CN213357737U - Diffusion furnace for improving diffusion uniformity of reaction gas - Google Patents
Diffusion furnace for improving diffusion uniformity of reaction gas Download PDFInfo
- Publication number
- CN213357737U CN213357737U CN202022389336.5U CN202022389336U CN213357737U CN 213357737 U CN213357737 U CN 213357737U CN 202022389336 U CN202022389336 U CN 202022389336U CN 213357737 U CN213357737 U CN 213357737U
- Authority
- CN
- China
- Prior art keywords
- furnace
- uniform distribution
- feeding
- gas
- adjusting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model discloses a diffusion furnace for improving the diffusion uniformity of reaction gas, which comprises an outer box body and a furnace body; the furnace body comprises a furnace barrel and a gas uniform distribution piece; an annular uniform distribution cavity extending along the axial direction of the cylinder is arranged in the side wall of the cylinder of the gas uniform distribution piece; a plurality of gas uniform distribution holes communicated with the annular uniform distribution cavity are uniformly formed in the inner side wall of the cylinder of the gas uniform distribution piece; a gas inlet pipe communicated with the annular uniform distribution cavity is arranged on the outer side wall of the cylinder of the gas uniform distribution piece; the gas uniform distribution piece is coaxially arranged in the furnace barrel; and a feeding mechanism capable of conveying the silicon wafer into the inner cavity of the furnace body through the furnace opening is arranged on the inner side wall of one side of the outer box body. The utility model discloses the annular design of well annular equipartition chamber makes reaction gas by the all directions diffusion of circumference to the furnace body cavity in with the design of the gaseous equipartition hole of inboard equipartition thereof, has greatly promoted reaction gas's diffusion homogeneity to guarantee to generate film thickness's uniformity on the silicon chip.
Description
Technical Field
The utility model belongs to the technical field of the diffusion furnace, concretely relates to promote diffusion furnace of reaction gas diffusion homogeneity.
Background
The diffusion furnace is one of important process equipment of a front process of a semiconductor production line, and is used for diffusion, oxidation, annealing, alloying, sintering and other processes in industries such as large-scale integrated circuits, discrete devices, power electronics, photoelectric devices, optical fibers and the like.
When the diffusion furnace is used, the silicon wafer needs to be conveyed into the diffusion furnace body, and the silicon wafer reacts with reaction gas in the diffusion furnace, so that a silicon dioxide film is continuously generated on the surface of the silicon wafer.
However, in the conventional diffusion furnace body, the reaction gas cannot be uniformly diffused into the inner cavity of the furnace body, so that the thickness of the film generated on the silicon wafer is not uniform.
Therefore, it is desirable to design a diffusion furnace capable of improving the diffusion uniformity of the reaction gas.
SUMMERY OF THE UTILITY MODEL
The utility model aims at overcoming the defects of the prior art and providing a diffusion furnace for improving the diffusion uniformity of reaction gas.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a diffusion furnace for improving the diffusion uniformity of reaction gas comprises an outer box body and a furnace body arranged in the outer box body;
the furnace body comprises a furnace barrel and a gas uniform distribution piece; the furnace cylinder is of a horizontal cylinder structure with two ends sealed; one end of the furnace cylinder is provided with a furnace opening; the furnace barrel is fixedly arranged on the inner bottom surface of the outer box body through a furnace barrel base;
the gas uniform distribution piece is of a cylindrical structure, and an annular uniform distribution cavity extending along the axial direction of the cylinder is arranged in the side wall of the cylinder of the gas uniform distribution piece; a plurality of gas uniform distribution holes communicated with the annular uniform distribution cavity are uniformly formed in the inner side wall of the cylinder of the gas uniform distribution piece; a gas inlet pipe communicated with the annular uniform distribution cavity is arranged on the outer side wall of the cylinder of the gas uniform distribution piece;
the gas uniform distribution piece is coaxially arranged inside the furnace cylinder, and through holes for a gas inlet pipe to pass through are formed in the side wall of the furnace cylinder and the side wall of the outer box body;
an exhaust pipe is arranged on the side wall of the furnace cylinder and extends to the outside of the outer box body;
a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body through the furnace opening is arranged on the inner side wall of one side of the outer box body;
the feeding mechanism comprises a feeding motor, a feeding screw rod, a feeding sliding seat and a feeding guide rail;
the feeding motor is fixedly arranged on the inner side wall of one side of the outer box body;
one end of the feeding screw rod is coaxially and fixedly connected with the end part of a rotating shaft of the feeding motor;
the middle threaded hole of the feeding sliding seat is in threaded connection with the feeding screw; the side surface of the feeding sliding seat is in sliding connection with the feeding guide rail along the axial direction of the feeding screw;
the upper part of the feeding sliding seat is provided with a chuck for clamping a silicon wafer; the chuck comprises an adjusting seat in a U-shaped structure, and an opening of the adjusting seat faces to a furnace mouth of the furnace body; two horizontal clamping plates which are symmetrical up and down are arranged between the two horizontal plates of the adjusting seat; a plurality of clamping columns are symmetrically arranged on the opposite side surfaces of the two horizontal clamping plates along the length direction;
the adjusting seat is provided with an adjusting piece used for controlling the two horizontal clamping plates to synchronously move in opposite directions or synchronously move in back directions;
the outer end face of the vertical plate in the adjusting seat is fixedly connected with the top end of the feeding sliding seat through an L-shaped bracket; and a plugging plate capable of plugging the furnace mouth is arranged on the L-shaped support.
Preferably, the furnace barrel comprises a first furnace barrel and a second furnace barrel which are arranged in bilateral symmetry;
a first connecting flange is arranged at the right end of the first furnace barrel; a second connecting flange is arranged at the left end of the second furnace barrel;
the middle part of the outer side wall of the gas uniform distribution piece is provided with an annular mounting plate; a plurality of connecting holes are uniformly formed in the annular mounting plate along the circumferential direction;
the annular mounting plate is positioned between the first connecting flange and the second connecting flange;
the first connecting flange, the annular mounting plate and the second connecting flange are connected through bolts.
Preferably, an inlet valve is arranged on the gas inlet pipe; a filtering element for filtering gas is arranged on the gas inlet pipe at the front end of the inlet valve;
the filter piece comprises a cylindrical filter cartridge, and a plurality of layers of steel wire filter screens are uniformly embedded in the inner side surface of the filter cartridge along the axial direction;
and two ends of the filter cylinder are connected with the gas inlet pipe through flanges.
Preferably, the feeding screw rod is coaxially connected with a rotating shaft of the feeding motor through a coupler.
Preferably, the feeding guide rail is provided with a limiting sliding chute extending along the axial direction of the feeding screw;
and a limiting sliding block which is in sliding limiting fit with the limiting sliding groove is arranged on one side surface of the feeding sliding seat.
Preferably, the limiting sliding groove is a T-shaped sliding groove, and the limiting sliding block is a T-shaped sliding block.
Preferably, the bottom that is located the centre gripping post on upper portion and the top that is located the centre gripping post of lower part all are provided with the rubber pad.
Preferably, the adjusting part is an adjusting stud, and two ends of the adjusting stud are provided with external threads with opposite turning directions;
two ends of the adjusting stud are respectively in threaded connection with the corresponding horizontal clamping plates;
the top end and the bottom end of the adjusting stud are respectively in rotary connection with corresponding horizontal plates in the adjusting seat;
the horizontal clamping plate is provided with an adjusting sliding block towards one end of the adjusting seat, and an adjusting sliding groove which is in up-down sliding fit with the adjusting sliding block is formed in a vertical plate of the adjusting seat.
Preferably, the adjusting sliding groove is a T-shaped sliding groove, and the adjusting sliding block is a T-shaped sliding block.
Preferably, the top end and the bottom end of the adjusting stud are respectively and rotatably connected with corresponding horizontal plates in the adjusting seat through bearings.
The utility model has the advantages that:
(1) the utility model is provided with the gas uniform distribution piece, and the arrangement of the inner annular uniform distribution cavity of the gas uniform distribution piece firstly reduces the flow velocity of incoming gas in the gas inlet pipe, and prevents the reaction gas from being sprayed onto the silicon chip at a higher speed to influence the generation of the film; second, as a containment and buffer space for the reactant gases; and thirdly, the annular design and the design of the gas uniformly distributed holes uniformly distributed on the inner side of the annular design enable reaction gas to be diffused into the inner cavity of the furnace body from all directions of the circumference, so that the diffusion uniformity of the reaction gas is greatly improved, and the consistency of the thickness of a film generated on a silicon wafer is ensured.
(2) The utility model realizes the linear motion of the feeding slide seat along the axial direction of the feeding screw rod when the feeding motor is started under the sliding limit matching of the limit sliding chute and the limit sliding block and the thread matching of the feeding slide seat and the feeding screw rod, thereby realizing that the chuck clamping the silicon chip is sent into the furnace body and quits from the furnace body; when the clamping head which clamps the silicon wafer enters the furnace body through the furnace mouth, the furnace mouth can be sealed by the plugging plate on the L-shaped support. Therefore, the silicon wafer feeding device has the function of closing the furnace mouth of the furnace body while feeding the silicon wafer into the furnace body.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the application and, together with the description, serve to explain the application and are not intended to limit the application.
FIG. 1 is a schematic perspective view of a diffusion furnace for improving the diffusion uniformity of reaction gas according to the present invention;
FIG. 2 is a schematic perspective view of the feeding mechanism of the present invention;
FIG. 3 is a schematic front view of the feeding mechanism of the present invention;
FIG. 4 is a sectional view taken along line A-A of FIG. 3;
FIG. 5 is a schematic perspective view of the furnace body of the present invention;
FIG. 6 is a schematic sectional view of the furnace body of the present invention;
FIG. 7 is a schematic perspective view of the gas distributor of the present invention;
FIG. 8 is a schematic cross-sectional view of the gas distributor of the present invention;
wherein:
0-outer box; 01-furnace body, 011-furnace cylinder, 0111-first furnace cylinder, 0112-second furnace cylinder, 0113-first connecting flange, 0114-second connecting flange, 0115-exhaust pipe; 012-gas uniform distribution piece, 0121-annular uniform distribution cavity, 0122-gas uniform distribution hole, 0123-gas inlet pipe, 0124-inlet valve, 0125-annular mounting plate; 013-furnace barrel base; 02-furnace mouth;
1-a feeding motor, 2-a feeding screw rod, 3-a feeding sliding seat, 31-a limiting sliding block, 4-a feeding guide rail, 41-a limiting sliding groove, 5-a chuck, 51-an adjusting seat, 511-an adjusting sliding groove, 52-a horizontal clamping plate, 521-an adjusting sliding block, 53-a clamping column, 54-a rubber pad, 55-an adjusting stud, 6-an L-shaped bracket and 7-a plugging plate;
8-filter element, 81-filter cartridge, 82-steel wire filter screen.
Detailed Description
It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
In the present invention, the terms such as "bottom" and "top" are used to indicate the position or positional relationship based on the position or positional relationship shown in the drawings, and are only the terms determined for convenience of describing the structural relationship between the components or elements of the present invention, and are not specific to any component or element of the present invention, and should not be construed as limiting the present invention.
In the present invention, terms such as "connected" and "connected" should be understood in a broad sense, and may be either fixedly connected or integrally connected or detachably connected; may be directly connected or indirectly connected through an intermediate. The meaning of the above terms in the present invention can be determined according to specific situations by persons skilled in the art, and should not be construed as limiting the present invention.
The present invention will be further explained with reference to the drawings and examples.
As shown in fig. 1, a diffusion furnace for improving the diffusion uniformity of a reaction gas includes an outer case 0 and a furnace body 01 disposed inside the outer case 0;
as shown in fig. 5-6, the furnace body 01 comprises a furnace cylinder 011 and a gas uniform distribution piece 012; the furnace barrel 011 is of a horizontal cylinder structure with two ends sealed; one end of the furnace barrel 011 is provided with a furnace opening 02; the furnace barrel 011 is fixedly arranged on the inner bottom surface of the outer box body 0 through a furnace barrel base 013;
as shown in fig. 7-8, the gas uniform distribution piece 012 is a cylindrical structure, and an annular uniform distribution cavity 0121 extending along the axial direction of the cylinder is arranged in the cylinder sidewall of the gas uniform distribution piece 012; a plurality of gas uniform distribution holes 0122 communicated with the annular uniform distribution cavity 0121 are uniformly arranged on the inner side wall of the cylinder of the gas uniform distribution piece 012; a gas inlet pipe 0123 communicated with the annular uniform distribution cavity 0121 is arranged on the outer side wall of the cylinder of the gas uniform distribution piece 012; the annular uniform distribution cavities 0121 are arranged, so that the flow rate of incoming gas in the gas inlet pipe 0123 is reduced, and the reaction gas is prevented from being sprayed onto the silicon wafer at a higher speed to influence the generation of a film; second, as a containment and buffer space for the reactant gases; thirdly, the annular design and the design of the gas uniformly distributed holes uniformly distributed on the inner side of the annular design enable the reaction gas to be diffused into the inner cavity of the furnace body 01 from all directions of the circumference, so that the diffusion uniformity of the reaction gas is greatly improved, and the consistency of the thickness of the generated film is ensured;
the gas uniform distribution piece 012 is coaxially arranged inside the furnace cylinder 011, and through holes for a gas inlet pipe 0123 to pass through are arranged on the side wall of the furnace cylinder 011 and the side wall of the outer box 0;
an exhaust pipe 0115 is arranged on the side wall of the furnace cylinder 011, and the exhaust pipe 0115 extends to the outside of the outer box body 0;
a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body 01 through the furnace opening 02 is arranged on the inner side wall of one side of the outer box body 0;
as shown in fig. 2-4, the feeding mechanism includes a feeding motor 1, a feeding screw 2, a feeding slide 3, and a feeding guide rail 4;
the feeding motor 1 is fixedly arranged on the inner side wall of one side of the outer box body 0;
one end of the feeding screw rod 2 is coaxially and fixedly connected with the end part of a rotating shaft of the feeding motor 1;
the middle threaded hole of the feeding sliding seat 3 is in threaded connection with the feeding screw rod 2; the side surface of the feeding sliding seat 3 is in sliding connection with the feeding guide rail 4 along the axial direction of the feeding screw rod 2;
the upper part of the feeding sliding seat 3 is provided with a chuck 5 for clamping a silicon wafer; the chuck 5 comprises a U-shaped adjusting seat 51, and the opening of the adjusting seat 51 faces to a furnace mouth 02 of the furnace body 01; two horizontal clamping plates 52 which are symmetrical up and down are arranged between the two horizontal plates of the adjusting seat 51; the clamping columns 53 are symmetrically arranged on the opposite side surfaces of the two horizontal clamping plates 52 along the length direction, and the arrangement of the clamping columns 53 ensures that the silicon wafer only has upper and lower clamping points so as to expose more surface area of the silicon wafer in the reaction gas in the furnace body 01 and generate a silicon dioxide film better;
the adjusting seat 51 is provided with an adjusting piece for controlling the two horizontal clamping plates 52 to synchronously move in opposite directions or synchronously move back to back; the two horizontal clamping plates 52 move synchronously in opposite directions to clamp the silicon wafer and move synchronously in opposite directions to loosen the silicon wafer;
the outer end face of a vertical plate in the adjusting seat 51 is fixedly connected with the top end of the feeding sliding seat 3 through an L-shaped bracket 6; the L-shaped bracket 6 is provided with a plugging plate 7 which can plug the furnace mouth 02; when the chuck 5 enters the furnace body 01 through the furnace opening 02, the furnace opening 02 is closed by the plugging plate 7 on the L-shaped support 6, and when the chuck 5 is withdrawn from the furnace body 01, the furnace opening 02 is unsealed by the plugging plate 7.
Preferably, the furnace cylinder 011 comprises a first furnace cylinder 0111 and a second furnace cylinder 0112 which are arranged in a left-right symmetry manner;
the right end of the first furnace cylinder 0111 is provided with a first connecting flange 0113; the left end of the second furnace cylinder 0112 is provided with a second connecting flange 0114;
the middle part of the outer side wall of the gas uniform distribution piece 012 is provided with an annular mounting plate 0125; a plurality of connecting holes are uniformly formed in the annular mounting plate 0125 in the circumferential direction;
the annular mounting plate 0125 is positioned between the first connecting flange 0113 and the second connecting flange 0114;
the first connecting flange 0113, the annular mounting plate 0125 and the second connecting flange 0114 are connected through bolts.
Preferably, an inlet valve 0124 is arranged on the gas inlet pipe 0123; the gas inlet pipe 0123 at the front end of the inlet valve 0124 is provided with a filtering element 8 for filtering gas.
Preferably, the filter element 8 includes a filter cartridge 81 having a cylindrical structure, and a plurality of layers of steel wire filter screens 82 are uniformly embedded in the inner side surface of the filter cartridge 81 along the axial direction;
the two ends of the filter cartridge 82 are flanged with the gas inlet pipe 0123, so as to facilitate the cleaning and replacement of the filter element 8.
Preferably, the feeding screw 2 is coaxially connected with a rotating shaft of the feeding motor 1 through a coupler.
Preferably, the feeding guide rail 4 is provided with a limiting sliding groove 41 extending along the axial direction of the feeding screw 2;
and a limiting slide block 31 which is in sliding limiting fit with the limiting slide groove 41 is arranged on one side surface of the feeding slide seat 3.
Under the sliding limit matching of the limit sliding chute 41 and the limit sliding block 31 and the thread matching of the feeding sliding seat 3 and the feeding screw 2, when the feeding motor 1 is started, the feeding sliding seat 3 can linearly move along the axial direction of the feeding screw 2, so that the chuck 5 holding the silicon wafer can be fed into the furnace body 01 and withdrawn from the furnace body 01.
Preferably, the limiting sliding groove 41 is a T-shaped sliding groove, and the limiting sliding block 31 is a T-shaped sliding block.
Preferably, rubber pads 54 are disposed at the bottom end of the upper clamping column 53 and the top end of the lower clamping column 53 to prevent the clamping column 53 from damaging the silicon wafer.
Preferably, the adjusting part is an adjusting stud 55, and two ends of the adjusting stud 55 are provided with external threads with opposite turning directions;
two ends of the adjusting stud 55 are respectively in threaded connection with the corresponding horizontal clamping plates 52;
the top end and the bottom end of the adjusting stud 55 are respectively and rotatably connected with corresponding horizontal plates in the adjusting seat 51;
an adjusting slide block 521 is arranged at one end of the horizontal clamping plate 52 facing the adjusting seat 51, and an adjusting sliding chute 511 which is in up-and-down sliding fit with the adjusting slide block 521 is arranged on a vertical plate of the adjusting seat 51.
Under the up-and-down sliding fit between the adjusting sliding chute 511 and the adjusting sliding block 521 and the thread fit between the two ends of the adjusting stud 55 and the horizontal clamping plates 52, when the adjusting stud 55 is rotated, the two horizontal clamping plates 52 synchronously move in opposite directions or move in a back direction, the two horizontal clamping plates 52 synchronously move in opposite directions to clamp the silicon wafer, and the silicon wafer is loosened by synchronous movement in the back direction.
Preferably, the adjusting sliding groove 511 is a T-shaped sliding groove, and the adjusting sliding block 521 is a T-shaped sliding block.
Preferably, the top end and the bottom end of the adjusting stud 55 are respectively and rotatably connected with the corresponding horizontal plate in the adjusting seat 51 through bearings.
A diffusion furnace for improving the diffusion uniformity of reaction gas comprises the following specific implementation modes:
in this application the chuck 5 of the feeding mechanism is aligned with the mouth 02 of the furnace body 01.
When the furnace is used, the feeding motor 1 is started firstly, and the chuck 5 is withdrawn from the furnace body 01; then, the adjusting stud 55 is rotated to enable the two horizontal clamping plates 52 to move backwards, so that the distance between the two horizontal clamping plates 52 is increased to facilitate the placement of a silicon wafer; placing a silicon wafer between the clamping columns 53 of the two horizontal clamping plates 52, and then reversely rotating the adjusting studs 55 to enable the two horizontal clamping plates 52 to move oppositely to clamp the silicon wafer; make pay-off motor 1 reversal afterwards, pay-off slide 3 drives chuck 5 and is close to furnace body 01, chuck 5 until the centre gripping has the silicon chip enters into furnace body 01 through fire door 02 in, shutoff board 7 on the L type support 6 can seal fire door 02 this moment, and reactant gas enters into annular equipartition chamber 0121 in the gas equipartition piece 012 after filtering of filter piece 8 in the gas inlet pipe 0123, after annular equipartition chamber 0121's diffusion and cushioning effect, through gas equipartition hole 0122 along each direction of circumference evenly spread to furnace body 01 inner chamber, reactant gas's diffusion homogeneity has greatly been promoted, thereby guarantee to generate the uniformity of film thickness on the silicon chip.
After the completion, the feeding motor 1 is started again, the chuck 5 holding the silicon wafer after the film formation is withdrawn from the furnace body 01, the silicon wafer after the film formation is unloaded, and then the next feeding and silicon wafer processing are waited.
Although the present invention has been described with reference to the accompanying drawings, it is not intended to limit the present invention, and those skilled in the art should understand that, based on the technical solution of the present invention, various modifications or variations that can be made by those skilled in the art without inventive labor are still within the scope of the present invention.
Claims (10)
1. A diffusion furnace for improving the diffusion uniformity of reaction gas comprises an outer box body and a furnace body arranged in the outer box body; it is characterized in that the utility model is characterized in that,
the furnace body comprises a furnace barrel and a gas uniform distribution piece; the furnace cylinder is of a horizontal cylinder structure with two ends sealed; one end of the furnace cylinder is provided with a furnace opening; the furnace barrel is fixedly arranged on the inner bottom surface of the outer box body through a furnace barrel base;
the gas uniform distribution piece is of a cylindrical structure, and an annular uniform distribution cavity extending along the axial direction of the cylinder is arranged in the side wall of the cylinder of the gas uniform distribution piece; a plurality of gas uniform distribution holes communicated with the annular uniform distribution cavity are uniformly formed in the inner side wall of the cylinder of the gas uniform distribution piece; a gas inlet pipe communicated with the annular uniform distribution cavity is arranged on the outer side wall of the cylinder of the gas uniform distribution piece;
the gas uniform distribution piece is coaxially arranged inside the furnace cylinder, and through holes for a gas inlet pipe to pass through are formed in the side wall of the furnace cylinder and the side wall of the outer box body;
an exhaust pipe is arranged on the side wall of the furnace cylinder and extends to the outside of the outer box body;
a feeding mechanism capable of feeding the silicon wafer into the inner cavity of the furnace body through the furnace opening is arranged on the inner side wall of one side of the outer box body;
the feeding mechanism comprises a feeding motor, a feeding screw rod, a feeding sliding seat and a feeding guide rail;
the feeding motor is fixedly arranged on the inner side wall of one side of the outer box body;
one end of the feeding screw rod is coaxially and fixedly connected with the end part of a rotating shaft of the feeding motor;
the middle threaded hole of the feeding sliding seat is in threaded connection with the feeding screw; the side surface of the feeding sliding seat is in sliding connection with the feeding guide rail along the axial direction of the feeding screw;
the upper part of the feeding sliding seat is provided with a chuck for clamping a silicon wafer; the chuck comprises an adjusting seat in a U-shaped structure, and an opening of the adjusting seat faces to a furnace mouth of the furnace body; two horizontal clamping plates which are symmetrical up and down are arranged between the two horizontal plates of the adjusting seat; a plurality of clamping columns are symmetrically arranged on the opposite side surfaces of the two horizontal clamping plates along the length direction;
the adjusting seat is provided with an adjusting piece used for controlling the two horizontal clamping plates to synchronously move in opposite directions or synchronously move in back directions;
the outer end face of the vertical plate in the adjusting seat is fixedly connected with the top end of the feeding sliding seat through an L-shaped bracket; and a plugging plate capable of plugging the furnace mouth is arranged on the L-shaped support.
2. The diffusion furnace of claim 1, wherein the furnace shaft comprises a first furnace shaft and a second furnace shaft symmetrically arranged in left and right directions;
a first connecting flange is arranged at the right end of the first furnace barrel; a second connecting flange is arranged at the left end of the second furnace barrel;
the middle part of the outer side wall of the gas uniform distribution piece is provided with an annular mounting plate; a plurality of connecting holes are uniformly formed in the annular mounting plate along the circumferential direction;
the annular mounting plate is positioned between the first connecting flange and the second connecting flange;
the first connecting flange, the annular mounting plate and the second connecting flange are connected through bolts.
3. The diffusion furnace for improving the diffusion uniformity of the reaction gas as claimed in claim 1, wherein an inlet valve is provided on the gas inlet pipe; a filtering element for filtering gas is arranged on the gas inlet pipe at the front end of the inlet valve;
the filter piece comprises a cylindrical filter cartridge, and a plurality of layers of steel wire filter screens are uniformly embedded in the inner side surface of the filter cartridge along the axial direction;
and two ends of the filter cylinder are connected with the gas inlet pipe through flanges.
4. The diffusion furnace of claim 1, wherein the feed screw is coaxially connected to a rotary shaft of the feed motor through a coupling.
5. The diffusion furnace according to claim 1, wherein the feed guide rail is provided with a limit chute extending in an axial direction of the feed screw;
and a limiting sliding block which is in sliding limiting fit with the limiting sliding groove is arranged on one side surface of the feeding sliding seat.
6. The diffusion furnace of claim 5, wherein the position-limiting sliding groove is a T-shaped sliding groove, and the position-limiting sliding block is a T-shaped sliding block.
7. The diffusion furnace of claim 1, wherein rubber pads are provided at the bottom end of the upper holding pillars and at the top end of the lower holding pillars.
8. The diffusion furnace of claim 1, wherein the adjusting member is an adjusting stud, and both ends of the adjusting stud are provided with external threads with opposite rotation directions;
two ends of the adjusting stud are respectively in threaded connection with the corresponding horizontal clamping plates;
the top end and the bottom end of the adjusting stud are respectively in rotary connection with corresponding horizontal plates in the adjusting seat;
the horizontal clamping plate is provided with an adjusting sliding block towards one end of the adjusting seat, and an adjusting sliding groove which is in up-down sliding fit with the adjusting sliding block is formed in a vertical plate of the adjusting seat.
9. The diffusion furnace of claim 8, wherein the adjusting chute is a T-shaped chute and the adjusting slide is a T-shaped slide.
10. The diffusion furnace of claim 8, wherein the top end and the bottom end of the adjusting stud are rotatably connected to the corresponding horizontal plate of the adjusting seat through bearings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022389336.5U CN213357737U (en) | 2020-10-24 | 2020-10-24 | Diffusion furnace for improving diffusion uniformity of reaction gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022389336.5U CN213357737U (en) | 2020-10-24 | 2020-10-24 | Diffusion furnace for improving diffusion uniformity of reaction gas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213357737U true CN213357737U (en) | 2021-06-04 |
Family
ID=76131994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022389336.5U Active CN213357737U (en) | 2020-10-24 | 2020-10-24 | Diffusion furnace for improving diffusion uniformity of reaction gas |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213357737U (en) |
-
2020
- 2020-10-24 CN CN202022389336.5U patent/CN213357737U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI704638B (en) | Door opening device, transfer chamber and semiconductor processing equipment | |
| EP4120331A1 (en) | Chuck structure of semiconductor cleaning device and semiconductor cleaning device | |
| US20150030766A1 (en) | Pedestal bottom clean for improved fluorine utilization and integrated symmetric foreline | |
| WO2020124544A1 (en) | Vacuum degreasing and sintering furnace and usage method therefor | |
| US20090017637A1 (en) | Method and apparatus for batch processing in a vertical reactor | |
| CN107548515A (en) | Processing set group comprising flow insulated ring | |
| CN105821393A (en) | Atomic layer deposition of films using spatially separated injector chamber | |
| CN213357737U (en) | Diffusion furnace for improving diffusion uniformity of reaction gas | |
| JP6056673B2 (en) | Gas processing equipment | |
| TWI733196B (en) | Air intake device and atomic layer deposition equipment for atomic layer deposition process | |
| CN213357738U (en) | Diffusion furnace convenient to move | |
| CN110408910A (en) | High-throughput vapor deposition apparatus and vapor deposition method | |
| CN213273775U (en) | Material feeding unit for diffusion furnace | |
| US4976610A (en) | Purge cantilevered wafer loading system for LP CVD processes | |
| KR20130013345A (en) | Horizontal equipment for plasma thermal spray and horizontal plasma thermal spraying method thereby | |
| CN112828633B (en) | Magnetorheological flexible clamp for thin-walled part with any appearance | |
| CN110249073A (en) | Diffuser design for flowable CVD | |
| TW201833378A (en) | Integration of dual remote plasmas sources for flowable cvd | |
| WO2019124101A1 (en) | Film-forming device | |
| CN213357742U (en) | Chemical vapor deposition device convenient to remove | |
| JP2002280373A (en) | Substrate processing apparatus | |
| CN114783907B (en) | Silicon wafer reaction equipment | |
| CN213133597U (en) | Novel pug deironing device | |
| JPH09162135A (en) | Longitudinal direction type diffusion furnace and cap that is used for it | |
| CN218471923U (en) | Wafer adsorption device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |