CN213660359U

CN213660359U - Immersion type wet etching device

Info

Publication number: CN213660359U
Application number: CN202023214082.XU
Authority: CN
Inventors: 蒋新; 张帆; 施利君; 宋金林
Original assignee: Suzhou Kzone Equipment Technology Co Ltd
Current assignee: Suzhou Kzone Equipment Technology Co Ltd
Priority date: 2020-12-28
Filing date: 2020-12-28
Publication date: 2021-07-09
Anticipated expiration: 2030-12-28

Abstract

The utility model relates to an immersive wet etching device, including flourishing liquid tray be provided with a plurality of driving roller along its length direction in the flourishing liquid tray, movably on the inner wall of flourishing liquid tray is provided with level sensor, level sensor can follow vertical direction and remove, level sensor's setting height is higher than the height of copper base plate on the driving roller the upper and lower of driving roller is provided with a plurality of that links to each other with the liquid supply pipeline respectively and sends liquid sword. This application can be when guaranteeing the sculpture homogeneity of copper, forming the less bank angle relatively, can effectively accelerate reaction rate, can effectively stop the oxidation reaction on copper surface simultaneously, guarantee final product quality.

Description

Immersion type wet etching device

Technical Field

The utility model relates to a flat machine semiconductor processing equipment technical field especially relates to an immersive wet etching device.

Background

As is well known, wet etching is a process of removing a portion of a lower layer material that is not masked by an upper layer of a masking material by using a physical and chemical reaction method, thereby obtaining a pattern corresponding to the pattern of the masking layer on the lower layer material. Wet etching and cleaning have been widely used in flat panel display and semiconductor processes for a long time in etching processes, and many wet etching processes have also shown superior performance.

With the continuous progress of the super large scale integrated circuit technology, the feature size of an electronic device is smaller and smaller, the integration level is higher and higher, the metal resistance is increased due to the thinning of a metal conducting wire designed in the super large scale integrated circuit, the generated heat is increased, the serious electromigration phenomenon is generated, and meanwhile, the delay caused by the increase of the resistance among wires is also deteriorated. Compared with the traditional aluminum, the resistivity of copper is smaller, the parasitic capacitance of the interconnecting wire is also smaller than that of aluminum, meanwhile, the electrical mobility of copper is better than that of aluminum, and for the reasons, the traditional aluminum process is gradually replaced by the copper process.

However, compared with the mature wet etching process of aluminum, the wet etching of copper is a difficult problem, and the main problems are that the etching uniformity is poor, the etching gradient angle is too large, the appearance of the etched side wall is generally slow, and the CD of the etched copper wire strip is much smaller than that of the designed CD. In addition, the copper surface is easily oxidized, so that the copper surface is well isolated from air in the etching process. The traditional wet etching method belongs to isotropy, certain lateral erosion exists in the etching process, the metal morphology can be changed, and meanwhile, metal lines can be thinned.

In view of the above problems, there is a need for an apparatus for wet etching copper to solve the above technical problems.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing an immersive wet etching device can effectively accelerate reaction rate when guaranteeing the sculpture homogeneity of copper, forming the relative less slope angle, can effectively stop the oxidation reaction on copper surface simultaneously, guarantees final product quality.

In order to achieve the above purpose, the utility model adopts the technical scheme that:

the utility model provides an immersive wet etching device, including flourishing liquid tray be provided with a plurality of driving roller along its length direction in the flourishing liquid tray, movably on the inner wall of flourishing liquid tray is provided with level sensor, level sensor can follow vertical direction and remove, level sensor's setting height is higher than the height of copper base plate on the driving roller the upper and lower a plurality of that is provided with respectively and supplies the liquid pipeline to link to each other of driving roller send liquid sword.

For the above technical solution, the applicant has further optimization measures.

Optionally, a vertical guide rail is arranged on the inner wall of the liquid containing tray, a sliding block in sliding fit with the vertical guide rail is arranged at the bottom of the liquid level sensor, and a bolt for locking the sliding block and the vertical guide rail is arranged on the side face of the sliding block.

Optionally, the plurality of liquid feeding knives comprise a plurality of first liquid knives arranged above the transmission roller and a plurality of second liquid knives arranged below the transmission roller, the first liquid knives are all obliquely arranged, and the second liquid knives are all vertically arranged.

Optionally, the plurality of first liquid knives are arranged in parallel.

Because of the application of the technical scheme, compared with the prior art, the utility model has the following advantages:

the utility model discloses an immersive wet etching device, owing to use immersive sculpture mode to carry out the sculpture to the copper base plate, can obtain better sculpture homogeneity and form better side appearance, the copper base plate keeps under the sculpture medicine simultaneously, can realize effective isolated of copper surface and air, and for improving its sculpture speed slower under this immersive sculpture mode, strike the less problem of dynamics and surface mounting number liquid sword about the copper base plate to the copper base plate. Through the design of installation liquid sword under the immersion wet etching mode, firstly spray the replacement frequency that can accelerate liquid medicine through incessant liquid sword for the sculpture speed, secondly can form certain striking dynamics to copper substrate surface through the regulation of designing liquid sword quantity, installation angle, and copper substrate interval, flow, pressure isoparametric, have better effect to the formation of etching rate and side appearance, so effectively guarantee final sculpture quality.

Drawings

Some specific embodiments of the present invention will be described in detail hereinafter, by way of illustration and not by way of limitation, with reference to the accompanying drawings. The same reference numbers in the drawings identify the same or similar elements or components. Those skilled in the art will appreciate that the drawings are not necessarily drawn to scale. In the drawings:

fig. 1 is a schematic structural diagram of an immersion wet etching apparatus according to an embodiment of the present invention.

Wherein the reference numerals are as follows:

1. liquid containing tray, 2, driving roller, 31, first liquid knife, 32, second liquid knife, 4, copper substrate, 5, liquid level sensor, 61, vertical guide rail, 62 and slide block.

Detailed Description

The technical solution of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

Furthermore, the technical features mentioned in the different embodiments of the invention described below can be combined with each other as long as they do not conflict with each other.

This embodiment has described an immersive wet etching device, as shown in fig. 1, including flourishing liquid tray 1 is interior along its length direction be provided with a plurality of driving roller 2, movably on the inner wall of flourishing liquid tray 1 is provided with level sensor 5, level sensor 5 can follow vertical direction and remove, level sensor 5 sets up the height that highly is higher than copper base plate 4 on driving roller 2 is provided with respectively from top to bottom and supplies the liquid pipe way continuous a plurality of to send liquid sword.

The liquid level sensor 5 highly is convenient for carry out the liquid medicine level control in the flourishing liquid tray 1, so can guarantee that the copper base plate 4 of treating etching is soaked in the liquid medicine, realize the immersive sculpture to copper base plate 4, when the liquid medicine surpass to set for high opportunity through the unnecessary liquid medicine of circulation pipeline discharge, constitute and supply liquid medicine recycling between the pipeline. Because the copper substrate 4 is etched by using the immersion type etching mode, better etching uniformity and better side appearance can be obtained, and meanwhile, the copper substrate 4 is kept under the etching agent, and the effective isolation of the copper surface and the air can be realized.

The plurality of liquid feeding knives comprise a plurality of first liquid knives 31 arranged above the transmission roller 2 and a plurality of second liquid knives 32 arranged below the transmission roller 2, the first liquid knives 31 are all obliquely arranged, the second liquid knives 32 are all vertically arranged, and the plurality of first liquid knives 31 are arranged in parallel. In this embodiment, seven first liquid knives 31 and seven second liquid knives 32 are provided, the first liquid knives 31 and the second liquid knives 32 are connected to an external liquid supply pipeline, a liquid inlet of the liquid supply pipeline is connected to an etching liquid medicine source, and when etching is performed, each of the first liquid knives 31 and the second liquid knives 32 keeps a liquid medicine spraying state. In order to solve the problems that the etching speed is slow and the striking force on the copper substrate 4 is small in an immersion type etching mode, a plurality of liquid knives are arranged on the upper surface and the lower surface of the copper substrate 4. Through the design of installation liquid sword under immersive wet process etching mode, firstly spray the replacement frequency that can accelerate liquid medicine through incessant liquid sword for the sculpture speed, secondly through the regulation of design liquid sword quantity, installation angle, 4 intervals with copper base plate, flow, pressure isoparametric can form certain striking dynamics to copper base plate 4 surface, have better effect to the formation of sculpture speed and side appearance, so effectively guarantee final sculpture quality.

In order to ensure that the upper and lower positions of the liquid level sensor 5 in the liquid containing tray 1 can be adjusted, thereby being suitable for different processing requirements. The inner wall of the liquid containing tray 1 is provided with a vertical guide rail 61, the bottom of the liquid level sensor 5 is provided with a slide block 62 in sliding fit with the vertical guide rail 61, and the side surface of the slide block 62 is provided with a bolt for locking the slide block 62 and the vertical guide rail 61.

The above embodiments are only for illustrating the technical concept and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and to implement the present invention, so as not to limit the protection scope of the present invention, and all equivalent changes or modifications made according to the spirit of the present invention should be covered by the protection scope of the present invention.

Claims

1. The utility model provides an immersive wet etching device, its characterized in that, includes flourishing liquid tray be provided with a plurality of driving roller along its length direction in the flourishing liquid tray, movably on the inner wall of flourishing liquid tray is provided with level sensor, level sensor can follow vertical direction and remove, level sensor's setting height is higher than the height of copper base plate on the driving roller be provided with respectively about the driving roller and send liquid sword with a plurality of that the liquid supply pipeline links to each other.

2. The immersion type wet etching device of claim 1, wherein a vertical guide rail is arranged on the inner wall of the liquid containing tray, a slide block which is in sliding fit with the vertical guide rail is arranged at the bottom of the liquid level sensor, and a bolt for locking the slide block and the vertical guide rail is arranged on the side surface of the slide block.

3. The immersion wet etching apparatus according to claim 1, wherein the plurality of liquid-feeding knives comprise a plurality of first liquid knives disposed above the driving roller and a plurality of second liquid knives disposed below the driving roller, the first liquid knives are all disposed obliquely, and the second liquid knives are all disposed vertically.

4. The immersion wet etching apparatus according to claim 3, wherein the plurality of first liquid knives are arranged in parallel.