CN215376084U

CN215376084U - Adsorption working platform and photoetching equipment

Info

Publication number: CN215376084U
Application number: CN202121771368.XU
Authority: CN
Inventors: 陈国军; 吴景舟; 马迪
Original assignee: Jiangsu Desheng Intelligent Technology Co ltd
Current assignee: Jiangsu Desheng Intelligent Technology Co ltd
Priority date: 2021-07-30
Filing date: 2021-07-30
Publication date: 2021-12-31
Anticipated expiration: 2031-07-30

Abstract

The application relates to an adsorption working platform, which is used for a photoetching device to adsorb workpieces, and also comprises a frame and an optical device, wherein the frame can move relative to the adsorption working platform, the adsorption working platform comprises an air suction platform body with a working surface, a plurality of air suction holes which are arranged through the air suction platform body and communicated with the pump body, and a blocking structure for blocking the air suction holes, part of the air suction holes are blocked by the blocking structure to form a blocking area, so that the air suction holes which are not blocked form an adsorption area on the working surface, therefore, when the pump body inhales, all the air suction holes on the whole working surface can form negative pressure, the adsorption force of the pump body to the workpieces is equal to or slightly less than the suction force of the pump body, the workpieces are tightly adsorbed and kept flat, and convenient to process, the structure can tightly adsorb the workpieces with various sizes and can place the workpieces in any area of the working surface, the practicality of the adsorption work air suction platform is improved.

Description

Adsorption working platform and photoetching equipment

Technical Field

The utility model relates to an adsorption working platform and a photoetching device.

Background

Photolithography, that is, photolithography, involves irradiating light onto a photoreactive material to react the photoreactive material, and usually irradiating light onto the photoreactive material in a specific pattern to obtain a desired structure. Lithography is also commonly referred to as exposure, and the equipment that performs the lithography is a lithography machine or an exposure machine.

Common objects to be subjected to photolithography are screens, dry films, or glasses coated with a photoreactive material. The screen plate is used for fixing a screen on a wood frame or a steel frame, and coating a light reaction material on the screen, and the screen plate can be used for printing cloth after exposure and subsequent treatment. The dry film is a film coated with a photoreactive material, which is generally used to manufacture a PCB board. Glass coated with a photoreactive material is commonly used to make display screens.

During photolithography, a screen is generally fixed on a table top of a working platform through an air cylinder clamping frame, and a dry film or glass can be warped or crushed through air cylinder clamping, and is generally adsorbed through an air suction platform at present. However, when the size of the object to be photoetched is relatively small, the object to be photoetched cannot cover all the air holes on the working table, so that part of the air holes are always filled with air, negative pressure cannot be formed or is small, the suction force of the pump body to the object to be photoetched is far smaller than the suction force of the pump body, the object to be photoetched cannot be tightly adsorbed, and the practicability of the working platform is poor.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide an adsorption working platform capable of tightly adsorbing workpieces of various sizes. In order to achieve the purpose, the utility model provides the following technical scheme: the utility model provides an adsorb work platform for lithography apparatus is in order to adsorb the work piece, lithography apparatus still includes the frame and installs optical device in the frame, the frame can be relative adsorb work platform motion, adsorb work platform including inhale the platform and with the pump body that the platform is connected of breathing in, inhale the platform including the platform body of breathing in that has the working face, run through inhale the platform body set up and with a plurality of suction holes of pump body intercommunication and be used for the shutoff the block structure of suction hole, block structure shutoff part the suction hole forms the shutoff region, so that not by the shutoff the suction hole is in form the adsorption zone on the working face to adsorb the work piece.

Furthermore, the plugging structure comprises a plurality of plugging components, and one plugging component is arranged in each air suction hole.

Further, in the height direction of the air suction platform, the air suction hole is provided with a first opening and a second opening, the first opening is formed on the working surface, and the blocking assembly comprises a blocking piece arranged between the first opening and the second opening and an elastic piece used for limiting the blocking piece between the first opening and the second opening.

Further, the maximum dimension of the closure is greater than the dimensions of the first and second openings, with a first gap between the closure and the first opening and a second gap between the closure and the second opening.

Further, when the pump body works in an air suction mode, the blocking piece in the blocking area moves towards the second opening and blocks the second opening, and negative pressure is formed at the blocking piece and the second opening; and the workpiece in the adsorption area blocks the first opening, and negative pressure is formed at the workpiece and the first opening.

Further, the plugging piece is a sphere.

Furthermore, the plugging assembly further comprises a supporting piece connected with the platform body, the supporting piece and the plugging piece are oppositely arranged at two ends of the elastic piece, and a channel communicated with the pump body and the suction hole is formed in the supporting piece.

Further, the blocking structure comprises at least one adsorption pad, and the adsorption pad can cover the working surface and form negative pressure with the air suction holes so as to block the air suction holes.

Furthermore, the material of absorption pad is glass or ya keli.

The utility model also provides a lithographic apparatus comprising an adsorption work platform as described above.

The utility model has the beneficial effects that: adsorb work platform is through setting up block structure, divide into the shutoff region that the suction hole was formed by the shutoff and adsorb the adsorption zone of work piece with the working face, thereby when the pump body breathes in, all suction holes on the whole working face can both form the negative pressure, realize that the pump body equals or slightly is less than the suction by the suction of work piece, make the work piece tightly adsorbed and keep level and smooth, just, processing, this structure can tightly adsorb various size work pieces and can place the work piece in the arbitrary region of working face, the practicality of adsorbing work platform has been improved.

The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical solutions of the present invention more clearly understood and to implement them in accordance with the contents of the description, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.

Drawings

FIG. 1 is a schematic structural view of a work platform according to the present application;

FIG. 2 is a sectional view of a portion of a work platform according to a first embodiment of the present application;

FIG. 3 is a sectional view of a portion of the structure of a work platform of the first embodiment of the present application, which is not covered with a workpiece and is operated by suction in a pump body;

FIG. 4 is a sectional view of a portion of the structure of a work platform covering a workpiece and working by suction in a pump body according to the first embodiment of the present application;

FIG. 5 is a schematic structural diagram of a work platform shown in a second embodiment of the present application;

FIG. 6 depicts a schematic diagram of a lithographic apparatus according to the present invention.

Detailed Description

The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the mechanism or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

Referring to fig. 1, a suction work platform 100 for a lithographic apparatus for sucking a workpiece 200 (as shown in fig. 4) includes a suction platform 1 and a pump body (not shown) connected to the suction platform 1.

The air suction platform 1 comprises an air suction platform body 11 and a plurality of air suction holes 12 which penetrate through the air suction platform body 11 and are communicated with the pump body. The suction platform body 11 has a working surface 111 and a bottom surface 112 disposed opposite to the working surface 111, and the suction holes 12 communicate the working surface 111 and the bottom surface 112. The air suction platform body 11 is in a cuboid shape, and the shape and the specific size of the air suction platform body 11 are not limited herein and can be set according to actual needs. The plurality of air suction holes 12 are arranged on the working surface 111 at equal intervals, but not limited thereto, and the plurality of air suction holes 12 may be randomly arranged on the working surface 111. In this embodiment, the cross section of the air suction hole 12 is circular, but the utility model is not limited thereto, and the cross section of the air suction hole 12 may be other shapes, which are not listed here. The specific number and the specific size of the air suction holes 12 and the distance between adjacent air suction holes 12 are not particularly limited, and may be set according to actual needs. The air suction hole 12 is communicated with the pump body, and the pump body is started, so that air blowing or air suction into the air suction hole 12 can be realized. The bottom surface 112 of the air suction platform 1 may be surrounded with a chamber (not shown) communicating with the plurality of air suction holes 12, and the chamber may be connected to the pump body through a pipe (not shown), so that the pump body blows or sucks air into the plurality of air suction holes 12 synchronously. The connection between the suction hole 12 and the pump body is not described here. Note that the height direction of the suction platform 1 is shown as a direction a in fig. 1.

Referring to fig. 2, in the height direction of the suction platform 1, the suction hole 12 is provided with a first opening 121 and a second opening 122, the first opening 121 is formed on the working surface 111, the second opening 122 is formed in the suction platform body 11, and it is apparent that the suction hole 12 is further provided with a third opening (not shown) formed on the bottom surface 112, so as to realize penetration of the suction platform body 11 through the first opening 121 and the third opening.

The workpiece 200 is placed on the working surface 111, the suction hole 12 is connected with the pump body and starts the pump body to suck air, and the workpiece 200 and the suction hole 12 form negative pressure, so that the workpiece 200 is tightly adsorbed on the suction platform 1, the workpiece 200 can be fixed, the workpiece 200 can be kept flat, and the processing is convenient. In order to ensure that the suction force of the pump body on the workpiece 200 is equal to or slightly less than the suction force of the air pump, the workpiece 200 needs to cover all the suction holes 12 on the working surface 111, if the size of the workpiece 200 is smaller than the working surface 111, a part of the suction holes 12 is exposed, and when the pump body sucks air, the part of the suction holes 12 always sucks air, so that negative pressure cannot be formed or is small, the suction force of the pump body on the workpiece 200 is far smaller than the suction force of the pump body, and the workpiece 200 cannot be tightly sucked.

The suction platform 1 generally has a specific size, and in order to meet the requirements of sucking workpieces 200 with different sizes, the suction platform 1 further comprises a blocking structure for blocking the suction holes 12, wherein the blocking structure blocks part of the suction holes 12 to form a blocking area, so that the suction holes 12 which are not blocked form a suction area on the working surface 11, and thus a negative pressure is formed on all the suction holes 12, the suction force is equal to or slightly smaller than the suction force of the air pump, and the workpieces 200 are sucked efficiently. It is apparent that the blocked area is an area formed by the suction holes 12 which is not covered with the workpiece 200.

Referring to fig. 2 to 4, the plugging structure in the first embodiment of the present application includes a plurality of plugging assemblies 13, and one plugging assembly 13 is disposed in each suction hole 12. The plugging component 13 can move in the suction hole 12 and plug the suction hole 12. Specifically, the blocking assembly 13 can be moved to the second opening 122 and block the second opening 122.

The blocking assembly 13 includes a blocking member 131 disposed between the first opening 121 and the second opening 122, an elastic member 132 for limiting the blocking member 131 between the first opening 121 and the second opening 122, and a supporting member 133 connected to the suction platform body 11. In this embodiment, the blocking member 131 is a sphere, and in other embodiments, the blocking member 131 may also be an oval, a square, or an irregular structure with an arc-shaped surface at one end, which is not listed here. The maximum size of the blocking member 131 is larger than the size of the first and

second openings

121 and 122 so as to be restricted therebetween by the first and

second openings

121 and 122, and particularly, when the blocking member 131 is a sphere, the diameter of the sphere is larger than the size of the first and

second openings

121 and 122.

The elastic member 132 may be a spring or other structure having elastic force, the supporting member 133 and the blocking member 131 are oppositely disposed at two ends of the elastic member 132, the supporting member 133 is located at the third opening, the supporting member 133 may be integrally formed with the suction platform body 11, the structure is simplified, the supporting member 133 is formed with a channel 1331 communicating the pump body and the suction hole, and the third opening is an opening of the channel 1331 on the bottom surface 112. In other embodiments, the supporting member 133 may also be fixedly connected to the suction platform body 11, and is not limited in this respect. The supporting member 133 may have a hollow cylindrical structure, a hollow rectangular parallelepiped structure, or the like, which is not specifically illustrated herein.

The elastic member 132 can be in contact with the supporting member 133 and the blocking member 131, and under the action of gravity, the elastic member 132 abuts against the supporting member 133, and the blocking member 131 abuts against the elastic member 132, so that the blocking member 131 is held between the first opening 121 and the second opening 122. The elastic member 132 may also be connected and fixed to the supporting member 133 at one end and connected and fixed to the blocking member 131 at the other end.

When the pump body does not work, the elastic piece 132 is in a natural state, the blocking piece 131 abuts against one end of the elastic piece 132, a first gap is formed between the blocking piece 131 and the first opening 121, and a second gap is formed between the blocking piece 131 and the second opening 122, namely, at the moment, the first opening 121 is not blocked by the blocking piece 131, the second opening 122 is not blocked by the blocking piece 131, and the pump body is started, so that air flow can circulate in the air suction hole 12.

Referring to fig. 3, during the suction operation of the pump body, the suction holes 12 which are not covered by the workpiece 200 form a blocking area, wherein the blocking piece 131 moves towards the second opening 122 and blocks the second opening 122, and negative pressure is formed at the blocking piece 131 and the second opening 122. Specifically, when the pump body performs suction operation, the formed air flow enters the suction hole 12 from the first opening 121, the blocking piece 131 moves towards the second opening 122 under the action of the air flow, at this time, the elastic piece 132 is compressed, the air flow passes through the channel 1331 of the support piece 133 and enters the pump body from the third opening, until the blocking piece 131 blocks the second opening 122, the blocking piece 131 stops moving, at this time, negative pressure is formed at the blocking piece 131 and the second opening 122, so as to block the suction hole 12, wherein the direction of the air flow is shown as an arrow. After the pump body stops working, the blocking piece 131 moves towards the first opening 121 and moves between the first opening 121 and the second opening 122 under the action of the elastic piece 132.

Referring to fig. 4, the suction hole 12 covered by the workpiece 200 forms a suction area, when the pump body sucks air, because the workpiece 200 blocks the first opening 121, negative pressure is immediately formed at the workpiece 200 and the first opening 121, the blocking piece 131 keeps the position unchanged, and the workpiece 200 is firmly sucked on the working surface 111 under the action of the negative pressure. After the pump stops working, the negative pressure at the workpiece 200 and the first opening 121 disappears, wherein the direction of the air flow is shown by the arrow.

Negative pressure is formed at the workpiece 200 and the first opening 121, the workpiece 200 is adsorbed on the working surface 111, the blocking piece 131 in the suction hole 12 which does not adsorb the workpiece 200 moves in the suction hole 12 and blocks the suction hole 12, the phenomenon that the suction hole 12 is always filled with air because part of the suction hole 12 is not covered by the workpiece 200, negative pressure cannot be formed or the negative pressure is small, and the adsorption force is far smaller than that of a pump body is avoided, so that the adsorption force of the pump body on the workpiece 200 is equal to or slightly smaller than that of the pump body, and the workpiece 200 is tightly adsorbed. The suction platform 100 can adsorb workpieces 200 with any size and place the workpieces 200 at any area of the working surface 111, and improves the practicability of the suction platform 100.

Referring to fig. 5, the blocking structure in the second embodiment of the present application includes at least one absorption pad 14, the absorption pad 14 may cover the working surface 111 and form a negative pressure between the working surface and the suction holes 12 to block the suction holes 12, so as to block the suction holes 12 uncovered by the workpiece 200, and form a negative pressure on all the suction holes 12 on the whole working surface 111, so as to achieve a larger suction force of the pump body on the workpiece 200, the workpiece 200 and the absorption pad 14 are tightly absorbed on the working surface 111, the absorption pad 14 is made of a material such as glass or acrylic, and the absorption pad 14 may also be made of other materials with smooth surfaces and easy to adhere, which are not listed here.

Generally, the size of a workpiece processed by a manufacturer of one adsorption work platform 100 is only fixed, and the workpiece is fixed by being biased to one corner of the work surface 111 during work, so that two adsorption pads 14 can be customized according to each size of workpiece, and the operation is simple and the cost is low.

Referring to FIG. 6, the present invention further provides a lithographic apparatus 001 comprising a base 300, a frame 400 disposed on the base 300, an optical device 500 disposed on the frame 400, and a suction stage 100 disposed on the base 300 and configured as described above.

The frame 400 is a gantry structure, the frame 400 is slidably mounted on the base 300 along the X direction, and the frame 400 is externally connected with a power device (not shown), so that the power device drives the frame 400 to move on the base 300 along the X direction. The optical device 500 is movable in the Y-direction and the Z-direction relative to the frame 400, so that the position of the optical device 500 can be adjusted to perform the photolithography process on the workpiece 200 positioned on the suction table 100. The manner in which the optical device 500 is mounted on the frame 400 and moved is conventional and will not be described in detail herein.

The optical device 500 includes a light source (not shown), a DMD (not shown), and a lens assembly (not shown), and a light beam emitted from the light source is projected onto the DMD, reflected by the DMD, and then formed through the lens assembly to irradiate the workpiece 200 for etching. The structure of the optical device 500 is conventional and will not be described in detail herein.

To sum up, adsorb work platform is through setting up block structure, divide into the shutoff region that the suction hole was formed by the shutoff and adsorb the adsorption zone of work piece with the working face, thereby when the pump body breathes in, all suction holes on the whole working face can both form the negative pressure, realize that the pump body is equal to or slightly less than the suction by the suction of work piece, make the work piece tightly adsorbed and keep level and smooth, just, processing, this structure can tightly adsorb various size work pieces and can place the work piece in the arbitrary region of working face, the practicality of adsorbing work platform of breathing in has been improved.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the utility model. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims

1. The utility model provides an adsorb work platform for lithography apparatus is with adsorbing the work piece, lithography apparatus still includes the frame and installs optical device in the frame, the frame can be relative adsorb work platform motion, its characterized in that, adsorb work platform include inhale the platform and with the pump body that the platform is connected breathes in, inhale the platform including the platform body of breathing in that has the working face, run through inhale the platform body set up and with a plurality of suction holes of pump body intercommunication and be used for the shutoff the block structure of suction hole, block structure shutoff part the suction hole forms the shutoff region, so that not by the shutoff the suction hole is in form the adsorption zone on the working face to adsorb the work piece.

2. The adsorbent work platform of claim 1 wherein said plugging structure comprises a plurality of plugging elements, one said plugging element being disposed within each said suction hole.

3. The suction work platform of claim 2, wherein the suction hole is provided with a first opening and a second opening in a height direction of the suction work platform, the first opening being formed on the work surface, and the blocking assembly includes a blocking member provided between the first opening and the second opening, and an elastic member for restraining the blocking member between the first opening and the second opening.

4. An adsorbent work platform as set forth in claim 3 wherein said block piece has a maximum dimension greater than the dimensions of said first and second openings with a first gap between said block piece and said first opening and a second gap between said block piece and said second opening.

5. The sorption work platform of claim 3, wherein during suction operation of the pump body, the blocking member in the blocking region moves toward and blocks the second opening, and a negative pressure is formed at the blocking member and the second opening; and the workpiece in the adsorption area blocks the first opening, and negative pressure is formed at the workpiece and the first opening.

6. An adsorbent work platform as claimed in claim 3 wherein the block piece is a sphere.

7. The adsorption work platform of claim 3, wherein the blocking assembly further comprises a support member connected to the platform body, the support member and the blocking member are disposed at opposite ends of the elastic member, and a passage is formed in the support member to communicate the pump body with the suction hole.

8. An adsorbent work platform as claimed in claim 1 wherein said blocking structure comprises at least one adsorbent pad which can be covered over said work surface to create a negative pressure between said suction holes to block said suction holes.

9. An adsorption work platform according to claim 8, wherein the adsorption pad is made of glass or acrylic.

10. A lithographic apparatus comprising a sorption work platform according to any one of claims 1 to 9.