CN108112153A - A kind of double-plasma ion source - Google Patents
A kind of double-plasma ion source Download PDFInfo
- Publication number
- CN108112153A CN108112153A CN201711427448.1A CN201711427448A CN108112153A CN 108112153 A CN108112153 A CN 108112153A CN 201711427448 A CN201711427448 A CN 201711427448A CN 108112153 A CN108112153 A CN 108112153A
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- Prior art keywords
- anode
- flange
- target
- filament
- ion source
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/28—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/06—Generating neutron beams
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- Electromagnetism (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a kind of double-plasma ion sources, anode casing and target use soft iron material, target is equipped with cooling bath, excitation wire bag is equipped between target and anode casing, cathode filament is equipped in arc chamber, cathode filament is placed in filament cap, filament cap is mounted on filament frame, filament frame and lamp filament binding post are fixed on by ceramic tube on target flange, target flange is mounted on one end of target, the cooling bath connection target cooling pipe entrance of target, target flange is equipped with admission line and connects arc chamber, the arc chamber other end is conical outlet, conical outlet jointed anode abaculus, anode abaculus connection expansion cup, anode flange is equipped with anode flange cooling pipe entrance and anode flange cooling pipe exports, anode flange bottom is equipped with anode and draws flange.The beneficial effects of the invention are as follows provide higher educt beaming flow intensity.
Description
Technical field
The invention belongs to accelerator facility technical fields, are related to a kind of double-plasma ion source.
Background technology
Deuterium deuterium (D-D) and deuterium tritium (D-T) fusion reaction accelerator neutron generator are that important monoenergetic neutrons (send out by abbreviation neutron
Raw device), it is each to can be widely applied to Nuclear Data measurement, nuclear fusion stack basic research, military project basic research, fast neutron application technology etc.
A aspect.The characteristics of D-D and D-T fusion reactions is that under relatively low D beam energies, there is larger reaction cross-section, you can with low
It can accelerator acceleration D ion beams, bombardment deuterium titanium (TiD) target or generation deuterium deuterium (D-D) or deuterium tritium (D-T) fusion of tritium titanium (TiT) target
Reaction generates strong fast neutron, and the yield of fast neutron is directly proportional to bombarding the D beam intensities on target.In order to make 100-120kV/
D-D accelerator for neutron production neutron yields reach higher technical indicator, and the bigger neutron yield rising space of D lines is bigger on target, therefore
It is proposed that the educt beaming flow of miniaturization ion source is the bigger the better on the premise of more than 2mA.
Current radio frequency ion source, ecr ion source are needed using high frequency electric source and microwave source, there are high frequencies and microwave spoke
Problem is penetrated, interference can be generated to the measurement electronic system and accelerator for neutron production control system of correlation analysis instrument.Penning ion
Source structure is simple, performance is stablized, but the plasma density generated in arc chamber is less than normal, and educt beaming flow is smaller, and line is monatomic
Ion ratio is not high (about 15%).
The content of the invention
It is an object of the invention to provide a kind of double-plasma ion sources, and it is smaller to solve current ion source educt beaming flow
The problem of.
The technical solution adopted in the present invention is to include anode casing, and anode casing and target use soft iron material,
Target is equipped with cooling bath, and excitation wire bag is equipped between target and anode casing, and cathode filament is equipped in arc chamber, cloudy
Pole filament is placed in filament cap, and filament cap is mounted on filament frame, during filament frame and lamp filament binding post are fixed on by ceramic tube
Between on electrode flange, target flange is mounted on one end of target, and the cooling bath connection target of target is cold
But entrance, target flange are equipped with admission line and connect arc chamber, and the arc chamber other end is conical outlet, and taper goes out
Mouth jointed anode abaculus, anode abaculus connection expansion cup, anode flange are equipped with anode flange cooling pipe entrance and anode process
Blue cooling pipe outlet, anode flange bottom is equipped with anode and draws flange.
Further, the contact angle of target flange and target is equipped with Vacuum Package O-ring seal.
Further, the radius of arc chamber conical outlet upper and lower side is respectively 46mm and 6mm；The anode abaculus uses metal
Molybdenum material, the extraction bore dia 1mm of anode abaculus；Expansion cup a diameter of 19mm, length 16mm.
Further, excitation wire bag is mounted on copper coil frame flange, and the anode casing is mounted on anode flange, in
Between electrode, excitation wire bag, anode abaculus, expansion cup and copper coil frame flange and anode flange between be equipped with insulating flange.
Further, filament frame, filament cap are process by metal molybdenum, the insulation between the cathode filament and filament cap
Be ceramics pole, the anode casing, anode flange, target are process by pure iron, the copper coil frame flange by
Magnetic stainless steel or Copper fabrication form.
Further, cathode filament adds -500V voltages, and target is -200V voltages, inside target and anode flange
It is carved with cooling bath, the corresponding two groups of coolings inlet and outlet in outside.
The beneficial effects of the invention are as follows provide higher educt beaming flow intensity.
Description of the drawings
Fig. 1 is the structure diagram of double-plasma ion source provided in an embodiment of the present invention；
Fig. 2 is distribution diagram of magnetic line of force in double-plasma ion source provided in an embodiment of the present invention；
Fig. 3 is the magnetic field distribution figure at the central axis of double-plasma ion source provided in an embodiment of the present invention；
Fig. 4 is the electric-field intensity distribution figure at the central axis of double-plasma ion source provided in an embodiment of the present invention；
Fig. 5 is that the line of double-plasma ion source provided in an embodiment of the present invention draws ichnography.
In figure, 1. anode casings, 2. targets, 3. excitation wire bags, 4. arc chambers, 5. cathode filaments, 6. filament caps, 7.
Filament frame, 8. lamp filament binding posts, 9. ceramic tubes, 10. target flanges, 11. Vacuum Package O-ring seals, 12. targets
Cooling pipe entrance, 13. admission lines, 14. anode abaculus, 15. expansion cups, 16. bronze medal coil frame flanges, 17. anode flanges,
18. insulating flange, 19. anode flange cooling pipe entrances, the outlet of 20. anode flange cooling pipes, 21. anodes draw flange.
Specific embodiment
The present invention is described in detail With reference to embodiment.
For the present invention as shown in Figure 1, anode casing 1 and target 2 use soft iron material, target 2 is equipped with cooling bath；
It is equipped with excitation wire bag 3 between target 2 and anode casing 1, the inside of target 2 forms arc chamber 4, axial in arc chamber 4
Magnetic field is generated by excitation wire bag 3, and cathode filament 5 is equipped in arc chamber 4, and cathode filament 5 is placed in filament cap 6, and filament cap 6 is installed
On filament frame 7, filament frame 7 and lamp filament binding post 8 are fixed on by ceramic tube 9 on target flange 10, and ceramic tube 9 makes lamp
Guide frame 7 and lamp filament binding post 8 keep insulating with target flange 10, and target flange 10 is mounted on the one of target 2
End, in order to strengthen the sealing of target flange 10 and target 2, in the contact of target flange 10 and target 2
Angle is equipped with Vacuum Package O-ring seal 11, the cooling bath connection target cooling pipe entrance 12 of target 2, intermediate electricity
Pole flange 10 is equipped with admission line 13 and connects arc chamber 4, and 4 other end of arc chamber is conical outlet, conical outlet upper and lower side
Radius is respectively 46mm and 6mm, and conical outlet jointed anode abaculus 14, anode abaculus 14 is using metal molybdenum material, anode abaculus
14 extraction bore dia 1mm, the connection expansion cup 15 of anode abaculus 14, expansion cup 15 a diameter of 19mm, length 16mm.
Excitation wire bag 3 is mounted on copper coil frame flange 16, and anode casing 1 is mounted on anode flange 17, intermediate electricity
Insulation is equipped between pole 2, excitation wire bag 3, anode abaculus 14, expansion cup 15 and copper coil frame flange 16 and anode flange 17
Flange 18, anode flange 17 are equipped with anode flange cooling pipe entrance 19 and anode flange cooling pipe outlet 20, anode process
Blue 17 bottoms are equipped with anode and draw flange 21.Filament frame 7, filament cap 6 are process by metal molybdenum, cathode filament 5 and filament
Insulation between cover 6 is ceramics pole.Anode casing 1, anode flange 17, target 2 are process by pure iron, copper wire bag bone
Frame flange 16 is formed by magnetic stainless steel or Copper fabrication.
The magnetic field sources for the double-plasma ion source that the present invention uses is electromagnet.Ion source anode be ground potential, filament
Part plus -500V voltages, target 2 are -200V voltages.Cooling bath is carved with inside target 2 and anode flange 17, outside
Portion corresponds to two groups of cooling inlet and outlet, and substantial amounts of heat can be generated during double-plasma ion source use, passes through cooling cycle
System can reduce each part temperatures, and then increase substantially double-plasma ion source using parameter, improve service life.
Working gas deuterium is discharged by gas flowmeter by admission line 13 into double-plasma ion source during work
In pouch chamber, ion source air pressure inside is maintained in proper range, big to 5 feed-in of cathode filament by lamp filament binding post 8 at this time
Electric current, the rise of 5 temperature of cathode filament, the thermionic emission of generation cause gas discharge.Discharge generate plasma first by
The pyramidal structure of 2 front end of target is subject to mechanical compression, and pyramidal structure diameter maximum is 46mm, is 6mm at diameter minimum.
There is the high-intensity magnetic field that excitation wire bag 3 generates to generate very strong radial constraint to electronics and plasma in this position, by plasma
Body is compressed in discharging chamber near axis, a current potential peak occurs, this current potential peak is by plasma from 14 diameter of anode abaculus
To be pushed out in the anode hole of 1mm, the plasma sprayed from anode hole enters the expansion cup 15 of rear end, and expansion cup 15 can be with
Divergence of ion beam degree is reduced well, reduces extraction voltage.
The material of different magnetic conductivities can have an impact the transmission efficiency in magnetic field, and magnetic conductivity is higher, magnetic field transmission efficiency
It is higher.Therefore anode casing 1, anode flange 17, target flange 2 are pure iron material, to form better ion source magnetic
Field circuit.When the number of ampere turns of excitation wire bag 3 is 8000, ion source internal magnetic field lines are distributed as shown in Fig. 2, in respective axes
Magnetic field intensity is as shown in Figure 3.The areas adjacent between cathode filament 5 and target 2, magnetic induction intensity rise to maximum,
About 40Gs, the about several eV of the thermionic energy that cathode filament 5 is sent, adds through the electric field between cathode filament 5 and target 2
Speed, energy about up to 200eV or so, estimate that electronics is about 1mm in the radius of gyration of this region helix precession accordingly；In centre
Plasma magnetic compression region between electrode 2 and anodic filament 5, magnetic induction intensity is maximum up to 1900Gs, can be to plasma
Body generates strong magnetic compression；In anode hole and expansion cup 15 region, magnetic field is very weak, will not plasma diffusion and expanding
It is formed in cup 15 and draws the apparent disturbance of meniscus generation.
In the use environment of this double-plasma ion source, ion source rear end is drawn there are one accelerates electrode, this electrode
In -120kV high pressures, play the role of drawing ion beam while accelerated ion beam, during use, anode casing 1, sun
Pole flange 17 is in ground potential, and cathode filament 5 and target 2 are respectively at -500V, -200V voltage.On ion source axis
Electric field distribution it is as shown in Figure 4
Double-plasma ion source with when on compact D-D accelerators for neutron production, it is necessary to which beam spot diameter, is less than on target
20mm,.The line simulated using MAGIC softwares is drawn as shown in Figure 5, and beam spot diameter, of the line on target is in 16mm
Left and right, meets design requirement.
It is also an advantage of the present invention that：
1) entire shell is all anode, and anode be in ground potential, safer in use, facilitate ion source with
Rear end equipment connection uses, and cathode filament and target are respectively at -500V, -200V voltage, ensure that ion source can be just
The normal starting the arc；
2) filament frame, filament cap are using metal molybdenum material, and molybdenum has higher fusing point, is unlikely to deform at high temperature, side
Just change, service life is longer；
3) excitation part uses electromagnet, and the magnetic field intensity that electromagnet is formed is continuously adjustable, defeated by changing supply current
Go out the magnetic field of varying strength, and then find the optimal magnetic field of ion beam focusing, facilitate the debugging of ion source, to reach drawing for bigger
Go out line；
4) ion source rear end does not have an individual extraction electrode, reduces by a power supply unit, extraction voltage by rear end extraction
Electrode is accelerated to provide, devises expansion cup structure, one can be formed more in the case where the extraction of rear end equipment accelerates electrode effect
Preferable meniscus, the focusing for being conducive to ion beam are drawn.
Using scheme provided by the invention compared with the prior art, the service life of double-plasma ion source can be extended,
Educt beaming flow intensity is improved, reduces use cost.The D lines of 1~40mA can be drawn, when service life is small more than 100；It is all
Component is using Demountable, and while conveniently replaced easily worn part, very big sky is left to the optimization of its parameter
Between, improve whole economic benefit.
The above is only the better embodiment to the present invention, not makees limit in any form to the present invention
System, any simple modification that every technical spirit according to the invention makes embodiment of above, equivalent variations and modification,
Belong in the range of technical solution of the present invention.
Claims (6)
1. a kind of double-plasma ion source, it is characterised in that：Including anode casing, anode casing and target use soft iron
Material, target are equipped with cooling bath, and excitation wire bag is equipped between target and anode casing, cathode modulation is equipped in arc chamber
Silk, cathode filament are placed in filament cap, and filament cap is mounted on filament frame, and filament frame and lamp filament binding post are fixed by ceramic tube
On target flange, target flange is mounted on one end of target, the intermediate electricity of cooling bath connection of target
Pole cooling pipe entrance, target flange are equipped with admission line and connect arc chamber, and the arc chamber other end is conical outlet, is bored
Shape exports jointed anode abaculus, anode abaculus connection expansion cup, and anode flange is equipped with anode flange cooling pipe entrance and sun
Pole flange cooling pipe outlet, anode flange bottom is equipped with anode and draws flange.
2. according to a kind of double-plasma ion source described in claim 1, it is characterised in that：The target flange and centre
The contact angle of electrode is equipped with Vacuum Package O-ring seal.
3. according to a kind of double-plasma ion source described in claim 1, it is characterised in that：Above and below the arc chamber conical outlet
The radius at end is respectively 46mm and 6mm；The anode abaculus uses metal molybdenum material, the extraction bore dia 1mm of anode abaculus；Institute
State expansion cup a diameter of 19mm, length 16mm.
4. according to a kind of double-plasma ion source described in claim 1, it is characterised in that：The excitation wire bag is mounted on copper wire
On bag skeleton flange, the anode casing be mounted on anode flange on, target, excitation wire bag, anode abaculus, expansion cup and
Insulating flange is equipped between copper coil frame flange and anode flange.
5. according to a kind of double-plasma ion source described in claim 1, it is characterised in that：The filament frame, filament cap by
Metal molybdenum is process, and the insulation between the cathode filament and filament cap is ceramics pole, the anode casing, anode process
Blue, target is process by pure iron, and the copper coil frame flange is formed by magnetic stainless steel or Copper fabrication.
6. according to a kind of double-plasma ion source described in claim 1, it is characterised in that：The cathode filament adds -500V electric
Pressure, target are -200V voltages, are carved with cooling bath inside target and anode flange, corresponding two groups of outside cool down into
Outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711427448.1A CN108112153A (en) | 2017-12-26 | 2017-12-26 | A kind of double-plasma ion source |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711427448.1A CN108112153A (en) | 2017-12-26 | 2017-12-26 | A kind of double-plasma ion source |
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| CN108112153A true CN108112153A (en) | 2018-06-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201711427448.1A Pending CN108112153A (en) | 2017-12-26 | 2017-12-26 | A kind of double-plasma ion source |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109216151A (en) * | 2018-08-16 | 2019-01-15 | 兰州大学 | A kind of built-in antenna type high frequency ion source device |
| CN110072325A (en) * | 2019-05-29 | 2019-07-30 | 中国科学院合肥物质科学研究院 | A kind of high current ion high voltage static accelerating tube |
| CN112928002A (en) * | 2021-01-26 | 2021-06-08 | 中科石金(安徽)中子技术有限公司 | Miniaturized vacuum arc ion source based on mesh anode structure |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109216151A (en) * | 2018-08-16 | 2019-01-15 | 兰州大学 | A kind of built-in antenna type high frequency ion source device |
| CN110072325A (en) * | 2019-05-29 | 2019-07-30 | 中国科学院合肥物质科学研究院 | A kind of high current ion high voltage static accelerating tube |
| CN110072325B (en) * | 2019-05-29 | 2021-06-18 | 中国科学院合肥物质科学研究院 | High-voltage electrostatic accelerating tube for high-current ions |
| CN112928002A (en) * | 2021-01-26 | 2021-06-08 | 中科石金(安徽)中子技术有限公司 | Miniaturized vacuum arc ion source based on mesh anode structure |
| CN112928002B (en) * | 2021-01-26 | 2024-04-05 | 中科石金(安徽)中子技术有限公司 | Miniaturized vacuum arc ion source based on netted anode structure |
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