CN213357738U

CN213357738U - Diffusion furnace convenient to move

Info

Publication number: CN213357738U
Application number: CN202022389324.2U
Authority: CN
Inventors: 牛新海; 李志坤
Original assignee: Qingdao Weihong Equipment Technology Co ltd
Current assignee: Qingdao Weihong Equipment Technology Co ltd
Priority date: 2020-10-24
Filing date: 2020-10-24
Publication date: 2021-06-04
Anticipated expiration: 2030-10-24

Abstract

The utility model discloses a diffusion furnace convenient to move, which comprises an outer box body and a furnace body; the furnace body comprises a furnace barrel and a gas uniform distribution piece; a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body through the furnace opening is arranged on the inner side wall of one side of the outer box body; the bottom of the outer box body is provided with a base; the bottom of the base is provided with four rollers; four right angles of the base are respectively provided with a supporting stud; the bottom end of the supporting stud is rotatably connected with the supporting seat through a bearing. The utility model is provided with the idler wheels and the support studs, when the diffusion furnace is required to be moved, the four support studs are respectively rotated to enable the support studs to move upwards until the idler wheels contact the ground, and the diffusion furnace is moved through the idler wheels; when the diffusion furnace is required to be fixed, the support stud is rotated reversely to move downwards until the support base contacts with the support surface to play a supporting role; therefore, this application diffusion furnace both is convenient for remove, can realize again supporting fixed action.

Description

Diffusion furnace convenient to move

Technical Field

The utility model belongs to the technical field of the diffusion furnace, concretely relates to diffusion furnace convenient to remove.

Background

The diffusion furnace is one of important process equipment of a front process of a semiconductor production line, and is used for diffusion, oxidation, annealing, alloying, sintering and other processes in industries such as large-scale integrated circuits, discrete devices, power electronics, photoelectric devices, optical fibers and the like.

When the diffusion furnace is used, the silicon wafer needs to be conveyed into the diffusion furnace body, and the silicon wafer reacts with reaction gas in the diffusion furnace, so that a silicon dioxide film is continuously generated on the surface of the silicon wafer.

However, the existing diffusion furnaces are not easy to move, and when the position needs to be adjusted, the mode of manual push-pull is mostly adopted, so that the labor intensity is high.

Therefore, it is desirable to design a diffusion furnace that is easy to move.

SUMMERY OF THE UTILITY MODEL

The utility model aims at overcoming the defects of the prior art and providing the diffusion furnace convenient to move.

In order to achieve the above purpose, the utility model adopts the following technical scheme:

a diffusion furnace convenient to move comprises an outer box body and a furnace body arranged in the outer box body;

the furnace body comprises a furnace barrel and a gas uniform distribution piece; the furnace cylinder is of a horizontal cylinder structure with two ends sealed; one end of the furnace cylinder is provided with a furnace opening; the furnace barrel is fixedly arranged on the inner bottom surface of the outer box body through a furnace barrel base;

the gas uniform distribution piece is of a cylindrical structure, and an annular uniform distribution cavity extending along the axial direction of the cylinder is arranged in the side wall of the cylinder of the gas uniform distribution piece; a plurality of gas uniform distribution holes communicated with the annular uniform distribution cavity are uniformly formed in the inner side wall of the cylinder of the gas uniform distribution piece; a gas inlet pipe communicated with the annular uniform distribution cavity is arranged on the outer side wall of the cylinder of the gas uniform distribution piece;

the gas uniform distribution piece is coaxially arranged inside the furnace cylinder, and through holes for a gas inlet pipe to pass through are formed in the side wall of the furnace cylinder and the side wall of the outer box body;

an exhaust pipe is arranged on the side wall of the furnace cylinder and extends to the outside of the outer box body;

a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body through the furnace opening is arranged on the inner side wall of one side of the outer box body;

the feeding mechanism comprises a feeding motor, a feeding screw rod, a feeding sliding seat and a feeding guide rail;

the feeding motor is fixedly arranged on the inner side wall of one side of the outer box body;

one end of the feeding screw rod is coaxially and fixedly connected with the end part of a rotating shaft of the feeding motor;

the middle threaded hole of the feeding sliding seat is in threaded connection with the feeding screw; the side surface of the feeding sliding seat is in sliding connection with the feeding guide rail along the axial direction of the feeding screw;

the upper part of the feeding sliding seat is provided with a chuck for clamping a silicon wafer; the chuck comprises an adjusting seat in a U-shaped structure, and an opening of the adjusting seat faces to a furnace mouth of the furnace body; two horizontal clamping plates which are symmetrical up and down are arranged between the two horizontal plates of the adjusting seat; a plurality of clamping columns are symmetrically arranged on the opposite side surfaces of the two horizontal clamping plates along the length direction;

the adjusting seat is provided with an adjusting piece used for controlling the two horizontal clamping plates to synchronously move in opposite directions or synchronously move in back directions;

the outer end face of the vertical plate in the adjusting seat is fixedly connected with the top end of the feeding sliding seat through an L-shaped bracket; a plugging plate capable of plugging the furnace mouth is arranged on the L-shaped bracket;

a base is arranged at the bottom of the outer box body; the bottom of the base is provided with four rollers;

four right angles of the base are respectively provided with a supporting stud;

the four right angles of the base are respectively provided with a threaded hole which penetrates through the top surface and the bottom surface of the base; the support stud is in threaded connection with the threaded hole;

the bottom end of the supporting stud is rotatably connected with the supporting seat through a bearing.

Preferably, the furnace barrel comprises a first furnace barrel and a second furnace barrel which are arranged in bilateral symmetry;

a first connecting flange is arranged at the right end of the first furnace barrel; a second connecting flange is arranged at the left end of the second furnace barrel;

the middle part of the outer side wall of the gas uniform distribution piece is provided with an annular mounting plate; a plurality of connecting holes are uniformly formed in the annular mounting plate along the circumferential direction;

the annular mounting plate is positioned between the first connecting flange and the second connecting flange;

the first connecting flange, the annular mounting plate and the second connecting flange are connected through bolts.

Preferably, an inlet valve is arranged on the gas inlet pipe; a filtering element for filtering gas is arranged on the gas inlet pipe at the front end of the inlet valve;

the filter piece comprises a cylindrical filter cartridge, and a plurality of layers of steel wire filter screens are uniformly embedded in the inner side surface of the filter cartridge along the axial direction;

and two ends of the filter cylinder are connected with the gas inlet pipe through flanges.

Preferably, the feeding screw rod is coaxially connected with a rotating shaft of the feeding motor through a coupler.

Preferably, the feeding guide rail is provided with a limiting sliding chute extending along the axial direction of the feeding screw;

and a limiting sliding block which is in sliding limiting fit with the limiting sliding groove is arranged on one side surface of the feeding sliding seat.

Preferably, the limiting sliding groove is a T-shaped sliding groove, and the limiting sliding block is a T-shaped sliding block.

Preferably, the bottom that is located the centre gripping post on upper portion and the top that is located the centre gripping post of lower part all are provided with the rubber pad.

Preferably, the adjusting part is an adjusting stud, and two ends of the adjusting stud are provided with external threads with opposite turning directions;

two ends of the adjusting stud are respectively in threaded connection with the corresponding horizontal clamping plates;

the top end and the bottom end of the adjusting stud are respectively in rotary connection with corresponding horizontal plates in the adjusting seat;

the horizontal clamping plate is provided with an adjusting sliding block towards one end of the adjusting seat, and an adjusting sliding groove which is in up-down sliding fit with the adjusting sliding block is formed in a vertical plate of the adjusting seat.

Preferably, the adjusting sliding groove is a T-shaped sliding groove, and the adjusting sliding block is a T-shaped sliding block.

Preferably, the top end and the bottom end of the adjusting stud are respectively and rotatably connected with corresponding horizontal plates in the adjusting seat through bearings.

The utility model has the advantages that:

(1) the utility model is provided with the idler wheels and the support studs, when the diffusion furnace is required to be moved, the four support studs are respectively rotated to enable the support studs to move upwards until the idler wheels contact the ground, and the diffusion furnace is moved through the idler wheels; when the diffusion furnace is required to be fixed, the support stud is rotated reversely to move downwards until the support base contacts with the support surface to play a supporting role; therefore, this application diffusion furnace both is convenient for remove, can realize again supporting fixed action.

(2) The utility model is provided with the gas uniform distribution piece, and the arrangement of the inner annular uniform distribution cavity of the gas uniform distribution piece firstly reduces the flow velocity of incoming gas in the gas inlet pipe, and prevents the reaction gas from being sprayed onto the silicon chip at a higher speed to influence the generation of the film; second, as a containment and buffer space for the reactant gases; and thirdly, the annular design and the design of the gas uniformly distributed holes uniformly distributed on the inner side of the annular design enable reaction gas to be diffused into the inner cavity of the furnace body from all directions of the circumference, so that the diffusion uniformity of the reaction gas is greatly improved, and the consistency of the thickness of a film generated on a silicon wafer is ensured.

(3) The utility model realizes the linear motion of the feeding slide seat along the axial direction of the feeding screw rod when the feeding motor is started under the sliding limit matching of the limit sliding chute and the limit sliding block and the thread matching of the feeding slide seat and the feeding screw rod, thereby realizing that the chuck clamping the silicon chip is sent into the furnace body and quits from the furnace body; when the clamping head which clamps the silicon wafer enters the furnace body through the furnace mouth, the furnace mouth can be sealed by the plugging plate on the L-shaped support. Therefore, the silicon wafer feeding device has the function of closing the furnace mouth of the furnace body while feeding the silicon wafer into the furnace body.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the application and, together with the description, serve to explain the application and are not intended to limit the application.

FIG. 1 is a schematic perspective view of a diffusion furnace of the present invention, which is easy to move;

FIG. 2 is a schematic perspective view of the feeding mechanism of the present invention;

FIG. 3 is a schematic front view of the feeding mechanism of the present invention;

FIG. 4 is a sectional view taken along line A-A of FIG. 3;

FIG. 5 is a schematic perspective view of the furnace body of the present invention;

FIG. 6 is a schematic sectional view of the furnace body of the present invention;

FIG. 7 is a schematic perspective view of the gas distributor of the present invention;

FIG. 8 is a schematic cross-sectional view of the gas distributor of the present invention;

wherein:

0-outer box; 01-furnace body, 011-furnace cylinder, 0111-first furnace cylinder, 0112-second furnace cylinder, 0113-first connecting flange, 0114-second connecting flange, 0115-exhaust pipe; 012-gas uniform distribution piece, 0121-annular uniform distribution cavity, 0122-gas uniform distribution hole, 0123-gas inlet pipe, 0124-inlet valve, 0125-annular mounting plate; 013-furnace barrel base; 02-furnace mouth;

1-a feeding motor, 2-a feeding screw rod, 3-a feeding sliding seat, 31-a limiting sliding block, 4-a feeding guide rail, 41-a limiting sliding groove, 5-a chuck, 51-an adjusting seat, 511-an adjusting sliding groove, 52-a horizontal clamping plate, 521-an adjusting sliding block, 53-a clamping column, 54-a rubber pad, 55-an adjusting stud, 6-an L-shaped bracket and 7-a plugging plate;

8-filter element, 81-filter cartridge, 82-steel wire filter screen;

9-base, 91-roller, 92-support stud, 921-support adjusting handle and 93-support seat.

Detailed Description

It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.

It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.

In the present invention, the terms such as "bottom" and "top" are used to indicate the position or positional relationship based on the position or positional relationship shown in the drawings, and are only the terms determined for convenience of describing the structural relationship between the components or elements of the present invention, and are not specific to any component or element of the present invention, and should not be construed as limiting the present invention.

In the present invention, terms such as "connected" and "connected" should be understood in a broad sense, and may be either fixedly connected or integrally connected or detachably connected; may be directly connected or indirectly connected through an intermediate. The meaning of the above terms in the present invention can be determined according to specific situations by persons skilled in the art, and should not be construed as limiting the present invention.

The present invention will be further explained with reference to the drawings and examples.

As shown in fig. 1, a diffusion furnace convenient to move comprises an outer box 0 and a furnace body 01 arranged inside the outer box 0;

as shown in fig. 5-6, the furnace body 01 comprises a furnace cylinder 011 and a gas uniform distribution piece 012; the furnace barrel 011 is of a horizontal cylinder structure with two ends sealed; one end of the furnace barrel 011 is provided with a furnace opening 02; the furnace barrel 011 is fixedly arranged on the inner bottom surface of the outer box body 0 through a furnace barrel base 013;

as shown in fig. 7-8, the gas uniform distribution piece 012 is a cylindrical structure, and an annular uniform distribution cavity 0121 extending along the axial direction of the cylinder is arranged in the cylinder sidewall of the gas uniform distribution piece 012; a plurality of gas uniform distribution holes 0122 communicated with the annular uniform distribution cavity 0121 are uniformly arranged on the inner side wall of the cylinder of the gas uniform distribution piece 012; a gas inlet pipe 0123 communicated with the annular uniform distribution cavity 0121 is arranged on the outer side wall of the cylinder of the gas uniform distribution piece 012; the annular uniform distribution cavities 0121 are arranged, so that the flow rate of incoming gas in the gas inlet pipe 0123 is reduced, and the reaction gas is prevented from being sprayed onto the silicon wafer at a higher speed to influence the generation of a film; second, as a containment and buffer space for the reactant gases; thirdly, the annular design and the design of the gas uniformly distributed holes uniformly distributed on the inner side of the annular design enable the reaction gas to be diffused into the inner cavity of the furnace body 01 from all directions of the circumference, so that the diffusion uniformity of the reaction gas is greatly improved, and the consistency of the thickness of the generated film is ensured;

the gas uniform distribution piece 012 is coaxially arranged inside the furnace cylinder 011, and through holes for a gas inlet pipe 0123 to pass through are arranged on the side wall of the furnace cylinder 011 and the side wall of the outer box 0;

an exhaust pipe 0115 is arranged on the side wall of the furnace cylinder 011, and the exhaust pipe 0115 extends to the outside of the outer box body 0;

a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body 01 through the furnace opening 02 is arranged on the inner side wall of one side of the outer box body 0;

as shown in fig. 2-4, the feeding mechanism includes a feeding motor 1, a feeding screw 2, a feeding slide 3, and a feeding guide rail 4;

the feeding motor 1 is fixedly arranged on the inner side wall of one side of the outer box body 0;

one end of the feeding screw rod 2 is coaxially and fixedly connected with the end part of a rotating shaft of the feeding motor 1;

the middle threaded hole of the feeding sliding seat 3 is in threaded connection with the feeding screw rod 2; the side surface of the feeding sliding seat 3 is in sliding connection with the feeding guide rail 4 along the axial direction of the feeding screw rod 2;

the upper part of the feeding sliding seat 3 is provided with a chuck 5 for clamping a silicon wafer; the chuck 5 comprises a U-shaped adjusting seat 51, and the opening of the adjusting seat 51 faces to a furnace mouth 02 of the furnace body 01; two horizontal clamping plates 52 which are symmetrical up and down are arranged between the two horizontal plates of the adjusting seat 51; the clamping columns 53 are symmetrically arranged on the opposite side surfaces of the two horizontal clamping plates 52 along the length direction, and the arrangement of the clamping columns 53 ensures that the silicon wafer only has upper and lower clamping points so as to expose more surface area of the silicon wafer in the reaction gas in the furnace body 01 and generate a silicon dioxide film better;

the adjusting seat 51 is provided with an adjusting piece for controlling the two horizontal clamping plates 52 to synchronously move in opposite directions or synchronously move back to back; the two horizontal clamping plates 52 move synchronously in opposite directions to clamp the silicon wafer and move synchronously in opposite directions to loosen the silicon wafer;

the outer end face of a vertical plate in the adjusting seat 51 is fixedly connected with the top end of the feeding sliding seat 3 through an L-shaped bracket 6; the L-shaped bracket 6 is provided with a plugging plate 7 which can plug the furnace mouth 02; when the chuck 5 enters the furnace body 01 through the furnace opening 02, the furnace opening 02 is sealed by the plugging plate 7 on the L-shaped support 6, and when the chuck 5 is withdrawn from the furnace body 01, the furnace opening 02 is unsealed by the plugging plate 7;

as shown in fig. 1, a base 9 is disposed at the bottom of the outer box 0; the bottom of the base 9 is provided with four rollers 91, so that the movement is convenient;

four right angles of the base 9 are respectively provided with a support stud 92;

four right angles of the base 9 are respectively provided with a threaded hole penetrating through the top surface and the bottom surface of the base 9; the support stud 92 is in threaded connection with the threaded hole;

the bottom end of the support stud 92 is rotatably connected with the support seat 93 through a bearing.

Specifically, the upper portion of the support stud 92 is provided with a support adjustment handle 921.

Specifically, a level is arranged on the base 9.

When the diffusion furnace is required to be moved, the four support studs 92 are respectively rotated to enable the support studs 92 to move upwards until the rollers 91 contact the ground, and the diffusion furnace is moved through the rollers 91;

when the diffusion furnace is required to be fixed, the support studs 92 are rotated reversely, so that the support studs 92 move downwards until the support seats 93 contact the ground to play a supporting role; when the ground supporting the diffusion furnace is uneven, the four supporting studs 92 are respectively adjusted, the base 9 can be adjusted to be horizontal, and meanwhile, the gradienter on the base 9 detects the levelness of the base 9, so that the regulation of the supporting studs 92 is guided; support stud 92 does not contact with the holding surface in this application simultaneously, supporting seat 93 and holding surface direct contact, and can rotate relatively between supporting seat 93 and the support stud 92, consequently at the in-process of rotatory support stud 92, supporting seat 93 does not take place to rotate, can not fish tail contact surface.

Preferably, the furnace cylinder 011 comprises a first furnace cylinder 0111 and a second furnace cylinder 0112 which are arranged in a left-right symmetry manner;

the right end of the first furnace cylinder 0111 is provided with a first connecting flange 0113; the left end of the second furnace cylinder 0112 is provided with a second connecting flange 0114;

the middle part of the outer side wall of the gas uniform distribution piece 012 is provided with an annular mounting plate 0125; a plurality of connecting holes are uniformly formed in the annular mounting plate 0125 in the circumferential direction;

the annular mounting plate 0125 is positioned between the first connecting flange 0113 and the second connecting flange 0114;

the first connecting flange 0113, the annular mounting plate 0125 and the second connecting flange 0114 are connected through bolts.

Preferably, an inlet valve 0124 is arranged on the gas inlet pipe 0123; the gas inlet pipe 0123 at the front end of the inlet valve 0124 is provided with a filtering element 8 for filtering gas.

Preferably, the filter element 8 includes a filter cartridge 81 having a cylindrical structure, and a plurality of layers of steel wire filter screens 82 are uniformly embedded in the inner side surface of the filter cartridge 81 along the axial direction;

the two ends of the filter cartridge 82 are flanged with the gas inlet pipe 0123, so as to facilitate the cleaning and replacement of the filter element 8.

Preferably, the feeding screw 2 is coaxially connected with a rotating shaft of the feeding motor 1 through a coupler.

Preferably, the feeding guide rail 4 is provided with a limiting sliding groove 41 extending along the axial direction of the feeding screw 2;

and a limiting slide block 31 which is in sliding limiting fit with the limiting slide groove 41 is arranged on one side surface of the feeding slide seat 3.

Under the sliding limit matching of the limit sliding chute 41 and the limit sliding block 31 and the thread matching of the feeding sliding seat 3 and the feeding screw 2, when the feeding motor 1 is started, the feeding sliding seat 3 can linearly move along the axial direction of the feeding screw 2, so that the chuck 5 holding the silicon wafer can be fed into the furnace body 01 and withdrawn from the furnace body 01.

Preferably, the limiting sliding groove 41 is a T-shaped sliding groove, and the limiting sliding block 31 is a T-shaped sliding block.

Preferably, rubber pads 54 are disposed at the bottom end of the upper clamping column 53 and the top end of the lower clamping column 53 to prevent the clamping column 53 from damaging the silicon wafer.

Preferably, the adjusting part is an adjusting stud 55, and two ends of the adjusting stud 55 are provided with external threads with opposite turning directions;

two ends of the adjusting stud 55 are respectively in threaded connection with the corresponding horizontal clamping plates 52;

the top end and the bottom end of the adjusting stud 55 are respectively and rotatably connected with corresponding horizontal plates in the adjusting seat 51;

an adjusting slide block 521 is arranged at one end of the horizontal clamping plate 52 facing the adjusting seat 51, and an adjusting sliding chute 511 which is in up-and-down sliding fit with the adjusting slide block 521 is arranged on a vertical plate of the adjusting seat 51.

Under the up-and-down sliding fit between the adjusting sliding chute 511 and the adjusting sliding block 521 and the thread fit between the two ends of the adjusting stud 55 and the horizontal clamping plates 52, when the adjusting stud 55 is rotated, the two horizontal clamping plates 52 synchronously move in opposite directions or move in a back direction, the two horizontal clamping plates 52 synchronously move in opposite directions to clamp the silicon wafer, and the silicon wafer is loosened by synchronous movement in the back direction.

Preferably, the adjusting sliding groove 511 is a T-shaped sliding groove, and the adjusting sliding block 521 is a T-shaped sliding block.

Preferably, the top end and the bottom end of the adjusting stud 55 are respectively and rotatably connected with the corresponding horizontal plate in the adjusting seat 51 through bearings.

A diffusion furnace convenient to move comprises the following specific embodiments:

the diffusion furnace is moved to a proper position through a roller 91; the support studs 92 are then rotated to move the support studs 92 downward until the support seats 93 contact the ground for support.

In this application the chuck 5 of the feeding mechanism is aligned with the mouth 02 of the furnace body 01.

When the furnace is used, the feeding motor 1 is started firstly, and the chuck 5 is withdrawn from the furnace body 01; then, the adjusting stud 55 is rotated to enable the two horizontal clamping plates 52 to move backwards, so that the distance between the two horizontal clamping plates 52 is increased to facilitate the placement of a silicon wafer; placing a silicon wafer between the clamping columns 53 of the two horizontal clamping plates 52, and then reversely rotating the adjusting studs 55 to enable the two horizontal clamping plates 52 to move oppositely to clamp the silicon wafer; make pay-off motor 1 reversal afterwards, pay-off slide 3 drives chuck 5 and is close to furnace body 01, chuck 5 until the centre gripping has the silicon chip enters into furnace body 01 through fire door 02 in, shutoff board 7 on the L type support 6 can seal fire door 02 this moment, and reactant gas enters into annular equipartition chamber 0121 in the gas equipartition piece 012 after filtering of filter piece 8 in the gas inlet pipe 0123, after annular equipartition chamber 0121's diffusion and cushioning effect, through gas equipartition hole 0122 along each direction of circumference evenly spread to furnace body 01 inner chamber, reactant gas's diffusion homogeneity has greatly been promoted, thereby guarantee to generate the uniformity of film thickness on the silicon chip.

After the completion, the feeding motor 1 is started again, the chuck 5 holding the silicon wafer after the film formation is withdrawn from the furnace body 01, the silicon wafer after the film formation is unloaded, and then the next feeding and silicon wafer processing are waited.

Although the present invention has been described with reference to the accompanying drawings, it is not intended to limit the present invention, and those skilled in the art should understand that, based on the technical solution of the present invention, various modifications or variations that can be made by those skilled in the art without inventive labor are still within the scope of the present invention.

Claims

1. A diffusion furnace convenient to move comprises an outer box body and a furnace body arranged in the outer box body; it is characterized in that the utility model is characterized in that,

four right angles of the base are respectively provided with a supporting stud;

2. The easy-to-move diffusion furnace of claim 1, wherein said furnace shaft comprises a first furnace shaft and a second furnace shaft disposed in bilateral symmetry;

3. The portable diffusion furnace of claim 1 wherein said gas inlet tube is provided with an inlet valve; a filtering element for filtering gas is arranged on the gas inlet pipe at the front end of the inlet valve;

4. The easy-to-move diffusion furnace of claim 1, wherein said feed screw is coaxially connected to a rotary shaft of a feed motor through a coupling.

5. The easy-to-move diffusion furnace of claim 1, wherein said feed rail is provided with a limit chute extending in the axial direction of the feed screw;

6. The portable diffusion furnace of claim 5 wherein said stop runner is a T-shaped runner and said stop slide is a T-shaped slide.

7. The portable diffusion furnace of claim 1 wherein the bottom end of the upper holding column and the top end of the lower holding column are provided with rubber pads.

8. The portable diffusion furnace of claim 1 wherein said adjusting member is an adjusting stud having external threads of opposite hand at opposite ends;

9. The portable diffusion furnace of claim 8 wherein said adjustment chute is a T-chute and said adjustment slide is a T-slide.

10. The portable diffusion furnace of claim 8 wherein the top and bottom ends of said adjusting stud are rotatably connected to respective horizontal plates in the adjusting seat by bearings.