CN214736060U

CN214736060U - Supporting device and coating equipment

Info

Publication number: CN214736060U
Application number: CN202120307924.1U
Authority: CN
Inventors: 周剑; 宋文华; 张永胜; 彭孝龙; 杨肸曦; 解传佳
Original assignee: Suzhou Maxwell Technologies Co Ltd
Current assignee: Suzhou Maxwell Technologies Co Ltd
Priority date: 2021-02-03
Filing date: 2021-02-03
Publication date: 2021-11-16
Anticipated expiration: 2031-02-03

Abstract

The utility model relates to a supporting device and a coating device, wherein the supporting device comprises a frame and a plurality of trays, wherein the frame is formed by erecting a plurality of cross beams and a plurality of vertical beams, two adjacent cross beams and the vertical beams enclose a first groove, the cross beams are provided with at least one inclined plane, and the inclined plane inclines towards the first groove from the highest position of the cross beams in the groove depth direction of the first groove; the tray is embedded in the first groove and provided with a plurality of second grooves for placing the substrate; the crossbeam has the inclined plane structure and makes the strutting arrangement who inlays and be equipped with the tray at sputter coating in-process, and the crossbeam shelters from the area to the base plate that both sides were placed and reduces, has improved effective coating area on the strutting arrangement to improve strutting arrangement utilization ratio and target collection rate, and realized the promotion of productivity.

Description

Supporting device and coating equipment

Technical Field

The utility model relates to a solar cell makes technical field, especially relates to a strutting arrangement and coating equipment.

Background

In the technical field of solar cell manufacturing, a coating apparatus is widely applied to the battery industry of an HIT (intrinsic thin film Heterojunction battery) with the advantages of continuous coating, excellent coating effect, environmental protection, no toxicity and the like, and a carrier plate (carrier) loading substrate is generally adopted in the coating apparatus for coating.

At present, along with whole trade to reducing this and large-output demand, the size of carrier plate is bigger and bigger, and the crossbeam quantity of carrier plate also can increase thereupon, and in order to reduce the deflection of carrier plate, the very high square steel of transverse strength is generally designed into to the crossbeam at present, nevertheless uses the filming equipment of this kind of crossbeam to sheltering from great to the base plate of placing on the carrier plate in the sputtering process crossbeam, and the coating film effect that leads to placing the base plate on the carrier plate is relatively poor, and the product yield is lower. And the shielded part of the substrate placed on the carrier plate cannot be coated with a film or the coated film is very thin, so that the substrate cannot be placed in the area, the utilization rate of the carrier plate and the collection rate of the target are low, and the waste of the carrier plate and the target is caused.

SUMMERY OF THE UTILITY MODEL

Therefore, it is necessary to provide a supporting device and a coating apparatus for supporting a substrate, aiming at the problem of low utilization rate of the carrier.

A support device comprising a frame and a plurality of trays, wherein:

the frame is formed by erecting a plurality of cross beams and a plurality of vertical beams, a first groove is defined by two adjacent cross beams and the vertical beams, each cross beam is provided with at least one inclined surface, and the inclined surfaces incline towards the first groove from the highest position of the cross beam in the groove depth direction of the first groove;

the tray is embedded in the first groove.

The supporting device is applied to coating equipment and used for carrying a substrate to carry out sputtering coating, a frame is erected with a plurality of vertical beams through a plurality of cross beams, a first groove is formed by two adjacent cross beams and the vertical beams in a surrounding mode and used for embedding a tray, at least one inclined plane is arranged on each cross beam, the inclined plane is limited to incline towards the first groove from the highest position of each cross beam in the groove depth direction of the first groove, the supporting device embedded with the tray is enabled to shield target atoms in the sputtering coating process, the shielding of the cross beams to sputtered target atoms is reduced, more target atoms are deposited on the surface of the substrate close to the cross beams to form a thin film, the effective coating area of the substrate on the supporting device is improved, the utilization rate and the target collection rate of the supporting device are improved, the coating quality of the surface of the substrate is improved, and the productivity is improved.

In one embodiment, the cross beam has a symmetrical plane, the symmetrical plane passes through the center of the cross beam and is parallel to the extending direction of the cross beam and the groove depth direction of the first groove, and the inclined planes are respectively arranged on two sides of the symmetrical plane.

In one embodiment, the included angle formed by the inclined plane and the symmetry plane is 30-60 degrees, and two inclined planes on two sides of the symmetry plane are symmetrically arranged around the symmetry plane.

The supporting device can reduce shielding in different sputtering directions by setting the included angle between the inclined plane and the symmetrical plane to be 30-60 degrees, and improves the utilization rate and the coating quality of the supporting device. Through setting up the inclined plane in symmetry both sides symmetry for the sputtering object of placing of symmetry both sides shelters from all to reduce at the sputtering in-process, so that the sputtering object of placing of crossbeam both sides all can obtain great utilization ratio, and the coating film quality is all better.

In one embodiment, the cross beam further comprises two vertical surfaces, the vertical surfaces are symmetrically arranged on two sides of the symmetrical surface and are parallel to the extending direction of the cross beam, one side of each vertical surface is connected with the inclined surface, and the vertical beams are fixed on the vertical surfaces.

In one embodiment, the beam is provided with a positioning groove, the opening of the positioning groove is positioned on the vertical surface, and the tray is provided with a positioning block corresponding to the positioning groove.

In one embodiment, fixing blocks are arranged at two ends of the cross beam, and the cross beam is fixedly connected with the vertical beam at the end through the fixing blocks.

In one embodiment, the beam is made of hexagonal square steel or octagonal square steel.

Above-mentioned strutting arrangement, because hexagonal square steel all has the inclined plane that the symmetry set up with eight square steel and intensity is higher, through setting up the crossbeam into hexagonal square steel or eight square steel, can reduce the area of sheltering from in the sputtering process to can reduce the deformation of crossbeam in extending direction.

In one embodiment, the frame further comprises a baffle plate and baffle plate supporting strips, the baffle plate is laid on the cross beam and is close to two end portions of the cross beam, the baffle plate supporting strips are arranged on the cross beam and are close to two end portions of the cross beam, and the baffle plate is fixed on the baffle plate supporting strips.

In one embodiment, the tray has a plurality of second grooves for placing the substrate.

A coating device comprises a device body, a target material and a workbench, and further comprises a supporting device according to any one of the technical schemes, wherein the workbench is arranged in the device body, the target material is fixed in the device body, and the supporting device is fixed on the workbench.

Above-mentioned coating equipment, be fixed in the workstation through the strutting arrangement who will place the base plate on, it is internal to drive the workstation translation to the equipment, the target that is fixed in the equipment body carries out sputter coating to the base plate surface, because be provided with at least one inclined plane on the crossbeam among the strutting arrangement, and this inclined plane inclines towards first recess from the crossbeam at the trough depth direction's of first recess highest position, make the strutting arrangement who inlays and be equipped with the tray in sputter coating process, the crossbeam shelters from the reduction to the target atom that jets out, more target atoms deposit in the base plate surface formation film that is close to the crossbeam, strutting arrangement utilization ratio and base plate surface coating film quality have been improved, and realize the promotion of productivity. Therefore, the coating equipment with the supporting device has higher product yield and productivity.

Drawings

Fig. 1 is a schematic structural view of the supporting device of the present invention;

fig. 2 is an exploded view of a module composed of a cross beam, a fixing block and a baffle supporting strip in the supporting device of the present invention;

fig. 3 is a schematic cross-sectional view of a cross beam in the supporting device of the present invention;

FIG. 4 is a partial schematic view of a module formed by a frame and a tray in the supporting device of the present invention;

fig. 5 is a schematic view of the sputtering operation of the supporting device of the present invention.

Reference numerals

100. A support device;

110. a frame; 111. a cross beam; 112. erecting a beam; 113. a first groove; 114. a positioning groove; 115. a fixed block; 116. a baffle plate; 117. a baffle plate supporting strip; 1111. a bevel; 1112. a plane of symmetry; 1113. a vertical plane;

120. a tray; 121. a second groove; 122. positioning blocks;

130. a substrate;

210. a target material; 220. a work bench.

Detailed Description

In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, as those skilled in the art will be able to make similar modifications without departing from the spirit and scope of the present invention.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In the present application, unless expressly stated or limited otherwise, the first feature may be directly on or directly under the second feature or indirectly via intermediate members. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.

The technical solution provided by the embodiments of the present invention is described below with reference to the accompanying drawings.

As shown in fig. 1, fig. 2 and fig. 3, the present invention provides a supporting device 100, the supporting device 100 is applied in a coating apparatus for bearing a substrate 130, the supporting device 100 includes a frame 110 and a tray 120, wherein:

the frame 110 is formed by erecting a plurality of cross beams 111 and a plurality of vertical beams 112, two adjacent cross beams 111 and two adjacent vertical beams 112 enclose a first groove 113, and the first groove 113 is used for embedding the tray 120, so that the frame 110 and the tray 120 are installed and fixed. The beam 111 further has at least one inclined surface 1111, and the inclined surface 1111 is inclined from the highest position of the beam 111 in the groove depth direction of the first groove 113 to the first groove 113, so that the shielding area of the beam 111 for the substrate 130 is reduced in the sputtering coating process of the frame 110 embedded with the tray 120. When the concrete setting, crossbeam 111 and perpendicular roof beam 112 can adopt stainless steel, aluminum alloy, pottery, wooden, other synthetic material etc. crossbeam 111 and perpendicular roof beam 112 can adopt modes such as casting, punching press, sheet metal component bending integrated into one piece, also can adopt one or more in the welding, spiro union, joint to fix as an organic whole, certainly crossbeam 111 and perpendicular roof beam 112 the material and the connected mode not be restricted to this, still can be other forms that can satisfy the demands.

The plurality of trays 120 are correspondingly placed in the first groove 113 in a modularized manner, so that the trays can be conveniently disassembled and cleaned, the mounting size deviation of the trays 120 caused by reassembling after disassembly is reduced, the tray 120 is prevented from being stuck in the first groove 113 to cause capacity loss, and in addition, the situation that the film forming quality is influenced by large vibration caused in the sputtering coating process due to large deformation in the extending direction of the cross beam 111 can be avoided. The tray 120 has a plurality of second grooves 121, the second grooves 121 are used for placing the substrates 130, so that one tray 120 can bear a plurality of substrates 130 at a time, the substrates 130 placed in the second grooves 121 can be one or more of silicon plates and glass substrates, and of course, the substrates 130 can also be other sputtering objects needing film coating.

The supporting device 100 is applied to a coating apparatus for carrying a substrate 130 to perform sputtering coating, a frame 110 is formed by erecting a plurality of beams 111 and a plurality of vertical beams 112, and a first groove 113 is defined by two adjacent beams 111 and vertical beams 112 for embedding a tray 120, at least one inclined plane 1111 is arranged on the beam 111, and the inclined plane 1111 is limited to incline towards the first groove 113 from the highest position of the beam 111 in the groove depth direction of the first groove 113, so that in the sputtering coating process of the supporting device 100 embedded with the tray 120, the shielding of the inclined plane 1111 on the beam 111 to target atoms sputtered by the coating apparatus is reduced, more target atoms are deposited on the surface of the substrate 130 to form a thin film, the effective coating area of the substrate 130 on the supporting device 100 is increased, the utilization rate of the supporting device 100 and the collection rate of the target 210 are increased, and the coating quality of the surface of the substrate 130 is improved, and the productivity is improved.

In order to increase the effective coating area on the supporting device 100, in a preferred embodiment, as shown in fig. 1, fig. 2 and fig. 3, the beam 111 has a symmetry plane 1112, the symmetry plane 1112 passes through the center of the beam 111, the symmetry plane 1112 is parallel to the extending direction of the beam 111 and the groove depth direction of the first groove 113, and inclined planes 1111 are respectively disposed on two sides of the symmetry plane 1112.

In the supporting device 100, the inclined planes 1111 are respectively arranged on the two sides of the symmetrical plane 1112, so that the shielding of the two sides of the beam 111 on the substrate 130 is less, the shielding reduction of the beam 111 on the substrate 130 in two different sputtering directions can be met, and the utilization rate and the coating quality of the supporting device 100 are improved.

In order to further increase the effective coating area on the supporting device 100, as shown in fig. 3 and 5, the included angle formed by the inclined plane 1111 and the symmetric plane 1112 may be set to be the same as the sputtering inclination angle of the target 210 relative to the frame 110 in the coating apparatus, so that the shielding area of the beam 111 relative to the substrates 130 on both sides is minimized, and the optimal sputtering effect is obtained. Specifically, the inclined plane 1111 may be inclined from the symmetrical plane 1112 by an angle of 30 ° to 60 °.

In the supporting device 100, the included angle formed by the inclined plane 1111 and the symmetrical plane 1112 is set to be 30-60 degrees, so that shielding can be reduced in different sputtering directions, and the utilization rate and the coating quality of the supporting device 100 are improved; on the other hand, the strength of the beam 111 can be increased, and the deformation of the supporting device 100 in the extending direction of the beam 111 can be reduced, so that the stability of the substrate 130 is improved, and the film forming quality is improved. In a specific arrangement, the included angle between the inclined plane 1111 and the symmetry plane 1112 may be one or more of 30 °, 35 °, 40 °, 45 °, 50 °, 55 °, and 60 °, and of course, the included angle between the inclined plane 1111 and the symmetry plane 1112 is not limited to the above range, and may be other values within the range of 30 ° to 60 °. In addition, when the utilization rate of the supporting apparatus 100 or the requirement for the film formation quality is not high, the angle between the inclined plane 1111 and the symmetric plane 1112 is not limited to the above-described range, and the angle between the inclined plane 1111 and the symmetric plane 1112 may be set according to the sputtering tilt angle between the target 210 and the surface to be sputtered on the substrate 130.

In order to further increase the effective coating area on the supporting device 100, specifically, as shown in fig. 2 and 3, two inclined surfaces 1111 are symmetrically disposed on both sides of the symmetric surface 1112. In the supporting device 100, the two inclined planes 1111 defining the two sides of the symmetry plane 1112 are symmetrically arranged with respect to the symmetry plane 1112, so that on one hand, the shielding of the two sides of the beam 111 on the substrate 130 is less, and the reduction of the shielding of the beam 111 on the substrate 130 in two different sputtering directions can be satisfied, thereby further improving the utilization rate and the coating quality of the supporting device 100; on the other hand, the structure of the cross beam 111 is symmetrical, and the assembly of the frame 110 is convenient. Of course, the number of the inclined surfaces 1111 on both sides of the symmetry plane 1112 is not limited to two, and a plurality of inclined surfaces 1111 may be provided, and a plurality of corresponding inclined surfaces 1111 may be provided symmetrically to the symmetry plane 1112.

In order to realize the installation and fixation of the cross beam 111 and the vertical beam 112, specifically, as shown in fig. 2, 3 and 4, the cross beam 111 further has two vertical surfaces 1113, the vertical surfaces 1113 are symmetrically arranged on two sides of the symmetrical surface 1112, and the vertical surfaces 1113 are parallel to the extending direction of the cross beam 111, one side of the vertical surface 1113 is connected with the inclined surface 1111, if a plurality of inclined surfaces 1111 are provided, two sides of the vertical surface 1113 are respectively connected with the inclined surface 1111, and the vertical beam 112 is fixed on the vertical surface 1113. The supporting device 100 is provided with the vertical surface 1113 on the cross beam 111 and defines the arrangement mode of the vertical surface 1113, so that the vertical surface 1113 can be used as a mounting reference surface of the vertical beam 112 and the cross beam 111 for the fixed mounting of the vertical beam 112.

To facilitate installation, more specifically, as shown in fig. 1, 2, 3 and 4, a positioning groove 114 is further formed on the cross beam 111, the opening of the positioning groove 114 is located in the vertical surface 1113, and the positioning groove 114 extends to a certain distance toward the inside of the cross beam 111. The tray 120 is provided with a positioning block 122 corresponding to the positioning groove 114.

Above-mentioned strutting arrangement 100, can be relatively convenient and fast ground be fixed in tray 120 and sputter coating on crossbeam 111 through the cooperation that adopts positioning groove 114 and locating piece 122, compare in traditional spiro union fixed tray 120 and frame 110, only need dismantle locating piece 122 can take off single tray 120 module and wash, because tray 120 and frame 110's fit clearance is less, need not to use other appurtenance such as spanner to dismantle, it is convenient to dismantle, and does not influence frame 110 body size after dismantling.

