CN214747317U - Safe processing system for doping in vacuum furnace - Google Patents

Abstract

The utility model provides a doping safety processing system in a vacuum furnace, which comprises a vacuum furnace, a first vacuumizing subsystem and a second vacuumizing subsystem for vacuumizing the gas in the furnace, and a water-gas separator for processing the pumped gas; the air inlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the air outlet end of the vacuum furnace through a first three-way pipe, and the air outlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the water-gas separator through a second three-way pipe. The utility model relates to a safe processing system for doping in a vacuum furnace, the vacuum pumping control system has two sets, and the two sets of processing systems can complete the production requirement with lower cost; and can two units fast switch over under emergency, even if one unit can not guarantee production because of the special circumstances, switch over another unit and just can guarantee the normal operating of equipment production, have double-deck insurance like this, provide safe two sets of system guarantee to production.

Description

Safe processing system for doping in vacuum furnace

Technical Field

The utility model belongs to the technical field of the crystal pulling furnace, especially, relate to a doping safety processing system in vacuum furnace.

Background

During the production process of the crystal pulling furnace, various trace elements such as phosphorus, arsenic and the like can be doped, and the product quality is improved. In the production working state, elements such as phosphorus, arsenic and the like are exhausted by an exhaust pipeline after being pumped by a vacuum pump.

1. Red phosphorus, arsenic and the like in the impurities can enter the human body through ways of inhalation, ingestion, skin contact and the like. Poisoning can be caused by frequent intake of red phosphorus and arsenic dust;

2. after the vacuum pump is pumped out, red phosphorus, arsenic and the like are left in the centralized exhaust pipeline, the ignition temperature of the red phosphorus is 260 ℃, the red phosphorus is sensitive to heat, friction and impact, and great potential safety hazards exist in use.

3. In the production process, the residue is cleaned regularly, so that the labor is wasted to a certain extent, and the cost is increased.

In the production process, the vacuum furnace utilizes a vacuum system (formed by carefully assembling elements such as a vacuum pump, a vacuum measuring device, a vacuum valve and the like) to discharge partial substances in the furnace chamber in a specific space of the furnace chamber, so that the pressure in the furnace chamber is less than a standard atmospheric pressure, and the space in the furnace chamber realizes a vacuum state, namely the vacuum furnace. Because the environment in the furnace needs a vacuum state, the furnace needs to be continuously pumped out by a vacuum pump, and the pumped-out waste gas enters a centralized exhaust pipeline through an air pumping pipeline and finally enters a treatment system under the action of the vacuum pump.

During the production process, various trace elements such as phosphorus and arsenic are doped due to the quality requirement of the product. Some of the trace elements are volatilized in a high-temperature environment or in a putting process, and the volatilized part passes through the pipeline due to the adsorption and discharge functions of the vacuum pump, then passes through the vacuum pump and finally is discharged from the pipeline, which is the current production flow.

The hidden danger at present: the red phosphorus may pass through pipes, pumps, and particularly, a post-pump concentrated exhaust pipe during discharge and remain. Because the production furnaces are too many, the pipelines are too long, and the vacuum oil pump generates oil gas, red phosphorus, arsenic and other elements in the high-temperature process to form an oil-gas mixture, the factors are that due to the inflammable and explosive characteristics of the red phosphorus, the toxicity of the arsenic and the like, one friction and one high temperature can cause even a little ignition spark, so that the fire hazard, the strong explosion, the toxic gas and other dangerous hidden dangers can be caused, the life and property safety of people can be seriously influenced, the prevention must be carried out, and how to eliminate the hidden dangers in the production process becomes the urgent necessity of the current production.

By analyzing the characteristics of the doped trace elements and the working production environment, the safe production can be realized by controlling the two aspects of temperature control and trace element decomposition.

The formulation scheme is as follows:

the current production method of silicon single crystals is mainly a Czochralski method (CZ) and a floating zone method (FZ), and 70-80% of the world production of silicon single crystals is produced by the Czochralski method. The conventional Czochralski method for producing a silicon single crystal employs a reduced pressure crystal pulling process which is a vacuum process and a flowing atmosphere process.

In the decompression crystal pulling process, in the pulling process of the silicon single crystal, inert gas (generally high-purity argon gas) is continuously and uniformly introduced into a hearth of a single crystal furnace, and a vacuum pump continuously exhausts the gas from the hearth to keep the vacuum degree in the hearth to be stabilized at (2.7-5.3) x 103 Pa. The process has the characteristics of both vacuum process (negative pressure is kept in the hearth) and flowing atmosphere process (continuous inflation and continuous exhaust).

By adopting the process, the high-purity argon gas flow filled into the hearth can penetrate through the whole silicon single crystal growing region from top to bottom in the silicon single crystal growing process, silicon oxide and impurity volatile matters generated due to high temperature are carried away in time, and the quality of the silicon single crystal is ensured. According to the most commonly used silicon single crystal pulling method reduced pressure crystal pulling process at present, a vacuum system is generally provided with a slide valve type vacuum pump. However, with the increase of the demand of silicon single crystals with special requirements such as large diameter, heavy doping and the like, the requirements on single crystal furnace equipment are higher and higher, and the defects of adopting a slide valve type vacuum pump are increasingly shown.

The defect of the vacuum system of the straight-pulled single crystal furnace adopting the slide valve type vacuum pump is that the water ring type vacuum pump is applied to the straight-pulled single crystal furnace equipment by modifying the vacuum system, so that the overall performance of the straight-pulled single crystal furnace is improved.

SUMMERY OF THE UTILITY MODEL

In view of this, the present invention provides a safe processing system for doping in a vacuum furnace to solve the problem that the crystal pulling furnace is damaged by directly discharging the gas pumped out by the vacuum pump during the production process.

In order to achieve the above purpose, the technical scheme of the utility model is realized like this:

a doping safety processing system in a vacuum furnace comprises the vacuum furnace, a first vacuumizing subsystem, a second vacuumizing subsystem and a water-gas separator, wherein the first vacuumizing subsystem and the second vacuumizing subsystem are used for vacuumizing gas in the vacuum furnace;

the air inlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the air outlet end of the vacuum furnace through a first three-way pipe, and the air outlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with a water-gas separator through a second three-way pipe;

the first vacuumizing subsystem comprises a first vacuum pump;

the second evacuation subsystem includes a water ring vacuum pump.

Further, first evacuation subsystem still includes concentrated exhaust duct, the second vacuum pump, the first vacuum pump inlet end is connected with first pneumatic valve, first pneumatic valve inlet end is connected with first three-way pipe, the end of giving vent to anger of first pneumatic valve is connected with the inlet end of first vacuum pump, the air inlet of concentrating exhaust duct is connected to the end of giving vent to anger of first vacuum pump, exhaust duct's gas outlet is connected with the second vacuum pump inlet end, the end of giving vent to anger of second vacuum pump is connected with the second pneumatic valve, the second pneumatic valve other end is connected with second three-way pipe one end.

Furthermore, the air inlet end of the water ring type hollow pump is connected with a third pneumatic valve, the air inlet end of the third pneumatic valve is connected with the first three-way pipe, the air outlet end of the third pneumatic valve is connected with the air inlet end of the water ring type vacuum pump, the air outlet end of the water ring type vacuum pump is connected with a fourth pneumatic valve, the air inlet end of the fourth pneumatic valve is connected with the air outlet end of the water ring type vacuum pump, and the air outlet end of the fourth pneumatic valve is connected with the second three-way pipe.

Further, a liquid outlet of the water-gas separator is connected with a sewage treatment tank.

Further, the gas outlet of the water-gas separator is connected with a gas filtering device.

Further, the gas filtering apparatus includes: the box body is a filter plate and an ultraviolet disinfection lamp which are detachably arranged in the box body;

a first cavity is arranged in the box body, the top of the first cavity is provided with a mounting groove, a slot is arranged in the mounting groove, the width of the slot corresponds to the thickness of the filter plate, and the filter plate is arranged in the slot;

the top of the first cavity is also provided with a rectangular opening, and the ultraviolet disinfection lamp is arranged at the rectangular opening and extends into the first cavity.

Further, sealed lid is installed in the articulated mounting of mounting groove one end, and the thickness of sealed lid is corresponding with the mounting groove degree of depth, and the mounting groove other end is equipped with first mounting panel, and sealed lid one end is equipped with the second mounting panel corresponding with first mounting panel, and first mounting panel and second mounting panel pass through the bolt fastening, and sealed lid seals the filter in first cavity.

Furthermore, be equipped with a plurality of first bolt holes in the rectangle trompil, be equipped with a plurality of second bolt holes corresponding with first bolt hole on the ultraviolet ray disinfection lamp, the ultraviolet ray disinfection lamp passes through the bolt fastening on the box.

Further, a second cavity, a third cavity and a fourth cavity are further arranged in the box body, a first air blower is installed in the second cavity, an air inlet of the first air blower extends into the first cavity, and an air outlet of the first air blower extends into the third cavity;

a plurality of spray heads are arranged in the third cavity, and an agent liquid configuration box is arranged at the top of the third cavity and is connected with the spray heads;

and a second air blower is arranged in the fourth cavity, an air inlet of the second air blower extends into the third cavity, and an air outlet of the second air blower is connected with an air outlet of the box body.

Compared with the prior art, the safe processing system for the doping in the vacuum furnace has the following beneficial effects:

(1) the utility model relates to a safe processing system for doping in a vacuum furnace, the vacuum pumping control system has two sets, and the two sets of processing systems can complete the production requirement with lower cost; and can two units fast switch over under emergency, even if one unit can not guarantee production because of the special circumstances, switch over another unit and just can guarantee the normal operating of equipment production, have double-deck insurance like this, provide safe two sets of system guarantee to production.

(2) A doping safety processing system in vacuum furnace, first evacuation subsystem will take out the gas that has the poison gas and filter gas through gas filtration device after aqueous vapor separation, make the air more fresh, reduced the injury that causes the human body.

(3) A doping safety processing system in vacuum furnace, second evacuation subsystem has carried out a reaction through water ring vacuum pump to gas, the disinfection, then after separating through water gas separator, once filtering through filter equipment, carried out double-deck filtration to toxic gas, gas treatment is more appropriate.

Drawings

The accompanying drawings, which form a part hereof, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention without undue limitation. In the drawings:

fig. 1 is a schematic view of a safe doping processing system in a vacuum furnace according to an embodiment of the present invention;

fig. 2 is a first schematic structural diagram of a gas filtering device according to an embodiment of the present invention;

fig. 3 is a schematic structural diagram of a gas filtering device according to an embodiment of the present invention;

fig. 4 is a structural diagram of a box body of a gas filtering device according to an embodiment of the present invention.

Description of reference numerals:

1. a vacuum furnace; 2. a first vacuum pump; 3. a centralized exhaust duct; 4. a sewage treatment tank; 5. a water-gas separator; 6. a water-ring vacuum pump; 7. a second vacuum pump; 8. an air filtration device; 11. a first three-way pipe; 12. a first pneumatic valve; 13. a third pneumatic valve; 61. a fourth pneumatic valve; 62. a second three-way pipe; 71. a second pneumatic valve; 81. a box body; 82. a sealing cover; 83. a filter plate; 84. an ultraviolet disinfection lamp; 85. an agent liquid preparation box; 86. a second blower; 87. a first blower; 88. a spray head; 831. a pull ring; 801. a first cavity; 802. a second cavity; 803. a third cavity; 804. a fourth cavity; 821. a groove; 841. a lamp wick; 811. a viewing port; 812. an air inlet of the box body; 813. mounting grooves; 814. a rectangular groove; 815. rectangular holes are formed; 816. a first mounting plate.

Detailed Description

It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.

The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

As shown in fig. 1 to 4, a safe doping treatment system in a vacuum furnace comprises a vacuum furnace 1, a first vacuum-pumping subsystem and a second vacuum-pumping subsystem for pumping gas in the vacuum furnace 1, and a water-gas separator 5 for treating the pumped gas;

the air inlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the air outlet end of the vacuum furnace 1 through a first three-way pipe 11, and the air outlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the water-gas separator 5 through a second three-way pipe 62;

the first vacuumizing subsystem comprises a first vacuum pump 2;

the second evacuation subsystem comprises a water ring vacuum pump 6.

As shown in fig. 1, the first vacuum pumping subsystem further includes a centralized exhaust pipeline 3 and a second vacuum pump 7, an air inlet end of the first vacuum pump 2 is connected with a first pneumatic valve 12, an air inlet end of the first pneumatic valve 12 is connected with a first three-way pipe 11, an air outlet end of the first pneumatic valve 12 is connected with an air inlet end of the first vacuum pump 2, an air outlet end of the first vacuum pump 2 is connected with an air inlet of the centralized exhaust pipeline 3, an air outlet of the exhaust pipeline is connected with an air inlet end of the second vacuum pump 7, an air outlet end of the second vacuum pump 7 is connected with a second pneumatic valve 71, and the other end of the second pneumatic valve 71 is connected with one end of a second three-way pipe 62;

the air inlet end of the water ring type hollow pump is connected with a third pneumatic valve 13, the air inlet end of the third pneumatic valve 13 is connected with a first three-way pipe 11, the air outlet end of the third pneumatic valve 13 is connected with the air inlet end of the water ring type vacuum pump 6, the air outlet end of the water ring type vacuum pump 6 is connected with a fourth pneumatic valve 61, the air inlet end of the fourth pneumatic valve 61 is connected with the air outlet end of the water ring type vacuum pump 6, and the air outlet end of the fourth pneumatic valve 61 is connected with a second three-way pipe 62.

The water ring type hollow pump adopts a 2BW series liquid ring type vacuum pump, and the first vacuum pump 2 and the second vacuum pump 7 adopt slide valve type vacuum pumps.

The first vacuumizing subsystem and the second vacuumizing subsystem can select the first vacuumizing subsystem or the second vacuumizing subsystem through the switches of the first pneumatic valve 12 and the third pneumatic valve 13, when the first pneumatic valve 12 is opened, the third pneumatic valve 13 is closed, the first vacuumizing subsystem works, the first vacuum pump 2 sucks gas in the vacuum furnace 1, the first pneumatic valve 12 is closed after the vacuum value in the vacuum furnace 1 meets the requirement, the first vacuum pump 2 transmits the extracted gas into the centralized exhaust pipeline 3, and the gas in the centralized exhaust pipeline is extracted by the second vacuum pump 7 and transmitted into the water-gas separator 5 for separation treatment.

When the first pneumatic valve 12 is closed, the third pneumatic valve 13 is opened, the second vacuumizing subsystem is opened, the water-ring vacuum pump 6 is filled with the preparation, the gas sucked into the vacuum furnace 1 by the water-ring vacuum pump 6 is reacted in the pump, and the reacted gas is transmitted to the water-gas separator 5 for water-gas separation.

Preparation: is a special and specially-made preparation for red phosphorus and arsenic modulation, and has the following name: flame retardant (phosphide digestion solution), product characteristics: can decompose simple substance phosphorus and phosphide, so that the phosphorus and the phosphide are oxidized and decomposed to become metaphosphoric acid and the like, and the chemical properties of the product are as follows: it is weakly acidic, non-combustible and non-explosive. Use notes: if the eye contact is not made, the eye contact can be made by washing with a large amount of clear water and then cleaning with soap or sending the medicine for treatment. The product can be directly used as fertilizer for trees after being neutralized by carbohydrate. The medicament can safely digest red phosphorus and arsenic volatilized in the furnace and enter a centralized special treatment circulating system through a special pipeline, and a preparation of the treatment system can be recycled, so that the cost is greatly saved, the maintenance is simple and safe, and only the concentration can be adjusted regularly according to the time.

The vacuum pumping control systems are provided with two sets, one is a normal vacuum pumping subsystem which can pump the gas in the furnace to the required production vacuum value to ensure normal production; secondly, switching to a water circulation system to ensure that dangerous sources generated in the production process can be safely treated and decomposed; the vacuum pumping subsystems are arranged in the production process, the furnace can be quickly pumped to the required production vacuum value, the valve is cut off from the connection with the pipeline, the vacuum oil pump is closed, then the water circulation system is started, the one-way valve is opened, and then the unit valve is opened, so that the unit switching is completed, the water circulation system is normally produced, if the water circulation unit is directly used for pumping out slowly and needs to be independently completed, a huge water circulation unit is needed, the cost is too high to be beneficial to production cost control, and the two sets of units exist, so the production requirement can be completed with the smaller cost. The most important thing is that two units can be switched rapidly under emergency, even if one unit can not guarantee production due to special conditions, the normal operation of equipment production can be guaranteed by switching the other unit, so that double-layer insurance is provided, and two sets of system guarantees of safety are provided for production.

The 2BW series liquid ring vacuum pump closed circulation system is a complete set of equipment consisting of a 2BV type water ring vacuum pump 6 or a 2BE series liquid ring vacuum pump, a steam-water separator, a heat exchanger and various pipeline accessories, wherein the model selection of the liquid ring vacuum pump/compressor needs to BE calculated according to detailed working conditions. Compared with a single liquid ring vacuum pump, the installation is more convenient. Because the working solution can be recycled, the system greatly reduces the consumption of the working solution and the pollution to the environment, and has obvious superiority in various occasions that the extracted gas is toxic and contains organic solvents. In most application occasions, a closed circulation system of a liquid ring vacuum pump can be adopted.

The working fluid of the closed circulation system of the liquid ring vacuum pump can adopt various media: water, organic solvents such as methanol, ethanol, xylene, aniline, acetone, etc., transformer oil, etc.

The 2BV type water ring vacuum pump 6 has the following purposes:

the 2BV type water-ring vacuum pump 6 is used to pump air and other non-corrosive, water-insoluble, solid particle-free gases to create a vacuum in the closed vessel, allowing a small amount of liquid to be contained in the sucked gas. As the compression process of the gas is isothermal in the working process of the 2BV type water-ring vacuum pump 6, the gas is not easy to explode when the flammable and explosive gas is compressed and pumped, so that the application of the gas is wider. The 2BV type water ring vacuum pump 6 can also be used for water diversion of a large-scale water pump. When the compressor is used, the pressure is up to 0.26MPa (absolute pressure), and the compressor can completely replace a reciprocating vacuum pump, so a 2BV type water ring vacuum pump 6 is selected and selected by research.

As shown in fig. 1, a liquid outlet of the moisture separator 5 is connected with a sewage treatment tank 4; the sewage treatment tank 4 is an existing sewage treatment apparatus, and will not be described in detail here.

The gas outlet of the water-gas separator 5 is connected with a gas filtering device; the water-gas separator 5 is an existing water-gas separator 5 and will not be described in detail here.

