CN215493954U

CN215493954U - Wafer detection equipment

Info

Publication number: CN215493954U
Application number: CN202121771038.0U
Authority: CN
Inventors: 胡呈祥; 唐坚; 肖子冬
Original assignee: Guangdong Baizi Electronic Technology Co ltd
Current assignee: Guangdong Baizi Electronic Technology Co ltd
Priority date: 2021-07-30
Filing date: 2021-07-30
Publication date: 2022-01-11
Anticipated expiration: 2031-07-30

Abstract

The utility model discloses a wafer detection device, which comprises a machine body, wherein a micro darkroom is arranged in the machine body, a bearing machine table which can bear a wafer and can drive the wafer to move up and down, move left and right, move front and back and rotate is arranged in the micro darkroom, a probe seat is arranged on the machine body above the bearing machine table, a probe is arranged on the probe seat and extends into the micro darkroom through the machine body, a microscope mechanism used for observing the wafer on the bearing machine table is arranged on the machine body, the microscope mechanism can realize multi-direction adjustment of front and back, left and right, and up and down, during testing, the bearing machine table can drive the wafer to move up and down, move left and right, move front and back and rotate to a proper position by placing the wafer on the bearing machine table, then a worker observes the arrangement of elements on the wafer through the microscope mechanism, and then tests can be carried out by adjusting the position of the probe according to the arrangement of the elements, convenient operation, detection efficiency is high, accords with the production needs.

Description

Wafer detection equipment

Technical Field

The utility model relates to a wafer detection device.

Background

The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because it has a circular shape. In the wafer processing process, due to the fact that the thickness and the bottom width (outer diameter) of the produced wafer are different due to external factors, each element in the wafer needs to be detected so as to ensure the completeness of the wafer.

The existing detection mode is to detect one by one through manual operation, and the detection mode has the problems of low efficiency, missing detection, false detection and the like.

Therefore, there is a need for a wafer inspection apparatus to solve the above problem.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a wafer detection device.

The wafer detection equipment designed according to the purpose comprises a machine body, wherein a micro darkroom is arranged in the machine body, a bearing machine table which can bear a wafer and can drive the wafer to move up and down, left and right, front and back and rotate is arranged in the micro darkroom, a probe seat is arranged on the machine body above the bearing machine table, a probe is arranged on the probe seat, the probe penetrates through the machine body and extends into the micro darkroom, a microscope mechanism used for observing the wafer on the bearing machine table is arranged on the machine body, and the microscope mechanism can be adjusted in a front-back direction, a left-right direction and a vertical direction.

Preferably, the bearing machine platform comprises an XY platform for left-right movement and front-back movement, a lifting platform for lifting, a rotating platform for rotating and an object stage for bearing the wafer, and the object stage is located at the top.

Preferably, the microscope mechanism comprises a microscope and an adjusting mechanism for adjusting the front-back, left-right, and up-down positions of the microscope, the adjusting mechanism is arranged on the machine body, the microscope is arranged on the adjusting mechanism, and a lens of the microscope extends downwards into the micro dark room.

Preferably, the adjusting mechanism comprises a fixed frame, a first substrate is arranged on the fixed frame, a second substrate is movably inserted on the first substrate, and a third substrate is movably inserted on the second substrate;

the second substrate can move back and forth relative to the first substrate, the third substrate can move left and right relative to the second substrate, the first substrate is provided with a first linear motor for driving the second substrate to move back and forth, and the second substrate is provided with a second linear motor for driving the third substrate to move back and forth;

the microscope is arranged on the moving part, and the longitudinal guide rail part is provided with a third linear motor for driving the moving part to move up and down.

Preferably, an opening is formed in the front side wall of the machine body and connected with the inside of the miniature darkroom, a closed door for closing the opening is hinged to the front side wall of the machine body, electric push rods are hinged to the left side and the right side of the closed door, and the other end of each electric push rod is hinged to the machine body.

Preferably, the probe seat has a plurality of probe seats arranged in a circumferential arrangement.

Preferably, the observation center of the microscope mechanism and the axis of the probe seat arranged in a circumferential arrangement are the same circle center.

Preferably, a display is further mounted on the body.

The utility model has the advantages of convenient operation, convenient detection, high efficiency and low labor cost, compared with the prior art, the utility model comprises an organism, a micro darkroom is arranged in the organism, a bearing machine table which can bear a wafer and can drive the wafer to move up and down, move left and right, move front and back and rotate is arranged in the micro darkroom, a probe seat is arranged on the organism above the bearing machine table, a probe is arranged on the probe seat, the probe passes through the organism and extends into the micro darkroom, a microscope mechanism for observing the wafer on the bearing machine table is arranged on the organism, the microscope mechanism can realize multi-direction adjustment of front and back, left and right, and up and down, when in test, the wafer is placed on the bearing machine table, the bearing machine table can cooperate with a vision system to drive the wafer to move up and down, move left and right, move front and back, and rotate to a proper position, then the staff passes through the arrangement of microscope mechanism observation wafer upper element, then adjusts the position of probe and can test (or use the probe card to carry out full-automatic test) according to the arrangement of component, convenient operation, detection efficiency is high, accords with the production needs.

Drawings

FIG. 1 is a schematic perspective view of the present invention;

FIG. 2 is a second schematic perspective view of the present invention;

fig. 3 is a schematic cross-sectional structure of the present invention.

Detailed Description

The utility model is further described with reference to the following figures and examples.

Referring to fig. 1 to 3, a wafer inspection apparatus includes an organism 10, a micro darkroom 110 is disposed in the organism 10, a carrier 20 capable of carrying a wafer and driving the wafer to move up and down, left and right, front and back, and rotate is disposed in the micro darkroom 110, a probe base 40 is disposed on the organism 10 above the carrier 20, a probe 410 is disposed on the probe base 40, the probe 410 passes through the organism 10 and extends into the micro darkroom 110, a microscope mechanism 30 for observing the wafer on the carrier 20 is disposed on the organism 10, and the microscope mechanism 30 can be adjusted in front and back, left and right, and up and down directions.

The probe seat 40 has a plurality of probe seats arranged in a circumferential manner.

During testing, the wafer is placed on the bearing machine table, the bearing machine table can drive the wafer to move up and down, move left and right, move front and back and rotate to be adjusted to a proper position, then a worker observes arrangement of elements on the wafer through the microscope mechanism, and then the position of the probe is adjusted according to the arrangement of the elements to perform testing (or a probe card is used for performing full-automatic testing), so that the operation is convenient, the detection efficiency is high, and the wafer is in accordance with production requirements.

The carrier 20 includes an XY stage 210 for moving left and right and moving front and back, a lifting stage 220 for lifting, a rotating stage 230 for rotating, and a stage 240 for carrying a wafer, wherein the stage 240 is located at the top.

The XY stage 210 and the lifting stage 220 are driven by the existing linear reciprocating mechanism such as a linear motor, and the details are not repeated here.

And the rotary platform 230 is driven to rotate by a direct drive motor.

The XY stage 210, the elevating stage 220, and the rotating stage 230 may be arranged at will, and the stage 240 may be located at the top.

The microscope mechanism 30 includes a microscope 320 and an adjusting mechanism 321 for adjusting the front-back, left-right, and up-down positions of the microscope 320, the adjusting mechanism 321 is disposed on the body 10, the microscope 320 is disposed on the adjusting mechanism 321, and the lens of the microscope 320 extends downward into the micro darkroom 110.

The adjusting mechanism 321 comprises a fixed frame 310, a first substrate 350 is arranged on the fixed frame 310, a second substrate 360 is movably inserted on the first substrate 350, and a third substrate 370 is movably inserted on the second substrate 360;

the second substrate 360 can move back and forth relative to the first substrate 350, the third substrate 370 can move left and right relative to the second substrate 360, the first substrate 350 is provided with a first linear motor 380 for driving the second substrate 360 to move back and forth, and the second substrate 360 is provided with a second linear motor 340 for driving the third substrate 370 to move back and forth;

the third substrate 370 is provided with an installation base 390, the front side of the installation base 390 is provided with a longitudinal rail member 301, the longitudinal rail member 301 is movably inserted with a moving member 300, the microscope 320 is arranged on the moving member 300, and the longitudinal rail member 301 is provided with a third linear motor 330 for driving the moving member 300 to move up and down.

The microscope can be driven by the first linear motor to move back and forth, the second linear motor can be driven by the second linear motor to move left and right, and the third linear motor can be driven by the third linear motor to move up and down, so that multi-direction adjustment of moving up and down, moving left and right, and moving back and forth is realized, and the microscope is adjusted to a proper observation position.

An opening is formed in the front side wall of the machine body 10 and connected with the interior of the micro darkroom 110, a closed door 130 for closing the opening is hinged to the front side wall of the machine body 10, electric push rods 120 are hinged to the left side and the right side of the closed door 130, and the other end of each electric push rod 120 is hinged to the machine body 10.

When it is desired to test the wafer, the wafer is placed on the stage 240 through the opening.

The observation center of the microscope mechanism 30 and the axis of the probe holder 40 arranged circumferentially are concentric.

A display is also mounted on the body 10.

The working principle of the utility model is as follows:

step 1, a wafer is placed on an object stage 240 from an opening by a human or a transfer robot;

step 2, automatically controlling the XY stage 210, the lifting stage 220 and the rotating stage 230 to work through the controller, so as to adjust the wafer on the object stage 240 to a proper position;

step 3, automatically observing the positions of elements in the wafer by using a microscope mechanism 30 through a controller;

step 4, adjusting the probe seat 40 according to the specific element position;

and 5, contacting the wafer through the probe, and sequentially testing. (or automatic testing using a Probe card)

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used only for the convenience of description and simplicity of description, rather than to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the utility model, the terms "first" and "second" are used for descriptive purposes only, and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated.

The foregoing shows and describes the general principles and broad features of the present invention and advantages thereof. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the utility model as claimed. The scope of the utility model is defined by the appended claims and equivalents thereof.

Claims

1. A wafer inspection apparatus comprising an organism (10), characterized in that: the wafer-bearing machine is characterized in that a micro darkroom (110) is arranged in the machine body (10), a bearing machine table (20) capable of bearing a wafer and driving the wafer to move up and down, left and right, front and back and rotate is arranged in the micro darkroom (110), a probe seat (40) is arranged on the machine body (10) above the bearing machine table (20), a probe (410) is arranged on the probe seat (40), the probe (410) penetrates through the machine body (10) and extends into the micro darkroom (110), a microscope mechanism (30) used for observing the wafer on the bearing machine table (20) is arranged on the machine body (10), and the microscope mechanism (30) can be adjusted in a front-back, left-right, up-down multi-direction mode.

2. The wafer inspection apparatus of claim 1, wherein: the bearing machine table (20) comprises an XY platform (210) which is responsible for moving left and right and moving front and back, a lifting platform (220) which is responsible for lifting, a rotating platform (230) which is responsible for rotating and an object stage (240) which is used for bearing wafers, wherein the object stage (240) is positioned at the top.

3. The wafer inspection apparatus of claim 1, wherein: microscope mechanism (30) including microscope (320) and be used for right microscope (320) carry out front and back, left and right sides, upper and lower position control's adjustment mechanism (321), adjustment mechanism (321) set up on organism (10), microscope (320) set up on adjustment mechanism (321), the camera lens of microscope (320) downwardly extending to in miniature darkroom (110).

4. The wafer inspection apparatus of claim 3, wherein: the adjusting mechanism (321) comprises a fixed frame (310), a first substrate (350) is arranged on the fixed frame (310), a second substrate (360) is movably inserted on the first substrate (350), and a third substrate (370) is movably inserted on the second substrate (360);

the second substrate (360) can move back and forth relative to the first substrate (350), the third substrate (370) can move left and right relative to the second substrate (360), the first substrate (350) is provided with a first linear motor (380) for driving the second substrate (360) to move back and forth, and the second substrate (360) is provided with a second linear motor (340) for driving the third substrate (370) to move back and forth;

the microscope is characterized in that an installation seat (390) is arranged on the third base plate (370), a longitudinal guide rail piece (301) is arranged on the front side of the installation seat (390), a moving piece (300) is movably inserted into the longitudinal guide rail piece (301), the microscope (320) is arranged on the moving piece (300), and a third linear motor (330) used for driving the moving piece (300) to move up and down is arranged on the longitudinal guide rail piece (301).

5. The wafer inspection apparatus of claim 3, wherein: the miniature darkroom is characterized in that an opening is formed in the front side wall surface of the machine body (10) and connected with the interior of the miniature darkroom (110), a closed door (130) used for closing the opening is hinged to the front side wall surface of the machine body (10), electric push rods (120) are hinged to the left side and the right side of the closed door (130), and the other end of each electric push rod (120) is hinged to the machine body (10).

6. The wafer inspection apparatus according to any one of claims 1 to 5, wherein: the probe seat (40) is provided with a plurality of probe seats which are arranged in a circumferential manner.

7. The wafer inspection apparatus of claim 6, wherein: the observation center of the microscope mechanism (30) and the axis of the probe seat (40) which is arranged in the circumferential direction are the same circle center.

8. The wafer inspection apparatus according to any one of claims 1 to 5, wherein: the body (10) is also provided with a display.