CN212947226U - Retaining ring - Google Patents
Retaining ring Download PDFInfo
- Publication number
- CN212947226U CN212947226U CN202021858440.8U CN202021858440U CN212947226U CN 212947226 U CN212947226 U CN 212947226U CN 202021858440 U CN202021858440 U CN 202021858440U CN 212947226 U CN212947226 U CN 212947226U
- Authority
- CN
- China
- Prior art keywords
- ring
- groove
- retaining ring
- annular groove
- annular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The utility model provides a retaining ring, which comprises an elastic ring and a rigid ring; an annular groove is formed in the center of the rigid ring; the elastic ring is provided with an annular boss matched with the annular groove of the rigid ring, and the annular boss is provided with a first groove and a second groove, so that the bonding area of the rigid ring and the elastic ring is increased, and the service life of the retaining ring is prolonged; meanwhile, the retaining ring is simple in structure, easy to process and good in application prospect.
Description
Technical Field
The utility model relates to a semiconductor technology field especially relates to chemical mechanical polishing technical field, in particular to retaining ring.
Background
As microelectronic devices, such as those formed on semiconductor substrates, become more densely integrated, the material layers used for planarization of the material layers used to fabricate such devices become increasingly critical. That is, because highly integrated semiconductor devices typically include stacked material layers and associated interconnects, the upper surface flatness and regular thickness of the material layers are critical design parameters. Any non-uniformity or irregularity of the substrate or intermediate material layers will affect the performance of the microelectronic device or semiconductor.
Therefore, the planarization process is applied at various stages in the sequence of the manufacturing process of manufacturing the semiconductor device. Planarization processes are used to minimize irregularities and thickness variations in the substrate layer or intermediate material layer.
Chemical Mechanical Polishing (CMP) is a process commonly used in semiconductor manufacturing to planarize or polish layers of material deposited on a wafer. In the chemical mechanical polishing process, in order to prevent the wafer from flying out during the chemical mechanical polishing, a retaining ring needs to be fixed on a carrier head of the chemical mechanical polishing device.
The existing retaining ring is formed by bonding a rigid material ring and an elastic material ring together through a specific adhesive, and the structure has the advantages that the bonding area is small, the degumming phenomenon is easy to occur in the use process, and in the polishing process, the adhesive on the bonding surface is easy to be in direct contact with external chemical substances such as deionized water, polishing solution and the like, so after a plurality of polishing cycles, due to the corrosion effect of the chemical solution, the adhesive on the bonding surface is damaged, the upper layer and the lower layer of materials are separated, the service life of the retaining ring is shortened, and therefore, more researches are made for prolonging the service life of the retaining ring.
CN110230684A discloses a retaining ring for axially retaining a ring gear in a housing. The retaining ring has an opening, and a surface of the retaining ring abutting against an end face of the ring gear is provided with a damping structure. The surface of the retainer ring opposite to the surface abutting against the ring gear is provided with a chamfer on the outside in the radial direction, but the retainer ring is not aware of the problem of the adhesive strength between the rigid ring and the elastic ring.
CN209425232U discloses a new retaining ring, which comprises a retaining ring, wherein the upper surface of the retaining ring is provided with at least three first strip-shaped grooves arranged obliquely, and the lower surface of the retaining ring is provided with at least three bolt holes; the retaining ring comprises an annular body made of stainless steel, and a plastic layer is wrapped outside the annular body. The utility model discloses a this design provides a novel retaining ring, the outer plastic layer that wraps up of ring body made through the stainless steel, and the surface of ring body is equipped with a plurality of strip recesses, and after moulding plastics through the injection molding machine, the plastic layer is more stable with being connected between the ring body, has strengthened structural strength, has improved life, has reduced manufacturing cost simultaneously, but this retaining ring structure is complicated, and the processing degree of difficulty is big.
