CN202610331U - Single-face etching device for laboratory - Google Patents
Single-face etching device for laboratory Download PDFInfo
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- CN202610331U CN202610331U CN 201220276396 CN201220276396U CN202610331U CN 202610331 U CN202610331 U CN 202610331U CN 201220276396 CN201220276396 CN 201220276396 CN 201220276396 U CN201220276396 U CN 201220276396U CN 202610331 U CN202610331 U CN 202610331U
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- groove
- etching
- absorbing plate
- etching device
- liquid absorbing
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Abstract
The utility model discloses a single-face etching device for a laboratory. The single-face etching device comprises an etching groove body (1) and a liquid absorbing plate (2). A groove (3) is arranged on an upper surface of the etching groove body (1), the shape of the liquid absorbing plate (2) is matched with the shape of the groove (3), the liquid absorbing plate (2) is placed in the groove (3), a notch (4) is arranged at the position of an edge of the liquid absorbing plate (2), and small holes (5) are evenly distributed at the center of the liquid absorbing plate (2). The single-face etching device has the advantages of being capable of performing etching tests on test pieces in different specifications and different features, effectively controlling technical parameters such as response time and etching depth and enabling the obtained results of the tests to be real and reliable. When the single-face etching device is used in the tests, reaction liquid using quantity needed by the tests is less, and unnecessary energy waste and environmental pollution are reduced. The single-face etching device has the advantages of being simple in structure, convenient to operate, low in cost and the like.
Description
Technical field
The utility model relates to the single face etched features of using in a kind of laboratory.
Background technology
In manufacture of solar cells, etching is as three process, and it mainly acts on is the p-n knot of removing the diffusion silicon chip back side, back and edge, and the phosphorosilicate glass that in diffusion process, produces, and removes metallic impurity simultaneously, prevents electric leakage.What we adopted usually is that wet etching is an acid etch, generally adopts the HF/HNO3 system, in etching, strengthens the reflectivity at the silicon chip back side, increases the absorption of light, helps increasing short-circuit current.The equipment of the wet etching that we use always in the production has RENA and SCHMID, and they are applicable to large-scale quantification production.
Research that usually all can experimentizing property before industrialization is produced to the special-purpose apparatus in laboratory, generally all is to adopt large-scale production units such as RENA or SCHMID in the laboratory now, has brought following shortcoming like this:
(1) owing to film source in the experiment is less, adopt main equipment to cause great waste to resources such as human and material resources;
(2) large-scale production unit is comparatively strict to the specification requirement of film source, and handled usually all is the silicon chip of 125mm * 125mm or 156mm * 156mm size, for the normal etching of the silicon chip that does not meet its requirement;
(3) large-scale production unit can't provide data support accurately and effectively for industrialization production to the difficult control of technical parameters such as etching depth, erosion rate.
The utility model content
The purpose of the utility model is to overcome the shortcoming and defect of above-mentioned prior art; The single face etched features that provides a kind of laboratory to use; Solve in the existing etching experiment and also adopt some large-scale production units; Resources such as human and material resources are caused the significant wastage shortcoming, also solve large-scale production unit and be difficult to control technical parameters such as etching depth, erosion rate, cause to provide the drawback of experimental data accurately and effectively.
The purpose of the utility model realizes through following technical proposals: the single face etched features that a kind of laboratory is used; Comprise etching cell body and imbibition plate; The upper surface of described etching cell body is provided with a groove, the shape of described imbibition plate and groove coupling, and the imbibition plate is positioned in the groove; The edge of imbibition plate is provided with a breach, and the center of imbibition plate is evenly distributed with aperture.
Further, above-mentioned groove is that the cross section is square indentations, and imbibition plate and its coupling be the square plate that can put into groove, and the height of imbibition plate are not higher than the degree of depth of groove.
The beneficial effect of the utility model is: can carry out etching experiment to the test film of different size, different-shape, and effective technical parameters such as controlling reaction time, etching depth, make the result of experiment gained more true and reliable; This device needed reaction solution requirement in experiment is fewer, has reduced unnecessary energy dissipation and environmental pollution; The utility model also has simple in structure, easy to operate, low cost and other advantages.
Description of drawings
Fig. 1 is the sectional view of the utility model;
Fig. 2 is the structural representation of imbibition plate;
Among the figure, 1-etching cell body, 2-imbibition plate, 3-groove, 4-breach, 5-aperture.
Embodiment
Below in conjunction with embodiment the utility model is done further to specify, but the structure of the utility model is not limited only to following examples:
[embodiment]
Like Fig. 1, shown in Figure 2; The single face etched features that a kind of laboratory is used comprises etching cell body 1 and imbibition plate 2, and the upper surface of described etching cell body 1 is provided with a groove 3; The shape of described imbibition plate 2 and groove 3 couplings; Imbibition plate 2 is positioned in the groove 3, and the edge of imbibition plate 2 is provided with a breach 4, and the center of imbibition plate 2 is evenly distributed with aperture 5.
During experiment, imbibition plate 2 is put into groove 3, drip the reaction solution 10-15 for preparing from the breach of imbibition plate 4 and drip, commonly used is the mixed solution of HF+HNO3; Question response liquid through wicking action from imbibition plate 2 intermediary uniform small pores 5 by after the sucking-off; The silicon chip of etching is put into groove 3; It is positioned at above the imbibition plate 2; And notice that making herbs into wool faces up, etched surface is contacted with reaction solution carry out etching, to reach removal the silicon chip back side after the diffusion and periphery P-N knot; Etching time is calculated in requirement according to etching depth, generally is about 1-3min, with the made tweezers of tetrafluoroethylene silicon chip is taken out after etching finishes.
Claims (3)
1. single face etched features that the laboratory is used; It is characterized in that comprise etching cell body (1) and imbibition plate (2), the upper surface of described etching cell body (1) is provided with a groove (3); The shape of described imbibition plate (2) and groove (3) coupling; Imbibition plate (2) is positioned in the groove (3), and the edge of imbibition plate (2) is provided with a breach (4), and the center of imbibition plate (2) is evenly distributed with aperture (5).
2. the single face etched features that a kind of laboratory according to claim 1 is used is characterized in that, described groove (3) is square indentations for the cross section.
3. the single face etched features that a kind of laboratory according to claim 1 and 2 is used is characterized in that, the height of described imbibition plate (2) is not higher than the degree of depth of groove (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220276396 CN202610331U (en) | 2012-06-13 | 2012-06-13 | Single-face etching device for laboratory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220276396 CN202610331U (en) | 2012-06-13 | 2012-06-13 | Single-face etching device for laboratory |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202610331U true CN202610331U (en) | 2012-12-19 |
Family
ID=47344043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220276396 Expired - Fee Related CN202610331U (en) | 2012-06-13 | 2012-06-13 | Single-face etching device for laboratory |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202610331U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105220143A (en) * | 2015-07-23 | 2016-01-06 | 西安交通大学 | Based on front side of silicon wafer microstructure protector and the method for wet corrosion technique |
| EP3376202B1 (en) * | 2017-03-16 | 2019-08-07 | Bruker Daltonik GmbH | Separation of liquid in droplets and sedimented material enclosed therein |
-
2012
- 2012-06-13 CN CN 201220276396 patent/CN202610331U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105220143A (en) * | 2015-07-23 | 2016-01-06 | 西安交通大学 | Based on front side of silicon wafer microstructure protector and the method for wet corrosion technique |
| EP3376202B1 (en) * | 2017-03-16 | 2019-08-07 | Bruker Daltonik GmbH | Separation of liquid in droplets and sedimented material enclosed therein |
| US11017993B2 (en) | 2017-03-16 | 2021-05-25 | Bruker Daltonik Gmbh | Separation of liquid in droplets and sedimented material enclosed therein |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121219 Termination date: 20160613 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |