CN212357053U - Neutral-ash low-radiation coated glass - Google Patents
Neutral-ash low-radiation coated glass Download PDFInfo
- Publication number
- CN212357053U CN212357053U CN202021666405.6U CN202021666405U CN212357053U CN 212357053 U CN212357053 U CN 212357053U CN 202021666405 U CN202021666405 U CN 202021666405U CN 212357053 U CN212357053 U CN 212357053U
- Authority
- CN
- China
- Prior art keywords
- layer
- thickness
- coated glass
- dielectric layer
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The utility model discloses a neutral gray low-emissivity coated glass, locate including glass substrate and plating coating layer on the glass substrate, coating layer includes certainly glass substrate outwards sets gradually: the first dielectric layer is a SiNx layer; the first protective layer is a NiCr layer; the second dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer; a first functional layer which is an Ag layer; the third protective layer is a NiCr layer; the third dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer; a second functional layer, which is an Ag layer; a fifth protective layer, which is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer; and the fourth dielectric layer is a SiNx layer. The utility model discloses each angle of product is neutral grey, and the colour is even.
Description
Technical Field
The utility model relates to the field of coated glass, in particular to neutral gray low-emissivity coated glass.
Background
Low-emissivity coated glass, also called Low-E glass, can be divided into single-silver Low-E, double-silver Low-E and triple-silver Low-E according to the excellent structure and performance of the film layer. The film coating layer is formed by plating a low-radiation coating containing one or two or even multiple layers of film systems of metal films or metal oxide films on the surface of the glass by a vacuum magnetron sputtering method, so that visible light in sunlight can penetrate through the coating, but infrared radiation in the sunlight is isolated outside.
With the gradual maturity of the market, curtain wall glass is a coat of buildings, and in view of the overall appearance of a city and the harmony of building groups, the glass with individuality has less and less colors, such as gold, green, silver and the like. The demands of customers on the appearance color of the curtain wall are gradually unified, and the market is more favorable for gray tone and neutral gray. However, most of the Low-E products in the market have the defects that the colors are not clear enough when the outdoor observation is carried out, the colors are not pure when the outdoor observation is carried out at different angles, and chromatic aberration exists, so that the visual effect of the products is influenced.
SUMMERY OF THE UTILITY MODEL
The utility model mainly aims at providing neutral gray low-emissivity coated glass, aiming at improving the problem that the prior gray low-emissivity coated glass has chromatic aberration.
In order to achieve the above object, the utility model provides a neutral grey low-emissivity coated glass, locate including glass substrate and plating film coating layer on the glass substrate, film coating layer include certainly glass substrate outwards sets gradually:
the first dielectric layer is a SiNx layer;
the first protective layer is a NiCr layer;
the second dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer;
a first functional layer which is an Ag layer;
the third protective layer is a NiCr layer;
the third dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer;
a second functional layer, which is an Ag layer;
a fifth protective layer, which is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer; and
and the fourth dielectric layer is a SiNx layer.
Optionally, the thickness of the first dielectric layer is 10-18 nm, and/or the thickness of the first protective layer is 1-5 nm, and/or the thickness of the second dielectric layer is 33-40 nm, and/or the thickness of the first functional layer is 5-15 nm, and/or the thickness of the third protective layer is 0.5-2 nm, and/or the thickness of the third dielectric layer is 60-80 nm, and/or the thickness of the second functional layer is 10-18 nm, and/or the thickness of the fifth protective layer is 0.5-2 nm, and/or the thickness of the fourth dielectric layer is 28-42 nm.
Optionally, the thickness of the first dielectric layer is 10.3nm, and/or the thickness of the first protection layer is 1.38nm, and/or the thickness of the second dielectric layer is 35.7nm, and/or the thickness of the first functional layer is 12.71nm, and/or the thickness of the third protection layer is 1.98nm, and/or the thickness of the third dielectric layer is 78.3nm, and/or the thickness of the second functional layer is 15.98nm, and/or the thickness of the fifth protection layer is 1.31nm, and/or the thickness of the fourth dielectric layer is 28.3 nm.
Optionally, the thickness of the first dielectric layer is 17.7nm, and/or the thickness of the first protection layer is 2.62nm, and/or the thickness of the second dielectric layer is 33.4nm, and/or the thickness of the first functional layer is 7.67nm, and/or the thickness of the third protection layer is 1.38nm, and/or the thickness of the third dielectric layer is 71.5nm, and/or the thickness of the second functional layer is 13.69nm, and/or the thickness of the fifth protection layer is 0.69nm, and/or the thickness of the fourth dielectric layer is 33.1 nm.
Optionally, the coating layer further includes:
and the second protective layer is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and is arranged between the second dielectric layer and the first functional layer.
Optionally, the thickness of the second protective layer is not greater than 2 nm.
Optionally, the coating layer further includes:
and the fourth protective layer is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and is arranged between the third dielectric layer and the second functional layer.
Optionally, the thickness of the fourth protective layer is not greater than 2 nm.
Optionally, the neutral gray low-emissivity coated glass has a transmittance T of 40-50%, a transmittance color a of 0-1, and a transmittance color b of-1.0-4.0.
Optionally, the glass surface reflection color L of the neutral gray low-emissivity coated glass is 25-29, a is 0.33-0.71, and b is-2.33-4.46.
The utility model discloses technical scheme makes each angle of the low radiation coated glass who forms all be neutral grey through adopting the design of coating film layer, and the colour difference of different angles is little, and whole colour is even, and visual effect is unified.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural view of an embodiment of the low-emissivity coated glass of the present invention;
FIG. 2 is a schematic flow chart of an embodiment of the method for preparing the neutral-ash low-emissivity coated glass of the present invention;
FIG. 3 is a schematic flow chart illustrating a method for forming a second passivation layer according to an embodiment of the present invention;
fig. 4 is a schematic flow chart of an embodiment of a method for forming a fourth passivation layer according to the present invention.
The reference numbers illustrate:
the objects, features and advantages of the present invention will be further described with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that, if directional indications (such as upper, lower, left, right, front and rear … …) are involved in the embodiment of the present invention, the directional indications are only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indications are changed accordingly.
In addition, if there is a description relating to "first", "second", etc. in the embodiments of the present invention, the description of "first", "second", etc. is for descriptive purposes only and is not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In addition, the technical solutions in the embodiments may be combined with each other, but it must be based on the realization of those skilled in the art, and when the technical solutions are contradictory or cannot be realized, the combination of the technical solutions should not be considered to exist, and is not within the protection scope of the present invention.
Referring to fig. 1, the present invention provides a neutral gray low-emissivity coated glass, which comprises a glass substrate 100 and a coating layer coated on the glass substrate 100, wherein the coating layer comprises the following components which are sequentially arranged from the glass substrate 100 to the outside: a first dielectric layer 101, a first protective layer 102, a second dielectric layer 103, a first functional layer 20, a third protective layer 301, a third dielectric layer 302, a second functional layer 40, a fifth protective layer 501 and a fourth dielectric layer 502. All the layers can be prepared by a magnetron sputtering process.
The first dielectric layer 101 is a SiNx layer, and is used for preventing sodium in the glass substrate 100 from diffusing and migrating into the coating layer to damage the structure of the first functional layer 20.
The first medium layer 101 is made of SiNx, so that the strength of the coating layer can be improved, and the coating layer has better stability. After the first protective layer 102 is formed on the first dielectric layer 101, the stability of the first protective layer 102 can be higher, and further, after the coated glass is formed, the stability is better.
The first protective layer 102 is a NiCr layer for absorbing most of the sunlight penetrating the glass substrate 100 to reduce the outdoor reflectivity. The first protective layer 102 is matched with the first medium layer 101, so that the reflection color and the transmission color of the coated layer can be effectively improved, and the coated glass product is in a stable color state. Under the matching action of the first medium layer 101 and the protective layer, the overall stability of the coated glass product is higher, and after a plurality of film layers of the coated glass layer are formed, the presented color can be in an even state, so that the visual effect of the coated glass product is relatively more uniform, the color difference is not easy to appear, and each angle of the coated glass product can be in a preset color.
The second dielectric layer 103 is at least one of a SiNx layer, a ZnSnOx layer, or a ZnAlOx layer, and the second dielectric layer 103 is used for protecting the first functional layer 20 and preventing the first functional layer 20 from being damaged. The second dielectric layer 103 may be one of a SiNx layer, a ZnSnOx layer, or a ZnAlOx layer, or may be a composite layered structure formed by combining multiple layers.
The first functional layer 20 is an Ag layer, and the first functional layer 20 is used for reducing the radiance of the coated glass, reflecting infrared radiation from the sun, filtering sunlight into a cold light source, and bringing good energy-saving performance to a coated product.
Under the action of the first medium layer 101 and the first protective layer 102, the states of the first functional layer 20 and the second medium layer 103 can be more stable, and further, a preset color can be presented according to a preset requirement, so that the problem of color cast is not easy to occur, and the colors presented at different angles of the coated glass product can be kept uniform.
The third protective layer 301 is an NiCr layer, and the third protective layer 301 has an effect of protecting the first functional layer 20, so that the first functional layer 20 can be prevented from being affected by the outside, and meanwhile, the permeability of the product can be improved.
The third dielectric layer 302 is at least one of a SiNx layer, a ZnSnOx layer, or a ZnAlOx layer, and the third dielectric layer 302 is used for protecting the second functional layer 40 and preventing the second functional layer 40 from being damaged. The third dielectric layer 302 may be one of a SiNx layer, a ZnSnOx layer, or a ZnAlOx layer, or may be a composite layered structure formed by combining a plurality of layers, and the third dielectric layer 302 may also be the same as the second dielectric layer 103 in material.
The second functional layer 40 is an Ag layer, and the second functional layer 40 is used for reducing the radiance of the coated glass, reflecting infrared radiation from the sun, filtering sunlight into a cold light source, and bringing good energy-saving performance to a coated product. The first functional layer 20 is matched with the second functional layer 40, so that the radiance of the coated glass can be effectively reduced, and the product has a better energy-saving effect.
The fifth protective layer 501 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, and the fifth protective layer 501 is used to protect the second functional layer 40 to prevent the second functional layer 40 from being damaged, and can be used to improve the permeability of the coating product in cooperation with the second functional layer 40. The fifth protective layer 501 may be one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, or may be a composite layered structure formed by a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer.
The fourth dielectric layer 502 is a SiNx layer, the fourth dielectric layer 502 is used as the outermost layer of the coated glass, and the mechanical property of the coated glass can be improved by using the effect that the SiNx has high hardness, so that the coated glass is not easy to scratch, and good transmission performance and color uniformity can be further kept.
The double silver layers formed by the first functional layer 20 and the second functional layer 40 can effectively reduce the radiance of the coated glass product and reflect infrared radiation from the sun. Through the mutual cooperation of the film layer and the double silver layers, the coated glass product can be in a neutral gray state.
According to the scheme, the SiNx layer of the first dielectric layer 101 and the NiCr layer of the first protective layer 102 are arranged between the second dielectric layer 103 and the glass base surface, so that the influence of the glass base surface on the functional layer can be further avoided, the coated film layer has higher stability, after the coating process is completed, the uniformity of the film layer of the whole structure is higher, the coated film layer can be in a relatively more uniform neutral gray state from all angles, the coated glass product can be in the same color from different angles, the color consistency is higher, and the problem of color difference of different angles is not easy to occur.
The film thickness of the film coating layer can be selected as required, and the film coating glass product can keep a preset color state by adopting the film layer setting. The transmittance and reflectivity of the film layer can be adjusted to a certain extent by adjusting the thicknesses of different film layers. The coated glass product formed by the scheme has small multi-angle color deviation, different positions are detected, the front color difference and the side color difference delta a are less than 2.5, and the whole color is more uniform. In the scheme, L, a and b in Lab color space are used for describing, the prepared 6mm low-emissivity coated glass single sheet is detected at different positions, the transmittance T is 40-50%, the transmission color a is 0-1, and b is-1.0-4.0; the glass surface reflection color L is 25 to 29, a is 0.33 to-0.71, and b is-2.33 to-4.46 when detected at different positions. The transparent color and the reflective color are both neutral gray tones observed from different angles, the tones observed from different angles are consistent, and the tones of the product at all angles can be preset neutral gray.
Optionally, the thickness of the first dielectric layer 101 is 10 to 18nm, and may be selected from 11.5nm, 13nm, 14.2nm, 14.9nm, 15.6nm, 16.1nm, 16.7nm, 17.2nm, 17.5nm and 18nm, and the thickness of the first dielectric layer 101 may be selected as required, so that the reflectivity of the coated glass product is kept within a preset range. Further, 10.3nm, or 17.7nm, may be selected.
Optionally, the thickness of the first protective layer 102 is 1 to 5nm, and may be selected from 1nm, 1.21nm, 1.34nm, 1.41nm, 1.56nm, 1.62nm, 1.71nm, 1.78nm, 1.89nm, 2.86nm, 3.45nm, 4.35nm, and 5 nm. Further, 1.38nm, or 2.62nm may be selected.
Optionally, the thickness of the second dielectric layer 103 is 33 to 40 nm. 33nm, 34.5nm, 37nm, 38.5nm and 40nm can be selected. Further, 35.7nm, or 33.4nm, may be selected.
Optionally, the thickness of the first functional layer 20 is 5 to 15 nm. 5nm, 6.2nm, 7.2nm, 8nm, 9.3nm, 10.5nm, 11.4nm, 12.1nm, 13nm, 13.9nm, 14.3nm, 15nm may be selected. Further, 12.7nm, or 7.67nm, may be selected.
Optionally, the thickness of the third protective layer 301 is 0.5 to 2 nm. The wavelength of the light source can be 0.5nm, 1.1nm, 1.6nm and 2 nm. Further alternatively, 1.98nm, or 1.38nm, may be selected.
Optionally, the thickness of the third dielectric layer 302 is 60 to 80 nm. 60nm, 66nm, 71nm, 75nm and 80nm can be selected. Further, 78.3nm, or 71.5nm may be selected.
Optionally, the thickness of the second functional layer 40 is 10 to 18 nm. 10nm, 12.1nm, 13.9nm, 14.6nm, 15.8nm, 16.7nm, 17.2nm and 18nm can be selected. Further, 15.98nm, or 13.69nm may be selected.
Optionally, the thickness of the fifth protective layer 501 is 0.5 to 2 nm. The wavelength of the light source can be 0.5nm, 1.9nm, 1.4nm and 2 nm. Further, 1.31nm, or 0.69nm may be selected.
Optionally, the thickness of the fourth dielectric layer 502 is 28-42 nm. 28nm, 34nm, 39nm and 42nm can be selected. Further, 28.3nm, or 33.1nm may be selected.
In order to improve the durability of the coating, optionally, the coating further comprises: a second protective layer 104, where the second protective layer 104 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, and the second protective layer 104 is disposed between the second dielectric layer 103 and the first functional layer 20. The second protective layer 104 is used for improving the bonding strength between the second dielectric layer 103 and the first functional layer 20, so that the coating layer has higher stability and better durability. The second protective layer 104 may also be used to protect the first functional layer 20 and prevent the first functional layer 20 from being damaged, thereby maintaining the coated glass product within a predetermined emissivity range. The second protection layer 104 may be one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, or may be a composite film structure.
Optionally, the thickness of the second protective layer 104 is not greater than 2 nm. The particle size can be 0.1nm, 0.5nm, 1.1nm, or 2 nm. By selecting different thicknesses, the transmittance of the coated glass product can be improved.
Optionally, the coating layer further includes: a fourth protection layer 303, where the fourth protection layer 303 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, and the fourth protection layer 303 is disposed between the third dielectric layer 302 and the second functional layer 40. The first protection layer 102 may be one of a NiCr layer, a Cr layer, a NiCrOx layer, or a NiCrNx layer, or may be a composite film structure.
The fourth protection layer 303 is used for protecting the second functional layer 40, so as to prevent the second functional layer 40 from being damaged, so that the coated product maintains a preset emissivity range, and the durability of the coated glass product is improved. Optionally, the thickness of the fourth protection layer 303 is not more than 2 nm. The particle size may be 0.1nm, 0.6nm, 0.77nm, 1.11nm, 1.61nm, or 2 nm. By selecting different thicknesses, the transmittance of the coated glass product can be improved.
When the coated glass product is manufactured, the coated glass product may have the second protective layer 104 and the fourth protective layer 303 at the same time, or the second protective layer 104 or the fourth protective layer 303 may be separately provided.
Because the coated glass product is provided with the first medium layer 101, the first protective layer 102 and the second medium layer 103, the coated glass product can play a role in protecting the first functional layer 20, so that the film structure formed by the first functional layer 20, the second protective layer 104 and the third protective layer 301 is kept in a preset state and a preset color, and the color difference at different angles is relatively smaller; the second protective layer 104 can further improve the durability of the coated glass product. The coating layer is provided with a third medium layer 302 and a third protective layer 301, so that the effect of protecting the first functional layer 20 and the second functional layer 40 can be achieved, the fourth protective layer 303 can be used for improving the durability of a coated product, and the transmittance of the coated glass product can be changed by adding the second protective layer 104 and the fourth protective layer 303 so as to adapt to different scenes.
The utility model also provides a preparation method of the neutral gray low-emissivity coated glass.
Referring to fig. 2, the preparation method of the neutral gray low-emissivity coated glass includes the following steps:
s10: a glass substrate 100 is provided.
The glass substrate 100 may be white glass, or may be selected as needed.
S20: and performing vacuum magnetron sputtering on the surface of the glass substrate 100 by using a target to form a first dielectric layer 101, wherein the first dielectric layer 101 is a SiNx layer.
The target material used in the magnetron sputtering cathode position is a silicon-aluminum alloy target with the weight ratio of silicon to aluminum being 90: 10. The silicon-aluminum alloy target is a rotary target; the sputtering power is 0-70 Kw, and the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S21: and performing vacuum magnetron sputtering on the surface of one side, back to the glass substrate 100, of the first dielectric layer 101 by using a target to form a first protective layer 102, wherein the first protective layer 102 is a NiCr layer.
The target material used in the magnetron sputtering cathode position is a nickel-chromium alloy target with the weight ratio of nickel to chromium being 80: 20. The nickel-chromium alloy target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S22: and forming a second dielectric layer 103 by performing vacuum magnetron sputtering on the surface of one side, back to the first dielectric layer 101, of the first protective layer 102 by using a target, wherein the second dielectric layer 103 is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer.
The target material used in the magnetron sputtering cathode position is a silicon-aluminum alloy target with a silicon-aluminum weight ratio of 90:10, or a zinc-tin alloy target with a zinc-tin weight ratio of 50:50, or a zinc-aluminum alloy target with a zinc-aluminum weight ratio of 98: 2.
The silicon-aluminum alloy target is a rotating target, the sputtering power is 0-70 Kw, and the ratio of high-purity argon to high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The zinc-tin alloy target is a rotary target, the sputtering power is 0-60 Kw, and the ratio of high-purity argon to high-purity nitrogen in the sputtering process gas is 0.78: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The zinc-aluminum alloy target is a rotating target, the sputtering power is 0-60 Kw, and the ratio of high-purity argon and high-purity oxygen in the sputtering process gas is 0.78: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S23: and performing vacuum magnetron sputtering on the surface of one side, back to the first protective layer 102, of the second dielectric layer 103 by using a target to form a first functional layer 20, wherein the first functional layer 20 is an Ag layer.
The target material used by the magnetron sputtering cathode is a silver target with the silver purity of 99.99 percent. The silver target is a planar target.
S24: and performing vacuum magnetron sputtering on the surface of one side, which faces away from the second dielectric layer 103, of the first functional layer 20 by using a target to form a third protective layer 301, wherein the third protective layer 301 is an NiCr layer.
The target material used in the magnetron sputtering cathode position is a nickel-chromium alloy target with the weight ratio of nickel to chromium being 80: 20. The nickel-chromium alloy target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S25: and forming a third dielectric layer 302 by performing vacuum magnetron sputtering on the surface of one side, back to the first functional layer 20, of the third protective layer 301 by using a target material, wherein the third dielectric layer 302 is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer.
The target material used in the magnetron sputtering cathode position is a silicon-aluminum alloy target with a silicon-aluminum weight ratio of 90:10, or a zinc-tin alloy target with a zinc-tin weight ratio of 50:50, or a zinc-aluminum alloy target with a zinc-aluminum weight ratio of 98: 2.
The silicon-aluminum alloy target is a rotating target, the sputtering power is 0-70 Kw, and the ratio of high-purity argon to high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The zinc-tin alloy target is a rotary target, the sputtering power is 0-60 Kw, and the ratio of high-purity argon to high-purity nitrogen in the sputtering process gas is 0.78: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The zinc-aluminum alloy target is a rotating target, the sputtering power is 0-60 Kw, and the ratio of high-purity argon and high-purity oxygen in the sputtering process gas is 0.78: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S26: and performing vacuum magnetron sputtering on the surface of one side, back to the third protective layer 301, of the third dielectric layer 302 by using a target to form a second functional layer 40, wherein the second functional layer 40 is an Ag layer.
The target material used by the magnetron sputtering cathode is a silver target with the silver purity of 99.99 percent. The silver target is a planar target.
S27: and forming a fifth protective layer 501 by performing vacuum magnetron sputtering on the surface of the second functional layer 40, which is opposite to the third dielectric layer 302, by using a target, wherein the fifth protective layer 501 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer.
The target material used in the magnetron sputtering cathode position is a nickel-chromium alloy target with the weight ratio of nickel to chromium being 80:20 or a chromium target with the purity being 99.95%.
The nickel-chromium alloy target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The chromium target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
S28: and performing vacuum magnetron sputtering on the surface of one side, back to the second functional layer 40, of the fifth protective layer 501 by using a target to form a fourth dielectric layer 502, wherein the fourth dielectric layer 502 is a SiNx layer.
The target material used in the magnetron sputtering cathode position is a silicon-aluminum alloy target with the weight ratio of silicon to aluminum being 90: 10. The silicon-aluminum alloy target is a rotating target, the sputtering power is 0-70 Kw, and the ratio of high-purity argon to high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
Referring to fig. 1, the coated glass product prepared by the above process has a front side surface color difference Δ a of less than 2.5, uniform overall color, and when observed from various angles, the color is neutral gray, the transmittance T is 40-50%, the transmission color a is 0-1, and the transmission color b is-1.0-4.0; the glass surface has a reflection color L of 25 to 29, a of 0.33 to-0.71, and b of-2.33 to-4.46. The color cast does not occur at each angle, the color is clear and pure when the indoor and outdoor observation is carried out, and the color is uniform.
Referring to fig. 3, optionally, after the step S22, the method for preparing the neutral-ash low-emissivity coated glass further includes:
s221: a target is used for forming a second protective layer 104 by vacuum magnetron sputtering on the side of the second dielectric layer 103, which faces away from the first protective layer 102, the second protective layer 104 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and the first functional layer 20 is arranged on the side of the second protective layer 104, which faces away from the second dielectric layer 103.
Wherein, the target material used in the magnetron sputtering cathode position is a nickel-chromium alloy target with the weight ratio of nickel to chromium being 80:20 or a chromium target with the purity being 99.95 percent.
The nickel-chromium alloy target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The chromium target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
Referring to fig. 4, optionally, after the step S25, the method for preparing the neutral-ash low-emissivity coated glass further includes:
s251: and forming a fourth protective layer 303 by performing vacuum magnetron sputtering on the side, facing away from the third protective layer 301, of the third dielectric layer 302 by using a target, wherein the fourth protective layer 303 is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and the second functional layer 40 is arranged on the side, facing away from the third dielectric layer 302, of the fourth protective layer 303.
Wherein, the target material used in the magnetron sputtering cathode position is a nickel-chromium alloy target with the weight ratio of nickel to chromium being 80:20 or a chromium target with the purity being 99.95 percent.
The nickel-chromium alloy target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
The chromium target is a planar target, the sputtering power is 0-20 Kw, the sputtering process gas is high-purity argon, the sputtering pressure is 2-5 x 10-3mbar, or the ratio of the high-purity argon to the high-purity nitrogen in the sputtering process gas is 1: 1, the sputtering pressure is 2-5 x 10-3 mbar.
By arranging the second protective layer 104 and/or the fourth protective layer 303, the Ag layer can be protected, and the durability of the coated glass product can be further improved.
The utility model provides an optional embodiment of the utility model for explanation on the basis of the neutral gray low-radiation coated glass.
Example 1:
referring to fig. 1 to 4, the structure of the coating layer in the present embodiment is:
the first dielectric layer 101 is a SiNx layer and is 10.3nm thick;
the first protective layer 102 is made of a NiCr layer and has a thickness of 1.38 nm;
the second dielectric layer 103 is made of a SiNx layer and is 35.7nm thick;
the second protective layer 104 is made of a NiCr layer and has a thickness of 1.10 nm;
the first functional layer 20 is made of an Ag layer and has a thickness of 12.71 nm;
the third protective layer 301 is made of a NiCr layer and has a thickness of 1.98 nm;
the third dielectric layer 302 is formed by ZnAlOx layers, and the thickness is 78.3 nm;
the fourth protective layer 303 is made of a NiCr layer and has a thickness of 0.77 nm;
the second functional layer 40 is formed by an Ag layer, and the thickness is 15.98 nm;
the fifth protective layer 501 is made of a NiCr layer and has a thickness of 1.31 nm;
the fourth dielectric layer 502 is made of a SiNx layer and has a thickness of 28.3 nm.
The double-silver low-emissivity coated glass substrate 100 prepared in the embodiment is high-quality 6mm white glass, and after the structural film layer is coated, the parameters of the double-silver low-emissivity coated glass single sheet are as follows:
transmittance T is 46.99%, a is-1.88, b is 1.36;
glass surface color L was 25.48, a was 2.41, b was-4.77.
Example 2:
referring to fig. 1 to 4, the film structure in the present embodiment is:
the first dielectric layer 101 is a SiNx layer with the thickness of 17.7 nm;
the first protective layer 102 is made of a NiCr layer and has a thickness of 2.62 nm;
the second dielectric layer 103 is made of a SiNx layer and is 33.4nm thick;
the second protective layer 104 is made of a NiCr layer and has a thickness of 0 nm;
the first functional layer 20 is made of an Ag layer and has a thickness of 7.67 nm;
the third protective layer 301 is made of a NiCr layer and has a thickness of 1.38 nm;
the third dielectric layer 302 is formed by ZnAlOx layers, and the thickness is 71.5 nm;
the fourth protective layer 303 is made of a NiCr layer and has a thickness of 0 nm;
the second functional layer 40 is formed by an Ag layer, and the thickness is 13.69 nm;
the fifth protective layer 501 is made of a NiCr layer and has a thickness of 0.69 nm;
the fourth dielectric layer 502 is made of a SiNx layer and has a thickness of 33.1 nm.
The base of the double-silver low-emissivity coated glass prepared in the embodiment is 6mm high-quality white glass, and after the structural film layer is coated, the parameters of the double-silver low-emissivity coated glass single sheet are as follows:
the transmittance T was 48.66%, a was-1.76, b was 3.20;
glass surface color L was 28.40, a was 0.71, b was-4.46.
Example 3:
referring to fig. 1 to 4, the film structure in the present embodiment is:
the first dielectric layer 101 is a SiNx layer and is 12.3nm thick;
the first protective layer 102 is made of a NiCr layer and has a thickness of 3.49 nm;
the second dielectric layer 103 is made of a SiNx layer and is 39.2nm thick;
the second protective layer 104 is made of a NiCr layer and has a thickness of 0.07 nm;
the first functional layer 20 is made of an Ag layer and has a thickness of 10.68 nm;
the third protective layer 301 is made of a NiCr layer and has a thickness of 0.63 nm;
the third dielectric layer 302 is formed by a ZnAlOx layer, and the thickness is 67.3 nm;
the fourth protective layer 303 is made of a NiCr layer and has a thickness of 1.21 nm;
the second functional layer 40 is formed by an Ag layer, and the thickness is 17.33 nm;
the fifth protective layer 501 is made of a NiCr layer, and has a thickness of 1.89 nm;
the fourth dielectric layer 502 is made of a SiNx layer and has a thickness of 37.7 nm.
The base of the double-silver low-emissivity coated glass prepared in the embodiment is 6mm high-quality white glass, and after the structural film layer is coated, the parameters of the double-silver low-emissivity coated glass single sheet are as follows:
the transmittance T was 47.88%, a was-1.81, b was 2.28;
glass surface color L was 26.91, a was 1.59, and b was-4.61.
Example 4:
referring to fig. 1 to 4, the film structure in the present embodiment is:
the first dielectric layer 101 is a SiNx layer with the thickness of 14.1 nm;
the first protective layer 102 is made of a NiCr layer and has a thickness of 4.98 nm;
the second dielectric layer 103 is made of a SiNx layer and has a thickness of 36.1 nm;
the second protective layer 104 is made of a NiCr layer and has a thickness of 1.89 nm;
the first functional layer 20 is made of an Ag layer and has a thickness of 5.0 nm;
the third protective layer 301 is made of a NiCr layer and has a thickness of 1.72 nm;
the third dielectric layer 302 is formed by ZnAlOx layers, and the thickness is 75.5 nm;
the fourth protective layer 303 is made of a NiCr layer and has a thickness of 1.97 nm;
the second functional layer 40 is formed by an Ag layer, and the thickness is 10.31 nm;
the fifth protective layer 501 is made of a NiCr layer, and has a thickness of 0.91 nm;
the fourth dielectric layer 502 is made of a SiNx layer and has a thickness of 35.4 nm.
The base of the double-silver low-emissivity coated glass prepared in the embodiment is 6mm high-quality white glass, and after the structural film layer is coated, the parameters of the double-silver low-emissivity coated glass single sheet are as follows:
the transmittance T was 47.88%, a was-1.81, b was 2.28;
glass surface color L was 26.91, a was 1.59, and b was-4.61.
Example 5:
referring to fig. 1 to 4, the film structure in the present embodiment is:
the first dielectric layer 101 is a SiNx layer and is 15.9nm thick;
the first protective layer 102 is made of a NiCr layer and has a thickness of 3.07 nm;
the second dielectric layer 103 is made of a SiNx layer and is 37.7nm thick;
the second protective layer 104 is made of a NiCr layer and has a thickness of 0.77 nm;
the first functional layer 20 is made of an Ag layer and has a thickness of 14.94 nm;
the third protective layer 301 is made of a NiCr layer and has a thickness of 1.03 nm;
the third dielectric layer 302 is formed by ZnAlOx layers, and the thickness is 61.2 nm;
the fourth protective layer 303 is made of a NiCr layer and has a thickness of 0.49 nm;
the second functional layer 40 is formed by an Ag layer, and the thickness is 12.36 nm;
the fifth protective layer 501 is made of a NiCr layer, and has a thickness of 1.58 nm;
the fourth dielectric layer 502 is made of a SiNx layer and has a thickness of 41.3 nm.
The base of the double-silver low-emissivity coated glass prepared in the embodiment is 6mm high-quality white glass, and after the structural film layer is coated, the parameters of the double-silver low-emissivity coated glass single sheet are as follows:
the transmittance T was 47.88%, a was-1.81, b was 2.28;
glass surface color L was 26.91, a was 1.59, and b was-4.61.
Table 1: examples 6mm double silver Low emissivity coated glass color values
According to the embodiment and the table 1, the coated glass product prepared by the utility model has the advantages that different positions are detected, the front color difference and the side color difference delta a are less than 2.5, the whole color is uniform, the color is neutral gray tone when observed from various angles, and the color has higher uniformity. The product transmittance T is 40-50%, the transmission color a is 0-1, and b is-1.0-4.0; the glass surface has the reflection color L of 25-29, a of 0.33-0.71 and b of-2.33-4.46, the product has stable color, and the gray is pure when observed outdoors and indoors, and color cast does not occur.
The above is only the optional embodiment of the present invention, and not therefore the limit of the patent scope of the present invention, all of which are in the concept of the present invention, the equivalent structure transformation of the content of the specification and the drawings is utilized, or the direct/indirect application is included in other related technical fields in the patent protection scope of the present invention.
Claims (10)
1. The utility model provides a neutral grey low-emissivity coated glass, includes the glass substrate and plates and locate coating film layer on the glass substrate, its characterized in that, coating film layer include certainly the glass substrate outwards sets gradually:
the first dielectric layer is a SiNx layer;
the first protective layer is a NiCr layer;
the second dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer;
a first functional layer which is an Ag layer;
the third protective layer is a NiCr layer;
the third dielectric layer is at least one of a SiNx layer, a ZnSnOx layer or a ZnAlOx layer;
a second functional layer, which is an Ag layer;
a fifth protective layer, which is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer; and
and the fourth dielectric layer is a SiNx layer.
2. The neutral gray low-emissivity coated glass according to claim 1, wherein the first dielectric layer has a thickness of 10 to 18nm, and/or the first protective layer has a thickness of 1 to 5nm, and/or the second dielectric layer has a thickness of 33 to 40nm, and/or the first functional layer has a thickness of 5 to 15nm, and/or the third protective layer has a thickness of 0.5 to 2nm, and/or the third dielectric layer has a thickness of 60 to 80nm, and/or the second functional layer has a thickness of 10 to 18nm, and/or the fifth protective layer has a thickness of 0.5 to 2nm, and/or the fourth dielectric layer has a thickness of 28 to 42 nm.
3. The neutral gray low-emissivity coated glass according to claim 2, wherein the first dielectric layer has a thickness of 10.3nm, and/or the first protective layer has a thickness of 1.38nm, and/or the second dielectric layer has a thickness of 35.7nm, and/or the first functional layer has a thickness of 12.71nm, and/or the third protective layer has a thickness of 1.98nm, and/or the third dielectric layer has a thickness of 78.3nm, and/or the second functional layer has a thickness of 15.98nm, and/or the fifth protective layer has a thickness of 1.31nm, and/or the fourth dielectric layer has a thickness of 28.3 nm.
4. The neutral gray low-emissivity coated glass according to claim 2, wherein the first dielectric layer has a thickness of 17.7nm, and/or the first protective layer has a thickness of 2.62nm, and/or the second dielectric layer has a thickness of 33.4nm, and/or the first functional layer has a thickness of 7.67nm, and/or the third protective layer has a thickness of 1.38nm, and/or the third dielectric layer has a thickness of 71.5nm, and/or the second functional layer has a thickness of 13.69nm, and/or the fifth protective layer has a thickness of 0.69nm, and/or the fourth dielectric layer has a thickness of 33.1 nm.
5. The neutral gray low-emissivity coated glass of claim 1, wherein said coating further comprises:
and the second protective layer is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and is arranged between the second dielectric layer and the first functional layer.
6. The neutral gray low-emissivity coated glass of claim 5, wherein the second protective layer has a thickness of no more than 2 nm.
7. The neutral gray low-emissivity coated glass of claim 1, wherein said coating further comprises:
and the fourth protective layer is at least one of a NiCr layer, a Cr layer, a NiCrOx layer or a NiCrNx layer, and is arranged between the third dielectric layer and the second functional layer.
8. The neutral gray low-emissivity coated glass of claim 7, wherein the fourth protective layer has a thickness of no more than 2 nm.
9. The neutral gray low-emissivity coated glass according to claim 1, wherein the neutral gray low-emissivity coated glass has a transmittance T of 40 to 50%, a transmittance color a of 0 to-1, and a transmittance color b of-1.0 to-4.0.
10. The neutral gray low-emissivity coated glass according to claim 1, wherein the glass surface reflection color L of the neutral gray low-emissivity coated glass is 25-29, a is 0.33-0.71, and b is-2.33-4.46.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021666405.6U CN212357053U (en) | 2020-08-11 | 2020-08-11 | Neutral-ash low-radiation coated glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021666405.6U CN212357053U (en) | 2020-08-11 | 2020-08-11 | Neutral-ash low-radiation coated glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212357053U true CN212357053U (en) | 2021-01-15 |
Family
ID=74132426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021666405.6U Active CN212357053U (en) | 2020-08-11 | 2020-08-11 | Neutral-ash low-radiation coated glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212357053U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111825339A (en) * | 2020-08-11 | 2020-10-27 | 浙江旗滨节能玻璃有限公司 | Neutral-ash low-radiation coated glass and preparation method thereof |
-
2020
- 2020-08-11 CN CN202021666405.6U patent/CN212357053U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111825339A (en) * | 2020-08-11 | 2020-10-27 | 浙江旗滨节能玻璃有限公司 | Neutral-ash low-radiation coated glass and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1279535C (en) | Coated glass article as a new article of manufacture | |
| JPH02239135A (en) | Coated glass material and method for said coating | |
| JPH07165442A (en) | Transparent base material having thin layer formed thereon and use thereof for controlling heat insulation and/or sunshine | |
| CN212357053U (en) | Neutral-ash low-radiation coated glass | |
| CN107663029B (en) | European gray low-emissivity coated glass | |
| US5022726A (en) | Magnesium film reflectors | |
| CN209276384U (en) | A kind of glass surface film surface no color differnece low radiation coated glass | |
| CN111825339A (en) | Neutral-ash low-radiation coated glass and preparation method thereof | |
| CN107471785A (en) | A kind of double silver low radiation energy-saving glass of high-performance | |
| JPH013036A (en) | Low reflective coated articles | |
| JPH10139491A (en) | Low reflecting dark gray glass | |
| WO2023156927A1 (en) | Heat treatable coated article having antireflective coating(s) on substrate | |
| CN215975555U (en) | Semi-reflecting and semi-permeable film glass | |
| CN212357052U (en) | Emerald green low-radiation coated glass | |
| JP2811885B2 (en) | Heat shielding glass | |
| CN214193059U (en) | Double-silver low-emissivity coated glass | |
| CN109052989B (en) | Low-emissivity coated glass with brown substrate effect and preparation method thereof | |
| CN103481596B (en) | Temperable blue low radiation energy-saving glass | |
| CN203600723U (en) | Blue toughened low-radiation and energy-saving glass | |
| JPS63239043A (en) | Infrared reflecting article | |
| CN114988718A (en) | Processing-resistant high-permeability tempered coated glass, manufacturing method thereof and hollow glass piece | |
| CN113233785B (en) | Semi-reflective semi-permeable membrane glass and preparation method thereof | |
| JPH04300227A (en) | Glass coated with thin tisin film | |
| JP2871401B2 (en) | Heat shielding glass with reduced film surface reflection | |
| CN210048664U (en) | 24K-imitated gold double-silver low-radiation coated glass with gold copper mirror |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |