CN216084917U - Thin-film solar cell substrate etching device - Google Patents
Thin-film solar cell substrate etching device Download PDFInfo
- Publication number
- CN216084917U CN216084917U CN202122799176.6U CN202122799176U CN216084917U CN 216084917 U CN216084917 U CN 216084917U CN 202122799176 U CN202122799176 U CN 202122799176U CN 216084917 U CN216084917 U CN 216084917U
- Authority
- CN
- China
- Prior art keywords
- waste liquid
- etching
- liquid collecting
- glass substrate
- collecting box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 88
- 238000005530 etching Methods 0.000 title claims abstract description 73
- 239000010409 thin film Substances 0.000 title claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 102
- 239000002699 waste material Substances 0.000 claims abstract description 97
- 239000011521 glass Substances 0.000 claims abstract description 68
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Weting (AREA)
Abstract
A thin film solar cell substrate etching device comprises a V-shaped glass substrate base, an etching integral support and a waste liquid collecting box; the V-shaped glass substrate base comprises a cylindrical straight rod, a U-shaped clamping groove and a locking hexagon bolt and can be used for fixing substrates with different sizes; the etching integral support is divided into an upper layer and a lower layer, the upper layer is an etching area, the lower layer is a waste liquid collecting area, and a waste liquid outflow hole is reserved in the middle layered part; the waste liquid collecting box comprises a waste liquid collecting box pouring groove and a waste liquid collecting box observation window, so that the waste liquid pouring and waste liquid collecting conditions can be conveniently observed; the four circular salient points of the V-shaped glass substrate base are matched with a waste liquid outflow hole of the etching integral support to complete the assembly of an etching area of the etching integral support; the waste liquid collecting box is assembled with the waste liquid collecting area of the etching integral support through the clamping groove of the waste liquid collecting box. The device can be used for etching substrates with different sizes, ensures that the etching time of all the substrates is consistent, and is convenient for uniformly collecting waste liquid.
Description
Technical Field
The utility model relates to a wet etching technology, in particular to a thin film solar cell substrate etching device.
Background
The wet etching can strip the unnecessary part of the material surface through the solution, and is widely applied to the semiconductor manufacturing process. At present, the wet etching device needs complex designs such as a roller, a nozzle and the like, and the cost and the complexity of the laboratory etching device are increased. The utility model patent with application number 201410298834.5 proposes an etching method and an etching soaking device for glass substrates, and a conveying device used in loading the glass substrates comprises a complex roller design and needs to be matched with a cylinder as a power source, thereby increasing the complexity and the cost of the whole device. In addition, the device does not carry out special collection to the waste liquid and handles, has increased follow-up waste liquid treatment's the degree of difficulty, is unfavorable for experimenter safety in operation and environmental protection.
Disclosure of Invention
In order to simplify the existing etching device so as to be suitable for laboratory etching experiments and properly collect waste liquid, the utility model aims to provide the etching device for the glass substrate, which can be used for uniformly collecting and managing the waste liquid after the glass substrate is etched. The device has simple structure, can strictly control the etching time of a plurality of glass substrates to be consistent, and is suitable for etching the glass substrates with different sizes.
A thin film solar cell substrate etching device comprises a V-shaped glass substrate base, an etching integral support and a waste liquid collecting box; the V-shaped glass substrate base is composed of circular convex points, glass substrate fixing clamping teeth, a U-shaped clamping groove, a locking hexagon bolt, a fixing groove and a cylindrical straight rod; the U-shaped clamping groove consists of a glass substrate fixing latch and a hexagonal bolt groove, the U-shaped clamping groove and the fixing groove of the V-shaped glass substrate base are positioned in the same horizontal plane and can be inserted into the fixing groove of the V-shaped glass substrate base, the glass substrate fixing latch of the V-shaped glass substrate base corresponds to the glass substrate fixing latch of the U-shaped clamping groove, and the length of the U-shaped clamping groove inserted into the fixing groove of the V-shaped glass substrate base can be adjusted according to the size of a glass substrate; the locking hexagon bolt is used for locking the U-shaped clamping groove and the fixing groove of the V-shaped glass substrate base; the cylindrical straight rod consists of a first cylindrical straight rod and a second cylindrical straight rod and is used for fixing, taking and placing the V-shaped glass substrate base; the etching integral support is divided into an upper-layer etching area, a middle layering part and a lower-layer waste liquid collecting area, the upper-layer etching area can be used for placing a V-shaped glass substrate base and etching liquid, the middle layering part comprises a waste liquid outflow hole, and the lower-layer waste liquid collecting area can be used for placing a waste liquid collecting box; the waste liquid collecting box consists of a waste liquid collecting box clamping groove, a waste liquid collecting box handle, a waste liquid collecting box observation window, a waste liquid collecting tank and a waste liquid collecting box dumping groove; the waste liquid collecting box pouring groove can facilitate the pouring of waste liquid; the observation window of the waste liquid collection box can facilitate the observation of the collection condition of the waste liquid; the four circular salient points of the V-shaped glass substrate base are matched with a waste liquid outflow hole of the etching integral support to complete the assembly of an etching area of the etching integral support; the waste liquid collecting box is assembled with the waste liquid collecting area of the etching integral support through the clamping groove of the waste liquid collecting box. The thin-film solar cell substrate etching device is made of polytetrafluoroethylene.
The utility model has the beneficial effects that:
1. the length of inserting the U-shaped clamping groove into the V-shaped glass substrate base fixing groove can be adjusted according to the size of the thin-film solar cell substrate, and the method is suitable for etching substrates with different sizes.
2. Have the unified collection device of waste liquid, be convenient for the collection and the management of waste liquid.
3. The etching time of all the thin film solar cell substrates can be controlled to be consistent.
Drawings
The utility model is further described with reference to the following detailed description and accompanying drawings.
FIG. 1 is a general structural diagram of an etching apparatus according to the present invention.
FIG. 2 is a view showing the structure of a V-shaped glass substrate base according to the present invention.
Fig. 3 is a structural diagram of a U-shaped card slot according to the present invention.
FIG. 4 is a structural diagram of an etched integral support according to the present invention.
FIG. 5 is a view showing the structure of the waste liquid collecting box according to the present invention.
In the figure: 1 is a V-shaped glass substrate base; 1-1 is a cylindrical straight rod; 1-2 are U-shaped clamping grooves; 1-3 are locking hexagon bolts; 1-4 are glass substrate fixing latch of V-shaped glass substrate base; 1-5 are round salient points of a V-shaped glass substrate base; 1-6 are fixed grooves of a V-shaped glass substrate base; 1-7 are cylindrical straight rod thread grooves; 1-8 are locking hexagonal bolt grooves; 1-9 are glass substrate fixing latch of U-shaped neck; 2, etching the integral bracket; 2-1 is a waste liquid outlet; 2-2 is a waste liquid collecting box fixing groove; 2-3 is a waste liquid collecting box placing area; 3 is a waste liquid collecting box; 3-1 is a waste liquid collecting box observation window; 3-2 is a waste liquid collecting box clamping groove; 3-3 is a waste liquid collecting box dumping groove; 3-4 is a handle of the waste liquid collecting box; and 3-5 is a waste liquid collecting tank.
Detailed Description
A thin film solar cell substrate etching device comprises a V-shaped glass substrate base 1, an etching integral support 2 and a waste liquid collecting box 3; the V-shaped glass substrate base 1 consists of a cylindrical straight rod 1-1, a U-shaped clamping groove 1-2, a locking hexagon bolt 1-3, a glass substrate fixing latch 1-4 of the V-shaped glass substrate base, a circular convex point 1-5, a fixing groove 1-6 and a cylindrical straight rod groove 1-7; the U-shaped clamping groove 1-2 comprises a locking hexagonal bolt groove 1-8 and a glass substrate fixing latch 1-9 of the U-shaped clamping groove, the U-shaped clamping groove 1-2 and a fixing groove 1-6 of a V-shaped glass substrate base 1 are positioned in the same horizontal plane and can be inserted into the fixing groove 1-6 of the V-shaped glass substrate base 1, a glass substrate fixing latch 1-4 of the V-shaped glass substrate base 1 corresponds to the glass substrate fixing latch 1-9 of the U-shaped clamping groove 1-2, and the length of the U-shaped clamping groove 1-2 inserted into the fixing groove 1-6 of the V-shaped glass substrate base can be adjusted according to the size of a glass substrate; the locking hexagon bolts 1-3 are used for locking the U-shaped clamping grooves 1-2 and the fixing grooves 1-6 of the V-shaped glass substrate base; the cylindrical straight rods 1-7 consist of a first cylindrical straight rod and a second cylindrical straight rod and are used for fixing, taking and placing the V-shaped glass substrate base 1; the etching integral support 2 is divided into an upper-layer etching area, a middle-layer layering part and a lower-layer waste liquid collecting area, the upper-layer etching area can be used for placing a V-shaped glass substrate base 1 and etching liquid, the middle-layer layering part comprises a waste liquid outflow hole 2-1, and the lower-layer waste liquid collecting area can be used for placing a waste liquid collecting box 3; the waste liquid collecting box 3 consists of a waste liquid collecting box observation window 3-1, a waste liquid collecting box clamping groove 3-2, a waste liquid collecting box dumping groove 3-3 and a waste liquid collecting box handle 3-4; the observation window 3-1 of the waste liquid collection box can facilitate the observation of the collection condition of the waste liquid; the waste liquid collecting box pouring tank 3-3 can facilitate the pouring of waste liquid; the four circular salient points of the V-shaped glass substrate base 1 are matched with a waste liquid outflow hole of the etching integral support to complete the assembly of an etching area of the etching integral support 2; the waste liquid collecting box 3 is assembled with the waste liquid collecting area of the etching integral support 2 through a waste liquid collecting box clamping groove. The thin-film solar cell substrate etching device is made of polytetrafluoroethylene.
The following takes a thin-film solar cell substrate with a dimension of 25mm by 25mm as an example to illustrate the specific working process of the device: firstly fixing a V-shaped glass substrate base 1 through a cylindrical straight rod 1-1, inserting a U-shaped clamping groove 1-2 into a fixing groove 1-6 of the V-shaped glass substrate base 1, adjusting the length of the U-shaped clamping groove 1-2 inserted into the fixing groove 1-6 of the V-shaped glass substrate base to ensure that a glass substrate can be fixed between the U-shaped clamping groove 1-2 and a fixing latch 1-9 of the V-shaped glass substrate base, fixing the U-shaped clamping groove 1-2 by a locking hexagonal bolt 1-3, clamping the bottom of the glass substrate in a corresponding fixing latch 1-9 of the V-shaped glass substrate base 1, correspondingly placing a circular salient point 1-5 of the V-shaped glass substrate base and a waste liquid outflow hole 2-1 of a middle layered part of an etching integral support 2 into an etching area of the etching integral support 2 after all glass substrates are placed, so as to ensure that the etching liquid can not flow into the lower waste liquid collecting box 3, and then the etching liquid is poured into the lower waste liquid collecting box for etching. After the etching is finished, the V-shaped glass substrate base 1 is taken out by using the cylindrical straight rod 1-1, etching waste liquid automatically flows into the waste liquid collecting box 3 through a waste liquid outflow hole 2-1 in the middle layered part of the etching integral support 2, other treatment liquid is continuously poured into the etching groove to perform waste liquid neutralization treatment, the storage condition of the waste liquid is observed through the waste liquid collecting box observation window 3-1, when the capacity of the waste liquid exceeds a scale mark, the waste liquid is poured out from the waste liquid collecting box pouring groove 3-3 of the waste liquid collecting box, and the waste liquid is uniformly treated.
Claims (5)
1. A thin film solar cell substrate etching device comprises a V-shaped glass substrate base, an etching integral support and a waste liquid collecting box; the V-shaped glass substrate base is composed of circular convex points, glass substrate fixing clamping teeth, a U-shaped clamping groove, a locking hexagon bolt, a fixing groove and a cylindrical straight rod; the U-shaped clamping groove and the fixing groove of the V-shaped glass substrate base are positioned in the same horizontal plane and can be inserted into the fixing groove of the V-shaped glass substrate base; the etching integral support is divided into an upper layer and a lower layer, the upper layer is an etching area, the lower layer is a waste liquid collecting area, and a waste liquid outflow hole is reserved in the middle layered part; the waste liquid collecting box comprises a waste liquid collecting box pouring groove and a waste liquid collecting box observation window, so that the waste liquid pouring and waste liquid collecting conditions can be conveniently observed; the four circular salient points of the V-shaped glass substrate base are matched with a waste liquid outflow hole of the etching integral support to complete the assembly of an etching area of the etching integral support; the waste liquid collecting box is assembled with the waste liquid collecting area of the etching integral support through the clamping groove of the waste liquid collecting box.
2. The device for etching the thin film solar cell substrate according to claim 1, wherein: the depth of the U-shaped clamping groove inserted into the V-shaped glass substrate base fixing groove can be adjusted according to the size of the glass substrate, and the adjustable range is 1.5-3 cm.
3. The device for etching the thin film solar cell substrate according to claim 1, wherein: the V-shaped glass substrate base can be separated from the etching area of the etching integral support through the cylindrical straight rod, and the diameter of the cylindrical straight rod is 1 cm.
4. The device for etching the thin film solar cell substrate according to claim 1, wherein: and waste liquid outflow holes are formed between the etching area and the waste liquid collecting area of the etching integral support, the size of each waste liquid outflow hole is matched with the size of the circular salient point below the V-shaped glass substrate base, the diameter of each waste liquid outflow hole is 1cm, and the number of the waste liquid outflow holes is 3-4.
5. The device for etching the thin film solar cell substrate according to claim 1, wherein: the material used for the device is polytetrafluoroethylene.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122799176.6U CN216084917U (en) | 2021-11-16 | 2021-11-16 | Thin-film solar cell substrate etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122799176.6U CN216084917U (en) | 2021-11-16 | 2021-11-16 | Thin-film solar cell substrate etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216084917U true CN216084917U (en) | 2022-03-18 |
Family
ID=80661265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122799176.6U Expired - Fee Related CN216084917U (en) | 2021-11-16 | 2021-11-16 | Thin-film solar cell substrate etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216084917U (en) |
-
2021
- 2021-11-16 CN CN202122799176.6U patent/CN216084917U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20220318 |