CN211770968U - Ceramic electron beam fusion welding device containing beam plasma - Google Patents

Abstract

A ceramic electron beam fusion welding device containing beam plasma. Belongs to the field of vacuum electron beam welding of ceramic materials. A polytetrafluoroethylene pad II, an anode flange, a water cooling sleeve, a discharge anode, a polytetrafluoroethylene pad III, an electron accelerating electrode, a polytetrafluoroethylene pad IV and a beam plasma tube are fixedly connected in sequence and are arranged in a vacuum chamber, the polytetrafluoroethylene pad II is fixedly connected with the upper end in the vacuum chamber, a gas ring is fixed in the beam plasma tube, a magnetic field coil is fixed on the water cooling sleeve, a polytetrafluoroethylene pad I is fixed at the upper end outside the vacuum chamber and corresponds to the polytetrafluoroethylene pad II, the polytetrafluoroethylene pad I is fixedly connected with a cathode flange, a hollow cathode is fixedly penetrated in the cathode flange, a vacuum pump set is communicated with the vacuum chamber, and a ceramic workpiece is arranged below the beam plasma tube; the cathode flange and the discharge anode are connected with a cathode and an anode of a discharge power supply, the discharge anode and the electron acceleration electrode are connected with a cathode and an anode of an acceleration power supply, and the ceramic workpiece is connected with an anode of the acceleration power supply. The device is used for electron beam fusion welding of ceramic workpieces.

Description

Ceramic electron beam fusion welding device containing beam plasma

Technical Field

The utility model relates to a ceramic electron beam fusion welding device who contains beam plasma belongs to ceramic material's vacuum electron beam welding field.

Background

The ceramic material has a series of excellent performances such as high strength, high temperature resistance, high hardness, corrosion resistance, wear resistance, oxidation resistance and the like, and is widely applied to the high-tech fields such as aviation, aerospace, communication, electronics, military and the like. In order to manufacture ceramic structural members of complex shapes, ceramic joining processes such as brazing, solid state joining, fusion welding, etc. have been developed. The study and application of brazing and solid-state joining techniques are wide, but the two joining methods have the defect that the use temperature of a welded structural part is low.

Currently, research on the fusion welding technique of ceramic materials is gaining attention. Compared with other methods, the electron beam fusion welding of the ceramic material has the characteristics of vacuum protection, high energy utilization rate (up to 100 percent) and the like, and is suitable for material connection in a space environment.

When the electron beam with high energy density directly acts on the non-conductive ceramic material, the surface of the ceramic material is charged, so that the ceramic material reduces the motion energy of the subsequent electron beam and influences the beam shape, and therefore, the problem of the surface charge accumulation effect during the melting welding of the ceramic material electron beam is critical. In order to avoid charging of surface charges of materials, various foreign research institutes have conducted systematic studies using different methods, for example: heating the non-conductive material to high temperature to make the surface of the material have conductive property; bombarding the surface of the non-conductive material by auxiliary ion beams, and neutralizing the surface charge of the material by ions; arranging a bias metal net on the surface area of the non-conductive material to attract electron beam current; the electron beam is operated in the range of the front stage pressure (5-100 Pa). The methods need to add auxiliary hardware, so that the process is complex and has no industrial application.

Disclosure of Invention

The utility model aims at providing a ceramic electron beam fusion welding device containing beam plasma for solving the electron beam welding ceramic material, there is the charge accumulation effect on the insulating ceramic surface, reduces electron beam energy density problem.

The utility model discloses a ceramic electron beam fusion welding device who contains restraint plasma, according to plasma electron emission principle, utilize plasma as the emission source of electron, increase a restraint plasma section of thick bamboo between electron acceleration electrode and ceramic work piece, the electron beam of high energy collides with the working gas who pours into a restraint plasma section of thick bamboo inside each other and forms plasma (promptly: restraint plasma), restraint plasma and ceramic material surface accumulation electric charge, realizes ceramic material's electron beam fusion welding technology.

