CN113219701A

CN113219701A - Color film substrate, manufacturing method thereof and display panel

Info

Publication number: CN113219701A
Application number: CN202110429460.6A
Authority: CN
Inventors: 赵聪聪; 聂军; 唐榕; 张建英; 郑浩旋
Original assignee: HKC Co Ltd
Current assignee: HKC Co Ltd
Priority date: 2021-04-21
Filing date: 2021-04-21
Publication date: 2021-08-06

Abstract

The application discloses a color film substrate, a manufacturing method thereof and a display panel, wherein the color film substrate comprises a substrate, a black matrix layer and a groove, the substrate comprises a display area and a non-display area, and the non-display area is arranged around the display area; the black matrix layer at least comprises a first black matrix layer arranged in the non-display area of the substrate, the groove is arranged in the first black matrix layer and surrounds the display area, and the groove is a blind groove; the thickness of the first black matrix layer at the position corresponding to the groove bottom of the groove is between 0.7 and 0.9 um. According to the application, the blind groove is formed in the black matrix layer of the non-display area, and when the thickness of the black matrix layer below the blind groove is controlled to be 0.7-0.9um, experiments show that the light leakage can be effectively prevented, the resistance of the black matrix layer can be increased, and the static problem caused by the black matrix layer in the non-display area is solved.

Description

Color film substrate, manufacturing method thereof and display panel

Technical Field

The application relates to the technical field of display, in particular to a color film substrate, a manufacturing method thereof and a display panel.

Background

With the development of display technology, people have pursued higher display quality of display devices, wherein narrow-frame or even frameless display screens have become one of the bright spots for display screen design. In the manufacturing process of the display device, the array substrate is usually independently manufactured in advance, and then the array substrate and the color film substrate are aligned to form a liquid crystal cell. The black matrix layer in the display area on the color film substrate corresponds to the positions of the data lines, the scanning lines, the thin film transistors and other components on the array substrate so as to shield the data lines, the scanning lines, the thin film transistors and other components; the black matrix layer in the non-display area on the color film substrate corresponds to the peripheral metal signal lines to shield the peripheral metal signal lines and prevent light leakage.

In order to avoid the bad display caused by abnormal liquid crystal deflection caused by static electricity introduced into the liquid crystal box through the black matrix layer due to the exposure of the black matrix layer in the non-display area to the environment. Usually, a groove is formed around the black matrix to cut off the edge and the inside of the black matrix, thereby cutting off the static electricity introduction path and preventing static electricity from entering the liquid crystal cell. However, the groove design of the black matrix is easy to cause light leakage, which affects the display effect.

Disclosure of Invention

The application aims to provide a light leakage and static electricity preventing color film substrate, a manufacturing method thereof and a display panel.

The application discloses a color film substrate which comprises a substrate, a black matrix layer and a groove, wherein the substrate comprises a display area and a non-display area, and the non-display area is arranged around the display area; the black matrix layer at least comprises a first black matrix layer arranged in the non-display area of the substrate, the groove is arranged in the first black matrix layer and surrounds the display area, and the groove is a blind groove; wherein, the thickness of the first black matrix layer at the position of the groove bottom corresponding to the groove is between 0.7 and 0.9 um.

Optionally, the groove is filled with a blue color resist.

Optionally, the thickness of the blue color resistor is greater than the depth of the groove, and the groove is disposed in the frame glue coating region.

Optionally, the depth of the groove is between 0.2 um and 0.5um, and the thickness of the blue color resistance is between 1.7 um and 1.9 um.

Optionally, the width of the groove is not less than 20 um.

Optionally, the number of the grooves is multiple.

Optionally, the at least one groove is between 0.05-0.5mm from the edge of the substrate.

Optionally, the at least one groove is at a distance of between 0.01 and 0.2mm from the display area.

The application discloses a manufacturing method of the color film substrate, which comprises the following steps:

forming a first black matrix layer on the substrate in the non-display region; and

forming a groove which surrounds a display area and does not penetrate through the first black matrix layer on the first black matrix layer by using a photomask;

wherein, the thickness of the first black matrix layer at the position of the groove bottom corresponding to the groove is between 0.7 and 0.9 um.

The application also discloses a display panel, which comprises the color film substrate and an array substrate arranged in a box-to-box manner with the color film substrate.

Compared with a scheme that the black matrix is cut off by forming the through groove on the black matrix so as to improve static electricity; according to the application, the blind groove is formed in the black matrix layer of the non-display area, and when the thickness of the black matrix layer below the blind groove is controlled to be 0.7-0.9um, experiments show that the light leakage can be effectively prevented, the resistance of the black matrix layer can be increased, and the static problem caused by the black matrix layer in the non-display area is solved.

Drawings

The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:

fig. 1 is a schematic diagram of a display panel according to an embodiment of the present application;

fig. 2 is a schematic view of a color filter substrate according to an embodiment of the present disclosure;

FIG. 3 is a graph showing a variation of resistance and OD values according to a thickness of a first black matrix layer;

fig. 4 is a schematic plan view of a color filter substrate provided with a plurality of grooves according to an embodiment of the present disclosure;

fig. 5 is a schematic cross-sectional view of a color filter substrate provided with a plurality of grooves according to an embodiment of the present disclosure;

fig. 6 is a flowchart of a method for manufacturing a color filter substrate according to another embodiment of the present disclosure.

100, a display panel; 200. a color film substrate; 210. a substrate; 211. a display area; 212. a non-display area; 220. a black matrix layer; 221. a first black matrix layer; 222. a second black matrix layer; 230. a color resist layer; 240. a groove; 250. blue color resistance; 300. an array substrate; 400. and (5) frame glue.

Detailed Description

It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.

In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. The terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that one or more other features, integers, steps, operations, elements, components, and/or combinations thereof may be present or added.

Further, terms of orientation or positional relationship indicated by "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, are described based on the orientation or relative positional relationship shown in the drawings, are simply for convenience of description of the present application, and do not indicate that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application.

Furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly and may include, for example, fixed connections, removable connections, and integral connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, or through both elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

The present application will now be described in detail with reference to the drawings and alternative embodiments, it being understood that any combination of the various embodiments or technical features described below may form new embodiments without conflict.

Fig. 1 is a schematic diagram of a display panel 100. As an embodiment of the present application, a display panel 100 is disclosed, where the display panel 100 includes a color film substrate 200 and an array substrate 300 that are arranged in a box-to-box manner, the array substrate 300 and the color film substrate 200 are fixed by a sealant 400, and the sealant 400 seals a liquid crystal between the array substrate 300 and the color film substrate 200. The non-display area of the color film substrate 200 includes a black matrix layer 220 and a blue color resistor 250, an annular groove 240 is formed in the black matrix layer 220, the groove 240 is a blind groove, that is, the groove 240 does not penetrate through the black matrix layer 220, a part of the blue color resistor 250 is disposed in the groove 240, and the other part of the blue color resistor 250 is immersed in the sealant 400. In the embodiment, the annular groove 240 is formed in the black matrix layer 220 in the non-display area of the color film substrate 200, so that the thickness of part of the black matrix layer 220 is reduced, the resistance of the black matrix layer 220 is increased, and the effect of blocking charge transfer is achieved; moreover, the groove 240 is a blind groove, so that even if the groove 240 is formed on the black matrix layer 220, light leakage at the groove 240 is not caused; in addition, the blue color resists 250 are filled in the grooves 240 to achieve the effects of further shading and preventing static electricity; finally, the groove 240 is located corresponding to the position of the sealant 400, and the height of the blue color resistor 250 is greater than that of the groove 240, so that a part of the blue color resistor 250 will sink into the sealant 400, the contact area between the color film substrate 200 and the sealant 400 is increased, and the adhesion effect between the sealant 400 and the color film substrate 200 is improved.

As shown in fig. 2, the color filter substrate 200 is a schematic diagram, where the color filter substrate 200 includes a substrate 210, a black matrix layer 220, a color resistance layer 230, and a groove 240, the substrate 210 includes a display area 211 and a non-display area 212, and the non-display area 212 is disposed around the display area 211; the black matrix layer 220 at least comprises a first black matrix layer 221 arranged in the non-display area 212 of the substrate 210 and a second black matrix layer arranged in the display area 211, and the color resistance layer 230 and the second black matrix layer 222 are arranged at intervals; the groove 240 is disposed in the first black matrix layer 221, surrounding the display region 211, and the groove 240 is a blind groove; wherein, the thickness of the first black matrix layer 221 at the groove bottom position corresponding to the groove 240 is between 0.7-0.9 um. Of course, the color filter substrate 200 further includes a planarization layer, a common electrode layer, and the like, which are not listed here.

With the improvement of the appearance requirement of display screen products, ebl (entry border) technology is mostly adopted to produce products in the market, that is, the products are designed without a frame, but the light leakage problem at the edge is brought at the same time. The existing design is to increase the size of the color film substrate glass, so that the black matrix layer is flush with the edge of the color film substrate. The design utilizes the black matrix layer to realize the light blocking effect of the edge, so as to achieve better user experience. However, the design can expose the black matrix layer too much (close to the edge of the glass), so that the black matrix on the color film substrate corresponds to the peripheral metal signal lines on the array substrate, and when the display panel works, the black matrix can generate induced voltage to generate Static electricity to influence liquid crystal deflection, so that the risk of Electro-Static discharge (ESD) is greatly increased, and the performance of the product is reduced. At present, static electricity is prevented from being transferred into a display area by mostly disconnecting a black matrix in a non-display area; however, this may cause a risk of light leakage, which may affect the display effect of the product.

Compared with the scheme that an annular through groove is formed in the black matrix in the non-display area of the color film substrate to partition the black matrix so as to improve static electricity; in the present application, the annular groove 240 is also disposed on the black matrix layer 220 in the non-display region 212, but the groove 240 does not penetrate through the black matrix layer 220, that is, the groove 240 is a blind groove, and thus the black matrix layer 220 is not separated, but the groove 240 can make the corresponding black matrix layer become thin, so as to increase resistance, hinder charge transfer, and reduce electrostatic risk. Moreover, after the groove 240 is a blind groove, a black matrix is present at the groove 240, which can block light and prevent light leakage at the groove 240.

As shown in fig. 3, which is a schematic view showing a variation of resistance and OD (absorbance) value according to the thickness of the first black matrix layer 221, it can be seen that, when the thickness of the first black matrix layer 221 is increased, the corresponding resistance is gradually decreased, and the OD value is gradually increased, the better the light-shielding effect is; as can be seen from the OD curve in the figure, when the OD value is greater than 4, the first black matrix layer 221 has a good light-shielding effect, and the thickness of the first black matrix layer 221 is 0.7um at this time, so that the thickness of the first black matrix layer 221 is not less than 0.7um in order to ensure that the color filter substrate 200 does not leak light; as can be seen from the resistance curve in the figure, when the thickness of the first black matrix layer 221 exceeds 0.9um, the resistance thereof reaches a degree close to saturation, and when the thickness of the first black matrix layer 221 is less than 0.9um, the resistance thereof changes faster, and decreasing the thickness of the first black matrix layer 221 can effectively increase the resistance of the first black matrix layer 221, so the thickness of the first black matrix layer 221 in the present application does not exceed 0.9um, so that the resistance thereof is greater, and charge transfer can be effectively blocked, thereby reducing the risk of static electricity. In summary, when the thickness of the first black matrix layer 221 in the present application is between 0.7um and 0.9um, the light-shielding effect of the first black matrix layer 221 can be ensured, and the better anti-static effect can be achieved, so that the thickness of the bottom of the groove 240 corresponding to the thickness of the black matrix layer 220 is between 0.7um and 0.9 um.

In addition, the groove 240 is filled with a color resistance material, specifically a blue color resistance material, and the blue color resistance 250 has a larger resistance, so that an anti-static effect can be achieved; in addition, the blue color resistor 250 only transmits blue light, thereby achieving the effect of shielding light, and therefore, the blue color resistor 250 can further enhance the effect of shielding light at the groove 240 by matching with the groove 240 in the shape of a blind groove. The thickness of the blue color resistor 250 is greater than the depth of the groove 240, and the groove 240 is disposed in the sealant coating region, so that the blue color resistor 250 protrudes out of the black matrix layer 220, and when the sealant 400 is laid, the blue color resistor 250 partially sinks into the sealant 400, thereby increasing the contact area between the color film substrate 200 and the sealant 400 and increasing the adhesion effect of the two. Specifically, the thickness of the black matrix layer 220 is 1.1-1.3um, and the corresponding OD value is greater than 4, so that most of the shading effects are satisfied; the depth of the groove 240 is between 0.2 um and 0.5um, the thickness of the blue color resistor 250 is between 1.7 um and 1.9um, and the thickness of the blue color resistor 250 is the same as that of the color resistor layer 230 in the display area 211, so that the blue color resistor 250 in the groove 240 and the color resistor layer 230 in the display area 211 can be formed in the same process, and the process steps are reduced; the thickness of the blue color resist 250 protruding from the groove 240 exceeds 1um, and for the thickness of a general film, 1um is a larger value, so that even if other films are deposited on the blue color resist 250, the blue color resist 250 is protruded, which is convenient for increasing the adhesion between the sealant 400 and the color film substrate 200.

The blue color resists 250 can be uniformly filled in the whole annular groove 240, so that the tops of the blue color resists 250 enclosing the annular shape are flush, the blue color resists 250 protrude out of the black matrix layer 220, and an annular closed pattern is formed; when the frame glue is coated, the annular blue color resistor 250 can sink into the frame glue 400, so that the contact area between the frame glue 400 and the blue color resistor 250 is larger, the adhesion effect is favorably improved, and the sealing effect of the frame glue 400 is improved; when the alignment liquid is coated, the annular blue color resistor 250 can also play a role of a retaining wall, so that the alignment liquid is prevented from overflowing, and the display effect of the display panel is favorably improved. In addition, the blue color resistors 250 can also be arranged in the groove 240 at intervals, so that discontinuous blue color resistors 250 are formed in the annular groove 240, when the frame sealant 400 is coated, the blue color resistors 250 can sink into the frame sealant 400, and a part of the frame sealant 400 can sink into a gap between adjacent blue color resistors 250, so that the contact area between the frame sealant 400 and the color film substrate 200 can be increased, and the adhesion effect is also increased; in addition, the groove forms a groove, and the technical effect of preventing the alignment liquid from overflowing can be achieved when the alignment liquid is coated.

Of course, the blue color resistor 250 can be replaced by other black insulating materials, such as a spacer layer (PS) material, a reflective layer material, an ink material, or other light shielding materials, and the black insulating material is also filled in the groove and has a height greater than that of the groove 240; compared with the blue color resistor 250, the black insulating material has better insulating effect and shading effect, and can further improve the shading effect and the ESD (electro-static discharge) prevention effect of the display panel. The black insulating material can also be arranged in the frame glue coating area and corresponds to the frame glue, so that the black insulating material can also sink into the frame glue when the frame glue is coated, the contact area is increased, and the adhesion effect of the frame glue is improved.

In the present application, there may be only one groove 240, and the width of the groove 240 may be equal to the width of the first black matrix layer 221, that is, the whole first color resistance layer 230 is made thin, so that the resistance of the whole first black matrix layer 221 can be greatly improved; the groove 240 can also be formed in the sealant coating region, between the sealant coating region and the display region 211, or between the sealant coating region and the edge of the substrate 210, at this time, the width of the groove 240 can be not less than 20um, and at this time, the processing precision of the groove 240 is high, which is beneficial to improving the precision. When the groove 240 is located between the frame glue coating region and the edge of the substrate, the groove 240 can prevent external static electricity from being conducted to the display region; when the groove 240 is located between the sealant coating region and the display region, static electricity generated in the black matrix layer overlapping with the peripheral metal signal lines in the array substrate can be prevented from being transferred into the display region.

Of course, a plurality of annular grooves 240 may be provided in the first black matrix layer 221, as shown in fig. 4 and 5, which are a plan view and a cross-sectional view of the color filter substrate 200 provided with a plurality of grooves 240, respectively. The number of the grooves 240 may be multiple, and all the grooves may be blind grooves, or a part of the grooves may be blind grooves, and a part of the grooves may be through grooves, which is not limited specifically; wherein, the distance between the at least one groove 240 and the edge of the substrate 210 is between 0.05 mm and 0.5mm, which can prevent the conduction of external static electricity to the display region 211; or the distance between at least one groove 240 and the display region 211 is 0.01-0.2mm, so as to prevent the high-voltage metal signal line from generating induced charges and conducting to the display region 211 along BM; certainly, the distance between one groove 240 and the edge of the substrate 210 can be controlled to be between 0.05 and 0.5mm, and the distance between one groove 240 and the display area 211 can be controlled to be between 0.01 and 0.2mm, so that the double anti-static effect is achieved; in addition, one of the grooves 240 can be arranged in the coating area of the frame glue 400, so that the adhesion force to the frame glue 400 is increased while the anti-static effect is achieved; or all the grooves 240 are disposed between the coating region of the sealant 400 and the display region 211, so as to correspond to the metal traces on the array substrate 300, thereby reducing the generation of charges. Or an annular blind groove is arranged in the first black matrix layer between the frame glue coating area and the edge of the substrate by combining the design of the blind groove and the through groove, and the distance between the annular blind groove and the edge of the substrate is 0.05-0.5 mm; then designing an annular blind groove in a first black matrix layer corresponding to the frame glue coating area, and then designing an annular through groove in the first black matrix layer between the frame glue coating area and the display area; the protective effect on the ESD risk is further enhanced while the multiple effects are achieved, and static electricity is prevented from being transmitted into the display area.

As shown in fig. 6, a flowchart of a method for manufacturing a color filter substrate is provided, and as another embodiment of the present application, a method for manufacturing the color filter substrate is also disclosed, which includes the steps of:

s1: forming a first black matrix layer on the substrate in the non-display region;

s2: forming a groove which surrounds a display area and does not penetrate through the first black matrix layer on the first black matrix layer by using a photomask;

The grooves can be manufactured on the black matrix by adopting a general photomask developing technology, the larger the transmittance of a photomask (mask) is, the larger the etching depth is, so that the depth of the grooves can be controlled by controlling the corresponding light transmittance at the grooves, and the black matrix with the thickness of 0.7-0.9um is obtained. The color film substrate manufactured by the method has the technical effects of light leakage prevention and static electricity prevention.

In the step of S1, a second black matrix layer may be simultaneously formed in the display region of the substrate, and in the step of S2, a groove in the first black matrix layer and a second black matrix layer pattern are simultaneously formed; after the step of S2, the method further comprises the steps of:

s3: forming a blue color resistor in the groove, and simultaneously forming a color group layer at the hollow position of the second black matrix layer pattern;

s4: and forming a flat layer and a common electrode layer on the first black matrix layer, the second black matrix layer and the color resistance layer.

It should be noted that, the limitations of each step in the present disclosure are not considered to limit the order of the steps without affecting the implementation of the specific embodiments, and the steps written in the foregoing may be executed first, or executed later, or even executed simultaneously, and as long as the present disclosure can be implemented, all the steps should be considered as belonging to the protection scope of the present application.

The technical solution of the present application can be widely applied to various display panels, such as TN (Twisted Nematic) display panel, IPS (In-Plane Switching) display panel, VA (Vertical Alignment) display panel, MVA (Multi-Domain Vertical Alignment) display panel, and of course, other types of display panels may be used, and the above solution can be applied.

The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the specific implementations of the present application are not to be considered limited to these descriptions. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.

Claims

1. A color film substrate is characterized by comprising:

a substrate including a display area and a non-display area, the non-display area being disposed around the display area;

a black matrix layer including at least a first black matrix layer disposed in the substrate non-display region; and

the groove is arranged in the first black matrix layer and surrounds the display area, and the groove is a blind groove;

2. The color filter substrate of claim 1, wherein a blue color resist is filled in the groove.

3. The color filter substrate of claim 2, wherein the thickness of the blue color resist is greater than the depth of the groove, and the groove is disposed in the sealant coating region.

4. The color filter substrate of claim 3, wherein the depth of the groove is between 0.2 and 0.5um, and the thickness of the blue color resistance is between 1.7 and 1.9 um.

5. The color filter substrate of claim 1, wherein the width of the groove is not less than 20 um.

6. The color filter substrate of claim 1, wherein the number of the grooves is plural.

7. The color filter substrate of claim 6, wherein the distance between at least one groove and the edge of the substrate is between 0.05 mm and 0.5 mm.

8. The color filter substrate of claim 6, wherein a distance between at least one of the grooves and the edge of the display area is between 0.01 mm and 0.2 mm.

9. A method for manufacturing a color filter substrate according to any one of claims 1 to 8, comprising:

10. A display panel comprising the color filter substrate according to any one of claims 1 to 8, and an array substrate disposed in a box-to-box relationship with the color filter substrate.