CN212030032U - Spin-drying device for producing single silicon wafer - Google Patents
Spin-drying device for producing single silicon wafer Download PDFInfo
- Publication number
- CN212030032U CN212030032U CN202020218832.1U CN202020218832U CN212030032U CN 212030032 U CN212030032 U CN 212030032U CN 202020218832 U CN202020218832 U CN 202020218832U CN 212030032 U CN212030032 U CN 212030032U
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- Prior art keywords
- spin
- drying
- dries
- rotary disk
- silicon wafer
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- 238000001035 drying Methods 0.000 title claims abstract description 82
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 21
- 239000010703 silicon Substances 0.000 title claims abstract description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims description 19
- 238000003466 welding Methods 0.000 claims description 7
- 238000007664 blowing Methods 0.000 abstract description 10
- 238000007789 sealing Methods 0.000 abstract description 5
- 230000003749 cleanliness Effects 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 15
- 230000005540 biological transmission Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The utility model discloses a monosilicon wafer production is with device that spin-dries, including spin-drying device casing, control box, rotatory mechanism, the hot blast mechanism that spin-dries, spin-drying device casing right side is provided with the control box, spin-dry device casing inside is provided with rotatory mechanism that spin-dries, rotatory mechanism upper portion that spin-dries is provided with the hot blast mechanism. Has the advantages that: the device is sealed through the drying device shell, the sealing performance of the drying device is improved, the single silicon wafer is dried through the rotary drying mechanism and the hot air blowing mechanism, and the cleanliness of the drying process is guaranteed through the drying quality and the drying speed.
Description
Technical Field
The utility model relates to a machinery equipment design field that spin-dries especially relates to monosilicon wafer production is with device that spin-dries.
Background
The monocrystalline silicon wafer is used as a base material of a solar cell piece for photovoltaic power generation, has wide market demand and is also used as a raw material of a computer chip, the silicon wafer is a semiconductor device base material, a silicon ingot is cut into a sheet-shaped base material with a certain thickness, a plurality of procedures are carried out on the base material to form semiconductor devices with various functions, the semiconductor devices are used as a basis for forming various electronic equipment, the monocrystalline silicon piece has strict requirements on production environment, and the use cleanliness and the sealing performance of equipment of a traditional spin-drying device for producing the monocrystalline silicon piece are required to be improved.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a single silicon wafer production is with device that spin-dries in order to solve above-mentioned problem.
The utility model discloses a following technical scheme realizes above-mentioned purpose:
single silicon wafer production is with device that spin-dries, including device casing, control box, rotatory mechanism, the hot blast mechanism that spin-dries, the device casing right side that spin-dries is provided with the control box, the device casing that spin-dries inside is provided with rotatory mechanism that spin-dries, rotatory mechanism upper portion that spin-dries is provided with the hot blast mechanism.
Preferably, the casing of the spin drying device comprises a casing base, the lower part of the casing base is connected with supporting legs, the upper part of the casing base is connected with the side wall of the spin drying barrel, the upper side of the rear part of the side wall of the spin drying barrel is provided with a connecting hinge, the upper side of the connecting hinge is connected with a spin drying barrel cover, two sides of the side wall of the spin drying barrel are provided with supporting cylinders, the upper part of the supporting cylinder is provided with a supporting rod, the front part of the spin drying barrel cover is provided with a barrel cover lock catch, the lower part of the casing base is connected with a drainage pipeline, the casing base is connected with the supporting legs through welding, the casing base is connected with the side wall of the spin drying barrel through welding, the side wall of the spin drying barrel is connected with the spin drying barrel, the drainage pipeline is connected with the shell base through bolts.
Preferably, the rotary spin-drying mechanism comprises a rotary disk, a single group of fixing net is arranged on the upper portion of the rotary disk, a transmission belt is arranged on the lower portion of the rotary disk, a driving motor is arranged on the upper portion of the transmission belt, the single group of fixing net is connected with the rotary disk through a bolt, and the driving motor is connected with the rotary disk through the transmission belt.
Preferably, the rotary spin-drying mechanism comprises a rotary disk, a plurality of groups of fixing nets are arranged on the upper portion of the rotary disk, a transmission belt is arranged on the lower portion of the rotary disk, a driving motor is arranged on the upper portion of the transmission belt, the plurality of groups of fixing nets are connected with the rotary disk through bolts, and the driving motor is connected with the rotary disk through the transmission belt.
Preferably, the hot air blowing mechanism comprises a heating air box, an air inlet filter screen is arranged at the rear part of the heating air box, a hot air pipeline is connected to the upper part of the heating air box, an air outlet nozzle is connected to the upper end of the hot air pipeline, the air inlet filter screen is connected with the heating air box through a bolt, and the heating air box is connected with the air outlet nozzle through the hot air pipeline.
Has the advantages that: the device is sealed through the drying device shell, the sealing performance of the drying device is improved, the single silicon wafer is dried through the rotary drying mechanism and the hot air blowing mechanism, and the cleanliness of the drying process is guaranteed through the drying quality and the drying speed.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive exercise.
FIG. 1 is a first perspective view of a spin-drying apparatus for producing a single silicon wafer according to embodiment 1 of the present invention;
FIG. 2 is a second perspective view of the spin-drying apparatus for producing a single silicon wafer according to embodiment 1 of the present invention;
FIG. 3 is a third perspective view of the spin-drying apparatus for producing a single silicon wafer according to embodiment 1 of the present invention;
fig. 4 is a perspective view of embodiment 2 of the spin-drying device for producing single silicon wafers.
The reference numerals are explained below: 1. a drying device shell; 2. a control box; 3. a rotary spin-drying mechanism; 4. a hot air blowing mechanism; 101. a housing base; 102. supporting legs; 103. the side wall of the spin dryer tube; 104. a connecting hinge; 105. a barrel cover is dried; 106. a support cylinder; 107. a support bar; 108. locking the barrel cover; 109. a water discharge pipeline; 301. rotating the disc; 302. a single set of fixed nets; 303. a plurality of groups of fixed nets; 304. a drive motor; 305. a drive belt; 401. a heating bellows; 402. an air inlet filter screen; 403. a hot air duct; 404. and an air outlet nozzle.
Detailed Description
The present invention will be further explained with reference to the accompanying drawings:
in the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
Example 1
As shown in fig. 1, 2 and 3, the spin-drying device for producing the single silicon wafer comprises a spin-drying device shell 1, a control box 2, a rotary spin-drying mechanism 3 and a hot air blowing mechanism 4, wherein the control box 2 is arranged on the right side of the spin-drying device shell 1, the rotary spin-drying mechanism 3 is arranged inside the spin-drying device shell 1, and the hot air blowing mechanism 4 is arranged on the upper portion of the rotary spin-drying mechanism 3.
Preferably, the casing 1 of the spin drying device comprises a casing base 101, the lower part of the casing base 101 is connected with supporting legs 102, the upper part of the casing base 101 is connected with a side wall 103 of the spin drying barrel, the upper side of the rear part of the side wall 103 of the spin drying barrel is provided with a connecting hinge 104, the upper side of the connecting hinge 104 is connected with a spin drying barrel cover 105, two sides of the side wall 103 of the spin drying barrel are provided with supporting rods 107, the front part of the spin drying barrel cover 105 is provided with a barrel cover lock 108, the lower part of the casing base 101 is connected with a drainage pipeline 109, the casing base 101 is connected with the supporting legs 102 by welding, the casing base 101 is connected with the side wall 103 of the spin drying barrel by welding, the side wall 103 of the spin drying barrel is connected with the barrel cover 105 by the connecting hinge 104, the supporting rods 106, the rotary spin-drying mechanism 3 comprises a rotary disc 301, a single group of fixing nets 302 are arranged on the upper portion of the rotary disc 301, a transmission belt 305 is arranged on the lower portion of the rotary disc 301, a driving motor 304 is arranged on the upper portion of the transmission belt 305, the single group of fixing nets 302 are connected with the rotary disc 301 through bolts, the driving motor 304 is connected with the rotary disc 301 through the transmission belt 305, the hot air blowing mechanism 4 comprises a heating air box 401, an air inlet filter screen 402 is arranged on the rear portion of the heating air box 401, the upper portion of the heating air box 401 is connected with a hot air pipeline 403, an air outlet nozzle 404 is connected to the upper end of the hot air pipeline.
In the structure, the control box 2 controls the circuit to operate, the driving motor 304 drives the rotating disc 301 to rotate through the transmission belt 305, the single-group fixing net 302 fixes the single silicon wafer to finish spin-drying, the heating air box 401 sucks in filtered air through the air inlet filter screen 402, hot air is sprayed out from the air outlet nozzle 404 to accelerate drying, the spin-drying barrel cover 105 and the barrel cover lock 108 finish sealing of the device, and the drainage pipeline 109 discharges waste water.
Example 2
As shown in fig. 4, the spin-drying device for producing the single silicon wafer comprises a spin-drying device shell 1, a control box 2, a rotary spin-drying mechanism 3 and a hot air blowing mechanism 4, wherein the control box 2 is arranged on the right side of the spin-drying device shell 1, the rotary spin-drying mechanism 3 is arranged inside the spin-drying device shell 1, and the hot air blowing mechanism 4 is arranged on the upper portion of the rotary spin-drying mechanism 3.
Preferably, the casing 1 of the spin drying device comprises a casing base 101, the lower part of the casing base 101 is connected with supporting legs 102, the upper part of the casing base 101 is connected with a side wall 103 of the spin drying barrel, the upper side of the rear part of the side wall 103 of the spin drying barrel is provided with a connecting hinge 104, the upper side of the connecting hinge 104 is connected with a spin drying barrel cover 105, two sides of the side wall 103 of the spin drying barrel are provided with supporting rods 107, the front part of the spin drying barrel cover 105 is provided with a barrel cover lock 108, the lower part of the casing base 101 is connected with a drainage pipeline 109, the casing base 101 is connected with the supporting legs 102 by welding, the casing base 101 is connected with the side wall 103 of the spin drying barrel by welding, the side wall 103 of the spin drying barrel is connected with the barrel cover 105 by the connecting hinge 104, the supporting rods 106, the rotary spin-drying mechanism 3 comprises a rotary disc 301, a plurality of groups of fixing nets 303 are arranged on the upper portion of the rotary disc 301, a transmission belt 305 is arranged on the lower portion of the rotary disc 301, a driving motor 304 is arranged on the upper portion of the transmission belt 305, the plurality of groups of fixing nets 303 are connected with the rotary disc 301 through bolts, the driving motor 304 is connected with the rotary disc 301 through the transmission belt 305, the hot air blowing mechanism 4 comprises a heating air box 401, an air inlet filter screen 402 is arranged on the rear portion of the heating air box 401, a hot air pipeline 403 is connected to the upper portion of the heating air box 401, an air outlet nozzle 404 is connected to the upper end of the hot.
In the structure, the control box 2 controls the circuit to operate, the driving motor 304 drives the rotating disc 301 to rotate through the transmission belt 305, the multiple groups of fixing nets 303 fix the single silicon wafer to finish spin-drying, the heating air box 401 sucks in filtered air through the air inlet filter screen 402, hot air is sprayed out from the air outlet nozzle 404 to accelerate drying, the spin-drying barrel cover 105 and the barrel cover lock 108 finish sealing of the device, and the drainage pipeline 109 discharges waste water.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (5)
1. Single silicon wafer production is with device that spin-dries, its characterized in that: including device casing (1), control box (2) spin-dry, rotatory mechanism (3) that spin-dries, hot blast mechanism (4), the device casing (1) right side that spin-dries is provided with control box (2), device casing (1) that spin-dries inside is provided with rotatory mechanism (3) that spin-dries, rotatory mechanism (3) upper portion that spin-dries is provided with hot blast mechanism (4).
2. The spin-drying device for single-silicon wafer production according to claim 1, wherein: the casing (1) of the spin-drying device comprises a casing base (101), the casing base (101) is connected with supporting legs (102) at the lower part, the upper part of the casing base (101) is connected with a spin-drying barrel side wall (103), a connecting hinge (104) is arranged at the upper side of the rear part of the spin-drying barrel side wall (103), a spin-drying barrel cover (105) is connected at the upper side of the connecting hinge (104), supporting cylinders (106) are arranged at the two sides of the spin-drying barrel side wall (103), a supporting rod (107) is arranged at the upper part of the supporting cylinder (106), a barrel cover lock catch (108) is arranged at the front part of the spin-drying barrel cover (105), a drainage pipe (109) is connected at the lower part of the casing base (101), the casing base (101) is connected with the supporting legs (102) through welding, the casing base (101) is connected with, the support cylinder (106) is connected with the side wall (103) of the spin dryer tube through a shaft pin, the support rod (107) is connected with the support cylinder (106) in a sliding mode, the cover lock catch (108) is connected with the spin dryer cover (105) through the shaft pin, and the drainage pipeline (109) is connected with the shell base (101) through a bolt.
3. The spin-drying device for single-silicon wafer production according to claim 1, wherein: rotatory mechanism (3) that spin-dries include rotary disk (301), rotary disk (301) upper portion is provided with single group's fixed net (302), rotary disk (301) lower part is provided with driving belt (305), driving belt (305) upper portion is provided with driving motor (304), single group's fixed net (302) is through bolted connection rotary disk (301), driving motor (304) are passed through driving belt (305) are connected rotary disk (301).
4. The spin-drying device for single-silicon wafer production according to claim 1, wherein: rotatory mechanism (3) that spin-dries include rotary disk (301), rotary disk (301) upper portion is provided with fixed net of multiunit (303), rotary disk (301) lower part is provided with drive belt (305), drive belt (305) upper portion is provided with driving motor (304), fixed net of multiunit (303) is through bolted connection rotary disk (301), driving motor (304) are passed through drive belt (305) are connected rotary disk (301).
5. The spin-drying device for single-silicon wafer production according to claim 1, wherein: hot blast mechanism (4) are including heating bellows (401), heating bellows (401) rear portion is provided with air inlet filter screen (402), hot-blast main (403) is connected on heating bellows (401) upper portion, air outlet nozzle (404) is connected to hot-blast main (403) upper end, air inlet filter screen (402) passes through bolted connection heating bellows (401), heating bellows (401) pass through hot-blast main (403) are connected air outlet nozzle (404).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020218832.1U CN212030032U (en) | 2020-02-27 | 2020-02-27 | Spin-drying device for producing single silicon wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020218832.1U CN212030032U (en) | 2020-02-27 | 2020-02-27 | Spin-drying device for producing single silicon wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212030032U true CN212030032U (en) | 2020-11-27 |
Family
ID=73492256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020218832.1U Expired - Fee Related CN212030032U (en) | 2020-02-27 | 2020-02-27 | Spin-drying device for producing single silicon wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212030032U (en) |
-
2020
- 2020-02-27 CN CN202020218832.1U patent/CN212030032U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20221123 Address after: 213100 Room B605, Floor 6, Building B, No. 18, Xingao Road, Niutang Town, Wujin District, Changzhou City, Jiangsu Province Patentee after: Changzhou Heyu Electronic New Materials Co.,Ltd. Address before: 313000 800 Zhenbei Road, Zhili Town, Wuxing District, Huzhou City, Zhejiang Province Patentee before: ZHEJIANG BEISHENG NEW MATERIAL TECHNOLOGY Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20201127 |