CN214694351U

CN214694351U - All-solid-state electrochromic film manufacturing equipment based on curved substrate

Info

Publication number: CN214694351U
Application number: CN202120366044.1U
Authority: CN
Inventors: 赵勇
Original assignee: Suzhou Guangmin Intelligent Technology Co ltd
Current assignee: Suzhou Guangmin Intelligent Technology Co ltd
Priority date: 2021-02-08
Filing date: 2021-02-08
Publication date: 2021-11-12
Anticipated expiration: 2031-02-08

Abstract

The utility model discloses a full solid electrochromic film manufacturing device based on a curved surface substrate, which comprises a plurality of pairs of magnetic rods capable of rotating along the axis of the magnetic rods and a target material sleeved outside the magnetic rods; the target can rotate relative to the magnetic rod; when the magnetic bar rotates, a magnetic field with continuously and periodically changed positions can be formed between the target and the curved substrate.

Description

All-solid-state electrochromic film manufacturing equipment based on curved substrate

Technical Field

The utility model relates to an electrochromic technical field, concretely relates to all solid-state electrochromic film preparation equipment based on curved surface base plate.

Background

Electrochromic films have begun to gain more and more attention and applications in the fields of architecture, traffic and even consumer electronics because of their unique light-dimming and heat-insulating properties. Among various electrochromic technologies, inorganic all-solid-state electrochromic thin film technology is gaining much favor due to its excellent cycle life and environmental weatherability.

The structure of a common all-solid-state electrochromic film is shown in fig. 5, and is a sandwich structure composed of 5 functional film layers, which sequentially include a first transparent conductive electrode 51, a reverse electrochromic layer 52, an ion conductive layer 53, an electrochromic layer 54, and a second transparent conductive electrode 55. When a voltage is applied between the two transparent conductive electrodes, the all-solid electrochromic film starts to color or fades.

The electrochromic coating of the current curved surface glass has no mass production technical scheme, firstly, the coating space required by the curved surface glass is large, the current traditional coating line cannot solve the problem, and secondly, the distance change of each part of the curved surface glass relative to the traditional electrode is large, so that uniform coating is difficult to realize.

SUMMERY OF THE UTILITY MODEL

In order to solve the technical problem, the utility model provides an all solid-state electrochromic film preparation equipment based on curved surface base plate.

In order to solve the technical problem, the utility model adopts the following technical scheme:

an all-solid-state electrochromic film manufacturing device based on a curved substrate comprises a plurality of pairs of magnetic rods capable of rotating along the axis of the magnetic rods and a target material sleeved outside the magnetic rods; the target can rotate relative to the magnetic rod; when the magnetic bar rotates, a magnetic field with continuously and periodically changed positions can be formed between the target and the curved substrate.

Further, the magnetic rods comprise a pair of first magnetic rods, and the target comprises a first transparent conductive electrode target sleeved outside the first magnetic rods.

Further, the magnetic rods comprise a pair of second magnetic rods, and the target comprises a reverse electrochromic layer target sleeved outside the second magnetic rods.

Further, the magnetic rods comprise a pair of third magnetic rods, and the target comprises an ion conducting layer target sleeved outside the third magnetic rods.

Further, the magnetic rods comprise a pair of fourth magnetic rods, and the target comprises an electrochromic layer target sleeved outside the fourth magnetic rods.

Further, the magnetic rods comprise a pair of fifth magnetic rods, and the target comprises a second transparent conductive electrode target sleeved outside the fifth magnetic rods.

Compared with the prior art, the utility model has the advantages that:

the utility model discloses when using the magnetron sputtering method to carry out the coating film, through rotatable bar magnet, form continuous variation's magnetic field between target and curved surface base plate for form the diversified plasma cloud of continuous type between target and the curved surface base plate, can realize the coating film on curved surface glass and the 3D glass.

Drawings

FIG. 1 is a schematic structural view of the curved substrate of the present invention during coating;

FIG. 2 is a flow chart of a prior art planar substrate coating process;

FIG. 3 is a schematic structural diagram of a planar substrate during coating in the prior art;

FIG. 4 is a schematic structural view of the curved substrate of the present invention after coating;

fig. 5 is a schematic structural diagram of an electrochromic film.

Detailed Description

A preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

The inorganic all-solid-state electrochromic film which is commercially available at present is mainly obtained by magnetron sputtering coating. Because the current magnetron sputtering coating process needs a process temperature of about 300-400 ℃, the available coating substrates are limited, and the currently available coating substrates are mainly high-transparency float glass substrates with various thicknesses.

The all-solid-state electrochromic film based on the flat float glass substrate is mature in the aspect of energy-saving building curtain walls at present and is applied, but all glass substrates are flat substrates 1 and are obtained by an online continuous coating technology. As shown in fig. 2, the on-line continuous coating mainly comprises several continuous coating chambers, wherein each coating chamber is responsible for sputtering a corresponding specific material nano-film layer according to the required electrochromic film structure of the coating.

The volume of the magnetron sputtering cavity is fixed during film coating, and the distance between the glass substrate and the material target in the magnetron sputtering cavity is fixed, so that the continuous film coating line generally needs a planar substrate and uniformly runs in the cavity at a certain speed, namely the direction shown by an arrow in fig. 2, and thus uniform film coating of a corresponding film layer is obtained.

According to the coating principle of a large-size online continuous magnetron sputtering system and the basic requirements of all-solid-state electrochromic coating devices, magnetron sputtering in each coating cavity comprises one pair or at most one pair of fixed magnetic rods. The inorganic all-solid-state electrochromic coating line needs at least 5 independent coating cavities, and each cavity is internally provided with a fixed magnetic rod, a target material and process reaction gas which correspond to different phases.

FIG. 3 is a simplified diagram showing the structure of the online continuous magnetron sputtering coating line sputtering component. Generally, the core sputtering component mainly comprises a pair of fixed magnetic rods 21, a target 3 material on the periphery of the magnetic rods, and a corresponding driving power supply. The principle of magnetron sputtering is that high voltage is utilized to generate a high electric field, so that working gas in a coating film is ionized to form plasma; the generated argon ions are collected around the magnetic field of the coating film and the target under the action of the strong magnetic field to form a plasma cloud 4. The charged ions in the plasma cloud are driven by a strong electric field to accelerate and bombard the cathode and the target material, so that the target material is bombarded and sputtered on the planar substrate.

In the on-line coating process, as the planar substrate moves at a constant speed all the time, the target nano material or the nano particles after the target and the reaction gas react can be uniformly deposited on the planar substrate. During the whole coating process, the position and the direction of the magnetic rods are fixed, namely the distribution of the magnetic field is fixed, so that the position and the distribution of the plasma cloud bound by the magnetic rods are also fixed and concentrated in the middle area of the pair of rotating targets, namely only a limited area between the two magnetic rods can be coated during the actual coating process, as shown in fig. 3. Only the target material rotates uniformly in the whole coating process, so that the coating is uniform, and the utilization rate of the target is increased.

Although the online continuous magnetron sputtering coating line is commonly used in the production of large-sized electrochromic products based on planar substrates, the coating line has two significant problems: firstly, in the coating production process, because the planar substrate needs to move in the cavity all the time, the vacuum coating cavity is relatively long correspondingly, and different coating reaction cavities need to be isolated by longer buffer cavities, so that the coating line is relatively long, the occupied area is large, and the investment cost is relatively high; in addition, because the cavity space of the traditional online continuous coating line is limited, in order to ensure the coating uniformity, the substrate frame and the glass substrate are required to be flat, so that coating on some uneven or curved surfaces cannot be performed, such as 2.5D or 3D mobile phone glass back plates, curved automobile front windshield glass, curved automobile skylights and the like.

The utility model discloses utilize the rotatable formula negative pole of magnetic field that has already been commercialized as the basis, obtain a new equipment, as shown in figure 1. Compared with the traditional cathode, the sleeve which loads target material outside can rotate freely, and the internal magnetic field can swing back and forth uniformly according to the setting. Because the plasma cloud is mainly bound by the magnetic field, the magnetic field which rotates regularly can form continuous multi-azimuth plasma cloud. Compared with a fixed magnetic field scheme, the magnetic rod coating method can only coat a film on the middle part of the planar substrate positioned in the magnetic rod, and a rotating magnetic field scheme can realize the film coating in a wider area and a wider direction. With the regular swing of the magnetic field, the coating of the all-solid-state electrochromic film on the curved-surface substrate can be realized.

In this embodiment, the magnetic rod and the associated equipment for generating the continuously variable magnetic field are the swing cathode of SCI corporation.

The all-solid-state electrochromic coating film at least comprises 5 functional film layers, so that the coating of the curved-surface substrate still needs 5 coating cavities, and the next coating link is carried out after the coating of one film layer is finished until the whole coating process is finished. Due to the particularity of the coating of the curved-surface substrate, the curved-surface substrate is fixed during coating, and after one coating is finished, the curved-surface substrate is conveyed to the next coating cavity by the mechanical device to finish the corresponding coating of the film layer, as shown in fig. 4.

It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein, and any reference signs in the claims are not intended to be construed as limiting the claim concerned.

Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.

Claims

1. The utility model provides an all solid-state electrochromic film preparation equipment based on curved surface base plate which characterized in that: comprises a plurality of pairs of magnetic rods (22) which can rotate along the axis of the magnetic rods and a target material (3) sleeved outside the magnetic rods; the target can rotate relative to the magnetic rod; when the magnetic bar rotates, a magnetic field with continuously and periodically changing positions can be formed between the target and the curved substrate (5).

2. The device for manufacturing the all-solid-state electrochromic film based on the curved substrate as claimed in claim 1, wherein: the magnetic rods comprise a pair of first magnetic rods, and the target comprises a first transparent conductive electrode target (31) sleeved outside the first magnetic rods.

3. The device for manufacturing the all-solid-state electrochromic film based on the curved substrate as claimed in claim 1, wherein: the magnetic rods comprise a pair of second magnetic rods, and the target comprises a reverse electrochromic layer target (32) sleeved outside the second magnetic rods.

4. The device for manufacturing the all-solid-state electrochromic film based on the curved substrate as claimed in claim 1, wherein: the magnetic rods comprise a pair of third magnetic rods, and the target comprises an ion conducting layer target (33) sleeved outside the third magnetic rods.

5. The device for manufacturing the all-solid-state electrochromic film based on the curved substrate as claimed in claim 1, wherein: the magnetic rods comprise a pair of fourth magnetic rods, and the target comprises an electrochromic layer target (34) sleeved outside the fourth magnetic rods.

6. The device for manufacturing the all-solid-state electrochromic film based on the curved substrate as claimed in claim 1, wherein: the magnetic rods comprise a pair of fifth magnetic rods, and the target comprises a second transparent conductive electrode target (35) sleeved outside the fifth magnetic rods.