TWI648098B - Gas-liquid mixing apparauts, process equipment and gas-liquid mixing method - Google Patents

Gas-liquid mixing apparauts, process equipment and gas-liquid mixing method Download PDF

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TWI648098B
TWI648098B TW106139349A TW106139349A TWI648098B TW I648098 B TWI648098 B TW I648098B TW 106139349 A TW106139349 A TW 106139349A TW 106139349 A TW106139349 A TW 106139349A TW I648098 B TWI648098 B TW I648098B
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nitrogen gas
liquid
tube
gas bubble
nitrogen
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TW106139349A
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TW201918275A (en
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顏英哲
黃進堂
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亞智科技股份有限公司
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Abstract

一種氣液混合方法,包括以下步驟:輸入氮氣至藥液;細化氮氣為氮氣氣泡,並加壓氮氣氣泡,使氮氣氣泡混入至藥液而為第一具氮氣氣泡之藥液;以及蓄壓第一具氮氣氣泡之藥液。此外,一種氣液混合機構與製程設備亦被提出。 A gas-liquid mixing method comprises the steps of: inputting nitrogen gas into a chemical solution; refining nitrogen gas into a nitrogen gas bubble, and pressurizing the nitrogen gas bubble to mix the nitrogen gas bubble into the chemical liquid to be the first chemical liquid with nitrogen gas bubbles; and accumulating pressure The first chemical solution with nitrogen bubbles. In addition, a gas-liquid mixing mechanism and process equipment have also been proposed.

Description

氣液混合機構、製程設備及氣液混合方法 Gas-liquid mixing mechanism, process equipment and gas-liquid mixing method

本發明是有關於一種氣液混合機構、製程設備與氣液混合方法,且特別是有關於一種降低藥液劣化情況的氣液混合機構、製程設備與氣液混合方法。 The invention relates to a gas-liquid mixing mechanism, a process equipment and a gas-liquid mixing method, and particularly relates to a gas-liquid mixing mechanism, a process equipment and a gas-liquid mixing method for reducing the deterioration of a chemical liquid.

於現代高科技產業的製造的過程中,基板需要經過多道加工程序,例如清洗、蝕刻、塗佈、顯影等製造程序,會採用特定藥液去執行相對應的製造程序。 In the manufacturing process of the modern high-tech industry, the substrate needs to go through multiple processing procedures, such as cleaning, etching, coating, developing, etc., and the specific chemical liquid is used to execute the corresponding manufacturing process.

由於藥液無法避免在傳輸路徑上接觸大氣,以顯影設備為例,大氣中的氣體元素(如CO2)跟藥液反應為碳酸水(H2CO3)而使藥液有劣化的情況。針對此顯影液劣化的問題,一般係在藥液槽內灌入惰性氣體,藉由惰性氣體不易反應的特性,避免藥液與大氣中的氣體元素產生反應。然,由於惰性氣體不容易溶解於藥液內,導致防治顯影液劣化的效果不佳。 Since the chemical solution cannot avoid contact with the atmosphere on the transport path, in the case of the developing device, the gas element (such as CO 2 ) in the atmosphere reacts with the chemical solution to be carbonated water (H 2 CO 3 ) to deteriorate the chemical solution. In view of the problem of deterioration of the developer, an inert gas is generally poured into the chemical solution tank, and the reaction of the chemical liquid with the gas element in the atmosphere is prevented by the inert gas being less reactive. However, since the inert gas is not easily dissolved in the chemical liquid, the effect of preventing deterioration of the developing solution is not good.

因此,如何提升藥液壽命與良率,進而減少藥液更換時間與降低製造成本,係為極重要的課題 Therefore, how to improve the life and yield of the liquid, and thus reduce the liquid replacement time and reduce the manufacturing cost is a very important issue.

本發明的一目的在於,解決藥液劣化問題,延長藥液使用壽命,進而減少藥液更換時間與降低製造成本,並增加生產製造效能。 One object of the present invention is to solve the problem of chemical liquid deterioration, prolong the service life of the chemical liquid, thereby reducing the liquid chemical replacement time and reducing the manufacturing cost, and increasing the manufacturing efficiency.

本發明的一實施例提出一種氣液混合機構,包括一第一氮氣溶解裝置以及一減壓閥模組。第一氮氣溶解裝置包括一第一匯流管、一第一細化管以及一第一蓄壓筒。第一細化管連通於第一匯流管,該第一細化管內設置一第一細化裝置,一氮氣與一藥液由第一匯流管流入至第一細化管時,第一細化裝置係細化氮氣為一氮氣氣泡。第一蓄壓筒連通於第一細化管,第一蓄壓筒的管徑大於第一細化管的管徑,以降低藥液的流速並加壓氮氣氣泡,使氮氣氣泡混入至藥液而為一第一具氮氣氣泡之藥液。減壓閥模組連通於第一蓄壓筒,減壓閥模組用以調節並蓄壓第一蓄壓筒內第一具氮氣氣泡之藥液之壓力。 An embodiment of the invention provides a gas-liquid mixing mechanism comprising a first nitrogen dissolving device and a pressure reducing valve module. The first nitrogen dissolving device comprises a first manifold, a first refining tube and a first accumulator. The first thinning tube is connected to the first collecting tube, and the first thinning tube is provided with a first refining device. When a nitrogen gas and a chemical liquid flow from the first collecting tube to the first thinning tube, the first fine The chemical device refines the nitrogen gas into a nitrogen gas bubble. The first accumulator cylinder is connected to the first refinement tube, and the diameter of the first accumulator cylinder is larger than the diameter of the first refinement tube, so as to reduce the flow rate of the chemical solution and pressurize the nitrogen gas bubbles, so that the nitrogen gas bubbles are mixed into the liquid medicine. It is a first chemical solution with nitrogen bubbles. The pressure reducing valve module is connected to the first accumulator cylinder, and the pressure reducing valve module is used for regulating and accumulating the pressure of the first nitrogen gas bubble in the first accumulator.

本發明的一實施例提出一種製程設備,包括一藥液槽、處理裝置以及一氣液混合機構。藥液槽存儲一藥液。處理裝置係以藥液槽提供之藥液處理一基板。氣液混合機構係接收藥液槽之藥液,氣液混合機構包括一第一氮氣溶解裝置以及一減壓閥模組。第一氮氣溶解裝置包括一第一匯流管、一第一細化管以及一第一蓄壓筒。第一細化管連通於第一匯流管,該第一細化管內設置一第一細化裝置,一氮氣與一藥液由第一匯流管流入至第一細化管時,第一細化裝置係細化氮氣為一氮氣氣泡。第一蓄壓筒連通於第一細化管,第一蓄壓筒的管徑大於第一細化管的管徑,以降低藥液的流速並加壓氮氣氣泡,使氮氣氣泡混入至藥液而為一第一具氮氣氣泡之藥液。減壓閥模組連通於第一蓄壓筒,減壓閥模組用以調節並蓄壓第一蓄壓筒內第一具氮氣氣泡之藥液之壓力。 An embodiment of the invention provides a process apparatus comprising a chemical tank, a processing device, and a gas-liquid mixing mechanism. The liquid tank stores a liquid medicine. The processing device processes a substrate with a chemical solution provided by the drug solution tank. The gas-liquid mixing mechanism receives the liquid medicine of the liquid medicine tank, and the gas-liquid mixing mechanism includes a first nitrogen gas dissolving device and a pressure reducing valve module. The first nitrogen dissolving device comprises a first manifold, a first refining tube and a first accumulator. The first thinning tube is connected to the first collecting tube, and the first thinning tube is provided with a first refining device. When a nitrogen gas and a chemical liquid flow from the first collecting tube to the first thinning tube, the first fine The chemical device refines the nitrogen gas into a nitrogen gas bubble. The first accumulator cylinder is connected to the first refinement tube, and the diameter of the first accumulator cylinder is larger than the diameter of the first refinement tube, so as to reduce the flow rate of the chemical solution and pressurize the nitrogen gas bubbles, so that the nitrogen gas bubbles are mixed into the liquid medicine. It is a first chemical solution with nitrogen bubbles. The pressure reducing valve module is connected to the first accumulator cylinder, and the pressure reducing valve module is used for regulating and accumulating the pressure of the first nitrogen gas bubble in the first accumulator.

本發明的一實施例提出一種氣液混合方法,包括以下步驟:輸入一氮氣至一藥液;細化氮氣為一氮氣氣泡,並加壓氮氣氣泡,使氮氣氣泡混入至藥液而為一第一具氮氣氣泡之藥液;以及蓄壓第一具氮氣氣泡之藥液。 An embodiment of the present invention provides a gas-liquid mixing method comprising the steps of: inputting a nitrogen gas to a chemical solution; refining the nitrogen gas into a nitrogen gas bubble, and pressurizing the nitrogen gas bubble to mix the nitrogen gas bubble into the chemical liquid to be a first a liquid medicine with nitrogen gas bubbles; and a liquid medicine for accumulating the first nitrogen gas bubble.

基於上述,在本發明的氣液混合機構、製程設備與氣液混合方法中,藉由氮氣溶解於藥液之內,可確實有效抑制藥液中含二氧化碳量或含氧量的增加,達到防止藥液劣化的功能。 Based on the above, in the gas-liquid mixing mechanism, the process equipment, and the gas-liquid mixing method of the present invention, by dissolving nitrogen gas in the chemical liquid, the increase in the carbon dioxide content or the oxygen content in the chemical liquid can be effectively suppressed, thereby preventing The function of chemical liquid deterioration.

再者,經由上述管徑不同的結構差異,以加壓氮氣氣泡,除了提升氮氣氣泡之壓力以外,也可提升總體氣體壓力之飽和度,提升氮氣氣泡之壓力,亦可增加氮氣氣泡溶解於藥液的含量,可使氮氣氣泡更能溶解於藥液之內,延長藥液使用壽命,進而減少藥液更換時間與降低製造成本,並增加生產製造效能。 Furthermore, through the above-mentioned structural differences with different pipe diameters, in addition to increasing the pressure of the nitrogen gas bubbles, the pressure of the nitrogen gas bubbles can also increase the saturation of the overall gas pressure, increase the pressure of the nitrogen gas bubbles, and increase the nitrogen gas bubbles dissolved in the medicine. The content of the liquid can make the nitrogen bubbles more soluble in the liquid medicine, prolong the service life of the liquid, thereby reducing the liquid replacement time and reducing the manufacturing cost, and increasing the manufacturing efficiency.

此外,藉由蓄壓筒與減壓閥模組的配置,以將壓力蓄集到蓄壓筒之內,故可維持氮氣氣泡溶解於藥液的含量。 Further, since the pressure accumulator and the pressure reducing valve module are disposed to store the pressure in the pressure accumulating cylinder, the content of the nitrogen gas bubbles dissolved in the chemical liquid can be maintained.

10、20、30‧‧‧氣液混合機構 10, 20, 30‧ ‧ gas-liquid mixing mechanism

11‧‧‧第一氮氣溶解裝置 11‧‧‧First nitrogen dissolving device

111、131‧‧‧氮氣輸入管 111, 131‧‧‧ nitrogen inlet pipe

1112‧‧‧噴管 1112‧‧‧ nozzle

1114‧‧‧噴嘴 1114‧‧‧Nozzles

112、132‧‧‧藥液輸入管 112, 132‧‧‧ drug liquid input tube

113‧‧‧第一匯流管 113‧‧‧First manifold

114‧‧‧第一細化管 114‧‧‧First refinement tube

1142‧‧‧輸入段 1142‧‧‧ Input section

1144‧‧‧輸出段 1144‧‧‧Output segment

116、216‧‧‧第一蓄壓筒 116, 216‧‧‧ first accumulator

1162‧‧‧第一部件 1162‧‧‧ first part

1164‧‧‧第二部件 1164‧‧‧ second part

1166‧‧‧第三部件 1166‧‧‧ third part

118‧‧‧第一細化裝置 118‧‧‧First refinement

1182‧‧‧導流鰭片 1182‧‧ ‧ guide fins

1184‧‧‧導流孔 1184‧‧‧Inlet

1186‧‧‧連接環 1186‧‧‧ Connecting ring

12‧‧‧減壓閥模組 12‧‧‧Reducing valve module

121‧‧‧管路 121‧‧‧pipe

121A‧‧‧一次側管 121A‧‧‧One side tube

121B‧‧‧二次側管 121B‧‧‧Second side tube

122‧‧‧減壓閥門 122‧‧‧Reducing valve

123‧‧‧第一側調壓裝置 123‧‧‧First side pressure regulating device

123A‧‧‧第一測壓表 123A‧‧‧First pressure gauge

123B‧‧‧第一調壓元件 123B‧‧‧First pressure regulating element

124‧‧‧第二側調壓裝置 124‧‧‧Second side pressure regulating device

124A‧‧‧第二測壓表 124A‧‧‧Second pressure gauge

124B‧‧‧第二調壓元件 124B‧‧‧Second voltage regulator

13‧‧‧第二氮氣溶解裝置 13‧‧‧Second nitrogen dissolving device

133‧‧‧第二匯流管 133‧‧‧Second manifold

134‧‧‧第二細化管 134‧‧‧Second thin tube

136、236‧‧‧第二蓄壓筒 136, 236‧‧‧ second accumulator

138‧‧‧第二細化裝置 138‧‧‧Second refinement device

50‧‧‧製程設備 50‧‧‧Processing equipment

51‧‧‧藥液槽 51‧‧‧ drug tank

52‧‧‧處理裝置 52‧‧‧Processing device

521‧‧‧噴淋管 521‧‧‧Spray tube

522‧‧‧噴頭 522‧‧‧ nozzle

53‧‧‧噴灑泵浦 53‧‧‧Spray pump

54‧‧‧循環泵浦 54‧‧‧Circulating pump

55‧‧‧第一電導度計 55‧‧‧First Conductivity Meter

56‧‧‧第二電導度計 56‧‧‧Second Conductivity Meter

57‧‧‧回收管 57‧‧‧Recycling tube

58‧‧‧排液管 58‧‧‧Draining tube

D1、D2、D3、D4、D5、D6‧‧‧管徑 D1, D2, D3, D4, D5, D6‧‧‧ pipe diameter

G‧‧‧氮氣 G‧‧‧Nitrogen

L‧‧‧藥液 L‧‧‧ liquid

R1、R2‧‧‧立體旋轉 R1, R2‧‧‧ three-dimensional rotation

S10、S20‧‧‧氣液混合方法 S10, S20‧‧‧ gas-liquid mixing method

S110~S130‧‧‧步驟 S110~S130‧‧‧Steps

S210~S260‧‧‧步驟 S210~S260‧‧‧Steps

圖1為本發明之氣液混合機構第一實施例的示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing a first embodiment of a gas-liquid mixing mechanism of the present invention.

圖2為本發明之第一氮氣溶解裝置的示意圖。 2 is a schematic view of a first nitrogen dissolving device of the present invention.

圖3為本發明之第一細化裝置的示意圖。 Figure 3 is a schematic illustration of a first refinement apparatus of the present invention.

圖4為圖3之第一細化裝置的平面示意圖。 4 is a plan view of the first refining device of FIG. 3.

圖5A為本發明之氣液混合機構第二實施例的示意圖。 Fig. 5A is a schematic view showing a second embodiment of the gas-liquid mixing mechanism of the present invention.

圖5B為本發明之氣液混合機構第三實施例的示意圖。 Fig. 5B is a schematic view showing a third embodiment of the gas-liquid mixing mechanism of the present invention.

圖6為本發明之製程設備的示意圖。 Figure 6 is a schematic illustration of a process apparatus of the present invention.

圖7為本發明之氣液混合方法第一實施例的示意圖。 Fig. 7 is a schematic view showing the first embodiment of the gas-liquid mixing method of the present invention.

圖8為本發明之氣液混合方法第二實施例的示意圖。 Figure 8 is a schematic view showing a second embodiment of the gas-liquid mixing method of the present invention.

以下結合附圖和實施例,對本發明的具體實施方式作進一步描述。以下實施例僅用於更加清楚地說明本發明的技術方案,而不能以此限制本發明的保護範圍。 The specific embodiments of the present invention are further described below in conjunction with the drawings and embodiments. The following examples are only used to more clearly illustrate the technical solutions of the present invention, and are not intended to limit the scope of the present invention.

圖1為本發明之氣液混合機構第一實施例的示意圖。圖2為本發明之第一氮氣溶解裝置的示意圖。圖3為本發明之第一細化裝置的示意圖。圖4為圖3之第一細化裝置的平面示意圖。請先參閱圖1。在本實施例中,氣液混合機構10包含一第一氮氣溶解裝置11以及一減壓閥模組12。第一氮氣溶解裝置11包括一氮氣輸入管111、一藥液輸入管112、一第一匯流管113、一第一細化管114以及一第一蓄壓筒116。氮氣輸入管111連通於第一匯流管113,藥液輸入管112連通於第一匯流管113,第一匯流管113連通於第一細化管114,且第一細化管114連通於第一蓄壓筒116,以構成第一氮氣溶解裝置11。第一匯流管113為氮氣輸入管111與藥液輸入管112的連通交接位置,藥液輸入管112用以輸入藥液L至第一匯流管113,氮氣輸入管111用以輸入氮氣G至第一匯流管113,使得氮氣G與藥液L於第一匯流管113交會,並流經第一細化管114與第一蓄壓筒116而自減壓閥模組12輸出。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing a first embodiment of a gas-liquid mixing mechanism of the present invention. 2 is a schematic view of a first nitrogen dissolving device of the present invention. Figure 3 is a schematic illustration of a first refinement apparatus of the present invention. 4 is a plan view of the first refining device of FIG. 3. Please refer to Figure 1 first. In the present embodiment, the gas-liquid mixing mechanism 10 includes a first nitrogen dissolving device 11 and a pressure reducing valve module 12. The first nitrogen dissolving device 11 includes a nitrogen gas input pipe 111, a chemical liquid input pipe 112, a first manifold pipe 113, a first thinning pipe 114, and a first pressure accumulating cylinder 116. The nitrogen inlet pipe 111 is in communication with the first manifold 113, the chemical inlet pipe 112 is in communication with the first manifold 113, the first manifold 113 is in communication with the first refining pipe 114, and the first refining pipe 114 is in communication with the first The accumulator 116 is configured to constitute the first nitrogen dissolving device 11. The first manifold 113 is a communication transfer position between the nitrogen inlet pipe 111 and the chemical input pipe 112. The chemical input pipe 112 is used to input the chemical liquid L to the first manifold 113, and the nitrogen inlet pipe 111 is used to input the nitrogen gas G to the first. A manifold 113 allows the nitrogen gas G to collide with the chemical solution L at the first manifold 113 and flows through the first thin tube 114 and the first pressure accumulating tube 116 to be output from the pressure reducing valve module 12.

在本實施例中,如圖2所示,氮氣輸入管111包括一噴管1112與一噴嘴1114,噴管1112連通噴嘴1114,氮氣G輸入至噴管1112內,並由噴管1112輸送氮氣G至噴嘴1114,以將氮氣G輸送至第一匯流管113中的藥液 L。假設各個氣體在常溫下具相同分壓,氮氣G可較如二氧化碳或氧氣等氣體更溶解於藥液L之內,藉由氮氣G溶解於藥液L之內,可確實有效抑制藥液L中含二氧化碳量或含氧量的增加,並使得藥液L的電導度下降,達到防止藥液L劣化的功能。 In the present embodiment, as shown in FIG. 2, the nitrogen inlet pipe 111 includes a nozzle 1112 and a nozzle 1114. The nozzle 1112 communicates with the nozzle 1114, the nitrogen gas G is input into the nozzle 1112, and the nitrogen gas G is delivered by the nozzle 1112. To the nozzle 1114 to deliver the nitrogen gas G to the first confluence tube 113 L. Assuming that each gas has the same partial pressure at normal temperature, the nitrogen gas G can be dissolved in the liquid L more than a gas such as carbon dioxide or oxygen, and the nitrogen gas G is dissolved in the liquid L, which can effectively suppress the liquid L. The carbon dioxide content or the oxygen content is increased, and the electrical conductivity of the chemical liquid L is lowered to achieve the function of preventing the deterioration of the chemical liquid L.

在本實施例中,第一細化管114之兩側分別連通於第一匯流管113與第一蓄壓筒116。第一細化管114內設置一第一細化裝置118,使氮氣G與藥液L由第一匯流管113流入至第一細化管114時,第一細化裝置118係細化氮氣G為一氮氣氣泡,氮氣氣泡較能與藥液L快速且均勻混合,以提高溶解速率,並且,本實施例的第一蓄壓筒116的管徑D3大於第一細化管114的管徑D2,當藥液L與氮氣氣泡由管徑小之第一細化管114流入至管徑大之第一蓄壓筒116時,依據白努利原理(Bernoulli's principle),藥液L的流速降低並藉此加壓氮氣氣泡,使氮氣氣泡混入至藥液L而為一第一具氮氣氣泡之藥液。藉此,透過前述管徑不同的結構差異,達到加壓氮氣氣泡的效果。在此配置之下,依據道耳頓分壓定律(Dalton's law of partial pressures),混合氣體產生的總體氣體壓力等於混合氣體中各別成分的分壓總合,而總體氣體壓力之飽和度為一定值,以本實施例為例,總體氣體壓力為二氧化碳之分壓壓力、氧氣之分壓壓力以及氮氣之分壓壓力之總和,因此,經由上述管徑不同的結構差異,以加壓氮氣氣泡之分壓壓力,除了提升氮氣氣泡之分壓壓力以外,也可提升總體氣體壓力之飽和度,並且,氣體在溶液中之溶解性質與氣體的分壓有關,氣體溶解於某溶液中的體積莫耳濃度與溶液達成平衡的氣體分壓成正比,據此,氮氣氣泡被施壓的壓力越大,使得第一具氮氣氣泡之藥液內含有氮氣氣泡的比例增加,而能降低如二氧化碳或 氧氣等氣體溶解於第一具氮氣氣泡之藥液的比例,可使氮氣氣泡更能溶解於藥液L之內。 In this embodiment, the two sides of the first refinement tube 114 are respectively connected to the first manifold tube 113 and the first accumulator tube 116. A first refining device 118 is disposed in the first refining tube 114. When the nitrogen gas G and the chemical liquid L flow from the first collecting pipe 113 to the first refining pipe 114, the first refining device 118 refines the nitrogen gas G. The nitrogen gas bubble is more rapidly and uniformly mixed with the chemical liquid L to increase the dissolution rate, and the diameter D3 of the first pressure accumulating cylinder 116 of the embodiment is larger than the diameter D2 of the first thin tube 114. When the chemical liquid L and the nitrogen gas bubble flow from the first thin tube 114 having a small diameter to the first pressure storage tube 116 having a large diameter, the flow rate of the liquid L is lowered according to the Bernoulli's principle. Thereby, the nitrogen gas bubble is pressurized, and the nitrogen gas bubble is mixed into the chemical liquid L to be a first chemical liquid having a nitrogen gas bubble. Thereby, the effect of pressurizing the nitrogen gas bubbles is achieved by the structural difference of the different pipe diameters. Under this configuration, according to Dalton's law of partial pressures, the total gas pressure generated by the mixed gas is equal to the partial pressure sum of the individual components in the mixed gas, and the saturation of the overall gas pressure is constant. For the value of the present embodiment, the total gas pressure is the sum of the partial pressure of carbon dioxide, the partial pressure of oxygen, and the partial pressure of nitrogen. Therefore, the pressure difference between the above-mentioned pipe diameters is used to pressurize the nitrogen gas bubbles. The partial pressure, in addition to increasing the partial pressure of the nitrogen gas bubbles, can also increase the saturation of the overall gas pressure, and the solubility of the gas in the solution is related to the partial pressure of the gas, and the volume of the gas dissolved in a solution The concentration is proportional to the partial pressure of the gas in which the solution is balanced. Accordingly, the greater the pressure at which the nitrogen gas bubbles are applied, the proportion of the first nitrogen gas bubble containing the nitrogen gas bubbles is increased, and the carbon dioxide or the like can be lowered. The ratio of oxygen gas and the like dissolved in the first chemical liquid having nitrogen gas bubbles makes the nitrogen gas bubbles more soluble in the liquid medicine L.

在本實施例中,第一細化管114的管徑D2小於第一匯流管113的管徑D1,且第一蓄壓筒116的管徑D3大於第一細化管114的管徑D2,即第一細化管114的管徑D2較其兩側連接之第一匯流管113的管徑D1與第一蓄壓筒116的管徑D3小,形成一文氏管(Venturi tube)結構,第一細化管114作為文氏管結構的頸縮段。第一細化管114包含一輸入段1142與一輸出段1144,輸入段1142連通於輸出段1144,而第一細化裝置118設置在輸入段1142。在此配置之下,第一細化裝置118佔據了輸入段1142前端大部分空間,使得氮氣G與藥液L通過輸入段1142前端時,大多數的氮氣G能被第一細化裝置118細化為氮氣氣泡,增加氮氣氣泡的含量,使得較多的氮氣氣泡在輸入段1142至輸出段1144之間與藥液L快速且均勻混合,以提高溶解速率。 In the present embodiment, the diameter D2 of the first refinement tube 114 is smaller than the diameter D1 of the first rectification tube 113, and the diameter D3 of the first accumulator tube 116 is larger than the diameter D2 of the first refinement tube 114. That is, the diameter D2 of the first thin tube 114 is smaller than the diameter D1 of the first manifold 113 connected to both sides thereof and the diameter D3 of the first pressure accumulating tube 116, forming a Venturi tube structure. A thin tube 114 serves as a necking section of the venturi structure. The first refinement tube 114 includes an input section 1142 and an output section 1144. The input section 1142 is in communication with the output section 1144, and the first refining device 118 is disposed in the input section 1142. Under this configuration, the first refining device 118 occupies most of the space at the front end of the input section 1142 so that most of the nitrogen gas G can be thinned by the first refining device 118 when the nitrogen gas G and the chemical liquid L pass through the front end of the input section 1142. The formation of nitrogen gas bubbles increases the content of nitrogen gas bubbles, so that more nitrogen gas bubbles are rapidly and uniformly mixed with the chemical liquid L between the input section 1142 and the output section 1144 to increase the dissolution rate.

在本實施例中,第一細化裝置118可如圖3與圖4所示為一生化球,然本發明不對第一細化裝置加以限制,在其他實施例中,第一細化裝置可為一濾網、一鰭片組、一濾膜或一多孔性陶瓷細化片。第一細化裝置118包含複數個導流鰭片1182、複數個導流孔1184以及複數個連接環1186。連接環1186連接複數個導流鰭片1182,複數個導流鰭片142以放射狀排列並構成一立體幾何形狀,例如為垂直輻射狀、順/逆時針渦漩狀或旋轉輻射狀,於其他未繪示實施例中,導流鰭片亦可呈水平輻射狀,本發明不對第一細化裝置的形狀加以限制。導流孔1184為兩個導流鰭片1182之間所形成。然而,本發明不以此為限,於其他未繪示的實施例中,導流孔能設於導流鰭片,例如在導流鰭片開孔而形成導流孔。 In the present embodiment, the first refining device 118 can be a biochemical ball as shown in FIG. 3 and FIG. 4, but the present invention does not limit the first refining device. In other embodiments, the first refining device can be It is a sieve, a fin set, a filter or a porous ceramic refining sheet. The first refining device 118 includes a plurality of guiding fins 1182, a plurality of diversion holes 1184, and a plurality of connecting rings 1186. The connecting ring 1186 is connected to the plurality of guiding fins 1182. The plurality of guiding fins 142 are arranged radially and form a three-dimensional geometric shape, for example, a vertical radial shape, a cis/counterclockwise swirling shape or a rotating radial shape. In the embodiment not shown, the flow guiding fins may also be horizontally radiated, and the present invention does not limit the shape of the first refining device. The flow guiding hole 1184 is formed between the two flow guiding fins 1182. However, the present invention is not limited thereto. In other embodiments not shown, the air guiding holes can be disposed on the flow guiding fins, for example, the guiding fins are opened to form the air guiding holes.

在此配置之下,當氮氣G與藥液L流入第一細化管114時,第一細化裝置118在藥液L中立體旋轉R1、R2(或稱萬向旋轉、三維旋轉),亦即藥液L在第一細化管114內作順(或逆)時針旋轉的立體滾動,而不會只有二維(或水平)方向轉動。 Under this configuration, when the nitrogen gas G and the chemical liquid L flow into the first thin tube 114, the first refining device 118 rotates R1, R2 (or universal rotation, three-dimensional rotation) in the liquid L, That is, the liquid L is subjected to a three-dimensional (or horizontal) rotation in the first refinement tube 114 in a straight (or reverse) clockwise rotation.

再者,當第一細化管114在藥液L中立體旋轉R1、R2時,導流鰭片1182將氮氣G細化為氮氣氣泡,氮氣氣泡與藥液L通過各導流孔1184,導流孔1184擾動氮氣氣泡與藥液L,而能達到混合擾流的效果,並增加氮氣G被細化後的氮氣氣泡與藥液L之接觸面積,進而提升氮氣氣泡溶解於藥液L之溶解率。 Further, when the first refinement tube 114 is three-dimensionally rotated R1 and R2 in the chemical liquid L, the flow guiding fin 1182 refines the nitrogen gas G into a nitrogen gas bubble, and the nitrogen gas bubble and the chemical liquid L pass through the respective flow guiding holes 1184. The flow hole 1184 disturbs the nitrogen gas bubble and the chemical liquid L, and can achieve the effect of the mixed spoiler, and increases the contact area between the nitrogen gas bubble and the chemical liquid L after the nitrogen gas G is refined, thereby improving the dissolution of the nitrogen gas bubble dissolved in the chemical liquid L. rate.

請復參閱圖1與圖2,第一蓄壓筒116包含一第一部件1162、一第二部件1164與一第三部件1166,其中第二部件1164設置於第一部件1162與第三部件1166之間。第一部件1162之一側連接第一細化管114,第一部件1162之另一側連接第二部件1164,第一部件1162至第二部件1164形成一漸擴結構,使得第一部件1162連接第一細化管114之一側之管徑較小,而第一部件1162連接第二部件1164之另一側之管徑較大,故藥液L與氮氣氣泡由管徑小之第一細化管114流入至管徑大之第二部件1164,可達到加壓氮氣氣泡的效果。另一方面,第二部件1164之一側連接於第三部件1166,且第二部件1164至第三部件1166形成一漸縮結構。為了避免前述漸縮結構降低氮氣氣泡之分壓壓力,本實施例包含減壓閥模組12,減壓閥模組12連通於第一蓄壓筒116,當第一具氮氣氣泡之藥液由第一細化管114流入至第一蓄壓筒116時,減壓閥模組12用以調節並蓄壓第一蓄壓筒116內第一具氮氣氣泡之藥液之壓力,以輸出第一具氮氣氣泡之藥液。此外,藉由上述配置而蓄集第一具 氮氣氣泡之藥液之壓力,可增加第一蓄壓筒116的管徑D3,讓氮氣氣泡溶解於第一具氮氣氣泡之藥液的效果提升。 Referring to FIG. 1 and FIG. 2 , the first accumulator tube 116 includes a first component 1162 , a second component 1164 and a third component 1166 . The second component 1164 is disposed on the first component 1162 and the third component 1166 . between. One side of the first member 1162 is connected to the first thin tube 114, and the other side of the first member 1162 is connected to the second member 1164. The first member 1162 to the second member 1164 form a divergent structure, so that the first member 1162 is connected. The diameter of one side of the first thin tube 114 is small, and the diameter of the other side of the first part 1162 connected to the second part 1164 is large, so the first step of the chemical liquid L and the nitrogen gas bubble is small. The tube 114 flows into the second member 1164 having a large diameter to achieve the effect of compressing the nitrogen gas bubbles. On the other hand, one side of the second member 1164 is connected to the third member 1166, and the second member 1164 to the first member 1166 form a tapered structure. In order to prevent the above-mentioned tapered structure from reducing the partial pressure of the nitrogen gas bubbles, the embodiment includes a pressure reducing valve module 12, and the pressure reducing valve module 12 is connected to the first pressure accumulating cylinder 116, when the first chemical solution with nitrogen gas bubbles is When the first refinement tube 114 flows into the first accumulator tube 116, the pressure reducing valve module 12 is used to adjust and accumulate the pressure of the first nitrogen gas bubble in the first accumulator tube 116 to output the first A liquid with a nitrogen bubble. In addition, the first item is accumulated by the above configuration The pressure of the chemical solution of the nitrogen gas bubbles can increase the diameter D3 of the first pressure accumulating cylinder 116, and the effect of dissolving the nitrogen gas bubbles in the first chemical liquid with nitrogen gas bubbles is enhanced.

詳細而言,減壓閥模組12包括一管路121、一減壓閥門122、一第一側調壓裝置123以及一第二側調壓裝置124,管路121連通於第一蓄壓筒116中的第三部件1166,其中管路121可分為一次側管121A與二次側管121B,一次側管121A連通於二次側管121B,管路121之一次側管121A設置第一側調整裝置123,管路121之二次側管121B設置第二側調整裝置124,減壓閥門122設置於第一側調整裝置123與第二側調整裝置124之間,減壓閥門122藉由閥門中之管徑變化改變流體流至二次側管121B之壓力。第一側調壓裝置123包含一第一測壓表123A與一第一調壓元件123B,第一調壓元件123B用以調整一次側管121A內的壓力,並由第一測壓表123A顯示一次側管121A內的壓力值。第二側調壓裝置124包含一第二測壓表124A與一第二調壓元件124B,第二調壓元件124B用以調整二次側管121B內的壓力,並由第二測壓表124A顯示二次側管121B內的壓力值。在此配置之下,設定管路121中的一次側管121A與二次側管121B的初始壓力為均等,換言之,透過減壓閥門122與第一調壓元件123B調節,使得一次側管121A內的壓力保持大於二次側管121B內的壓力,而第一蓄壓筒116連通管路121之一次側管121A,透過上述減壓閥模組12之調節,以將壓力蓄集到第一蓄壓筒116之內,故可維持氮氣氣泡溶解於藥液L的含量。 Specifically, the pressure reducing valve module 12 includes a pipeline 121, a pressure reducing valve 122, a first side pressure regulating device 123, and a second side pressure regulating device 124. The pipeline 121 is connected to the first pressure accumulating cylinder. The third member 1166 of 116, wherein the pipeline 121 can be divided into a primary side tube 121A and a secondary side tube 121B, the primary side tube 121A is in communication with the secondary side tube 121B, and the primary side tube 121A of the line 121 is disposed on the first side. The adjusting device 123, the secondary side tube 121B of the pipeline 121 is provided with a second side adjusting device 124, the pressure reducing valve 122 is disposed between the first side adjusting device 123 and the second side adjusting device 124, and the pressure reducing valve 122 is provided by the valve The change in the diameter of the tube changes the pressure of the fluid flow to the secondary side tube 121B. The first pressure regulating device 123 includes a first pressure gauge 123A and a first pressure regulating component 123B. The first pressure regulating component 123B is used to adjust the pressure in the primary side tube 121A, and is displayed by the first pressure gauge 123A. The pressure value in the primary side tube 121A. The second pressure regulating device 124 includes a second pressure gauge 124A and a second pressure regulating element 124B. The second pressure regulating component 124B is used to adjust the pressure in the secondary side tube 121B, and is used by the second pressure gauge 124A. The pressure value in the secondary side tube 121B is displayed. Under this configuration, the initial pressures of the primary side tube 121A and the secondary side tube 121B in the set line 121 are equal, in other words, adjusted by the pressure reducing valve 122 and the first pressure regulating element 123B, so that the primary side tube 121A is inside. The pressure is kept larger than the pressure in the secondary side tube 121B, and the first pressure accumulating cylinder 116 communicates with the primary side tube 121A of the pipeline 121, and is adjusted by the pressure reducing valve module 12 to accumulate the pressure to the first storage. The inside of the pressure cylinder 116 can maintain the content of the nitrogen gas bubbles dissolved in the chemical liquid L.

圖5A為本發明之氣液混合機構第二實施例的示意圖。請參閱圖5A,需說明的是,圖5A的氣液混合機構20與圖1的氣液混合機構10相似,其中相同的構件以相同的標號表示且具有相同的功能而不再重複說 明,以下僅說明差異處。圖5A與圖1的差異在於:氣液混合機構20更包括一第二氮氣溶解裝置13,第二氮氣溶解裝置13連通於第一蓄壓筒116與減壓閥模組12之間。第二氮氣溶解裝置13包括一氮氣輸入管131、一藥液輸入管132、一第二匯流管133、一第二細化管134以及一第二蓄壓筒136。氮氣輸入管131連通於第二匯流管133,藥液輸入管132連通於第二匯流管133,第二匯流管133連通於第二細化管134,且第二細化管134連通於第二蓄壓筒136,以構成第二氮氣溶解裝置12。 Fig. 5A is a schematic view showing a second embodiment of the gas-liquid mixing mechanism of the present invention. Referring to FIG. 5A, it should be noted that the gas-liquid mixing mechanism 20 of FIG. 5A is similar to the gas-liquid mixing mechanism 10 of FIG. 1, wherein the same components are denoted by the same reference numerals and have the same functions and will not be repeated. The following only explains the differences. The difference between FIG. 5A and FIG. 1 is that the gas-liquid mixing mechanism 20 further includes a second nitrogen dissolving device 13 that is in communication with the first accumulator tube 116 and the pressure reducing valve module 12. The second nitrogen dissolving device 13 includes a nitrogen gas input pipe 131, a chemical liquid input pipe 132, a second manifold pipe 133, a second thinning pipe 134, and a second pressure accumulating cylinder 136. The nitrogen inlet pipe 131 is in communication with the second manifold 133, the drug inlet pipe 132 is in communication with the second manifold 133, the second manifold 133 is in communication with the second capillary 134, and the second capillary 134 is in communication with the second The accumulator 136 is configured to constitute the second nitrogen dissolving device 12.

在本實施例中,藥液輸入管132連通於第一蓄壓筒116,第一蓄壓筒116用以輸出第一具氮氣氣泡之藥液至藥液輸入管132,藥液輸入管132用以輸出第一具氮氣氣泡之藥液至第二匯流管133。氮氣輸入管131的設置、作法與功能均類似於圖1至圖2中的氮氣輸入管111,故氮氣輸入管131可參閱前述圖1至圖2中的氮氣輸入管111,氮氣輸入管131用以輸入氮氣G至第二匯流管133,使得氮氣G與第一具氮氣氣泡之藥液於第二匯流管133交會。因此,本實施例藉由前述第一氮氣溶解裝置11來有效讓氮氣氣泡溶解於藥液L,更藉由多設置第二氮氣溶解裝置13,以增加氮氣G於藥液L內的含量,來提升整體藥液L內氮氣G的氮氣量。在其他實施例中,可增加其他數量之氮氣溶解裝置,端視實際製程而可調整。 In the present embodiment, the chemical liquid input pipe 132 is connected to the first pressure accumulating cylinder 116, and the first pressure accumulating cylinder 116 is configured to output the first chemical liquid having nitrogen gas bubbles to the chemical liquid input pipe 132, and the chemical liquid input pipe 132 is used. The first chemical solution with nitrogen gas bubbles is output to the second manifold 133. The setting, operation and function of the nitrogen inlet pipe 131 are similar to the nitrogen inlet pipe 111 in FIG. 1 to FIG. 2, so the nitrogen inlet pipe 131 can be referred to the nitrogen inlet pipe 111 in the foregoing FIGS. 1 to 2, and the nitrogen inlet pipe 131 is used. The nitrogen gas G is supplied to the second manifold 133 so that the nitrogen gas G and the first nitrogen gas bubble are mixed at the second manifold 133. Therefore, in the present embodiment, the first nitrogen gas dissolving device 11 is used to effectively dissolve the nitrogen gas bubbles in the chemical liquid L, and the second nitrogen dissolving device 13 is further provided to increase the content of the nitrogen gas G in the chemical liquid L. Increase the amount of nitrogen in the gas G in the entire liquid L. In other embodiments, other quantities of nitrogen dissolving means may be added, which may be adjusted depending on the actual process.

在本實施例中,第二細化管134內設置一第二細化裝置138,使氮氣G與第一具氮氣氣泡之藥液由第二匯流管133流入至第二細化管134時,第二細化裝置138係細化氮氣G為氮氣氣泡,氮氣氣泡較能與具氮氣氣泡之藥液快速且均勻混合,以提高溶解速率。需說明的是,第二細化裝置138的設置、作法與功能均類似於第一細化裝置118,故第二細化裝置138可 參閱前述第一細化裝置118。 In the embodiment, a second refining device 138 is disposed in the second refinement tube 134, so that the nitrogen gas G and the first chemical solution having nitrogen gas bubbles flow from the second manifold 133 to the second refinement tube 134. The second refining device 138 refines the nitrogen gas G into a nitrogen gas bubble, and the nitrogen gas bubble can be quickly and uniformly mixed with the chemical liquid with nitrogen gas bubbles to increase the dissolution rate. It should be noted that the arrangement, operation and function of the second refining device 138 are similar to the first refining device 118, so the second refining device 138 can See the first first refining device 118 described above.

在本實施例中,第二蓄壓筒136連通於第二細化管134,第二蓄壓筒136的管徑大於第二細化管134的管徑,以降低第一具氮氣氣泡之藥液的流速並加壓氮氣氣泡。因此,當第一具氮氣氣泡之藥液與氮氣氣泡由管徑小之第二細化管134流入至管徑大之第二蓄壓筒136時,第一具氮氣氣泡之藥液的流速降低並藉此加壓氮氣氣泡,使氮氣氣泡混入至第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液。當第二具氮氣氣泡之藥液由第二細化管134流入至第二蓄壓筒136時,減壓閥模組12用以調節並蓄壓第二蓄壓筒136內第二具氮氣氣泡之藥液之壓力,以輸出第二具氮氣氣泡之藥液。需說明的是,第二蓄壓筒136的設置、作法與功能均類似於第一蓄壓筒116,可參閱圖1至圖4所述第一蓄壓筒116,並透過上述減壓閥模組12之調節,以將壓力蓄集到第二蓄壓筒136之內。此外,第二蓄壓筒136的管徑D4大於第一蓄壓筒116的管徑D3,可提升氮氣氣泡溶解於第二具氮氣氣泡之藥液的效果。 In this embodiment, the second accumulator 136 is connected to the second refinement tube 134, and the diameter of the second accumulator 136 is larger than the diameter of the second refinement tube 134 to reduce the first nitrogen bubble. The flow rate of the liquid is pressurized with nitrogen gas bubbles. Therefore, when the first nitrogen gas bubble liquid and the nitrogen gas bubble flow from the second thin tube 134 having a small diameter to the second pressure storage tube 136 having a large diameter, the flow rate of the first nitrogen gas bubble is lowered. In this way, the nitrogen gas bubbles are pressurized, and the nitrogen gas bubbles are mixed into the first nitrogen gas bubble liquid to be a second nitrogen gas bubble liquid. When the second nitrogen gas bubble liquid flows from the second refinement tube 134 to the second accumulator tube 136, the pressure reducing valve module 12 is used to adjust and accumulate the second nitrogen gas bubble in the second accumulator tube 136. The pressure of the liquid medicine to output a second liquid solution with nitrogen gas bubbles. It should be noted that the second accumulator 136 is similar to the first accumulator 116, and can be referred to the first accumulator 116 as shown in FIG. 1 to FIG. The adjustment of the group 12 is to accumulate pressure within the second accumulator 136. In addition, the diameter D4 of the second accumulator 136 is larger than the diameter D3 of the first accumulator 16, and the effect of dissolving nitrogen bubbles in the second chemical solution of nitrogen bubbles can be enhanced.

圖5B為本發明之氣液混合機構第三實施例的示意圖。請參閱圖5B,需說明的是,圖5B的氣液混合機構30與圖1的氣液混合機構10及圖5A的氣液混合機構20相似,其中相同的構件以相同的標號表示且具有相同的功能而不再重複說明,以下僅說明差異處。圖5A與圖5B的差異在於:圖5B中的第一氮氣溶解裝置13中的第一蓄壓筒216的管徑D5不同於圖5A中的第一氮氣溶解裝置13中的第一蓄壓筒116的管徑D3;圖5B中的第二氮氣溶解裝置13中的第二蓄壓筒236的管徑D6不同於圖5A中的第二氮氣溶解裝置13中的第二蓄壓筒136,其中圖5B中的第一蓄壓筒216的管徑D5大於第二蓄壓 筒236的管徑D6。 Fig. 5B is a schematic view showing a third embodiment of the gas-liquid mixing mechanism of the present invention. Referring to FIG. 5B, it should be noted that the gas-liquid mixing mechanism 30 of FIG. 5B is similar to the gas-liquid mixing mechanism 10 of FIG. 1 and the gas-liquid mixing mechanism 20 of FIG. 5A, wherein the same components are denoted by the same reference numerals and have the same The function is not repeated, the following only explains the difference. The difference between FIG. 5A and FIG. 5B is that the diameter D5 of the first accumulator 216 in the first nitrogen dissolving device 13 in FIG. 5B is different from the first accumulator in the first nitrogen dissolving device 13 in FIG. 5A. The pipe diameter D3 of 116; the pipe diameter D6 of the second accumulator 236 in the second nitrogen dissolving device 13 in Fig. 5B is different from the second accumulator 136 in the second nitrogen dissolving device 13 in Fig. 5A, wherein The diameter D5 of the first accumulator 216 in FIG. 5B is greater than the second accumulator The diameter D6 of the barrel 236.

在本實施例中,藉由上述配置而蓄集第一具氮氣氣泡之藥液之壓力,讓氮氣氣泡更溶解於藥液L,此外,本實施例中的第一蓄壓筒216的管徑D5大於圖5A之第一蓄壓筒116的管徑D3,換言之,本實施例增大第一蓄壓筒216的管徑D5,藉此提升氮氣氣泡溶解於第一具氮氣氣泡之藥液的效果,並且,更藉由設置第二氮氣溶解裝置13,以增加氮氣G於藥液L內的含量,來提升整體藥液L內氮氣G的氮氣量。 In the present embodiment, the pressure of the first chemical solution having nitrogen gas bubbles is accumulated by the above configuration, and the nitrogen gas bubbles are more dissolved in the chemical liquid L. Further, the diameter of the first pressure accumulating cylinder 216 in this embodiment is D5 is larger than the diameter D3 of the first pressure accumulating cylinder 116 of FIG. 5A. In other words, the present embodiment increases the diameter D5 of the first pressure accumulating cylinder 216, thereby enhancing the dissolution of the nitrogen gas bubble in the first chemical solution with nitrogen gas bubbles. As a result, the amount of nitrogen gas of the nitrogen gas G in the entire chemical liquid L is increased by providing the second nitrogen gas dissolving device 13 to increase the content of the nitrogen gas G in the chemical liquid L.

圖6為本發明之製程設備的示意圖。請參閱圖6,本實施例的製程設備50為一顯影機,製程設備50包括一藥液槽51、一處理裝置52、一噴灑泵浦53、一循環泵浦54、一第一電導度計55、一第二電導度計56、一回收管57、一排液管58以及一氣液混合機構10,其中第一電導度計55連接於氣液混合機構10,第一電導度計55用以監測由氣液混合機構10輸出之藥液L之電導度,且第二電導度計56連接於藥液槽51,第二電導度計56用以監測藥液槽51內藥液L之電導度。藥液槽51存儲藥液L,處理裝置52係以藥液槽51提供之藥液L處理一基板,氣液混合機10係接收藥液槽51之藥液L。噴灑泵浦53之一端連接藥液槽51,噴灑泵浦53之另一端連接處理裝置52,藉由噴灑泵浦53使得藥液槽51連通於處理裝置52,回收管57之一端連接處理裝置52,回收管57之另一端連接藥液槽51,排液管58之一端連接藥液槽51,排液管58之另一端則連接外部。藥液槽51用以提供藥液L至噴灑泵浦53,噴灑泵浦53將藥液L傳輸至處理裝置52中的噴淋管521,並藉由噴頭522噴灑藥液L,以進行相對應的製程,後續可藉由回收管57回收藥液L至藥液槽51,並且,當藥液槽51內的液位超過一定預設值時,可藉由排液管58排出至外 部。 Figure 6 is a schematic illustration of a process apparatus of the present invention. Referring to FIG. 6, the process device 50 of the embodiment is a developing device. The process device 50 includes a chemical tank 51, a processing device 52, a spray pump 53, a circulating pump 54, and a first conductivity meter. 55, a second conductivity meter 56, a recovery tube 57, a drain tube 58 and a gas-liquid mixing mechanism 10, wherein the first conductivity meter 55 is connected to the gas-liquid mixing mechanism 10, the first conductivity meter 55 is used The electrical conductivity of the chemical liquid L outputted by the gas-liquid mixing mechanism 10 is monitored, and the second electrical conductivity meter 56 is connected to the chemical liquid tank 51, and the second electrical conductivity meter 56 is used to monitor the electrical conductivity of the chemical liquid L in the chemical liquid tank 51. . The chemical solution tank 51 stores the chemical liquid L, the processing device 52 treats a substrate with the chemical liquid L supplied from the chemical liquid tank 51, and the gas-liquid mixer 10 receives the chemical liquid L of the chemical liquid tank 51. One end of the spray pump 53 is connected to the chemical tank 51, and the other end of the spray pump 53 is connected to the processing device 52. The spray tank 53 is connected to the processing device 52, and one end of the recovery tube 57 is connected to the processing device 52. The other end of the recovery pipe 57 is connected to the chemical liquid tank 51. One end of the liquid discharge pipe 58 is connected to the chemical liquid tank 51, and the other end of the liquid discharge pipe 58 is connected to the outside. The liquid medicine tank 51 is used to supply the chemical liquid L to the spray pump 53, and the spray pump 53 transports the liquid medicine L to the spray pipe 521 in the processing device 52, and sprays the liquid medicine L through the spray head 522 to perform corresponding After the process, the liquid L can be recovered by the recovery pipe 57 to the liquid tank 51, and when the liquid level in the liquid tank 51 exceeds a certain preset value, it can be discharged to the outside by the drain pipe 58. unit.

在本實施例中,循環泵浦54之一端連通氣液混合機構10,循環泵浦54之另一端連通藥液槽51,藥液L由循環泵浦54輸出至氣液混合機構10之內,藥液L係經氣液混合機構10處理,第一電導度計55可量測由氣液混合機構10輸出之藥液L之電導度,並經由循環泵浦54輸回至藥液槽51之內,第二電導度計56可量測藥液槽51內藥液L之電導度。氣液混合機構10可參照圖1至圖4所述,透過第一氮氣溶解裝置11,使得藥液L與氮氣氣泡由管徑小之第一細化管114流入至管徑大之第一蓄壓筒116,藉此加壓氮氣氣泡,使得氮氣G更能溶解於藥液L之內,並透過減壓閥模組12之調節,以將壓力蓄集到第一蓄壓筒116之內,維持氮氣氣泡溶解於藥液L的含量,此舉可確實有效抑制藥液L中含二氧化碳量或含氧量的增加,故可降低第二電導度計56量測之藥液L之電導度,達到防止藥液L劣化的功能,來延長藥液使用壽命,進而減少藥液更換時間與降低製造成本,並增加生產製造效能。此外,亦可透過圖5A或圖5B所示的氣液混合機構10,設置第二氮氣溶解裝置13,來增加氮氣G於藥液L內的含量,來提升整體藥液L內氮氣G的氮氣量,以強化防止藥液L劣化的功能。需說明的是,本實施例之氣液混合機構10與第一電導度計55係設置在循環泵浦54之上,在另一實施例中,如圖6中虛線所示之氣液混合機構10與第一電導度計55係可設置在噴灑泵浦53之上,在此配置之下,噴灑泵浦53係輸入藥液槽51內的藥液L至氣液混合機構A,氣液混合機構10處理藥液L以抑制藥液L中含二氧化碳量或含氧量的增加,藉此降低藥液L之電導度值,而藥液L之電導度係可由第一電導度計55所量測,接著,經由氣液混合機構10處理後的藥液L被噴灑泵浦53傳輸至處理裝置52,以供 給至基板。 In the present embodiment, one end of the circulation pump 54 is connected to the gas-liquid mixing mechanism 10, and the other end of the circulation pump 54 is connected to the liquid medicine tank 51, and the liquid medicine L is output from the circulation pump 54 to the gas-liquid mixing mechanism 10. The chemical liquid L is processed by the gas-liquid mixing mechanism 10, and the first conductivity meter 55 can measure the electrical conductivity of the chemical liquid L outputted by the gas-liquid mixing mechanism 10, and is returned to the liquid medicine tank 51 via the circulation pump 54. The second conductivity meter 56 can measure the electrical conductivity of the drug solution L in the drug solution tank 51. The gas-liquid mixing mechanism 10 can pass through the first nitrogen dissolving device 11 as described above with reference to FIGS. 1 to 4, so that the chemical liquid L and the nitrogen gas bubbles flow from the first thinning tube 114 having a small diameter to the first large diameter tube. The pressure cylinder 116, thereby pressurizing the nitrogen gas bubble, so that the nitrogen gas G is more soluble in the chemical liquid L, and is adjusted by the pressure reducing valve module 12 to accumulate the pressure into the first pressure accumulating cylinder 116. The content of the nitrogen gas bubble dissolved in the chemical liquid L is maintained, which can effectively suppress the increase of the carbon dioxide content or the oxygen content in the chemical liquid L, so that the electrical conductivity of the chemical liquid L measured by the second electrical conductivity meter 56 can be reduced. The function of preventing the deterioration of the liquid L is achieved to prolong the service life of the liquid, thereby reducing the time for replacing the liquid and reducing the manufacturing cost, and increasing the manufacturing efficiency. In addition, the second nitrogen dissolving device 13 may be provided through the gas-liquid mixing mechanism 10 shown in FIG. 5A or FIG. 5B to increase the content of the nitrogen gas G in the chemical liquid L, thereby increasing the nitrogen gas of the nitrogen gas G in the entire chemical liquid L. The amount is to strengthen the function of preventing the deterioration of the chemical liquid L. It should be noted that the gas-liquid mixing mechanism 10 and the first conductivity meter 55 of the present embodiment are disposed above the circulation pump 54, and in another embodiment, the gas-liquid mixing mechanism shown by the broken line in FIG. 10 and the first conductivity meter 55 may be disposed above the spray pump 53. Under this configuration, the spray pump 53 is input into the liquid medicine L in the liquid tank 51 to the gas-liquid mixing mechanism A, and the gas-liquid mixing The mechanism 10 processes the chemical liquid L to suppress the increase of the carbon dioxide content or the oxygen content in the chemical liquid L, thereby reducing the electrical conductivity value of the chemical liquid L, and the electrical conductivity of the chemical liquid L can be measured by the first electrical conductivity meter 55. Then, the chemical liquid L processed by the gas-liquid mixing mechanism 10 is transmitted to the processing device 52 by the spray pump 53 for Give to the substrate.

圖7為本發明之氣液混合方法第一實施例的示意圖。請參閱圖7,本實施例之氣液混合方法S10能適用於圖1之氣液混合機構10。氣液混合方法S10包括以下步驟S110至步驟S130。於步驟S110中,輸入一氮氣G至一藥液L。以圖1為例,氮氣輸入管111用以輸入氮氣G至第一匯流管113,使得氮氣G與藥液L於第一匯流管113交會。據此,假設各個氣體在常溫下具相同分壓,氮氣G可較如二氧化碳或氧氣等氣體更溶解於藥液L之內,藉由氮氣G溶解於藥液L之內,可確實有效抑制藥液L中含二氧化碳量或含氧量的增加,並使得藥液L的電導度下降,達到防止藥液L劣化的功能。 Fig. 7 is a schematic view showing the first embodiment of the gas-liquid mixing method of the present invention. Referring to FIG. 7, the gas-liquid mixing method S10 of the present embodiment can be applied to the gas-liquid mixing mechanism 10 of FIG. The gas-liquid mixing method S10 includes the following steps S110 to S130. In step S110, a nitrogen gas G is input to a chemical liquid L. Taking FIG. 1 as an example, the nitrogen inlet pipe 111 is used to input the nitrogen gas G to the first manifold 113 so that the nitrogen gas G and the chemical liquid L meet at the first manifold 113. Accordingly, it is assumed that each gas has the same partial pressure at normal temperature, and nitrogen gas G can be dissolved in the liquid L more than a gas such as carbon dioxide or oxygen, and the nitrogen gas G is dissolved in the liquid L, which can effectively inhibit the drug. The liquid L contains an increase in the amount of carbon dioxide or oxygen, and causes the electrical conductivity of the chemical liquid L to decrease, thereby achieving a function of preventing deterioration of the chemical liquid L.

進行步驟S120,細化氮氣G為一氮氣氣泡,並加壓氮氣氣泡,使氮氣氣泡混入至藥液L而為一第一具氮氣氣泡之藥液。詳細而言,以圖1為例,第一細化管114內設置第一細化裝置118,使氮氣G與藥液L由一第一匯流管113流入至一第一細化管114時,第一細化裝置118係細化氮氣G為一氮氣氣泡,氮氣氣泡較能與藥液L快速且均勻混合,以提高溶解速率。需說明的是,第一細化裝置118例如可採用如圖3與圖4所示,然本發明不對第一細化裝置加以限制,在其他實施例中,第一細化裝置可為一濾網、一鰭片組、一濾膜或一多孔性陶瓷細化片。 In step S120, the nitrogen gas G is refined into a nitrogen gas bubble, and the nitrogen gas bubble is pressurized, and the nitrogen gas bubble is mixed into the chemical liquid L to be a first chemical liquid having a nitrogen gas bubble. Specifically, taking FIG. 1 as an example, a first refining device 118 is disposed in the first refinement tube 114 to allow the nitrogen gas G and the chemical liquid L to flow from a first manifold 113 to a first refinement tube 114. The first refining device 118 refines the nitrogen gas G into a nitrogen gas bubble, and the nitrogen gas bubble can be quickly and uniformly mixed with the chemical liquid L to increase the dissolution rate. It should be noted that the first refinement device 118 can be, for example, as shown in FIG. 3 and FIG. 4, but the present invention does not limit the first refinement device. In other embodiments, the first refinement device can be a filter. A mesh, a fin set, a filter or a porous ceramic refining sheet.

另一方面,本實施例之第一蓄壓筒116的管徑D3大於第一細化管114的管徑D2,以降低該藥液L的流速並加壓該氮氣氣泡。因此,當藥液L與氮氣氣泡由管徑小之第一細化管114流入至管徑大之第一蓄壓筒116時,藥液L的流速降低並藉此加壓氮氣氣泡,使氮氣氣泡混入至藥液L而為一第一具氮氣氣泡之藥液。藉此,透過前述管徑不同的結構差異,以加壓 氮氣氣泡,除了提升氮氣氣泡之分壓壓力以外,也可提升總體氣體壓力之飽和度,亦可增加氮氣氣泡溶解於藥液L的含量,可使氮氣氣泡更能溶解於藥液L之內。 On the other hand, the diameter D3 of the first accumulator tube 116 of the present embodiment is larger than the tube diameter D2 of the first refining tube 114 to lower the flow rate of the chemical liquid L and pressurize the nitrogen gas bubble. Therefore, when the chemical liquid L and the nitrogen gas bubble flow from the first thin tube 114 having a small diameter to the first pressure storage tube 116 having a large diameter, the flow rate of the chemical liquid L is lowered and thereby the nitrogen gas bubble is pressurized to make the nitrogen gas The air bubbles are mixed into the chemical liquid L to be a first chemical liquid having a nitrogen gas bubble. Thereby, the pressure is transmitted through the difference in the structure of the pipe diameter Nitrogen gas bubbles, in addition to increasing the partial pressure of nitrogen gas bubbles, can also increase the saturation of the overall gas pressure, and can also increase the content of nitrogen gas bubbles dissolved in the liquid L, so that the nitrogen gas bubbles can be more dissolved in the liquid L.

於步驟S130中,蓄壓第一具氮氣氣泡之藥液。詳細而言,以圖1為例,使第一具氮氣氣泡之藥液由第一細化管114流入至一第一蓄壓筒116,減壓閥模組12用以調節並蓄壓第一蓄壓筒116內第一具氮氣氣泡之藥液之壓力,以輸出第一具氮氣氣泡之藥液。需說明的是,第一蓄壓筒116的設置、作法與功能例如可採用可參閱前述圖1至圖2,而減壓閥模組12的調節以將壓力蓄集到第一蓄壓筒116之內可參閱圖1至圖2所述。 In step S130, the first chemical liquid having nitrogen gas bubbles is accumulated. Specifically, taking FIG. 1 as an example, the first chemical liquid having nitrogen gas bubbles flows from the first refinement tube 114 to a first accumulator tube 116, and the pressure reducing valve module 12 is used to adjust and accumulate the first The pressure of the first nitrogen gas bubble in the pressure accumulator 116 is output to output the first chemical liquid with nitrogen gas bubbles. It should be noted that, for example, the arrangement, the operation and the function of the first accumulator tube 116 can be referred to the aforementioned FIGS. 1 to 2, and the adjustment of the pressure reducing valve module 12 to accumulate the pressure to the first accumulator tube 116. See Figure 1 through Figure 2 for details.

圖8為本發明之氣液混合方法第二實施例的示意圖。請參閱圖8,本實施例之氣液混合方法S20能適用於圖5A之氣液混合機構20或圖5B之氣液混合機構30。氣液混合方法20包括以下步驟S210至步驟S260,其中圖8的步驟S210與圖7的步驟S110相同,圖8的步驟S220與圖7的步驟S120相同,圖8的步驟S230與圖7的步驟S130相同,且具有相同的功能而不再重複說明,以下僅說明差異處。於步驟S240中,輸入氮氣G至第一具氮氣氣泡之藥液。以圖5A或圖5B為例,藥液輸入管132用以輸出第一具氮氣氣泡之藥液至第二匯流管133,氮氣輸入管131用以輸入氮氣G至第二匯流管133,使得氮氣G與第一具氮氣氣泡之藥液於第二匯流管133交會。因此,本實施例藉由前述第一氮氣溶解裝置11來有效讓氮氣氣泡溶解於藥液L,更能藉由多設置第二氮氣溶解裝置13,以增加氮氣G於藥液L內的含量,來提升整體藥液L內氮氣G的氮氣量。此外,於步驟S240中,在一實施例中,輸入氮氣至藥液之氮氣量大於輸入氮氣至第一具氮氣氣泡之藥液之氮氣量,以圖5A或圖 5B為例,第一匯流管113輸入氮氣G之氮氣量大於第二匯流管133輸入氮氣G之氮氣量。於步驟S250,細化氮氣為氮氣氣泡,並加壓氮氣氣泡,使氮氣氣泡混入至第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液。詳細而言,以圖5A或圖5B為例,第二細化管134內設置第二細化裝置138,使氮氣G與第一具氮氣氣泡之藥液由第二匯流管133流入至第二細化管134時,第二細化管134中的第二細化裝置138係細化氮氣G為一氮氣氣泡,氮氣氣泡較能與第一具氮氣氣泡之藥液快速且均勻混合,以提高溶解速率,並且,由於第二蓄壓筒136的管徑大於第二細化管134的管徑,故使氮氣氣泡與第一具氮氣氣泡之藥液由管徑小之第二細化管134流入至管徑大之第二蓄壓筒136,以降低第一具氮氣氣泡之藥液的流速並藉此加壓氮氣氣泡,使氮氣氣泡混入至第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液。藉此,透過前述管徑不同的結構差異,以加壓氮氣氣泡,除了提升氮氣氣泡之分壓壓力以外,也可提升總體氣體壓力之飽和度,亦可增加氮氣氣泡溶解於藥液L的含量,可使氮氣氣泡更能溶解於藥液L之內。於步驟S260,蓄壓第二具氮氣氣泡之藥液以輸出第二具氮氣氣泡之藥液。詳細而言,使第二具氮氣氣泡之藥液由第二細化管134流入至第二蓄壓筒136,減壓閥模組12用以調節並蓄壓第二蓄壓筒136內第二具氮氣氣泡之藥液之壓力,以輸出第二具氮氣氣泡之藥液。此外,如圖5B所示的第一蓄壓筒216的管徑D5大於圖5A或圖1所示的第一蓄壓筒116的管徑D3,換言之,圖5B之實施例藉由增大第一蓄壓筒216的管徑D5,讓氮氣氣泡溶解於第一具氮氣氣泡之藥液的效果提升。另外,如圖5A所示,第二蓄壓筒136的管徑D4大於第一蓄壓筒116的管徑D3,亦可讓氮氣氣泡溶解於第二具氮氣氣泡之藥液的效果提升。 Figure 8 is a schematic view showing a second embodiment of the gas-liquid mixing method of the present invention. Referring to FIG. 8, the gas-liquid mixing method S20 of the present embodiment can be applied to the gas-liquid mixing mechanism 20 of FIG. 5A or the gas-liquid mixing mechanism 30 of FIG. 5B. The gas-liquid mixing method 20 includes the following steps S210 to S260, wherein the step S210 of FIG. 8 is the same as the step S110 of FIG. 7, the step S220 of FIG. 8 is the same as the step S120 of FIG. 7, and the step S230 of FIG. 8 and the step of FIG. S130 is the same and has the same function and will not be repeatedly described. Only differences will be described below. In step S240, nitrogen gas G is input to the first chemical liquid having nitrogen gas bubbles. Taking FIG. 5A or FIG. 5B as an example, the chemical liquid input pipe 132 is configured to output the first chemical liquid with nitrogen gas bubbles to the second manifold 133, and the nitrogen gas input pipe 131 is used for inputting the nitrogen gas G to the second manifold 133 to make nitrogen gas. G and the first nitrogen gas bubble liquid meet at the second manifold 133. Therefore, in the present embodiment, the first nitrogen dissolving device 11 is used to effectively dissolve the nitrogen gas bubbles in the chemical liquid L, and the second nitrogen dissolving device 13 can be further provided to increase the content of the nitrogen gas G in the liquid L. To increase the amount of nitrogen in the whole liquid L in the liquid L. In addition, in step S240, in an embodiment, the amount of nitrogen input into the chemical liquid is greater than the amount of nitrogen input to the first nitrogen gas bubble, as shown in FIG. 5A or For example, in 5B, the amount of nitrogen gas input into the first bus bar 113 by the nitrogen gas G is larger than the amount of nitrogen gas input into the second bus bar 133 into the nitrogen gas G. In step S250, the nitrogen gas is refined into a nitrogen gas bubble, and the nitrogen gas bubble is pressurized, and the nitrogen gas bubble is mixed into the first nitrogen gas bubble liquid to be a second nitrogen gas bubble liquid. Specifically, taking FIG. 5A or FIG. 5B as an example, a second refining device 138 is disposed in the second refinement tube 134 to allow the nitrogen gas G and the first nitrogen gas bubble liquid to flow from the second manifold 133 to the second When the tube 134 is refined, the second refining device 138 in the second refinement tube 134 refines the nitrogen gas G into a nitrogen gas bubble, and the nitrogen gas bubble can be quickly and uniformly mixed with the first nitrogen gas bubble liquid to improve The dissolution rate, and since the diameter of the second accumulator 136 is larger than the diameter of the second refining tube 134, the nitrogen gas bubble and the first nitrogen gas bubble are made of a second thin tube 134 having a small diameter. Flowing into the second accumulator 136 having a large diameter to reduce the flow rate of the first nitrogen gas bubble and thereby pressurizing the nitrogen gas bubble to mix the nitrogen gas bubble into the first nitrogen gas bubble Two liquid medicines with nitrogen bubbles. Thereby, through the difference in the structure of the pipe diameter, the nitrogen gas bubble is pressurized, in addition to increasing the partial pressure of the nitrogen gas bubble, the saturation of the overall gas pressure can be increased, and the content of the nitrogen gas bubble dissolved in the liquid L can also be increased. , the nitrogen bubble can be more dissolved in the liquid L. In step S260, the second nitrogen gas bubble liquid is accumulated to output a second nitrogen gas bubble liquid. Specifically, the second nitrogen gas bubble is caused to flow from the second refinement tube 134 to the second accumulator 136, and the pressure reducing valve module 12 is used to adjust and accumulate the second pressure in the second accumulator 136. The pressure of the liquid medicine with nitrogen gas bubbles is used to output a liquid medicine with a second nitrogen bubble. In addition, the diameter D5 of the first accumulator 216 shown in FIG. 5B is larger than the diameter D3 of the first accumulator 116 shown in FIG. 5A or FIG. 1, in other words, the embodiment of FIG. 5B is increased by The tube diameter D5 of the accumulator tube 216 enhances the effect of dissolving the nitrogen gas bubbles in the first chemical solution having nitrogen gas bubbles. Further, as shown in FIG. 5A, the diameter D4 of the second accumulator tube 136 is larger than the tube diameter D3 of the first accumulator tube 116, and the effect of dissolving the nitrogen gas bubbles in the second chemical solution of the nitrogen gas bubbles can be enhanced.

請參見下述表一至表三,表一至表三分別係為本發明氣液混合機構用於如圖6所示的製程設備的實驗數據。請先參閱表一,表一係以圖5A的氣液混合機構20為例,並僅開啟第一蓄壓筒116或第二蓄壓筒136作為比較依據,亦即表一係以單一蓄壓筒(如圖1的氣液混合機構10)實施後的電導度值。 Please refer to Tables 1 to 3 below. Tables 1 to 3 are the experimental data of the gas-liquid mixing mechanism of the present invention for the process equipment shown in FIG. Please refer to Table 1 first. Table 1 is taken as an example of the gas-liquid mixing mechanism 20 of FIG. 5A, and only the first accumulator tube 116 or the second accumulator tube 136 is opened for comparison, that is, the table 1 is a single accumulator. The conductivity value of the cylinder (such as the gas-liquid mixing mechanism 10 of Fig. 1) is implemented.

上述表一中,一次側管121A內循環流量(LPM)與壓力(Mpa)可由減壓閥門122與第一調壓元件123B調整一次側管121A內的壓力,並由第一測壓表123A顯示一次側管121A內的壓力值,在本實施例中,增加一次側 管121A內壓力至0.21Mpa,同時降低一次側管121A內的流量(約為80LPM)。首先,請參照表一中的項次A0~A3,表一中的項次A0為關閉第一蓄壓筒116與關閉第二蓄壓筒136,項次A1~A3分別代表開啟第一蓄壓筒116並注入不同氮氣量之氮氣至第一蓄壓筒116,並關閉第二蓄壓筒136,相比之下,於相同之流量(壓力)的設定條件下,由項次A0與A3的數值趨勢可知,注入較多的氮氣量可使得藥液槽51內藥液L之電導度值呈下降的趨勢,即驗證藉由氮氣G溶解於藥液L之內,可確實有效抑制藥液L中含二氧化碳量或含氧量的增加。接著,請參照表一中的項次A0、A4~A6,項次A4~A6分別代表開啟第二蓄壓筒136並注入不同氮氣量至第二蓄壓筒136,並關閉第一蓄壓筒116,相比之下,在相同之流量(壓力)的設定條件下,由項次A0與A6的數值趨勢可知,亦有注入較多的氮氣量可使得藥液槽51內藥液L之電導度值下降越多的趨勢。 In the above Table 1, the circulating flow rate (LPM) and the pressure (Mpa) in the primary side pipe 121A can be adjusted by the pressure reducing valve 122 and the first pressure regulating element 123B to the pressure in the primary side pipe 121A, and are displayed by the first pressure gauge 123A. The pressure value in the primary side tube 121A, in the present embodiment, the primary side is increased The pressure in the tube 121A was 0.21 MPa while reducing the flow rate in the primary side tube 121A (about 80 LPM). First, please refer to the items A0~A3 in Table 1. The item A0 in Table 1 is to close the first accumulator tube 116 and close the second accumulator tube 136, and the items A1~A3 respectively represent the first accumulator pressure. The canister 116 injects nitrogen gas of different nitrogen amounts into the first accumulator cylinder 116, and closes the second accumulator cylinder 136, in contrast to the conditions of the same flow rate (pressure), by the items A0 and A3. The numerical trend shows that the amount of nitrogen gas injected can make the conductivity value of the liquid L in the liquid tank 51 decrease, that is, it is verified that the nitrogen gas G is dissolved in the liquid L, and the liquid L can be effectively suppressed. The amount of carbon dioxide or oxygen in the increase. Next, please refer to the items A0, A4~A6 in Table 1, and the items A4~A6 respectively represent the opening of the second accumulator 136 and injecting different amounts of nitrogen into the second accumulator 136, and closing the first accumulator 116, in contrast, under the same flow rate (pressure) setting conditions, it can be seen from the numerical trend of the items A0 and A6 that there is also a large amount of nitrogen injected to make the conductance of the liquid L in the liquid tank 51. The trend of decreasing the degree.

此外,項次A1~A3為開啟第一蓄壓筒116並關閉第二蓄壓筒136,項次A4~A6為開啟第二蓄壓筒136並關閉第一蓄壓筒116,由於第二蓄壓筒136的管徑D4大於第一蓄壓筒116的管徑D3,由表一可知,在相同之流量(壓力)的設定條件下,項次A4~A6中管徑大的第二蓄壓筒136的藥液槽51內藥液L之電導度值均小於項次A1~A3中管徑小的第一蓄壓筒116的藥液槽51內藥液L之電導度值,換言之,使用管徑大的第二蓄壓筒136的效果更優於管徑小的第一蓄壓筒116,因此,可透過增加蓄壓筒的管徑,更能大幅降低藥液槽51內藥液L之電導度值。舉例而言,如圖1所示,在僅有第一氮氣溶解裝置11的氣液混合機構10的設置之下,可增加第一蓄壓筒116的管徑D3,讓氮氣氣泡溶解於第一具氮氣氣泡之藥液的效果提升。 In addition, the items A1 to A3 are to open the first accumulator tube 116 and close the second accumulator tube 136, and the items A4 to A6 are to open the second accumulator tube 136 and close the first accumulator tube 116, because the second storage unit The diameter D4 of the pressure cylinder 136 is larger than the diameter D3 of the first pressure accumulation cylinder 116. As can be seen from Table 1, under the same flow rate (pressure) setting condition, the second pressure accumulation of the tube diameter is large in the case of A4~A6. The electrical conductivity value of the chemical liquid L in the chemical solution tank 51 of the cylinder 136 is smaller than the electrical conductivity value of the chemical liquid L in the chemical liquid tank 51 of the first pressure storage cylinder 116 having a small diameter in the items A1 to A3, in other words, The second accumulator 136 having a large diameter is more effective than the first accumulator 116 having a small diameter. Therefore, the diameter of the accumulator can be increased, and the liquid L in the sump 51 can be greatly reduced. The conductivity value. For example, as shown in FIG. 1, under the arrangement of the gas-liquid mixing mechanism 10 of only the first nitrogen dissolving device 11, the diameter D3 of the first accumulator tube 116 can be increased, so that the nitrogen gas bubbles are dissolved in the first The effect of the liquid with nitrogen bubbles is enhanced.

請見下表二,表二係以圖5A的氣液混合機構20為例,並一起開啟第一蓄壓筒116與第二蓄壓筒136作為比較依據,亦即表二係以複數個蓄壓筒實施後的電導度值。 Please refer to Table 2 below. Table 2 is taken as an example of the gas-liquid mixing mechanism 20 of FIG. 5A, and the first accumulator tube 116 and the second accumulator tube 136 are opened together for comparison, that is, the table 2 is a plurality of The conductivity value after the cylinder is implemented.

上述表二中,一次側管121A內循環流量(LPM)與壓力(Mpa)可由減壓閥門122與第一調壓元件123B調整一次側管121A內的壓力,並由第一測壓表123A顯示一次側管121A內的壓力值,在本實施例中,增加一次側管121A內壓力至0.21Mpa,同時降低一次側管121A內的流量(約為80LPM)。首先,項次B0代表關閉第一蓄壓筒116與關閉第二蓄壓筒136,項次B1~B3分別代表一起開啟第一蓄壓筒116與第二蓄壓筒136並注入不同氮氣量之氮氣至第一蓄壓筒116與第二蓄壓筒136。相較於表一中僅開啟第一蓄壓筒116或開啟第二蓄壓筒136的設定條件,在相同之流量(壓力)的設定條件 下,表二中項次B1~B3均顯示藥液槽51內藥液L之電導度值下降更多,換言之,本發明可透過增加蓄壓筒的數量來提升藥液槽51內藥液L之電導度值下降的趨勢。再者,如同前述表一結論,表二中由項次B0至B3的數值趨勢可知,亦呈現在相同之流量(壓力)的設定條件下,注入較多的氮氣量可使得藥液槽51內藥液L之電導度值下降越多。 In the above table 2, the circulation flow rate (LPM) and the pressure (Mpa) in the primary side pipe 121A can be adjusted by the pressure reducing valve 122 and the first pressure regulating element 123B to the pressure in the primary side pipe 121A, and are displayed by the first pressure gauge 123A. In the present embodiment, the pressure in the primary side tube 121A is increased to 0.21 MPa, and the flow rate in the primary side tube 121A (about 80 LPM) is decreased. First, the item B0 represents the closing of the first accumulator tube 116 and the closing of the second accumulator tube 136, and the items B1 to B3 respectively represent opening the first accumulator tube 116 and the second accumulator tube 136 together and injecting different amounts of nitrogen. Nitrogen gas is supplied to the first pressure accumulating cylinder 116 and the second pressure accumulating cylinder 136. The setting conditions of the same flow rate (pressure) are compared with the setting conditions in which only the first accumulator tube 116 is opened or the second accumulator tube 136 is opened in Table 1. Next, the items B1 to B3 in the second table show that the electrical conductivity value of the liquid medicine L in the liquid medicine tank 51 is decreased more. In other words, the present invention can increase the liquid medicine in the liquid medicine tank 51 by increasing the number of the pressure storage cylinders. The tendency of the conductivity value to decrease. Furthermore, as shown in Table 1 above, the numerical trend of the items B0 to B3 in Table 2 shows that under the same flow rate (pressure) setting conditions, the injection of more nitrogen can make the liquid tank 51 The more the conductivity value of the drug solution L drops.

請見下表三,表三係以圖5B的氣液混合機構30為例,並一起開啟第一蓄壓筒216與第二蓄壓筒236作為比較依據,亦即表三係以複數個蓄壓筒實施後的電導度值,表三與表二的不同之處在於:表三中的第一蓄壓筒216的管徑D5大於第二蓄壓筒236的管徑D6。 See Table 3 below. Table 3 is taken as an example of the gas-liquid mixing mechanism 30 of FIG. 5B, and the first pressure accumulating cylinder 216 and the second accumulator cylinder 236 are opened together as a comparison basis, that is, the table three is a plurality of The electrical conductivity values after the implementation of the pressure cylinder are different from those of the second embodiment in that the diameter D5 of the first pressure accumulating cylinder 216 in Table 3 is larger than the diameter D6 of the second pressure accumulating cylinder 236.

上述表三中,一次側管121A內循環流量(LPM)與壓力(Mpa)可由減壓閥門122與第一調壓元件123B調整一次側管121A內的壓力,並由第 一測壓表123A顯示一次側管121A內的壓力值,在本實施例中,增加一次側管121A內壓力至0.21Mpa,同時降低一次側管121A內的流量(約為80LPM)。項次C0代表關閉第一蓄壓筒216與關閉第二蓄壓筒236,項次C1~C3分別代表一起開啟第一蓄壓筒216與第二蓄壓筒236並注入不同氮氣量之氮氣至第一蓄壓筒216與第二蓄壓筒236。首先,相較於表一中僅開啟第一蓄壓筒116或僅開啟第二蓄壓筒136的設定條件,如同前述表二結論,在相同之流量(壓力)的設定條件下,表三中項次C1~C3均顯示藥液槽51內藥液L之電導度值下降更多,換言之,本發明可透過增加蓄壓筒的數量來提升藥液槽51內藥液L之電導度值下降的趨勢。再者,如同前述表一結論,表三中由項次C0與C3的數值趨勢可知,亦呈現在相同之流量(壓力)的設定條件下,注入較多的氮氣量可使得藥液槽51內藥液L之電導度值下降越多。 In the above table 3, the circulating flow rate (LPM) and the pressure (Mpa) in the primary side pipe 121A can be adjusted by the pressure reducing valve 122 and the first pressure regulating element 123B to the pressure in the primary side pipe 121A, and A pressure gauge 123A displays the pressure value in the primary side tube 121A. In the present embodiment, the pressure in the primary side tube 121A is increased to 0.21 MPa, and the flow rate in the primary side tube 121A (about 80 LPM) is lowered. Item C0 represents closing the first accumulator 216 and closing the second accumulator 236, and the items C1 C C3 respectively represent opening the first accumulator 216 and the second accumulating cylinder 236 together and injecting nitrogen gas of different nitrogen amounts to The first accumulator tube 216 and the second accumulator tube 236. First, compared with the setting conditions in which only the first accumulator tube 116 or only the second accumulator tube 136 is opened in Table 1, as in the above Table 2, under the same flow rate (pressure) setting conditions, Table 3 The items C1 to C3 all show that the conductivity value of the liquid L in the liquid solution tank 51 drops more. In other words, the present invention can increase the conductivity value of the liquid medicine L in the liquid medicine tank 51 by increasing the number of the pressure accumulating cylinders. the trend of. Furthermore, as shown in Table 1 above, the numerical trend of the items C0 and C3 in Table 3 shows that under the same flow rate (pressure) setting conditions, the injection of more nitrogen can make the liquid tank 51 The more the conductivity value of the drug solution L drops.

此外,表二為第一蓄壓筒116的管徑D3小於第二蓄壓筒136的管徑D4,表三為第一蓄壓筒216的管徑D5大於第二蓄壓筒236的管徑D6,比較表二與表三可知,表二的藥液槽51內藥液L之電導度值較佳,反應出先用管徑小的蓄壓筒再用管徑大的蓄壓筒,其效果會優於先用管徑大的蓄壓筒再用管徑小的蓄壓筒。但不論如何,本發明經由上述實驗驗證後,透過上述氣液混合機構中蓄壓筒的設置均可以讓藥液槽51內藥液L之電導度值達到下降的趨勢。 In addition, in Table 2, the pipe diameter D3 of the first accumulator cylinder 116 is smaller than the pipe diameter D4 of the second accumulator cylinder 136, and Table 3 shows that the pipe diameter D5 of the first accumulator cylinder 216 is larger than the pipe diameter of the second accumulator cylinder 236. D6, comparing Table 2 and Table 3, it can be seen that the conductivity value of the liquid L in the liquid tank 51 of Table 2 is better, and the pressure storage tube having a small diameter is used first, and the pressure storage tube having a large diameter is used. The effect is better than using an accumulator having a large diameter and a small accumulator having a small diameter. However, in any case, after the present invention is verified by the above experiment, the electric conductivity value of the chemical liquid L in the chemical solution tank 51 can be lowered by the arrangement of the pressure accumulating cylinder in the gas-liquid mixing mechanism.

綜上所述,在本發明的氣液混合機構、製程設備與氣液混合方法中,藉由氮氣溶解於藥液之內,可確實有效抑制藥液中含二氧化碳量或含氧量的增加,並使得藥液的電導度下降,達到防止藥液劣化的功能,並且,本發明透過實驗證明,注入較多的氮氣量確實可使得藥液槽內藥液 之電導度值下降越多。 As described above, in the gas-liquid mixing mechanism, the process equipment, and the gas-liquid mixing method of the present invention, the nitrogen gas is dissolved in the chemical liquid, and the increase in the carbon dioxide content or the oxygen content in the chemical liquid can be effectively suppressed. And the electrical conductivity of the chemical liquid is lowered to achieve the function of preventing the deterioration of the chemical liquid, and the invention proves through experiments that the amount of nitrogen gas injected can actually make the liquid medicine in the liquid medicine tank The more the conductivity value decreases.

再者,經由上述管徑不同的結構差異,以加壓氮氣氣泡,除了提升氮氣氣泡之分壓壓力以外,也可提升總體氣體壓力之飽和度,並且,提升氮氣氣泡之分壓壓力,亦可增加氮氣氣泡溶解於藥液的含量,可使氮氣氣泡更能溶解於藥液之內,更能使得藥液的電導度下降,延長藥液使用壽命,進而減少藥液更換時間與降低製造成本,並增加生產製造效能。 Furthermore, by varying the structural differences of the above-mentioned pipe diameters, in order to pressurize the nitrogen gas bubbles, in addition to increasing the partial pressure of the nitrogen gas bubbles, the saturation of the overall gas pressure can be increased, and the partial pressure of the nitrogen gas bubbles can be increased. Increasing the content of nitrogen gas bubbles dissolved in the liquid medicine can make the nitrogen gas bubbles dissolve in the liquid medicine more, and can further reduce the electrical conductivity of the liquid medicine, prolong the service life of the liquid medicine, thereby reducing the liquid chemical replacement time and reducing the manufacturing cost. And increase production efficiency.

此外,藉由蓄壓筒與減壓閥模組的配置,以將壓力蓄集到蓄壓筒之內,故可維持氮氣氣泡溶解於藥液的含量。進一步,本發明透過實驗證明,並且,本發明可增加蓄壓筒的管徑,讓氮氣溶解於藥液的效果提升;或者,本發明可增加氮氣溶解裝置的數量,藉由多個蓄壓筒來提升藥液槽內藥液之電導度值下降的趨勢;又或者,本發明亦可設計排列不同管徑的蓄壓筒來達到較佳的藥液槽內藥液之電導度值下降的趨勢。 Further, since the pressure accumulator and the pressure reducing valve module are disposed to store the pressure in the pressure accumulating cylinder, the content of the nitrogen gas bubbles dissolved in the chemical liquid can be maintained. Further, the present invention proves through experiments that the present invention can increase the diameter of the accumulator tube and increase the effect of dissolving nitrogen in the chemical solution; or, the present invention can increase the number of nitrogen dissolving devices by using multiple accumulator tubes. To increase the tendency of the electrical conductivity value of the liquid medicine in the liquid medicine tank to decrease; or, the present invention can also design a pressure storage tube with different diameters to achieve a better tendency of the electrical conductivity value of the liquid medicine in the liquid medicine tank to decrease. .

以上所述,乃僅記載本發明為呈現解決問題所採用的技術手段的較佳實施方式或實施例而已,並非用來限定本發明專利實施的範圍。即凡與本發明專利申請範圍文義相符,或依本發明專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。 The above description is only intended to describe the preferred embodiments or embodiments of the present invention, which are not intended to limit the scope of the present invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.

Claims (26)

一種氣液混合機構,包括:一第一氮氣溶解裝置,包括:一第一匯流管;一第一細化管,連通於該第一匯流管,該第一細化管內設置一第一細化裝置,其中一氮氣與一藥液由該第一匯流管流入至該第一細化管時,該第一細化裝置係細化該氮氣為一氮氣氣泡;及一第一蓄壓筒,連通於該第一細化管,其中該第一蓄壓筒的管徑大於該第一細化管的管徑,以降低該藥液的流速並加壓該氮氣氣泡,使該氮氣氣泡混入至該藥液而為一第一具氮氣氣泡之藥液,其中該第一蓄壓筒包含依序連接之一第一部件、一第二部件與一第三部件,該第一部件之一側連接該第一細化管,該第一部件至該第二部件形成一漸擴結構,該第二部件至該第三部件形成一漸縮結構;以及一減壓閥模組,連通於該第一蓄壓筒,該減壓閥模組用以調節並蓄壓該第一蓄壓筒內該第一具氮氣氣泡之藥液之壓力。 A gas-liquid mixing mechanism, comprising: a first nitrogen dissolving device, comprising: a first collecting pipe; a first thinning pipe connected to the first collecting pipe, wherein the first thinning pipe is provided with a first fine pipe The first refining device refines the nitrogen gas into a nitrogen gas bubble; and a first accumulator tube, wherein a nitrogen gas and a chemical liquid flow from the first manifold to the first refining tube, Connected to the first refinement tube, wherein a diameter of the first accumulator tube is larger than a diameter of the first refinement tube to reduce a flow rate of the chemical solution and pressurize the nitrogen gas bubble to mix the nitrogen gas bubble into The liquid medicine is a first liquid medicine with nitrogen gas bubbles, wherein the first pressure accumulating cylinder comprises a first component, a second component and a third component connected in sequence, one side of the first component is connected The first thinning tube, the first component to the second component form a diverging structure, the second component to the third component form a tapered structure; and a pressure reducing valve module is connected to the first An accumulator valve for regulating and accumulating the first nitrogen gas bubble in the first accumulator The pressure of the liquid. 如申請專利範圍第1項所述之氣液混合機構,更包括:一第二氮氣溶解裝置,連通於該第一蓄壓筒與該減壓閥模組之間,該第二氮氣溶解裝置包括:一第二匯流管;一第二細化管,連通於該第二匯流管,該第二細化管內設置一第二細化裝置,其中該氮氣與該第一具氮氣氣泡之藥液由該第二匯流管流入至該第二細化管時,該第二細化裝置係細化該氮氣為該氮氣氣泡;以及 一第二蓄壓筒,連通於該第二細化管,其中該第二蓄壓筒的管徑大於該第二細化管的該管徑,以降低該第一具氮氣氣泡之藥液的流速並加壓該氮氣氣泡,使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液,該減壓閥模組用以調節並蓄壓該第二蓄壓筒內該第二具氮氣氣泡之藥液之壓力。 The gas-liquid mixing mechanism of claim 1, further comprising: a second nitrogen dissolving device connected between the first accumulator and the pressure reducing valve module, the second nitrogen dissolving device comprising a second manifold; a second thinning tube connected to the second manifold; a second refining device disposed in the second refining tube, wherein the nitrogen and the first nitrogen gas bubble When flowing from the second manifold to the second refinement tube, the second refining device refines the nitrogen gas into the nitrogen gas bubble; a second accumulator tube is connected to the second refining tube, wherein a diameter of the second accumulator tube is larger than a diameter of the second refining tube to reduce the liquid of the first nitrogen gas bubble Flow rate and pressurize the nitrogen gas bubble, so that the nitrogen gas bubble is mixed into the first nitrogen gas bubble liquid to be a second nitrogen gas bubble liquid, and the pressure reducing valve module is used for adjusting and accumulating the second gas. The pressure of the second nitrogen gas bubble in the pressure accumulator. 如申請專利範圍第2項所述之氣液混合機構,其中該第一匯流管輸入該氮氣之氮氣量大於該第二匯流管輸入該氮氣之氮氣量。 The gas-liquid mixing mechanism of claim 2, wherein the amount of nitrogen gas input to the first manifold is greater than the amount of nitrogen input to the second manifold. 如申請專利範圍第2項所述之氣液混合機構,其中該第二蓄壓筒的管徑大於該第一蓄壓筒的管徑。 The gas-liquid mixing mechanism of claim 2, wherein the diameter of the second accumulator is larger than the diameter of the first accumulator. 如申請專利範圍第2項所述之氣液混合機構,其中該第二蓄壓筒的管徑小於該第一蓄壓筒的管徑。 The gas-liquid mixing mechanism according to claim 2, wherein the diameter of the second accumulator is smaller than the diameter of the first accumulator. 如申請專利範圍第2項所述之氣液混合機構,其中該第二細化管的管徑小於該第二匯流管的管徑。 The gas-liquid mixing mechanism of claim 2, wherein the diameter of the second thinning tube is smaller than the diameter of the second collecting tube. 如申請專利範圍第1項所述之氣液混合機構,其中該第一細化裝置包含複數個導流鰭片與複數個導流孔,各該導流鰭片係細化該氮氣為該氮氣氣泡,該氮氣氣泡與該藥液通過各該導流孔。 The gas-liquid mixing mechanism of claim 1, wherein the first refining device comprises a plurality of guiding fins and a plurality of guiding holes, each of the guiding fins refining the nitrogen as the nitrogen Bubbles, the nitrogen gas bubbles and the liquid medicine pass through the respective flow guiding holes. 如申請專利範圍第1項所述之氣液混合機構,其中該第一細化管的管徑小於該第一匯流管的管徑。 The gas-liquid mixing mechanism of claim 1, wherein the diameter of the first thin tube is smaller than the diameter of the first manifold. 一種製程設備,包括:一藥液槽,存儲一藥液;一處理裝置,係以該藥液槽提供之該藥液處理一基板;以及一氣液混合機構,係接收該藥液槽之該藥液,該氣液混合機構包括:一第一氮氣溶解裝置,包括:一第一匯流管; 一第一細化管,連通於該第一匯流管,該第一細化管內設置一第一細化裝置,其中一氮氣與該藥液由該第一匯流管流入至該第一細化管時,該第一細化裝置係細化該氮氣為一氮氣氣泡;及一第一蓄壓筒,連通於該第一細化管,其中該第一蓄壓筒的管徑大於該第一細化管的管徑,以降低該藥液的流速並加壓該氮氣氣泡,使該氮氣氣泡混入至該藥液而為一第一具氮氣氣泡之藥液,其中該第一蓄壓筒包含依序連接之一第一部件、一第二部件與一第三部件,該第一部件之一側連接該第一細化管,該第一部件至該第二部件形成一漸擴結構,該第二部件至該第三部件形成一漸縮結構;以及一減壓閥模組,連通於該第一蓄壓筒,該減壓閥模組用以調節並蓄壓該第一蓄壓筒內該第一具氮氣氣泡之藥液之壓力。 A process equipment comprising: a liquid medicine tank for storing a chemical liquid; a processing device for treating a substrate by the liquid medicine provided by the liquid medicine tank; and a gas-liquid mixing mechanism for receiving the medicine liquid tank The liquid-liquid mixing mechanism comprises: a first nitrogen dissolving device comprising: a first collecting pipe; a first thinning tube is connected to the first collecting tube, and a first refining device is disposed in the first refining tube, wherein a nitrogen gas and the liquid medicine flow from the first collecting tube to the first refining tube In the tube, the first refining device refines the nitrogen gas into a nitrogen gas bubble; and a first accumulator tube is connected to the first refining tube, wherein the first accumulator tube has a larger diameter than the first tube Refining the diameter of the tube to reduce the flow rate of the chemical solution and pressurizing the nitrogen gas bubble, so that the nitrogen gas bubble is mixed into the chemical liquid to be a first chemical solution with nitrogen gas bubbles, wherein the first pressure accumulator comprises Connecting one of the first component, the second component and the third component in sequence, one side of the first component is connected to the first thinning tube, and the first component to the second component form a diverging structure, The second component to the third component form a tapered structure; and a pressure reducing valve module is connected to the first pressure accumulating cylinder, wherein the pressure reducing valve module is used for adjusting and accumulating the first pressure accumulating cylinder The pressure of the first chemical solution with nitrogen gas bubbles. 如申請專利範圍第9項所述之製程設備,其中該製程設備為一顯影機。 The process apparatus of claim 9, wherein the process equipment is a developing machine. 如申請專利範圍第9項所述之製程設備,更包括:一第二氮氣溶解裝置,連通於該第一蓄壓筒與該減壓閥模組之間,該第二氮氣溶解裝置包括:一第二匯流管;一第二細化管,連通於該第二匯流管,該第二細化管內設置一第二細化裝置,其中該氮氣與該第一具氮氣氣泡之藥液由該第二匯流管流入至該第二細化管時,該第二細化裝置係細化該氮氣為該氮氣氣泡;以及一第二蓄壓筒,連通於該第二細化管,其中該第二蓄壓筒的管徑大於該第二細化管的該管徑,以降低該第一具氮氣氣泡之藥液的 流速並加壓該氮氣氣泡,使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液,該減壓閥模組用以調節並蓄壓該第二蓄壓筒內該第二具氮氣氣泡之藥液之壓力。 The process apparatus of claim 9, further comprising: a second nitrogen dissolving device connected between the first accumulator and the pressure reducing valve module, the second nitrogen dissolving device comprising: a second collecting tube; a second refining tube connected to the second collecting tube, wherein the second refining tube is provided with a second refining device, wherein the nitrogen gas and the first nitrogen gas bubble are When the second manifold flows into the second thinning tube, the second refining device refines the nitrogen gas into the nitrogen gas bubble; and a second accumulator tube is connected to the second refining tube, wherein the second reducting tube The diameter of the second accumulator is larger than the diameter of the second refinement tube to reduce the liquid of the first nitrogen bubble Flow rate and pressurize the nitrogen gas bubble, so that the nitrogen gas bubble is mixed into the first nitrogen gas bubble liquid to be a second nitrogen gas bubble liquid, and the pressure reducing valve module is used for adjusting and accumulating the second gas. The pressure of the second nitrogen gas bubble in the pressure accumulator. 如申請專利範圍第11項所述之製程設備,其中該第一匯流管輸入該氮氣之氮氣量大於該第二匯流管輸入該氮氣之氮氣量。 The process apparatus of claim 11, wherein the first manifold has a nitrogen amount input to the nitrogen gas greater than a nitrogen amount of the nitrogen gas input to the second manifold. 如申請專利範圍第11項所述之製程設備,其中該第二蓄壓筒的管徑大於該第一蓄壓筒的管徑。 The process equipment of claim 11, wherein the diameter of the second accumulator is larger than the diameter of the first accumulator. 如申請專利範圍第11項所述之製程設備,其中該第二蓄壓筒的管徑小於該第一蓄壓筒的管徑。 The process equipment of claim 11, wherein the diameter of the second accumulator is smaller than the diameter of the first accumulator. 如申請專利範圍第11項所述之製程設備,其中該第二細化管的管徑小於該第二匯流管的管徑。 The process equipment of claim 11, wherein the diameter of the second thin tube is smaller than the diameter of the second manifold. 如申請專利範圍第9項所述之製程設備,其中該第一細化裝置包含複數個導流鰭片與複數個導流孔,各該導流鰭片係細化該氮氣為該氮氣氣泡,該氮氣氣泡與該藥液通過各該導流孔。 The process apparatus of claim 9, wherein the first refining device comprises a plurality of flow guiding fins and a plurality of flow guiding holes, each of the guiding fins refining the nitrogen gas into the nitrogen gas bubbles. The nitrogen gas bubbles and the chemical liquid pass through the respective flow guiding holes. 如申請專利範圍第9項所述之製程設備,其中該第一細化管的管徑小於該第一匯流管的管徑。 The process equipment of claim 9, wherein the diameter of the first thin tube is smaller than the diameter of the first manifold. 如申請專利範圍第9項所述之製程設備,更包括:一第一電導度計,連接於該氣液混合機構;以及一第二電導度計,連接於該藥液槽。 The process equipment of claim 9, further comprising: a first conductivity meter connected to the gas-liquid mixing mechanism; and a second conductivity meter connected to the liquid tank. 一種氣液混合方法,包括以下步驟:輸入一氮氣至一藥液;細化該氮氣為一氮氣氣泡,並加壓該氮氣氣泡,使該氮氣氣泡混入至該藥液而為一第一具氮氣氣泡之藥液;以及蓄壓該第一具氮氣氣泡之藥液,其中使該第一具氮氣氣泡之藥液由 一第一細化管流入至一第一蓄壓筒,其中該第一蓄壓筒包含依序連接之一第一部件、一第二部件與一第三部件,該第一部件之一側連接該第一細化管,該第一部件至該第二部件形成一漸擴結構,該第一具氮氣氣泡之藥液由該第一部件流入至該第二部件,以加壓該氮氣氣泡,該第二部件至該第三部件形成一漸縮結構,一減壓閥模組用以調節並蓄壓該第一蓄壓筒內該第一具氮氣氣泡之藥液之壓力。 A gas-liquid mixing method comprises the steps of: inputting a nitrogen gas to a chemical liquid; refining the nitrogen gas into a nitrogen gas bubble, and pressurizing the nitrogen gas bubble to mix the nitrogen gas bubble into the chemical liquid to be a first nitrogen gas a liquid medicine for bubbling; and a liquid medicine for accumulating the first nitrogen gas bubble, wherein the first chemical liquid having a nitrogen gas bubble is a first thin tube flows into a first pressure accumulating tube, wherein the first pressure accumulating tube comprises a first component, a second component and a third component connected in sequence, one side of the first component being connected The first thinning tube, the first component to the second component form a diverging structure, and the first nitrogen gas bubble liquid flows from the first component to the second component to pressurize the nitrogen gas bubble. The second component to the third component form a tapered structure, and a pressure reducing valve module is used for adjusting and accumulating the pressure of the first nitrogen gas bubble in the first pressure accumulating cylinder. 如申請專利範圍第19項所述之氣液混合方法,其中所述使該氮氣氣泡混入至該藥液而為該第一具氮氣氣泡之藥液的步驟,包括以下步驟:使該氮氣與該藥液流入至該第一細化管,該第一細化管中的一第一細化裝置係細化該氮氣為該氮氣氣泡。 The gas-liquid mixing method of claim 19, wherein the step of mixing the nitrogen gas bubble into the chemical liquid is the first chemical liquid having a nitrogen gas bubble, comprising the steps of: The chemical liquid flows into the first thinning tube, and a first refining device in the first thinning tube refines the nitrogen gas into the nitrogen gas bubbles. 如申請專利範圍第20項所述之氣液混合方法,其中所述使該氮氣氣泡混入至該藥液而為該第一具氮氣氣泡之藥液的步驟,包括以下步驟:該第一蓄壓筒的管徑大於該第一細化管的管徑,以降低該藥液的流速並加壓該氮氣氣泡,使該氮氣氣泡混入至藥液而為該第一具氮氣氣泡之藥液。 The gas-liquid mixing method according to claim 20, wherein the step of mixing the nitrogen gas bubble into the chemical liquid to be the first chemical liquid having nitrogen gas bubbles comprises the following steps: the first pressure accumulation The diameter of the tube is larger than the diameter of the first thin tube, so as to reduce the flow rate of the chemical solution and pressurize the nitrogen gas bubble, so that the nitrogen gas bubble is mixed into the chemical liquid to be the first chemical liquid with nitrogen gas bubbles. 如申請專利範圍第19項所述之氣液混合方法,更包括:輸入該氮氣至該第一具氮氣氣泡之藥液;細化該氮氣為該氮氣氣泡,並加壓該氮氣氣泡,使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為一第二具氮氣氣泡之藥液;以及蓄壓該第二具氮氣氣泡之藥液。 The gas-liquid mixing method of claim 19, further comprising: inputting the nitrogen gas to the first chemical solution having a nitrogen gas bubble; refining the nitrogen gas into the nitrogen gas bubble, and pressurizing the nitrogen gas bubble to make the A nitrogen gas bubble is mixed into the first nitrogen gas bubble liquid to be a second nitrogen gas bubble liquid; and the second nitrogen gas bubble liquid is accumulated. 如申請專利範圍第22項所述之氣液混合方法,其中所述使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為該第二具氮氣氣泡之藥液的步驟,包括以下步驟:使該氮氣與該第一具氮氣氣泡之藥液流入至一第二細化管時,該第 二細化管中的一第二細化裝置係細化該氮氣為該氮氣氣泡。 The gas-liquid mixing method of claim 22, wherein the step of mixing the nitrogen gas bubble into the first chemical liquid having a nitrogen gas bubble is the liquid chemical solution of the second nitrogen gas bubble, comprising the following steps : when the nitrogen gas and the first chemical solution having nitrogen gas bubbles flow into a second thinning tube, the first A second refining device in the two refinement tubes refines the nitrogen gas into the nitrogen gas bubbles. 如申請專利範圍第23項所述之氣液混合方法,其中所述使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為該第二具氮氣氣泡之藥液的步驟,包括以下步驟:使該氮氣氣泡與該第一具氮氣氣泡之藥液由該第二細化管流入至一第二蓄壓筒,該第二蓄壓筒的管徑大於該第二細化管的管徑,以降低該第一具氮氣氣泡之藥液的流速並加壓該氮氣氣泡,使該氮氣氣泡混入至該第一具氮氣氣泡之藥液而為該第二具氮氣氣泡之藥液。 The gas-liquid mixing method according to claim 23, wherein the step of mixing the nitrogen gas bubble into the first chemical liquid having a nitrogen gas bubble is the liquid chemical solution of the second nitrogen gas bubble, comprising the following steps Dissolving the nitrogen gas bubble and the first nitrogen gas bubble from the second thin tube into a second pressure accumulator, wherein the diameter of the second pressure tube is larger than the diameter of the second thin tube In order to reduce the flow rate of the first nitrogen gas bubble liquid and pressurize the nitrogen gas bubble, the nitrogen gas bubble is mixed into the first nitrogen gas bubble liquid to be the second nitrogen gas bubble liquid. 如申請專利範圍第22項所述之氣液混合方法,其中輸入該氮氣至該藥液之氮氣量大於輸入該氮氣至該第一具氮氣氣泡之藥液之氮氣量。 The gas-liquid mixing method according to claim 22, wherein the amount of nitrogen gas input to the chemical liquid is greater than the amount of nitrogen gas input to the first nitrogen gas bubble. 如申請專利範圍第24項所述之氣液混合方法,其中所述蓄壓該第二具氮氣氣泡之藥液的步驟,包括以下步驟:使該第二具氮氣氣泡之藥液由該第二細化管流入至該第二蓄壓筒,該減壓閥模組用以調節並蓄壓該第二蓄壓筒內該第二具氮氣氣泡之藥液之壓力。 The gas-liquid mixing method according to claim 24, wherein the step of accumulating the second chemical liquid having a nitrogen gas bubble comprises the step of: making the second chemical liquid having a nitrogen gas bubble from the second The refining tube flows into the second accumulator tube, and the pressure reducing valve module is configured to adjust and accumulate the pressure of the second nitrogen gas bubble in the second accumulator.
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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06190360A (en) * 1992-10-29 1994-07-12 Nippon Sanso Kk Dissolved oxygen decreasing device
JP2000140591A (en) * 1998-11-04 2000-05-23 Sony Chem Corp Mixing apparatus, mixing, and polymerization
TW515882B (en) * 1999-08-25 2003-01-01 Smc Corp Constant-temperature refrigerant liquid circulating apparatus
TWM301699U (en) * 2006-06-12 2006-12-01 Yung-Kun Chen Combining structure of gas liquid mixing apparatus
JP2008284552A (en) * 2008-07-28 2008-11-27 Anemosu:Kk Method and apparatus for reducing dissolved oxygen
TW201216397A (en) * 2010-07-30 2012-04-16 Jx Nippon Oil & Amp Energy Corp Discharge gas treating system
TW201223450A (en) * 2010-08-30 2012-06-16 Mg Grow Up Corp Nitrogen-treated-water generating device, nitrogen-treated-water generating method, nitrogen-treated water, and processing method for maintaining freshness of fresh fishery products processed by means of nitrogen-treated water
TWM515910U (en) * 2015-08-18 2016-01-21 Manz Taiwan Ltd Gas-liquid mixing structure and process equipment
JP6190360B2 (en) 2011-05-02 2017-08-30 ミレニアム ファーマシューティカルズ, インコーポレイテッドMillennium Pharmaceuticals, Inc. Formulation for anti-α4β7 antibody

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2724849Y (en) * 2004-07-16 2005-09-14 农业部南京农业机械化研究所 Jetting type air mixing spray-nozzle
CN2810731Y (en) * 2005-06-07 2006-08-30 吴镇霖 Ozone water mixer
JP5252861B2 (en) * 2007-01-15 2013-07-31 芝浦メカトロニクス株式会社 Substrate processing equipment
JP4547445B2 (en) * 2008-07-03 2010-09-22 株式会社日立製作所 Liquid processing equipment
JP2013086076A (en) * 2011-10-21 2013-05-13 Panasonic Corp Microbubble generation nozzle
US9931601B2 (en) * 2014-07-22 2018-04-03 Hayward Industries, Inc. Venturi bypass system and associated methods
CN206121538U (en) * 2016-11-02 2017-04-26 梁雅增 Carbonic acid spring gas -liquid mixture device

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06190360A (en) * 1992-10-29 1994-07-12 Nippon Sanso Kk Dissolved oxygen decreasing device
JP2000140591A (en) * 1998-11-04 2000-05-23 Sony Chem Corp Mixing apparatus, mixing, and polymerization
TW515882B (en) * 1999-08-25 2003-01-01 Smc Corp Constant-temperature refrigerant liquid circulating apparatus
TWM301699U (en) * 2006-06-12 2006-12-01 Yung-Kun Chen Combining structure of gas liquid mixing apparatus
JP2008284552A (en) * 2008-07-28 2008-11-27 Anemosu:Kk Method and apparatus for reducing dissolved oxygen
TW201216397A (en) * 2010-07-30 2012-04-16 Jx Nippon Oil & Amp Energy Corp Discharge gas treating system
TW201223450A (en) * 2010-08-30 2012-06-16 Mg Grow Up Corp Nitrogen-treated-water generating device, nitrogen-treated-water generating method, nitrogen-treated water, and processing method for maintaining freshness of fresh fishery products processed by means of nitrogen-treated water
JP6190360B2 (en) 2011-05-02 2017-08-30 ミレニアム ファーマシューティカルズ, インコーポレイテッドMillennium Pharmaceuticals, Inc. Formulation for anti-α4β7 antibody
TWM515910U (en) * 2015-08-18 2016-01-21 Manz Taiwan Ltd Gas-liquid mixing structure and process equipment

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