CN213887259U - Ceramic dish wiper mechanism - Google Patents

Ceramic dish wiper mechanism Download PDF

Info

Publication number
CN213887259U
CN213887259U CN202022792237.1U CN202022792237U CN213887259U CN 213887259 U CN213887259 U CN 213887259U CN 202022792237 U CN202022792237 U CN 202022792237U CN 213887259 U CN213887259 U CN 213887259U
Authority
CN
China
Prior art keywords
brush
ceramic
vertical edge
cylindrical fixed
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202022792237.1U
Other languages
Chinese (zh)
Inventor
王鑫
郑东
肖迪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qingdao Istarwafer Technology Co ltd
Original Assignee
Qingdao Istarwafer Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qingdao Istarwafer Technology Co ltd filed Critical Qingdao Istarwafer Technology Co ltd
Priority to CN202022792237.1U priority Critical patent/CN213887259U/en
Application granted granted Critical
Publication of CN213887259U publication Critical patent/CN213887259U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The utility model relates to the technical field of electronic product processing, and discloses a ceramic disc cleaning mechanism, it includes the clean bench, install in the clean bench center support and can drive the rotatory cylindrical fixed station of ceramic dish, install in the manipulator of clean bench one side, clean brush subassembly, the manipulator includes stand and swing arm, install the absorption piece on the cylindrical fixed station, be equipped with driving motor and water spray pipeline in the stand, clean brush subassembly includes upper brush, lower floor's brush and vertical edge brush, upper brush is connected with the swing arm, upper brush includes a plurality of circular brush heads, circular brush head middle part is equipped with the water jet, the water spray pipeline is connected with the water jet, vertical edge brush is located ceramic dish circumference edge on the clean bench, be equipped with lower floor's brush on the clean bench between vertical edge brush and the cylindrical fixed station, be equipped with the bolster between swing arm and the upper brush. The utility model discloses simple structure, the cleanliness is high.

Description

Ceramic dish wiper mechanism
Technical Field
The utility model relates to a pottery dish wiper mechanism belongs to electron product processing technology field.
Background
For sapphire wafers, the flatness of the wafer surface is an extremely important quality parameter, and the flatness of the chip directly affects the flatness of the processed wafer, so that the cleanliness of the surface of the ceramic disc for cheating is particularly important, and the surface of the ceramic disc needs to be cleaned in order to improve the cleanliness of the surface of the ceramic disc.
Traditional sapphire ceramic dish cleaning machine washs ceramic dish, and what be aimed at is that ceramic dish surface carries out cleaning, can not carry out effectual clearance at ceramic dish's edge to lead to in the course of working, the phenomenon that drops can appear in the dirty and granule in edge, influences the machining precision of sapphire wafer.
SUMMERY OF THE UTILITY MODEL
To the above-mentioned defect that prior art exists, the utility model provides a pottery dish wiper mechanism.
The utility model relates to a ceramic disk cleaning mechanism, which comprises a cleaning table, a cylindrical fixed table which is arranged at the center of the cleaning table and is supported and can drive the ceramic disk to rotate, a mechanical arm which is arranged at one side of the cleaning table and comprises a stand column and a swing arm, an adsorption piece is arranged on the cylindrical fixed table, a driving motor I and a water spraying pipeline are arranged in the stand column, the cleaning brush component comprises an upper layer brush, a lower layer brush and a vertical edge brush, the upper layer brush is arranged on the swing arm and is connected with the driving motor I, the upper layer brush comprises a plurality of circular brush heads, a water spraying opening is arranged in the middle of each circular brush head, the water spraying pipeline passes through the swing arm and is connected with the water spraying opening of each circular brush head, the vertical edge brush is arranged at the circumferential edge of the ceramic disk on the cleaning table, a lower layer, still be equipped with driving motor II on the clean bench, cylindrical fixed station, lower floor's brush and vertical edge brush all are connected with driving motor II, are equipped with the bolster between swing arm and the upper brush. The ceramic plate is sucked by the sucking disc, and is not easy to drop and break in the rotating process. But the manipulator precision control upper brush whereabouts rises, makes things convenient for ceramic dish clamp to get of device to get to put of ceramic dish, and every circular brush head middle part is equipped with the ceramic dish that sprays that the water jet can be better, is favorable to the brush to scrub, and ceramic dish bottom surface can be scrubbed to lower floor's brush, and the bolster that is equipped with between manipulator swing arm and the upper brush can cushion the power that the upper brush fell on the ceramic dish, prevents to smash ceramic dish.
Preferably, the circular brush heads are in contact connection. The circular brush heads are in contact connection, so that the cleaning area can be enlarged, and the cleaning efficiency is accelerated.
Preferably, the suction member is a vacuum chuck. The ceramic disc is not damaged by the sucking disc.
Preferably, the buffer member is a stainless steel spring. The price is cheap, and the product is not easy to damage after long-term use.
Preferably, the cylindrical fixed table is rotatably connected with the cleaning table. The cylindrical fixing table is small in size, saves space and can well support the ceramic disc.
Preferably, the vertical edge brush rotates in a direction opposite to that of the cylindrical fixed table. The rotating direction of the vertical edge brush is opposite to that of the cylindrical fixed table, so that the friction force between the vertical edge brush and the ceramic disc can be increased, and the cleaning efficiency is higher.
Preferably, the plurality of circular brush heads synchronously rotate in the same direction. Simple structure and easy production.
The utility model discloses following beneficial effect has:
(1) the structure is simple, and the production is easy;
(2) the ceramic disc for sapphire is effectively cleaned, so that the cleanliness of the surface of the ceramic disc is improved, and the precision of sapphire wafer mounting is guaranteed;
(3) the cleaning cost is reduced.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
Fig. 2 is a schematic view of the brush surface of the upper layer brush.
In the figure: 1. a cleaning table; 2. a fixed table; 3. an upper layer brush; 4. a lower layer brush; 5. a vertical edge brush; 6. a column; 7. swinging arms; 8. driving a motor II; 9. a buffer member; 10. an adsorbing member.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Example 1:
as shown in figures 1 to 2, the ceramic disc cleaning mechanism of the utility model comprises a cleaning table 1, a cylindrical fixed table 2 is arranged at the center of the cleaning table 1, the cylindrical fixed table 2 is rotationally connected with the cleaning table 1, an adsorption piece 10 is arranged above the cylindrical fixed table 2, the ceramic disc can be firmly adsorbed by the adsorption piece 10 when the ceramic disc is placed on the cylindrical fixed table 2, the ceramic disc is prevented from being turned and broken during the rotation process, a manipulator is arranged at one side of the cleaning table 1 and can move flexibly, the ceramic disc clamping device is convenient to take and place the ceramic disc, the manipulator comprises an upright post 6 and a swing arm 7, the upright post 6 is arranged on the cleaning table 1, a driving motor I and a spraying pipeline are arranged inside the upright post 6, an upper layer brush 3 is arranged on the manipulator swing arm 7 and is connected with the driving motor I, a buffer piece 9 is also arranged between the swing arm 7 and the upper layer brush 3, the buffer piece 9 can buffer when the upper layer brush 3 falls on the surface of the ceramic disc, the ceramic disc is prevented from being broken due to excessive falling force.
Upper brush 3 is circular structure, including the disc and install a plurality of on the disc the same and to the circular brush head that ceramic dish upper surface distance is the same, through gear connection between every circular brush head, every circular brush head middle part all is equipped with the water jet, the water spray pipeline passes manipulator swing arm 7 and is connected with the water jet of circular brush head, the ceramic dish that sprays that a plurality of water jets can be even, make things convenient for circular brush head to scrub, the contact connection between the circular brush head has enlarged the washing area, has improved the cleaning efficiency.
The cleaning table 1 is also provided with vertical edge brushes 5 at the circumferential edge of the ceramic disc, the vertical edge brushes 5 are of a cylindrical structure and can scrub the edge of the ceramic disc, a lower layer brush 4 is arranged between the vertical edge brushes 5 and the cylindrical fixed table 2, the lower layer brush 4 is of a circular structure and is as high as the fixed table 2, the diameter length of the lower layer brush 4 is slightly smaller than the distance between the cylindrical fixed table 2 and the vertical edge brushes 5, the lower layer brush 4 is used for scrubbing the lower surface of the ceramic disc, brush leakage cannot occur, the cleaning effect is good, the lower layer brush 4 is not in contact with the cylindrical fixed table 2 and the vertical edge brushes 5, friction in the rotating process can be reduced, and abrasion of devices is reduced; still be equipped with driving motor II 8 on the clean bench 1, cylindrical fixed station 2, lower floor's brush 4, vertical edge brush 5 all with driving motor II 8 electric connection.
The suction member 10 is a vacuum chuck. The vacuum rubber sucker can be selected for use and is easy to use, and the ceramic plate can not be damaged by the sucker adsorbing the ceramic plate.
The buffer 9 is a stainless steel spring. The price is cheap, and the product is not easy to damage after long-term use.
The vertical edge brush 5 rotates in the direction opposite to the direction of rotation of the cylindrical fixed stand 2. The rotating direction of the vertical edge brush 5 is opposite to that of the cylindrical fixed table 2, so that the friction force between the vertical edge brush 5 and the ceramic disc can be increased, and the cleaning efficiency is higher.
The plurality of brushes synchronously rotate in the same direction. Simple structure and easy production.
The utility model discloses a use as follows: ceramic dish wiper mechanism, place ceramic dish on cylindrical fixed station 2 through pressing from both sides the device of getting, adsorb 10 and inhale tight fixed the beginning rotation to ceramic dish, the manual control upper brush 3 of machinery falls into ceramic dish upper surface, driving motor drive upper brush 3, lower floor's brush 4, vertical edge brush 5 begins to rotate, every circular brush head water jet of upper brush 3 sprays water, the synchronous syntropy of circular brush head rotates, vertical edge brush 5 rotates with ceramic dish synchronous reverse, carry out ceramic dish's whole washing.
The utility model has the advantages that: ceramic dish wiper mechanism, contain a plurality of circular brush heads, every circular brush head through the upper brush and all be equipped with the delivery port and set up the mode of vertical edge brush, can effectually carry out the degree of depth cleanness to ceramic dish to can not cause the damage to ceramic dish.
The utility model discloses can extensively apply to the electronic product processing occasion.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (7)

1. A ceramic disk cleaning mechanism comprises a cleaning table (1), a cylindrical fixed table (2) which is arranged at the center of the cleaning table (1) and is supported and can drive a ceramic disk to rotate, a mechanical arm which is arranged at one side of the cleaning table (1) and comprises an upright post (6) and a swing arm (7), and the ceramic disk cleaning mechanism is characterized in that an adsorption part (10) is arranged on the cylindrical fixed table (2), a driving motor I and a water spraying pipeline are arranged in the upright post (6), the cleaning brush component comprises an upper layer brush (3), a lower layer brush (4) and a vertical edge brush (5), the upper layer brush (3) is arranged on the swing arm (7) and is connected with the driving motor I, the upper layer brush (3) comprises a plurality of circular brush heads, the middle parts of the circular brush heads are provided with water spraying ports, the water spraying pipeline penetrates through the swing arm (7) to be connected with the water spraying ports of the circular brush heads, the vertical edge brush (5) is positioned at the circumferential edge of the ceramic disk on the cleaning table (1), be equipped with lower floor brush (4) between vertical edge brush (5) and cylindrical fixed station (2), lower floor brush (4) are installed on clean bench, still are equipped with driving motor II (8) on the clean bench, and cylindrical fixed station (2), lower floor brush (4) and vertical edge brush (5) all are connected with driving motor II (8), are equipped with bolster (9) between swing arm (7) and upper brush (3).
2. The ceramic disk cleaning mechanism of claim 1 wherein said plurality of circular brush heads are in contact connection.
3. Ceramic disc cleaning mechanism according to claim 1, characterized in that the suction element (10) is a vacuum rubber suction cup.
4. Ceramic disc cleaning mechanism according to claim 1, characterized in that the buffer (9) is a stainless steel spring.
5. Ceramic disc washing mechanism according to claim 1, characterized in that the cylindrical fixed table (2) is rotatably connected with the washing table (1).
6. Ceramic disc cleaning mechanism according to claim 5, characterized in that the vertical edge brush (5) rotates in the opposite direction to the cylindrical stationary table (2).
7. The ceramic disk cleaning mechanism of claim 1 wherein said plurality of circular brush heads rotate in a synchronous, co-rotating direction.
CN202022792237.1U 2020-11-27 2020-11-27 Ceramic dish wiper mechanism Active CN213887259U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202022792237.1U CN213887259U (en) 2020-11-27 2020-11-27 Ceramic dish wiper mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202022792237.1U CN213887259U (en) 2020-11-27 2020-11-27 Ceramic dish wiper mechanism

Publications (1)

Publication Number Publication Date
CN213887259U true CN213887259U (en) 2021-08-06

Family

ID=77123207

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202022792237.1U Active CN213887259U (en) 2020-11-27 2020-11-27 Ceramic dish wiper mechanism

Country Status (1)

Country Link
CN (1) CN213887259U (en)

Similar Documents

Publication Publication Date Title
TWI680834B (en) Wafer edge grinding device and method
US6202658B1 (en) Method and apparatus for cleaning the edge of a thin disc
US9646859B2 (en) Disk-brush cleaner module with fluid jet
TW202142363A (en) Edge polishing apparatus and cleansing method for a vacuum polishing pad
CN114378031A (en) Single wafer type wafer cleaning device
CN201091563Y (en) Automatic brushing bowl machine
CN213887259U (en) Ceramic dish wiper mechanism
CN213401116U (en) Wafer cleaning device capable of adjusting position of spray head
CN218340464U (en) All-round washing and sorting machine of chip
CN217719518U (en) Vertical belt cleaning device of wafer
CN115547894A (en) A wash polishing all-in-one for wafer production and processing
CN215394548U (en) Cleaning machine is ground to dysmorphism
CN115714100A (en) Wafer double-side brushing device
CN115338156A (en) Glass substrate surface liquid washing cleaning mechanism
CN215815813U (en) Double-station spraying cleaning machine convenient to operate
CN219043806U (en) Substrate thinning workbench and substrate thinning device
CN201188170Y (en) Clamper for photolithography edition
CN210788306U (en) A brushing device for silicon chip pottery dish separating centrifuge
KR100775627B1 (en) A substrate cleaning apparatus and cleaning method
CN211130940U (en) Split type scrubbing device
CN220585194U (en) Cleaning tank for cleaning flower basket of solar cell silicon wafer
CN219170585U (en) Grinding pad trimming equipment
CN213134130U (en) Cleaning equipment
CN220516500U (en) Automatic brushing device and brushing equipment for double-sided grinding polishing pad
CN214348182U (en) Cleaning device for wafer cutting ring

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant