CN215085059U

CN215085059U - Photoresist recovery system

Info

Publication number: CN215085059U
Application number: CN202120777892.1U
Authority: CN
Inventors: 夏俭波; 李青桦; 陈志刚; 徐鹏飞
Original assignee: Semiconductor Manufacturing Electronics Shaoxing Corp SMEC
Current assignee: Semiconductor Manufacturing Electronics Shaoxing Corp SMEC
Priority date: 2021-04-15
Filing date: 2021-04-15
Publication date: 2021-12-10
Anticipated expiration: 2031-04-15

Abstract

The utility model provides a photoresist recovery system, which comprises an air source, a photoresist storage container, a first pipeline, a bubble removing unit, a buffer recovery container, a recovery pipeline and a discharge pipeline; the gas source is communicated with the photoresist storage container and is used for pressing the photoresist in the photoresist storage container into the first pipeline; the photoresist storage container is communicated with the bubble removing unit through a first pipeline; the bubble removing unit comprises a bubble removing pipeline, and the bubble removing pipeline is used for discharging bubbles in the photoresist; the tail end of the bubble removing pipeline is communicated with the top of the buffer recovery container; the air source is communicated with the buffer recovery container, one end of the discharge pipeline is communicated with the top of the buffer recovery container, and the other end of the discharge pipeline is used for discharging bubbles in the buffer recovery container; the bottom of the buffer recovery container is communicated with the top of the photoresist storage container through a recovery pipeline. The utility model provides a photoresist recovery system can solve the problem that the Track board caused a large amount of photoresists extravagant when arranging the bubble operation among the prior art.

Description

Photoresist recovery system

Technical Field

The utility model relates to a semiconductor device technical field, in particular to photoresist recovery system.

Background

In a semiconductor manufacturing process, a photolithography process has been regarded as a critical step in the manufacture of an integrated circuit, and needs to be used for many times in the whole process, and the stability and reliability of the photolithography process have important influences on the quality, yield and cost of products. The photolithography process is a complex process, and essentially copies a circuit structure onto a wafer to be etched and ion-implanted in a pattern form, and a TRACK machine (a photoresist developer) is used for transferring a mask pattern onto the wafer, and the process of the TRACK machine is roughly as follows: firstly, a photoresist coating system is utilized to form a layer of photosensitive material, namely a photoresist thin layer, then parallel light is irradiated on the photoresist thin layer through a mask plate to be exposed and deteriorated, and finally, a developing solution is utilized to carry out development to complete pattern transfer. If the thickness of the formed photoresist thin layer is deviated, the subsequent related processes can be directly influenced, and if the thickness of the photoresist exceeds the expected thickness, insufficient exposure and development can be caused, and a normal photoetching pattern cannot be obtained; the thickness of the photoresist is smaller than the expected thickness, so that the protection of the photoresist on the wafer can be failed except for the deformation of the pattern caused by abnormal exposure and development, and the wafer is scrapped after the etching process. Therefore, in the coating process of the photoresist, the realization of good control on the thickness of the photoresist is very critical.

When bubbles exist in the photoresist, the photoresist thin layer is obviously adversely affected, and when the photoresist thin layer contains the bubbles, the photoresist is not only unevenly sprayed, the yield is reduced, but also the actual coating amount of the photoresist is reduced, and the thickness of the formed photoresist thin layer is thinned. Therefore, when the photoresist filter is replaced or new photoresist is coated, the bubble removing action is needed to discharge the bubbles remained in the filter, the motor-driven pump and the photoresist conveying pipeline, so that the bubbles are prevented from reaching the surface of the wafer through the photoresist conveying pipeline to form defects.

Therefore, in the prior art, the Track machine can execute bubble discharging operation when the photoresist is replaced or the filter is replaced and bubbles exist in the pipeline every time, the photoresist discharged along with the bubbles in the bubble discharging process can be directly discharged to a factory service end, secondary recycling is not carried out, and a large amount of photoresist is wasted.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a photoresist recovery system to solve Track board among the prior art and cause the extravagant problem of a large amount of photoresists when arranging the bubble operation.

In order to solve the technical problem, the utility model provides a photoresist recovery system, which comprises an air source, a photoresist storage container, a first pipeline, a bubble removing unit, a buffer recovery container, a recovery pipeline and a discharge pipeline; the gas source is communicated with the top of the photoresist storage container and is used for pressing the photoresist in the photoresist storage container into the first pipeline; the photoresist storage container is communicated with the bubble removing unit through the first pipeline; the bubble removing unit comprises a bubble removing pipeline, and the bubble removing pipeline is used for discharging bubbles in the photoresist; the tail end of the bubble removing pipeline is communicated with the top of the buffer recovery container according to the fluid flowing direction; the gas source is communicated with the top of the buffer recovery container, one end of the discharge pipeline is communicated with the top of the buffer recovery container, and the other end of the discharge pipeline is used for discharging bubbles in the buffer recovery container; the bottom of the buffer recovery container is communicated with the top of the photoresist storage container through the recovery pipeline.

Further, the gas source is communicated with the photoresist storage container through a first gas inlet pipeline, and a first valve is arranged on the first gas inlet pipeline.

Furthermore, a second valve is arranged on the discharge pipeline, and the second valve and the first valve are synchronously opened or closed.

Further, the first valve and the second valve are pneumatic valves.

Further, the air source is communicated with the buffer recovery container through a second air inlet pipeline, and a third valve is arranged on the second air inlet pipeline.

Furthermore, a fourth valve is arranged on the recovery pipeline.

Furthermore, the first pipeline extends into the photoresist storage container and is communicated with the bottom of the photoresist storage container.

Further, the gas source is a nitrogen gas source.

Furthermore, the bubble removing unit comprises a consumption detecting container, a bubble collecting container, a filter, a second pipeline, a third pipeline, a first exhaust branch, a second exhaust branch and a third exhaust branch; two ends of the first pipeline are respectively communicated with the photoresist storage container and the consumption detection container; two ends of the second pipeline are respectively communicated with the consumption detection container and the bubble collection container; two ends of the third pipeline are respectively communicated with the bubble collecting container and the filter, and the filter is used for being communicated with a motor-driven pump; the consumption detection container is communicated with the bubble removal pipeline through the first exhaust branch; the bubble collecting container is communicated with the bubble removing pipeline through the second exhaust branch; the filter is in communication with the bubble removal conduit through the third exhaust branch.

Further, the first pipeline, the second pipeline and/or the third pipeline are/is provided with bubble detection sensors; and valves are arranged on the first exhaust branch, the second exhaust branch and/or the third exhaust branch.

In conclusion, compared with the prior art, the utility model provides a photoresist recovery system has increased a buffering recovery container in the terminal series connection of present bubble removal pipeline, and TRACK board is when arranging the bubble operation like this, and the photoresist that is arranged along with the bubble together can get into buffering recovery container, and after gas-liquid separation in buffering recovery container, the bubble can be followed discharge tube and discharged, and the photoresist then can remain in buffering recovery container, simultaneously buffering recovery container with set up the recovery pipeline between the photoresist storage container, from parallelly connected a set of pipeline of air supply extremely among the buffering recovery container, after the pressurization, the photoresist of keeping in the buffering recovery container just can be followed the recovery pipeline flows back to among the photoresist storage container to the recovery of photoresist has been realized recycling to the photoresist.

Drawings

FIG. 1 is a schematic diagram of a photoresist bubble removal system;

fig. 2 is a schematic diagram of a photoresist recycling system according to an embodiment of the present invention.

Wherein the reference numbers are as follows:

1-a photoresist container; 2-a consumption detection container; 3-a bubble collection vessel; 4-a filter; 5-bubble removing unit; 6-bubble removal pipeline; 10-a gas source; 20-a photoresist storage container; 30-a bubble removal unit; 40-a buffer recovery vessel; 102-a first air intake duct; 300-a bubble removal conduit; 301-a first conduit; 402-a recovery pipeline; 400-a discharge conduit; e1-first valve; e4-second valve; m1-third valve; m2-fourth valve; 31-a consumption detection container; 32-a bubble collection vessel; 33-a filter; 302-a second conduit; 303-a third conduit; 304-a first exhaust branch; 305-a second exhaust branch; 306-a third exhaust branch; 51,52, 53-bubble detection sensor.

Detailed Description

The photoresist recovery system according to the present invention will be described in detail with reference to the accompanying drawings and the following detailed description. The advantages and features of the present invention will become more apparent from the following description.

It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention. To make the objects, features and advantages of the present invention more comprehensible, please refer to the attached drawings. It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limitation of the implementation of the present invention, so that the present invention does not have the essential significance in the technology, and any modification of the structure, change of the ratio relationship or adjustment of the size should still fall within the scope of the technical content disclosed in the present invention without affecting the function and the achievable purpose of the present invention.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the present invention.

In this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

As shown in fig. 1, a photoresist bubble removing system includes a photoresist container 1 and a bubble removing unit 5, where a Track machine performs a bubble removing operation each time a photoresist is replaced or a filter is replaced and bubbles are present in a pipeline, and at this time, a consumption detection container 2(L/E tank), a bubble collection container 3(Trap tank), and a filter 4 in the bubble removing unit 5 are all communicated with a bubble removing pipeline 6 through a pipeline and a valve, and the bubble removing operation can be implemented by opening the valve, but in the bubble removing process, the photoresist in these containers is also removed to the bubble removing pipeline 6 along with the bubbles, and the bubble removing pipeline 6 in the prior art is directly removed to a plant end without secondary recycling, which results in a large amount of photoresist waste.

The core idea of the utility model is to provide a photoresist recovery system to solve the problem that Track board caused a large amount of photoresists extravagant when arranging the bubble operation among the prior art.

In order to realize the above idea, as shown in fig. 2, the present invention provides a photoresist recovery system, which includes a gas source 10, a photoresist storage container 20, a first pipeline 301, a bubble removing unit 30, a buffer recovery container 40, a recovery pipeline 402 and a discharge pipeline 400, wherein the gas source 10 is communicated with the top of the photoresist storage container 20 and is used for pressing the photoresist in the photoresist storage container 20 into the first pipeline 301; the photoresist storage container 20 is communicated with the bubble removing unit 30 through the first pipe 301; the bubble removing unit 30 includes a bubble removing duct 300, the bubble removing duct 300 being for removing bubbles in the photoresist; the end of the bubble removing duct 300 communicates with the top of the buffer recovery tank 40 in the fluid flow direction; the gas source 10 is communicated with the top of the buffer recovery container 40, one end of the discharge pipeline 400 is communicated with the top of the buffer recovery container 40, and the other end is used for discharging bubbles in the buffer recovery container 40; the bottom of the buffer recovery tank 40 is communicated with the top of the photoresist storage tank 20 through the recovery pipe 402.

The utility model discloses an in the scheme, get rid of pipeline 300 end at current bubble and establish ties and increased a buffering recovery container 40, TRACK board is when arranging the bubble operation like this, and the photoresist that is arranged along with the bubble can get into buffering recovery container 40 in, after gas-liquid separation in buffering recovery container 40, the bubble can be followed discharge tube 400 and discharged, and the photoresist then can remain in buffering recovery container 40, simultaneously buffering recovery container 40 with recovery pipeline 402 has been add between the photoresist storage container 20, from parallelly connected a set of pipeline of air supply 10 extremely among the buffering recovery container 40, after the pressurization, the photoresist of keeping in buffering recovery container 40 just can be followed recovery pipeline 402 flows back to in the photoresist storage container 20 to the recovery of photoresist has been realized recycling to the photoresist.

As an implementation manner of the present invention, the gas source 10 is communicated with the photoresist storage container 20 through a first gas inlet pipe 102, and a first valve E1 is disposed on the first gas inlet pipe 102. The discharge pipe 400 is provided with a second valve E4, and the second valve E4 is opened or closed in synchronization with the first valve E1. Also, the first valve E1 and the second valve E4 may preferably be pneumatic valves. Of course, it should be understood by those skilled in the art that the type of the first valve E1 and the second valve E4 in the present invention is not limited to being pneumatic valves, and other types of valves, such as ball valves, solenoid valves, etc., are also included in the protection scope of the present application.

Preferably, the gas source 10 is communicated with the buffer recovery tank 40 through a second gas inlet pipe 104, and a third valve M1 is disposed on the second gas inlet pipe 104. The recovery pipeline 402 is provided with a fourth valve M2. When the photoresist recovery is required, the photoresist recovery line can be started by opening the third valve M1 and the fourth valve M2. Preferably, the third valve M1 and the fourth valve M2 may be manual valves, such as manual ball valves. Of course, it should be understood by those skilled in the art that the types of the third valve M1 and the fourth valve M2 in the present application are not limited to the above-mentioned manual valves, but may be automatic valves, such as pneumatic valves, solenoid valves, etc., and fall within the scope of the present application.

Further, the first pipe 301 extends into the photoresist storage container 20 and is communicated with the bottom of the photoresist storage container 20. Therefore, the photoresist in the photoresist storage container 20 can be fully utilized, and the photoresist remained at the bottom can not be sucked out for utilization.

Optionally, the air source 10 of the present invention may be a nitrogen air source. Of course, the gas type of the gas source 10 is not limited in this application, and other inert gases that do not participate in the photolithography reaction may be used.

Further, the bubble removing unit 30 includes a consumption detecting container 31(L/E tank), a bubble collecting container 32(Trap tank), a filter 33, a second pipe 302, a third pipe 303, a first exhaust branch 304, a second exhaust branch 305, and a third exhaust branch 306; both ends of the first pipe 301 are respectively communicated with the photoresist storage container 20 and the consumption detection container 31; both ends of the second pipe 302 are respectively communicated with the consumption detection container 31 and the bubble collecting container 32; both ends of the third pipeline 303 are respectively communicated with the bubble collecting container 32 and the filter 33, and the filter 33 is used for being communicated with a motor-driven pump; the consumption detection container 31 is communicated with the bubble elimination pipeline 300 through the first exhaust branch 304; the bubble collecting container 32 is communicated with the bubble removing pipe 300 through the second exhaust branch 305; the filter 33 communicates with the bubble removal duct 300 through the third exhaust branch 306.

Further, the first pipeline 301, the second pipeline 302 and/or the third pipeline 303 are provided with bubble detection sensors 51,52, 53; valves are provided in the first exhaust branch 304, the second exhaust branch 305 and/or the third exhaust branch 306, which may be any type of on-off valves, such as pneumatic valves E2, E4 provided in the first exhaust branch 304 and the third exhaust branch 306, and a manual valve M3 provided in the second exhaust branch 305.

The utility model also provides a rubber coating development board (Track board), include as above photoresist recovery system.

The above description is only for the description of the preferred embodiments of the present invention, and not for any limitation of the scope of the present invention, and any modification and modification made by those skilled in the art according to the above disclosure are all included in the protection scope of the claims. It will be apparent to those skilled in the art that various changes and modifications may be made to the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. A photoresist recovery system is characterized by comprising an air source, a photoresist storage container, a first pipeline, a bubble removing unit, a buffer recovery container, a recovery pipeline and a discharge pipeline,

the gas source is communicated with the top of the photoresist storage container and is used for pressing the photoresist in the photoresist storage container into the first pipeline;

the photoresist storage container is communicated with the bubble removing unit through the first pipeline;

the bubble removing unit comprises a bubble removing pipeline, and the bubble removing pipeline is used for discharging bubbles in the photoresist;

the tail end of the bubble removing pipeline is communicated with the top of the buffer recovery container according to the fluid flowing direction;

the gas source is communicated with the top of the buffer recovery container, one end of the discharge pipeline is communicated with the top of the buffer recovery container, and the other end of the discharge pipeline is used for discharging bubbles in the buffer recovery container;

the bottom of the buffer recovery container is communicated with the top of the photoresist storage container through the recovery pipeline.

2. The photoresist recovery system of claim 1, wherein the gas source is in communication with the photoresist storage container via a first gas inlet line, the first gas inlet line having a first valve disposed thereon.

3. The photoresist recovery system of claim 2, wherein the exhaust line is provided with a second valve that is opened or closed in synchronization with the first valve.

4. The photoresist recovery system of claim 3, wherein the first valve and the second valve are pneumatic valves.

5. The photoresist recovery system of claim 1, wherein the gas source is in communication with the buffer recovery vessel via a second gas inlet line, the second gas inlet line having a third valve disposed thereon.

6. The photoresist recovery system of claim 1, wherein a fourth valve is disposed on the recovery conduit.

7. The system of claim 1, wherein the first conduit extends into the photoresist storage container and communicates with a bottom of the photoresist storage container.

8. The photoresist recovery system of claim 1, wherein the gas source is a nitrogen gas source.

9. The photoresist recovery system of claim 1, wherein the bubble removal unit comprises a consumption detection container, a bubble collection container, a filter, a second pipeline, a third pipeline, a first exhaust branch, a second exhaust branch and a third exhaust branch;

two ends of the first pipeline are respectively communicated with the photoresist storage container and the consumption detection container; two ends of the second pipeline are respectively communicated with the consumption detection container and the bubble collection container; two ends of the third pipeline are respectively communicated with the bubble collecting container and the filter, and the filter is used for being communicated with a motor-driven pump;

the consumption detection container is communicated with the bubble removal pipeline through the first exhaust branch;

the bubble collecting container is communicated with the bubble removing pipeline through the second exhaust branch;

the filter is in communication with the bubble removal conduit through the third exhaust branch.

10. The photoresist recovery system of claim 9, wherein a bubble detection sensor is disposed on the first pipe, the second pipe, and/or the third pipe;

and valves are arranged on the first exhaust branch, the second exhaust branch and/or the third exhaust branch.