CN215494544U

CN215494544U - Alignment device and photoetching machine

Info

Publication number: CN215494544U
Application number: CN202122091313.0U
Authority: CN
Inventors: 孙昊; 李煜芝; 周畅; 朱岳彬
Original assignee: Shanghai Micro Electronics Equipment Co Ltd
Current assignee: Shanghai Micro Electronics Equipment Co Ltd
Priority date: 2021-08-31
Filing date: 2021-08-31
Publication date: 2022-01-11
Anticipated expiration: 2031-08-31

Abstract

The utility model belongs to the technical field of optical equipment, and discloses an alignment device and a photoetching machine. The alignment device comprises a halogen light source, an imaging mechanism and a wavelength adjusting mechanism, wherein the imaging mechanism is configured to transmit a light beam emitted by the halogen light source according to a preset light path and form an image of a structure to be imaged; the wavelength adjusting mechanism comprises a switching component and a filtering component, wherein the filtering component comprises a plurality of optical filters, the switching component is configured to selectively move any one of the optical filters to a preset position, and the preset position is located in the preset optical path. Through the matching of the halogen light source and the wavelength adjusting mechanism, the wavelength range of the illuminating light beam can be adjusted according to the process requirements so as to meet various process requirements; compared with the prior art in which a plurality of light sources or a plurality of alignment devices are arranged, the complexity of the system can be greatly reduced, and the production cost is reduced.

Description

Alignment device and photoetching machine

Technical Field

The utility model relates to the technical field of optical equipment, in particular to an alignment device and a photoetching machine.

Background

In the production process of an Active-matrix organic light emitting diode (AMOLED) screen, in the process of overlaying process layers such as a shading film and a color filter film (red, blue and green) on a glass substrate, processing is performed according to alignment marks on the glass substrate as positioning references. The traditional alignment device generally adopts a warm white LED with the wavelength of 500-750 nm to illuminate an alignment mark on a glass substrate, and along with the continuous improvement of the production process of the AMOLED glass substrate, the alignment mark which needs to adopt near-infrared illumination with the wavelength of 800-1000 nm also appears. At present, a plurality of alignment marks are arranged on a glass substrate, a part of the alignment marks need to be illuminated by a warm white LED, and a part of the alignment marks need to be illuminated by a near infrared LED, so that different alignment devices are needed in the processing process of the AMOLED glass substrate, and the production cost is increased.

In order to solve the above problems, more than two light sources are arranged in the same alignment device in the industry to meet the requirement of alignment lighting, but the arrangement greatly improves the complexity of the alignment device.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide an alignment device and a photoetching machine, which can meet the alignment conditions of a wide range of processes, reduce the complexity of the alignment device and improve the alignment precision.

In order to achieve the purpose, the utility model adopts the following technical scheme:

an alignment device, comprising:

a halogen light source;

the imaging mechanism is configured to transmit the light beam emitted by the halogen light source according to a preset light path and form an image of a structure to be imaged;

the wavelength adjusting mechanism comprises a switching component and a filtering component, wherein the filtering component comprises a plurality of optical filters, the switching component is configured to selectively move any one of the optical filters to a preset position, and the preset position is located in the preset optical path.

Optionally, the optical filter assembly further includes a carrier, a plurality of mounting through holes are disposed on the carrier, each optical filter is correspondingly mounted in one of the mounting through holes, and the switching assembly is configured to drive the carrier to move.

Optionally, the switching assembly is a linear driving assembly, the plurality of optical filters are linearly arranged on the carrier, and the linear driving assembly is configured to drive the carrier to reciprocate along the arrangement direction of the plurality of optical filters.

Optionally, the switching assembly includes a rotation driving assembly, the plurality of optical filters are circularly arranged on the carrier, and the rotation driving assembly is configured to drive the carrier to rotate around a center of the circle.

Optionally, the wavelength adjustment mechanism further includes a detection component configured to detect a position of the optical filter, the detection component is electrically connected to the switching component, and the switching component is configured to adjust the position of the optical filter according to a detection result of the detection component.

Optionally, the detection assembly includes a triggering element and a plurality of sensing elements, each of the optical filters is correspondingly provided with one of the sensing elements, and the triggering element is configured to trigger the sensing element corresponding to the optical filter located at the preset position.

Optionally, the sensing element is a proximity sensor or a microswitch.

Optionally, the imaging mechanism includes an infrared filter, the infrared filter is disposed between the halogen light source and the wavelength adjustment mechanism, and the infrared filter is configured to filter infrared rays.

Optionally, the imaging mechanism includes an ultraviolet filter, the ultraviolet filter is disposed between the halogen light source and the wavelength adjusting mechanism, and the ultraviolet filter is configured to filter ultraviolet rays.

A lithography machine comprises the alignment device.

The utility model has the beneficial effects that:

in the alignment device provided by the utility model, the wavelength range of the illumination light beam can be adjusted according to the process requirement by matching the halogen light source with the wavelength adjusting mechanism so as to meet various process requirements; compared with the prior art in which a plurality of light sources or a plurality of alignment devices are arranged, the complexity of the system can be greatly reduced, and the production cost is reduced.

The photoetching machine provided by the utility model can switch the illumination wave band, ensures the alignment precision of process layers such as BM/R/G/B and the like, and realizes that a polarizing film laminating process in an AMLOED process is replaced by a CFOT process, so that the screen is lighter and thinner and has higher contrast.

Drawings

FIG. 1 is a schematic structural diagram of an alignment apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of a filter assembly according to an embodiment of the present invention;

fig. 3 is a schematic structural diagram of a filter assembly according to a second embodiment of the present invention.

In the figure:

1. a halogen light source; 2. a wavelength adjusting mechanism; 21. a filter assembly; 211. a carrier; 212. an optical filter; 221. an output shaft; 31. a first collimating mirror; 32. a converging mirror; 33. a second collimating mirror; 34. a third collimating mirror; 35. a light splitter; 36. an imaging detector; 41. a first diaphragm; 42. a second diaphragm; 51. an infrared filter; 52. an ultraviolet filter; 100. a glass substrate.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the utility model and are not limiting of the utility model. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.

In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, removably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

In the description of the present embodiment, the terms "upper", "lower", "right", etc. are used in an orientation or positional relationship based on that shown in the drawings only for convenience of description and simplicity of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.

Example one

The marks on the glass substrate 100 need to be aligned in the AMOLED screen production process to ensure the processing accuracy. The glass substrate 100 is generally provided with a plurality of marks, some of the alignment marks need to be illuminated by warm white LEDs, and some of the alignment marks need to be illuminated by near infrared LEDs, so that different alignment devices are required in the processing process of the AMOLED glass substrate 100, and the production cost is increased.

To solve the above problem, as shown in fig. 1, the present embodiment provides an alignment apparatus including a halogen light source 1, an imaging mechanism, and a wavelength adjustment mechanism 2. The halogen light source 1 provides an illuminating light beam, and the imaging mechanism can transmit the light beam emitted by the halogen light source 1 according to a preset light path and form an image of a structure to be imaged, in the embodiment, the structure to be imaged is a glass substrate 100, and a mark is arranged on the glass substrate 100 for reference during processing. The wavelength adjustment mechanism 2 includes a switching unit and a filter unit 21, the filter unit 21 includes a plurality of filters 212, and the switching unit can selectively move any one of the plurality of filters 212 to a preset position, wherein the preset position is located in a preset optical path.

In this embodiment, the optical filter 212 located at the preset position can be adjusted by the wavelength adjusting mechanism 2, so as to adjust the wavelength of the light beam in the preset light path according to the actual processing requirement, thereby meeting the requirements of various processes; compared with the prior art in which a plurality of alignment devices or a plurality of light sources are arranged, the complexity of the system is greatly reduced, and the processing cost is also reduced.

The spectrum of the halogen light source 1 is wider, the switchable working waveband of the alignment device can be increased, and the illumination requirements of various processes can be better met.

Specifically, the wavelength of the halogen light source 1 is 440nm to 960nm, and the working wavelength range that can be adjusted by selecting the appropriate filter 212 includes: 440 nm-560 nm, 510 nm-650 nm, 610 nm-750 nm and 810 nm-960 nm. The working waveband can be used for the alignment process of process layers such as BM/R/G/B and the like, the alignment precision can be ensured, and a polarizer laminating process in an AMLOED process can be replaced by color Filter on thin Film Encapsulation (CFOT), so that the screen is lighter and thinner, and the contrast is higher.

It is understood that the wavelength range of the light source, the number of the filters 212, and the filtering range of each filter 212 can be set according to actual requirements.

In this embodiment, the imaging mechanism includes a first collimating mirror 31, a converging mirror 32, a beam splitter 35, a second collimating mirror 33, a third collimating mirror 34, and an imaging detector 36. The first collimating mirror 31, the converging mirror 32 and the beam splitter 35 are arranged along the propagation direction of the light beam emitted by the light source 1, the first collimating mirror 31 is used for adjusting the passing light beam into parallel light, the parallel light passes through the converging mirror 32 and then converges at a point on the beam splitter 35, under the action of the beam splitter 35, part of the light is reflected to the glass substrate 100, the light irradiated on the glass substrate 100 is reflected and then passes through the beam splitter 35 again, and an image is formed on the imaging detector 36 under the action of the beam splitter 35. A second collimating mirror 33 and a third collimating mirror 34 are respectively arranged between the beam splitter 35 and the glass substrate 100 and between the beam splitter 35 and the imaging detector 36, and both the second collimating mirror 33 and the third collimating mirror 34 are used for adjusting the passing light rays into parallel light rays.

Further, the imaging mechanism further comprises a diaphragm assembly including a first diaphragm 41 and a second diaphragm 42 which are arranged at intervals. The first diaphragm 41 is disposed between the light source 1 and the first collimating mirror 31, and is an NA limiting diaphragm for limiting the light beam. The second diaphragm 42 is disposed between the first collimating mirror 31 and the converging mirror 32, and the second diaphragm 42 is a field diaphragm for limiting the field size. In the present embodiment, a preset position is provided between the second diaphragm 42 and the converging mirror 32, so that the wavelength of the passing light beam is adjusted to a desired wavelength range after the field range is limited.

Further, the imaging mechanism further includes an infrared filter 51 and an ultraviolet filter 52. The infrared filter 51 and the ultraviolet filter 52 are arranged in sequence between the first collimating mirror 31 and the second diaphragm 42 in the direction of the light beam emitted by the light source 1. The infrared filter 51 reflects more than 99% of infrared light, so that subsequent optical elements are prevented from being broiled by the heat effect of the infrared light, the stability of components of the light source 1 is improved, and the service life of the components is prolonged; the uv filter 52 filters most of the uv light to avoid the uv light from accidentally interfering with the manufacturing process.

In order to realize the switching of the plurality of filters 212, as shown in fig. 2, the filter assembly 21 further includes a carrier 211, a plurality of mounting through holes are disposed on the carrier 211, and each filter 212 is correspondingly mounted in one of the mounting through holes, so as to prevent the filter 212 from being shielded by the carrier 211. The switching assembly is moved by driving the carrier 211 so that any one of the filters 212 thereon can be moved to a preset position. By arranging the carrier 211 to carry the plurality of filters 212, the switching assembly can drive the carrier 211 to move to realize the movement of the plurality of filters 212, so that the switching of the plurality of filters 212 is more convenient, and the filters 212 can be prevented from being damaged by the switching assembly.

In this embodiment, the plurality of filters 212 are linearly arranged on the carrier 211, the switching element is a linear driving element, and the linear driving element drives the carrier 211 to reciprocate along the arrangement direction of the plurality of filters 212, so that the filters 212 meeting the illumination requirement move to the preset position.

Alternatively, the linear driving assembly may be a linear motor, an air cylinder, a hydraulic cylinder, a screw nut assembly, or a gear rack assembly, as long as the linear reciprocating motion of the stage along the arrangement direction of the plurality of optical filters 212 can be realized.

Furthermore, the plurality of filters 212 are arranged at equal intervals, so that the moving distance when different filters 212 are switched is an integral multiple of the interval between two adjacent filters 212, and the control is simpler and more convenient.

In order to make the position of the optical filter 212 more accurate after switching, the wavelength adjusting mechanism 2 further includes a detecting element, the detecting element can detect the position of the optical filter 212, the detecting element is electrically connected with the switching element, and the switching element can adjust the position of the optical filter 212 according to the detection result of the detecting element, so as to improve the accuracy of the position switching of the optical filter 212.

Specifically, the detection assembly includes a trigger and a plurality of sensors, each optical filter 212 is correspondingly provided with a sensor, the trigger can trigger the sensor corresponding to the optical filter 212 located at the preset position, so that after the sensor corresponding to the optical filter 212 required by the process is triggered, the switching assembly stops driving, so that the carrier 211 is kept at the current position, the optical filter 212 required by the process can be located at the preset position, and the switching accuracy of the optical filter 212 is improved.

Illustratively, the sensing member may be a micro switch. When the filter 212 moves to the preset position, the trigger contacts with the corresponding micro switch of the filter 212 and triggers the micro switch. The switching component receives a signal to stop driving after the micro switch is triggered, so as to stop the driving carrier 211 from moving continuously.

Illustratively, the sensing element may also be a proximity switch. When the filter 212 moves to the preset position, the trigger moves to a sensing range of the proximity switch corresponding to the filter 212, so that the trigger triggers the proximity switch. The proximity switch receives a signal to stop driving after the proximity switch is triggered to stop the driving of the carrier 211.

Example two

The present embodiment provides an alignment apparatus which is different from the alignment apparatus of the first embodiment in the structure of the wavelength adjustment mechanism 2.

As shown in fig. 3, in the embodiment, the plurality of optical filters 212 are circularly arranged on the carrier 211, and the switching element is a rotation driving element, which can drive the carrier 211 to rotate around the circular center of the circle, so as to switch the optical filters 212.

Alternatively, the rotation driving assembly includes a rotation motor, and an output shaft 221 of the rotation motor is connected to the carrier 211, and the carrier 211 is driven to rotate by the rotation of the output shaft 221 of the rotation motor.

EXAMPLE III

The embodiment also provides a lithography machine, which comprises the alignment device in the first embodiment or the second embodiment. The photoetching machine uses the alignment device in the first embodiment or the second embodiment, can ensure the alignment precision of process layers such as BM/R/G/B and the like, and uses a CFOT process to replace a polaroid laminating process in an AMLOED process, so that a screen is thinner and thinner, and the contrast is higher.

It should be understood that the above-described embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Numerous obvious variations, adaptations and substitutions will occur to those skilled in the art without departing from the scope of the utility model. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. An alignment device, comprising:

a halogen light source (1);

an imaging mechanism configured to propagate the light beam emitted by the halogen light source (1) according to a preset light path and form an image of a structure to be imaged;

a wavelength adjustment mechanism (2) comprising a switching assembly and a filter assembly (21), the filter assembly (21) comprising a plurality of filters (212), the switching assembly being configured to selectively move any one of the plurality of filters (212) to a preset position, the preset position being located in the preset optical path.

2. The alignment device according to claim 1, wherein the filter assembly (21) further comprises a carrier (211), the carrier (211) is provided with a plurality of mounting through holes, each filter (212) is correspondingly mounted in one of the mounting through holes, and the switching assembly is configured to drive the carrier (211) to move.

3. The alignment apparatus according to claim 2, wherein the switching assembly is a linear driving assembly, the plurality of filters (212) are linearly arranged on the carrier (211), and the linear driving assembly is configured to drive the carrier (211) to reciprocate along an arrangement direction of the plurality of filters (212).

4. The alignment apparatus according to claim 2, wherein the switching assembly comprises a rotation driving assembly, the plurality of filters (212) are arranged on the carrier (211) in a circle, and the rotation driving assembly is configured to drive the carrier (211) to rotate around a center of the circle.

5. The alignment device according to any of claims 1 to 4, wherein the wavelength adjustment mechanism (2) further comprises a detection component configured to detect a position of the optical filter (212), the detection component being electrically connected to the switching component, the switching component being configured to adjust the position of the optical filter (212) according to a detection result of the detection component.

6. The alignment device according to claim 5, wherein the detection assembly comprises a triggering member and a plurality of sensing members, one sensing member is correspondingly disposed on each of the filters (212), and the triggering member is configured to trigger the sensing member corresponding to the filter (212) located at the preset position.

7. The alignment device of claim 6 wherein the sensing member is a proximity sensor or a microswitch.

8. The alignment device according to any of claims 1-4, wherein the imaging means comprises an infrared filter (51), the infrared filter (51) being arranged between the halogen light source (1) and the wavelength adjustment means (2), the infrared filter (51) being configured to filter infrared light.

9. The alignment device according to any one of claims 1 to 4, wherein the imaging mechanism comprises an ultraviolet filter (52), the ultraviolet filter (52) being disposed between the halogen light source (1) and the wavelength adjustment mechanism (2), the ultraviolet filter (52) being configured to filter ultraviolet light.

10. A lithography machine comprising an alignment device according to any one of claims 1 to 9.