CN211260360U - Gas mixing output system - Google Patents
Gas mixing output system Download PDFInfo
- Publication number
- CN211260360U CN211260360U CN201921900011.XU CN201921900011U CN211260360U CN 211260360 U CN211260360 U CN 211260360U CN 201921900011 U CN201921900011 U CN 201921900011U CN 211260360 U CN211260360 U CN 211260360U
- Authority
- CN
- China
- Prior art keywords
- gas
- pressure
- supply units
- mixed
- mixed gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Accessories For Mixers (AREA)
Abstract
A gas mixing output system comprises a plurality of gas supply units for supplying a plurality of gases, a gas pressure stabilizing device and a gas buffer unit, wherein the gas supply units are used for supplying the plurality of gases and mixing the plurality of gases into a mixed gas; the gas pressure stabilizing device is communicated with the plurality of gas supply units and regulates and controls the mixed gas within a preset pressure range; the gas buffer unit is communicated with the gas pressure stabilizing device and feeds back an output flow value and an output pressure value of the mixed gas to the gas supply unit, so that the gas supply unit regulates the flow of the mixed gas from the gas supply unit; the gas pressure stabilizing device monitors the pressure value of the mixed gas; when the pressure value of the mixed gas exceeds the preset pressure range, the gas pressure stabilizing device starts to act, so that the pressure value of the mixed gas returns to the preset pressure range.
Description
Technical Field
The utility model relates to a gas mixing system; in particular to a gas mixing output system.
Background
In the high-tech field, it is required to use a mixed gas with a stable concentration for manufacturing high-tech product components (e.g., semiconductor chips, display devices, touch panels, etc.). Such a constant concentration of mixed gas is usually supplied to the manufacturing machine of the high-tech product components at a constant pressure and a constant flow rate.
For example, the semiconductor process has a strict requirement on the concentration accuracy of the mixed gas, and the concentration accuracy of the mixed gas needs to reach a predetermined value ± 0.0N% to meet the standard. At 4% H2/96％N2For example, the concentration accuracy of the mixed gas is required to meet the mixing accuracy of 4% + -0.12%, so that the mixed gas can be used in semiconductor process.
Generally, a gas mixing system uses a Mass Flow Controller (MFC) to control the output flow and pressure of pure gas; however, because the mechanical structure of the MFC is limited, the pressure difference between the primary side and the secondary side of the MFC must be between 15 psi and 20psi to stabilize the mass flow rate of the gas, so the conventional gas mixing system must have a mixing lower limit flow rate to ensure that the MFC can accurately control the gas flow rate. Conventional gas mixing systems can mix gases below 300LPM and have fixed or semi-fixed opening devices, such as backpressure valves or flow-limiting ports, downstream of the gas mixing tank to maintain the pressure differential between the primary and secondary sides of the MFC. However, when the flow rate of the equipment gas is increased and the flow rate changes greatly by 50 to 1000LPM during the use process, such a conventional gas mixing system cannot provide the concentration accuracy of the stable mixed gas, that is, if the flow rate of the required mixed gas greatly changes, the required mixed gas exceeds the regulation and control capability range of the back pressure valve with a fixed opening of the conventional gas mixing system, so that the concentration accuracy of the mixed gas and other related parameters are unbalanced, and the use requirement of the manufacturing machine cannot be met.
In summary, there is still a need for improvement of the conventional gas mixing and outputting system and method to solve the problems of the conventional gas mixing and outputting system and method.
SUMMERY OF THE UTILITY MODEL
In view of the above, the present invention provides a gas mixing output system and method, which utilizes a gas pressure stabilizer to adjust the opening of the gas pressure stabilizer according to the required flow rate of the mixed gas, so as to maintain the pressure difference of the gas supply unit at the primary side and the secondary side within a predetermined range, ensure the normal operation of the gas supply unit, and accurately control the concentration and flow rate of the gas, thereby maintaining the concentration accuracy of the mixed gas.
In order to achieve the above objects, the present invention provides a gas mixing output system, which comprises a plurality of gas supply units, a gas pressure stabilizer, and a gas buffer unit; the plurality of gas supply units are used for supplying a plurality of gases, and the plurality of gases are mixed into a mixed gas; the gas pressure stabilizing device is communicated with the plurality of gas supply units and is used for regulating and controlling the mixed gas within a preset pressure range; the gas buffer unit is communicated with the gas pressure stabilizing device and used for feeding back an output flow value and an output pressure value of the mixed gas to the plurality of gas supply units so that the plurality of gas supply units can regulate the flow of the mixed gas from the plurality of gas supply units according to the output flow value and the output pressure value; wherein the gas pressure stabilizer comprises a gas pressure gauge and a pressure controller, the gas pressure gauge is used for monitoring the pressure value of the mixed gas, and the pressure controller is used for controlling the pressure value of the mixed gas; the pressure controller is communicatively connected to the gas gauge; when the flow rate of the mixed gas from the plurality of gas supply units changes and the gas pressure gauge monitors that the pressure value of the mixed gas from the plurality of gas supply units exceeds the preset pressure range, the pressure controller receives a first regulating signal from the gas pressure gauge, and the pressure controller starts to act according to the first regulating signal to enable the pressure value of the mixed gas to return to the preset pressure range.
Another object of the present invention is to provide a gas mixing output method, which includes at least the following steps:
providing a plurality of gases;
mixing the plurality of gases into a mixed gas;
regulating the mixed gas within a preset pressure range by using a gas pressure stabilizing device which is communicated with the plurality of gas supply units; and
feeding back an output flow value and an output pressure value of the mixed gas to the plurality of gas supply units by using a gas buffer unit, so that the plurality of gas supply units regulate the flow of the mixed gas from the plurality of gas supply units according to the output flow value and the output pressure value, and the gas buffer unit is communicated with the gas pressure stabilizing device;
wherein the gas pressure stabilizer comprises a gas pressure gauge and a pressure controller, the gas pressure gauge is used for monitoring the pressure value of the mixed gas, and the pressure controller is used for controlling the pressure value of the mixed gas; the pressure controller is communicatively connected to the gas gauge; when the flow rate of the mixed gas from the plurality of gas supply units changes and the gas pressure gauge monitors that the pressure value of the mixed gas from the plurality of gas supply units exceeds the preset pressure range, the pressure controller receives a first regulating signal from the gas pressure gauge, and the pressure controller starts to act according to the first regulating signal to enable the pressure value of the mixed gas to return to the preset pressure range.
The utility model has the advantages of, utilize gaseous voltage regulator device according to the gaseous voltage regulator device's of required mist flow adjustment aperture to the pressure differential value that the gas supply unit is once inclining and the secondary side is located a preset range, ensures that the gas supply unit normally operates, and the gaseous concentration of accurate control and flow, and then maintain mist's concentration precision.
Drawings
FIG. 1 is a schematic view of a gas mixing output system according to a preferred embodiment of the present invention;
fig. 2 is a flow chart of a gas mixing output method according to a preferred embodiment of the present invention.
Description of the reference numerals
1 gas mixing output system
10 first gas supply unit
12 first gas pressure gauge 14 first gas Mass Flow Controller (MFC)
14a first side 14b a second side
20 second gas supply unit
22 second gas gauge 24 second gas Mass Flow Controller (MFC)
24a first side 24b second side
30 gas mixing device
40 gas pressure stabilizer
42 gas pressure gauge 44 pressure controller
50 gas buffer unit
52 gas pressure gauge
M manufacturing machine
S02, S04, S06 and S08 steps
Detailed Description
In order to explain the present invention more clearly, a preferred embodiment will be described in detail below with reference to the accompanying drawings. Referring to fig. 1, fig. 1 is a schematic view of a gas mixing output system 1 according to a preferred embodiment of the present invention, wherein the gas mixing output system 1 is illustrated by using a first gas and a second gas as an example, but not limited thereto; in practice, the gas mixing output system 1 provided by the present invention can be used for mixing various gases to form a mixed gas. In fig. 1, a gas mixing output system 1 includes a plurality of gas supply units, a gas mixing device 30, a gas pressure stabilizer 40, and a gas buffer unit 50.
In an embodiment of the present invention, the plurality of gas supply units are configured to supply a plurality of gases; for example, the plurality of gas supply units includes a first gas supply unit 10 and a second gas supply unit 20, wherein the first gas supply unit 10 supplies a first gas and the second gas supply unit 20 supplies a second gas.
The first gas supply unit 10 includes a first gas pressure gauge 12 and a first gas Mass Flow Controller (MFC)14, and the second gas supply unit 20 includes a second gas pressure gauge 22 and a second gas Mass Flow Controller (MFC) 24. In the present embodiment, the first gas pressure gauge 12 is used for measuring the pressure value of the first gas, and the first gas Mass Flow Controller (MFC)14 is used for controlling the flow value of the first gas. In the present embodiment, the second gas pressure gauge 22 is used to measure the pressure of the second gas, and the second gas Mass Flow Controller (MFC)24 is used to control the flow rate of the second gas.
The gas mixing device 30 is connected to the first gas supply unit 10 and the second gas supply unit 20, so that the first gas and the second gas are mixed into a mixed gas in the gas mixing device 30. In the embodiment of the present invention, the first gas Mass Flow Controller (MFC)14 of the first gas supply unit 10 and the second gas Mass Flow Controller (MFC)24 of the second gas supply unit 20 are respectively connected to the gas mixing device 30. In an embodiment of the present invention, when the first gas has a first pressure difference on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14, and the first pressure difference is within 15-20psi, the first gas Mass Flow Controller (MFC)14 has the best flow regulation capability for the first gas; the second gas has a second pressure difference between the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24, and the second pressure difference is within 15-20psi, the second gas Mass Flow Controller (MFC)24 has an optimal flow regulation capability for the second gas. In general, the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 can precisely control the flow rates of the first gas and the second gas and the concentration precision of the mixed gas when the first pressure difference and the second pressure difference are both within 15-20 psi. In an embodiment of the present invention, the first gas has a pressure value of 110psi at the first side 14a of the first gas Mass Flow Controller (MFC)14, and the second gas has a pressure value of 110psi at the first side 24a of the second gas Mass Flow Controller (MFC) 24.
The gas pressure stabilizer 40 is connected to the gas mixing device 30 for regulating the pressure of the mixed gas within a predetermined pressure range. In the embodiment of the present invention, the gas pressure stabilizer 40 is disposed between the gas mixing device 30 and the gas buffer unit 50, and is communicated with the gas mixing device 30 and the gas buffer unit 50. In another embodiment of the present invention, the gas pressure stabilizer 40 is disposed between the gas supply units 10 and 20 and the gas mixing device 30, and is communicated with the gas supply units 10 and 20 and the gas mixing device 30. In the embodiment of the present invention, the gas pressure stabilizer 40 includes a gas pressure gauge 42 and a pressure controller 44, wherein the gas pressure gauge 42 is used for monitoring the pressure value of the mixed gas, and the pressure controller 44 is used for controlling the pressure value of the mixed gas. In the present embodiment, the pressure controller 44 is communicatively connected to the gas gauge 42; when the gas pressure gauge 42 detects that the pressure value of the mixed gas exceeds the preset pressure range, the gas pressure gauge 42 transmits a first control signal to the pressure controller 44, and the pressure controller 44 starts to operate according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range. In the embodiment of the present invention, when the flow rate of the mixed gas from the gas supply units 10 and 20 changes, and the gas pressure gauge 42 monitors that the pressure value of the mixed gas from the gas supply units 10 and 20 exceeds the preset pressure range (e.g. 90-95 psi), the pressure controller 44 and the gas pressure gauge 42 circularly feed back and adjust the pressure value of the mixed gas until the pressure value of the mixed gas returns to and is maintained within the preset pressure range.
In the embodiment of the present invention, when the flow rate of the mixed gas in the gas supply units 10 and 20 is increased, the opening degree of the pressure controller 44 is increased accordingly, so that the pressure difference of the mixed gas on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14 and the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24 is maintained within a predetermined range (e.g., the predetermined range is 15-20 psi). When the flow rate of the mixed gas in the gas supply units 10 and 20 becomes small, the opening degree of the pressure controller 44 is decreased accordingly, so that the pressure difference of the mixed gas on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14 and the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24 is maintained within a predetermined range (for example, a predetermined range of 15-20 psi). For example, assuming that the preset pressure range of the mixed gas is 90-95 psi, when the pressure value of the mixed gas detected by the gas gauge 42 exceeds 90-95 psi, the gas gauge 42 transmits a first control signal to the pressure controller 44, and the pressure controller 44 starts to operate according to the first control signal to return the pressure value of the mixed gas to 90-95 psi. In the embodiment of the present invention, the gas pressure stabilizer 40 can regulate the pressure value of the mixed gas, so that the first pressure difference of the first gas in the first gas Mass Flow Controller (MFC)14 is within 15-20psi, and the second pressure difference of the second gas in the second gas Mass Flow Controller (MFC)24 is within 15-20 psi.
On the other hand, when the flow rate of the mixed gas increases, the gas stabilizer 40 automatically increases the opening degree, and prevents the gas pressure value of the mixed gas from accumulating at the secondary side of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC) 24. On the contrary, when the flow rate of the mixed gas is decreased, the gas pressure stabilizer 40 automatically decreases the opening degree to maintain the pressure value of the gas at the secondary sides of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 to be 90-95 psi, so that the first pressure difference and the second pressure difference are maintained at 15-20psi, and further, the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 can accurately control the flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas. In embodiments of the present invention, the pressure controller 44 includes a Mass Flow Controller (MFC), an automatic Back Pressure Regulator (BPR), or a Pressure Control Valve (PCV).
The gas buffer unit 50 is connected to the gas pressure stabilizer 40 for regulating and controlling the output flow rate and the output pressure of the mixed gas. The gas buffer unit 50 is communicatively connected to the first gas supply unit 10 and the second gas supply unit 20; when the output pressure value of the mixed gas output by the gas buffer unit 50 is greater than or less than an output preset value, the gas buffer unit 50 transmits a second regulation signal to at least one of the first gas supply unit 10 and the second gas supply unit 20, and the at least one of the first gas supply unit 10 and the second gas supply unit 20 regulates the output flow of at least one of the first gas and the second gas according to the second regulation signal. In the embodiment of the present invention, the gas buffer unit 50 has a gas pressure gauge 52 for measuring the pressure value of the mixed gas in the gas buffer unit 50.
In detail, the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are controlled in accordance with the change of the gas pressure in the gas buffer unit 50. When the pressure of the gas in the gas buffer unit 50 changes, the gas buffer unit 50 sends a signal to an automatic controller (not shown), and the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are automatically adjusted by the command from the automatic controller. For example, the pressure of the mixed gas in the gas buffer unit 50 can be maintained within 75-85 psi by the above-mentioned operation method. In the embodiment of the present invention, if the pressure value of the mixed gas of the gas buffer unit 50 is less than the set value (e.g. 80psi), the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are increased; on the contrary, if the pressure value of the mixed gas of the gas buffer unit 50 is greater than the set value (e.g., 80psi), the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are decreased. In the embodiment of the present invention, the gas buffer unit 50 is connected to the manufacturing machine M to provide the mixed gas with the predetermined concentration and the predetermined flow rate to the manufacturing machine M; the manufacturing tool M may be, for example, a semiconductor manufacturing tool.
Referring to fig. 2, fig. 2 is a flowchart of a gas mixing output method according to a preferred embodiment of the present invention. The embodiment of the utility model provides a gas mixing output method includes following step at least:
step S02, providing a plurality of gases;
step S04, mixing the multiple gases into a mixed gas;
step S06, regulating and controlling the mixed gas within a preset pressure range by using the gas pressure stabilizing device 40;
in step S08, the gas buffer unit 50 feeds back the output flow rate value and the output pressure value of the mixed gas to the plurality of gas supply units 10 and 20 supplying the plurality of gases, so that the plurality of gas supply units 10 and 20 adjust the flow rate of the mixed gas from the gas supply units 10 and 20 according to the output flow rate value and the output pressure value. In the embodiment of the present invention, the gas buffer unit 50 is connected to the gas pressure stabilizer 40.
In the embodiment of the present invention, the gas pressure stabilizer 40 includes a gas pressure gauge 42 and a pressure controller 44, the gas pressure gauge 42 is used for monitoring the pressure value of the mixed gas, and the pressure controller 44 is used for controlling the pressure value of the mixed gas. The pressure controller 44 is communicatively connected to the gas gauge 42. When the flow rate of the mixed gas from the gas supply units 10 and 20 changes and the gas pressure gauge 42 monitors that the pressure value of the mixed gas from the gas supply units 10 and 20 exceeds the preset pressure range, the pressure controller 44 receives a first control signal from the gas pressure gauge 42, and the pressure controller 44 starts to operate according to the first control signal to return the pressure value of the mixed gas to the preset pressure range. In the embodiment of the present invention, the gas gauge 42 can send out the first control signal and directly transmit the first control signal to the pressure controller 44; in practice, the gas gauge 42 may send a value monitoring signal to a Programmable Logic Controller (PLC) (not shown), and then send a first control signal from the PLC to the pressure Controller 44.
In the embodiment of the present invention, the plurality of gases are provided by a plurality of gas supply units, respectively; for example, the plurality of gas supply units includes a first gas supply unit 10 and a second gas supply unit 20, wherein the first gas supply unit 10 supplies a first gas and the second gas supply unit 20 supplies a second gas.
The first gas supply unit 10 includes a first gas pressure gauge 12 and a first gas Mass Flow Controller (MFC)14, and the second gas supply unit 20 includes a second gas pressure gauge 22 and a second gas Mass Flow Controller (MFC) 24. In the present embodiment, the first gas pressure gauge 12 is used for measuring the pressure value of the first gas, and the first gas Mass Flow Controller (MFC)14 is used for controlling the flow value of the first gas. In the present embodiment, the second gas pressure gauge 22 is used to measure the pressure of the second gas, and the second gas Mass Flow Controller (MFC)24 is used to control the flow rate of the second gas.
The gas mixing device 30 is connected to the first gas supply unit 10 and the second gas supply unit 20, so that the first gas and the second gas are mixed into a mixed gas in the gas mixing device 30. In the embodiment of the present invention, the first gas Mass Flow Controller (MFC)14 of the first gas supply unit 10 and the second gas Mass Flow Controller (MFC)24 of the second gas supply unit 20 are respectively connected to the gas mixing device 30. In an embodiment of the present invention, when the first gas has a first pressure difference on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14, and the first pressure difference is within 15-20psi, the first gas Mass Flow Controller (MFC)14 has the best flow regulation capability for the first gas; the second gas has a second pressure difference between the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24, and the second pressure difference is within 15-20psi, the second gas Mass Flow Controller (MFC)24 has an optimal flow regulation capability for the second gas. In general, the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 can precisely control the flow rates of the first gas and the second gas and the concentration precision of the mixed gas when the first pressure difference and the second pressure difference are both within 15-20 psi. In an embodiment of the present invention, the first gas has a pressure value of 110psi at the first side 14a of the first gas Mass Flow Controller (MFC)14, and the second gas has a pressure value of 110psi at the first side 24a of the second gas Mass Flow Controller (MFC) 24.
The gas pressure stabilizer 40 is connected to the gas mixing device 30 for regulating the pressure of the mixed gas within a predetermined pressure range. In the embodiment of the present invention, the gas pressure stabilizer 40 is disposed between the gas mixing device 30 and the gas buffer unit 50, and is communicated with the gas mixing device 30 and the gas buffer unit 50. In another embodiment of the present invention, the gas pressure stabilizer 40 is disposed between the gas supply units 10 and 20 and the gas mixing device 30, and is communicated with the gas supply units 10 and 20 and the gas mixing device 30. In the embodiment of the present invention, the gas pressure stabilizer 40 includes a gas pressure gauge 42 and a pressure controller 44, wherein the gas pressure gauge 42 is used for monitoring the pressure value of the mixed gas, and the pressure controller 44 is used for controlling the pressure value of the mixed gas. In the present embodiment, the pressure controller 44 is communicatively connected to the gas gauge 42; when the gas pressure gauge 42 detects that the pressure value of the mixed gas exceeds the preset pressure range, the gas pressure gauge 42 transmits a first control signal to the pressure controller 44, and the pressure controller 44 starts to operate according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range.
In the embodiment of the present invention, when the flow rate of the mixed gas in the gas supply units 10 and 20 is increased, the opening degree of the pressure controller 44 is increased accordingly, so that the pressure difference of the mixed gas on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14 and the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24 is maintained within a predetermined range (e.g., the predetermined range is 15-20 psi). When the flow rate of the mixed gas in the gas supply units 10 and 20 becomes small, the opening degree of the pressure controller 44 is decreased accordingly, so that the pressure difference of the mixed gas on the first side 14a and the second side 14b of the first gas Mass Flow Controller (MFC)14 and the first side 24a and the second side 24b of the second gas Mass Flow Controller (MFC)24 is maintained within a predetermined range (for example, a predetermined range of 15-20 psi). For example, assuming that the preset pressure range of the mixed gas is 90-95 psi, when the pressure value of the mixed gas detected by the gas gauge 42 exceeds 90-95 psi, the gas gauge 42 transmits a first control signal to the pressure controller 44, and the pressure controller 44 starts to operate according to the first control signal to return the pressure value of the mixed gas to 90-95 psi. In the embodiment of the present invention, the gas pressure stabilizer 40 can regulate the pressure value of the mixed gas, so that the first gas is within the range of 15-20psi of the first pressure difference of the first gas Mass Flow Controller (MFC)14, and the second gas is within the range of 15-20psi of the second pressure difference of the second gas Mass Flow Controller (MFC) 24.
On the other hand, when the flow rate of the mixed gas increases, the gas stabilizer 40 automatically increases the opening degree, and prevents the gas pressure value of the mixed gas from accumulating at the secondary side of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC) 24. On the contrary, when the flow rate of the mixed gas is decreased, the gas pressure stabilizer 40 automatically decreases the opening degree to maintain the pressure value of the gas at the secondary sides of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 to be 90-95 psi, so that the first pressure difference and the second pressure difference are maintained at 15-20psi, and further, the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 can accurately control the flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas. In embodiments of the present invention, the pressure controller 44 includes a Mass Flow Controller (MFC), an automatic Back Pressure Regulator (BPR), or a Pressure Control Valve (PCV). In the embodiment of the present invention, when the flow rate of the mixed gas from the gas supply units 10 and 20 changes, and the gas pressure gauge 42 monitors that the pressure value of the mixed gas from the gas supply units 10 and 20 exceeds the preset pressure range (e.g. 90-95 psi), the pressure controller 44 and the gas pressure gauge 42 circularly feed back and adjust the pressure value of the mixed gas until the pressure value of the mixed gas returns to and is maintained within the preset pressure range.
The gas buffer unit 50 is connected to the gas pressure stabilizer 40 for regulating and controlling the output flow rate and the output pressure of the mixed gas. The gas buffer unit 50 is communicatively connected to the first gas supply unit 10 and the second gas supply unit 20; when the output pressure value of the mixed gas output by the gas buffer unit 50 is greater than or less than an output preset value, the gas buffer unit 50 transmits a second regulation signal to at least one of the first gas supply unit 10 and the second gas supply unit 20, and the at least one of the first gas supply unit 10 and the second gas supply unit 20 regulates the output flow of at least one of the first gas and the second gas according to the second regulation signal.
In detail, the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are controlled in accordance with the change of the gas pressure in the gas buffer unit 50. When the pressure of the gas in the gas buffer unit 50 changes, the gas buffer unit 50 sends a signal to an automatic controller (not shown), and the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are automatically adjusted by the command from the automatic controller. For example, the pressure of the mixed gas in the gas buffer unit 50 can be maintained within 75-85 psi by the above-mentioned operation method. In the embodiment of the present invention, if the pressure value of the mixed gas of the gas buffer unit 50 is less than the set value (e.g. 80psi), the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are increased; on the contrary, if the pressure value of the mixed gas of the gas buffer unit 50 is greater than the set value (e.g., 80psi), the flow rates of the first gas and the second gas of the first gas Mass Flow Controller (MFC)14 and the second gas Mass Flow Controller (MFC)24 are decreased. In the embodiment of the present invention, the gas buffer unit 50 is connected to the manufacturing machine M to provide the mixed gas with the predetermined concentration and the predetermined flow rate to the manufacturing machine M; the manufacturing tool M may be, for example, a semiconductor manufacturing tool.
By the embodiment of the utility model provides a design, the embodiment of the utility model provides a gaseous mixed output system and gaseous mixed output method, its aperture that utilizes gaseous voltage regulator device to adjust gaseous voltage regulator device according to required mist's flow to the pressure differential value that the gas supply unit was once inclining and the secondary side is located a preset range, ensures that the gas supply unit normally operates, and the concentration and the flow of accurate control gas, and then maintain mist's concentration precision.
The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications to the application of the present invention and the claims should be considered to be included in the scope of the present invention.
Claims (7)
1. A gas mixing output system, comprising:
a plurality of gas supply units for supplying a plurality of gases mixed into a mixed gas;
the gas pressure stabilizing device is communicated with the plurality of gas supply units and is used for regulating and controlling the mixed gas within a preset pressure range; and
a gas buffer unit, connected to the gas pressure stabilizer, for feeding back an output flow value and an output pressure value of the mixed gas to the plurality of gas supply units, so that the plurality of gas supply units can adjust the flow rate of the mixed gas from the plurality of gas supply units according to the output flow value and the output pressure value;
wherein the gas pressure stabilizer comprises a gas pressure gauge and a pressure controller, the gas pressure gauge is used for monitoring the pressure value of the mixed gas, and the pressure controller is used for controlling the pressure value of the mixed gas; the pressure controller is communicatively connected to the gas gauge; when the flow rate of the mixed gas from the plurality of gas supply units changes and the gas pressure gauge monitors that the pressure value of the mixed gas from the plurality of gas supply units exceeds the preset pressure range, the pressure controller receives a first regulating signal from the gas pressure gauge, and the pressure controller starts to act according to the first regulating signal to enable the pressure value of the mixed gas to return to the preset pressure range.
2. The gas mixing output system of claim 1, comprising a gas mixing device in communication with the plurality of gas supply units for mixing the plurality of gases into the mixed gas.
3. The gas mixing output system of claim 2, wherein the gas pressure stabilizer is disposed between and in communication with the gas mixing device and the gas buffer unit.
4. The gas mixing output system of claim 2, wherein the gas regulator is disposed between and in communication with the gas supply units and the gas mixing device.
5. The gas mixing output system according to claim 1, wherein when the flow rate of the mixed gas in the plurality of gas supply units increases, the opening degree of the pressure controller increases accordingly, so that the pressure difference of the mixed gas on the primary side and the secondary side of the plurality of gas supply units is maintained within a predetermined range; when the flow rate of the mixed gas in the plurality of gas supply units becomes smaller, the opening degree of the pressure controller is reduced accordingly, so that the pressure difference of the mixed gas on the primary side and the secondary side of the plurality of gas supply units is kept within the predetermined range.
6. The gas mixing output system of claim 1, wherein the gas buffer unit is communicatively connected to the plurality of gas supply units, and when the output pressure value of the mixed gas output by the gas buffer unit is greater than or less than an output preset value, the gas buffer unit transmits a second control signal to at least one of the plurality of gas supply units, so that the at least one of the plurality of gas supply units controls the output flow rate of the at least one of the plurality of gases according to the second control signal.
7. The gas mixing output system of claim 1, wherein when the flow rate of the mixed gas from the plurality of gas supply units changes and the gas pressure gauge monitors that the pressure value of the mixed gas from the plurality of gas supply units exceeds the preset pressure range, the pressure controller and the gas pressure gauge loop back and adjust the pressure value of the mixed gas until the pressure value of the mixed gas returns and is maintained within the preset pressure range.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921900011.XU CN211260360U (en) | 2019-11-06 | 2019-11-06 | Gas mixing output system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921900011.XU CN211260360U (en) | 2019-11-06 | 2019-11-06 | Gas mixing output system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211260360U true CN211260360U (en) | 2020-08-14 |
Family
ID=71988139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921900011.XU Active CN211260360U (en) | 2019-11-06 | 2019-11-06 | Gas mixing output system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211260360U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114686852A (en) * | 2020-12-28 | 2022-07-01 | 江苏菲沃泰纳米科技股份有限公司 | Coating system, feeding device and method |
| CN116926504A (en) * | 2023-09-19 | 2023-10-24 | 上海星原驰半导体有限公司 | Precursor output device and atomic layer deposition equipment |
-
2019
- 2019-11-06 CN CN201921900011.XU patent/CN211260360U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114686852A (en) * | 2020-12-28 | 2022-07-01 | 江苏菲沃泰纳米科技股份有限公司 | Coating system, feeding device and method |
| CN116926504A (en) * | 2023-09-19 | 2023-10-24 | 上海星原驰半导体有限公司 | Precursor output device and atomic layer deposition equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN211260360U (en) | Gas mixing output system | |
| US3841344A (en) | Gas mixing systems | |
| CN101479682B (en) | Flow controller delivery of a specified quantity of a fluid | |
| US20190354122A1 (en) | Dynamic gas blending system and process for producing mixtures with minimal variation within tolerance limits and increased gas utilization | |
| US4958658A (en) | Mass flow stabilized | |
| US20170043359A1 (en) | Method for fluid pressure control in a closed system | |
| CN112780947A (en) | Gas mixing output system and method | |
| US8381756B2 (en) | Method for supplying gas | |
| CN103115041B (en) | Hydraulic pressure automatic control device | |
| TWM593285U (en) | Gas mixing output system | |
| US8028726B2 (en) | Automatic venting of refillable bulk liquid canisters | |
| CN204176335U (en) | Compressed oxygen pipeline network regulation device in empty point | |
| JP2006272212A (en) | Paint flow rate controlling system in multi-gun painting | |
| US3856486A (en) | Pneumatic pressure control system | |
| JP2023528067A (en) | Plant and method for delivering gas mixtures | |
| CN103851246A (en) | Multivalve cascade regulating method and regulating system | |
| JP5722186B2 (en) | Liquefied gas supply method | |
| JP2009301257A (en) | Control system for pressure regulator of multiple line | |
| CN211586058U (en) | Mixed gas preparation device | |
| RU2176100C1 (en) | Method controlling flow rate and pressure of gas delivered to users | |
| CN204533691U (en) | Security monitoring gas pressure regulator, governor | |
| CN204629100U (en) | Security monitoring gas pressure regulator, governor | |
| JP5968836B2 (en) | Gas supply system and method for controlling gas supply system | |
| US20170336157A1 (en) | Coolant distribution system | |
| CN114234047A (en) | Nitrogen pressure-stabilizing energy-saving system and method for liquid nitrogen storage tank |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |