CN216274361U

CN216274361U - ALD spray assembly and ALD coating equipment

Info

Publication number: CN216274361U
Application number: CN202120612864.4U
Authority: CN
Inventors: 黎微明; 李翔; 周芸福; 王新征; 许所昌
Original assignee: Jiangsu Leadmicro Nano Technology Co Ltd
Current assignee: Jiangsu Leadmicro Nano Technology Co Ltd
Priority date: 2021-03-25
Filing date: 2021-03-25
Publication date: 2022-04-12
Anticipated expiration: 2031-03-25

Abstract

The utility model relates to an ALD spray assembly, which comprises a substrate, a cover plate and a first air inlet part. The cover plate is connected to the base plate in a sealing mode and covers the opening, the workpiece to be machined is placed in the reaction cavity, reaction gas enters the gas inlet cavity from the first gas inlet hole, the gas inlet cavity can provide a buffer space for the reaction gas, and the gas after being buffered by the gas inlet cavity is distributed more uniformly. Simultaneously, the reaction gas discharged from the first gas outlet enters the reaction cavity through the first communication holes, so that the uniformity of the reaction gas entering the reaction cavity is further improved, the reaction gas in the reaction cavity is ensured to be more uniformly contacted with the workpiece to be machined, the film generated on the workpiece to be machined by the final reaction gas is more uniform, and the quality of the film is improved. The utility model also relates to ALD coating equipment.

Description

ALD spray assembly and ALD coating equipment

Technical Field

The utility model relates to the technical field of ALD (atomic layer deposition) coating, in particular to an ALD spraying assembly and ALD coating equipment.

Background

Atomic Layer Deposition (ALD) is a deposition technique for forming a monoatomic layer by using chemisorption and desorption generated by a surface saturation reaction of a precursor on a substrate surface, and is a technique for depositing a substance on the substrate surface layer by layer in the form of a monoatomic layer and forming Atomic layer thin films of different thicknesses by simply and accurately controlling the thickness of the thin film by controlling the number of reaction cycles.

The traditional ALD device is to directly introduce a large amount of reaction gas into the reaction chamber, so that the substrate or the previous atomic layer is immersed in the reaction gas, and the reaction gas is easily contacted with the substrate or the previous atomic layer unevenly due to the direct large amount of gas introduction, so that the finally generated atomic layer thin film is uneven and poor in quality.

SUMMERY OF THE UTILITY MODEL

Based on this, it is necessary to provide an ALD spray assembly and ALD coating equipment that can promote the homogeneity of the atomic layer film of production, improve product quality to the relatively poor problem of atomic layer film quality of traditional ALD device sound field.

An ALD spray assembly comprising:

the base plate is provided with a reaction cavity and an opening communicated with the reaction cavity, and the reaction cavity is used for accommodating a workpiece to be machined;

the cover plate is hermetically connected to one side of the substrate, which is provided with the opening, and covers the opening, and the cover plate is provided with a plurality of first communication holes communicated with the reaction cavity;

the first air inlet part is hermetically connected to one side of the cover plate far away from the base plate and is provided with at least two air inlet cavities and at least two first air inlet holes and first air outlet holes which are communicated with the air inlet cavities, the two air inlet cavities are arranged at intervals along a third direction which is parallel to the cover plate and is vertical to the second direction, each first air inlet hole and each first air outlet hole are communicated with the corresponding air inlet cavity, the first air inlet holes are used for inputting reaction gas into the air inlet cavities, the first air outlet holes are communicated with each first connecting hole, one side of the first air inlet part facing the cover plate is provided with a first connecting groove, one side of the cover plate facing the first air inlet part is provided with a second connecting groove communicated with each first connecting hole, and the first connecting groove and the second connecting groove are corresponding and communicated to form a connecting space by enclosure, the first air outlet is communicated with the connecting space; and

first baffle, connect in the apron, and be located in the second spread groove, first baffle be used for with connect the space separation to become upper space, lower floor's space and intercommunication upper space with the intercommunication clearance in lower floor's space, first baffle seted up with the opening that conducts of lower floor's space intercommunication, wherein one first gas outlet with upper space intercommunication, wherein another first gas outlet with the opening intercommunication conducts.

Through setting up foretell ALD spray assembly, apron sealing connection just covers the opening in the base plate, treats that the machined part places in the reaction chamber, and reaction gas admits air the chamber from first inlet port input, and the reaction gas that gets into in the chamber of admitting air is discharged from first gas outlet to get into through a plurality of first through-holes and react with treating the machined part in order to be full of the reaction chamber, reaction gas in the reaction chamber.

After the reaction gas enters the gas inlet cavity from the first gas inlet hole, the gas inlet cavity can provide a buffer space for the reaction gas, and the gas after being buffered by the gas inlet cavity is distributed more uniformly. Simultaneously, the reaction gas discharged from the first gas outlet enters the reaction cavity through the first communication holes, so that the uniformity of the reaction gas entering the reaction cavity is further improved, the reaction gas in the reaction cavity is ensured to be more uniformly contacted with the workpiece to be machined, the film generated on the workpiece to be machined by the final reaction gas is more uniform, and the quality of the film is improved.

In one embodiment, the ALD spray assembly further comprises at least three adjustment feet, each of the adjustment feet having an adjustment end reciprocally movable in a first direction perpendicular to the cover plate, the adjustment end of each of the adjustment feet being connected to the base plate.

In one embodiment, each of the adjusting legs includes a fixing base and an adjusting base, the adjusting base is screwed to the fixing base, and the adjusting base is connected to the base.

In one embodiment, the first air inlet member has a top wall and a side wall extending from an edge of the top wall to the same side, the top wall and the side wall enclose to form the air inlet cavity and the first air outlet communicated with the air inlet cavity, the first air inlet hole is formed in the side wall of the air inlet cavity, the plurality of first communication holes are arranged at intervals in a second direction parallel to the cover plate, and the top wall of the air inlet cavity extends from the side wall provided with the first air inlet hole along the second direction and gradually approaches the cover plate.

In one embodiment, the first air inlet member or the cover plate is provided with a plurality of first uniform flow islands which are located in the connecting space and arranged at intervals in a second direction parallel to the cover plate, a first uniform flow channel communicated with spaces on two opposite sides of the first uniform flow island is formed between two adjacent first uniform flow islands, and the first air outlet and the first communication holes are respectively communicated with the spaces on two opposite sides of the first uniform flow island.

In one embodiment, the first air inlet is provided with a plurality of first uniform flow islands, and the plurality of first uniform flow islands are positioned in the upper layer space;

the cover plate is also provided with a plurality of second uniform flow islands which are positioned in the lower layer space and are arranged at intervals in the second direction, and second uniform flow channels communicated with spaces on two opposite sides of the second uniform flow islands are formed between every two adjacent second uniform flow islands.

In one embodiment, the reaction cavity comprises an air inlet area, a uniform flow area and a reaction area which are sequentially communicated, and the air inlet area is communicated with the first communication holes;

and a plurality of third uniform flow islands are arranged on one side of the cover plate facing the substrate or one side of the substrate facing the cover plate, the third uniform flow islands are arranged at intervals in a second direction parallel to the cover plate and are positioned in the uniform flow area, and two adjacent third uniform flow islands form a third uniform flow channel for communicating the air inlet area and the reaction area.

In one embodiment, the substrate is further provided with an exhaust channel communicated with the reaction cavity, and the exhaust channel penetrates through the other side of the substrate, which is far away from the cover plate;

an annular groove, an air inlet groove and an air outlet groove are further formed in one side, provided with the opening, of the base plate, the annular groove and the opening are staggered, and the opening is located in a space formed by the annular groove in a surrounding mode;

the reaction cavity comprises an air inlet area, a uniform flow area, a reaction area and an air exhaust area which are sequentially communicated, the air inlet groove is respectively communicated with the annular groove and the air inlet area, the air outlet groove is respectively communicated with the annular groove and the air exhaust area, and the cover plate covers the annular groove, the air inlet groove, the air outlet groove and the opening.

In one embodiment, the base plate further has a feeding channel communicated with the reaction cavity, one end of the feeding channel, which is far away from the reaction cavity, penetrates through the other side of the base plate, which is far away from the opening, and the feeding channel is used for allowing the workpiece to enter the reaction cavity.

An ALD coating device comprises the ALD spraying assembly.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic diagram illustrating an ALD shower assembly according to an embodiment of the present invention;

FIG. 2 is a schematic diagram illustrating an ALD shower assembly according to another embodiment of the present invention;

FIG. 3 is a schematic cross-sectional view of the ALD showerhead assembly shown in FIG. 2;

FIG. 4 is a schematic diagram of a tuning pin of the ALD shower assembly shown in FIGS. 1 and 2;

FIG. 5 is a schematic cross-sectional view of an ALD showerhead assembly according to an embodiment of the present invention;

FIG. 6 is a schematic diagram of a first uniform flow island arrangement of an ALD showerhead assembly, according to an embodiment of the present invention.

Detailed Description

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the utility model and to simplify the description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and are not to be considered limiting of the utility model.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.

In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.

As shown in fig. 1-3, an ALD spray assembly 100 according to an embodiment of the present invention includes a substrate 10, a cover plate 20 and a first gas inlet 30.

The substrate 10 has a reaction chamber 11 and an opening communicating with the reaction chamber 11, the opening is located at one side of the substrate 10, and the reaction chamber 11 is used for accommodating a workpiece to be processed.

The cover plate 20 is hermetically connected to one side of the substrate 10 having the opening and covers the opening, and the cover plate 20 has a plurality of first communication holes 21 communicating with the reaction chamber 11.

The first air inlet member 30 is hermetically connected to a side of the cover plate 20 away from the substrate 10, and the first air inlet member 30 has an air inlet chamber 31, and a first air inlet hole 32 and a first air outlet hole 33 which are communicated with the air inlet chamber 31, the first air inlet hole 32 is used for inputting reaction gas into the air inlet chamber 31, and the second air outlet hole is communicated with each first communication hole 21.

Through setting up foretell ALD spray assembly, apron 20 sealing connection just covers the opening in base plate 10, treats that the machined part is placed in reaction chamber 11, and reaction gas inputs into chamber 31 from first inlet port 32, and the reaction gas that gets into in the chamber 31 of admitting air is discharged from first gas outlet 33 to get into through a plurality of first through-holes 21 and react with treating the machined part in order to be full of reaction chamber 11, reaction gas in the reaction chamber 11.

After the reaction gas enters the gas inlet cavity 31 from the first gas inlet hole 32, the gas inlet cavity 31 provides a buffer space for the reaction gas, and the gas after being buffered by the gas inlet cavity 31 is distributed more uniformly. Meanwhile, the reaction gas discharged from the first gas outlet 33 enters the reaction chamber 11 through the first communication holes 21, so that the uniformity of the reaction gas entering the reaction chamber 11 is further improved, the reaction gas in the reaction chamber 11 is ensured to be more uniformly contacted with a workpiece to be processed, the film generated on the workpiece to be processed by the reaction gas is more uniform, and the quality of the film is improved.

It should be noted that, after the reaction gas enters the gas inlet chamber 31 through the first gas inlet hole 32, the reaction gas fills the buffer space and is then discharged, so as to improve the uniformity of the reaction gas discharged from the first gas outlet 33. The workpiece to be processed may be a wafer, but may also be other products that need to be subjected to the ALD process, and is not limited herein.

It should also be explained that the first air outlet 33 is communicated with the plurality of first communication holes 21, that is, when the first air inlet member 30 is hermetically connected to the cover plate 20, the projection of the first air outlet 33 on the cover plate 20 covers the area of the plurality of first communication holes 21.

In this embodiment, the two opposite sides of the cover plate 20 are respectively connected to the substrate 10 and the first air inlet 30 in a sealing manner, and the two opposite sides of the cover plate 20 facing the substrate 10 and the first air inlet 30 respectively have matching grooves, the matching grooves on the two sides are communicated with the plurality of first through holes 21, the matching groove of the cover plate 20 facing one side of the first air inlet 30 is communicated with the first air outlet 33, and the matching groove of the cover plate 20 facing one side of the substrate 10 is communicated with the reaction chamber 11.

Referring to fig. 5, the substrate 10 further has a feeding channel 13 communicating with the reaction chamber 11, one end of the feeding channel 13 away from the reaction chamber 11 penetrates through the other side of the substrate 10 away from the opening, and the feeding channel 13 is used for feeding the workpiece to be processed into the reaction chamber 11.

It should be noted that the workpiece to be processed is fixed to the top of the chuck, the chuck is entered from the feeding passage 13, the top of the chuck is located in the reaction chamber 11, and the chuck is sealed from the feeding passage 13, thereby sealing the reaction chamber 11 after the chuck feeds the workpiece to be processed into the reaction chamber 11.

Referring to fig. 5, in some embodiments, the feed channel 13 has a step structure, when the wafer is held by the chuck and enters from the feed channel 13, the chuck is in sealing contact with the step structure, and the wafer extends into the reaction chamber 11 to react with the reaction gas, so as to ensure the sealing property, improve the reaction effect of the reaction gas and the wafer, and improve the quality of the generated film.

Specifically, feed channel 13 is circular passageway, and feed channel 13's diameter can set up according to the size of chuck and wafer, only needs to ensure that after the chuck pushed the wafer into the reaction chamber, the sealed butt of chuck and feed channel 13 can.

Referring to fig. 1 and 4, in some embodiments, the ALD spray assembly further comprises at least three adjustment legs 40, each adjustment leg 40 having an adjustment end reciprocally movable in a first direction perpendicular to the cover plate 20, the adjustment end of each adjustment leg 40 being connected to the substrate 10.

The cover plate 20 is plate-shaped, so the direction perpendicular to the cover plate 20 is the direction perpendicular to the surface with the largest area of the cover plate 20, specifically, in fig. 2, the first direction is the Z direction, which is the vertical direction in practical application. In addition, the cover plate 20 and the base plate 10 are parallel to each other.

In this manner, the substrate 10 is supported by the at least three adjusting legs 40, and then the substrate 10 is kept horizontally placed by adjusting the adjusting ends in the vertical direction, and the at least three adjusting legs 40 can form a stable multi-point support, ensuring the stability of the support.

In practical applications, the number of the adjusting legs 40 is three, and the adjusting ends of the three adjusting legs 40 are respectively connected to three different sides of the substrate 10 to ensure the stability of the support. Specifically, the substrate 10 includes a plate body 18 and three connecting portions 19, the plate body 18 is a rectangular plate, and the three connecting portions 19 are fixedly connected to three sides of the plate body 18.

It should be noted that, in fig. 1 and fig. 2, the X direction, the Y direction and the Z direction are the same, and in order to improve the stability of the support in this embodiment, one of the connection portions 19 is fixedly connected to one side of the plate 18 in the length direction thereof, and the other two connection portions 19 are connected to the opposite sides of the plate 18 in the width direction thereof.

In other embodiments, as shown in FIG. 2, more adjustment feet 40, such as six, may be provided to ensure stability of the support.

Referring to fig. 4, in some embodiments, each of the adjusting legs 40 includes a fixing base 41 and an adjusting base 42, the adjusting base 42 is screwed to the fixing base 41, so that the adjusting base 42 moves back and forth along a first direction relative to the fixing base 41 during the process of rotating the adjusting base 42, and the adjusting base 42 serves as the adjusting end and is connected to the substrate 10. Thus, the adjusting seat 42 can be rotated to reciprocate the adjusting seat 42 along the first direction, so that the substrate 10 is adjusted to be horizontal, and the adjustment precision is improved.

Furthermore, each adjusting foot 40 further comprises a locking member 43, the locking member 43 is connected to the adjusting seat 42 to form a fixing position by enclosing with the adjusting seat 42, and the locking member 43 is used for locking the connecting portion 19 in the fixing position.

In practical applications, the adjusting base 42 includes a first connecting end 421 and a second connecting end 422, the first connecting end 421 is connected to the fixing base 41 by a screw, the second connecting end 422 is connected to an end of the first connecting end 421 away from the fixing base 41, a radial dimension of the second connecting end 422 is smaller than that of the first connecting end 421, and the locking member 43 is connected to the second connecting end 422 by a screw to form the fixing position with the first connecting end 421.

After the fixing base 41 is connected with other mounting mechanisms, the height can be adjusted only by adjusting the adjusting base 42, and the locking member 43 is also connected with the adjusting base 42 without operating the fixing base 41. Meanwhile, after the substrate 10 is connected to the adjusting base 42, the second connecting end 422 of the adjusting base 42 protrudes out of the substrate 10, and can be directly operated above the substrate 10 to adjust the height. Therefore, the installation and subsequent operation of operators are facilitated, and the space utilization rate is improved.

Specifically, the locking member 43 is a nut, and each adjustment further includes a first washer and a second washer, the first washer and the second washer are both sleeved on the second connecting end 422, the first washer abuts against the first connecting end 421, and the second washer abuts against the locking member 43, so as to prevent the connecting portion 19 from being damaged when the locking member 43 is locked.

Referring to fig. 1, in some embodiments, the ALD spray assembly further comprises auxiliary support legs 50, wherein the auxiliary support legs 50 are connected to the substrate 10 for supporting the substrate 10 in cooperation with at least three tuning pins 40. Further, auxiliary supporting legs 50 are connected to the base plate 10 and the cover plate 20.

The auxiliary supporting legs 50 serve to assist in supporting the substrate 10, so as to ensure stability of the support. In this embodiment, the auxiliary supporting legs 50 have the same structure as the adjusting legs 40 and are adjustable, but the auxiliary supporting legs 50 are connected to the base plate 10 and the cover plate 20 at the same time. In other embodiments, the auxiliary supporting legs 50 may have other structures, and may be connected to the substrate 10 only, as long as the substrate 10 can be supported.

Referring to fig. 3, in some embodiments, the first air inlet member 30 has a top wall and a side wall extending from an edge of the top wall to the same side, the top wall and the side wall enclose the air inlet chamber 31 and a first air outlet 33 communicating with the air inlet chamber 31, and the first air inlet 32 is opened in the side wall of the air inlet chamber 31.

Further, the plurality of first communication holes 21 are arranged at intervals along a second direction parallel to the cover plate 20, and the top wall of the air intake chamber 31 extends from the side wall provided with the first air intake holes 32 along the second direction and gradually approaches the cover plate 20.

The second direction is perpendicular to the first direction, and the second direction is the X direction shown in fig. 2.

It should be explained that, compared to the chamber with a rectangular parallelepiped space, the reaction gas fed from the side wall flows toward the opposite side and slowly flows downward under the action of gravity and the reaction gas fed subsequently, which may cause the distribution of the reaction gas in the chamber to be uneven, for example, the amount of the reaction gas is different between the side close to the first gas inlet 32 and the side far from the first gas inlet 32.

In this embodiment, the top wall inclined relative to the second direction guides the reactant gas, and guides the reactant gas to flow toward the cover plate 20, and the reactant gas inputted through the first gas inlet holes 32 flows toward the cover plate 20 by the guiding of the top wall, so that the reactant gas in the gas inlet chamber 31 is distributed more uniformly.

In practice, the minimum distance between the top wall of the intake chamber 31 and the cover plate is smaller than the distance between the first intake holes 32 and the cover plate 20. As explained in connection with fig. 3, the minimum distance between the top wall of the air intake chamber 31 and the cover plate 20 is the distance between the leftmost side of the top wall and the cover plate 20, which is smaller than the distance between the first air intake holes 32 and the cover plate 20.

Meanwhile, the first air intake holes 32 are communicated with the air intake chamber 31, and the first air intake holes 32 are opened in the side wall of the air intake chamber 31, so that the maximum distance between the top wall of the air intake chamber 31 and the cover plate 20 is greater than the sum of the distance between the first air intake holes 32 and the cover plate 20 and the diameter of the first air intake holes 32. Thus, the reaction gas introduced through the first gas inlet hole 32 necessarily flows along the top of the gas inlet chamber 31 and gradually flows toward the cover plate 20.

The reaction gas is input from the right side of the gas inlet chamber 31, the reaction gas is a fluid, a part of the reaction gas flows to the left side of the gas inlet chamber 31 along the top wall of the gas inlet chamber 31, and a part of the reaction gas flows downwards in the process of entering the gas inlet chamber 31 or flowing along the top wall of the gas inlet chamber 31. In this way, it can be ensured that the reaction gas entering the gas inlet chamber 31 fills the gas inlet chamber 31 and the reaction gas on the left and right sides in the gas inlet chamber 31 is uniformly distributed.

In short, part of the reaction gas flows to the left side along the top wall of the gas inlet cavity 31 and flows to the cover plate 20, and the other part of the reaction gas directly flows to the cover plate 20, because the height of the left side of the gas inlet cavity 31 is lower and the space is smaller than the right side of the gas inlet cavity 31, even though the total amount of the reaction gas on the left side in the gas inlet cavity 31 is smaller than the total amount of the reaction gas on the right side in the gas inlet cavity 31, the density of the reaction gas on the left side in the gas inlet cavity 31 is still very close to the density of the reaction gas on the right side in the gas inlet cavity 31 (the inclination degree of the top wall of the gas inlet cavity 31 can be determined by multiple times, so as to ensure that the density difference of the reaction gases on the two sides is within an allowable range), that is, the distribution of the reaction gas in the gas inlet cavity 31 is very uniform.

Referring to fig. 5, in some embodiments, the number of the air inlet cavities 31, the first air inlet holes 32 and the first air outlet holes 33 is at least two, the at least two air inlet cavities 31 are spaced apart from each other along a third direction parallel to the cover plate 20, and each of the first air inlet holes 32 and each of the first air outlet holes 33 are communicated with the corresponding air inlet cavity 31.

The third direction is perpendicular to the second direction, and the third direction is a Y direction shown in fig. 2, in practical application, the second direction and the third direction are horizontal directions perpendicular to each other, and the first direction is a vertical direction.

In practical applications, the width of the air inlet chamber 31 along the third direction is smaller than the length of the base plate 10 and the cover plate 20 along the third direction, so the number of the air inlet chambers 31 is two, and the number of the corresponding first air inlet holes 32 and the corresponding first air outlet holes 33 is two.

Referring to fig. 5, in some embodiments, a side of the first air inlet 30 facing the cover plate 20 has a first connecting groove 34, a side of the cover plate 20 facing the first air inlet 30 has a second connecting groove 22 communicating with each first connecting hole 21, the first connecting groove 34 corresponds to and communicates with the second connecting groove 22 to form a connecting space, and the first air outlet 33 communicates with the connecting space.

Referring to fig. 5 and fig. 6, further, the first air inlet member 30 or the cover plate 20 is provided with a plurality of first uniform flow islands 35, the plurality of first uniform flow islands 35 are located in the connection space and are arranged at intervals in the second direction, a first uniform flow island channel 351 communicating spaces on two opposite sides of the first uniform flow island 35 is formed between two adjacent first uniform flow islands 35, and the first air outlet 33 and the plurality of first communication holes 21 are respectively communicated with spaces on two opposite sides of the first uniform flow island 35.

The plurality of first uniform flow islands 35 are three or more first uniform flow islands 35, and at least two first uniform flow channels can be formed, wherein the reaction gas enters the connecting space from the first gas outlet 33, then flows to the space on the other side of the first uniform flow island 35 through the at least two first uniform flow island channels 351, finally enters the reaction chamber 11 through the plurality of first connecting holes 21, and passes through the first uniform flow island channels 351 formed by the plurality of first uniform flow islands 35, so that the reaction gas realizes uniform flow, that is, the uniformity of the reaction gas is further improved.

Referring to fig. 5, in some embodiments, the ALD spray assembly further includes a first partition plate 61, the first partition plate 61 is connected to the cover plate 20 and located in the second connecting groove 22 for dividing the connecting space into an upper space, a lower space and a communicating gap 23 communicating the upper space and the lower space, and the first partition plate 61 is provided with a conducting opening 611 communicating with the lower space.

Further, the number of the air inlet chamber 31, the first air inlet hole 32 and the first air outlet 33 is two, wherein one first air outlet 33 is directly communicated with the upper layer space, and the other first air outlet 33 is communicated with the conducting opening 611, so as to be communicated with the lower layer space.

In practical applications, the width of the first connecting groove 34 along the third direction is smaller than the width of the second connecting groove 22 along the third direction, wherein one of the first air outlets 33 is communicated with the first connecting groove 34, and the other one of the first air outlets 33 penetrates through the side of the first air inlet 30 where the first connecting groove 34 is formed, and is not communicated with the first connecting groove 34.

In this way, in the case where the first partition plate 61 is not provided, the first air outlet 33 not communicating with the first connecting groove 34 directly communicates with the second connecting groove 22, and in the case where the first partition plate 61 is provided, the first air outlet 33 communicates with the through hole.

In some embodiments, a plurality of first uniform flow islands 35 are disposed in the first air inlet 30 and located in the upper space, and a plurality of second uniform flow islands are further disposed in the cover plate 20 and located in the lower space and spaced apart from each other in the second direction, and a second uniform flow channel is formed between two adjacent second uniform flow islands to communicate spaces on two opposite sides of the second uniform flow islands.

With reference to the above embodiments, it can be understood that, in the present embodiment, that is, the two gas inlet cavities 31 are used for inputting the reaction gas, so as to slow down the speed of inputting the reaction gas into the gas inlet cavities 31 and improve the uniformity, and meanwhile, the reaction gas input into the two gas inlet cavities 31 is subjected to the uniform flow treatment by the plurality of first uniform flow islands 35 and the plurality of second uniform flow islands, so as to further improve the uniformity of the reaction gas.

In practical applications, a plurality of first uniform flow islands 35 are disposed in the first connecting grooves 34, and a plurality of second uniform flow islands are disposed in the second connecting grooves 22.

Referring to fig. 6, in some embodiments, the first uniform flow islands 35 and the second uniform flow islands are distributed in an arc shape to enhance the effect of the uniform flow islands on the uniform flow treatment of the reaction gas. Specifically, the arcs formed by the plurality of first uniform flow islands 35 and the plurality of second uniform flow islands are convex toward the direction of the input of the reaction gas, that is, the direction indicated by the arrows in fig. 6 is the direction of the gas flow, so as to have a dispersing effect on the reaction gas, so that the distribution of the reaction gas is more uniform.

In some embodiments, the width of the end of each first uniform flow island 35 close to the first air outlet 33 in the second direction is larger than the width of the end close to the first communicating hole 21 in the second direction, and the width of the end of each second uniform flow island close to the first air outlet 33 in the second direction is larger than the width of the end close to the first communicating hole 21 in the second direction, so as to improve the effect of the uniform flow treatment.

It should be noted that the first uniform flow island 35 and the second uniform flow island are protrusions respectively disposed in the first connecting groove 34 and the second connecting groove 22, and both the first uniform flow island 35 and the second uniform flow island are in a drop shape.

In some embodiments, the substrate 10 further defines an exhaust channel communicating with the reaction chamber 11, and the exhaust channel penetrates through another side of the substrate 10 away from the cover plate 20 for exhausting the excess reaction gas in the reaction chamber 11. Further, the reaction chamber 11 includes an air inlet region 111, a uniform flow region 112, a reaction region 113 and an air outlet region 114 which are sequentially communicated, and the air outlet channel is communicated with the air outlet region 114.

In practical applications, the number of the exhaust passages is two, and both the exhaust passages are communicated with the exhaust area 114 and are arranged at intervals along the second direction. Specifically, the gas inlet region 111, the uniform flow region 112, the reaction region 113, and the gas discharge region 114 are sequentially arranged in the third direction.

In some embodiments, the side of the substrate 10 where the opening is formed further has an annular groove, an air inlet groove and an air outlet groove, the annular groove is staggered with the opening, the opening is located in a space defined by the annular groove, the air inlet groove is respectively communicated with the annular groove and the air inlet region 111, the air outlet groove is respectively communicated with the annular groove and the air outlet region 114, and the cover plate 20 further covers the annular groove, the air inlet groove and the air outlet groove.

After the cover plate 20 is covered on the substrate 10, the openings, the annular grooves, the gas inlet grooves and the gas outlet grooves are covered, and after the reaction gas is input into the gas inlet region 111 from the plurality of first communication holes 21 and/or the plurality of second communication holes 101, a part of the reaction gas enters the annular grooves from the gas inlet grooves and finally enters the gas outlet region 114 from the gas outlet grooves to be discharged. The reaction gas entering the annular groove forms an air curtain between the substrate 10 and the cover plate 20, and the opening is positioned in the space formed by the surrounding of the annular groove, so that the sealing performance of the cover plate 20 covering the opening is improved, the external gas is prevented from entering, the reaction effect of the reaction gas and the wafer is improved, and the quality of the generated film is improved.

In some embodiments, the showerhead assembly further includes an inlet fitting 80, the inlet fitting 80 communicating with the first inlet aperture 32 for connection to a device for inputting reactant gas.

Further, when the number of the first air inlet holes 32 is at least two, the air inlet joint 80 includes at least two, and two first air inlet holes 32 corresponding to two adjacent air inlet cavities 31 in the third direction respectively penetrate through two opposite sides of the first air inlet member 30 along the second direction, so as to conveniently arrange the air inlet joint 80.

In practical application, the air inlet joint 80 is also communicated with the second air inlet hole, and when the second air inlet hole comprises at least two air inlet holes, the arrangement form is the same.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the utility model. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims

1. An ALD spray assembly, comprising:

2. The ALD spray assembly of claim 1, further comprising at least three adjustment feet, each having an adjustment end reciprocally movable in a first direction perpendicular to the cover plate, the adjustment end of each adjustment foot being connected to the base plate.

3. The ALD spray assembly of claim 2, wherein each of the adjustment legs includes a fixed base and an adjustment base, the adjustment base being threadably connected to the fixed base, the adjustment base being connected to the base plate.

4. The ALD spray assembly of claim 1, wherein the first air inlet has a top wall and a side wall extending from an edge of the top wall to the same side, the top wall and the side wall enclose the air inlet chamber and the first air outlet communicating with the air inlet chamber, the first air inlet is opened in the side wall of the air inlet chamber, the first communication holes are arranged at intervals along a second direction parallel to the cover plate, and the top wall of the air inlet chamber extends from the side wall opened with the first air inlet along the second direction and gradually approaches the cover plate.

5. The ALD spray assembly of claim 1, wherein the first air inlet or the cover plate is provided with a plurality of first flow distribution islands which are located in the connecting space and are arranged at intervals in a second direction parallel to the cover plate, a first flow distribution channel communicating with spaces on two opposite sides of the first flow distribution island is formed between two adjacent first flow distribution islands, and the first air outlet and the plurality of first communication holes are respectively communicated with the spaces on two opposite sides of the first flow distribution island.

6. The ALD spray assembly of claim 5, wherein the first air inlet is provided with a plurality of the first turbulence islands, the plurality of the first turbulence islands being located within the upper level space;

7. The ALD spray assembly of claim 1, wherein the reaction chamber comprises a gas inlet area, a uniform flow area and a reaction area which are communicated in sequence, the gas inlet area is communicated with the plurality of first communication holes;

8. The ALD spray assembly of claim 1, wherein the substrate is further provided with an exhaust channel communicating with the reaction chamber, the exhaust channel penetrating through another side of the substrate away from the cover plate;

9. The ALD spray assembly of claim 1, wherein the substrate further has a feed channel communicating with the reaction chamber, an end of the feed channel remote from the reaction chamber extends through another side of the substrate remote from the opening, the feed channel being for the workpiece to be processed to enter the reaction chamber.

10. An ALD coating apparatus comprising an ALD spray assembly according to any one of claims 1 to 9.