CN211914910U - Bracket for cleaning large-diameter silicon wafer box - Google Patents
Bracket for cleaning large-diameter silicon wafer box Download PDFInfo
- Publication number
- CN211914910U CN211914910U CN201922380743.7U CN201922380743U CN211914910U CN 211914910 U CN211914910 U CN 211914910U CN 201922380743 U CN201922380743 U CN 201922380743U CN 211914910 U CN211914910 U CN 211914910U
- Authority
- CN
- China
- Prior art keywords
- silicon wafer
- box
- fixed beam
- wafer box
- supporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 239000010703 silicon Substances 0.000 title claims abstract description 59
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 59
- 238000004140 cleaning Methods 0.000 title claims abstract description 23
- 230000007246 mechanism Effects 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 8
- 230000002146 bilateral effect Effects 0.000 claims abstract description 6
- 230000003139 buffering effect Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 6
- 239000002033 PVDF binder Substances 0.000 abstract description 3
- 239000012535 impurity Substances 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 229910021645 metal ion Inorganic materials 0.000 abstract description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 44
- 239000013078 crystal Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Abstract
The utility model provides a bracket for cleaning a large-diameter silicon wafer box, which comprises a fixed beam, a supporting mechanism and a rotating frame, wherein the supporting mechanism is arranged on the fixed beam and is used for supporting a box body of the silicon wafer box; the rotating frame is connected to the fixed beam and can rotate relative to the fixed beam; the rotating frame is used for fixing a box cover of the silicon wafer box. The utility model relates to a cleaning bracket for large-diameter silicon wafer box, which adopts a mechanical structure and automation equipment to respectively fix and clean the box body and the box cover of the silicon wafer box, ensures the thorough cleaning of the silicon wafer box, avoids repeatedly overturning the box body and the box cover of the silicon wafer box, and prolongs the service life of the silicon wafer box; the bilateral symmetry structure can simultaneously clean two batches of silicon wafer boxes, so that the time is saved, and the production efficiency is improved; the box body of the silicon wafer box is supported by adopting the polyvinylidene fluoride material, so that the box body is prevented from being worn and contaminated again in the cleaning process, the secondary pollution of external metal ions and impurities is avoided, and the product percent of pass is improved.
Description
Technical Field
The utility model belongs to the semiconductor material field of making especially relates to a wash bracket for major diameter silicon chip spool box.
Background
In the production process of semiconductor silicon single crystal materials, silicon single crystal wafers need to be stored in a wafer box, the wafer box is contaminated and abraded to increase particles on the surface of the silicon wafers, the quality of the silicon wafers is directly influenced, the wafer box needs to be cleaned in time after being used for a period of time, the cleanliness and the dryness of the wafer box are guaranteed, and the wafer box is very important for storing and polishing the wafer box. The wafer box is cleaned in two modes, one mode is carried out by adopting a manual method, the damage to the wafer box and the box cover is quite large, the wafer box and the box cover are required to be continuously turned during manual cleaning, the wafer box can be scratched, the service life of the wafer box is shortened, and the wafer box is easily led into external metal ions and impurities during manual cleaning to cause secondary pollution, so that the silicon wafer is unqualified, and the yield of products is reduced; the other method is to adopt a cleaning machine for cleaning, but the wafer box is not protected in place due to the design problem of the bracket in the prior art, and the conditions of abrasion and secondary contamination can occur in the cleaning process.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a wash bracket for major diameter silicon chip spool box to current spool box washing existence not enough.
In order to solve the technical problem, the utility model discloses a technical scheme is:
a bracket for cleaning a large-diameter silicon wafer cassette comprises:
a fixed beam;
the supporting mechanism is arranged on the fixed beam and used for supporting the box body of the silicon wafer box;
the rotating frame is connected to the fixed beam and can rotate relative to the fixed beam; the rotating frame is used for fixing a box cover of the silicon wafer box.
The fixed beam is also provided with a fixed rod which can rotate relative to the fixed beam; the fixing rod is used for fixing the box body of the silicon wafer box in cooperation with the supporting mechanism.
Further, the fixed beam is of a bilateral symmetry structure and used for supporting the bracket.
The supporting mechanism comprises a supporting rod and a supporting cap, and the supporting cap is arranged at the top of the supporting rod; the bottom of the supporting rod is detachably connected to the fixed beam.
Furthermore, the supporting cap has elasticity and is used for buffering the friction between the box body of the silicon wafer box and the fixed beam and the supporting rod.
The rotating frame is provided with a groove, and the groove is used for fixing a box cover of the silicon wafer box.
By adopting the technical scheme, the bracket for cleaning the large-diameter silicon wafer box adopts a mechanical structure and automatic equipment to respectively fix and clean the box body and the box cover of the silicon wafer box, ensures the thorough cleaning of the silicon wafer box, avoids repeatedly overturning the box body and the box cover of the silicon wafer box, and prolongs the service life of the silicon wafer box; the bilateral symmetry structure can simultaneously clean two batches of silicon wafer boxes, so that the time is saved, and the production efficiency is improved; the box body of the silicon wafer box is supported by adopting the polyvinylidene fluoride material, so that the box body is prevented from being worn and contaminated again in the cleaning process, the secondary pollution of external metal ions and impurities is avoided, and the product percent of pass is improved.
Drawings
Fig. 1 is a schematic structural diagram of an embodiment of the present invention;
fig. 2 is a schematic view showing an opened state of a fixing member according to an embodiment.
In the figure:
1. fixed beam 2, mounting 3, bracing piece
4. Support cap 5, rotary frame 6, and upper loading rail
Detailed Description
The invention will be further described with reference to the following examples and drawings:
in the description of the embodiments of the present invention, it should be understood that the terms "top," "bottom," and the like refer to orientations or positional relationships based on those shown in the drawings, which are used for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present invention. In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "disposed" and "connected" are to be interpreted broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
In an embodiment of the present invention, as shown in fig. 1, a bracket for cleaning a large-diameter silicon wafer cassette includes: fixed beam 1, supporting mechanism, revolving frame 5, fixed beam 1 are bilateral symmetry structure for support whole bracket, preferably, the material of fixed beam 1 is the stainless steel.
The fixed beam 1 is matched with an uploading track 6 of the automation equipment, so that the automation operation is facilitated.
The supporting mechanisms are arranged on the fixed beam 1 in a bilateral symmetry mode and comprise supporting rods 3 and supporting caps 4, and the supporting caps 4 are arranged at the tops of the supporting rods 3; the bottom of the support bar 3 is detachably connected to the fixed beam 1.
The supporting rod 3 is used for supporting 4 contact points at the bottom of the box body of the silicon wafer box, the number of the contact points can be correspondingly adjusted according to the type of the used silicon wafer box, the compatibility is strong, and the operation is flexible and convenient.
Preferably, the material of support cap 4 is polyvinylidene fluoride for the box body of buffering silicon chip spool box and the friction between fixed beam 1 and the bracing piece 3, prevent to destroy inside the box body of silicon chip spool box, have good guard action.
The rotating frames 5 are symmetrically arranged at the left and right sides of the middle part of the fixed beam 1 and can rotate relative to the fixed beam 1; the rotating frame 5 is provided with a groove for fixing a box cover of a silicon wafer box.
When the rotating frame 5 rotates relative to the fixed beam 1, the box cover of the silicon wafer box rotates along with the rotating frame 5, and collision in the cleaning process is prevented.
As shown in fig. 2, the fixing beam 1 is further provided with a fixing rod 2, the fixing rod 2 can rotate relative to the fixing beam 1, and the fixing rod 2 is used for fixing the box body of the silicon wafer box together with the supporting mechanism.
When the fixed rod 2 rotates upwards to an open state, the box body of the silicon wafer box is placed on the supporting mechanism, then the fixed rod 2 rotates downwards to an initial position, and the box body of the silicon wafer box is fixed on the fixed beam 1.
The utility model discloses a working process of embodiment:
s1: the supporting mechanism and the rotating frame 5 are respectively and symmetrically fixedly connected with the fixed beam 1 to complete the assembly of the bracket for the silicon wafer box;
s2: opening the silicon wafer box, and fixedly placing a box cover of the silicon wafer box on the rotating frame 5; the fixing rod 2 is rotated to open, the box body of the silicon wafer box is placed on the supporting mechanism, then the fixing rod 2 is rotated downwards to the initial position, and the box body of the silicon wafer box is fixed on the fixing beam 1;
s3: the entire carriage is placed on the uploading rail 6 of the automation device and the device is started; the carrier is brought into the apparatus for cleaning.
The embodiments of the present invention have been described in detail, but the description is only for the preferred embodiments of the present invention and should not be construed as limiting the scope of the present invention. All the equivalent changes and improvements made according to the application scope of the present invention should still fall within the patent coverage of the present invention.
Claims (6)
1. The utility model provides a wash bracket for major diameter silicon chip spool box which characterized in that: the method comprises the following steps:
a fixed beam (1);
the supporting mechanism is arranged on the fixed beam (1) and is used for supporting a box body of a silicon wafer box;
a rotating frame (5), wherein the rotating frame (5) is connected to the fixed beam (1) and can rotate relative to the fixed beam (1); the rotating frame (5) is used for fixing a box cover of a silicon wafer box.
2. The carrier for cleaning large-diameter silicon wafer cassettes as claimed in claim 1, wherein:
the fixed beam (1) is of a bilateral symmetry structure and is used for supporting the bracket.
3. The carrier for cleaning large-diameter silicon wafer cassettes as claimed in claim 2, wherein:
the fixed beam (1) is also provided with a fixed rod (2), and the fixed rod (2) can rotate relative to the fixed beam (1); the fixing rod (2) is used for fixing the box body of the silicon wafer box in cooperation with the supporting mechanism.
4. The carrier for cleaning large-diameter silicon wafer cassettes as claimed in claim 1, wherein:
the supporting mechanism comprises a supporting rod (3) and a supporting cap (4), and the supporting cap (4) is arranged at the top of the supporting rod (3); the bottom of the supporting rod (3) is detachably connected to the fixed beam (1).
5. The carrier for cleaning large-diameter silicon wafer cassettes as claimed in claim 4, wherein:
the supporting cap (4) is elastic and used for buffering friction between the box body of the silicon wafer box and the fixing beam (1) and the supporting rod (3).
6. The carrier for cleaning large-diameter silicon wafer cassettes as claimed in claim 1, wherein:
the silicon wafer box is characterized in that a groove is formed in the rotating frame (5), and the groove is used for fixing a box cover of the silicon wafer box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922380743.7U CN211914910U (en) | 2019-12-26 | 2019-12-26 | Bracket for cleaning large-diameter silicon wafer box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922380743.7U CN211914910U (en) | 2019-12-26 | 2019-12-26 | Bracket for cleaning large-diameter silicon wafer box |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211914910U true CN211914910U (en) | 2020-11-13 |
Family
ID=73326953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922380743.7U Active CN211914910U (en) | 2019-12-26 | 2019-12-26 | Bracket for cleaning large-diameter silicon wafer box |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211914910U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114453365A (en) * | 2022-01-18 | 2022-05-10 | 中环领先半导体材料有限公司 | Portable large-diameter silicon wafer box cleaning process |
| CN114887989A (en) * | 2022-05-05 | 2022-08-12 | 中环领先半导体材料有限公司 | Large-diameter silicon wafer box cleaning equipment |
| CN115602585A (en) * | 2022-08-31 | 2023-01-13 | 先之科半导体科技（东莞）有限公司（Cn） | Carborundum diode sculpture belt cleaning device |
-
2019
- 2019-12-26 CN CN201922380743.7U patent/CN211914910U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114453365A (en) * | 2022-01-18 | 2022-05-10 | 中环领先半导体材料有限公司 | Portable large-diameter silicon wafer box cleaning process |
| CN114453365B (en) * | 2022-01-18 | 2023-01-03 | 中环领先半导体材料有限公司 | Portable large-diameter silicon wafer box cleaning process |
| CN114887989A (en) * | 2022-05-05 | 2022-08-12 | 中环领先半导体材料有限公司 | Large-diameter silicon wafer box cleaning equipment |
| CN115602585A (en) * | 2022-08-31 | 2023-01-13 | 先之科半导体科技（东莞）有限公司（Cn） | Carborundum diode sculpture belt cleaning device |
| CN115602585B (en) * | 2022-08-31 | 2023-06-02 | 先之科半导体科技(东莞)有限公司 | Silicon carbide diode etching cleaning device |
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Area (outside the ring) Hai Tai Road 12 inside. Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region after: China Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Address before: No.12 Haitai East Road, Huayuan Industrial Zone, Binhai New Area, Tianjin Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region before: China Patentee before: Zhonghuan leading semiconductor materials Co.,Ltd. |
|
| CP03 | Change of name, title or address |