CN212299538U - Ultrapure water heat exchange system - Google Patents
Ultrapure water heat exchange system Download PDFInfo
- Publication number
- CN212299538U CN212299538U CN202020555515.9U CN202020555515U CN212299538U CN 212299538 U CN212299538 U CN 212299538U CN 202020555515 U CN202020555515 U CN 202020555515U CN 212299538 U CN212299538 U CN 212299538U
- Authority
- CN
- China
- Prior art keywords
- heat exchange
- ultrapure water
- circulating fluid
- pipeline
- semiconductor chilling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Abstract
The utility model discloses an ultrapure water heat exchange system, a sleeve heat exchange pipeline is connected between an ultrapure water system and a circulating fluid system, the sleeve heat exchange pipeline is adopted to realize the heat exchange between circulating fluid and ultrapure water, the ultrapure water pipeline adopts a soft clean pipeline, the link of ultrapure water pollution is reduced, and the arrangement is convenient; in the process, heat in the ultrapure water is transferred into the circulating fluid through the sleeve heat exchange pipeline, and after a circulating fluid temperature signal is acquired by the first temperature sensor, the output heat exchange quantity of the semiconductor refrigerating sheet of the temperature control system is analyzed and matched by the microcomputer processing system, so that the temperature of the circulating fluid is adjusted, and further the heat exchange control of the ultrapure water is realized; the device has the advantages of no other directly contacted components, simple loop, low cost, realization of heat exchange, reduction of the possibility of ultrapure water pollution while ensuring the requirements of semiconductor process, and high reliability.
Description
Technical Field
The utility model relates to a heat exchange system, in particular to ultrapure water heat exchange system.
Background
Ultrapure water (Ultrapure water), also known as UP water, is water having a resistivity of 18 M.OMEGA.CM (25 ℃ C.). The water has few impurities except water molecules, no organic matters such as bacteria, viruses and chlorine-containing dioxin, and certainly no mineral trace elements required by human bodies, namely water with all atoms except oxygen and hydrogen removed.
In semiconductor manufacturing, ultrapure water is used in wafer cleaning and etching. Particularly, wafer residues, which are the main cause of the large consumption of ultrapure water in wafer factories. The water vapor source is used for cleaning semiconductor raw materials and utensils used in the integrated circuit industry, preparing photoetching masks, oxidizing silicon wafers and the like. In addition, ultrapure water is used in the fabrication of other solid state electronic devices, thick and thin film circuits, printed circuits, vacuum tubes, and the like. Different from the requirements of ultrapure water in other industries, in the semiconductor industry, the ultrapure water has extremely strict water quality requirements.
In a semiconductor process, a part of process procedures generate heat, and in order to ensure the stability and the reliability of the process procedures, temperature control equipment needs to be introduced to ensure the temperature of ultrapure water in the process procedures, so that a corresponding ultrapure water heat exchange system also needs to be solved in a matching way.
SUMMERY OF THE UTILITY MODEL
Utility model purpose: the utility model aims at providing an ultrapure water heat exchange system has ultrapure water temperature control's function.
The technical scheme is as follows: the utility model discloses an ultrapure water heat exchange system, which comprises a temperature control system, a circulating fluid system and an ultrapure water system, wherein a sleeve heat exchange pipeline is connected between the ultrapure water system and the circulating fluid system, and the sleeve heat exchange pipeline is used for realizing the heat exchange of circulating ultrapure water fluid; the casing heat exchange pipeline comprises a circulating fluid inlet, a circulating fluid outlet, an ultrapure water inlet and an ultrapure water outlet, wherein the circulating fluid flows in the circulating fluid pipeline, the ultrapure water fluid flows in the ultrapure water pipeline, the circulating fluid pipeline is sleeved outside the ultrapure water pipeline, the ultrapure water pipeline in the circulating fluid pipeline can be a single pipeline or a plurality of pipelines, and the flowing directions of the circulating fluid and the ultrapure water fluid are opposite.
Furthermore, the temperature control system comprises a first heat exchange cold plate and a semiconductor refrigeration piece, the plant water in the first heat exchange cold plate exchanges heat with the semiconductor refrigeration piece, the plant water carries away heat or cold generated by the semiconductor refrigeration piece, circulating fluid in the second heat exchange cold plate exchanges heat with the semiconductor refrigeration piece, and the circulating fluid carries away cold or heat generated by the semiconductor refrigeration piece.
Furthermore, the circulating fluid system comprises a second heat exchange cold plate and a semiconductor refrigerating sheet, circulating fluid in the second heat exchange cold plate exchanges heat with the semiconductor refrigerating sheet, and the circulating fluid takes away cold or heat generated by the semiconductor refrigerating sheet.
Furthermore, the circulating fluid system also comprises a first temperature sensor for detecting the temperature of the circulating fluid at the outlet of the water pump, a second temperature sensor for detecting the temperature of the circulating fluid at the outlet of the sleeve heat exchange pipeline, and a pressure sensor for detecting the pressure of the circulating fluid at the outlet of the water pump.
Further, circulating fluid system still includes the drainage pipe way, and the drainage pipe way is provided with the stop valve.
Has the advantages that: compared with the prior art, the utility model: the heat exchange between the circulating fluid and the ultrapure water is realized by adopting a sleeve heat exchange pipeline, and the ultrapure water pipeline adopts a soft clean pipeline, so that the link of ultrapure water pollution is reduced, and the arrangement is convenient; in the process, heat in the ultrapure water is transferred into the circulating fluid through the sleeve heat exchange pipeline, and after a circulating fluid temperature signal is acquired by the first temperature sensor, the output heat exchange quantity of the semiconductor refrigerating sheet of the temperature control system is analyzed and matched by the microcomputer processing system, so that the temperature of the circulating fluid is adjusted, and further the heat exchange control of the ultrapure water is realized; the device has the advantages of no other directly contacted components, simple loop, low cost, realization of heat exchange, reduction of the possibility of ultrapure water pollution while ensuring the requirements of semiconductor process, and high reliability.
Drawings
FIG. 1 is a schematic diagram of the system of the present embodiment;
fig. 2 is a schematic diagram of the heat exchange pipeline of the bushing in this embodiment.
Detailed Description
As shown in FIG. 1, an ultrapure water heat exchange system comprises a temperature control system and a circulating fluid system.
The temperature control system comprises a first heat exchange cold plate 10 and a semiconductor refrigeration piece 11, plant water in the first heat exchange cold plate 10 exchanges heat with the semiconductor refrigeration piece 11, the plant water carries away heat or cold generated by the semiconductor refrigeration piece 11, circulating fluid in the second heat exchange cold plate 5 exchanges heat with the semiconductor refrigeration piece 11, and the circulating fluid carries away cold or heat generated by the semiconductor refrigeration piece 11.
The circulating fluid system comprises a second heat exchange cold plate 5 and semiconductor chilling plates 11, circulating fluid in the second heat exchange cold plate 5 exchanges heat with the semiconductor chilling plates 11, and the circulating fluid carries away cold or heat generated by the semiconductor chilling plates 11.
The circulating fluid system further comprises a water pump 7, a filter 3, a flow meter 4 and a water tank 6 which are sequentially connected, an outlet of the second heat exchange cold plate 5 is communicated with the water tank 6, and an inlet of the second heat exchange cold plate 5 is communicated with an outlet of the filter 3. A sleeve heat exchange pipeline 1 is arranged between a water pump 7 and a filter 3 of the circulating fluid system, the sleeve heat exchange pipeline 1 further comprises a circulating fluid inlet, a circulating fluid outlet, an ultrapure water inlet and an ultrapure water outlet, the outlet of the water pump 7 of the circulating fluid system is communicated with the circulating fluid inlet of the sleeve heat exchange pipeline 1, and the circulating fluid outlet of the sleeve heat exchange pipeline 1 is communicated with the inlet of the filter 3; an ultrapure water inlet and an ultrapure water outlet of the sleeve heat exchange pipeline 1 are communicated with an ultrapure water system, and the ultrapure water pipeline 1-2 can be a single pipeline or a plurality of pipelines.
As shown in FIG. 2, the circulating fluid flows in the circulating fluid line 1-1, the ultrapure water fluid flows in the ultrapure water line 1-2, and the circulating fluid line 1-1 is sleeved outside the ultrapure water line 1-2, and the circulating fluid and the ultrapure water fluid flow in opposite directions.
As shown in fig. 1, the circulating fluid system further comprises a first temperature sensor 9 for detecting the temperature of the circulating fluid at the outlet of the water pump 7, a second temperature sensor 2 for detecting the temperature of the circulating fluid at the outlet of the casing heat exchange pipeline 1, and a pressure sensor 8 for detecting the pressure of the circulating fluid at the outlet of the water pump 7. The circulating fluid system further comprises a liquid discharge pipeline, the liquid discharge pipeline is provided with a stop valve 12, and the stop valve 12 is used for dredging of cleaning.
Claims (5)
1. An ultrapure water heat exchange system comprises a temperature control system, a circulating fluid system and an ultrapure water system, and is characterized in that a sleeve heat exchange pipeline (1) is connected between the ultrapure water system and the circulating fluid system, and the sleeve heat exchange pipeline (1) is used for realizing heat exchange of circulating ultrapure water fluid; the casing heat exchange pipeline (1) comprises a circulating fluid inlet, a circulating fluid outlet, an ultrapure water inlet and an ultrapure water outlet, wherein the circulating fluid flows in the circulating fluid pipeline (1-1), the ultrapure water fluid flows in the ultrapure water pipeline (1-2), the circulating fluid pipeline (1-1) is sleeved outside the ultrapure water pipeline (1-2), the ultrapure water pipeline (1-2) in the circulating fluid pipeline (1-1) can be a single pipeline or a plurality of pipelines, and the flowing directions of the circulating fluid and the ultrapure water fluid are opposite.
2. The ultrapure water heat exchange system according to claim 1, wherein the temperature control system comprises a first heat exchange cold plate (10) and semiconductor chilling plates (11), the plant water in the first heat exchange cold plate (10) exchanges heat with the semiconductor chilling plates (11), the plant water carries away heat or cold generated by the semiconductor chilling plates (11), the circulating fluid in the second heat exchange cold plate (5) exchanges heat with the semiconductor chilling plates (11), and the circulating fluid carries away cold or heat generated by the semiconductor chilling plates (11).
3. An ultrapure water heat exchange system according to claim 1 wherein the circulating fluid system comprises a second heat exchange cold plate (5) and semiconductor chilling plates (11), the circulating fluid in the second heat exchange cold plate (5) exchanges heat with the semiconductor chilling plates (11), and the circulating fluid carries away the cold or heat generated by the semiconductor chilling plates (11).
4. An ultrapure water heat exchange system according to claim 2 or 3 wherein the circulating fluid system further comprises a first temperature sensor (9) for detecting the temperature of the circulating fluid at the outlet of the water pump (7), a second temperature sensor (2) for detecting the temperature of the circulating fluid at the outlet of the bushing heat exchange line (1), a pressure sensor (8) for detecting the pressure of the circulating fluid at the outlet of the water pump (7).
5. An ultrapure water heat exchange system according to claim 2 wherein the circulating fluid system further comprises a drain line provided with a shut-off valve (12).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020555515.9U CN212299538U (en) | 2020-04-15 | 2020-04-15 | Ultrapure water heat exchange system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020555515.9U CN212299538U (en) | 2020-04-15 | 2020-04-15 | Ultrapure water heat exchange system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212299538U true CN212299538U (en) | 2021-01-05 |
Family
ID=73973141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020555515.9U Active CN212299538U (en) | 2020-04-15 | 2020-04-15 | Ultrapure water heat exchange system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212299538U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112965543A (en) * | 2021-02-03 | 2021-06-15 | 合肥亦威科技有限公司 | Temperature control system with ultrahigh temperature control precision |
| CN113666455A (en) * | 2021-08-19 | 2021-11-19 | 合肥亦威科技有限公司 | Pure water generation system for semiconductor temperature control system |
-
2020
- 2020-04-15 CN CN202020555515.9U patent/CN212299538U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112965543A (en) * | 2021-02-03 | 2021-06-15 | 合肥亦威科技有限公司 | Temperature control system with ultrahigh temperature control precision |
| CN113666455A (en) * | 2021-08-19 | 2021-11-19 | 合肥亦威科技有限公司 | Pure water generation system for semiconductor temperature control system |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN212299538U (en) | Ultrapure water heat exchange system | |
| TW482871B (en) | Vacuum device | |
| WO2015002740A1 (en) | Reactor gas panel common exhaust | |
| CN2905064Y (en) | Water heating device for medical instrument cleaning and disinfecting apparatus | |
| TWI721213B (en) | Substrate cleaning device and substrate cleaning method | |
| CN205699783U (en) | Glass washing wastewater recycle device | |
| CN207986919U (en) | A kind of ultrapure water apparatus of multistage filtering self-circulation type | |
| CN212396595U (en) | Production line for copper corrosive liquid | |
| CN214244671U (en) | Diffusion furnace clean bench cooling system | |
| CN217458895U (en) | Integrated deoxygenation membrane vacuum device | |
| CN204752439U (en) | Ultrapure water system terminal quality of water hoisting device | |
| CN207672152U (en) | A kind of big kilogram of sapphire crystal growth water-cooling apparatus | |
| CN104375391A (en) | Method and device for controlling photoetching machine | |
| CN214050481U (en) | High-efficiency ammonia evaporator | |
| CN207210162U (en) | A kind of wastewater treatment equipment of convenient purification | |
| CN216141400U (en) | Device for improving pure water resistivity | |
| CN210085132U (en) | Ultrapure water automatic cycle regeneration system | |
| CN111322902A (en) | Two-stage heat exchange precise temperature control system | |
| CN214226880U (en) | Wet etching equipment with function of improving metal pollution | |
| CN110779980A (en) | VOCs monitoring system for in-situ thermal desorption | |
| KR102296540B1 (en) | Impurity reduction system of the used etching liquid | |
| CN220723713U (en) | Multistage integrated reclaimed water recycling equipment | |
| CN213485470U (en) | Large-scale shipborne radar cooling system | |
| CN212412018U (en) | High-precision temperature control system for wafer plating solution | |
| CN212403816U (en) | Water treatment device for purifying water |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |