CN214669967U - Color film substrate and display panel - Google Patents

Abstract

The application discloses a color film substrate and a display panel, wherein the color film substrate comprises a substrate and a black matrix layer, the substrate comprises a display area and a non-display area, and the non-display area is arranged around the display area; the black matrix layer is arranged on the substrate and comprises a first black matrix layer formed in the non-display area and a second black matrix layer formed in the display area; the thickness of the first black matrix layer is between 0.7 and 0.9 um. Through multiple experiments, the application finds that when the thickness of the black matrix layer in the non-display area is between 0.7 and 0.9um, the resistance of the black matrix layer is larger, so that the charge entering the display area is reduced, and the electrostatic risk is effectively reduced; and the black matrix layer with the thickness can also effectively shield light, thereby avoiding the problem of light leakage.

Description

Color film substrate and display panel

Technical Field

The application relates to the technical field of display, in particular to a color film substrate and a display panel.

Background

With the development of display technology, people have pursued higher display quality of display devices, wherein narrow-frame or even frameless display screens have become one of the bright spots for display screen design. In the manufacturing process of the display device, the array substrate is usually independently manufactured in advance, and then the array substrate and the color film substrate are aligned to form a liquid crystal cell. The black matrix layer in the display area on the color film substrate corresponds to the positions of the data lines, the scanning lines, the thin film transistors and other components on the array substrate so as to shield the data lines, the scanning lines, the thin film transistors and other components; the black matrix layer in the non-display area on the color film substrate corresponds to the peripheral metal signal lines to shield the peripheral metal signal lines and prevent light leakage.

In order to avoid the bad display caused by abnormal liquid crystal deflection caused by static electricity introduced into the liquid crystal box through the black matrix layer due to the exposure of the black matrix layer in the non-display area to the environment. Usually, a groove is formed around the black matrix to cut off the edge and the inside of the black matrix, thereby cutting off the static electricity introduction path and preventing static electricity from entering the liquid crystal cell. However, the groove design of the black matrix is easy to cause light leakage, which affects the display effect.

SUMMERY OF THE UTILITY MODEL

The application aims to provide a light leakage preventing and static electricity preventing color film substrate and a display panel.

The application discloses a color film substrate which comprises a substrate and a black matrix layer, wherein the substrate comprises a display area and a non-display area, and the non-display area is arranged around the display area; the black matrix layer is arranged on the substrate and comprises a first black matrix layer formed in the non-display area and a second black matrix layer formed in the display area; the thickness of the first black matrix layer is between 0.7 and 0.9 um.

Optionally, the color filter substrate includes a light-shielding layer, and the light-shielding layer is disposed on a side of the first black matrix layer away from the substrate.

Optionally, the light shielding layer is made of a blue color resist material.

Optionally, the light shielding layer is made of a light reflecting material.

Optionally, the reflective material includes a nano titanium dioxide material.

Optionally, the first black matrix layer is overlapped with a non-display region of the substrate, and the light shielding layer is overlapped with the first black matrix layer.

Optionally, the thickness of the second black matrix layer is 1-1.2um, and the sum of the heights of the light shielding layer and the first black matrix layer is equal to the height of the second black matrix layer.

Optionally, the color filter substrate includes a groove, and the groove is disposed between the first black matrix layer and the second black matrix layer to separate the first black matrix layer from the second black matrix layer.

Optionally, a hollow pattern is disposed in the first black matrix layer, and the light shielding layer is disposed on the first black matrix layer and covers the hollow pattern.

The application also discloses a display panel, which comprises the color film substrate and an array substrate arranged opposite to the color film substrate.

Compared with the scheme that the grooves are formed in the black matrix, the black matrix is separated, and therefore static electricity is improved; experiments show that when the thickness of the black matrix layer in the non-display area is between 0.7 and 0.9um, light leakage can be effectively prevented, the resistance of the black matrix layer can be increased, and the static problem generated by the black matrix layer in the non-display area is solved.

Drawings

The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:

fig. 1 is a schematic diagram of a display panel according to an embodiment of the present application;

fig. 2 is a schematic view of a color filter substrate according to an embodiment of the present disclosure;

FIG. 3 is a schematic diagram of resistance and OD variation with thickness of a first black matrix layer according to an embodiment of the present application;

fig. 4 is a schematic view of a color filter substrate provided with a light-shielding layer according to an embodiment of the present disclosure;

fig. 5 is a schematic view of a color filter substrate with a groove according to an embodiment of the present disclosure.

100, a display panel; 200. a color film substrate; 210. a substrate; 211. a display area; 212. a non-display area; 220. a black matrix layer; 221. a first black matrix layer; 222. a second black matrix layer; 230. a light-shielding layer; 240. a groove; 300. an array substrate.

Detailed Description

It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.

In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. The terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that one or more other features, integers, steps, operations, elements, components, and/or combinations thereof may be present or added.

Further, terms of orientation or positional relationship indicated by "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, are described based on the orientation or relative positional relationship shown in the drawings, are simply for convenience of description of the present application, and do not indicate that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application.

Furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly and may include, for example, fixed connections, removable connections, and integral connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, or through both elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

The present application will now be described in detail with reference to the drawings and alternative embodiments, it being understood that any combination of the various embodiments or technical features described below may form new embodiments without conflict.

Fig. 1 is a schematic diagram of a display panel 100. As an embodiment of the present application, a display panel 100 is disclosed, where the display panel 100 includes a color film substrate 200 and an array substrate 300 that are oppositely disposed. As shown in fig. 2, the display panel 100 includes a substrate 210 and a black matrix layer 220, the substrate 210 includes a display region 211 and a non-display region 212, and the non-display region 212 is disposed around the display region 211; the black matrix layer 220 is disposed on the substrate 210, and includes a first black matrix layer 221 formed in the non-display region 212, and a second black matrix layer 222 formed in the display region 211; the thickness of the first black matrix layer 221 is between 0.7-0.9 um.

With the improvement of the appearance requirement of display screen products, ebl (entry border) technology is mostly adopted to produce products in the market, that is, the products are designed without a frame, but the light leakage problem at the edge is brought at the same time. The existing design is to increase the size of the color film substrate glass, so that the black matrix layer is flush with the edge of the color film substrate. The design utilizes the black matrix layer to realize the light blocking effect of the edge, so as to achieve better user experience. However, the design can expose the black matrix layer too much (close to the edge of the glass), so that the black matrix on the color film substrate corresponds to the peripheral metal signal lines on the array substrate, and when the display panel works, the black matrix can generate induced voltage to generate Static electricity to influence liquid crystal deflection, so that the risk of Electro-Static discharge (ESD) is greatly increased, and the performance of the product is reduced. At present, static electricity is prevented from being transferred into a display area by mostly disconnecting a black matrix in a non-display area; however, this may cause a risk of light leakage, which may affect the display effect of the product.

Compared with the scheme that the groove 240 is formed on the black matrix, the black matrix is cut off to improve static electricity; through a plurality of experiments, it is found that when the thickness of the black matrix in the non-display region 212 is between 0.7um and 0.9um, the resistance thereof is relatively large, thereby reducing the charge entering the display region 211 and effectively reducing the risk of electrostatic discharge (ESD).

As shown in fig. 3, which is a schematic view showing a variation of resistance and OD according to the thickness of the first black matrix layer, it can be seen that as the thickness of the first black matrix layer 221 increases, the resistance thereof gradually decreases and the OD gradually increases; as can be seen from the OD curve in the figure, when the OD value is greater than 4, the first black matrix layer 221 has a good light-shielding effect, and the thickness of the first black matrix layer 221 is 0.7um at this time, so that the thickness of the first black matrix layer 221 is not less than 0.7um in order to ensure that the color filter substrate 200 does not leak light; as can be seen from the resistance curve in the figure, when the thickness of the first black matrix layer 221 exceeds 0.9um, the resistance thereof reaches a degree close to saturation, and when the thickness of the first black matrix layer 221 is less than 0.9um, the resistance thereof changes faster, and decreasing the thickness of the first black matrix layer 221 can effectively increase the resistance of the first black matrix layer 221, so the thickness of the first black matrix layer 221 in the present application does not exceed 0.9um, so that the resistance thereof is greater, and charge transfer can be effectively blocked, thereby reducing the risk of static electricity. In summary, when the thickness of the first black matrix layer 221 in the present application is between 0.7um and 0.9um, the light shielding effect of the first black matrix layer 221 can be ensured, and a better anti-static effect can be achieved.

In addition, as shown in fig. 4, the color filter substrate 200 includes a light-shielding layer 230, and the light-shielding layer 230 is disposed on a side of the first black matrix layer 221 away from the substrate 210. Although the first black matrix layer 221 itself can improve the electrostatic risk due to its thin thickness, it can cause the light leakage problem caused by the reduced thickness, so the light shielding layer 230 is disposed on the first black matrix layer 221 to enhance the light shielding effect of the first black matrix layer 221, thereby preventing the light leakage.

Specifically, the light shielding layer 230 may be made of a blue color resistance material, and the blue color resistance itself has a large resistance, and has a poor effect of conducting charges, so that the ESD risk is not increased; the transmittance of the blue color resistor is the worst in red, green and blue colors, and human eyes are insensitive to blue, so that the light leakage risk can be effectively reduced; since the color filter substrate 200 also has a blue color resist process, the light-shielding layer 230 and the blue color resist layer of the display region 211 can be formed in the same process, so that the process of the light-shielding layer 230 is not increased.

The light shielding layer 230 can also be made of a light reflecting material, so that the backlight can be reflected back while the anti-static and better light shielding effects are achieved, and the light utilization rate is improved; and because the first black matrix layer 221 is also arranged on the lower layer of the reflective material, external light cannot directly irradiate the reflective material, so that human eyes are dazzled by the light. The specific reflecting material can be a substance with ultrahigh reflectivity, such as nano titanium dioxide, and has a good reflecting effect.

In addition, in the application, only the first black matrix is thinned, and the thickness of the second black matrix is not changed, so that the second black matrix does not have the problem of light leakage. Specifically, the thickness of the second black matrix layer 222 is 1-1.2um, and the sum of the heights of the light shielding layer 230 and the first black matrix layer 221 is equal to the height of the second black matrix layer 222. For the shading effect of the black matrix, the larger the OD value (shading density), the better, generally the requirement is more than 3.0, the OD value is 5 to meet the requirement of most, and the thickness of the corresponding second black matrix layer 222 is 1-1.2um to meet the shading requirement. The light-shielding layer 230 is formed on the first black matrix layer 221, and the top of the light-shielding layer 230 is flush with the top of the second light-shielding layer 230, which is beneficial to the surface flatness and planarization of the subsequent film layer.

In another embodiment, the first black matrix layer 221 may have a hollow pattern therein, and the hollow pattern may be an annular pattern disposed around the display region 211, or may have other shapes; the hollow pattern may penetrate through the entire first black matrix layer 221, or may not penetrate through the first black matrix layer 221. By arranging the hollow patterns in the first black matrix layer 221, a part of the first black matrix layer 221 is further thinned or isolated, and the transmission effect of charges in the first black matrix layer 221 is weakened.

Further, the light shielding layer 230 is also arranged on the first black matrix layer 221, the light shielding layer 230 is filled and covers the hollow patterns, light leakage at the hollow patterns is prevented, the flatness of the film layer is improved, the light shielding layer 230 can be made of a light reflecting material, and the filling can serve as a marking function in the hollow patterns.

As shown in fig. 5, as another embodiment of the present application, a schematic view of another color filter substrate 200 is further disclosed, where the color filter substrate 200 includes a substrate 210 and a black matrix layer 220, the substrate 210 includes a display area 211 and a non-display area 212, and the non-display area 212 is disposed around the display area 211; the black matrix layer 220 is disposed on the substrate 210, and includes a first black matrix layer 221 formed in the non-display region 212, and a second black matrix layer 222 formed in the display region 211; the thickness of the first black matrix layer 221 is between 0.7 and 0.9um, and the thickness of the second black matrix layer is between 1 and 1.2 um; an annular groove 240 is formed in the color film substrate 200, and the first black matrix and the second black matrix are separated by the annular groove 240. In the present application, on the basis of making the black matrix layer 220 of the non-display region 212 thin, the annular groove 240 is further provided to separate the black matrix layer 220 in the display region 211 and the non-display region 212, even if a small amount of charges are generated on the first black matrix layer 221, the charges are difficult to be transferred to the display region 211, thereby greatly reducing the risk of electrostatic discharge (ESD). Specifically, the annular groove 240 is disposed at the inner side of the peripheral metal signal line, and is spaced from the display region by 0.01-0.2 mm, so as to prevent the high-voltage metal signal line from generating induced charges and conducting the induced charges to the display region 211 along the black matrix layer 220.

In this embodiment, a light-shielding layer may also be disposed on the first black matrix layer 221, and the light-shielding layer overlaps with the first black matrix layer 221 to further shield light, and the light-shielding layer may be made of the above-mentioned blue color-blocking or light-reflecting material.

As another embodiment of the present application, another color film substrate 200 is further disclosed, and includes a substrate 210, a black matrix layer 220, and a light shielding layer 230, where the substrate 210 includes a display area 211 and a non-display area 212, and the non-display area 212 is disposed around the display area 211; the black matrix layer 220 is disposed on the substrate 210, and includes a first black matrix layer 221 formed in the non-display region 212, and a second black matrix layer 222 formed in the display region 211, wherein the first black matrix layer 221 has a thickness of 0.7um, and the second black matrix layer 222 has a thickness of 1.2 um; the light-shielding layer 230 is made of a light-reflecting material, and the sum of the heights of the light-shielding layer 230 and the first black matrix layer 221 is equal to the height of the second black matrix layer 222.

According to the method, while the black matrix on the color film substrate is patterned through a photomask manufacturing process, the black matrix layer in the non-display area is thinned to enable the thickness of the black matrix layer to be 0.7um, the black matrix layer with the thickness can meet the shading requirement, and the resistance is large, so that charges entering the display area are reduced, and the risk of Static-Static discharge (ESD) is effectively reduced; in addition, the thickness of the second black matrix layer 222 is 1.2um, which is beneficial to forming enough section difference with the first black matrix layer 221, so that the light shielding layer 203 formed on the first black matrix layer 221 can keep level with the second black matrix layer 222, the OD value corresponding to the thickness of the second black matrix layer 222 is not less than 5, the light shielding effect is strongest, and the display area does not leak light.

The technical solution of the present application can be widely applied to various display panels, such as TN (Twisted Nematic) display panel, IPS (In-Plane Switching) display panel, VA (Vertical Alignment) display panel, MVA (Multi-Domain Vertical Alignment) display panel, and of course, other types of display panels may be used, and the above solution can be applied.

The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the specific implementations of the present application are not to be considered limited to these descriptions. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.

Claims (10)

1. A color film substrate is characterized by comprising:

a substrate including a display area and a non-display area, the non-display area being disposed around the display area; and

a black matrix layer disposed on the substrate, including a first black matrix layer formed in the non-display region and a second black matrix layer formed in the display region;

the thickness of the first black matrix layer is between 0.7 and 0.9 um.

2. The color filter substrate of claim 1, wherein the color filter substrate comprises an opaque layer, and the opaque layer is disposed on a side of the first black matrix layer away from the substrate.

3. The color filter substrate according to claim 2, wherein the light-shielding layer is made of a blue color resist material.

4. The color filter substrate of claim 3, wherein the light-shielding layer is made of a light-reflecting material.

5. The color filter substrate of claim 4, wherein the reflective material comprises a nano titanium dioxide material.

6. The color filter substrate of claim 2, wherein the first black matrix layer is overlapped with the non-display area of the substrate, and the light-shielding layer is overlapped with the first black matrix layer.

7. The color filter substrate according to any one of claims 2 to 6, wherein the thickness of the second black matrix layer is 1 to 1.2um, and the sum of the heights of the light-shielding layer and the first black matrix layer is equal to the height of the second black matrix layer.

8. The color filter substrate of claim 1, wherein the color filter substrate comprises a groove, and the groove is arranged between the first black matrix layer and the second black matrix layer to separate the first black matrix layer from the second black matrix layer.

9. The color filter substrate of claim 2, wherein a hollow pattern is disposed in the first black matrix layer, and the light shielding layer is disposed on the first black matrix layer and covers the hollow pattern.

10. A display panel comprising the color filter substrate according to any one of claims 1 to 9, and an array substrate disposed opposite to the color filter substrate.

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