CN213680870U - Sample fixing auxiliary tool for magnetron sputtering equipment - Google Patents
Sample fixing auxiliary tool for magnetron sputtering equipment Download PDFInfo
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- CN213680870U CN213680870U CN202022714343.8U CN202022714343U CN213680870U CN 213680870 U CN213680870 U CN 213680870U CN 202022714343 U CN202022714343 U CN 202022714343U CN 213680870 U CN213680870 U CN 213680870U
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- wane
- horizontal plate
- magnetron sputtering
- side wane
- sample
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Abstract
The utility model discloses a fixed auxiliary fixtures of sample for magnetron sputtering equipment belongs to magnetron sputtering equipment technical field, and its characterized in that includes at least: a horizontal plate of length a; a left side wane fixed at one end of the horizontal plate; a right side wane fixed at the other end of the horizontal plate; wherein: the lengths of the left side wane and the right side wane are both b; the left side wane and the right side wane are positioned on the same side of the horizontal plate and are in a coplanar relationship, the included angle between the left side wane and the horizontal plate is 135 degrees, and the included angle between the right side wane and the horizontal plate is 135 degrees; the screw hole of a 4mm diameter is seted up respectively at the center of left side wane and right side wane, left side wane, horizontal plate and right side wane are the integrated into one piece structure, left side wane, horizontal plate and right side wane are made for the stainless steel. By adopting the technical scheme, the utility model discloses have the function of fixed not co-altitude sample.
Description
Technical Field
The utility model belongs to the technical field of magnetron sputtering equipment, concretely relates to fixed auxiliary fixtures of sample for magnetron sputtering equipment.
Background
Magnetron sputtering is well known as one type of Physical Vapor Deposition (PVD). The general sputtering method can be used for preparing multi-materials such as metal, semiconductor, insulator and the like, and has the advantages of simple equipment, easy control, large film coating area, strong adhesive force and the like. The magnetron sputtering method developed in the last 70 th century realizes high speed, low temperature and low damage. Since the high-speed sputtering is performed under a low pressure, it is necessary to effectively increase the ionization rate of the gas. Magnetron sputtering increases the sputtering rate by introducing a magnetic field at the surface of the target cathode, using the confinement of the magnetic field to charged particles to increase the plasma density.
In the magnetron sputtering device, a sample needs to be fixed on a slide glass tray for growing a film, but a part of the sample has a certain height, so that the sample cannot be fixed by using a conventional clamp.
SUMMERY OF THE UTILITY MODEL
The utility model provides a sample fixing auxiliary tool for magnetron sputtering equipment, which can fix the sample at a certain height for processing, for solving the technical problems existing in the known technology.
The utility model aims at providing a fixed auxiliary fixtures of sample for magnetron sputtering equipment includes at least:
a horizontal plate of length a;
a left side wane fixed at one end of the horizontal plate;
a right side wane fixed at the other end of the horizontal plate; wherein:
the lengths of the left side wane and the right side wane are both b; and left side wane and right side wane lie in the same one side of horizontal plate, and the three is the coplane relation, the contained angle between left side wane and the horizontal plate is 135 degrees, the contained angle between right side wane and the horizontal plate is 135 degrees.
And the centers of the left side wane and the right side wane are respectively provided with a screw hole with the diameter of 4 mm.
Preferably, a equals 21mm and b equals 9.9 mm.
Preferably, the thickness and width of the horizontal plate are 1.5mm and 7mm in sequence.
Preferably, the thickness and the width of the left side seesaw and the right side seesaw are 1.07mm and 7mm in sequence.
Preferably, the left side wane, the horizontal plate and the right side wane are of an integrally formed structure.
Preferably, the left side rocker, the horizontal plate and the right side rocker are made of stainless steel.
The utility model has the advantages and positive effects that:
this application is through adopting above-mentioned technical scheme, the utility model discloses a high adjustment of sample can fix the sample and handle at a take the altitude, has the function of fixed not co-altitude sample promptly.
Drawings
FIG. 1 is a diagram illustrating a state of use of a preferred embodiment of the present invention;
FIG. 2 is a top view of a preferred embodiment of the present invention;
fig. 3 is a front view of a preferred embodiment of the present invention.
Wherein: 1. a sample tray; 2. fixing the bolt A; 3. a fixing bolt B; 4. a sample; 5. a fixing bolt C; 6. fixing a bolt D; 7. a horizontal plate; 8. a left side rocker; 9. and a right side wane.
Detailed Description
For further understanding of the contents, features and effects of the present invention, the following embodiments are exemplified and will be described in detail with reference to the accompanying drawings:
in the description of the present invention, it is to be understood that the terms "upper", "lower", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the present invention.
As shown in fig. 2 and fig. 3, the technical solution of the present invention is:
the utility model provides a fixed auxiliary fixtures of sample for magnetron sputtering equipment, includes:
a horizontal plate 7 of length a;
a left side wane 8 fixed at one end of the horizontal plate;
a right side wane 9 fixed at the other end of the horizontal plate; wherein:
the lengths of the left side wane and the right side wane are both b; the left side wane and the right side wane are positioned on the same side of the horizontal plate and are in a coplanar relationship, the included angle between the left side wane and the horizontal plate is 135 degrees, and the included angle between the right side wane and the horizontal plate is 135 degrees;
and the centers of the left side wane and the right side wane are respectively provided with a screw hole with the diameter of 4 mm.
Where a equals 21mm and b equals 7 mm.
The thickness and the width of the horizontal plate are 1.5mm and 7mm in sequence.
The thickness and the width of the left side seesaw and the right side seesaw are 1.5mm and 7mm in sequence.
The left side wane, the horizontal plate and the right side wane are of an integrally formed structure.
The left side wane, the horizontal plate and the right side wane are made of stainless steel.
The structure of this preferred embodiment is special-shaped structure, and its thickness is 1.5mm, and length 30mm, both ends warpage 45.
The manufacturing principle is as follows: a stainless steel substrate 1.5mm thick, 31mm long and 7mm wide was provided with two 45-degree-warped sides, and two 4-mm-diameter screw holes were formed. One of the screw holes is fixed on the sample plate, the other screw hole is used for fixing a sample with height, namely a chip with the height of about 4mm can be fixed, and the structure is placed in magnetron sputtering equipment, so that a coating process can be carried out.
As shown in fig. 1, the working principle of the present invention is as follows:
firstly, two sample fixing auxiliary tools for magnetron sputtering devices are selected and placed on two sides of a sample 4 as shown in fig. 1, then lower side warping plates of the two sample fixing auxiliary tools for magnetron sputtering devices are fixed with a sample disc 1 through a fixing bolt A2 and a fixing bolt D6, then the height of the sample 4 is adjusted, and finally the sample 4 is clamped through a fixing bolt B3 and a fixing bolt C5.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and all the modifications and equivalents of the technical spirit of the present invention to any simple modifications of the above embodiments are within the scope of the technical solution of the present invention.
Claims (6)
1. A sample fixing auxiliary tool for magnetron sputtering equipment; characterized in that it at least comprises:
a horizontal plate of length a;
a left side wane fixed at one end of the horizontal plate;
a right side wane fixed at the other end of the horizontal plate; wherein:
the lengths of the left side wane and the right side wane are both b; the left side wane and the right side wane are positioned on the same side of the horizontal plate and are in a coplanar relationship, the included angle between the left side wane and the horizontal plate is 135 degrees, and the included angle between the right side wane and the horizontal plate is 135 degrees;
and the centers of the left side wane and the right side wane are respectively provided with a screw hole with the diameter of 4 mm.
2. The sample fixing auxiliary tool for the magnetron sputtering device according to claim 1, wherein a is equal to 21mm, and b is equal to 9.9 cm.
3. The sample fixing auxiliary tool for the magnetron sputtering device according to claim 1 or 2, wherein the thickness and the width of the horizontal plate are 1.5mm and 7mm in sequence.
4. The sample fixing auxiliary tool for the magnetron sputtering device according to claim 1, wherein the thickness and the width of the left side warped plate and the right side warped plate are 1.06mm and 7mm in sequence.
5. The auxiliary fixture for fixing the sample for the magnetron sputtering device according to claim 4, wherein the left side rocker, the horizontal plate and the right side rocker are of an integrally formed structure.
6. The auxiliary fixture for fixing the sample for the magnetron sputtering device according to claim 1, wherein the left side rocker, the horizontal plate and the right side rocker are made of stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022714343.8U CN213680870U (en) | 2020-11-20 | 2020-11-20 | Sample fixing auxiliary tool for magnetron sputtering equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022714343.8U CN213680870U (en) | 2020-11-20 | 2020-11-20 | Sample fixing auxiliary tool for magnetron sputtering equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213680870U true CN213680870U (en) | 2021-07-13 |
Family
ID=76734403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022714343.8U Active CN213680870U (en) | 2020-11-20 | 2020-11-20 | Sample fixing auxiliary tool for magnetron sputtering equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213680870U (en) |
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2020
- 2020-11-20 CN CN202022714343.8U patent/CN213680870U/en active Active
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