The cross beam 111 and the vertical beam 112 are erected in a variety of ways, and in a preferred embodiment, as shown in fig. 1 and 2, the cross beam 111 has two opposite ends in the extending direction, fixing blocks 115 are arranged at the two ends of the cross beam 111, and the cross beam 111 and the vertical beam 112 at the ends of the cross beam 111 are connected through the fixing blocks 115. In addition, the cross beam 111 and the vertical beams 112 arranged at intervals in the middle can also be connected through fixing blocks 115, wherein the fixing blocks 115 are arranged on the cross beam 111 and are positioned at the intersection positions of the cross beam 111 and the vertical beams 112 arranged at intervals in the middle.

In the supporting device 100, the cross beam 111 and the vertical beam 112 are connected into a whole through the fixing block 115, so that the dismounting is convenient. Of course, the erection mode of the cross beam 111 and the vertical beam 112 is not limited to the connection mode provided by the above preferred embodiment, but may also be a bolt, a welding, a clamping or other connection modes that can connect the cross beam 111 and the vertical beam 112 into a whole, and the present invention is not limited thereto.

The specific structural form of the cross beam 111 has a plurality of forms, and in a preferred embodiment, as shown in fig. 1, fig. 2 and fig. 3, the cross beam 111 is made of hexagonal square steel or octagonal square steel, each of the hexagonal square steel and the octagonal square steel has a plurality of inclined surfaces 1111 and two vertical surfaces 1113, the inclined surfaces 1111 incline towards the first groove 113 from the highest position of the cross beam 111 in the groove depth direction of the first groove 113, and the two vertical surfaces 1113 are symmetrically arranged on two sides of the symmetrical surface 1112. When specifically setting up, a plurality of crossbeams 111 can be hexagonal square steel, and a plurality of crossbeams 111 can also be eight angle square steel, can also partly be hexagonal square steel in a plurality of crossbeams 111, and another part is eight angle square steel.

Above-mentioned strutting arrangement 100, crossbeam 111 adopt hexagonal square steel or octagonal square steel, and at sputter coating in-process, because crossbeam 111 is better at crossbeam 111 extending direction intensity, the base plate 130 stability of placing on strutting arrangement 100 is good, and the film forming quality is high to the 1111 structures in inclined plane very big reduction sputter shelters from the area, improve strutting arrangement 100 utilization ratio.

In the preferred embodiment described above, the cross beams 111 are all made of square steel, but in the case where the number of pallets 120 is small or the strength of the cross beams 111 is not required to be high, the cross beams 111 may be made of square tubes, so that the overall weight of the support device 100 can be reduced to meet the requirement for a lightweight design, and the material and cost can be saved. In addition, the specific structure of the cross beam 111 is not limited to the hexagonal square steel and/or the octagonal square steel provided by the above preferred embodiment, and may also be other square steels with the inclined plane 1111 structure, and only the shielding area of the cross beam 111 to the substrate 130 needs to be reduced, which is not limited by the present invention.

In addition, as shown in fig. 1 and 2, in a preferred embodiment, the frame 110 further includes a baffle 116 and a baffle supporting bar 117, the baffle 116 is laid on the cross beam 111, the baffle 116 is close to both ends of the cross beam 111, the baffle supporting bar 117 is disposed on the cross beam 111, the baffle supporting bar 117 is close to both ends of the cross beam 111, and the baffle 116 is fixed to the baffle supporting bar 117. The baffle supporting strip 117 is also provided with a threaded hole, the cross beam 111 is provided with a matching hole corresponding to the threaded hole, and the baffle supporting strip 117 is fixed on the cross beam 111 through a screw. The baffle 116 is laid at the position close to the two sides of the end part of the cross beam 111 in a clamping mode, the length of the baffle 116 in one direction is slightly larger than the distance between two adjacent cross beams 111, so that the baffle 116 after clamping is not easy to fall off, and the stable connection between the baffle 116 and the cross beams 111 is ensured.

In addition, as shown in fig. 1 and 5, the present invention further provides a coating apparatus, which includes an apparatus body (not shown), a target 210, a worktable 220, and a supporting device 100 according to any one of the above technical solutions, wherein the worktable 220 is movable to be disposed in the apparatus body, the target 210 is fixed in the apparatus body, target atoms sputtered from the target 210 are at a certain angle with respect to the worktable 220, and the supporting device 100 is fixed on the worktable 220.

In the coating equipment, the supporting device 100 with the substrate 130 is fixed on the workbench 220, the workbench 220 is driven to translate into the equipment body, the target 210 fixed in the equipment body performs sputtering coating on the surface of the substrate 130, since the cross member 111 of the supporting device 100 is provided with at least one inclined surface 1111, and the inclined surface 1111 is inclined toward the first groove 113 from the highest position of the cross beam 111 in the groove depth direction of the first groove 113, so that the inclined plane 1111 on the beam 111 shields less target atoms sputtered by the coating equipment in the sputtering coating process of the supporting device 100 embedded with the tray 120, more target atoms are deposited on the surface of the substrate 130 to form a film, the effective coating area of the substrate 130 on the supporting device 100 is increased, thereby improving the utilization rate of the supporting device 100 and the surface coating quality of the substrate 130 and realizing the improvement of the productivity. Therefore, the coating apparatus having the supporting device 100 has high coating quality and high productivity.

Certainly, in the dynamic coating process, that is, the workbench 220 fixed with the bearing device 100 moves relative to the target 210, when the included angle formed by the inclined plane 1111 and the symmetric plane 1112 is set to be the same as the sputtering inclined angle of the target 210 relative to the workbench 220, there is a position where the utilization rate of the bearing device 100 is the highest and the collection rate of the target 210 is the highest, so as to obtain the optimal coating effect, and the other positions have a slightly decreased coating effect due to the gradually increased sputtering shielding, but compared with the conventional coating equipment, the utilization rate of the bearing device 100 and the collection rate of the target are both increased, and the coating effect is also better.

The supporting device 100 is used for a carrier substrate 130 of a coating apparatus, as shown in fig. 1 and 5, a sputtering method of the supporting device includes:

step 1: placing the substrate 130 in the second groove 121;

before the substrate 130 is placed, the tray 120 is cleaned to prevent impurities on the tray 120 from reacting with target atoms to affect the film forming effect.

Step 2: the tray 120 on which the substrate 130 is placed is embedded in the first groove 113;

and step 3: driving the worktable 220 fixed with the frame 110 to translate into a vacuum chamber to sputter and coat a film through the target 210;

in the sputtering process, a process gas is also provided, wherein the process gas is Ar or Ar/H₂One or more of the mixed oxygen and the oxygen are chemically reacted with the sputtered target atoms to deposit on the surface of the substrate 130, thereby forming a compound film of the target material.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims

1. The utility model provides a strutting arrangement which characterized in that, includes frame and a plurality of tray, wherein:

the tray is embedded in the first groove.

2. The supporting device as claimed in claim 1, wherein the cross beam has a symmetrical plane passing through a center of the cross beam and being parallel to both an extending direction of the cross beam and a groove depth direction of the first groove, and the inclined planes are respectively provided on both sides of the symmetrical plane.

3. The support device of claim 2, wherein the inclined plane and the symmetry plane form an included angle of 30-60 °, and two inclined planes on both sides of the symmetry plane are symmetrically arranged about the symmetry plane.

4. The supporting device as claimed in claim 2, wherein the cross beam further has two vertical surfaces, the vertical surfaces are symmetrically arranged on two sides of the symmetrical surface and parallel to the extending direction of the cross beam, one side of the vertical surface is connected with the inclined surface, and the vertical beam is fixed on the vertical surface.

5. The supporting device as claimed in claim 4, wherein the cross beam is provided with a positioning groove, the opening of the positioning groove is located on the vertical surface, and the tray is provided with a positioning block corresponding to the positioning groove.

6. The supporting device as claimed in claim 1, wherein fixing blocks are provided at both ends of the cross beam, and the cross beam is fixedly connected with the vertical beams at the ends thereof through the fixing blocks.

7. The support device of claim 1, wherein the cross beam is hexagonal or octagonal square steel.

8. The supporting device as claimed in claim 1, wherein the frame further comprises a baffle plate and baffle plate supporting strips, the baffle plate is laid on the cross beam and close to two ends of the cross beam, the baffle plate supporting strips are arranged on the cross beam and close to two ends of the cross beam, and the baffle plate is fixed on the baffle plate supporting strips.

9. The support device of claim 1, wherein the tray has a plurality of second recesses for receiving substrates.

10. A coating apparatus comprising an apparatus body, a target material, a table, and the supporting device according to any one of claims 1 to 9, wherein the table is disposed in the apparatus body, the target material is fixed in the apparatus body, and the supporting device is fixed on the table.