1 used for conveying the etching liquid into the etching liquid storage cylinder 3, and a liquid inlet structure 2, wherein the input device 1 is provided with an ejection hole which is communicated with the liquid inlet structure 2 and used for conveying the etching liquid into the etching liquid storage cylinder 3 through the liquid inlet structure 2; the liquid inlet structure 2 comprises a main pipe 21 and a spray head 22 for spraying the etching liquid into a plurality of strands of subdivided fluids, one end of the main pipe 21 is communicated with a spraying hole, the other end of the main pipe 21 is communicated with the spray head 22, and the spray head 22 is positioned in the etching liquid storage cylinder 3.

The utility model discloses etching solution send liquid subassembly to pass through feed liquor structure 2 and input etching solution storage cylinder 3 with etching solution, be responsible for 21 flow path that can effectively prolong etching solution, shower nozzle 22 falls into the multi-strand segmentation fluid with etching solution, plays the effect of buffering and stationary flow, has avoided the great oscillation and the uneven distribution of production of etching solution in etching solution storage cylinder 3, has guaranteed the chlorine solubility relatively stable of etching solution to guarantee the stability of the etching effect of etching solution.

Further, referring to fig. 2 and 3, as an embodiment of the showerhead of the present invention, the showerhead 22 has a spraying surface 221, the spraying surface 221 is disc-shaped, and a plurality of through holes 222 for flowing out the etching solution are formed on the spraying surface 221. The plurality of through holes 222 can divide the etching liquid into a plurality of finely divided streams, thereby making the flow of the etching liquid in the etching liquid storage cylinder 3 more uniform.

Further, as the utility model provides a liquid inlet structure's a specific embodiment, liquid inlet structure 2 still includes a plurality of minutes pipes (not shown in the figure), and the quantity of shower nozzle 22 is a plurality of, a plurality of shower nozzles 22 and a plurality of minute pipe one-to-ones intercommunication, a plurality of minutes pipe all with be responsible for 21 intercommunications. The main pipe 21 is communicated with the spray head 22 through a plurality of branch pipes, which is beneficial to further subdividing and prolonging the flowing path of the etching liquid, and plays the roles of stabilizing the liquid flowing and reducing the fluid oscillation.

Further, referring to fig. 2 and 3, as an embodiment of the etching solution feeding assembly of the present invention, the nozzle 22 is located at the bottom of the etching solution storage tank 3. Shower nozzle 22 is located etching solution storage cylinder 3 bottom, follows supreme feed liquor down, can guarantee the stability that liquid flows in the cylinder body better, simultaneously because shower nozzle 22 is located etching solution storage cylinder 3 bottom, and the submergence can also reduce the overflow volume of chlorine when etching solution leaves shower nozzle 22 in the etching solution to guarantee the etching performance of etching solution.

Further, referring to fig. 1 to 3, as an embodiment of the etching solution feeding assembly of the present invention, the input device 1 is a jet device, and the ejection port is an ejection port of the jet device.

Further, as the utility model provides a concrete implementation mode of shower nozzle, shower nozzle 22 is spherical, is formed with a plurality of through-holes 222 on the sphere of shower nozzle 22, and a plurality of through-holes 222 equidistant setting.

Further, please refer to fig. 1 to 3, which are schematic views of a specific embodiment of the etching solution feeding assembly according to the present invention, further comprising a circulation assembly (not shown) including a circulation pump and a circulation pipeline, the circulation pipeline is connected to the top and bottom ends of the etching solution storage tank 3, and the circulation pump is installed in the circulation pipeline. The circulating component realizes the circulating flow of the etching solution in the etching solution storage cylinder 3, the effect similar to stirring is formed, and the uniformity of the chlorine solubility of the etching solution can be further ensured.

Further, the etching liquid feeding assembly further comprises a control valve for controlling the flow, and the control valve is installed on the main pipe. Specifically, the control valve can be a ball valve, and the function of the ball valve is to adjust the flow in the pipeline according to the application condition of the actual etching section, for example, monitoring of the ORP, wherein the ORP can be adjusted to be small if the ORP is too high in the etching section, and can be adjusted to be large if the ORP is too low in the etching section. Because the general etching machine has two to three etching sections or more, the adjustment of the water inlet amount according to the ORP value in each etching section is equivalent to the adjustment of the gas-liquid mixed input amount, so that the inside of the etching section is uniformly etched, generally, the etching degree is higher than the ORP value, which is beneficial to etching, and the rear section is smaller. And during maintenance of the etching section, the ball valve can be closed, so that the cleaning of the internal liquid is facilitated, and the liquid medicine of the overflow pipeline is prevented from entering the etching machine.

An etching machine comprises an etching machine body and one or more etching liquid conveying assemblies as described above, wherein the etching liquid conveying assemblies are mounted on the etching machine body. The etching liquid is input into the etching liquid storage cylinder 3 through the liquid inlet structure 2, the main pipe 21 can effectively prolong the flow path of the etching liquid, the spray head 22 divides the etching liquid into a plurality of strands of subdivided fluids, the effects of buffering and stabilizing are achieved, large oscillation and uneven distribution of the etching liquid in the etching liquid storage cylinder 3 are avoided, the chlorine solubility of the etching liquid is guaranteed to be relatively stable, and therefore the stability of the etching effect of the etching liquid is guaranteed.

The above description is only exemplary of the present invention and should not be construed as limiting the present invention, and any modifications, equivalents and improvements made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.

Claims

1. An etching liquid conveying assembly is used for conveying etching liquid into an etching machine, and comprises an etching liquid storage cylinder installed in the etching machine and an input device used for conveying the etching liquid into the etching liquid storage cylinder, and is characterized by further comprising a liquid inlet structure, wherein the input device is provided with an ejection outlet which is communicated with the liquid inlet structure and conveys the etching liquid into the etching liquid storage cylinder through the liquid inlet structure; the liquid inlet structure comprises a main pipe and a spray head used for spraying the etching liquid into a plurality of strands of subdivided fluids, one end of the main pipe is communicated with the spraying hole, the other end of the main pipe is communicated with the spray head, and the spray head is positioned in the etching liquid storage cylinder.

2. The etching liquid delivery assembly of claim 1, wherein: the spray head is provided with a spray surface, the spray surface is in a disc shape, and a plurality of through holes for the etching solution to flow out are formed in the spray surface.

3. The etching liquid feed assembly according to claim 1 or 2, wherein: still include a plurality of minutes pipe, the quantity of shower nozzle is a plurality of, and is a plurality of the shower nozzle is with a plurality of divide the pipe one-to-one intercommunication, it is a plurality of divide the pipe all with be responsible for the intercommunication.

4. The etching liquid delivery assembly according to claim 1 or 2, wherein: the spray head is positioned at the bottom of the etching solution storage cylinder.

5. The etching liquid feed assembly according to claim 1 or 2, wherein: the input device is a jet ejector, and the ejection hole is an ejection hole of the jet ejector.

6. The etching liquid feed assembly according to claim 1 or 2, wherein: the shower nozzle is spherical, be formed with a plurality of through-holes on the sphere of shower nozzle, it is a plurality of the through-hole is equidistant to be set up.

7. The etching liquid feed assembly according to claim 1 or 2, wherein: still include the circulation subassembly, the circulation subassembly includes circulating pump and circulation pipeline, circulation pipeline intercommunication the top bottom both ends of etching solution storage cylinder, the circulating pump is installed in the circulation pipeline.

8. The etching liquid feed assembly according to claim 1 or 2, wherein: the etching liquid feeding assembly further comprises a control valve for controlling the flow, and the control valve is installed on the main pipe.

9. The utility model provides an etching machine, includes the etching machine body, its characterized in that: the etching solution conveying device further comprises one or more etching solution conveying assemblies as claimed in any one of claims 1 to 8, wherein the etching solution conveying assemblies are mounted on the etching machine body.