CN215517743U - Control device for epitaxial layer thickness uniformity growth of epitaxial furnace - Google Patents
Control device for epitaxial layer thickness uniformity growth of epitaxial furnace Download PDFInfo
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- CN215517743U CN215517743U CN202121985032.3U CN202121985032U CN215517743U CN 215517743 U CN215517743 U CN 215517743U CN 202121985032 U CN202121985032 U CN 202121985032U CN 215517743 U CN215517743 U CN 215517743U
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Abstract
The utility model provides a control device for epitaxial layer thickness uniformity growth of an epitaxial furnace, which comprises an epitaxial furnace body and a control device with a setting value on the epitaxial furnace body, wherein a square frame-shaped installation frame is fixedly arranged on the epitaxial furnace body, the control device is fixedly arranged in the installation frame, a first installation component and a second installation component are respectively and fixedly arranged on the left side and the right side of the inner side of the installation frame, the first installation component and the second installation component are symmetrically arranged, and the left side and the right side of the control device are respectively positioned in the first installation component and the second installation component.
Description
Technical Field
The utility model belongs to the technical field of epitaxial furnace equipment, and particularly relates to a control device for epitaxial layer thickness uniformity growth outside an epitaxial furnace.
Background
At present, epitaxial wafers, such as silicon carbide epitaxial wafers, are generally grown by a CVD (chemical vapor deposition) method, in which a substrate is placed in a reaction chamber of an epitaxial furnace, a compound containing a film-forming element and a simple substance gas are introduced into the reaction chamber, and a solid film is deposited on the surface of the substrate by a space vapor chemical reaction at a certain temperature and pressure. CVD is a mainstream technology in the semiconductor industry because it enables the growth of epitaxial wafers with high purity and few defects. Most of the epitaxial furnaces for vapor deposition commercialized at present are horizontal planetary reaction chamber epitaxial furnaces, wherein a large disc is arranged in a reaction chamber of the epitaxial furnace, and a plurality of small disc bases for placing substrates are arranged on the large disc. An injector communicated with the air inlet pipeline is arranged above the center of the large disc, source gas enters the reaction chamber from the air inlet pipeline through the injector and is transported along the radial direction of the large disc, and tail gas is discharged from an exhaust channel at the periphery of the large disc. The bottom of the large disc is provided with a heating coil for heating the reaction chamber. The current heating coil is the similar mosquito-repellent incense structure of integration and encircles in the deep bid bottom and by its heating degree of control system control, so that present an even temperature in the reaction chamber, the epitaxial layer thickness of production is more even, heating coil and outside display controller electric connection, observe and control the heating temperature of heating coil in to the reaction chamber through outside display controller, consequently, display controller is the controlling means that epitaxial layer thickness uniformity of epitaxial furnace grows, how with outside display controller and epitaxial furnace body fixed connection be the problem that needs to solve.
SUMMERY OF THE UTILITY MODEL
The utility model provides a control device for epitaxial layer thickness uniformity growth of an epitaxial furnace, which solves the problems in the prior art.
The technical scheme of the utility model is realized as follows: the utility model provides a controlling means for epitaxial layer thickness homogeneity of epitaxial furnace grows, includes epitaxial furnace body and the controlling means of setting value on the epitaxial furnace body, fixed being provided with the installing frame that is the square frame form on the epitaxial furnace body, controlling means is fixed to be set up in the installing frame, and the inboard left and right sides of installing frame is fixed respectively and is provided with first installation component and second installation component, and first installation component and second installation component symmetry set up, and controlling means's the left and right sides is located first installation component and second installation component respectively.
When fixing controlling means on epitaxial furnace, fix the installing frame on the epitaxial furnace body earlier, because the installing frame is square frame shape structure, consequently the middle part of installing frame is empty, first installation component and second installation component are located the installing frame middle part position respectively, the upper and lower two parts of the controlling means left and right sides are located first installation component and second installation component respectively, fix controlling means earlier through first installation component and second installation component, first installation component and second installation component are fixed with the installing frame that sets up on the epitaxial furnace again, realize the fixed process between controlling means and the epitaxial furnace.
As a preferred embodiment, the first mounting assembly comprises a first mounting part, a second mounting part and a third mounting part which are sequentially arranged from top to bottom, the second mounting part is fixedly arranged on the first mounting part, the third mounting part is arranged at a distance from the first mounting part, the top of the control device is arranged between the first mounting part and the second mounting part, and the bottom of the control device is arranged in the third mounting part.
As a preferred embodiment, the third installation part comprises a first part body, a second part body and a third part body which are integrally formed from top to bottom, the first part body and the third part body are respectively and vertically arranged at the top and the bottom of the second part body, the front side of the third part body is vertically and integrally provided with a first baffle plate, the left side of the third part body is vertically and fixedly provided with a second baffle plate, the bottom of the left side of the control device is positioned between the first baffle plate and the second part body and is in contact with the second baffle plate, through the arrangement of the third mounting part structure, the bottom part of the control device is inserted between the second body and the third body, the first piece is located in the square frame in the middle of the installation frame, the second piece and the third piece are arranged to achieve preliminary fixing of the control device, and the first baffle and the second baffle which are arranged at the third piece are further fixed to the control device, so that the bottom of the control device is fixed by the third installation piece.
As a preferred embodiment, the first mounting part comprises a fourth body, a fifth body and a sixth body which are integrally formed, the fifth body is transversely arranged, the fourth body and the sixth body are respectively vertically arranged on the front side and the rear side of the fifth body, the length of the fourth body is smaller than that of the sixth body, the sixth body abuts against the surface of the mounting frame, the top of the control device is inserted between the fourth body and the sixth body, and the top of the control device is fixed by the first mounting part.
As a preferred embodiment, the second mounting part comprises a seventh part body and an eighth part body which are integrally formed, the seventh part body is vertically arranged, the eighth part body is vertically arranged at the rear side of the seventh part body, a slot with an open bottom is formed in the sixth part body, an insertion block corresponding to the slot is formed in the rear side of the seventh part body and inserted into the slot, the seventh part body and the fourth part body are arranged at intervals, the control device is positioned between the seventh part body and the fourth part body, the top of the control device is positioned in a gap between the fourth part body and the seventh part body, and the eighth part body is positioned at the upper side of a hollow position in the middle of the mounting frame, so that the second mounting part, the first mounting part and the control device are fixed, and the control device is fixed on the mounting frame on the surface of the epitaxial furnace.
As a preferred embodiment, the first body, the second body, the sixth body and the eighth body are all abutted against the surface of the mounting frame, so that the fixing process between the first mounting piece and the mounting frame and the fixing process between the second mounting piece and the mounting frame are realized.
After the technical scheme is adopted, the utility model has the beneficial effects that:
when fixing controlling means on epitaxial furnace, fix the installing frame on the epitaxial furnace body earlier, because the installing frame is square frame shape structure, consequently the middle part of installing frame is empty, first installation component and second installation component are located the installing frame middle part position respectively, the upper and lower two parts of the controlling means left and right sides are located first installation component and second installation component respectively, fix controlling means earlier through first installation component and second installation component, first installation component and second installation component are fixed with the installing frame that sets up on the epitaxial furnace again, realize the fixed process between controlling means and the epitaxial furnace.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the connection between the control device and the mounting frame of FIG. 1;
fig. 3 is a schematic structural view of the first mounting assembly.
In the figure, 1-the epitaxial furnace body; 2-a control device; 3, mounting a frame; 4-a first mounting assembly; 5-a second mounting assembly; 6-a first mount; 7-a second mount; 8-a third mount; 9-a first body; 10-a second body; 11-a third body; 12-a first baffle; 13-a second baffle; 14-a fourth body; 15-fifth body; 16-a sixth body; 17-seventh body; 18-eighth body; 19-a slot; 20-inserting blocks.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1 to 3, a control device for epitaxial layer thickness uniformity growth of an epitaxial furnace comprises an epitaxial furnace body 1 and a control device 2 with a setting value on the epitaxial furnace body 1, wherein a square frame-shaped installation frame 3 is fixedly arranged on the epitaxial furnace body 1, the control device 2 is fixedly arranged in the installation frame 3, a first installation component 4 and a second installation component 5 are respectively and fixedly arranged on the left side and the right side of the inner side of the installation frame 3, the first installation component 4 and the second installation component 5 are symmetrically arranged, and the left side and the right side of the control device 2 are respectively located in the first installation component 4 and the second installation component 5.
When fixing controlling means 2 on epitaxial furnace, fix installing frame 3 on epitaxial furnace body 1 earlier, because installing frame 3 is square frame shape structure, consequently, the middle part of installing frame 3 is empty, first installation component 4 and second installation component 5 are located installing frame 3 middle part position respectively, the upper and lower two parts of the 2 left and right sides of controlling means are located first installation component 4 and second installation component 5 respectively, fix controlling means 2 earlier through first installation component 4 and second installation component 5, first installation component 4 and second installation component 5 are fixed with installing frame 3 that sets up on the epitaxial furnace again, realize the fixed process between controlling means 2 and the epitaxial furnace.
The first mounting component 4 comprises a first mounting part 6, a second mounting part 7 and a third mounting part 8 which are arranged from top to bottom in sequence, the second mounting part 7 is fixedly arranged on the first mounting part 6, the third mounting part 8 is arranged at a distance from the first mounting part 6, the top part of the control device 2 is positioned between the first mounting part 6 and the second mounting part 7, the bottom part of the control device 2 is positioned in the third mounting part 8, since the first mounting assembly 4 and the second mounting assembly 5 are symmetrically arranged, the arrangement of the structure of the first mounting assembly 4, so that the top and the bottom of the left side of the control device 2 can be inserted into the first mounting part 6 and the third mounting part 8 respectively, and the top and the bottom of the right side of the control device can be inserted into the first mounting part 6 and the third mounting part 8 in the second mounting component 5 respectively, thereby realizing the fixing process of the first mounting component 4 and the second mounting component 5 to the control device 2.
The third mounting part 8 comprises a first part body 9, a second part body 10 and a third part body 11 which are integrally formed from top to bottom, the first part body 9 and the third part body 11 are respectively vertically arranged at the top and the bottom of the second part body 10, a first baffle plate 12 is vertically and integrally arranged at the front side of the third part body 11, a second baffle plate 13 is vertically and fixedly arranged at the left side of the third part body 11, the bottom at the left side of the control device 2 is positioned between the first baffle plate 12 and the second part body 10 and is in contact with the second baffle plate 13, the bottom of the control device 2 is inserted between the second part body 10 and the third part body 11 through the arrangement of the structure of the third mounting part 8, the first baffle plate 12 and the second baffle plate 13 which are arranged at the third part body 11 realize the primary fixation of the control device 2 through the first part body 9 being positioned in the square frame at the middle part of the mounting frame 3, so that the bottom of the control device 2 is fixed by the third mounting 8. First installed part 6 includes integrated into one piece's fourth body 14, fifth body 15 and sixth body 16, and fifth body 15 transversely sets up, and fourth body 14 and sixth body 16 set up perpendicularly respectively in the front and back both sides of fifth body 15 and the length of fourth body 14 is less than the length of sixth body 16, and sixth body 16 offsets with the surface of installing frame 3, and controlling means's top is inserted between fourth body 14 and the sixth body 16, realizes the fixed of first installed part 6 to controlling means top.
The second mounting part 7 comprises a seventh part body 17 and an eighth part body 18 which are integrally formed, the seventh part body 17 is vertically arranged, the eighth part body 18 is vertically arranged on the rear side of the seventh part body 17, a slot 19 with an open bottom is formed in the sixth part body 16, an insertion block 20 corresponding to the slot 19 is arranged on the rear side of the seventh part body 17, the insertion block 20 is inserted into the slot 19, the front side of the seventh part body 17 and the rear side of the fourth part body 14 are arranged at intervals, the control device 2 is positioned between the seventh part body 17 and the fourth part body 14, the top of the control device 2 is positioned in a gap between the fourth part body 14 and the seventh part body 17, the eighth part body 18 is positioned on the upper side of a hollow position in the middle of the mounting frame 3, and the fixing between the second mounting part 7 and the first mounting part 6 and the control device 2 is realized, and the control device 2 is fixed on the mounting frame 3 on the surface of the epitaxial furnace. The first piece body 9, the second piece body 10, the sixth piece body 16 and the eighth piece body 18 are all abutted against the surface of the mounting frame 3, and the fixing process between the first mounting piece 6 and the mounting frame 3 and the fixing process between the second mounting piece 7 and the mounting frame 3 are achieved.
In the description of the present invention, it is to be understood that the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used merely for convenience of description and for simplicity of description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention. In the description of the present invention, unless otherwise specified and limited, it is to be noted that the terms "mounted," "connected," and "connected" are to be interpreted broadly, and may be, for example, a mechanical connection or an electrical connection, a communication between two elements, a direct connection, or an indirect connection via an intermediate medium, and specific meanings of the terms may be understood by those skilled in the art according to specific situations.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (8)
1. The control device for epitaxial layer thickness uniformity growth of the epitaxial furnace comprises an epitaxial furnace body and a control device of a setting value on the epitaxial furnace body, and is characterized in that a square frame-shaped installation frame is fixedly arranged on the epitaxial furnace body, the control device is fixedly arranged in the installation frame, a first installation component and a second installation component are fixedly arranged on the left side and the right side of the inner side of the installation frame respectively, the first installation component and the second installation component are symmetrically arranged, and the left side and the right side of the control device are respectively located in the first installation component and the second installation component.
2. The control device for epitaxial layer thickness uniformity growth outside of an epitaxial furnace of claim 1, wherein the first mounting assembly comprises a first mounting member, a second mounting member and a third mounting member arranged from top to bottom, the second mounting member is fixedly arranged on the first mounting member, the third mounting member is arranged at a distance from the first mounting member, the top of the control device is positioned between the first mounting member and the second mounting member, and the bottom of the control device is positioned in the third mounting member.
3. The control device for epitaxial layer thickness uniformity growth of an epitaxial furnace as claimed in claim 2, wherein the third mounting member comprises a first member body, a second member body and a third member body which are integrally formed from top to bottom, the first member body and the third member body are respectively and vertically arranged at the top and the bottom of the second member body, the front side of the third member body is vertically and integrally provided with a first baffle plate, the left side of the third member body is vertically and fixedly provided with a second baffle plate, and the bottom of the left side of the control device is located between the first baffle plate and the second member body and is in contact with the second baffle plate.
4. The control device for epitaxial layer thickness uniformity growth of an epitaxial furnace as claimed in claim 3, wherein the first mounting member comprises a fourth body, a fifth body and a sixth body which are integrally formed, the fifth body is transversely arranged, the fourth body and the sixth body are respectively vertically arranged at the front side and the rear side of the fifth body, and the length of the fourth body is smaller than that of the sixth body.
5. The control device for epitaxial layer thickness uniformity growth of an epitaxial furnace according to claim 4, wherein the second mounting member comprises a seventh member body and an eighth member body which are integrally formed, the seventh member body is vertically arranged, and the eighth member body is vertically arranged at the rear side of the seventh member body.
6. The device as claimed in claim 5, wherein the sixth body has a slot with an open bottom, and the seventh body has an insert block at the rear side thereof corresponding to the slot, the insert block being inserted into the slot.
7. The control device for epitaxial layer thickness uniformity growth of an epitaxial furnace as claimed in claim 6, wherein the front side of the seventh body is spaced apart from the back side of the fourth body, the control device being located between the seventh body and the fourth body.
8. The control device for epitaxial layer thickness uniformity growth of an epitaxial furnace of claim 7, wherein the first, second, sixth and eighth body are all against the surface of the mounting frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121985032.3U CN215517743U (en) | 2021-08-23 | 2021-08-23 | Control device for epitaxial layer thickness uniformity growth of epitaxial furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121985032.3U CN215517743U (en) | 2021-08-23 | 2021-08-23 | Control device for epitaxial layer thickness uniformity growth of epitaxial furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215517743U true CN215517743U (en) | 2022-01-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121985032.3U Active CN215517743U (en) | 2021-08-23 | 2021-08-23 | Control device for epitaxial layer thickness uniformity growth of epitaxial furnace |
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| Country | Link |
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| CN (1) | CN215517743U (en) |
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2021
- 2021-08-23 CN CN202121985032.3U patent/CN215517743U/en active Active
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