CN211339680U - Double-layer LPCVD furnace - Google Patents

Double-layer LPCVD furnace Download PDF

Info

Publication number
CN211339680U
CN211339680U CN201921463536.1U CN201921463536U CN211339680U CN 211339680 U CN211339680 U CN 211339680U CN 201921463536 U CN201921463536 U CN 201921463536U CN 211339680 U CN211339680 U CN 211339680U
Authority
CN
China
Prior art keywords
furnace
flange
tail
pipe
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201921463536.1U
Other languages
Chinese (zh)
Inventor
吴晨阳
圣永波
马谭·雷纳斯
杨马克·卢彻斯
皮特·威奈莫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tan Baishi Ip Co ltd
Original Assignee
Tan Baishi Ip Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tan Baishi Ip Co ltd filed Critical Tan Baishi Ip Co ltd
Priority to CN201921463536.1U priority Critical patent/CN211339680U/en
Application granted granted Critical
Publication of CN211339680U publication Critical patent/CN211339680U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Chemical Vapour Deposition (AREA)

Abstract

The utility model provides a double-deck LPCVD stove, including furnace body, outer tube and inner tube, the outer pipe box is established outside the inner tube, the furnace body cover is established outside the outer tube, the outer tube adopts quartzy or SiC material to make, the inner tube adopts high temperature resistant metal material to make, the inner tube with the outer tube contactless. The temperature in the tube can be quickly balanced, the yield and the yield are favorably improved, the rigidity and the toughness are excellent, the stress damage of the tube wall caused by the epitaxial thin film is reduced, and the service life is prolonged.

Description

Double-layer LPCVD furnace
Technical Field
The utility model belongs to the technical field of semiconductor and photovoltaic equipment manufacture and specifically relates to a double-deck LPCVD stove is related to.
Background
The CVD process is called chemical vapor deposition chemistry vapor deposition and is one of the processes of epitaxial film growth, semiconductor manufacturing and photovoltaic manufacturing. The principle is that under specific high temperature and pressure, gas precursor is decomposed and reacted to generate new matter to be deposited on the substrate. Common CVD is classified by its characteristics into PECVD, LPCVD, and APCVD, which are correspondingly and collectively referred to as plasma-enhanced chemical vapor deposition, low-pressure chemical vapor deposition, and atmospheric pressure chemical vapor deposition, respectively. The method is mainly applied to the industrial production of a-Si films, SiN films, SiO films and the like for semiconductors and photovoltaics. A tubular reactor is generally used to maintain a high temperature and pressure environment.
In the conventional LPCVD process for photovoltaic and semiconductor, a single-layer quartz tube or a SiC furnace tube is generally used, and a heating wire is used as a heating source outside the tube. In order to meet the requirement of mass production capacity, the length of the furnace tube is more than 2m, the substrate wafer is put into the furnace tube by a carrier, and the heating rings on the outer side are divided into a plurality of heating rings which are independently controlled. So as to maintain the temperature inside the tube uniform and to achieve the uniformity of the epitaxial film.
In such a tube type furnace, since both ends of the furnace are perforated or a vacuum pump needs to be connected, the heat dissipation rate may be different from that of the inside of the tube, and different heating units are applied to the longitudinal direction of the tube during the temperature control. To achieve the desired uniform temperature, it takes several tens of minutes to several hours. Even so, with the addition of the inlet and exhaust systems, the design of the apparatus heating wires in zones, the temperature balance inside the whole tube is difficult, especially in the lower temperature range of 600 ℃.
In addition, due to the fact that the specific film is deposited, the Poly-Si polycrystalline silicon film is deposited on the substrate, parasitic deposition also exists inside the furnace tube, the accumulated thickness is considerable in daily life, stress generated by temperature change of the Si film is large, the quartz tube is broken, and the service life is shortened.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model is to provide a double-deck LPCVD stove, intraductal temperature can reach the balance rapidly, helps promoting yield and output, and rigidity and toughness are good, reduce the pipe wall because the stress that epitaxial film caused is damaged, increase of service life.
In order to solve the technical problem, double-deck LPCVD stove includes furnace body, outer tube and inner tube, the outer pipe box is established outside the inner tube, the furnace body cover is established outside the outer tube, the outer tube adopts quartzy or SiC material to make, the inner tube adopts high temperature resistant metal material to make, the inner tube with the outer tube contactless.
1. This technical scheme is owing to adopted double-deck LPCVD stove includes furnace body, outer tube and inner tube, the outer pipe box is established outside the inner tube, the furnace body cover is established outside the outer tube, the outer tube adopts quartz or SiC material to make, the inner tube adopts high temperature resistant metal material to make, the inner tube with the outer tube contactless, the horizontal length of inner tube is more than the horizontal length of outer tube and is not more than 10 cm's technical means, so, heat conduction effect is good, and intraductal temperature can reach the balance rapidly, helps promoting yield and output, and rigidity and toughness are good, reduce the pipe wall because the stress damage that epitaxial film caused, increase of service life.
The inner pipe is made of 316 stainless steel.
2. According to the technical scheme, the inner pipe adopts a technical means of 316 stainless steel, so that the temperature is quickly reduced, the weight is controllable, the pipe body can be thinned, the replacement and maintenance are very convenient, and the cost is low.
The inner wall of the inner pipe is raised to form a reinforcing rib structure.
3. According to the technical scheme, the inner wall of the inner tube is protruded to form a technical means of a reinforcing rib structure, so that deformation is not easy to occur.
The outer pipe extends out of the furnace mouth of the furnace body along the horizontal direction.
And a first furnace mouth flange and a second furnace mouth flange are sleeved outside one end of the outer pipe close to the furnace mouth.
One side of the first furnace opening flange is tightly attached to the furnace body.
The second furnace mouth flange comprises a large ring and a small ring which are concentrically arranged.
And the outer diameters of the large ring and the small ring of the second furnace opening flange are the same.
And the small ring end surface of the second furnace opening flange is pressed with the other surface of the first furnace opening flange.
And a first furnace mouth gasket is arranged between the small ring end surface of the second furnace mouth flange and the first furnace mouth flange.
And the large-circle end surface of the second furnace opening flange is pressed with the furnace door.
And a second furnace opening gasket is arranged between the second furnace opening flange and the furnace door.
4. According to the technical scheme, the outer pipe extends out of the furnace mouth of the furnace body along the horizontal direction; a first furnace mouth flange and a second furnace mouth flange are sleeved outside one end of the outer pipe close to the furnace mouth; one surface of the first furnace opening flange is tightly attached to the furnace body; the second furnace mouth flange comprises a large ring and a small ring which are concentrically arranged; the outer diameters of the large ring and the small ring of the second furnace opening flange are the same; the small ring end surface of the second furnace opening flange is pressed with the other surface of the first furnace opening flange; a first furnace mouth gasket is arranged between the small ring end surface of the second furnace mouth flange and the first furnace mouth flange; the large-circle end face of the second furnace opening flange is pressed with the furnace door; and a second furnace mouth gasket is arranged between the second furnace mouth flange and the furnace door, so that the sealing effect of the furnace mouth is good.
The outer pipe extends out of the furnace tail of the furnace body along the horizontal direction.
And a first furnace tail flange and a second furnace tail flange are sleeved outside one end of the outer pipe close to the furnace tail in an embedded mode.
One side of the first furnace tail flange is tightly attached to the furnace body.
The second furnace tail flange comprises a large ring and a small ring which are concentrically arranged.
And the outer diameters of the large ring and the small ring of the second furnace tail flange are the same.
And the small circle end surface of the second furnace tail flange is pressed with the other surface of the first furnace tail flange.
And a first furnace tail gasket is arranged between the small ring end face of the second furnace tail flange and the first furnace tail flange.
And the large ring end surface of the second furnace tail flange is pressed with the furnace tail cover plate.
And a second furnace tail gasket is arranged between the second furnace tail flange and the furnace tail cover plate.
5. According to the technical scheme, the outer pipe extends out of the furnace tail of the furnace body along the horizontal direction; a first furnace tail flange and a second furnace tail flange are sleeved outside one end of the outer pipe close to the furnace tail; one surface of the first furnace tail flange is tightly attached to the furnace body; the second furnace tail flange comprises a large ring and a small ring which are concentrically arranged; the outer diameters of the large ring and the small ring of the second furnace tail flange are the same; the small circle end surface of the second furnace tail flange is pressed with the other surface of the first furnace tail flange; a first furnace tail gasket is arranged between the small ring end surface of the second furnace tail flange and the first furnace tail flange; the large ring end surface of the second furnace tail flange is pressed with the furnace tail cover plate; and a second furnace tail gasket is arranged between the second furnace tail flange and the furnace tail cover plate, so that the sealing effect of the furnace tail is good.
The inner wall of the small ring end of the second furnace opening flange is tightly attached to the outer pipe.
And one end of the inner pipe close to the furnace opening is fixedly connected with one end of the outer pipe close to the furnace opening through an inner pipe fixing device.
6. In the technical scheme, the inner wall of the small ring end of the second furnace mouth flange is tightly attached to the outer pipe; the technical means that one end of the inner pipe close to the furnace opening is fixedly connected with one end of the outer pipe close to the furnace opening through the inner pipe fixing device, so that the inner pipe close to one end of the furnace opening is fixed and sealed.
And the inner wall of the small ring end of the second furnace tail flange is tightly attached to the outer pipe.
An inner pipe cushion block is arranged between one end of the inner pipe close to the furnace tail and one end of the outer pipe close to the furnace tail.
7. In the technical scheme, the inner wall of the small ring end of the second furnace tail flange is tightly attached to the outer pipe; and an inner pipe cushion block is arranged between one end of the inner pipe close to the furnace tail and one end of the outer pipe close to the furnace tail, so that the inner pipe close to one end of the furnace tail is sealed.
And a vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate.
The vacuum pump through hole is connected with a vacuum pump exhaust tube.
And a vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate.
The vacuum pump through hole is connected with a vacuum pump exhaust tube.
At least one air inlet pipe through hole is formed.
And each air inlet pipe through hole is respectively connected with a reaction gas inlet pipe.
And each reaction gas inlet pipe is respectively communicated into the inner pipe.
8. According to the technical scheme, a vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate; the vacuum pump through hole is connected with a vacuum pump exhaust pipe; a vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate; the vacuum pump through hole is connected with a vacuum pump exhaust pipe; at least one air inlet pipe through hole is formed; each gas inlet pipe through hole is respectively connected with a reaction gas inlet pipe; each reaction gas inlet pipe is respectively communicated with the inner pipe, so that gas is communicated into the inner pipe.
At least one gasket is arranged between the inner wall of the furnace body and the outer pipe.
9. According to the technical scheme, the technical means that at least one gasket is arranged between the inner wall of the furnace body and the outer pipe is adopted, so that the tight connection between the outer pipe and the furnace body is facilitated.
At least one temperature sensor is also included.
The temperature sensor is placed within the inner tube or between the inner tube and the outer tube.
10. The technical proposal also comprises at least one temperature sensor; the temperature sensor is placed in the inner pipe or between the inner pipe and the outer pipe, so that the temperature in the furnace is detected in time.
Compared with the prior art, the utility model following beneficial effect has:
this technical scheme is owing to adopted double-deck LPCVD stove includes furnace body, outer tube and inner tube, the outer pipe box is established outside the inner tube, the furnace body cover is established outside the outer tube, the outer tube adopts quartz or SiC material to make, the inner tube adopts high temperature resistant metal material to make, the inner tube with the outer tube contactless, the horizontal length of inner tube is more than the horizontal length of outer tube and not more than 10 cm's technological means, so, the intraductal temperature can reach the balance rapidly, helps promoting yield and output, and rigidity and toughness are good, reduce the pipe wall because the stress damage that epitaxial film caused, increase of service life.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
The present invention will be described in further detail with reference to the accompanying drawings and embodiments.
FIG. 1 is a schematic sectional view of a furnace mouth end of a double-layer LPCVD furnace of the present invention;
FIG. 2 is a schematic view of the cross-sectional structure of the furnace end of the double-layer LPCVD furnace of the present invention.
FIG. 3 is a schematic view of the inner tube of the double-layer LPCVD furnace according to the present invention.
In the figure: 101-furnace body; 102-a first gasket; 103-a first furnace mouth flange; 104-a first snout gasket; 105-a second furnace mouth flange; 106-outer tube; 107-inner tube; 1071-a stiffener structure; 108-inner tube fixation means; 109-a second snout gasket; 110-oven door; 202-a second shim; 203-a first furnace tail flange; 204-a first furnace tail gasket; 205-a second furnace tail flange; 208-inner tube spacer block; 209-a second furnace tail gasket; 210-a furnace tail cover plate; 211-vacuum pump exhaust tube; 212-reactant gas inlet pipe; 213-temperature sensor.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of the embodiments of the present invention, as generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the accompanying drawings, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate the position or positional relationship based on the position or positional relationship shown in the drawings, or the position or positional relationship which is usually placed when the product of the present invention is used, and are only for convenience of description and simplification of the description, but do not indicate or imply that the device or element referred to must have a specific position, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Furthermore, the terms "horizontal", "vertical", "overhang" and the like do not imply that the components are required to be absolutely horizontal or overhang, but may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Some embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The embodiments described below and the features of the embodiments can be combined with each other without conflict.
As shown in fig. 1-3, the utility model provides a double-deck LPCVD stove, including furnace body 101, outer tube 106 and inner tube 107, outer tube 106 cover is established on the inner tube 107, furnace body 101 cover is established on the outer tube 106, outer tube 106 adopts high temperature resistant and the quartz material that sealing performance is good to make, inner tube 107 adopts the high 316 stainless steel material of high temperature resistant coefficient of heat conductivity to make.
The outer tube 106 is coated with a resistance heating wire heating element and is controlled by two or two independent temperature control units in a partition mode.
The outer tube 106 and the inner tube 107 are arranged in concentric cylinders.
The outer tube 106 has two ends penetrating and is sealed with a flange, a gasket, the oven door 110 and the oven tail cover 210.
The inner wall of the inner pipe 107 is raised to form a reinforcing rib structure 1071.
A gasket is arranged between the inner wall of the furnace body 101 and the outer pipe 106; the number of the gaskets is two, the first gasket 102 is positioned at the front end of the furnace body 101, and the second gasket 202 is positioned at the rear end of the furnace body 101.
The furnace mouth end of the outer tube 106 protrudes out of the furnace mouth of the furnace body 101; a first furnace mouth flange 103 and a second furnace mouth flange 105 are embedded outside the outer pipe 106 at the furnace mouth end; one surface of the first furnace mouth flange 103 is tightly attached to the furnace body 101; the other surface of the first furnace opening flange 103 is tightly attached to the second furnace opening flange 105; the second furnace mouth flange 105 is nested outside the first furnace mouth flange 103 and connected together through bolts, and the first furnace mouth gasket 104 is fixedly compacted to achieve a sealing effect; the first furnace mouth gasket 104 is a sealing O ring; the second furnace mouth flange 105 comprises a large ring and a small ring which are concentrically arranged; the large circle end face of the second furnace opening flange 105 is tightly attached to the furnace door 110 through a second furnace opening gasket 109; the oven door 110 fixedly compacts the second oven opening gasket 109 to achieve a sealing effect; the second fire hole gasket 109 is a sealing O-ring.
The furnace tail end of the outer tube 106 protrudes out of the furnace tail of the furnace body 101; a first furnace tail flange 203 and a second furnace tail flange 205 are embedded outside the outer pipe 106 at the furnace tail end; one surface of the first furnace tail flange 203 is tightly attached to the furnace body 101; the other surface of the first furnace tail flange 203 is tightly attached to the second furnace tail flange 205; the second furnace tail flange 205 is nested outside the first furnace tail flange 203, and is connected together through bolts to fix the first furnace tail gasket 204 so as to achieve a sealing effect; the first furnace tail gasket 204 is a sealing O ring; the second furnace tail flange 205 comprises a large ring and a small ring which are concentrically arranged; the large circle end face of the second furnace tail flange 205 is tightly attached to the furnace tail cover plate 210 through a second furnace tail gasket 209; the furnace tail cover plate 210 fixedly compacts a second furnace tail gasket 209 to achieve a sealing effect; the second furnace tail gasket 209 is a sealing O-ring.
The outer tube 106 is sealed with the oven door 110 by the first oven port flange 103 and the second oven port flange 105, and the outer tube 106 is sealed with the oven tail cover plate 210 by the first oven tail flange 203 and the second oven tail flange 205, so as to form a vacuum chamber.
The inner wall of the small circle end of the second furnace opening flange 105 is tightly attached to the outer pipe 106; the end of the inner tube 107 close to the furnace opening is fixedly connected with the end of the outer tube 106 close to the furnace opening through an inner tube fixing device 108, so that relative movement cannot occur between the end of the inner tube 107 close to the furnace opening and the end of the outer tube 106 close to the furnace opening.
The inner wall of the small circle end of the second furnace tail flange 205 is tightly attached to the outer pipe 106; an inner pipe cushion block 208 is arranged between one end of the inner pipe 107 close to the furnace tail and one end of the outer pipe 106 close to the furnace tail; upon heating, the metal expands, causing a change in length of the inner tube 107 and a relative movement between the end of the outer tube 106 near the furnace tail.
A vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate 210; the vacuum pump through hole is connected with a vacuum pump exhaust pipe 211; at least one air inlet pipe through hole is formed; each gas inlet pipe through hole is respectively connected with a reaction gas inlet pipe 212; each of the reactant gas inlets 212 opens into the inner tube 107.
Also included is a temperature sensor 213; the temperature sensor 213 is placed between the inner tube 107 and the outer tube 106.
Therefore, the double-layer LPCVD furnace of the embodiment can quickly achieve the balance of the temperature in the tube, is beneficial to improving the yield and the yield, has excellent rigidity and toughness, reduces the stress damage of the tube wall caused by the epitaxial thin film, and prolongs the service life.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. The double-layer LPCVD furnace is characterized by comprising a furnace body (101), an outer tube (106) and an inner tube (107), wherein the outer tube (106) is sleeved outside the inner tube (107), the furnace body (101) is sleeved outside the outer tube (106), the outer tube (106) is made of quartz or SiC materials, the inner tube (107) is made of high-temperature-resistant metal materials, and the inner tube (107) is not in contact with the outer tube (106);
the outer pipe (106) extends out of a furnace opening of the furnace body (101) along the horizontal direction;
and a first furnace mouth flange (103) and a second furnace mouth flange (105) are embedded at one end of the outer pipe (106) close to the furnace mouth.
2. The double-layer LPCVD furnace according to claim 1,
the inner pipe (107) is made of 316 stainless steel.
3. The double-layer LPCVD furnace according to claim 1,
the inner wall of the inner pipe (107) is raised to form a reinforcing rib structure (1071).
4. The double-layer LPCVD furnace according to claim 1,
one surface of the first furnace mouth flange (103) is tightly attached to the furnace body (101);
the second furnace mouth flange (105) comprises a large ring and a small ring which are concentrically arranged;
the outer diameters of the large ring and the small ring of the second furnace opening flange (105) are the same;
the small circle end surface of the second furnace opening flange (105) is pressed with the other surface of the first furnace opening flange (103);
a first furnace mouth gasket (104) is arranged between the small ring end surface of the second furnace mouth flange (105) and the first furnace mouth flange (103);
the large circle end face of the second furnace opening flange (105) is pressed with the furnace door (110);
a second furnace mouth gasket (109) is arranged between the second furnace mouth flange (105) and the furnace door (110).
5. The double-layer LPCVD furnace according to claim 1,
the outer pipe (106) extends out of the furnace tail of the furnace body (101) along the horizontal direction;
a first furnace tail flange (203) and a second furnace tail flange (205) are sleeved outside one end of the outer pipe (106) close to the furnace tail;
one surface of the first furnace tail flange (203) is tightly attached to the furnace body (101);
the second furnace tail flange (205) comprises a large ring and a small ring which are concentrically arranged;
the outer diameters of the large ring and the small ring of the second furnace tail flange (205) are the same;
the small circle end surface of the second furnace tail flange (205) is pressed with the other surface of the first furnace tail flange (203);
a first furnace tail gasket (204) is arranged between the small circle end surface of the second furnace tail flange (205) and the first furnace tail flange (203);
the large circle end face of the second furnace tail flange (205) is pressed with the furnace tail cover plate (210);
and a second furnace tail gasket (209) is arranged between the second furnace tail flange (205) and the furnace tail cover plate (210).
6. The double-layer LPCVD furnace according to claim 4,
the inner wall of the small circle end of the second furnace opening flange (105) is tightly attached to the outer pipe (106);
one end of the inner pipe (107) close to the furnace opening is fixedly connected with one end of the outer pipe (106) close to the furnace opening through an inner pipe fixing device (108).
7. The double-layer LPCVD furnace according to claim 5,
the inner wall of the small circle end of the second furnace tail flange (205) is tightly attached to the outer pipe (106);
an inner pipe cushion block (208) is arranged between one end of the inner pipe (107) close to the furnace tail and one end of the outer pipe (106) close to the furnace tail.
8. The double-layer LPCVD furnace according to claim 5,
a vacuum pump through hole and an air inlet pipe through hole are formed in the rear of the furnace tail cover plate (210);
the vacuum pump through hole is connected with a vacuum pump exhaust pipe (211);
at least one air inlet pipe through hole is formed;
each air inlet pipe through hole is respectively connected with a reaction gas inlet pipe (212);
each reaction gas inlet pipe (212) is respectively communicated into the inner pipe (107).
9. The double-layer LPCVD furnace according to claim 1,
at least one gasket is arranged between the inner wall of the furnace body (101) and the outer pipe (106).
10. The double-layer LPCVD furnace according to claim 1,
further comprising at least one temperature sensor (213);
the temperature sensor (213) is placed within the inner tube (107) or between the inner tube (107) and the outer tube (106).
CN201921463536.1U 2019-09-04 2019-09-04 Double-layer LPCVD furnace Active CN211339680U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921463536.1U CN211339680U (en) 2019-09-04 2019-09-04 Double-layer LPCVD furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921463536.1U CN211339680U (en) 2019-09-04 2019-09-04 Double-layer LPCVD furnace

Publications (1)

Publication Number Publication Date
CN211339680U true CN211339680U (en) 2020-08-25

Family

ID=72133998

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921463536.1U Active CN211339680U (en) 2019-09-04 2019-09-04 Double-layer LPCVD furnace

Country Status (1)

Country Link
CN (1) CN211339680U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112382553A (en) * 2020-11-16 2021-02-19 拉普拉斯(无锡)半导体科技有限公司 Double-layer reaction cavity structure
CN116732495A (en) * 2023-07-17 2023-09-12 赛瑞达智能电子装备(无锡)有限公司 LPCVD double-layer furnace tube and control method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112382553A (en) * 2020-11-16 2021-02-19 拉普拉斯(无锡)半导体科技有限公司 Double-layer reaction cavity structure
CN116732495A (en) * 2023-07-17 2023-09-12 赛瑞达智能电子装备(无锡)有限公司 LPCVD double-layer furnace tube and control method thereof

Similar Documents

Publication Publication Date Title
CN211339680U (en) Double-layer LPCVD furnace
US4817558A (en) Thin-film depositing apparatus
CN110042370B (en) Reaction chamber structure of tubular PECVD equipment
CN102216656B (en) For the treatment of the seal arrangement of room
CN101980959A (en) Gold-coated polysilicon reactor system and method
EP2008969A1 (en) Trichlorosilane production apparatus
US20110129621A1 (en) Systems and methods for distributing gas in a chemical vapor deposition reactor
CN103132053A (en) Gas preheating system for chemical vapor deposition
CN203947158U (en) A kind of flow field baffle mechanism of MOCVD reaction chamber and MOCVD reaction chamber
US20070056950A1 (en) Removable heater
CN212610887U (en) Double-layer quartz process chamber structure
CN114464519A (en) Gas extraction ring and semiconductor processing device
CN212533120U (en) Production device of laminated film
JP4063661B2 (en) Semiconductor manufacturing apparatus and semiconductor manufacturing method
CN112382553A (en) Double-layer reaction cavity structure
WO2024077766A1 (en) Gas collecting ring used for gallium oxide epitaxy, and mocvd apparatus used for gallium oxide epitaxy
CN205313665U (en) Central pillar of metal organic chemical vapor deposition equipment (MOCVD)
TW202312512A (en) Pre-coating method for improving dust in reaction cavity and pre-coating film formed by pre-coating method
CN217997321U (en) PECVD furnace and PECVD deposition system
CN103834931B (en) Equipment for carrying out chemical vapor deposition process
CN220977135U (en) Furnace body sliding plate device
CN105463411A (en) Center supporting column of metal organic chemical vapor deposition device
CN218812237U (en) Improve film quality's air inlet structure
CN216864315U (en) HWCVD device with fixed bottom of hot wire
CN215517743U (en) Control device for epitaxial layer thickness uniformity growth of epitaxial furnace

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant