CN213063901U - System for providing vacuum environment for titanium sponge electrode welding equipment - Google Patents
System for providing vacuum environment for titanium sponge electrode welding equipment Download PDFInfo
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- CN213063901U CN213063901U CN202021839462.XU CN202021839462U CN213063901U CN 213063901 U CN213063901 U CN 213063901U CN 202021839462 U CN202021839462 U CN 202021839462U CN 213063901 U CN213063901 U CN 213063901U
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Abstract
The utility model belongs to the technical field of vacuum system, especially, relate to a system for provide vacuum environment for titanium sponge electrode welding equipment. The method shortens the time of vacuumizing the whole system and accelerates the production progress. The device comprises a first mechanical pump, a second mechanical pump, a first roots pump and a second roots pump; the first mechanical pump and the second mechanical pump are connected in parallel and then are used as a primary pump to be connected with the first roots pump through a vacuum pipeline, and the first roots pump is used as a secondary vacuum pump to be connected with the second roots pump through a vacuum pipeline; the second roots pump is used as a three-stage vacuum pump and is connected with the furnace chamber through a vacuum pipeline.
Description
Technical Field
The utility model belongs to the technical field of vacuum system, especially, relate to a system for provide vacuum environment for titanium sponge electrode welding equipment.
Background
With the development of material technology, the smelting and processing technology of titanium and titanium alloy is mature. A series of advantages of high strength, small density and the like of titanium are gradually reflected, and titanium alloy are more and more widely applied in the industrial and living fields, so that the replacement of steel by titanium and the replacement of aluminum by titanium gradually become a trend. The productivity of the device is improved and is not easy to be improved for welding the sponge titanium electrode which is an indispensable procedure for smelting the sponge titanium. As for a vacuum plasma welding box of main equipment for titanium sponge welding, the production time mainly comprises two parts of vacuumizing time and welding time, and measures can be taken only from the aspect of compressing and vacuumizing time for improving the productivity under the condition of not increasing an ion beam gun used for titanium sponge welding.
At present, a used vacuum system consists of two-stage vacuum pumps, two H150D mechanical pumps and 1 ZJP1200 roots pump, the span of the mechanical pump and the roots pump is too large, the starting response time of the roots pump is longer during vacuumizing, the requirement on the mechanical pump is higher, the vacuumizing speed is slower, and the production progress is seriously influenced.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a system for providing a vacuum environment for a vacuum plasma welding box of titanium sponge electrode welding equipment.
In order to achieve the above object, the present invention adopts the following technical solution, which is characterized by comprising a first mechanical pump, a second mechanical pump, a first roots pump and a second roots pump.
The first mechanical pump and the second mechanical pump are connected in parallel (in parallel) and then are used as a primary pump to be connected with the first roots pump through a vacuum pipeline, and the first roots pump is used as a secondary vacuum pump to be connected with the second roots pump through the vacuum pipeline; the second roots pump is used as a three-stage vacuum pump and is connected with the furnace chamber through a vacuum pipeline.
Furthermore, a parallel branch (parallel branch) formed by connecting the first mechanical pump and the second mechanical pump in parallel is connected with the first roots pump in series to form a series vacuum pipeline, and the series vacuum pipeline of the mechanical pump and the first roots pump is provided with an access hole.
Furthermore, a parallel branch (parallel branch) formed by connecting the first mechanical pump and the second mechanical pump in parallel is connected with the first roots pump in series to form a series vacuum pipeline, and a vacuum breaking valve is arranged on the series vacuum pipeline of the mechanical pump and the first roots pump.
Furthermore, the vacuum pipelines of the first roots pump and the second roots pump are provided with access ports.
Further, a butterfly valve is arranged between the second roots pump and the furnace chamber.
Further, the furnace chamber is provided with a vacuum gauge.
Further, the first mechanical pump and the second mechanical pump adopt an H150D mechanical pump; the first lobe pump adopts ZJP600B lobe pump, and the second lobe pump adopts ZJP1200 lobe pump.
Furthermore, the diameter of the vacuum pipeline between the ZJP1200 Roots pump and the ZJP600B Roots pump is DN250, the diameter of the vacuum pipeline in series between the ZJP600B Roots pump and the H150D mechanical pump is DN200, and the diameter of the vacuum pipeline between the two H150D mechanical pumps is DN 100.
Further, the access port uses a stainless steel interface of KF 16.
Further, the butterfly valve adopts a vacuum pneumatic butterfly valve.
Furthermore, the pumping speed ratio of the three-stage vacuum pump is 4:2:1 (1200L/S, 600L/S, 2X 150L/S).
Compared with the prior art, the invention has the beneficial effects.
The utility model discloses increase the lobe pump of one-level transition on original two-stage vacuum pump system's basis, shortened the vacuum interval of mechanical pump work, shortened ZJP1200 lobe pump 3's start-up time, shortened the time of entire system evacuation for the production progress.
Drawings
The invention is further described with reference to the following figures and detailed description. The scope of the invention is not limited to the following expressions.
Fig. 1 is a schematic diagram of a vacuum system with a three-stage configuration according to the present invention.
Fig. 2 is a mounting diagram of the vacuum system of the three-stage configuration of the present invention.
In the figure, 1 is H150D mechanical pump, 2 is ZJP600B roots pump, 3 is ZJP1200 roots pump, 4 is DN250 butterfly valve, 5 is PSG500 vacuum gauge, 6 is KF16 service hole.
Detailed Description
As shown in fig. 1-2, the present invention comprises a first mechanical pump, a second mechanical pump, a first roots pump and a second roots pump.
The first mechanical pump and the second mechanical pump are connected in parallel (in parallel) and then are used as a primary pump to be connected with the first roots pump through a vacuum pipeline, and the first roots pump is used as a secondary vacuum pump to be connected with the second roots pump through the vacuum pipeline; the second roots pump is used as a three-stage vacuum pump and is connected with the furnace chamber through a vacuum pipeline.
Preferably, a parallel branch (parallel branch) formed by connecting the first mechanical pump and the second mechanical pump in parallel is connected with the first roots pump in series to form a series vacuum pipeline, and the series vacuum pipeline of the mechanical pump and the first roots pump is provided with an access hole.
Preferably, a parallel branch (parallel branch) formed by connecting the first mechanical pump and the second mechanical pump in parallel is connected with the first roots pump in series to form a series vacuum pipeline, and a vacuum breaking valve is arranged on the series vacuum pipeline of the mechanical pump and the first roots pump.
Preferably, the vacuum pipelines of the first roots pump and the second roots pump are provided with access ports.
Preferably, a butterfly valve is arranged between the second roots pump and the furnace chamber.
Preferably, the furnace chamber is provided with a vacuum gauge.
Preferably, the first mechanical pump and the second mechanical pump adopt an H150D mechanical pump 1; the first lobe pump adopts ZJP600B lobe pump 2, and the second lobe pump adopts ZJP1200 lobe pump 3.
More preferably, the diameter of the vacuum pipe between the ZJP1200 roots pump 3 and the ZJP600B roots pump 2 is DN250, the diameter of the vacuum pipe in series between the ZJP600B roots pump 2 and the H150D mechanical pump 1 is DN200, and the diameter of the vacuum pipe between the two H150D mechanical pumps 1 is DN 100.
More preferably, the access opening employs a stainless steel interface of KF 16.
More preferably, the butterfly valve is a vacuum pneumatic butterfly valve.
Preferably, the pumping speed ratio of the three-stage vacuum pump is 4:2:1 (1200L/S, 600L/S, 2X 150L/S).
Specifically, as shown in fig. 2, the vacuum system of the three-stage configuration of the present invention includes ZJP1200 roots pump 3, ZJP600B roots pump 2, H150D mechanical pump 1; 1 Roots pump and 2 mechanical pumps are respectively arranged in the two models; the mechanical pump and the roots pump are connected through an on-site vacuum pipe; the starting of the Roots pump is controlled by the vacuum degree condition set by the PLC program.
Preferably, the proportion of the three-stage vacuum pump is more compact, the pumping speed of the two mechanical pumps is 300L/S, the pumping speed of the first-stage roots pump is 600L/S, the pumping speed of the second-stage roots pump is 1200L/S, and the span is smaller.
Preferably, the pumping speed ratio of the three-stage vacuum pump is 4:2:1, and the pumping speed ratio is more reasonable.
Preferably, the response of the proportioning roots pump of the three-stage vacuum pump is faster, and the time for pumping the vacuum degree of the system is shorter.
Preferably, the starting vacuum degree of the roots pump is adjustable, and the vacuumizing time of the system can be adjusted according to the process setting.
The H150D mechanical pump 1 and the ZJP600B Roots pump 2 and the ZJP1200 Roots pump 3 are tightly connected through vacuum pipes in the sequence shown in the figure. When the vacuum pumping is carried out, the furnace chamber is vacuumized from the atmospheric pressure, the mechanical pump is started firstly, the vacuum degree is pumped to 2000 Pa, then the roots pump is started after the starting condition of the ZJP600B roots pump 2 is met, the working interval of the ZJP600B roots pump 2 is 2000-700 Pa, and when the vacuum degree reaches 700 Pa, the ZJP1200 roots pump 3 is started, so that higher vacuum degree and faster pumping speed are realized.
The utility model discloses the tertiary pump passes through seamless steel welded vacuum pipe connection, detachable flange bolted connection.
The utility model discloses the stainless steel interface of welding KF16 is used for equipment problem investigation on the vacuum pipeline of tertiary vacuum pump behind every level of pump. And a vacuum pneumatic butterfly valve is not arranged between the three-stage vacuum pumps, and only one pneumatic butterfly valve is arranged on a main pipeline between the ZJP1200 roots pump and the furnace chamber and used for cutting off the relation between the vacuum system and the furnace chamber and detecting the leakage rate of the furnace chamber. The utility model discloses three level vacuum pump's vacuum pipe diameter configuration is as diameter DN250 between ZJP1200 and ZJP600B, DN200 between ZJP600B to H150D tee bend, vacuum pipe DN100 between two H150D mechanical pumps.
The utility model discloses the start-up vacuum of two-stage roots pump can be set for wantonly according to the feedback parameter of stove room vacuum gauge in the PLC procedure among the tertiary vacuum system. The starting vacuum degree of the two-stage roots pump can be set at will according to the vacuumizing time required by the process.
The configuration of the three-stage vacuum pump is more compact. The other scheme is to select 2H 150D mechanical pumps, 1 ZJP1200 roots pump and 1 ZJP2500 roots pump, so that the starting response time of the ZJP1200 roots pump is longer, and the effect of shortening the vacuum-pumping time of the equipment is not obvious. The three-stage vacuum pump is reasonable in proportion, and the working vacuum degree interval of the two-stage vacuum pump is reasonable.
The utility model discloses an use the ultimate vacuum degree that has improved equipment, the ultimate vacuum degree of tertiary vacuum pump configuration has improved an order of magnitude before than.
The utility model discloses an use and can set up the start vacuum of two-stage lobe pump by oneself on the procedure, the time of evacuation can be adjusted according to the needs of system.
It should be understood that the detailed description of the present invention is only for illustrating the present invention and is not limited by the technical solutions described in the embodiments of the present invention, and those skilled in the art should understand that the present invention can be modified or substituted equally to achieve the same technical effects; as long as the use requirements are met, the method is within the protection scope of the invention.
Claims (8)
1. A system for providing a vacuum environment for titanium sponge electrode welding equipment is characterized by comprising a first mechanical pump, a second mechanical pump, a first roots pump and a second roots pump;
the first mechanical pump and the second mechanical pump are connected in parallel and then are used as a primary pump to be connected with the first roots pump through a vacuum pipeline, and the first roots pump is used as a secondary vacuum pump to be connected with the second roots pump through a vacuum pipeline; the second roots pump is used as a three-stage vacuum pump and is connected with the furnace chamber through a vacuum pipeline.
2. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 1, wherein: and the vacuum pipelines of the first roots pump and the second roots pump are provided with access holes.
3. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 1, wherein: and a butterfly valve is arranged between the second roots pump and the furnace chamber.
4. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 1, wherein: the furnace chamber is provided with a vacuum gauge.
5. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 1, wherein: the first mechanical pump and the second mechanical pump adopt H150D mechanical pumps; the first lobe pump adopts ZJP600B lobe pump, and the second lobe pump adopts ZJP1200 lobe pump.
6. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 1, wherein: the diameter of a vacuum pipeline between a ZJP1200 roots pump and a ZJP600B roots pump is DN250, the diameter of a serial vacuum pipeline between a ZJP600B roots pump and an H150D mechanical pump is DN200, and the diameter of a vacuum pipeline between two H150D mechanical pumps is DN 100.
7. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as recited in claim 2, wherein: the access hole adopts a stainless steel interface of KF 16.
8. The system for providing a vacuum environment for a titanium sponge electrode welding apparatus as set forth in claim 3, wherein: the butterfly valve adopts a vacuum pneumatic butterfly valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021839462.XU CN213063901U (en) | 2020-08-28 | 2020-08-28 | System for providing vacuum environment for titanium sponge electrode welding equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021839462.XU CN213063901U (en) | 2020-08-28 | 2020-08-28 | System for providing vacuum environment for titanium sponge electrode welding equipment |
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| CN213063901U true CN213063901U (en) | 2021-04-27 |
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| CN202021839462.XU Active CN213063901U (en) | 2020-08-28 | 2020-08-28 | System for providing vacuum environment for titanium sponge electrode welding equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115253645A (en) * | 2022-08-26 | 2022-11-01 | 湖南顶立科技有限公司 | Vacuum guarantee and tail gas treatment integrated system and using method thereof |
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2020
- 2020-08-28 CN CN202021839462.XU patent/CN213063901U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115253645A (en) * | 2022-08-26 | 2022-11-01 | 湖南顶立科技有限公司 | Vacuum guarantee and tail gas treatment integrated system and using method thereof |
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