CN215856302U - Backboard component for improving utilization rate of planar target - Google Patents
Backboard component for improving utilization rate of planar target Download PDFInfo
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- CN215856302U CN215856302U CN202120164970.0U CN202120164970U CN215856302U CN 215856302 U CN215856302 U CN 215856302U CN 202120164970 U CN202120164970 U CN 202120164970U CN 215856302 U CN215856302 U CN 215856302U
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Abstract
The utility model discloses a back plate assembly for improving the utilization rate of a planar target, which comprises a back plate and a target; the back plate is provided with steps; the target comprises a first target and a second target; the first target covers the end face of the step far away from the back plate; the second step is arranged on the back plate and is attached to one side of the step; and one ends of the first target and the second target, which are far away from the back plate, are positioned on the same plane. According to the back plate assembly, through the arrangement of the steps, on one hand, a part of target materials which cannot be utilized are replaced, the consumption of raw materials of the target materials is reduced, and the utilization rate of the target materials is indirectly improved; on the other hand, the contact area of the target and the back plate is increased, and the cooling effect is improved; and finally, the connection strength of the target and the back plate is improved, the possibility of target deviation is reduced, and the product quality is improved.
Description
Technical Field
The utility model relates to the technical field of back plate assemblies, in particular to a back plate assembly for improving the utilization rate of a planar target.
Background
In the conventional magnetron sputtering coating technology, a magnetic pole is arranged on the back of a target material to provide a magnetic field, negative high voltage is applied to the target material, the target material is used as a cathode, a substrate is used as an anode, and an electric field is formed between the target material and the substrate. The magnetron sputtering coating is to make electrons spirally run on a target surface by utilizing the interaction of a magnetic field and an electric field, and continuously impact argon to generate ions, the generated ions impact the target surface under the action of the electric field to sputter a target material, and the target material is deposited on a substrate to obtain a required conductive film layer.
At present, a planar target is fixed on a planar back plate, and after magnetron sputtering, a large amount of target residues exist, so that the utilization rate is low. In addition, the target material is in single-side contact with the back plate, the effective contact area is small, the back plate has poor cooling effect on the target material, and target cracking is easily caused. Therefore, the technical problem to be solved by the utility model is how to design a back plate assembly for improving the utilization rate of the planar target.
SUMMERY OF THE UTILITY MODEL
Aiming at the defects of the prior art, the utility model provides a back plate assembly for improving the utilization rate of a planar target.
The utility model solves the technical problems through the following technical means:
the back plate assembly for improving the utilization rate of the planar target comprises a back plate and the target; the back plate is provided with steps; the target comprises a first target and a second target; the first target covers the end face of the step far away from the back plate; the second target is arranged on the back plate and is attached to one side of the step; and one ends of the first target and the second target, which are far away from the back plate, are positioned on the same plane.
Preferably, in the back plate assembly for improving the utilization rate of the planar target, the back plate protrudes outwards to form a step; the cross section of the step is rectangular.
Preferably, in the back plate assembly for improving the utilization rate of the planar target, the cross section of the first target is rectangular, and the cross section of the first target is the same as the cross section of the step in size and shape; the cross section of the second target material is rectangular; one side surface of the second target material is attached to the side surface of the step.
Preferably, the first target and the second target are respectively welded and fixed with the step and the back plate through welding media in the back plate assembly for improving the utilization rate of the planar target.
The utility model has the advantages that: according to the back plate assembly, through the arrangement of the steps, on one hand, a part of target materials which cannot be utilized are replaced, the consumption of raw materials of the target materials is reduced, and the utilization rate of the target materials is indirectly improved; on the other hand, the contact area of the target and the back plate is increased, and the cooling effect is improved; and finally, the connection strength of the target and the back plate is improved, the possibility of target deviation is reduced, and the product quality is improved.
Drawings
Fig. 1 is a schematic structural diagram of a conventional backplane assembly.
Fig. 2 is a schematic structural diagram of a conventional backplane assembly after magnetron sputtering etching.
FIG. 3 is a schematic structural diagram of a backplane assembly according to the present invention.
FIG. 4 is a schematic structural diagram of the backplate assembly after magnetron sputtering etching.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1, referring to fig. 3-4, a backing plate assembly for improving the utilization of planar targets, comprising a backing plate 1 and a target 2; the back plate 1 is provided with a step 11; the target 2 includes a first target 21 and a second target 22; the first target 21 covers the end face of the step 11 far away from the back plate; the second target 22 is arranged on the back plate 1, and the second target 22 is arranged on one side of the step 11 in an attached manner; one ends of the first target 21 and the second target 22, which are far away from the back plate 1, are positioned on the same plane;
the principle of the utility model is that the step 11 is arranged on the back plate 1, and the part which cannot be utilized at the edge of the target material is replaced by the step 11, so that the use amount of raw materials of the target material is reduced, and the utilization rate of the target material is indirectly improved; through the arrangement of the steps 11, the connection of the target material with the back plate 1 is improved from the original connection of one surface of the bottom surface with the back plate 1 to the connection of two surfaces of the bottom surface and the side surface of the target material with the back plate 1, so that the effective contact area of the target material and the back plate 1 is increased, and the cooling effect of the back plate 1 on the target material is improved; the connecting area of the target and the back plate 1 is increased, the effect of reinforcing the connecting strength of the target and the back plate 1 can be achieved, the offset probability of the target is reduced, and the product quality is ensured; the thickness of the step 11 and the first target 21 is set according to the magnetic field intensity of magnetron sputtering at the time of use.
According to the back plate assembly, through the arrangement of the steps, on one hand, a part of target materials which cannot be utilized are replaced, the consumption of raw materials of the target materials is reduced, and the utilization rate of the target materials is indirectly improved; on the other hand, the contact area of the target and the back plate is increased, and the cooling effect is improved; and finally, the connection strength of the target and the back plate is improved, the possibility of target deviation is reduced, and the product quality is improved.
Preferably, the back plate 1 protrudes outwards to form a step 11; the cross section of the step 11 is rectangular;
backplate 1 outwards bulges and forms step 11, backplate 1 and step 11 structure as an organic whole promptly, and structural strength is high, and more importantly, step 11 and 1 an organic whole setting of backplate make step 11 also can play the cooling effect to the target, improve the effective area of contact of backplate 1 and target promptly, improve the cooling effect greatly.
Preferably, the cross section of the first target 21 is rectangular, and the cross section of the first target 21 is the same as the cross section of the step 11 in size and shape; the cross section of the second target 22 is rectangular; one side surface of the second target 22 abuts against the side surface of the step 11;
the first target 21, the second target 22 and the step 11 are all rectangular rectangles with rectangular cross sections, so that the mounting is convenient, the contact area between the first target 21 and the second target 22 and the step 11 and the back plate 1 is large, and the cooling of the first target 21 and the second target 22 is facilitated.
Preferably, the first target 21 and the second target 22 are fixed to the step 11 and the back plate 1 by welding using a welding medium.
It is noted that, in this document, relational terms such as first and second, and the like, if any, are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (4)
1. The back plate assembly for improving the utilization rate of the planar target comprises a back plate (1) and a target (2); the method is characterized in that: the back plate (1) is provided with a step (11); the target (2) comprises a first target (21) and a second target (22); the first target (21) covers the end face, far away from the back plate, of the step (11); the second target (22) is arranged on the back plate (1), and the second target (22) is arranged on one side of the step (11) in an attached mode; one ends of the first target (21) and the second target (22) far away from the back plate (1) are positioned on the same plane.
2. The backing plate assembly of claim 1, wherein the backing plate assembly comprises: the back plate (1) protrudes outwards to form a step (11); the cross section of the step (11) is rectangular.
3. The backing plate assembly of claim 1, wherein the backing plate assembly comprises: the cross section of the first target (21) is rectangular, and the cross section of the first target (21) is the same as the cross section of the step (11) in size and shape; the cross section of the second target (22) is rectangular; one side of the second target (22) abuts against the side of the step (11).
4. The backing plate assembly of claim 1, wherein the backing plate assembly comprises: the first target (21) and the second target (22) are respectively welded and fixed with the step (11) and the back plate (1) through welding media.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120164970.0U CN215856302U (en) | 2021-01-21 | 2021-01-21 | Backboard component for improving utilization rate of planar target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120164970.0U CN215856302U (en) | 2021-01-21 | 2021-01-21 | Backboard component for improving utilization rate of planar target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215856302U true CN215856302U (en) | 2022-02-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120164970.0U Active CN215856302U (en) | 2021-01-21 | 2021-01-21 | Backboard component for improving utilization rate of planar target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215856302U (en) |
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2021
- 2021-01-21 CN CN202120164970.0U patent/CN215856302U/en active Active
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