As shown in fig. 2 to 4, the gas filtering apparatus includes: a box body 81, a filter plate 83 and an ultraviolet disinfection lamp 84 which are detachably arranged in the box body 81;

a first cavity 801 is arranged in the box body 81, a mounting groove 813 is arranged at the top of the first cavity 801, a slot is arranged in the mounting groove 813, the width of the slot corresponds to the thickness of the filter plate 83, and the filter plate 83 is arranged in the slot;

the top of the first cavity 801 is also provided with a rectangular opening 815, and the UV disinfection lamp 84 is mounted at the rectangular opening and extends into the first cavity 801.

The articulated sealed lid 82 that installs of mounting groove 813 one end, the thickness of sealed lid 82 corresponds with the mounting groove 813 degree of depth, and the mounting groove 813 other end is equipped with first mounting panel 816, and sealed lid 82 one end is equipped with the second mounting panel corresponding with first mounting panel 816, and first mounting panel 816 and second mounting panel pass through the bolt fastening, and sealed lid 82 seals up the filter 83 in first cavity 801.

The top of the filter plate 83 is provided with a pull ring 831, the pull ring 831 is convenient for taking out the filter plate 83, the bottom of the sealing cover 82 is provided with a groove 821 corresponding to the pull ring 831, when the sealing cover 82 covers, the pull ring 831 is positioned in the groove 821, so that the poor sealing performance of the sealing cover 82 caused by the support of the pull ring 831 and the gap between the filter plate 83 and the sealing cover 82 which are not beneficial to the filtration of gas are prevented;

the bottom of the sealing cover 82 is provided with a rubber seal which is tightly attached to the top of the filter plate 83 to prevent the gas from flying out from the top.

A plurality of first bolt holes are formed in the rectangular opening 815, a plurality of second bolt holes corresponding to the first bolt holes are formed in the ultraviolet disinfection lamp 84, and the ultraviolet disinfection lamp 84 is fixed to the box body 81 through bolts.

The ultraviolet disinfection lamp 84 is an integrated disinfection lamp and is only rectangular, related grinding tools can be manufactured according to actual use through the rectangle, the prior art is adopted, and the internal structure of the ultraviolet disinfection lamp 84 is the prior art;

the top of the ultraviolet disinfection lamp 84 is provided with a handle, which is convenient for the disassembly of the ultraviolet disinfection lamp 84.

A second cavity 802, a third cavity 803 and a fourth cavity 804 are further arranged in the box body 81, a first blower 87 is arranged in the second cavity 802, an air inlet of the first blower 87 extends into the first cavity 801, and an air outlet of the first blower 87 extends into the third cavity 803;

a plurality of spray heads 88 are arranged in the third cavity 803, an agent liquid preparation box 85 is arranged at the top of the third cavity, and the agent liquid preparation box 85 is connected with the spray heads 88;

the fourth cavity 804 is provided with the second blower 86, an air inlet of the second blower 86 extends into the third cavity 803, and an air outlet of the second blower 86 is connected with an air outlet of the box 81.

After the gas enters the air inlet of the box body 81, the gas is filtered by the filter screen and then is disinfected by the ultraviolet disinfection lamp 84, then the disinfected gas is sucked into the third cavity 803 by the first air blower 87, the spray head 88 in the third cavity 803 is opened, the spray contains the preparation, and after the preparation reacts with the gas, the reacted gas is sucked away and discharged out of the box body 81 by the second air blower 86, the gas is completely disinfected in the process, and the discharged gas is purified gas;

the bottom of the third cavity 803 is provided with a drain hole, not shown, through which the spray falling into the third cavity is drained.

Introduction of characteristics of red phosphorus and arsenic to facilitate preparation of the preparation, a solution is made:

physical and chemical properties of arsenic: as elements have three allotropes of grey, yellow and black, and are brittle and hard and metallic. 74.92 atomic weight, 5.73g/cm3 density (14 ℃), 817 ℃ melting point, 615 ℃ boiling point, sublimable and insoluble in water. Arsenic is easily oxidized in humid air to arsenic trioxide (As2O3) and easily sublimes (193 ℃). It can be oxidized after heating in air to produce arsenic trioxide (arsenic oxide) with high toxicity, which is white powder, slightly soluble in water and 0.1g lethal dose.

Arsenic and its compounds are used in pesticides, herbicides, insecticides, and many alloys. In particular, the compound arsenic trioxide is called arsenic trioxide, which is a very toxic substance, and the arsenic trioxide is a very toxic substance

Arsenic and arsenic compounds are listed in the list of toxic and harmful water pollutants. Protection and treatment of arsenic is very important.

2.2.2 physical and chemical characteristics of red phosphorus:

red Phosphorus (phosphor red) is also known as red Phosphorus.

Appearance and properties: the purple red amorphous powder is odorless, has metallic luster, and does not emit light in dark places.

Melting Point (. degree. C.): 590(4357kPa)

Boiling point (. degree. C.): 280

Relative density (water ═ 1): 2.34

Relative vapor density (air ═ 1): 4.77 saturated vapor pressure (kPa): 4357(590 deg.C)

Critical pressure (MPa): 8.1

Logarithmic value of octanol/water partition coefficient: -0.27

Ignition temperature (. degree. C.): 260

Upper explosion limit% (V/V): without data

Lower explosion limit% (V/V): 48-64 mg/m3

Solubility: insoluble in water and carbon disulfide, slightly soluble in absolute ethyl alcohol and soluble in alkali liquor.

2.2.3 Main applications: red phosphorus is used in the semiconductor industry as a diffusion source, in organic synthesis and for the manufacture of matches, and also as an insecticide, rodenticide, firework, smoke cartridge, and the like.

Knowing these characteristics, to the solution harms source of pertinence, in time handle, eliminate hidden danger and play the decisive role. It is the ultimate goal of how to eliminate or decompose these sources of danger into safe and non-dangerous liquid or solid forms.

The specific treatment process is as follows:

during working, when the first pneumatic valve 12 is opened, the third pneumatic valve 13 is closed, the first vacuumizing subsystem works, the first vacuum pump 2 sucks gas in the vacuum furnace 1, the first pneumatic valve 12 is closed after the vacuum value in the vacuum furnace 1 meets the requirement, the first vacuum pump 2 transmits the extracted gas into the centralized exhaust pipeline 3, and the gas in the centralized exhaust pipeline is extracted by the second vacuum pump 7 and transmitted into the water-gas separator 5 for separation treatment.

When the first pneumatic valve 12 is closed, the third pneumatic valve 13 is opened, the second vacuumizing subsystem is opened, the water-ring vacuum pump 6 is filled with the preparation, the gas sucked into the vacuum furnace 1 by the water-ring vacuum pump 6 is reacted in the pump, and the reacted gas is transmitted to the water-gas separator 5 for water-gas separation;

the gas enters the water-gas separator 5 to be subjected to water-gas separation, moisture flows out of a water outlet in the bottom of the water-gas separator 5 to be treated in the sewage treatment tank 4, the gas enters the gas filtering device through a gas outlet of the water-gas separator 5 to be filtered, the gas enters the box body 81 through a gas inlet of the box body 81 and enters the first cavity 801 through the filtering plate 83, the ultraviolet disinfection lamp 84 disinfects the gas, the filtered gas is sucked into the third cavity 803 through the first air blower 87, after the mist spray and the gas react, the dropped water drops are discharged through a bottom water outlet of the third cavity 803, and the gas is sucked away and discharged through the second air blower 86.

The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. A safe processing system for doping in a vacuum furnace is characterized in that: the device comprises a vacuum furnace (1), a first vacuumizing subsystem and a second vacuumizing subsystem which are used for vacuumizing gas in the vacuum furnace (1), and a water-gas separator (5) which is used for treating the pumped gas;

the air inlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with the air outlet end of the vacuum furnace (1) through a first three-way pipe (11), and the air outlet ends of the first vacuumizing subsystem and the second vacuumizing subsystem are connected with a water-gas separator (5) through a second three-way pipe (62);

the first vacuumizing subsystem comprises a first vacuum pump (2);

the second vacuumizing subsystem comprises a water-ring vacuum pump (6).

2. The safe doping treatment system in the vacuum furnace according to claim 1, wherein: the first vacuumizing subsystem further comprises a centralized exhaust pipeline (3) and a second vacuum pump (7), the air inlet end of the first vacuum pump (2) is connected with a first pneumatic valve (12), the air inlet end of the first pneumatic valve (12) is connected with a first three-way pipe (11), the air outlet end of the first pneumatic valve (12) is connected with the air inlet end of the first vacuum pump (2), the air outlet end of the first vacuum pump (2) is connected with the air inlet end of the centralized exhaust pipeline (3), the air outlet end of the exhaust pipeline is connected with the air inlet end of the second vacuum pump (7), and the air outlet end of the second vacuum pump (7) is connected with the air outlet end of the second vacuum pump (7).

3. The safe doping treatment system in the vacuum furnace according to claim 1, wherein: the liquid outlet of the water-gas separator (5) is connected with a sewage treatment tank (4).

4. The safe doping treatment system in the vacuum furnace according to claim 1, wherein: the gas outlet of the water-gas separator (5) is connected with a gas filtering device (8).

5. The safe doping treatment system in the vacuum furnace according to claim 4, wherein: the gas filtering device (8) comprises: the box body (81), a filter plate (83) and an ultraviolet disinfection lamp (84) which are detachably arranged in the box body (81);

a first cavity (801) is arranged in the box body (81), a mounting groove (813) is arranged at the top of the first cavity (801), a slot is arranged in the mounting groove (813), the width of the slot corresponds to the thickness of the filter plate (83), and the filter plate (83) is arranged in the slot;

the top of the first cavity (801) is also provided with a rectangular opening (815), and the ultraviolet disinfection lamp (84) is arranged at the rectangular opening and extends into the first cavity (801).

6. The safe doping treatment system in the vacuum furnace according to claim 5, wherein: the articulated sealed lid (82) of installing of mounting groove (813) one end, the thickness of sealed lid (82) is corresponding with mounting groove (813) degree of depth, and mounting groove (813) other end is equipped with first mounting panel (816), and sealed lid (82) one end is equipped with the second mounting panel corresponding with first mounting panel (816), and first mounting panel (816) and second mounting panel pass through bolt fastening, and sealed lid (82) are sealed filter (83) in first cavity (801).

7. The safe doping treatment system in the vacuum furnace according to claim 5, wherein: a plurality of first bolt holes are formed in the rectangular opening (815), a plurality of second bolt holes corresponding to the first bolt holes are formed in the ultraviolet disinfection lamp (84), and the ultraviolet disinfection lamp (84) is fixed to the box body (81) through bolts.

8. The safe doping treatment system in the vacuum furnace according to claim 6, wherein: a second cavity (802), a third cavity (803) and a fourth cavity (804) are further arranged in the box body (81), a first air blower (87) is installed in the second cavity (802), an air inlet of the first air blower (87) extends into the first cavity (801), and an air outlet of the first air blower (87) extends into the third cavity (803).

9. The safe doping treatment system in the vacuum furnace according to claim 8, wherein: a plurality of spray heads (88) are arranged in the third cavity (803), an agent liquid configuration box (85) is arranged at the top of the third cavity, and the agent liquid configuration box (85) is connected with the spray heads (88).

10. The safe doping treatment system in the vacuum furnace according to claim 9, wherein: a second blower (86) is arranged in the fourth cavity (804), the air inlet of the second blower (86) extends into the third cavity (803), and the air outlet of the second blower (86) is connected with the air outlet of the box body (81).

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