Realize above-mentioned purpose, the utility model discloses the technical scheme who takes as follows:

a ceramic electron beam fusion welding device containing beam plasma comprises discharge gas, a hollow cathode, a magnetic field coil, a discharge anode, an electron accelerating electrode, a beam plasma barrel, an electron beam, working gas, a vacuum chamber, a vacuum pump set, a discharge power supply, an accelerating power supply, a gas ring, a cathode flange, an anode flange, discharge plasma, a water cooling sleeve and four polytetrafluoroethylene pads, wherein the four polytetrafluoroethylene pads are respectively a polytetrafluoroethylene pad I, a polytetrafluoroethylene pad II, a polytetrafluoroethylene pad III and a polytetrafluoroethylene pad IV;

the polytetrafluoroethylene pad II, the anode flange, the water cooling jacket, the discharge anode, the polytetrafluoroethylene pad III, the electron accelerating electrode, the polytetrafluoroethylene pad IV and the beam plasma tube are sequentially and fixedly connected from top to bottom and are arranged in the vacuum chamber, the polytetrafluoroethylene pad II is fixedly connected with the upper end face in the vacuum chamber, the gas ring is fixed on the inner wall of the beam plasma tube, a gas cavity is arranged in the side wall of the gas ring, a plurality of small holes communicated with the inner cavity of the beam plasma tube are arranged on the inner ring wall of the gas cavity, an air inlet communicated with the gas cavity is arranged on the side wall of the beam plasma tube, working gas enters the gas cavity through the air inlet and enters the beam plasma tube through the small holes, the magnetic field coil is fixed on the outer wall of the water cooling jacket, the polytetrafluoroethylene pad I is fixed on the upper end face outside the vacuum chamber and corresponds to the polytetrafluoroethylene pad II, the cathode flange is fixed on the upper end face of the polytetrafluoroethylene pad I, the cathode flange, the anode flange, the electron accelerating electrode, the discharge anode, the upper end and the lower end of the beam plasma barrel and the four polytetrafluoroethylene pads are all provided with center holes, the hollow cathode is tightly inserted into the center hole of the cathode flange, the discharge gas enters the vacuum chamber through the hollow cathode, the vacuum pump set is communicated with the vacuum chamber through a through hole arranged below the side wall of the vacuum chamber, and the ceramic workpiece is arranged below the beam plasma barrel; the cathode flange and the discharge anode are respectively connected with the cathode and the anode of a discharge power supply to obtain discharge plasma, the discharge anode and the electron acceleration electrode are respectively connected with the cathode and the anode of the acceleration power supply to generate electron beams, the ceramic workpiece is connected with the anode of the acceleration power supply, and the magnetic field coil restrains the discharge plasma and the electron beams.

Compared with the prior art, the utility model beneficial effect who has is: the utility model provides a ceramic electron beam fusion welding device who contains beam plasma adopts the plasma negative pole as electron emission's mode can satisfy the requirement that vacuum pressure changes when welding, and beam plasma section of thick bamboo lets in working gas, utilizes electron beam and the inside gaseous collision each other of beam plasma section of thick bamboo to obtain beam plasma, and beam plasma can neutralize ceramic material surface accumulation electric charge, satisfies ceramic material's electron beam fusion welding technology's scientific research and industry demand.

Drawings

Fig. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a front view of a beam plasma barrel;

FIG. 3 is a cross-sectional view of section A-A of FIG. 2;

FIG. 4 is a partial enlarged view of FIG. 3 at B;

FIG. 5 is a front view of the gas ring;

FIG. 6 is a front view of the water jacket fixedly attached to the anode flange and the discharge anode, respectively.

The names and reference numbers of the components referred to in the above figures are as follows:

the device comprises a discharge gas 1, a hollow cathode 2, a magnetic field coil 3, a discharge anode 4, an electron accelerating electrode 5, a beam plasma barrel 6, an electron beam 7, a working gas 8, a vacuum chamber 9, a vacuum pump set 10, a discharge power supply 11, an accelerating power supply 12, a polytetrafluoroethylene gasket I13, a gas ring 14, a cathode flange 15, an anode flange 16, a ceramic workpiece 17, a discharge plasma 18, a water cooling sleeve 19, a polytetrafluoroethylene gasket II 20, a polytetrafluoroethylene gasket III 21, a polytetrafluoroethylene gasket IV 22, a gas cavity 23, a small hole 24, an opening 25, an annular water jacket 26, a water inlet I27, a water outlet I28, a water inlet II 29 and a water outlet II 30.

Detailed Description

The first embodiment is as follows: with reference to fig. 1 to 6, the present embodiment describes a ceramic electron beam fusion welding apparatus including a beam plasma, which includes a discharge gas 1, a hollow cathode 2, a magnetic field coil 3, a discharge anode 4, an electron accelerating electrode 5, a beam plasma tube 6, an electron beam 7, a working gas 8, a vacuum chamber 9, a vacuum pump set 10, a discharge power supply 11, an accelerating power supply 12, a gas ring 14, a cathode flange 15, an anode flange 16, a discharge plasma 18, a water cooling jacket 19, and four teflon pads, i.e., a teflon pad one 13, a teflon pad two 20, a teflon pad three 21, and a teflon pad four 22;

the polytetrafluoroethylene pad II 20, the anode flange 16, the water cooling sleeve 19, the discharge anode 4, the polytetrafluoroethylene pad III 21, the electron accelerating electrode 5, the polytetrafluoroethylene pad IV 22 and the beam plasma tube 6 are sequentially and fixedly connected from top to bottom and are arranged in the vacuum chamber 9 (the upper end and the lower end of the water cooling sleeve 19 are respectively welded with the anode flange 16 and the discharge anode 4, the electron accelerating electrode 5 and the discharge anode 4 are electrically insulated through the polytetrafluoroethylene pad III 21, the beam plasma tube 6 and the electron accelerating electrode 5 are electrically insulated through the polytetrafluoroethylene pad IV 22), the polytetrafluoroethylene pad II 20 is fixedly connected with the upper end face in the vacuum chamber 9, the gas ring 14 is fixed on the inner wall of the beam plasma tube 6, a gas cavity 23 is arranged in the side wall of the gas ring 14, a plurality of small holes 24 communicated with the inner cavity of the beam plasma tube 6 are arranged on the inner ring wall of the gas cavity 23, an air inlet communicated with the gas cavity is arranged on the side wall of the beam plasma tube 6, working gas 8 enters a gas cavity 23 through the gas inlet and enters a beam plasma tube 6 through a plurality of small holes 24, the magnetic field coil 3 is fixed on the outer wall of the water cooling sleeve 19, the polytetrafluoroethylene pad I13 is fixed on the upper end surface outside the vacuum chamber 9 and corresponds to the polytetrafluoroethylene pad II 20, the cathode flange 15 is fixed on the upper end surface of the polytetrafluoroethylene pad I13 (the cathode flange 15, the anode flange 16 and the vacuum chamber 9 are electrically insulated through the polytetrafluoroethylene pad I13 and the polytetrafluoroethylene pad II 20), the cathode flange 15, the anode flange 16, the electron accelerating electrode 5, the discharge anode 4, the upper end and the lower end of the beam plasma tube 6 and the four polytetrafluoroethylene pads are all provided with central holes, the hollow cathode 2 is tightly inserted into the central hole of the cathode flange 15, the discharge gas 1 enters the vacuum chamber 9 through the hollow cathode 2, and the vacuum pump set 10 is communicated with the vacuum chamber 9 through a through hole arranged below the side wall of the vacuum chamber 9 (a vacuum pump 10 maintaining the required working pressure of the vacuum chamber 9), a ceramic workpiece 17 is arranged below the beam plasma barrel 6; the cathode flange 15 and the discharge anode 4 are respectively connected with the cathode and the anode of the discharge power supply 11 to obtain discharge plasma 18, the discharge anode 4 and the electron accelerating electrode 5 are respectively connected with the cathode and the anode of the accelerating power supply 12 to generate electron beams 7, the ceramic workpiece 17 is connected with the anode of the accelerating power supply 12, and the magnetic field coil 3 restrains the discharge plasma 18 and the electron beams 7.

Further, as shown in fig. 3, the number of the plurality of small holes 24 is 10, 10 small holes 24 are uniformly distributed on the inner annular wall of the gas cavity 23, and the diameters of the 10 small holes 24 are all 0.8-1.2mm (preferably, the diameter of the small hole 24 is 1 mm). The working gas 8 introduced into the gas ring 14 can uniformly escape from the small holes 24 and is further uniformly distributed in the beam plasma tube 6 to form a uniform beam plasma which can well neutralize the accumulated charges.

Further, as shown in fig. 2, the diameter of the center hole provided at the upper end of the beam plasma barrel 6 is 10 to 20mm, and the diameter of the center hole provided at the lower end of the beam plasma barrel 6 is 10 to 30 mm. So that the electron beam 7 is able to traverse the beam plasma 6.

Further, as shown in fig. 1, the distance between the beam plasma tube 6 and the ceramic workpiece 17 is h, h =10-50 mm. On the premise of ensuring welding accessibility, accumulated charges are effectively neutralized.

Further, as shown in fig. 1, the discharge gas 1 and the working gas 8 are both argon.

Further, as shown in fig. 3, an opening 25 (for facilitating installation of the gas ring 14) is provided on the gas ring 14, the opening 25 is opened through the upper and lower end surfaces of the gas ring 14, and both ends of the gas ring 14 located at the opening 25 are closed structures.

So that gas entering the gas ring 14 can only escape through the small holes 24.

Further, as shown in fig. 1, the hollow cathode 2 and the discharge anode 4 are both in a water-cooling structure (prior art).

Further, as shown in fig. 5, an annular water jacket 26 is arranged in the middle of the cathode flange 15, and a first water inlet 27 and a first water outlet 28 are arranged on the side wall of the annular water jacket 26.

Further, as shown in fig. 6, the outer wall of the water-cooling jacket 19 is provided with a second water inlet 29 and a second water outlet 30 which are communicated with the inner annular cavity of the water-cooling jacket.

The working process of the utility model is as follows:

step one, pumping out air in a vacuum chamber 9 through a vacuum pump set 10, wherein the air pressure is less than or equal to 10^-3Pa；

Injecting the discharge gas 1 into the hollow cathode 2, wherein the hollow cathode 2, the discharge anode 4 and the discharge power supply 11 form a plasma discharge loop, and obtaining plasma;

step three, the discharge anode 4, the electron accelerating electrode 5 and the accelerating power supply 12 form an electron accelerating system, and electrons obtain energy;

injecting working gas 8 into the beam plasma barrel 6, enabling the high-energy electron beam to collide with the gas in the beam plasma barrel 6 to obtain beam plasma, and accumulating charges on the surfaces of the beam plasma and the ceramic workpiece 17;

and step five, the electron beam acts on the surface of the ceramic workpiece 17 and melts the ceramic workpiece 17, and a welding joint is obtained along with the movement of the ceramic workpiece 17.

The utility model discloses utilize plasma electron emission mode to obtain electron source, increase a bunch plasma section of thick bamboo 6 between electron acceleration electrode 5 and ceramic work piece 17, electron beam 7 forms a bunch plasma with pouring into the 8 mutual collisions of the inside working gas of a bunch plasma section of thick bamboo 6, utilizes in the bunch plasma and ceramic work piece 17 surface accumulation electric charges, realizes ceramic work piece 17's electron beam fusion welding technology.

The above description is only a preferred embodiment of the present invention, and the present invention is not limited to the above description, and although the present invention has been disclosed with the preferred embodiment, it is not limited to the present invention, and any skilled person in the art can make modifications or changes equivalent to the equivalent embodiment without departing from the technical scope of the present invention, but all the modifications, equivalent substitutions, and improvements made to the above embodiments within the spirit and principle of the present invention still belong to the protection scope of the technical solution of the present invention.

Claims (9)

1. A ceramic electron beam fusion welding device containing beam plasma is characterized in that: the device comprises a discharge gas (1), a hollow cathode (2), a magnetic field coil (3), a discharge anode (4), an electron accelerating electrode (5), a beam plasma tube (6), an electron beam (7), a working gas (8), a vacuum chamber (9), a vacuum pump set (10), a discharge power supply (11), an accelerating power supply (12), a gas ring (14), a cathode flange (15), an anode flange (16), a discharge plasma (18), a water cooling sleeve (19) and four polytetrafluoroethylene pads, wherein the four polytetrafluoroethylene pads are respectively a polytetrafluoroethylene pad I (13), a polytetrafluoroethylene pad II (20), a polytetrafluoroethylene pad III (21) and a polytetrafluoroethylene pad IV (22);

the device comprises a polytetrafluoroethylene pad II (20), an anode flange (16), a water cooling sleeve (19), a discharge anode (4), a polytetrafluoroethylene pad III (21), an electron accelerating electrode (5), a polytetrafluoroethylene pad IV (22) and a beam plasma tube (6), wherein the polytetrafluoroethylene pad III (21), the electron accelerating electrode (5), the polytetrafluoroethylene pad IV (22) and the beam plasma tube (6) are sequentially and fixedly connected from top to bottom and are arranged in a vacuum chamber (9), the polytetrafluoroethylene pad II (20) is fixedly connected with the upper end face in the vacuum chamber (9), a gas ring (14) is fixed on the inner wall of the beam plasma tube (6), a gas cavity (23) is arranged in the side wall of the gas ring (14), a plurality of small holes (24) communicated with the inner cavity of the beam plasma tube (6) are formed in the inner ring wall of the gas cavity (23), an air inlet communicated with the gas cavity is formed in the side wall of the beam plasma tube (6), working gas (8) enters the gas cavity (23) through the air inlet and enters, the magnetic field coil (3) is fixed on the outer wall of the water cooling sleeve (19), the first polytetrafluoroethylene pad (13) is fixed on the upper end surface outside the vacuum chamber (9) and corresponds to the second polytetrafluoroethylene pad (20), the cathode flange (15) is fixed on the upper end surface of the first polytetrafluoroethylene pad (13), the cathode flange (15), the anode flange (16), the electron accelerating electrode (5), the discharge anode (4), the upper end and the lower end of the beam plasma cylinder (6) and the four polytetrafluoroethylene pads are all provided with central holes, the hollow cathode (2) is tightly inserted into the central hole of the cathode flange (15), the discharge gas (1) enters the vacuum chamber (9) through the hollow cathode (2), the vacuum pump set (10) is communicated with the vacuum chamber (9) through a through hole arranged below the side wall of the vacuum chamber (9), and the ceramic workpiece (17) is arranged below the beam plasma barrel (6); the cathode flange (15) and the discharge anode (4) are respectively connected with a cathode and an anode of a discharge power supply (11) to obtain discharge plasma (18), the discharge anode (4) and the electron acceleration electrode (5) are respectively connected with a cathode and an anode of an acceleration power supply (12) to generate electron beams (7), the ceramic workpiece (17) is connected with an anode of the acceleration power supply (12), and the magnetic field coil (3) restrains the discharge plasma (18) and the electron beams (7).

2. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: the number of the small holes (24) is 10, 10 small holes (24) are uniformly distributed on the inner annular wall of the gas cavity (23), and the diameters of the 10 small holes (24) are 0.8-1.2 mm.

3. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: the diameter of a central hole arranged at the upper end of the beam plasma barrel (6) is 10-20mm, and the diameter of a central hole arranged at the lower end of the beam plasma barrel (6) is 10-30 mm.

4. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: the distance between the beam plasma barrel (6) and the ceramic workpiece (17) is h, h =10-50 mm.

5. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: the discharge gas (1) and the working gas (8) are both argon.

6. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: an opening (25) is formed in the gas ring (14), the opening (25) penetrates through the upper end face and the lower end face of the gas ring (14), and two ends, located at the opening (25), of the gas ring (14) are of a closed structure.

7. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: the hollow cathode (2) and the discharge anode (4) are both of a water-cooling structure.

8. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: an annular water jacket (26) is arranged in the middle of the cathode flange (15), and a first water inlet (27) and a first water outlet (28) are formed in the side wall of the annular water jacket (26).

9. The ceramic electron beam fusion welding apparatus containing beam plasma of claim 1, wherein: and a second water inlet (29) and a second water outlet (30) which are communicated with the inner annular cavity of the water cooling jacket are arranged on the outer wall of the water cooling jacket (19).

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