CN211856392U - Clamping lighting device for appearance detection of silicon carbide wafer - Google Patents
Clamping lighting device for appearance detection of silicon carbide wafer Download PDFInfo
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- CN211856392U CN211856392U CN202020620442.7U CN202020620442U CN211856392U CN 211856392 U CN211856392 U CN 211856392U CN 202020620442 U CN202020620442 U CN 202020620442U CN 211856392 U CN211856392 U CN 211856392U
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Abstract
The utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device, include: a mounting frame; the supporting frame is used for supporting the side edge of the wafer to be detected; the strong light lamp is installed on the mounting bracket and located above the supporting frame, and the light column of the strong light lamp can cover the whole wafer to be detected on the supporting frame. Because the utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device passes through the support frame and supports the side reason of waiting to detect the wafer, has avoided the wafer that leads to through the long-time centre gripping wafer of tweezers to collapse and splits on the one hand, has reduced measurement personnel's requirement, and on the other hand avoids contacting with the silicon face and the carbon face of wafer, and then has avoided wearing and tearing wafer silicon face and carbon face. In addition, the light beam of the high-intensity light can cover the whole wafer, and the probability of missed detection of the wafer is reduced. Namely, the utility model discloses avoid detecting the wafer in-process to wafer wearing and tearing, reduced the probability that the wafer missed the inspection.
Description
Technical Field
The utility model relates to a carborundum wafer detects technical field, especially relates to a carborundum wafer outward appearance detects uses centre gripping lighting device.
Background
In the semiconductor industry, silicon carbide wafers require visual inspection during processing or prior to shipment.
Generally, a wafer is inspected under a strong light to determine whether surface defects such as edge chipping, cracking, and scratching, and internal defects such as wrapping and polytype defects exist. At present, a strong light is usually fixed on a support, and an inspector clamps the edge of a wafer to enable a light column of the strong light to project on the surface of the wafer, visually inspect whether the surface and the internal defects exist, and then control the wafer to rotate through a wrist to gradually inspect the whole surface and the inside. In the whole process, the rotation of the wafer only depends on the movement of hands, the detection position is blindly disordered, the wafer is difficult to be detected comprehensively, and the phenomenon of missed detection often occurs; secondly, the wafer to be measured is a double-sided polished wafer with one silicon surface and one carbon surface, the wafer is clamped by tweezers for a long time, the abrasion of the front surface and the back surface is increased, the wafer is brittle, the wafer is easy to crack due to too much force, and the wafer is easy to drop due to too little force. The whole appearance detection process has high requirements on detection personnel, and wastes time and labor.
Therefore, how to reduce the probability of missing inspection of the wafer and avoid the abrasion of the wafer during the inspection of the wafer becomes a technical problem to be solved in the field.
SUMMERY OF THE UTILITY MODEL
In view of the above, the present invention provides a clamping illumination device for inspecting the appearance of a silicon carbide wafer, so as to reduce the probability of missing inspection of the wafer and avoid abrasion to the wafer during the inspection of the wafer.
In order to achieve the above object, the utility model provides a following technical scheme:
a clamping lighting device for appearance inspection of a silicon carbide wafer comprises:
a mounting frame;
the supporting frame is used for supporting the side edge of the wafer to be detected;
the strong light lamp is installed on the mounting frame and located above the supporting frame, and the light column of the strong light lamp can cover the whole wafer to be detected on the supporting frame.
In a specific embodiment, the supporting frame is a triangular detection frame, and the triangular detection frame is in point contact with the side edge of the wafer to be detected;
and/or
The support frame is made of antistatic materials.
In another specific embodiment, the clamping and lighting device for the appearance inspection of the silicon carbide wafer further comprises a stabilizing seat;
the support frame is installed on the stable seat, the stable seat is used for supporting the support frame.
In another specific embodiment, the holding illumination device for inspecting the appearance of the silicon carbide wafer further comprises a lifting part;
the lifting part is installed on the stable seat, and the lifting end of the lifting part is connected with the support frame.
In another specific embodiment, the clamping illumination device for detecting the appearance of the silicon carbide wafer further comprises a rotary driving component;
the rotary driving assembly is installed on the installation frame, the floodlight is installed at the rotary end of the rotary driving assembly, and the rotary driving assembly is used for driving the floodlight to rotate around the wafer to be detected.
In another specific embodiment, the rotary drive assembly includes a motor, a first gear, and a second gear;
the motor is arranged on the mounting frame;
the first gear is in transmission connection with an output shaft of the motor;
the second gear is in external meshing transmission with the first gear;
the highlight lamp is installed on the second gear.
In another specific embodiment, the rotary drive assembly further comprises an annular slide track and a slide block;
the highlight lamp is arranged at one end of the supporting arm of the second gear, and the sliding block is arranged at the other end of the supporting arm;
the annular slide rail is installed on the mounting bracket, and the slider can slide along the annular slide rail.
In another specific embodiment, the floodlight is rotatably connected with the support arm through a support arm rotating rod;
and a knob is arranged at the end part of the support arm rotating rod.
In another specific embodiment, the mount comprises a base, a support post, and a mount;
the support column is installed on the base, the mount is installed on the support column, the accent light is installed on the mount.
In another specific embodiment, the mounting bracket further comprises an anti-slip cover;
the anti-falling sleeve is arranged at the joint of the fixed frame and the supporting column and used for preventing the fixed frame from slipping off from the supporting column.
According to the utility model discloses an each embodiment can make up as required wantonly, and the embodiment that obtains after these combinations is also in the utility model discloses the scope is the utility model discloses a part of the concrete implementation mode.
According to the above technical scheme, the utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device, during the use, will wait to detect the wafer and place on the support frame for the side reason that the wafer was detected to the support frame support is opened the highlight lamp, and the detection personnel detects and waits to detect the wafer. Because the utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device passes through the support frame and supports the side reason of waiting to detect the wafer, has avoided the wafer that leads to through the long-time centre gripping wafer of tweezers to collapse and splits on the one hand, has reduced measurement personnel's requirement, and on the other hand avoids contacting with the silicon face and the carbon face of wafer, and then has avoided wearing and tearing wafer silicon face and carbon face. In addition, the light beam of the high-intensity light can cover the whole wafer, and the probability of missed detection of the wafer is reduced. Namely, the utility model discloses avoid detecting the wafer in-process to wafer wearing and tearing, reduced the probability that the wafer missed the inspection.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without performing novelty work.
FIG. 1 is a schematic structural view of a clamping lighting device for inspecting the appearance of a silicon carbide wafer according to the present invention;
fig. 2 is a schematic top view of the support frame, the base and the lifting unit of the present invention;
fig. 3 is a schematic view of the oblique structure when the supporting frame, the base and the lifting part are installed together.
In FIGS. 1-3:
the clamping and illuminating device 1000 for detecting the appearance of the silicon carbide wafer, the mounting frame 100, the supporting frame 200, the wafer 400 to be detected, the floodlight 300, the stabilizing seat 500, the lifting part 600, the rotary driving assembly 700, the motor 70, the first gear 71, the second gear 72, the annular slide rail 73, the slide block 74, the support arm 75, the knob 76, the base 10, the support column 11, the fixing frame 12, the anti-falling sleeve 13 and the protection washer 800.
Detailed Description
The technical solution of the embodiment of the present invention will be clearly and completely described below with reference to fig. 1 to 3 of the embodiment of the present invention. The present invention can be realized in various forms, and is not limited to the embodiment described in the present embodiment. The following detailed description is provided to facilitate a more thorough understanding of the present disclosure, and the terms used to indicate orientation and orientation are merely provided for relative positions of illustrated structures in the accompanying drawings.
It is to be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. Further, the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, elements, components, and/or groups thereof. The following description is of the preferred embodiment of the present invention, and is made for the purpose of illustrating the general principles of the invention and not for the purpose of limiting the invention. The protection scope of the present invention is subject to the limitations defined by the appended claims.
The utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device 1000, through setting up the reciprocating type rotation driving subassembly 700 of circulation, can carry out three hundred sixty degrees to the wafer and shine, guarantees that the wafer outward appearance can detect comprehensively, reduces and leaks to examine the probability, overcomes the unordered and long defect consuming time of traditional artifical detection blindness, reduces the wearing and tearing of wafer in the testing process simultaneously.
Example one
As shown in fig. 1, the utility model discloses a silicon carbide wafer outward appearance detects uses centre gripping lighting device 1000, wherein, silicon carbide wafer outward appearance detects uses centre gripping lighting device 1000 includes mounting bracket 100, support frame 200 and accent light 300.
The supporting frame 200 is used for supporting the side edge of the wafer 400 to be detected, and the shape of the supporting frame 200 is not limited and can be a frame body with any shape. In order to guarantee to wait to detect on the wafer 400 stable basis, further reduce the wearing and tearing that the wafer 400 was treated to the support frame 200, the utility model discloses a support frame 200 with wait to detect wafer 400 for point contact or line contact, when the contact is the point contact, need at least three point contact.
The floodlight 300 is mounted on the mounting frame 100 and located above the supporting frame 200, and the light pillar of the floodlight 300 can cover the whole wafer 400 to be detected located on the supporting frame 200. It should be noted that, the light beam of the high-intensity light 300 covering the whole wafer 400 to be detected may be: the number of the high-light lamps 300 is multiple, and the plurality of high-light lamps 300 cover the whole wafer 400 to be detected; it can also be: the floodlight 300 can move around the wafer 400 to be detected on the support frame 200, so that the light beam of the floodlight 300 covers the whole wafer 400 to be detected; the method can also be as follows: the floodlight 300 is not moved, and the support frame 200 drives different positions of the wafer 400 to be detected to rotate under the light beam of the floodlight 300, and the like.
The utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device 1000, during the use, will wait to detect wafer 400 and place on support frame 200 for support frame 200 supports the side reason of waiting to detect wafer 400, opens strong light lamp 300, and the detection personnel detect and wait to detect wafer 400. Because the utility model provides a carborundum wafer outward appearance detects uses centre gripping lighting device 1000 supports the side reason of waiting to detect wafer 400 through support frame 200, has avoided the wafer that leads to through the long-time centre gripping wafer of tweezers to collapse and splits on the one hand, has reduced measurement personnel's requirement, and on the other hand avoids contacting with the silicon face of wafer and the carbon face of wafer, and then has avoided the silicon face and the carbon face of wearing and tearing wafer. In addition, the light beam of the high-intensity light 300 can cover the whole wafer, and the probability of wafer missing inspection is reduced. Namely, the utility model discloses avoid detecting the wafer in-process to wafer wearing and tearing, reduced the probability that the wafer missed the inspection.
Example two
The utility model provides a second embodiment, the silicon carbide wafer outward appearance in this embodiment detects with centre gripping lighting device 1000 and the silicon carbide wafer outward appearance in embodiment one detects with centre gripping lighting device 1000's structure is similar, just no longer has been repeated the same part, only introduces the difference.
In this embodiment, the utility model discloses a support frame 200 is triangle detection support, triangle detection support with wait to detect the side edge point contact of wafer 400, reduce the wearing and tearing of treating detecting wafer 400.
Further, the utility model discloses a support frame 200 is made for preventing static material, specifically, is made for PEEK (polyether ether ketone) material, prevents that support frame 200 from attracting the granule to cause particle pollution to the wafer surface.
Further, the utility model discloses a carborundum wafer outward appearance detects with centre gripping lighting device 1000 still includes stable seat 500, and support frame 200 is installed on stable seat 500, and stable seat 500 is used for supporting support frame 200. Specifically, the cross section of the stabilizer 500 is trapezoidal, and it should be noted that the cross section of the stabilizer 500 may be other shapes.
Further, the utility model discloses a carborundum wafer outward appearance detects and still includes lift portion 600 with centre gripping lighting device 1000, lift portion 600 installs on stable seat 500, and lift end and the support frame 200 of lift portion 600 are connected. That is, the supporting frame 200 is connected to the stabilizing base 500 by the elevating part 600.
During the use, the regulation of support frame 200 height is realized through the lift of lift portion 600, and then realizes waiting to detect the altitude mixture control of wafer 400 for the neck of people is in more comfortable posture in the testing process.
It should be noted that the lifting unit 600 may be an automatic lifting device, such as an air cylinder or a hydraulic cylinder, and the lifting unit 600 may also be a manual lifting device, for example, the lifting unit 600 includes a lifting cylinder and a lifting rod, an internal thread is provided in the lifting cylinder, an external thread is provided on the lifting rod, and the lifting rod is in threaded connection with the lifting cylinder to realize the lifting of the lifting rod.
Further, the utility model discloses a carborundum wafer outward appearance detects still includes rotary drive subassembly 700 with centre gripping lighting device 1000, and rotary drive subassembly 700 installs on mounting bracket 100, and strong light lamp 300 installs the rotatory end at rotary drive subassembly 700, and rotary drive subassembly 700 is used for driving strong light lamp 300 and rotates round waiting to detect wafer 400.
Specifically, the utility model discloses a rotary drive assembly 700 includes motor 70, first gear 71 and second gear 72, and motor 70 is installed on mounting bracket 100, and first gear 71 is connected with the output shaft transmission of motor 70, and second gear 72 and the external gearing transmission of first gear 71, accent light 300 install on second gear 72. During the use, motor 70 starts, drives first gear 71 and rotates, and first gear 71 drives second gear 72 and rotates, and second gear 72 drives strong light 300 and rotates to make strong light 300 can shine on whole wafer, avoid louing examining. Specifically, the adjustment of the rotation speed of the highlight 300 is realized by adjusting the pitch ratio of the first gear 71 and the second gear 72, which is convenient for human eyes to observe. The top and bottom of the second gear 72 are clamped with protective washers 800.
The rotary drive unit 700 may be a rotary motor or the like.
Further, the utility model discloses a rotary driving assembly 700 still includes annular slide rail 73 and slider 74, the strong light lamp 300 is installed in the one end of the support arm 75 of second gear 72, the other end at support arm 75 is installed to slider 74, annular slide rail 73 installs on mounting bracket 100, and slider 74 can slide along annular slide rail 73, thereby make strong light lamp 300 use the centre of a circle of annular slide rail 73 as the center, use the radius of annular slide rail 73 to rotate as turning radius, consequently, in whole testing process, strong light lamp 300 operates steadily and detection distance is unchangeable all the time, stability when having improved the detection.
Further, the utility model discloses a strong light 300 passes through support arm rotary rod rotatable coupling with support arm 75, is convenient for adjust the angle of strong light 300 and horizontal plane to adjust the angle that strong light 300 shines and detect the wafer 400. Specifically, the floodlights 300 are mounted on the arm rotating rod, which is screw-coupled with the arm 75. It should be noted that the rotatable connection of accent light 300 to arm 75 may be achieved in other ways.
To facilitate the holding of the angle of the accent light 300, the utility model discloses a knob 76 is provided at the end of the support arm rotating rod. The knob 76 is not limited in shape and may be in the shape of a straight line or a cross.
Further, the utility model discloses an installation frame 100 includes base 10, support column 11 and mount 12, and support column 11 installs on base 10, and mount 12 installs on support column 11, and strong light 300 installs on mount 12. Specifically, the supporting frame 200 is installed on the base 10, the number of the supporting columns 11 is 4, and the supporting frames 200 are annularly arranged around the supporting frame.
Further, the utility model discloses a support frame 200 still includes anticreep cover 13, and anticreep cover 13 is installed in the junction of mount 12 and support column 11 for prevent that mount 12 from following the slippage of support column 11.
The utility model discloses during the use, at first, the measurement personnel will wait to detect wafer 400 level and place in the centre that the triangle detected the support, as shown in fig. 3, only wait to detect the three point position contact triangle detection support in wafer 400 side reason, wait that the silicon face and the carbon face of detecting wafer 400 all do not detect the support contact with the triangle. The height of the lifting part 600 is properly adjusted according to the height of the person, so that the neck of the person is in a comfortable posture in the detection process. Then, the power of the high-intensity light 300 is turned on, the rotation angle adjusting knob 76 is rotated, and the irradiation angle of the light beam of the high-intensity light 300 is adjusted to ensure that the light beam irradiates the surface of the wafer. After the detection device is ready, the motor 70 is started to drive the first gear 71 to rotate, and then the second gear 72 is driven to rotate, so that the slider 74 slides on the annular slide rail 73, the circle center of the annular slide rail 73 is used as the center of the highlight 300, the radius of the annular slide rail 73 is used as the rotating radius of the highlight, the highlight 300 runs stably, the detection distance is unchanged all the time, and the stability during detection is improved. The light beam of the high-intensity light 300 slowly rotates on the surface of the wafer at a constant speed, and inspectors only need to visually observe the irradiation position of the light beam to observe whether surface defects such as edge breakage, cracks and scratches and internal defects such as wrapping and polytype exist, so that nondestructive detection is carried out on the surface and the interior of the silicon carbide wafer.
The utility model has the advantages of as follows:
(1) during the detection, to wait to detect wafer 400 level and place in the triangle detects the support, only wait to detect the three point position contact triangle that wafer 400 was edgewise and detect the support, wait that the silicon face and the carbon face of detecting wafer 400 all do not detect the support contact with the triangle, replace traditional gripping wafer with tweezers, effectively reduced the wearing and tearing on wafer two sides, the existence of triangle detection support has liberated people's both hands simultaneously, and is more laborsaving.
(2) The height of the lifting part 600 can be properly adjusted by the detection personnel according to the height of the detection personnel, and the irradiation angle of the floodlight 300 can be adjusted by rotating the angle adjusting knob 76, so that the personnel, the wafer and the light column are in proper relative positions, the defect observation is facilitated, the body of the personnel is in a comfortable posture in the whole process, and the fatigue of the human body can be easily reduced after long-time observation.
(3) The motor 70 is started to drive the first gear 71 to rotate, and then the second gear 72 is driven to rotate, so that the slider 74 slides on the annular slide rail 73, and the highlight lamp 300 rotates by taking the circle center of the annular slide rail 73 as the center and the radius of the annular slide rail 73 as the rotation radius, so that in the whole detection process, the highlight lamp 300 runs stably, the detection distance is unchanged all the time, and the stability during detection is improved. The light beam of the high-intensity light 300 slowly rotates at a constant speed on the surface of the wafer 400 to be detected, the wafer is irradiated in a circulating reciprocating mode, dead-angle-free irradiation can be carried out on the wafer by three hundred sixty degrees, the missing phenomenon is avoided, and the defects that the traditional manual detection is blind, disordered and long in time consumption are overcome.
(4) The main body (including the base 10 and the lifting part 600) of the supporting frame 200 is made of PP, and the triangular detection support for placing the wafer 400 to be detected is made of anti-static PEEK (polyetheretherketone) and can prevent static electricity.
It is noted that relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to the embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A clamping lighting device for appearance inspection of a silicon carbide wafer is characterized by comprising:
a mounting frame;
the supporting frame is used for supporting the side edge of the wafer to be detected;
the strong light lamp is installed on the mounting frame and located above the supporting frame, and the light column of the strong light lamp can cover the whole wafer to be detected on the supporting frame.
2. The clamping illumination device for the appearance inspection of the silicon carbide wafer as claimed in claim 1, wherein the supporting frame is a triangular inspection bracket, and the triangular inspection bracket is in point contact with the side edge of the wafer to be inspected;
and/or
The support frame is made of antistatic materials.
3. The clamping illumination device for inspecting the appearance of the silicon carbide wafer according to claim 1, further comprising a stabilizer;
the support frame is installed on the stable seat, the stable seat is used for supporting the support frame.
4. The clamping illumination device for inspecting the appearance of the silicon carbide wafer according to claim 3, further comprising an elevating part;
the lifting part is installed on the stable seat, and the lifting end of the lifting part is connected with the support frame.
5. The clamping illumination device for inspecting the appearance of the silicon carbide wafer according to claim 1, further comprising a rotation driving assembly;
the rotary driving assembly is installed on the installation frame, the floodlight is installed at the rotary end of the rotary driving assembly, and the rotary driving assembly is used for driving the floodlight to rotate around the wafer to be detected.
6. The clamping illumination device for inspecting the appearance of the silicon carbide wafer as claimed in claim 5, wherein the rotary driving assembly comprises a motor, a first gear and a second gear;
the motor is arranged on the mounting frame;
the first gear is in transmission connection with an output shaft of the motor;
the second gear is in external meshing transmission with the first gear;
the highlight lamp is installed on the second gear.
7. The clamping illumination device for inspecting the appearance of the silicon carbide wafer as claimed in claim 6, wherein the rotary driving assembly further comprises an annular slide rail and a slide block;
the highlight lamp is arranged at one end of the supporting arm of the second gear, and the sliding block is arranged at the other end of the supporting arm;
the annular slide rail is installed on the mounting bracket, and the slider can slide along the annular slide rail.
8. The clamping illumination device for the visual inspection of the silicon carbide wafer as claimed in claim 7, wherein the floodlight is rotatably connected with the support arm through a support arm rotating rod;
and a knob is arranged at the end part of the support arm rotating rod.
9. The clamping illumination device for inspecting the appearance of the silicon carbide wafer according to any one of claims 1 to 8, wherein the mounting frame comprises a base, a support column and a fixing frame;
the support column is installed on the base, the mount is installed on the support column, the accent light is installed on the mount.
10. The clamping illumination device for inspecting the appearance of the silicon carbide wafer as claimed in claim 9, wherein the mounting bracket further comprises a slip-off prevention sleeve;
the anti-falling sleeve is arranged at the joint of the fixed frame and the supporting column and used for preventing the fixed frame from slipping off from the supporting column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020620442.7U CN211856392U (en) | 2020-04-22 | 2020-04-22 | Clamping lighting device for appearance detection of silicon carbide wafer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020620442.7U CN211856392U (en) | 2020-04-22 | 2020-04-22 | Clamping lighting device for appearance detection of silicon carbide wafer |
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| CN211856392U true CN211856392U (en) | 2020-11-03 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113109261A (en) * | 2021-04-14 | 2021-07-13 | 深圳市伟捷自动化科技有限公司 | Full-automatic visual detection machine |
| CN113739762A (en) * | 2021-09-17 | 2021-12-03 | 无锡迪渊特科技有限公司 | Mounting position detecting device for semiconductor equipment |
-
2020
- 2020-04-22 CN CN202020620442.7U patent/CN211856392U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113109261A (en) * | 2021-04-14 | 2021-07-13 | 深圳市伟捷自动化科技有限公司 | Full-automatic visual detection machine |
| CN113739762A (en) * | 2021-09-17 | 2021-12-03 | 无锡迪渊特科技有限公司 | Mounting position detecting device for semiconductor equipment |
| CN113739762B (en) * | 2021-09-17 | 2022-05-20 | 无锡迪渊特科技有限公司 | Mounting position detecting device for semiconductor equipment |
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Assignee: Shenzhen Reinvested Tianke Semiconductor Co.,Ltd. Assignor: TANKEBLUE SEMICONDUCTOR Co.,Ltd.|Jiangsu tiankeheda Semiconductor Co.,Ltd. Contract record no.: X2023990000674 Denomination of utility model: A Clamping Lighting Device for Appearance Inspection of Silicon Carbide Wafers Granted publication date: 20201103 License type: Common License Record date: 20230725 |