CN212517129U

CN212517129U - Wafer cleaning equipment spray mechanism

Info

Publication number: CN212517129U
Application number: CN202021749719.2U
Authority: CN
Inventors: 程玉学
Original assignee: Sanhe Zhixin Technology Co ltd
Current assignee: Sanhe Zhixin Technology Co ltd
Priority date: 2020-08-20
Filing date: 2020-08-20
Publication date: 2021-02-09
Anticipated expiration: 2030-08-20

Abstract

The utility model discloses a spraying mechanism of wafer cleaning equipment, the spraying mechanism comprises two supporting legs, a spray head fixing frame and a placing frame are arranged between the two supporting legs, meshes and supporting protrusions are arranged on the placing frame, a spray head and a valve are arranged on the spray head fixing frame, a water inlet is arranged on one side of the supporting leg, a reservoir is arranged below the spray head fixing frame and the placing frame, water pipes are arranged inside one supporting leg and the spray head fixing frame, and the water pipes are connected with the spray head; in the utility model, a valve is arranged on one side of the nozzle fixing frame, the number of the water outlet nozzles can be controlled by opening and closing the valve, the opening and closing of the valve can be determined according to the number of the wafer pieces, and the water is saved; the placing rack is fully distributed with meshes, the diameters of the meshes are smaller than that of the wafer, and the lower spray head can spray water below the wafer through the meshes, so that the two sides of the wafer can be cleaned simultaneously, and the time is saved; when the wafer is washed, water can fall into the reservoir, so that splashing of the water can be prevented, and water accumulated on the ground can be prevented.

Description

Wafer cleaning equipment spray mechanism

Technical Field

The invention relates to the field of spraying equipment, in particular to a spraying mechanism of wafer cleaning equipment.

Background

The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because it has a circular shape. Can be processed into various circuit device structures to become IC products with specific electrical functions. As the process nodes of the integrated circuit are more and more advanced, new requirements are provided for several actual manufacturing links, and the importance of the cleaning links is increasingly highlighted. The critical aspect of cleaning is that as feature sizes continue to shrink, semiconductors become more sensitive to impurity levels, which inevitably introduce contaminants such as particles, organics, metals, and oxides. In order to reduce the influence of impurities on the yield of chips, in actual production, not only the cleaning efficiency of a single time needs to be improved, but also frequent cleaning is needed before and after almost all processes, and with the development of the technology in the field of semiconductors, the cleanliness requirement of a wafer by a semiconductor manufacturer is higher and higher.

Therefore, the inventor provides a spraying mechanism of the wafer cleaning equipment by combining various factors.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a wafer cleaning equipment spray mechanism to solve the problem that proposes among the above-mentioned background art.

In order to achieve the above object, the utility model provides a following technical scheme:

a spray mechanism of wafer cleaning equipment comprises two supporting legs, a spray head fixing frame and a placing frame are placed between the two supporting legs, meshes are arranged on the placing frame, supporting protrusions for obliquely supporting a wafer are uniformly arranged on the placing frame, the supporting protrusions are arc-shaped, the supporting protrusions are elastic supporting protrusions made of rubber, a spray head and a valve are arranged on the spray head fixing frame, a water inlet is formed in one side of each supporting leg, and a water storage tank is arranged below the spray head fixing frame and the placing frame; the material of two supporting legs is plastics, the supporting leg plays the supporting role to shower nozzle fixed plate and rack, plastics have the material light, the price is low, many kinds, characteristics such as the colour is many and easy processing, it is pleasing to the eye practice thrift the cost again promptly, be covered with the mesh on the rack, the diameter of mesh is less than the diameter of wafer, during the washing, wafer inclined support is on the rack, be convenient for receive to wash and turn by oneself, improve the cleaning performance, the wafer supports protruding for the arc, can avoid causing the damage, the diameter of mesh is less than the diameter of wafer, do not worry that the wafer drops, following shower nozzle can spray the below of wafer with water through the mesh, realize that the two sides are washd simultaneously, do not need the turn-over, save time.

As a further aspect of the present invention: one side edge of the two supporting legs is provided with a water inlet, a water pipe is arranged in the supporting legs and is connected with the water inlet, and two spray nozzle fixing frames are arranged between the two supporting legs; the supporting leg is inside to be equipped with the water pipe, and the water pipe is connected on one side with the water inlet, and the outside water pipe is connected on another limit of water inlet, and water flows into the water pipe through the water inlet.

As a further aspect of the present invention: the shower nozzle fixing frame is arranged up and down, a row of shower nozzles are arranged on the bottom surface of the shower nozzle fixing frame above the shower nozzle fixing frame, a row of shower nozzles are arranged on the top surface of the shower nozzle fixing frame below the shower nozzle fixing frame, four valves are respectively arranged on the same sides of the two shower nozzle fixing frames, and a placing frame is arranged in the middle of the two shower nozzle fixing frames; the shower nozzle is fixed on the shower nozzle mount, and one side of shower nozzle mount is equipped with the valve, can control out the quantity of water shower nozzle through the opening and shutting of valve, can decide opening and shutting of valve according to the quantity of wafer, using water wisely.

As a further aspect of the present invention: a water pipe is arranged in the spray head fixing frame and connected with the spray head, and the spray head is fixed on the spray head fixing frame; the shower nozzle is connected with water pipe, and water flows into the water pipe through the water inlet, and through the shower nozzle with even spouting of water to the rack for wash the wafer.

As a further aspect of the present invention: the water storage tank is fixedly connected with the two supporting legs and is arranged on the ground right below the spray head fixing frame and the placing frame, and a water outlet is formed in one side of the water storage tank; the impounding reservoir is made of plastic, the quality of the plastic is easy to move, when the wafer is washed, water for washing the wafer falls down and falls into the impounding reservoir, splashing of the water around can be prevented, water accumulation on the ground is prevented, and after the water is fully stored, the water outlet can be opened to allow the water to flow out.

Compared with the prior art, the utility model discloses the beneficial effect of following several aspects has:

1. the utility model provides a spraying mechanism of wafer cleaning equipment, the structure is set skillfully and the arrangement is reasonable, in the utility model, a nozzle is fixed on a nozzle fixing frame, one side of the nozzle fixing frame is provided with a valve, the quantity of water outlet nozzles can be controlled by opening and closing the valve, the opening and closing of the valve can be determined according to the quantity of wafers, and the water is saved;

2. the utility model discloses further design the rack, be covered with the mesh on the rack, the diameter of mesh is less than the diameter of wafer, evenly is equipped with the support protruding that is used for the inclined support wafer on the rack, the support protruding is the arc, the support protruding is for the elastic support protruding by rubber, and during the washing, the wafer inclined support is above the rack, is convenient for being washed and turns by oneself, improves the cleaning performance, and the support protruding is the arc, can avoid causing the damage, and the diameter of mesh is less than the diameter of wafer, does not worry that the wafer drops, and lower shower nozzle can spray water to the below of wafer through the mesh, realizes that two sides are washd simultaneously, does not need the turn-over, saves time;

3. the utility model discloses further designed the cistern, the material of cistern is plastics, and the plastics quality is moved easily, and when washing the wafer, the water that washes the wafer can fall down, falls into the cistern, can prevent that water from splashing everywhere, prevents ground ponding, holds the back when water, can open the delivery port, lets rivers go out.

Drawings

Fig. 1 is a perspective view of a spray mechanism of a wafer cleaning apparatus.

Fig. 2 is a cross-sectional view of a spray mechanism of a wafer cleaning apparatus.

Fig. 3 is a sectional view of a rack in a spray mechanism of a wafer cleaning apparatus.

In the figure: 1. supporting legs; 2. a nozzle fixing frame; 3. a valve; 4. a spray head; 5. placing a rack; 5-1, meshes; 5-2, supporting protrusions; 6. a water inlet; 7. a reservoir; 8. a water outlet; 9. a water pipe.

Detailed Description

The technical solution of the present patent will be described in further detail with reference to the following embodiments.

Referring to fig. 1-3, a spray mechanism of a wafer cleaning device comprises two support legs 1, a spray head fixing frame 2 and a placing frame 5 are placed between the two support legs 1, meshes 5-1 are arranged on the placing frame 5, support protrusions 5-2 for obliquely supporting a wafer are uniformly arranged on the placing frame 5, the support protrusions 5-2 are arc-shaped, the support protrusions 5-2 are elastic support protrusions made of rubber, a spray head 4 and a valve 3 are arranged on the spray head fixing frame 2, a water inlet 6 is arranged on one side of each support leg 1, and a water storage tank 7 is arranged below the spray head fixing frame 2 and the placing frame 5; the support legs 1 are made of plastics, the support legs 1 support the spray head 4 fixing plate and the placing frame 5, the plastics have the characteristics of light weight, low price, multiple types, multiple colors, easiness in processing and the like, the appearance is attractive, the cost is saved, the placing frame 5 is full of meshes 5-1, the diameter of the meshes 5-1 is smaller than that of a wafer, the wafer is obliquely supported on the placing frame 5 during cleaning, the wafer is convenient to be washed and turned over automatically, the cleaning effect is improved, the support protrusions 5-2 are arc-shaped, damage can be avoided, the diameter of the meshes 5-1 is smaller than that of the wafer, the wafer does not need to fall off, the lower spray head 4 can spray water below the wafer through the meshes 5-1, the two sides can be cleaned simultaneously, turning is not needed, and the time is saved;

one side edge of the two supporting legs 1 is provided with a water inlet 6, a water pipe 9 is arranged inside the supporting legs 1, the water pipe 9 is connected with the water inlet 6, and two spray head fixing frames 2 are arranged between the two supporting legs 1; a water pipe 9 is arranged in the supporting leg 1, the water pipe 9 is connected with one side of the water inlet 6, the other side of the water inlet 6 is connected with an external water pipe, and water flows into the water pipe 9 through the water inlet 6;

the sprayer fixing frames 2 are arranged up and down, a row of sprayers 4 are arranged on the bottom surface of the upper sprayer fixing frame 2, a row of sprayers 4 are arranged on the top surface of the lower sprayer fixing frame 2, four valves 3 are respectively arranged on the same side of the two sprayer fixing frames 2, and a placing frame 5 is arranged in the middle of the two sprayer fixing frames 2; the spray head 4 is fixed on the spray head fixing frame 2, the valve 3 is arranged on one side of the spray head fixing frame 2, the number of the water outlet spray heads 4 can be controlled by opening and closing the valve 3, the opening and closing of the valve 3 can be determined according to the number of the wafers, and water is saved;

a water pipe 9 is arranged in the spray head fixing frame 2, the water pipe 9 is connected with the spray head 4, and the spray head 4 is fixed on the spray head fixing frame 2; the spray head 4 is connected with a water pipe 9, water flows into the water pipe 9 through the water inlet 6, and then is uniformly sprayed onto the placing frame 5 through the spray head 4 to clean the wafer;

the water storage tank 7 is fixedly connected with the two support legs 1 and is arranged on the ground right below the spray head fixing frame 2 and the placing frame 5, and a water outlet 8 is formed in one side of the water storage tank 7; the reservoir 7 is made of plastic, the plastic is easy to move, when the wafer is washed, water for washing the wafer falls down and falls into the reservoir 7, splashing of water around can be prevented, water accumulated on the ground can be prevented, and the water outlet 8 can be opened to allow the water to flow out after the water is fully stored.

The utility model discloses a theory of operation is: the nozzles are fixed on the nozzle fixing frame, one side of the nozzle fixing frame is provided with a valve, the number of the water nozzles can be controlled by opening and closing the valve, the opening and closing of the valve can be determined according to the number of the wafers, and water is saved; the rack is full of meshes, the diameter of the meshes is smaller than that of the wafer, supporting protrusions for obliquely supporting the wafer are uniformly arranged on the rack and are arc-shaped, the supporting protrusions are elastic supporting protrusions made of rubber, the wafer is obliquely supported on the rack during cleaning and is convenient to be washed and automatically turned over, the cleaning effect is improved, the supporting protrusions are arc-shaped, damage can be avoided, the diameter of the meshes is smaller than that of the wafer, the wafer is not worried about falling off, a lower nozzle can spray water below the wafer through the meshes, two sides of the wafer can be cleaned simultaneously, turning is not needed, and time is saved; the impounding reservoir is made of plastic, the quality of the plastic is easy to move, when the wafer is washed, water for washing the wafer falls down and falls into the impounding reservoir, splashing of the water around can be prevented, water accumulation on the ground is prevented, and after the water is fully stored, the water outlet can be opened to allow the water to flow out.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.

Although the preferred embodiments of the present patent have been described in detail, the present patent is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present patent within the knowledge of those skilled in the art.

Claims

1. The utility model provides a wafer cleaning equipment spray mechanism, a serial communication port, spray mechanism includes two supporting legs (1), shower nozzle mount (2) and rack (5) have been placed between two supporting legs (1), be equipped with mesh (5-1) on rack (5), evenly be equipped with on rack (5) and be used for the support of inclined support wafer protruding (5-2), be equipped with shower nozzle (4) and valve (3) on shower nozzle mount (2), supporting leg (1) is equipped with water inlet (6) on one side, shower nozzle mount (2) and rack (5) below are equipped with cistern (7).

2. The spray mechanism of a wafer cleaning apparatus as set forth in claim 1, wherein the support protrusions (5-2) are arc-shaped, and the support protrusions (5-2) are elastic support protrusions made of rubber.

3. The spraying mechanism of a wafer cleaning device as claimed in claim 1, wherein one side of the two support legs (1) is provided with a water inlet (6), a water pipe (9) is arranged inside the support leg (1), the water pipe (9) is connected with the water inlet (6), and two nozzle fixing frames (2) are arranged between the two support legs (1).

4. The wafer cleaning device spraying mechanism as claimed in claim 3, wherein the nozzle holders (2) are placed up and down, a row of nozzles (4) is arranged on the bottom surface of the upper nozzle holder (2), a row of nozzles (4) is arranged on the top surface of the lower nozzle holder (2), four valves (3) are respectively arranged on the same side of the two nozzle holders (2), and a placing rack (5) is arranged in the middle of the two nozzle holders (2).

5. The wafer cleaning device of the claim 4, characterized in that the nozzle holder (2) is provided with a water pipe (9), the water pipe (9) is connected with the nozzle (4), and the nozzle (4) is fixed on the nozzle holder (2).

6. The spraying mechanism of the wafer cleaning equipment as claimed in claim 1, characterized in that the water reservoir (7) is fixedly connected with the two support legs (1) and is arranged on the ground right below the spray head fixing frame (2) and the placing frame (5), and a water outlet (8) is formed in one side of the water reservoir (7).