CN215989630U - Multi-pass multi-frequency multiplier - Google Patents

Multi-pass multi-frequency multiplier Download PDF

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CN215989630U
CN215989630U CN202120811593.5U CN202120811593U CN215989630U CN 215989630 U CN215989630 U CN 215989630U CN 202120811593 U CN202120811593 U CN 202120811593U CN 215989630 U CN215989630 U CN 215989630U
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frequency
light
pass
beam splitter
quadruple
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雷健
关鹏
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Dongguan Zhongke Atomic Precision Manufacturing Technology Co ltd
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Dongguan Zhongke Atomic Precision Manufacturing Technology Co ltd
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Abstract

The utility model provides a multi-pass multi-frequency doubling device, which comprises a laser, a first dichroic beam splitter, a multi-pass second frequency doubling device and a multi-pass fourth frequency doubling device, wherein the laser, the first dichroic beam splitter, the multi-pass second frequency doubling device and the multi-pass fourth frequency doubling device are sequentially arranged along the direction of a light path; the first dichroic beam splitter enables the fundamental frequency light generated by the laser to enter the multi-pass frequency doubling device and reflects the fundamental frequency light from the multi-pass frequency doubling device; the multi-pass frequency doubling device performs multi-pass frequency doubling on the fundamental frequency light and reflects the fundamental frequency light which is not frequency doubled back to the first dichroic spectroscope; the multi-pass quadruple frequency device performs multi-pass quadruple frequency on the frequency doubling light and reflects the frequency doubling light which is not frequency doubled again back to the multi-pass frequency doubling device. The method and the device can improve the utilization rate of the fundamental frequency light, thereby improving the frequency doubling efficiency and the frequency quadrupling efficiency.

Description

Multi-pass multi-frequency multiplier
Technical Field
The present disclosure relates to the field of laser frequency doubling technology, and more particularly, to a multi-pass frequency doubling device.
Background
With the rapid development of laser technology, various new lasers should be put into operation, but nevertheless, the requirements for some specific wavelength lasers in scientific research and application cannot be met. The rare earth ion-doped all-solid-state laser widely used at present can only obtain tunable laser output with a few wavelengths or specific bandwidth. Nonlinear optical frequency conversion is an important means for obtaining novel wavelength laser. The conventional frequency doubling laser has a simple structure, and the conversion efficiency of second harmonic frequency doubling light generated by first frequency doubling and fourth frequency doubling light generated by second harmonic frequency doubling is generally low, so that the difficulty in the field of nonlinear optical conversion needs to be deeply researched. Especially, the current short wavelength ultraviolet laser is mainly realized by multiple frequency multiplication.
At present, the fourth harmonic laser is mainly generated by an extra-cavity first frequency doubling technology and a multiple reflection frequency doubling technology. The first frequency doubling outside the cavity is that the output second harmonic passes through a focusing system to the quadruple frequency crystal or the high-power fundamental frequency light passes through the technical route of the frequency doubling crystal in turn to obtain the fourth harmonic. The method is characterized in that the power density is high after the second harmonic is focused, the surface loss of the crystal is easily caused, and the efficiency is extremely low after the first conversion.
Aiming at the multiple reflection frequency doubling technology, the fundamental frequency light and the second harmonic are frequency doubled back and forth on the frequency doubling crystal and the frequency quadrupling crystal respectively, fourth harmonic is output, and the frequency doubling conversion efficiency can be greatly improved.
The utility model discloses a scheme for amplifying fourth harmonic generation, which is a Chinese utility model patent No. CN100421346C entitled "fourth harmonic solid laser generation method". The frequency doubling efficiency is improved by adopting a multiple reflection method inside and outside a second harmonic cavity. However, the technology has strict requirements on polarization, only frequency doubling is carried out on the fundamental frequency light of the p light, and the fundamental frequency light is greatly wasted. The utility model of Chinese utility model No. CN104810718B entitled "YLF laser quadruple frequency device and debugging method" discloses a technique for realizing high-efficiency frequency multiplication by controlling the temperature of quadruple frequency crystal, wherein the double frequency and quadruple frequency both adopt a single-pass frequency multiplication mode, and the frequency multiplication efficiency is lower without utilizing the fundamental frequency light and the second harmonic light for many times.
SUMMERY OF THE UTILITY MODEL
The utility model provides a multi-pass multi-frequency multiplication device, which is used for solving the problems that the traditional laser frequency doubling twice and frequency doubling quadruple adopt a one-way frequency multiplication mode, the fundamental frequency light and the second harmonic light are not utilized for multiple times, and the frequency doubling efficiency is lower. The embodiment of the utility model provides a multi-pass multi-frequency multiplication device. The technical scheme is as follows:
according to a first aspect of the embodiments of the present disclosure, there is provided a multi-pass multi-frequency multiplier apparatus, including: the system comprises a laser, a first dichroic beam splitter, a multi-pass frequency doubling device and a multi-pass frequency quadrupling device;
the laser is used for generating fundamental frequency light;
the first dichroic beam splitter is arranged on an emergent light path of the laser, and is used for enabling the fundamental frequency light to penetrate through the first dichroic beam splitter to enter the multi-pass frequency doubling device for frequency doubling, and is also used for reflecting the fundamental frequency light which is not frequency doubled and is from the multi-pass frequency doubling device back to the multi-pass frequency doubling device for frequency doubling;
the multi-pass frequency doubling device is arranged on an emergent light path of the first dichroic beam splitter and is used for carrying out multi-pass frequency doubling on the fundamental frequency light to enable frequency doubled fundamental frequency light to be emergent along the direction of the light path and reflecting un-frequency doubled fundamental frequency light to the first dichroic beam splitter;
the multi-pass quadruple frequency device is arranged on an emergent light path of the multi-pass double frequency device, and is used for performing multi-pass quadruple frequency on double-frequency light emitted by the multi-pass double frequency device, enabling the double-frequency quadruple light to be emitted along the direction of the light path, and reflecting the double-frequency light which is not subjected to secondary frequency doubling back to the multi-pass double frequency device.
The technical scheme provided by the embodiment of the utility model can have the following beneficial effects: according to the scheme provided by the application, the frequency doubling is carried out on the basic frequency light generated by the laser to obtain the frequency doubling light, meanwhile, the frequency doubling is carried out on the frequency doubling light to obtain the frequency quadrupling light, and in the frequency doubling and frequency quadrupling processes, the basic frequency light and the second harmonic light which are not successfully frequency doubled are repeatedly utilized, so that the utilization rate of the basic frequency light can be improved, the frequency doubling efficiency and the frequency quadrupling efficiency are improved, and the conversion rate of the fourth harmonic laser generated by a frequency quadrupling crystal is favorably improved.
In one embodiment, the multi-pass frequency doubling device comprises a frequency doubling crystal, a second dichroic beam splitter and a first total reflecting mirror;
the frequency doubling crystal is arranged on an emergent light path of the first dichroic beam splitter and is used for carrying out frequency doubling on the fundamental frequency light;
the second dichroic beam splitter is arranged on an emergent light path of the frequency doubling crystal, and an included angle of 45 degrees is formed between an incident surface of the second dichroic beam splitter and an emergent surface of the frequency doubling crystal; the incident surface of the second dichroic spectroscope is plated with a fundamental frequency light high-reflection film and a double frequency light high-transmission film, and the emergent surface of the second dichroic spectroscope is plated with a double frequency light high-transmission film;
the first total reflector is arranged on a reflection light path of the second dichroic spectroscope, and an incident plane of the first total reflector and an incident plane of the second dichroic spectroscope form an included angle of 45 degrees.
In one embodiment, the multi-pass frequency quadrupler apparatus comprises: a quadruple frequency crystal, a third dichroic beam splitter and a second total reflector;
the quadruple frequency crystal is arranged on a transmission light path of the second dichroic spectroscope and used for performing frequency doubling on the frequency doubled light again to obtain quadruple frequency light;
the third dichroic beam splitter is arranged on an emergent light path of the quadruple frequency crystal, and an included angle of 45 degrees is formed between an incident surface of the third dichroic beam splitter and an emergent surface of the quadruple frequency crystal; the incident surface of the third dichroic beam splitter is plated with a frequency-doubled light high-reflection film and a frequency-quadruple light high-transmission film, and the emergent surface of the third dichroic beam splitter is plated with a frequency-quadruple light high-transmission film;
the second total reflection mirror is arranged on a reflection light path of the third dichroic beam splitter, and an incident plane of the second total reflection mirror and an incident plane of the third dichroic beam splitter form an included angle of 45 degrees.
In one embodiment, the first dichroic beam splitter has an entrance surface coated with a fundamental frequency light high-transmittance film and an exit surface coated with a fundamental frequency light and a double frequency light high-reflectance film.
In one embodiment, the fundamental wavelength of light is 1064nm, the second harmonic wavelength of light is 532nm, and the fourth harmonic wavelength of light is 266 nm.
In one embodiment, the frequency doubling crystal includes, but is not limited to, a BBO, KTP crystal.
In one embodiment, the quadruple frequency crystal includes, but is not limited to, CLBO, BBO crystals.
In one embodiment, the multi-pass multi-frequency multiplying apparatus further comprises: the multi-pass octave device is arranged on an emergent light path of the multi-pass quadruple device and is used for carrying out multi-pass octave on quadruple light emitted by the multi-pass quadruple device so as to enable the octave light which is frequency doubled to be emitted along the direction of the light path and reflecting the quadruple light which is not frequency doubled back to the multi-pass quadruple device.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and together with the description, serve to explain the principles of the disclosure.
Fig. 1 is a schematic structural diagram of a multi-pass multi-frequency multiplier according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a multi-pass multi-frequency multiplier according to a second embodiment of the present invention.
Detailed Description
Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The implementations described in the exemplary embodiments below are not intended to represent all implementations consistent with the present disclosure. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the present disclosure, as detailed in the appended claims.
The disclosed embodiment provides a multi-pass multi-frequency multiplier, as shown in fig. 1, including: the system comprises a laser 1, a first dichroic spectroscope 2, a multi-pass frequency doubling device 9 and a multi-pass frequency quadrupling device 10.
Wherein the laser 1 is used to generate fundamental frequency light.
The first dichroic beam splitter 2 is disposed on an exit light path of the laser 1, and the first dichroic beam splitter 2 is configured to allow the fundamental frequency light to enter the multi-pass frequency doubling device 9 through itself for frequency doubling, and is further configured to reflect the fundamental frequency light, which is not frequency doubled, from the multi-pass frequency doubling device 9 back to the multi-pass frequency doubling device 9 for frequency doubling. Preferably, the incident surface of the first dichroic beam splitter 2 is coated with a fundamental frequency light high-transmittance film, and the exit surface is coated with a fundamental frequency light and a double frequency light high-reflection film.
The multi-pass frequency doubling device 9 is arranged on an emergent light path of the first dichroic beam splitter 2, and the multi-pass frequency doubling device 9 is used for carrying out multi-pass frequency doubling on the fundamental frequency light, enabling the frequency doubled fundamental frequency light to be emergent along the direction of the light path, and reflecting the fundamental frequency light which is not frequency doubled back to the first dichroic beam splitter 2.
The multi-pass quadruple frequency device 10 is arranged on an emergent light path of the multi-pass double frequency device 9, and the multi-pass quadruple frequency device 10 is used for performing multi-pass quadruple frequency on the double frequency light emitted by the multi-pass double frequency device 9, enabling the doubled frequency quadrupled light to be emitted along the direction of the light path, and reflecting the double frequency light which is not doubled again to the multi-pass double frequency device 9.
Illustratively, the fundamental wavelength is 1064nm, the frequency-doubled wavelength is 532nm, and the frequency-quadrupled wavelength is 266 nm.
In the embodiment shown in fig. 1, the frequency doubling is performed on the fundamental frequency light generated by the laser to obtain the frequency doubled light, and the frequency doubled light is simultaneously subjected to the frequency doubling to obtain the frequency quadrupled light, so that the fundamental frequency light and the second harmonic light which are not successfully frequency doubled are repeatedly utilized in the frequency doubling and frequency quadrupler processes, the utilization rate of the fundamental frequency light can be improved, the frequency doubling efficiency and the frequency quadrupler efficiency are improved, and the conversion rate of the fourth harmonic laser generated by the frequency quadrupler crystal is favorably improved.
In one embodiment, as shown in FIG. 2, the multi-pass frequency doubler 9 comprises a frequency doubler crystal 3, a second dichroic beamsplitter 4 and a first total reflecting mirror 5. The frequency doubling crystal 3 is arranged on an emergent light path of the first dichroic beam splitter 2, and the frequency doubling crystal 3 is used for doubling the frequency of the fundamental frequency light. The second dichroic beam splitter 4 is arranged on the emergent light path of the frequency doubling crystal 3 in an angle of 45 degrees, namely the incident plane of the second dichroic beam splitter 4 forms an included angle of 45 degrees with the emergent plane of the frequency doubling crystal 3; the first total reflection mirror 5 is arranged on a reflection light path of the second dichroic beam splitter 4, and an included angle of 45 degrees is formed between an incident plane of the first total reflection mirror 5 and an incident plane of the second dichroic beam splitter 4. Preferably, the incident surface of the second dichroic beam splitter 4 is coated with a fundamental frequency light high reflection film and a frequency-doubled light high transmission film, and the exit surface is coated with a frequency-doubled light high transmission film.
The operation principle of the multi-pass frequency doubling device 9 in fig. 2 is as follows:
because the incident surface of the first dichroic beam splitter 2 is plated with a fundamental frequency light high-transmission film, the exit surface is plated with a fundamental frequency light and a double frequency light high-reflection film, the fundamental frequency light emitted by the laser 1 passes through the first dichroic beam splitter 2, then is frequency-doubled by the double frequency crystal 3, the exit light of the double frequency crystal 3 enters the second dichroic beam splitter 4, because the incident surface of the second dichroic beam splitter 4 is plated with the fundamental frequency light high-reflection film and the double frequency light high-transmission film, the exit surface is plated with the double frequency light high-transmission film, therefore, the second dichroic beam splitter 4 exits the quadruple frequency light in the incident light, and reflects the fundamental frequency light which is not frequency-doubled to the first total reflection mirror 5, the first total reflection mirror 5 reflects the fundamental frequency light back to the second dichroic beam splitter 4, the fundamental frequency light passes through the second dichroic beam splitter 4, reaches the exit surface of the first dichroic beam splitter 2 through the second dichroic crystal 3, and is finally reflected again by the exit surface of the double frequency light of the first dichroic beam splitter 2, therefore, the fundamental frequency light which is not frequency doubled reciprocates back and forth among the first dichroic beam splitter 2, the frequency doubling crystal 3 and the first total reflecting mirror 5, thereby realizing multi-pass frequency doubling and realizing higher conversion efficiency of the frequency doubling.
Illustratively, the frequency doubling crystal 3 is a KTP or BBO crystal.
In one embodiment, as shown in fig. 2, the multi-pass quadrupler apparatus comprises: a quadruple frequency crystal 6, a third dichroic beam splitter 7 and a second total reflecting mirror 8.
The quadruple frequency crystal 6 is arranged on the transmission light path of the second dichroic beam splitter 4, and the quadruple frequency crystal 6 is used for performing frequency doubling on the double-frequency light again to obtain quadruple frequency light. The third dichroic beam splitter 7 is arranged on the emergent light path of the quadruple frequency crystal 6 at an angle of 45 degrees, namely, the incident plane of the third dichroic beam splitter 7 forms an included angle of 45 degrees with the emergent plane of the quadruple frequency crystal 6; the second total reflection mirror 8 is arranged on a reflection light path of the third dichroic beam splitter 7, and an included angle of 45 degrees is formed between an incident plane of the second total reflection mirror 8 and an incident plane of the third dichroic beam splitter 7. Preferably, the incident surface of the third dichroic beam splitter 7 is coated with a double-frequency light high-reflection film and a quadruple-frequency light high-transmission film, and the exit surface is coated with a quadruple-frequency light high-transmission film.
The operating principle of the multi-pass frequency quadrupler 10 in fig. 2 is as follows: the second dichroic light generated by the multi-pass frequency doubling device 9 is emitted from the second dichroic beam splitter 4, then frequency doubling is carried out again through the quadruple frequency crystal 6, the emergent light of the quadruple frequency crystal 6 is emitted onto the third dichroic beam splitter 7, because the incident surface of the third dichroic beam splitter 7 is plated with a frequency doubling light high-reflection film and a four frequency doubling light high-transmission film, and the emergent surface is plated with a four frequency doubling light high-transmission film, at this time, in the incident light of the third dichroic beam splitter 7, the four frequency doubling light is directly emitted, the frequency doubling light which is not frequency doubled by the four frequency doubling crystal 6 is reflected by the third dichroic beam splitter 7, then the light is emitted onto the second total reflector 8 and then is reflected back to the multi-pass frequency doubling device 10 and the multi-pass frequency doubling device 9, specifically, the frequency doubling light reflected by the second total reflector 8 is reflected by the third dichroic beam splitter 7, then sequentially passes through the four frequency doubling crystal 6 and the second dichroic beam splitter 4 (because the two surfaces of the second dichroic 4 are plated with frequency doubling light high-transmission films), After the frequency doubling crystal 3 is reflected back to the multi-pass frequency doubling device 10 by the first dichroic beam splitter 2 coated with a frequency doubling light high reflection film for multi-pass frequency doubling, and the frequency doubled again is output as a quadruple frequency light by the third dichroic beam splitter 7, namely, the frequency doubled light which is not frequency doubled reciprocates back and forth between the first dichroic beam splitter 2 and the second total reflecting mirror 8, so that the multi-pass frequency quadruple is realized, and the conversion efficiency of the quadruple frequency is further improved.
Illustratively, the quadruple frequency crystal 6 is a CLBO or BBO crystal.
In an optional embodiment, the multi-pass multi-frequency multiplier provided in the present invention may further include: and the multi-pass octave device is arranged on an emergent light path of the multi-pass quadruple frequency device 10 and is used for carrying out frequency doubling on the quadruple frequency light emitted by the multi-pass quadruple frequency device 10 again so as to obtain octave frequency light. Similar to the frequency doubling device and the frequency quadrupling device described above, the frequency octaving device may include an frequency octaving crystal, a third dichroic 45 ° beam splitter, and a third total reflection mirror. The octave crystal is arranged on the emergent light path of the third dichroic 45-degree spectroscope, the octave crystal is used for carrying out frequency doubling on quadruple light from the quadruple frequency device again to obtain octave light, the third dichroic 45-degree spectroscope is arranged on the emergent light path of the octave crystal, and the incident plane of the third dichroic 45-degree spectroscope and the emergent plane of the octave crystal form an included angle of 45 degrees; the incident surface of the third dichroic 45-degree spectroscope is plated with a quadruple frequency light high-reflection film and a octave frequency light high-transmission film, and the emergent surface of the third dichroic 45-degree spectroscope is plated with an octave frequency light high-transmission film. The third total reflecting mirror is arranged on a reflection light path of the third dichroic 45-degree spectroscope, and an incident plane of the third total reflecting mirror and an incident plane of the third dichroic 45-degree spectroscope form an included angle of 45 degrees. The working principle of the frequency octave device in this embodiment is similar to that of the frequency quadruplicate device, and those skilled in the art can further modify the frequency octave device according to the inventive concept of the foregoing embodiment of the present invention to implement the required multi-pass multi-frequency multiplication, which is not described herein again.
Other embodiments of the disclosure will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This application is intended to cover any variations, uses, or adaptations of the disclosure following, in general, the principles of the disclosure and including such departures from the present disclosure as come within known or customary practice within the art to which the disclosure pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the disclosure being indicated by the following claims.
It will be understood that the present disclosure is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the present disclosure is limited only by the appended claims.

Claims (8)

1. A multi-pass, multi-frequency multiplying apparatus, comprising: the device comprises a laser (1), a first dichroic spectroscope (2), a multi-pass frequency doubling device (9) and a multi-pass frequency quadrupling device (10);
the laser (1) is used for generating fundamental frequency light;
the first dichroic beam splitter (2) is arranged on an emergent light path of the laser (1), and the first dichroic beam splitter (2) is used for enabling the fundamental frequency light to enter the multi-pass frequency doubling device (9) through the first dichroic beam splitter for frequency doubling, and is also used for reflecting the fundamental frequency light which is not frequency doubled and comes from the multi-pass frequency doubling device (9) back to the multi-pass frequency doubling device (9) for frequency doubling;
the multi-pass frequency doubling device (9) is arranged on an emergent light path of the first dichroic beam splitter (2), and the multi-pass frequency doubling device (9) is used for carrying out multi-pass frequency doubling on the fundamental frequency light, enabling the frequency doubled light to be emergent along the direction of the light path, and reflecting the fundamental frequency light which is not frequency doubled back to the first dichroic beam splitter (2);
the multi-pass quadruple frequency device (10) is arranged on an emergent light path of the multi-pass double frequency device (9), and the multi-pass quadruple frequency device (10) is used for performing multi-pass quadruple frequency on the double-frequency light emitted by the multi-pass double frequency device (9) so that the double-frequency quadruple frequency light is emitted along the direction of the light path and is also used for reflecting the double-frequency light which is not subjected to secondary frequency doubling back to the multi-pass double frequency device (9).
2. The multipass frequency doubling apparatus according to claim 1, wherein the multipass frequency doubling device (9) comprises a frequency doubling crystal (3), a second dichroic beam splitter (4) and a first total reflecting mirror (5);
the frequency doubling crystal (3) is arranged on an emergent light path of the first dichroic beam splitter (2), and the frequency doubling crystal (3) is used for doubling the frequency of the fundamental frequency light;
the second dichroic beam splitter (4) is arranged on an emergent light path of the frequency doubling crystal (3), and an incident plane of the second dichroic beam splitter (4) and an emergent plane of the frequency doubling crystal (3) form an included angle of 45 degrees; the incident surface of the second dichroic spectroscope (4) is plated with a fundamental frequency light high-reflection film and a double frequency light high-transmission film, and the emergent surface is plated with a double frequency light high-transmission film;
the first total reflector (5) is arranged on a reflection light path of the second dichroic beam splitter (4), and an incident plane of the first total reflector (5) and an incident plane of the second dichroic beam splitter (4) form an included angle of 45 degrees.
3. The multi-pass multiple frequency multiplying device according to claim 2, characterized in that said multi-pass quadrupler frequency device (10) comprises: a quadruple frequency crystal (6), a third dichroic beam splitter (7) and a second total reflector (8);
the quadruple frequency crystal (6) is arranged on a transmission light path of the second dichroic beam splitter (4), and the quadruple frequency crystal (6) is used for performing frequency doubling on the double-frequency light again to obtain quadruple frequency light;
the third dichroic beam splitter (7) is arranged on an emergent light path of the quadruple frequency crystal (6), and an incident plane of the third dichroic beam splitter (7) and an emergent plane of the quadruple frequency crystal (6) form an included angle of 45 degrees; the incident surface of the third dichroic beam splitter (7) is plated with a double-frequency light high-reflection film and a quadruple-frequency light high-transmission film, and the emergent surface is plated with a quadruple-frequency light high-transmission film;
the second total reflection mirror (8) is arranged on a reflection light path of the third dichroic beam splitter (7), and an included angle of 45 degrees is formed between an incident plane of the second total reflection mirror (8) and an incident plane of the third dichroic beam splitter (7).
4. The multipass frequency multiplying device according to claim 1, wherein the first dichroic beamsplitter (2) is coated with a fundamental light high-transmittance film on the entrance face and with a fundamental light and a double-frequency light high-reflectance film on the exit face.
5. The multi-pass multi-frequency doubling device according to claim 1, wherein the fundamental wavelength of light is 1064nm, the second wavelength of light is 532nm, and the fourth wavelength of light is 266 nm.
6. The multipass frequency multiplying device of claim 2 wherein the frequency doubling crystal (3) comprises, but is not limited to, a BBO, KTP crystal.
7. The multipass frequency multiplying device of claim 3, wherein the quadruple frequency crystal (6) comprises, but is not limited to, a CLBO, BBO crystal.
8. The multi-pass multi-frequency multiplying apparatus according to any of claims 1-7, further comprising:
the multi-pass octave device is arranged on an emergent light path of the multi-pass quadruple frequency device (10), and is used for performing multi-pass octave frequency on the quadruple frequency light emitted by the multi-pass quadruple frequency device (10) so as to enable the frequency-doubled octave light to be emitted along the direction of the light path and reflecting the quadruple frequency light which is not frequency-doubled back to the multi-pass quadruple frequency device (10).
CN202120811593.5U 2021-04-20 2021-04-20 Multi-pass multi-frequency multiplier Active CN215989630U (en)

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