CN215268833U

CN215268833U - Low-temperature plasma generating equipment

Info

Publication number: CN215268833U
Application number: CN202121362968.0U
Authority: CN
Inventors: 李有亮
Original assignee: Chengdu Junchuang Technology Co ltd
Current assignee: Chengdu Junchuang Technology Co ltd
Priority date: 2021-06-18
Filing date: 2021-06-18
Publication date: 2021-12-21
Anticipated expiration: 2031-06-18

Abstract

The utility model relates to a plasma sound field equipment field especially relates to a low temperature plasma produces equipment, include: the vacuum box is internally provided with a reaction cavity capable of generating plasma; the air pressure control unit comprises an air pump, and the air pump is connected with the reaction cavity to control the air pressure in the reaction cavity; the gas supply unit is connected with the reaction cavity so as to charge reaction gas into the reaction cavity; a power supply unit including a power source, a positive electrode plate, and a negative electrode plate; the positive electrode and the negative electrode of the power supply are respectively and electrically connected with the positive plate and the negative plate, and the positive plate and the negative plate are arranged at intervals; furthermore, it comprises a magnetic field generating unit for changing the direction of motion of the charged particles. Can save energy and increase ionization rate.

Description

Low-temperature plasma generating equipment

Technical Field

The utility model relates to a plasma sound field equipment field especially relates to a low temperature plasma produces equipment.

Background

The conventional low-temperature plasma equipment is mainly used for surface cleaning, surface activation and thin film etching of semiconductor devices, and in the prior art, the low-temperature plasma generating equipment is mainly composed of a gas supply unit, a power supply unit and a vacuum maintaining system. When in use, the air pressure in the chamber is pumped to high vacuum (10) under the action of the molecular pump^-4pa or less), filling reaction gas into the chamber, maintaining the vacuum degree of the sealed chamber at 100pa by a vacuum system, and then applying positive voltage to the parallel polar platesWhen the negative pole inputs high direct voltage till the breakdown voltage of the working gas, the reaction gas of the cavity is ionized to form glow plasma in the closed vacuum.

In the existing plasma technology, in the scheme of generating plasma by adopting high-voltage ionization of positive and negative electrodes, after working gas is filled in the interpolar of parallel plates, positively charged atoms and electrons generated after voltage breakdown of the interpolar are increased, because the positively charged atoms and the negatively charged electrons are only acted by an electric field force between the interpolar electrodes in space, the positively charged atoms and the negatively charged electrons are gathered to two-stage plate surfaces, secondary collision between the charged atoms and unionized particles and between the electrons and unionized particles cannot be effectively formed, and the generation efficiency of the plasma is low. Meanwhile, due to the effect of the electric field force between the electrodes, the energy density distribution of the plasma is not uniform in the space between the electrodes, and the uniformity of the surface treatment is poor when the surface is treated by the plasma. Since a large amount of ionized gas requires a high power supply, the power supply has a high energy requirement to achieve the desired energy density of the plasma. Therefore, the disadvantages of the prior art can be summarized as follows: high energy consumption, low ionization rate and short service life of the polar plate.

SUMMERY OF THE UTILITY MODEL

The technical problem to be solved of the present invention is to overcome the shortcomings of the prior art, and to provide a low temperature plasma generating apparatus.

In order to achieve the above purpose, the utility model adopts the following technical scheme:

a low-temperature plasma generating apparatus comprising: the vacuum box is internally provided with a reaction cavity capable of generating plasma; the air pressure control unit comprises an air pump, and the air pump is connected with the reaction cavity to control the air pressure in the reaction cavity; the gas supply unit is connected with the reaction cavity so as to charge reaction gas into the reaction cavity; a power supply unit including a power source, a positive electrode plate, and a negative electrode plate; the positive electrode and the negative electrode of the power supply are respectively and electrically connected with the positive plate and the negative plate, and the positive plate and the negative plate are arranged at intervals; furthermore, it comprises a magnetic field generating unit for changing the direction of motion of the charged particles.

Further, the magnetic field generating means is a permanent magnet provided on the side surfaces of the positive and negative electrode plates and generating a uniform magnetic field.

Further, the magnetic field generating means is an energizing coil that is provided on the side surfaces of the positive and negative electrode plates and generates an alternating magnetic field.

Further, the air pressure control unit further comprises an APC system for controlling the vacuum degree according to the working state in the reaction chamber.

Further, the air pump is a molecular pump or a diffusion pump.

Further, the potential difference between the positive plate and the negative plate is 8 to 16 KV; the power supply is positioned on the outer side of the reaction cavity and is electrically connected with the positive plate and the negative plate through leads.

Further, the gap between the positive and negative electrode plates is 50mm to 90 mm.

Owing to adopted above technical scheme, the utility model discloses following beneficial effect has:

the utility model discloses a low temperature plasma produces equipment, the charged particle of its reaction intracavity by ionization can be spirally close to positive plate or negative plate under the effect of electric field force and lorentn magnetic force, consequently:

the moving route of the charged particles is longer before reaching the positive plate or the negative plate, the charged particles are more easily collided and ionized with gas atoms on the moving route to generate a plurality of charged particles, the charged particles also move towards the positive plate or the negative plate and collide and ionize with the gas atoms on the moving route, and therefore in multiple collisions, the charged particles increase in an avalanche mode, the power supply energy required for generating specific plasma density is reduced, the ionization rate is increased, and energy is saved;

in addition, during the collision process of the charged particles, the direction of the charged particles is changed, the kinetic energy is reduced, and the plasma is converted from stable glow discharge to arc discharge, thereby effectively prolonging the service life of the electrode plate.

Drawings

In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the drawings of the embodiments will be briefly described below, and it is obvious that the drawings in the following description only relate to some embodiments of the present invention, and are not intended to limit the present invention.

FIG. 1 is a schematic diagram of the general structure of the first embodiment;

FIG. 2 is a schematic diagram of the movement of negatively charged particles according to the first embodiment;

FIG. 3 is a schematic diagram of the collision between negatively charged particles and neutral particles in a first embodiment.

Reference numerals:

1. a vacuum box; 11. a reaction chamber; 2. an air pressure control unit; 21. a molecular pump; an APC system; 3. a power supply unit; 31. a power source; 32. a positive plate; 33. a negative plate; 4. an air supply unit; 5. a magnetic field generating unit.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the present invention will be described in further detail with reference to the accompanying drawings. The components of embodiments of the present invention, as generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.

Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by those of ordinary skill in the art to which the invention belongs. The use of "first," "second," and similar terms in the description and in the claims does not indicate any order, quantity, or importance, but rather is used to distinguish one element from another. Also, the use of the terms "a," "an," or "the" and similar referents do not denote a limitation of quantity, but rather denote the presence of at least one. The word "comprise" or "comprises", and the like, means that the element or item listed before "comprises" or "comprising" covers the element or item listed after "comprising" or "comprises" and its equivalents, and does not exclude other elements or items. "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like are used only to indicate relative positional relationships that may change when the absolute position of an object being described changes, and are merely for convenience in describing the invention and to simplify the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the invention.

Some embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Features in the embodiments described below may be combined with each other without conflict.

The first embodiment is as follows:

referring to fig. 1 to 3, the present invention provides a low temperature plasma generating apparatus, including: a vacuum box 1, wherein the vacuum box 1 is arranged in a closed manner, and a reaction cavity 11 capable of generating plasma is arranged in the vacuum box 1; the air pressure control unit 2 comprises an air pump which is connected with the reaction cavity 11 to control the air pressure in the reaction cavity 11; a gas supply unit 4 connected to the reaction chamber 11 to charge reaction gas into the reaction chamber 11; a power supply unit 3 including a power source 31, a positive electrode plate 32, and a negative electrode plate 33; the positive electrode and the negative electrode of the power supply 31 are respectively and electrically connected with the positive plate 32 and the negative plate 33, and the positive plate 32 and the negative plate 33 are arranged in a gap; furthermore, it comprises a magnetic field generating unit 5 for changing the direction of motion of the charged particles.

As shown in fig. 2 and 3, in the present embodiment, the magnetic field generating unit 5 is a permanent magnet that is provided on the side surfaces of the positive electrode plate 32 and the negative electrode plate 33 and generates a uniform magnetic field that provides a lorentz force to the charged particles. Therefore, when the ionized charged particles move in the electric field between the positive electrode plate 32 and the negative electrode plate 33, they are also subjected to lorentz magnetic force, and under the resultant force of the two forces, the charged particles spirally approach the positive electrode plate 32 or the negative electrode plate 33. Further, the charged particles collide with the uncharged particles during the movement process, so that the kinetic energy is reduced and the movement direction is changed, and after the collision, the charged particles still move towards the positive electrode plate 32 or the negative electrode plate 33 because the charged particles are always subjected to the action of the electric field force and the lorentz force.

It should be noted that, the uniform magnetic field generated by the permanent magnet is only one embodiment of the present invention, and in another embodiment, a person skilled in the art may also set an energizing coil on the side of the electrode plate to generate the alternating magnetic field. That is, any technical solution that generates the lorentn magnetic force in the reaction chamber 11 should fall within the scope of the present invention.

As shown in fig. 1, the air pressure control unit 2 further includes an APC system 22, and the APC system 22 is electrically connected to the air pump to control the vacuum degree according to the operating state in the reaction chamber 11. Further, when the claimed apparatus is in operation, the APC system 22 first controls the air pump to pump the pressure in the reaction chamber 11 to 10^-4pa; when the gas supply unit 4 injects the reaction gas into the reaction chamber 11, the APC system 22 controls the pressure in the reaction chamber 11 to be about 100 pa. The air pump used in the present embodiment is a molecular pump 21. In another embodiment, one skilled in the art can also select a diffusion pump as the evacuation device.

As shown in fig. 1, the power supply 31 is located outside the reaction chamber 11 and electrically connects the positive electrode plate 32 and the negative electrode plate 33 through a lead. By providing the power supply 31 outside the reaction chamber 11, the power supply 31 can be conveniently switched on and off to control the progress of the ionization reaction. Further, the potential difference between the positive electrode plate 32 and the negative electrode plate 33 is 8 to 16KV, more specifically, the potential difference between the positive electrode plate 32 and the negative electrode plate 33 in the present embodiment is 12 KV. In the plasma generating apparatus of the related art, the potential difference between the positive electrode plate 32 and the negative electrode plate 33 is generally 20KV, and the ionization rate is lower than that of the plasma generating apparatus described in the present embodiment.

It should be noted that the gap between the positive electrode plate 32 and the negative electrode plate 33 is 50mm to 90mm, and more specifically, the gap between the positive electrode plate 32 and the negative electrode plate 33 is 70mm in this embodiment.

The above description is only for the specific embodiments of the present invention, but the protection scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims

1. A low-temperature plasma generating apparatus, characterized by comprising:

the vacuum box is internally provided with a reaction cavity capable of generating plasma;

the air pressure control unit comprises an air pump, and the air pump is connected with the reaction cavity to control the air pressure in the reaction cavity;

the gas supply unit is connected with the reaction cavity so as to charge reaction gas into the reaction cavity;

a power supply unit including a power source, a positive electrode plate, and a negative electrode plate; the positive electrode and the negative electrode of the power supply are respectively and electrically connected with the positive plate and the negative plate, and the positive plate and the negative plate are arranged at intervals;

furthermore, it comprises a magnetic field generating unit for changing the direction of motion of the charged particles.

2. The production apparatus as claimed in claim 1, wherein the magnetic field generating unit is a permanent magnet which is provided on the side surfaces of the positive and negative electrode plates and generates a uniform magnetic field.

3. The production apparatus according to claim 1, wherein the magnetic field generating unit is an energizing coil that is provided on the side surfaces of the positive and negative electrode plates and generates an alternating magnetic field.

4. The generating apparatus of claim 1, wherein the pneumatic control unit further comprises an APC system to control a vacuum degree according to an operation state in the reaction chamber.

5. The generating apparatus of claim 1 or 4, wherein the air pump is a molecular pump or a diffusion pump.

6. The production apparatus as claimed in claim 1, wherein the potential difference between the positive and negative plates is 8 to 16 KV; the power supply is positioned on the outer side of the reaction cavity and is electrically connected with the positive plate and the negative plate through leads.

7. The production apparatus as claimed in claim 1, wherein the gap between the positive and negative plates is 50mm to 90 mm.