CN108857909A discloses a processing method for a CMP retaining ring bonding surface and a preparation method for the CMP retaining ring, wherein the bonding surface of the CMP retaining ring is treated by adopting a sand blasting process, so that the roughness of the bonding surface reaches 7.0-7.2 mu m. The treatment method is simple and convenient to operate, is rapid and efficient, and can enable the bonding surface of the retaining ring to reach appropriate roughness, so that the bonding strength is ensured, the roughness of the bonding surface is improved, a good bonding effect is difficult to achieve, and the problem of infirm bonding still exists.
Therefore, it is necessary to develop a retaining ring which has a simple structure, is not easily removed, and is firmly bonded.
SUMMERY OF THE UTILITY MODEL
In view of the problem that exists among the prior art, the utility model provides a retaining ring, retaining ring has increased the bonding area of rigidity ring and elasticity ring through set up first recess and second recess on the annular boss at the elasticity ring, has increased horizontal adhesion, has improved the life of retaining ring, and application prospect is wide.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a retaining ring, which comprises an elastic ring and a rigid ring; an annular groove is formed in the center of the rigid ring; the elastic ring is provided with an annular boss matched with the annular groove of the rigid ring, and the annular boss is provided with a first groove and a second groove.
On one hand, the retaining ring provided by the utility model increases the bonding area by arranging the annular boss on the elastic ring to be matched with the annular groove of the rigid ring, so that the retaining ring is not easy to degum; on the other hand, be provided with first recess and second recess on the annular boss, can fill the adhesive in first recess and the second recess, and fill in the adhesive in first recess and second recess be difficult for contacting with chemical matters such as polishing solution and deionized water, can prevent effectively that the adhesive from being corroded in the polishing process to the life of retaining ring has been improved, can use in the polishing technical field betterly.
The utility model discloses set up annular boss on the elastic ring, can effectively avoid setting up annular groove on the elastic ring and lead to elastic ring thickness thinner to the elastic ring breakdown problem that arouses.
Preferably, the end of the annular groove far away from the bottom is a narrow end; one end of the annular groove close to the bottom is a wide part end; the wide end is wider than the narrow end.
The utility model discloses it is preferred the width at annular groove both ends is inequality and the width in the outside is narrower than the width of bottom, realizes the cooperation structure that inlays mutually of similar elasticity ring and rigidity ring.
Preferably, the elastic ring is made of polyphenylene sulfide, polybutylene terephthalate, polyetheretherketone, polytetrafluoroethylene or polyethylene terephthalate, and is preferably polyphenylene sulfide.
Preferably, the material of the rigid ring is stainless steel, ceramic or aluminum alloy, preferably stainless steel 304.
Preferably, the depth of the annular groove is 1.5-1.7 mm, and may be 1.5mm, 1.52mm, 1.53mm, 1.54mm, 1.55mm, 1.58mm, 1.6mm, 1.62mm, 1.63mm, 1.65mm, 1.68mm, 1.7mm, or the like, for example.
The utility model discloses the degree of depth of preferred annular groove is 1.5 ~ 1.7mm, can prevent the not enough problem of intensity that the groove depth of rigidity ring is too dark to bring in the enough bonding area of assurance.
Preferably, the fit clearance between the annular groove on the rigid ring and the annular boss on the elastic ring is 0.1-0.3 mm, and may be, for example, 0.1mm, 0.12mm, 0.15mm, 0.18mm, 0.19mm, 0.2mm, 0.22mm, 0.23mm, 0.25mm, 0.28mm, 0.3mm, or the like.
The fit clearance is the clearance of the retaining ring after the annular groove of the rigid ring is matched with the annular boss of the elastic ring.
The utility model discloses annular boss and annular groove's fit clearance control is at 0.1 ~ 0.3mm, reserves sufficient clearance for the adhesive to the weight of adhesive between the guarantee clearance ensures the bonding effect of elasticity ring and rigidity ring.
Preferably, the wide end is 0.5-1.5 mm wider than the narrow end, and may be, for example, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, or the like.
The utility model discloses it is preferred annular groove's wide end is than narrow portion end wide 0.5 ~ 1.5mm, realizes the matched stack that elasticity ring and rigidity ring inlayed mutually, can increase the bonding force of elasticity ring and rigidity ring better, improves the firmness that bonds.
Preferably, the width of the wide end is 19-20 mm, such as 19mm, 19.2mm, 19.3mm, 19.4mm, 19.5mm, 19.6mm, 19.7mm, 19.8mm, 19.9mm or 20 mm.
The width of the narrow end is 18-19.5 mm, for example, 18mm, 18.1mm, 18.2mm, 18.3mm, 18.4mm, 18.5mm, 18.6mm, 18.7mm, 18.8mm, 18.9mm, 19mm, 19.2mm or 19.5 mm.
Preferably, the annular groove is rounded at the junction of the bottom and the periphery.
The annular groove is provided with a round angle at the joint of one end far away from the bottom and the rigid ring.
The utility model discloses preferably all set up to the fillet with annular groove in the bottom with the linking department of week portion and keep away from the linking department of bottom one end and rigidity ring, compare in the closed angle transition and can avoid the blind spot, the bonding agent of being convenient for fills up annular boss and annular groove's clearance, has improved the firmness of bonding.
Preferably, the radius of the fillet at the junction of the bottom and the periphery is 0.3-0.5 mm, such as 0.3mm, 0.32mm, 0.35mm, 0.36mm, 0.38mm, 0.4mm, 0.42mm, 0.45mm, 0.48mm, or 0.5 mm.
Preferably, the radius of the round corner at the joint of the end far away from the bottom and the rigid ring is 0.5-0.6 mm, such as 0.5mm, 0.51mm, 0.52mm, 0.53mm, 0.54mm, 0.55mm, 0.56mm, 0.57mm, 0.58mm, 0.59mm or 0.6 mm.
The utility model discloses the radius control of preferred fillet can enough avoid the adhesive blind spot at above-mentioned within range, can realize the structure that rigid ring and elastic ring the two inlayed mutually through the fillet at both ends again.
Preferably, the surface roughness of the annular groove and the annular boss is 4.0-8.0 μm, such as 4.0 μm, 4.2 μm, 4.3 μm, 4.5 μm, 4.8 μm, 5.0 μm, 5.2 μm, 5.5 μm, 5.6 μm, 5.8 μm, 6 μm, 6.5 μm, 7 μm, 7.5 μm, 8 μm, or the like.
The surface roughness of the annular groove and the annular boss is controlled to be 4.0-8.0 microns through sand blasting, so that the bonding of an adhesive is facilitated, and the bonding force of the elastic ring and the rigid ring is improved.
Preferably, the gap between the elastic ring and the rigid ring is filled with adhesive.
And adhesives are filled in the first groove and the second groove.
Preferably, the total mass of the adhesive is equal to or greater than 12g, and may be, for example, 12g, 13g, 14g, 15g, 16g, 17g, 18g, or the like.
Preferably, the adhesive comprises any one of, or a combination of at least two of, epoxy-polyamide or polyurethane, with typical but non-limiting combinations being: a combination of epoxy and epoxy-polyamide, a combination of epoxy and polyurethane, and a combination of epoxy-polyamide and polyurethane.
Preferably, the first groove and the second groove are axially symmetrically distributed along the center line of the annular boss.
The first groove and the second groove are the same in size.
Preferably, the width of the first groove is 0.7-1.5 mm, such as 0.7mm, 0.75mm, 0.78mm, 0.79mm, 0.8mm, 0.82mm, 0.85mm, 0.9mm, 0.95mm, 1.0mm, 1.05mm, 1.1mm, 1.15mm, 1.2mm, 1.25mm, 1.3mm, 1.35mm, 1.4mm, 1.45mm, 1.5mm, etc.
Preferably, the depth of the first groove is 0.5-0.7 mm, such as 0.5mm, 0.52mm, 0.53mm, 0.55mm, 0.58mm, 0.6mm, 0.62mm, 0.65mm, 0.68mm, or 0.7 mm.
Compared with the prior art, the utility model discloses following beneficial effect has at least:
(1) the retaining ring provided by the utility model can effectively prevent the adhesive on the bonding surface from directly contacting with external deionized water, polishing solution and other chemical substances, and can effectively prevent degumming;
(2) the retaining ring provided by the utility model increases the bonding area and strengthens the transverse tension by adopting the arrangement of the groove and the boss, thereby improving the bonding force between the elastic ring and the rigid ring and prolonging the service life of the retaining ring;
(3) the utility model provides a keep ring simple structure, processing is easy.
Drawings
Fig. 1 is a schematic view of a retaining ring provided by the present invention.
Fig. 2 is a partially enlarged view of a portion a in fig. 1.
Fig. 3 is a schematic view of an elastic ring in a retaining ring according to the present invention.
Fig. 4 is a partially enlarged view of a portion B in fig. 3.
Fig. 5 is a partially enlarged view of a portion C in fig. 4.
Fig. 6 is a schematic view of a rigid ring in a retaining ring provided by the present invention.
Fig. 7 is a partially enlarged view of a portion D in fig. 6.
In the figure: 1-an elastic ring; 101-an annular boss; 102-a first groove; 103-a second groove; 2-a rigid ring; 201-annular groove; 202-a threaded hole; 3-adhesive.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
The present invention will be described in further detail below. However, the following examples are only simple examples of the present invention, and do not represent or limit the scope of the present invention, which is defined by the appended claims.
The utility model provides a retaining ring, as shown in figure 1, the retaining ring includes elastic ring 1 and rigid ring 2.
As shown in fig. 3, the elastic ring 1 is provided with an annular boss 101 matching with an annular groove 201 of the rigid ring 2, as shown in fig. 4 and 5, the annular boss 101 includes a narrow end and a wide end, corners of the annular boss 101 are rounded, and the annular boss 101 is provided with a first groove 102 and a second groove 103 which have the same size and are axially symmetrically distributed along a center line of the annular boss 101.
As shown in fig. 6, an annular groove 201 is formed in the rigid ring 2 at a central position; as shown in fig. 7, the end of the annular groove 201 away from the bottom is a narrow end; one end of the annular groove 201 close to the bottom is a wide part end; the joint of one end of the annular groove 201 far away from the bottom and the rigid ring 2 is provided with a fillet, and the joint of the bottom and the periphery of the annular groove 201 is provided with a fillet; the back of the side of the rigid ring 2 away from the elastic ring 1 is provided with a threaded hole 202.
As shown in fig. 2, the first groove 102, the second groove 103, and the fit clearance between the annular groove 201 and the annular boss 101 are filled with an adhesive 3.
First, an embodiment
Example 1
The present embodiment provides a retaining ring, which, as shown in fig. 1, includes an elastic ring 1 and a rigid ring 2.
The material of elasticity ring 1 is stainless steel 304, and its thickness is 6.98mm, and the internal diameter is 198.7mm, and the external diameter is 249.9mm, as shown in fig. 3, be provided with the annular boss 101 with the annular groove 201 assorted of rigid ring 2 on the elasticity ring 1, the height of annular boss 101 is 1.60mm, as shown in fig. 4 and 5, the width of the narrow end of annular boss 101 is 18.6mm, and the width of wide end is 19.35mm, the corner of annular boss 101 sets up to the fillet, and the radius of R1 is 0.4mm, and the radius of R2 is 0.55mm, be provided with the size on the annular boss 101 the same and follow first recess 102 and the second recess 103 that annular boss 101 central line is axial symmetry distribution, the degree of depth of first recess 102 and second recess 103 is 0.6mm, and the width is 1 mm.
The rigid ring 2 is made of polyphenylene sulfide, the thickness of the rigid ring is 11.88mm, the inner diameter of the rigid ring is 198.7mm, and the outer diameter of the rigid ring is 249.9mm, as shown in fig. 6, an annular groove 201 is formed in the central position of the rigid ring 2, and the depth of the annular groove 201 is 1.65 mm; as shown in fig. 7, the end of the annular groove 201 away from the bottom is a narrow end; one end of the annular groove 201 close to the bottom is a wide part end; the width of the wide end is 19.45mm, and the width of the narrow end is 18.5 mm; the annular groove 201 is provided with a round corner at the joint of one end far away from the bottom and the rigid ring 2, the radius R3 of the round corner at the joint of the one end far away from the bottom and the rigid ring 2 is 0.55mm, and the annular groove 201 is provided with a round corner at the joint of the bottom and the periphery; the radius R4 of the round corner at the junction of the bottom and the periphery is 0.4mm, and the back of one side of the rigid ring 2 away from the elastic ring 1 is provided with a threaded hole 202.
As shown in fig. 2, the first groove 102, the second groove 103, and the fit clearance between the annular groove 201 and the annular boss 101 are filled with polyurethane as the adhesive 3, and the surface roughness of the annular groove 201 and the annular boss 101 is 5.0 μm.
Example 2
The present embodiment provides a retaining ring, which, as shown in fig. 1, includes an elastic ring 1 and a rigid ring 2.
The material of elasticity ring 1 is stainless steel 304, and its thickness is 8mm, and the internal diameter is 205.5mm, and the external diameter is 260.6mm, as shown in fig. 3, be provided with the annular boss 101 with the annular groove 201 assorted of rigid ring 2 on the elasticity ring 1, the height of annular boss 101 is 1.32mm, as shown in fig. 4 and fig. 5, the width of the narrow end of annular boss 101 is 18.0mm, and the width of wide end is 19.5mm, the corner of annular boss 101 sets up to the fillet, and the radius of R1 is 0.3mm, and the radius of R2 is 0.5mm, be provided with the size on the annular boss 101 the same and follow annular boss 101 central line is axial symmetry's first recess 102 and second recess 103, the degree of depth of first recess 102 and second recess 103 is 0.5mm, and the width is 1.5 mm.
The rigid ring 2 is made of polyphenylene sulfide, the thickness of the rigid ring is 12.6mm, the inner diameter of the rigid ring is 205.5mm, the outer diameter of the rigid ring is 260.6mm, as shown in fig. 6, an annular groove 201 is arranged at the center of the rigid ring 2, and the depth of the annular groove 201 is 1.5 mm; as shown in fig. 7, the end of the annular groove 201 away from the bottom is a narrow end; one end of the annular groove 201 close to the bottom is a wide part end; the width of the wide end is 19.2mm, and the width of the narrow end is 18.2 mm; the joint of one end of the annular groove 201 far away from the bottom and the rigid ring 2 is provided with a fillet, the radius R3 of the fillet at the joint of the end far away from the bottom and the rigid ring 2 is 0.5mm, and the joint of the bottom and the periphery of the annular groove 201 is provided with a fillet; the radius R4 of the round corner at the junction of the bottom and the periphery is 0.3mm, and the back of one side of the rigid ring 2 away from the elastic ring 1 is provided with a threaded hole 202.
As shown in fig. 2, the first groove 102, the second groove 103, and the fit clearance between the annular groove 201 and the annular boss 101 are filled with polyurethane as the adhesive 3, and the surface roughness of the annular groove 201 and the annular boss 101 is 8.0 μm.
Example 3
The present embodiment provides a retaining ring, which, as shown in fig. 1, includes an elastic ring 1 and a rigid ring 2.
The material of elasticity ring 1 is stainless steel 304, and its thickness is 5.8mm, and the internal diameter is 180.2mm, and the external diameter is 265.2mm, as shown in fig. 3, be provided with the annular boss 101 with the annular groove 201 assorted of rigid ring 2 on the elasticity ring 1, the height of annular boss 101 is 1.66mm, as shown in fig. 4 and fig. 5, the width of the narrow end of annular boss 101 is 19.2mm, and the width of wide end is 19.85mm, the corner of annular boss 101 sets up to the fillet, and the radius of R1 is 0.5mm, and the radius of R2 is 0.6mm, be provided with the size on the annular boss 101 the same and follow the first recess 102 and the second recess 103 that annular boss 101 central line is axial symmetry distribution, the degree of depth of first recess 102 and second recess 103 is 0.6mm, and the width is 1 mm.
The rigid ring 2 is made of polyphenylene sulfide, the thickness of the rigid ring is 7.98mm, the inner diameter of the rigid ring is 180.2mm, the outer diameter of the rigid ring is 265.2mm, as shown in fig. 6, an annular groove 201 is arranged at the center of the rigid ring 2, and the depth of the annular groove 201 is 1.7 mm; as shown in fig. 7, the end of the annular groove 201 away from the bottom is a narrow end; one end of the annular groove 201 close to the bottom is a wide part end; the width of the wide end is 20mm, and the width of the narrow end is 19.5 mm; the joint of one end of the annular groove 201 far away from the bottom and the rigid ring 2 is provided with a fillet, the radius R3 of the fillet at the joint of the end far away from the bottom and the rigid ring 2 is 0.6mm, and the joint of the bottom and the periphery of the annular groove 201 is provided with a fillet; the radius R4 of the round corner at the junction of the bottom and the periphery is 0.5mm, and the back of one side of the rigid ring 2 away from the elastic ring 1 is provided with a threaded hole 202.
As shown in fig. 2, the first groove 102, the second groove 103, and the fit clearance between the annular groove 201 and the annular boss 101 are filled with epoxy resin as the adhesive 3, and the surface roughness of the annular groove 201 and the annular boss 101 is 4.0 μm.
Example 4
This embodiment provides a retainer ring which is the same as embodiment 1 except that the widths of the annular groove 201 and the annular boss 101 are 19.35mm at both ends.
Second, comparative example
Comparative example 1
This comparative example provides a retainer ring that is the same as example 1 except that the annular boss 101 is not provided with the first groove 102 and the second groove 103.
The elastic ring and the rigid ring in the retaining ring provided by the embodiment 1-3 are firmly bonded, the retaining ring is not easy to degum, the service life of the retaining ring is long, and the industrial application value is high.
It can be seen from the combination of embodiment 1 and comparative example 1 that, in embodiment 1, the annular boss is provided with the first groove and the second groove, and compared with comparative example 1 in which the first groove and the second groove are not provided, the retaining ring in embodiment 1 can effectively avoid the contact between the adhesive and the chemical reagents such as the polishing solution during the chemical polishing process, so as to improve the service life of the retaining ring, while in comparative example 1, the adhesive is likely to contact with the chemical reagents such as the polishing solution, and the bonding firmness is lower than that in embodiment 1, thereby indicating that the utility model improves the service life of the retaining ring by providing the first groove and the second groove.
It can be seen from the comprehensive embodiment 1 and embodiment 4 that the recess and boss design that the width that adopt similar dovetail differs in embodiment 1, compare in embodiment 4 and adopt the same recess of width and boss design, the bonding is more firm in embodiment 1, and the elastic ring is more difficult to come unstuck, shows from this, the utility model discloses the preferred recess and the boss design that adopt the variable width improves the bonding effect of elastic ring and rigid ring.
To sum up, the utility model provides a retaining ring is through being provided with first recess and second recess on annular boss, has not only increased the bonding area of elastic ring and rigidity ring, has strengthened horizontal pulling force moreover, makes the retaining ring bond more firmly, can effectively avoid chemical reagent contact such as adhesive and polishing solution simultaneously, has improved the life of retaining ring, and this retaining ring structure is simple moreover, and processing is easy, can use in the polishing field betterly.
The applicant states that the present invention is described by the above embodiments, but the present invention is not limited to the above detailed structural features, i.e. the present invention can be implemented only by relying on the above detailed structural features. It should be clear to those skilled in the art that any modifications to the present invention, to the equivalent replacement of selected parts and the addition of auxiliary parts, the selection of specific modes, etc., all fall within the scope of protection and disclosure of the present invention.
Claims (10)
1. A retaining ring, characterized in that the retaining ring comprises an elastic ring and a rigid ring;
an annular groove is formed in the center of the rigid ring;
the elastic ring is provided with an annular boss matched with the annular groove of the rigid ring, and the annular boss is provided with a first groove and a second groove.
2. The retaining ring of claim 1, wherein the annular groove is narrowed at an end distal from the base; one end of the annular groove close to the bottom is a wide part end; the wide end is wider than the narrow end.
3. The retaining ring of claim 1 or 2, wherein the depth of the annular groove is 1.5-1.7 mm;
the fit clearance between the annular groove on the rigid ring and the annular boss on the elastic ring is 0.1-0.3 mm.
4. The retaining ring of claim 2, wherein the wide end is 0.5-1.5 mm wider than the narrow end.
5. The retaining ring of claim 4, wherein the wide end has a width of 19-20 mm.
6. The retaining ring of claim 4 or 5, wherein the width of the narrow end is 18-19.5 mm.
7. The retaining ring of claim 1, wherein the annular groove is radiused at the junction of the bottom and the perimeter;
the annular groove is provided with a round angle at the joint of one end far away from the bottom and the rigid ring.
8. The retaining ring of claim 1, wherein the surface roughness of the annular groove and the annular land is 4.0-8.0 μm.
9. The retaining ring of claim 1, wherein the first and second grooves are axisymmetrically distributed along a centerline of the annular boss;
the first groove and the second groove are the same in size.
10. The retaining ring of claim 1 or 9, wherein the width of the first groove is 0.7-1.5 mm;
the depth of the first groove is 0.5-0.7 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021858440.8U CN212947226U (en) | 2020-08-31 | 2020-08-31 | Retaining ring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021858440.8U CN212947226U (en) | 2020-08-31 | 2020-08-31 | Retaining ring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212947226U true CN212947226U (en) | 2021-04-13 |
Family
ID=75362188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021858440.8U Active CN212947226U (en) | 2020-08-31 | 2020-08-31 | Retaining ring |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212947226U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114406896A (en) * | 2022-01-25 | 2022-04-29 | 上海江丰平芯电子科技有限公司 | Retaining ring capable of rapidly detecting service life and use method thereof |
| CN114505783A (en) * | 2022-01-25 | 2022-05-17 | 上海江丰平芯电子科技有限公司 | Scratch-resistant retaining ring |
-
2020
- 2020-08-31 CN CN202021858440.8U patent/CN212947226U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114406896A (en) * | 2022-01-25 | 2022-04-29 | 上海江丰平芯电子科技有限公司 | Retaining ring capable of rapidly detecting service life and use method thereof |
| CN114505783A (en) * | 2022-01-25 | 2022-05-17 | 上海江丰平芯电子科技有限公司 | Scratch-resistant retaining ring |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN212947226U (en) | Retaining ring | |
| US8517803B2 (en) | Retaining ring for chemical mechanical polishing | |
| US8298046B2 (en) | Retaining rings | |
| EP2180977B1 (en) | Retaining ring with shaped profile | |
| US7503837B2 (en) | Composite retaining ring | |
| US20090250955A1 (en) | Wafer transfer blade | |
| US8382454B2 (en) | Check valve, infusion device using the same, and method of manufacturing the same | |
| KR200328288Y1 (en) | Retaining ring with flange for chemical mechanical polishing | |
| US9694470B2 (en) | Stepped retaining ring | |
| KR20090004521A (en) | Work carrier | |
| US9827647B2 (en) | Retainer ring for chemical-mechanical polishing device | |
| CN111571427B (en) | Retaining ring | |
| KR20080013768A (en) | Semiconductor wafer holding method, semiconductor wafer holding apparatus and semiconductor wafer holding structure | |
| US20070259609A1 (en) | Cmp Conditioner | |
| KR20060131620A (en) | Retainer ring of chemical mechanical polishing apparatus | |
| CN211661824U (en) | Retaining ring | |
| US9278433B2 (en) | Receiving device for receiving semiconductor substrates | |
| US20150283668A1 (en) | Retaining ring assembly with inserts | |
| CN214322993U (en) | Retaining ring | |
| KR100989752B1 (en) | Wafer transfer blade | |
| KR101529433B1 (en) | Retainer ring and method therof by chemical mechanical polisher | |
| CN215357907U (en) | Machining clamp of component for mechanochemical grinding | |
| CN105751089A (en) | Abrasive band | |
| KR100836752B1 (en) | Retainer ring of cmp machine | |
| CN215847582U (en) | Retaining ring for chemical mechanical polishing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |