CN211570764U - Film thickness automatic control film coating machine - Google Patents
Film thickness automatic control film coating machine Download PDFInfo
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- CN211570764U CN211570764U CN201922487201.XU CN201922487201U CN211570764U CN 211570764 U CN211570764 U CN 211570764U CN 201922487201 U CN201922487201 U CN 201922487201U CN 211570764 U CN211570764 U CN 211570764U
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Abstract
The utility model discloses a film thickness automatic control film plating machine, which comprises a shell, a working frame, a driving mechanism, a sputtering film plating mechanism and at least one film thickness monitoring mechanism, wherein the working frame is provided with a substrate carrier, the working frame drives the relative shell to rotate through the driving mechanism, and the working frame rotates around a first rotating shaft; the sputtering coating mechanism and the substrate carrier are arranged inside the shell, the film thickness monitoring mechanism is provided with a film thickness control instrument, a film thickness sensor and an oscillator, the film thickness control instrument is arranged on an electrical control cabinet of the coating machine, the film thickness sensor is arranged on the substrate carrier, and the oscillator is arranged on the working frame. The utility model provides a thick automatic control coating machine, the structure is succinct, lay the law, and thick detection precision is high.
Description
Technical Field
The utility model relates to an optics coating film technical field, concretely relates to thick automatic control coating machine of membrane.
Background
The optical film coating technology is widely applied to various industries, from precision optical equipment, display equipment to optical film application in daily life, for example, anti-counterfeiting technologies on ordinary glasses, digital cameras, various household appliances or banknotes can be called as optical film technology application or technical extension thereof. Without optical thin film technology as the development base, the recent optoelectronic, communication or laser technology cannot be developed, which shows the importance of optical thin film technology research and development.
Generally, when using multi-layer films, it is necessary to use high-low refractive index film stack technology as the design of each type of optical film according to the requirement of the designer to achieve the optical characteristics that are estimated in advance. Say: anti-reflection mirror, high reflection mirror, spectroscope, cut-off filter, band-pass filter, band-stop filter, etc.; in the present day that the software and hardware of computer analysis are well developed, not only the design of the optical film becomes more convenient, but also the research and development of the optical film technology will be faster. To obtain the desired film effect, the thickness of the film is controlled and detected, and two main detection methods are currently available: optical monitoring (visual method, reflection type and transmission type) and physical monitoring (quartz crystal monitoring), wherein the existing optical monitoring method mainly adopts a reflection type optical control film coating machine, and utilizes that the optical characteristics (reflectivity and transmissivity) between a dielectric film and optical glass are changed in the process of coating the dielectric film on an optical glass material, and the optical characteristics can be found to correspond to the optical glass according to the change of the optical characteristics from any film thickness theoretically. Changes in the light of the optical characteristic are converted into changes in the optical signal. When the device is used, parameters for detecting and feeding back to control whether the coating thickness is accurate need to be input into the coating machine, so that the accuracy of the coating thickness of the coating machine is ensured.
The film coating process of the optical film coating machine mostly adopts a quartz crystal film thickness instrument (short for film thickness instrument) to monitor the change of the film thickness, a quartz crystal probe (short for probe) of the film thickness instrument is generally arranged on a fixed position at the center of the furnace top, and a film thickness signal is sent to a film thickness instrument host outside the furnace through a transmission lead.
The most traditional method for fixing the probe above the furnace is the most convenient to install, transmit and use, but is only suitable for the furnace type of evaporation film plating from bottom to top, and the film thickness value of the center point of the furnace top of the furnace represents the film thickness value of each point of the whole furnace, so that the error is large.
Later, vertical film plating machines have appeared, which use a vertical sputtering target for sputter deposition, and the probe is changed to extend into the furnace near the workpiece, and the probe is laterally installed at a fixed position for film thickness monitoring, so that the film thickness information of the fixed point represents the film thickness of the workpiece moving in the whole furnace, and the method also has the problem of large error.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model lies in: to the technical problem that prior art exists, the utility model provides a thick automatic control coating machine, the structure is succinct, lay the law, and thick detection precision is high.
In order to solve the technical problem, the utility model provides a technical scheme does:
a film thickness automatic control film plating machine comprises a shell, a working frame, a driving mechanism, a sputtering film plating mechanism and at least one film thickness monitoring mechanism, wherein the working frame is provided with a substrate carrier, the working frame is driven by the driving mechanism to rotate relative to the shell, and the working frame rotates around a first rotating shaft; the sputtering coating mechanism and the substrate carrier are arranged inside the shell, the film thickness monitoring mechanism is provided with a film thickness control instrument, a film thickness sensor and an oscillator, the film thickness control instrument is arranged on an electrical control cabinet of the coating machine, the film thickness sensor is arranged on the substrate carrier, and the oscillator is arranged on the working frame.
The further improvement of the technical scheme is as follows:
in the above scheme, preferably, the upper end of the first rotating shaft extends out of the housing and is mounted on the housing, and a conductive slip ring is arranged at the top end of the first rotating shaft extending out of the housing.
In the above scheme, preferably, a cavity is arranged at the upper end of the first rotating shaft, and the oscillator is fixedly installed in the cavity.
In the above scheme, preferably, a magnetic fluid dynamic seal is arranged between the upper end of the first rotating shaft and the casing.
In the above aspect, preferably, the lower end of the first rotating shaft is mounted in the housing through a first bearing seat.
In the above scheme, preferably, the driving mechanism includes a driving part and a transmission gear set, the transmission gear set includes a first gear and a second gear which are engaged with each other, the second gear is connected with the driving part, and the first gear is fixedly arranged at the bottom end of the working frame.
In the above scheme, the first embodiment is: the substrate carrier is the support plate, thick monitoring mechanism of membrane is equipped with 1, thick sensor of membrane locates on the support plate.
In the above scheme, the second embodiment is: the substrate carrier comprises at least two rotating frames, the rotating frames are arranged on the working frame through second rotating shafts, and the rotating frames rotate relative to the working frame by taking the second rotating shafts as central shafts.
Preferably, the rotating frame is driven to rotate by a driving mechanism.
Preferably, the driving mechanism further comprises a third gear, and the third gear is fixed to the second rotating shaft.
Preferably, the driving mechanism further comprises a fourth gear and fixed gears, the fourth gear is meshed with the second gears, each third gear is meshed with one fixed gear, all the fixed gears are meshed with the fourth gear, and the second gear drives the third gears to rotate through the fourth gear and the fixed gears.
Preferably, the film thickness sensor is provided with at least two film thickness sensors which are respectively positioned on different rotating frames.
Preferably, the top end of the second rotating shaft is provided with a conductive slip ring.
Preferably, a second bearing seat is arranged between the second rotating shaft and the working frame.
The utility model provides a thick automatic control coating machine of membrane has following advantage compared with prior art:
(1) the utility model discloses a thick automatic control coating machine of membrane, the working frame simple structure, structural layout is succinct, reasonable, applicable in various vertical coating machine. The utility model discloses a thick sensor of membrane is at the coplanar height with the substrate to move together with the substrate, the thick precision height that detects of membrane.
(2) The utility model discloses a thick automatic control coating machine of membrane, bearing frame and magnetic fluid dynamic seal are adopted in the pivot, have simplified the overall structure of pivot with the work frame, have strengthened the motion stability of work frame, have further guaranteed the thick precision that detects of membrane to thick detection repeatability is good.
(3) The utility model discloses a thick automatic control coating machine of membrane, workstation and substrate revolving rack adopt gear drive's mode, through gear engagement, have improved the driven stationarity of workstation, improve the thick precision that detects of membrane.
Drawings
Fig. 1 is a schematic structural diagram of embodiment 1 of the present invention.
Fig. 2 is a schematic structural diagram of embodiment 2 of the present invention.
The reference numbers illustrate:
1. a housing; 2. a working frame; 21. a first rotating shaft; 22. an upper end plate; 23. a lower end plate; 24. a strut; 3. a film thickness monitoring mechanism; 31. a film thickness sensor; 32. an oscillator; 33. electrical leads and water pipes; 4. a substrate carrier; 41. rotating the frame; 42. a second rotating shaft; 43. a second bearing housing; 5. a conductive slip ring; 6. a first bearing housing; 7. a drive member; 81. a first gear; 82. a second gear; 83. a third gear; 84. a fourth gear; 85. and fixing the gear.
Detailed Description
The following describes the embodiments of the present invention in detail. It is to be understood that the description of the embodiments herein is for purposes of illustration and explanation only and is not intended to limit the invention.
Example 1
Fig. 1 shows an embodiment of the utility model discloses thick automatic control coating machine of membrane, the coating machine includes casing 1, workstation 2, actuating mechanism, sputter coating mechanism to and a thick monitoring mechanism 3 of membrane, workstation 2 is equipped with substrate carrier 4, workstation 2 is rotatory through the relative casing 1 of actuating mechanism drive, and workstation 2 includes first pivot 21, upper end plate 22, lower end plate 23 and branch 24, and branch 24 supports between upper end plate 22 and lower end plate 23. The working frame 2 rotates around a first rotating shaft 21; the sputtering coating mechanism and the substrate carrier 4 are arranged inside the shell 1, the film thickness monitoring mechanism 3 is provided with a film thickness control instrument, a film thickness sensor 31 and an oscillator 32, the film thickness control instrument is arranged in an electrical control cabinet of the coating machine, the film thickness sensor 31 is arranged on the substrate carrier 4, and the oscillator 32 is arranged on the working frame 2.
In this embodiment, a cavity is disposed at the upper end of the first rotating shaft 21, the upper end of the first rotating shaft 21 extends out of the housing 1 and is mounted on the housing 1, the top end of the first rotating shaft 21 extending out of the housing 1 is disposed with the conductive slip ring 5, and the oscillator 32 is fixedly mounted in the cavity. A magnetic fluid dynamic seal is arranged between the upper end of the first rotating shaft 21 and the shell 1.
In this embodiment, the substrate carrier 4 is a support plate, which is arranged in a barrel shape and is arranged on the working frame 2, and the substrate is attached to the support plate. The number of the film thickness monitoring mechanisms 3 is 1, and the film thickness sensors 31 are arranged on the carrier plate, are at the same plane height with the substrate and move together with the substrate. The middle part of the first rotating shaft 21 is a hollow pipe, one end of an electric lead of the film thickness sensor 31 and one end of a water pipe 33 are connected with the conductive slip ring 5, and the other end of the electric lead passes through the cavity of the first rotating shaft 21 and the cavity of the working frame 2 and then is connected with the film thickness sensor 31. The film thickness sensor 31 employs a crystal oscillator probe.
In this embodiment, the lower end of the first rotating shaft 21 is installed in the housing 1 through the first bearing seat 6. The first bearing housing 6 is fixed to the bottom end inside the housing 1. The bearing seat is internally provided with a bearing, and the bearing can be used by combining one or more bearings such as a self-aligning roller bearing, a thrust ball bearing, a deep groove ball bearing and the like. A dustproof ring is arranged between the bearing seat and the first rotating shaft 21.
In this embodiment, actuating mechanism includes driving piece 7 and transmission gear group, and transmission gear group includes engaged with first gear 81 and second gear 82, and driving piece 7 adopts the motor in this embodiment, and the motor passes through the shaft coupling to be connected with second gear 82, and the motor is installed outside casing 1, is equipped with the magnetic fluid dynamic seal between shaft coupling and the casing 1. In other embodiments, the drive may be via a pulley. The first gear 81 is fixedly arranged at the bottom end of the working frame 2.
Example 2
Fig. 2 shows a second embodiment of the invention, which differs from example 1 only in the structure of the substrate carrier 4: the substrate carrier 4 includes a plurality of rotating frames 41, the rotating frames 41 are mounted on the working frame 2 through a second rotating shaft 42, the rotating frames 41 rotate relative to the working frame 2 with the second rotating shaft 42 as a central axis, and the plurality of rotating frames 41 are arranged on the working frame 2 in a circular shape.
In this embodiment, the driving mechanism further includes a third gear 83, a fourth gear 84 and fixed gears 85, the third gear 83 is fixed to the second rotating shaft 42, the fourth gear 84 is meshed with the second gears 82, each third gear 83 is meshed with one fixed gear 85, all the fixed gears 85 are meshed with the fourth gear 84, and the second gears 82 drive the third gears 83 to rotate through the fourth gears 84 and the fixed gears 85. The rotating frame 41 rotates while the work frame 2 revolves. The upper end of the second rotating shaft 42 extends out of the upper end plate 22 to be connected with a conductive slip ring, the lower end of the second rotating shaft is connected with the lower end plate 23 through a second bearing seat, the upper end of the second bearing seat is connected with the second rotating shaft 42, and the lower end of the second bearing seat is fixedly connected with a third gear 83.
In this embodiment, at least two film thickness sensors 31 are provided, and are respectively located on different rotating frames 41. The electric lead and the water pipe of the film thickness sensor 31 pass through the first rotating shaft 21 of the working frame 2 to be connected with an external film thickness controller, the electric lead and the water pipe are divided into at least two strands after passing through the cavity, and each strand passes through the corresponding conductive slip ring to be connected with one film thickness sensor 31.
In either embodiment 1 or 2, the film thickness sensor 31 rotates in synchronization with the substrate, and can accurately detect the film thickness. In sputtering coating, the film thickness sensor 31 transmits the detected data to the film thickness controller at any time, the data is fed back to the processing system of the coating machine through the film thickness controller, and the processing system sends out an instruction to control the work of the magnetron sputtering cathode. The processing system of the film plating machine is the same as that of the film plating machine in the prior art.
The above embodiments are merely preferred embodiments of the present invention, which are not intended to limit the present invention in any way. Although the present invention has been described with reference to the preferred embodiments, it is not intended to limit the present invention. Therefore, any simple modification, equivalent change and modification made to the above embodiments by the technical entity of the present invention should fall within the protection scope of the technical solution of the present invention.
Claims (10)
1. The film coating machine is characterized by comprising a shell, a working frame, a driving mechanism, a sputtering film coating mechanism and at least one film thickness monitoring mechanism, wherein the working frame is provided with a substrate carrier, the working frame is driven by the driving mechanism to rotate relative to the shell, and the working frame rotates around a first rotating shaft; the sputtering coating mechanism and the substrate carrier are arranged inside the shell, the film thickness monitoring mechanism is provided with a film thickness control instrument, a film thickness sensor and an oscillator, the film thickness control instrument is arranged on an electrical control cabinet of the coating machine, the film thickness sensor is arranged on the substrate carrier, and the oscillator is arranged on the working frame.
2. The coating machine of claim 1, wherein the upper end of the first shaft extends out of the housing and is mounted on the housing, and a conductive slip ring is disposed at the top end of the first shaft extending out of the housing.
3. The coating machine of claim 2 wherein the first shaft has a cavity at its upper end, and the oscillator is fixedly mounted in the cavity.
4. The machine of claim 3, wherein a magnetohydrodynamic seal is provided between the upper end of the first shaft and the housing.
5. The machine of claim 2, wherein the lower end of the first shaft is mounted in the housing by a first bearing seat.
6. The film thickness automatic control coating machine according to claim 5, wherein the driving mechanism comprises a driving member and a transmission gear set, the transmission gear set comprises a first gear and a second gear which are meshed with each other, the second gear is connected with the driving member, and the first gear is fixedly arranged at the bottom end of the working frame.
7. The machine of claim 6, wherein the substrate carrier is a carrier.
8. The coating machine of claim 7, wherein 1 film thickness monitoring mechanism is provided, and the film thickness sensor is provided on the carrier plate.
9. The machine for automatically controlling coating thickness according to claim 6, wherein the substrate carrier comprises at least two rotating frames, the rotating frames are mounted on the working frame through a second rotating shaft, and the rotating frames rotate relative to the working frame with the second rotating shaft as a central shaft.
10. The machine of claim 9, wherein the turret is driven by a drive mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922487201.XU CN211570764U (en) | 2019-12-31 | 2019-12-31 | Film thickness automatic control film coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922487201.XU CN211570764U (en) | 2019-12-31 | 2019-12-31 | Film thickness automatic control film coating machine |
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| CN211570764U true CN211570764U (en) | 2020-09-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201922487201.XU Active CN211570764U (en) | 2019-12-31 | 2019-12-31 | Film thickness automatic control film coating machine |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113122817A (en) * | 2021-04-16 | 2021-07-16 | 深圳市三束镀膜技术有限公司 | Vacuum coating crystal oscillator signal short-distance processing device and vacuum coating equipment |
| CN113755806A (en) * | 2021-09-10 | 2021-12-07 | 四川旭虹光电科技有限公司 | Reflective magnetron sputtering coating thickness monitoring device, coating machine and method |
-
2019
- 2019-12-31 CN CN201922487201.XU patent/CN211570764U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113122817A (en) * | 2021-04-16 | 2021-07-16 | 深圳市三束镀膜技术有限公司 | Vacuum coating crystal oscillator signal short-distance processing device and vacuum coating equipment |
| CN113755806A (en) * | 2021-09-10 | 2021-12-07 | 四川旭虹光电科技有限公司 | Reflective magnetron sputtering coating thickness monitoring device, coating machine and method |
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