TWM593285U - Gas mixing output system - Google Patents

Gas mixing output system Download PDF

Info

Publication number
TWM593285U
TWM593285U TW108213572U TW108213572U TWM593285U TW M593285 U TWM593285 U TW M593285U TW 108213572 U TW108213572 U TW 108213572U TW 108213572 U TW108213572 U TW 108213572U TW M593285 U TWM593285 U TW M593285U
Authority
TW
Taiwan
Prior art keywords
gas
pressure
mixed
supply units
mixed gas
Prior art date
Application number
TW108213572U
Other languages
Chinese (zh)
Inventor
簡士堡
李仁捷
陳煖妮
Original Assignee
信紘科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信紘科技股份有限公司 filed Critical 信紘科技股份有限公司
Priority to TW108213572U priority Critical patent/TWM593285U/en
Publication of TWM593285U publication Critical patent/TWM593285U/en

Links

Images

Landscapes

  • Accessories For Mixers (AREA)

Abstract

一種氣體混合輸出系統包括供應複數種氣體的複數個氣體供應單元、氣體穩壓裝置及氣體緩衝單元，其中氣體供應單元用以供應複數種氣體，且混合成混合氣體；氣體穩壓裝置連通於該些氣體供應單元，且調控混合氣體於預設壓力範圍；氣體緩衝單元連通於氣體穩壓裝置，且回授混合氣體的輸出流量值及輸出壓力值至氣體供應單元，使氣體供應單元調節來自氣體供應單元的混合氣體的流量；氣體穩壓裝置監測混合氣體的壓力值；當混合氣體的壓力值超出預設壓力範圍時，氣體穩壓裝置開始作動，使混合氣體的壓力值回歸預設壓力範圍。A gas mixing output system includes a plurality of gas supply units supplying a plurality of gases, a gas stabilizing device and a gas buffer unit, wherein the gas supply unit is used to supply a plurality of gases and mixed into a mixed gas; the gas stabilizing device is connected to the Some gas supply units, and regulate the mixed gas within a preset pressure range; the gas buffer unit communicates with the gas pressure stabilizing device, and feedbacks the output flow value and output pressure value of the mixed gas to the gas supply unit, so that the gas supply unit adjusts the gas from The flow rate of the mixed gas in the supply unit; the gas pressure regulator monitors the pressure value of the mixed gas; when the pressure value of the mixed gas exceeds the preset pressure range, the gas pressure regulator starts to operate, so that the mixed gas pressure value returns to the preset pressure range .

Description

氣體混合輸出系統Gas mixing output system

本創作係與氣體混合系統有關；特別是指一種氣體混合輸出系統。This creation is related to the gas mixing system; in particular, it refers to a gas mixing output system.

在高科技領域中，需要利用濃度穩定的混合氣體，用以製造高科技產品零部件(例如，半導體晶片、顯示裝置、觸控面板等)。這類濃度穩定的混合氣體通常係以固定壓力及固定流量的方式供應至上述高科技產品零部件的製造機台。In the high-tech field, it is necessary to use a mixed gas with stable concentration to manufacture high-tech product parts (for example, semiconductor chips, display devices, touch panels, etc.). This kind of gas mixture with stable concentration is usually supplied to the above-mentioned high-tech product parts manufacturing machine with a fixed pressure and a fixed flow rate.

舉例來說，半導體製程針對混合氣體的濃度精度有嚴苛要求，混合氣體的濃度精度需達設定值±0.0N%才能符合標準。以4%H 2/96%N 2為例，混合氣體的濃度精度需符合4%±0.12%混合精度，方能供應予半導體製程使用。 For example, the semiconductor process has strict requirements on the concentration accuracy of the mixed gas. The concentration accuracy of the mixed gas needs to reach the set value ±0.0N% to meet the standard. Taking 4%H 2 /96%N 2 as an example, the concentration accuracy of the mixed gas must meet the 4%±0.12% mixing accuracy before it can be used in the semiconductor manufacturing process.

一般而言，氣體混合系統係利用質量流量控制器(MFC)控制純氣體的輸出流量及壓力；然而，由於MFC的機械結構限制，其一次側及二次側的壓力差 值必須於15-20psi，方能穩定氣體的質量流量控制，因此傳統的氣體混合系統必須設一混合下限流量，以確保MFC準確控制氣體流量。傳統的氣體混合系統可於300 LPM以下進行氣體混合，其在氣體混合槽的下游處設置有開度固定或半固定式裝置，如背壓閥或限流孔，以維持MFC一次側及二次側的壓力差值 。然而，當設備氣體流量提升且使用過程中流量變化極大50~1000 LPM時，這類傳統的氣體混合系統無法提供穩定混合氣體的濃度精度，即若所需的混合氣體的流量大幅度地變動時，則超出傳統的氣體混合系統的固定開度之背壓閥的調控能力範圍，以致混合氣體的濃度精度等相關參數失衡，無法符合上述製造機台的使用需求。Generally speaking, the gas mixing system uses a mass flow controller (MFC) to control the output flow and pressure of pure gas; however, due to the mechanical structure of MFC, the pressure difference between the primary and secondary sides must be within 15-20psi In order to stabilize the mass flow control of the gas, the traditional gas mixing system must set a lower mixing limit to ensure that the MFC accurately controls the gas flow. The traditional gas mixing system can perform gas mixing below 300 LPM. It is equipped with a fixed or semi-fixed device downstream of the gas mixing tank, such as a back pressure valve or a restrictor orifice, to maintain the MFC primary side and secondary Pressure difference on the side. However, when the gas flow rate of the equipment is increased and the flow rate changes greatly during use, such conventional gas mixing systems cannot provide a stable concentration accuracy of the mixed gas, that is, if the required mixed gas flow rate changes greatly , It is beyond the control capability of the back pressure valve with a fixed opening of the traditional gas mixing system, so that the concentration accuracy of the mixed gas and other related parameters are out of balance, which cannot meet the use requirements of the above-mentioned manufacturing machine.

綜上可知，現有的氣體混合輸出系統及方法仍有待改良，以改善傳統氣體混合輸出系統及方法所存在的諸多問題。In summary, the existing gas mixing output system and method still need to be improved to improve many problems in the traditional gas mixing output system and method.

有鑑於此，本創作之目的在於提供一種氣體混合輸出系統及方法，其利用氣體穩壓裝置依據所需的混合氣體的流量調整氣體穩壓裝置的開度，以維持氣體供應單元於一次側及二次側的壓力差值位於一預設範圍內，確保氣體供應單元正常運作，準確控制氣體的濃度及流量，進而維持混合氣體的濃度精度。In view of this, the purpose of this creation is to provide a gas mixing output system and method that uses a gas stabilizing device to adjust the opening of the gas stabilizing device according to the required flow rate of the mixed gas to maintain the gas supply unit on the primary side and The pressure difference on the secondary side is within a preset range to ensure the normal operation of the gas supply unit, accurately control the gas concentration and flow rate, and maintain the concentration accuracy of the mixed gas.

緣以達成上述目的，本創作提供的一種氣體混合輸出系統包括複數個氣體供應單元、一氣體穩壓裝置以及一氣體緩衝單元；該些氣體供應單元用以供應複數種氣體，且該些氣體係混合成一混合氣體；該氣體穩壓裝置連通於該些氣體供應單元，用以調控該混合氣體於一預設壓力範圍；該氣體緩衝單元連通於該氣體穩壓裝置，用以回授該混合氣體的一輸出流量值及一輸出壓力值至該些氣體供應單元，使該些氣體供應單元依據該輸出流量值及該輸出壓力值調節來自該些氣體供應單元的該混合氣體的流量；其中，該氣體穩壓裝置包括一氣體壓力計及一壓力控制器，該氣體壓力計係用以監測該混合氣體的壓力值，且該壓力控制器係用以控制該混合氣體的壓力值；該壓力控制器係訊號連接於該氣體壓力計；當來自該些氣體供應單元的該混合氣體的流量產生變化，且該氣體壓力計監測來自該些氣體供應單元的該混合氣體的壓力值超出該預設壓力範圍時，該壓力控制器由該氣體壓力計接收一第一調控訊號，且該壓力控制器根據該第一調控訊號開始作動，使該混合氣體的壓力值回歸該預設壓力範圍。In order to achieve the above purpose, a gas mixing output system provided by the author includes a plurality of gas supply units, a gas stabilizing device and a gas buffer unit; the gas supply units are used to supply a plurality of gases, and the gas systems Mixed into a mixed gas; the gas stabilizing device is connected to the gas supply units for regulating the mixed gas within a preset pressure range; the gas buffer unit is connected to the gas stabilizing device for feeding back the mixed gas An output flow value and an output pressure value to the gas supply units, so that the gas supply units adjust the flow rate of the mixed gas from the gas supply units according to the output flow value and the output pressure value; wherein, the The gas pressure stabilizing device includes a gas pressure gauge and a pressure controller, the gas pressure gauge is used to monitor the pressure value of the mixed gas, and the pressure controller is used to control the pressure value of the mixed gas; the pressure controller The signal is connected to the gas pressure gauge; when the flow rate of the mixed gas from the gas supply units changes, and the gas pressure gauge monitors the pressure value of the mixed gas from the gas supply units beyond the preset pressure range At this time, the pressure controller receives a first control signal from the gas pressure gauge, and the pressure controller starts to act according to the first control signal to return the pressure value of the mixed gas to the preset pressure range.

本創作的另一目的係提供一種氣體混合輸出方法，其包括至少以下步驟： 提供複數種氣體； 混合該些氣體成一混合氣體； 利用一氣體穩壓裝置，調控該混合氣體於一預設壓力範圍，該氣體穩壓裝置連通於該些氣體供應單元；以及 利用一氣體緩衝單元，回授該混合氣體的一輸出流量值及一輸出壓力值至該些氣體供應單元，使該些氣體供應單元依據該輸出流量值及該輸出壓力值調節來自該些氣體供應單元的該混合氣體的流量，該氣體緩衝單元連通於該氣體穩壓裝置； 其中，該氣體穩壓裝置包括一氣體壓力計及一壓力控制器，該氣體壓力計係用以監測該混合氣體的壓力值，且該壓力控制器係用以控制該混合氣體的壓力值；該壓力控制器係訊號連接於該氣體壓力計；當來自該些氣體供應單元的該混合氣體的流量產生變化，且該氣體壓力計監測來自該些氣體供應單元的該混合氣體的壓力值超出該預設壓力範圍時，該壓力控制器由該氣體壓力計接收一第一調控訊號，且該壓力控制器根據該第一調控訊號開始作動，使該混合氣體的壓力值回歸該預設壓力範圍。 Another purpose of this creation is to provide a gas mixing output method, which includes at least the following steps: Provide multiple gases; Mixing the gases into a mixed gas; Using a gas stabilizing device to regulate the mixed gas within a preset pressure range, the gas stabilizing device communicates with the gas supply units; and A gas buffer unit is used to feedback an output flow value and an output pressure value of the mixed gas to the gas supply units, so that the gas supply units adjust the gas supply from the gas supply according to the output flow value and the output pressure value The flow rate of the mixed gas of the unit, the gas buffer unit is connected to the gas voltage stabilizing device; Wherein, the gas pressure stabilizing device includes a gas pressure gauge and a pressure controller, the gas pressure gauge is used to monitor the pressure value of the mixed gas, and the pressure controller is used to control the pressure value of the mixed gas; The pressure controller signal is connected to the gas pressure gauge; when the flow rate of the mixed gas from the gas supply units changes, and the gas pressure gauge monitors the pressure value of the mixed gas from the gas supply units exceeds the pre- When setting the pressure range, the pressure controller receives a first control signal from the gas pressure gauge, and the pressure controller starts to act according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range.

本創作之效果在於，利用氣體穩壓裝置依據所需的混合氣體的流量調整氣體穩壓裝置的開度，以維持氣體供應單元於一次側及二次側的壓力差值位於一預設範圍內，確保氣體供應單元正常運作，準確控制氣體的濃度及流量，進而維持混合氣體的濃度精度。The effect of this creation is to use the gas regulator to adjust the opening of the gas regulator according to the required flow of the mixed gas to maintain the pressure difference between the primary and secondary sides of the gas supply unit within a preset range To ensure the normal operation of the gas supply unit, accurately control the gas concentration and flow rate, and maintain the concentration accuracy of the mixed gas.

為能更清楚地說明本創作，茲舉一較佳實施例並配合圖式詳細說明如後。請參圖１所示，圖１為本創作一較佳實施例的氣體混合輸出系統1的示意圖，其中氣體混合輸出系統1僅以第一氣體及第二氣體為例說明，但不以此為限制；實務上，本創作所提供的氣體混合輸出系統1可用於混合複數種氣體，以形成混合氣體。在圖１中，氣體混合輸出系統1包括複數個氣體供應單元、氣體混合裝置30、氣體穩壓裝置40及氣體緩衝單元50。In order to explain this creation more clearly, a preferred embodiment is given in detail below with reference to the drawings. Please refer to FIG. 1. FIG. 1 is a schematic diagram of a gas mixing output system 1 of a preferred embodiment. The gas mixing output system 1 is described by taking the first gas and the second gas as examples only, but not as Limitations; in practice, the gas mixing output system 1 provided by this creation can be used to mix a plurality of gases to form a mixed gas. In FIG. 1, the gas mixing output system 1 includes a plurality of gas supply units, a gas mixing device 30, a gas voltage stabilizing device 40 and a gas buffer unit 50.

在本創作實施例中，複數個氣體供應單元用以供應複數種氣體；舉例來說，複數個氣體供應單元包括第一氣體供應單元10及第二氣體供應單元20，其中第一氣體供應單元10供應第一氣體，而第二氣體供應單元20供應第二氣體。In this creative embodiment, a plurality of gas supply units are used to supply a plurality of gases; for example, the plurality of gas supply units include a first gas supply unit 10 and a second gas supply unit 20, wherein the first gas supply unit 10 The first gas is supplied, and the second gas supply unit 20 supplies the second gas.

第一氣體供應單元10包括第一氣體壓力計12及第一氣體質量流量控制器(MFC)14，而第二氣體供應單元20包括第二氣體壓力計22及第二氣體質量流量控制器(MFC)24。在本創作實施例中，第一氣體壓力計12係用以測量第一氣體的氣壓值，而第一氣體質量流量控制器(MFC)14係用以控制第一氣體的流量值。在本創作實施例中，第二氣體壓力計22係用以測量第二氣體的氣壓值，而第二氣體質量流量控制器(MFC)24係用以控制第二氣體的流量值。The first gas supply unit 10 includes a first gas pressure gauge 12 and a first gas mass flow controller (MFC) 14, and the second gas supply unit 20 includes a second gas pressure gauge 22 and a second gas mass flow controller (MFC) )twenty four. In this creative embodiment, the first gas pressure gauge 12 is used to measure the pressure value of the first gas, and the first gas mass flow controller (MFC) 14 is used to control the flow value of the first gas. In this creative embodiment, the second gas pressure gauge 22 is used to measure the gas pressure value of the second gas, and the second gas mass flow controller (MFC) 24 is used to control the flow value of the second gas.

氣體混合裝置30連通於第一氣體供應單元10及第二氣體供應單元20，使第一氣體及第二氣體於氣體混合裝置30內混合成一混合氣體。在本創作實施例中，第一氣體供應單元10的第一氣體質量流量控制器(MFC)14及第二氣體供應單元20的第二氣體質量流量控制器(MFC)24係分別連通於氣體混合裝置30。在本創作實施例中，第一氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b具有第一壓力差值，且第一壓力差值在15-20psi以內時，第一氣體質量流量控制器(MFC)14對於第一氣體具有最佳的流量調控能力；第二氣體在第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b具有第二壓力差值，且第二壓力差值在15-20psi以內時，第二氣體質量流量控制器(MFC)24對於第二氣體具有最佳的流量調控能力。整體來說，當第一壓力差值及第二壓力差值皆在15-20psi以內時，第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24可精確地調控第一氣體及第二氣體的流量及混合氣體的濃度精度。在本創作實施例中，第一氣體在第一氣體質量流量控制器(MFC)14的第一側14a具有壓力值為110 psi，而第二氣體在第二氣體質量流量控制器(MFC)24的第一側24a具有壓力值為110 psi。The gas mixing device 30 communicates with the first gas supply unit 10 and the second gas supply unit 20 so that the first gas and the second gas are mixed into a mixed gas in the gas mixing device 30. In this creative embodiment, the first gas mass flow controller (MFC) 14 of the first gas supply unit 10 and the second gas mass flow controller (MFC) 24 of the second gas supply unit 20 are respectively connected to the gas mixture装置30。 The device 30. In this creative embodiment, the first gas has a first pressure difference on the first side 14a and the second side 14b of the first gas mass flow controller (MFC) 14, and the first pressure difference is within 15-20 psi , The first gas mass flow controller (MFC) 14 has the best flow control capability for the first gas; the second gas is on the first side 24a and the second side 24b of the second gas mass flow controller (MFC) 24 With the second pressure difference, and when the second pressure difference is within 15-20 psi, the second gas mass flow controller (MFC) 24 has the best flow control capability for the second gas. Overall, when the first pressure difference and the second pressure difference are within 15-20 psi, the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 can accurately Regulate the flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas. In this creative embodiment, the first gas has a pressure value of 110 psi on the first side 14a of the first gas mass flow controller (MFC) 14, and the second gas has a second gas mass flow controller (MFC) 24 The first side 24a has a pressure value of 110 psi.

氣體穩壓裝置40連通於氣體混合裝置30，用以調控混合氣體於預設壓力範圍。在本創作實施例中，氣體穩壓裝置40係設置於氣體混合裝置30與氣體緩衝單元50之間，且連通於氣體混合裝置30與氣體緩衝單元50。在本創作另一實施例中，氣體穩壓裝置40係設置於氣體供應單元10、20與氣體混合裝置30之間，且連通於氣體供應單元10、20與氣體混合裝置30。在本創作實施例中，氣體穩壓裝置40包括氣體壓力計42及壓力控制器44，其中氣體壓力計42係用以監測混合氣體的壓力值，而壓力控制器44係用以控制混合氣體的壓力值。在本創作實施例中，壓力控制器44係訊號連接於氣體壓力計42；當氣體壓力計42監測出混合氣體的壓力值超出預設壓力範圍時，氣體壓力計42傳遞第一調控訊號至壓力控制器44，且壓力控制器44根據第一調控訊號開始作動，使混合氣體的壓力值回歸預設壓力範圍。在本創作實施例中，當來自氣體供應單元10、20的混合氣體的流量產生變化，且氣體壓力計42監測來自氣體供應單元10、20的混合氣體的壓力值超出預設壓力範圍(例如90~95 psi)時，壓力控制器44與氣體壓力計42循環回授且調節混合氣體的壓力值，直到混合氣體的壓力值回歸且維持在該預設壓力範圍。The gas stabilizing device 40 is connected to the gas mixing device 30 for regulating the mixed gas within a preset pressure range. In this creative embodiment, the gas pressure stabilizing device 40 is disposed between the gas mixing device 30 and the gas buffer unit 50 and communicates with the gas mixing device 30 and the gas buffer unit 50. In another embodiment of the present invention, the gas pressure stabilizing device 40 is disposed between the gas supply units 10, 20 and the gas mixing device 30, and communicates with the gas supply unit 10, 20 and the gas mixing device 30. In this creative embodiment, the gas pressure stabilizing device 40 includes a gas pressure gauge 42 and a pressure controller 44, wherein the gas pressure gauge 42 is used to monitor the pressure value of the mixed gas, and the pressure controller 44 is used to control the mixed gas Pressure value. In this creative embodiment, the pressure controller 44 is connected to the gas pressure gauge 42; when the gas pressure gauge 42 detects that the pressure of the mixed gas exceeds the preset pressure range, the gas pressure gauge 42 transmits the first control signal to the pressure The controller 44 and the pressure controller 44 start to operate according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range. In this creative embodiment, when the flow rate of the mixed gas from the gas supply unit 10, 20 changes, and the gas pressure gauge 42 monitors the mixed gas from the gas supply unit 10, 20, the pressure value exceeds the preset pressure range (such as 90 ~95 psi), the pressure controller 44 and the gas pressure gauge 42 loop back and adjust the mixed gas pressure value until the mixed gas pressure value returns and maintains within the preset pressure range.

在本創作實施例中，當混合氣體在氣體供應單元10、20的流量變大時，壓力控制器44的開度隨之變大，使混合氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b、第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b的壓力差值保持在預定範圍內(例如：預定範圍為15-20psi)。當混合氣體在氣體供應單元10、20的流量變小時，壓力控制器44的開度隨之變小，使混合氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b、第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b的壓力差值保持在預定範圍(例如：預定範圍為15-20psi)內。舉例來說，假設混合氣體的預設壓力範圍為90~95 psi，當氣體壓力計42監測出混合氣體的壓力值超出90~95psi時，則氣體壓力計42傳遞第一調控訊號至壓力控制器44，且壓力控制器44根據第一調控訊號開始作動，使混合氣體的壓力值回到90~95psi。在本創作實施例中，氣體穩壓裝置40可調控混合氣體的壓力值，使第一氣體在第一氣體質量流量控制器(MFC)14的第一壓力差值在15-20psi內，且第二氣體在第二氣體質量流量控制器(MFC)24的第二壓力差值在15-20psi內。In this creative embodiment, when the flow rate of the mixed gas in the gas supply units 10 and 20 becomes larger, the opening degree of the pressure controller 44 also becomes larger, so that the mixed gas is in the first gas mass flow controller (MFC) 14 The pressure difference between the first side 14a and the second side 14b and the first side 24a and the second side 24b of the second gas mass flow controller (MFC) 24 is kept within a predetermined range (for example: the predetermined range is 15-20psi ). When the flow rate of the mixed gas in the gas supply units 10 and 20 becomes smaller, the opening degree of the pressure controller 44 becomes smaller, so that the mixed gas is on the first side 14a and the second side of the first gas mass flow controller (MFC) 14 The pressure difference between the side 14b, the first side 24a and the second side 24b of the second gas mass flow controller (MFC) 24 is maintained within a predetermined range (eg, the predetermined range is 15-20 psi). For example, assuming that the preset pressure range of the mixed gas is 90~95 psi, when the gas pressure gauge 42 detects that the pressure value of the mixed gas exceeds 90~95 psi, the gas pressure gauge 42 transmits the first control signal to the pressure controller 44 and the pressure controller 44 starts to operate according to the first control signal, so that the pressure value of the mixed gas returns to 90~95 psi. In this creative embodiment, the gas pressure stabilizing device 40 can adjust the pressure value of the mixed gas so that the first pressure difference of the first gas at the first gas mass flow controller (MFC) 14 is within 15-20 psi, and the The second pressure difference of the two gases at the second gas mass flow controller (MFC) 24 is within 15-20 psi.

另一方面，當混合氣體的流量變大時，氣體穩壓裝置40會自動擴大開度，避免混合氣體的氣壓值累積在第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24二次側的位置。反之，當混合氣體的流量變小時，氣體穩壓裝置40會自動縮小開度，以維持第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24二次側的氣體的壓力值為90~95psi，使第一壓力差值及第二壓力差值保持在15-20psi，進而使第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24能準確地控制第一氣體及第二氣體的流量及混合氣體的濃度精度。在本創作實施例中，壓力控制器44包括質量流量控制器(MFC)、自動背壓調控器(BPR)或壓力控制閥(PCV)。On the other hand, when the flow rate of the mixed gas becomes larger, the gas pressure stabilizing device 40 will automatically expand the opening degree to prevent the gas pressure value of the mixed gas from accumulating in the first gas mass flow controller (MFC) 14 and the second gas mass flow control (MFC) 24 secondary side position. Conversely, when the flow rate of the mixed gas becomes smaller, the gas regulator 40 will automatically reduce the opening degree to maintain the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 on the secondary side. The gas pressure value is 90~95psi, so that the first pressure difference and the second pressure difference are maintained at 15-20psi, and then the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) )24 can accurately control the flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas. In the present authoring embodiment, the pressure controller 44 includes a mass flow controller (MFC), an automatic back pressure regulator (BPR), or a pressure control valve (PCV).

氣體緩衝單元50連通於氣體穩壓裝置40，用以調控混合氣體的輸出流量值及輸出壓力值。氣體緩衝單元50訊號連接至第一氣體供應單元10及第二氣體供應單元20；當氣體緩衝單元50輸出的混合氣體的輸出壓力值大於或小於一輸出預設值時，氣體緩衝單元50傳遞第二調控訊號至第一氣體供應單元10及第二氣體供應單元20中之至少一者，第一氣體供應單元10及第二氣體供應單元20中之至少一者根據第二調控訊號調控第一氣體及第二氣體中之至少一者的輸出流量。在本創作實施例中，氣體緩衝單元50具有氣體壓力計52，用以量測氣體緩衝單元50內的混合氣體壓力值。The gas buffer unit 50 communicates with the gas voltage stabilizing device 40 for regulating the output flow value and output pressure value of the mixed gas. The signal of the gas buffer unit 50 is connected to the first gas supply unit 10 and the second gas supply unit 20; when the output pressure value of the mixed gas output by the gas buffer unit 50 is greater than or less than an output preset value, the gas buffer unit 50 transmits the Two control signals to at least one of the first gas supply unit 10 and the second gas supply unit 20, at least one of the first gas supply unit 10 and the second gas supply unit 20 controls the first gas according to the second control signal And the output flow rate of at least one of the second gases. In this creative embodiment, the gas buffer unit 50 has a gas pressure gauge 52 for measuring the pressure value of the mixed gas in the gas buffer unit 50.

詳言之，第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量係依據氣體緩衝單元50內氣體壓力的變化作為控制條件。當氣體緩衝單元50內氣體的壓力產生變化時，氣體緩衝單元50發送訊號至一自動控制器(未繪示)，再藉由自動控制器下指令，以自動調整第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量。舉例來說，藉由上述操作方法，可使氣體緩衝單元50之混合氣體壓力值維持在 75~85 psi 內。在本創作實施例中，若氣體緩衝單元50之混合氣體壓力值小於設定值 (如80 psi) ，則第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量增加；反之，若氣體緩衝單元50之混合氣體壓力值大於設定值 (如80 psi) ，則第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量減少。在本創作實施例中，氣體緩衝單元50係連通於製造機台M，以提供預定濃度及預定流量的混合氣體至製造機台M；製造機台M例如可為半導體製造機台。In detail, the flow of the first gas and the second gas of the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 is based on the change of the gas pressure 力 in the gas buffer unit 50 as a control condition. When the pressure 力 of the gas buffer unit 50 changes, the gas buffer unit 50 sends a signal to an automatic controller (not shown), and then commands the automatic controller to automatically adjust the first gas mass flow controller ( MFC) 14 and the second gas mass flow controller (MFC) 24 flow of the first gas and the second gas 量. For example, through the above operation method, the mixed gas pressure 力 value of the gas buffer unit 50 can be maintained within 75~85 psi. In this creative embodiment, if the mixed gas pressure value of the gas buffer unit 50 is less than the set value (such as 80 psi), the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 The flow of the first gas and the second gas increases; conversely, if the mixed gas pressure value of the gas buffer unit 50 is greater than the set value (such as 80 psi), the first gas mass flow controller (MFC) 14 and the second gas mass The flow of the first gas and the second gas of the flow controller (MFC) 24 decreases. In this creative embodiment, the gas buffer unit 50 is connected to the manufacturing machine M to provide a mixed gas with a predetermined concentration and a predetermined flow rate to the manufacturing machine M; the manufacturing machine M may be, for example, a semiconductor manufacturing machine.

請參考圖２，圖２為本創作一較佳實施例的氣體混合輸出方法的流程圖。本創作實施例所提供的氣體混合輸出方法，至少包括以下步驟： 步驟S02，提供複數種氣體； 步驟S04，混合該些氣體成混合氣體； 步驟S06，利用氣體穩壓裝置40，調控混合氣體於預設壓力範圍，； 步驟S08，利用氣體緩衝單元50，回授混合氣體的輸出流量值及輸出壓力值至供應該些氣體的複數個氣體供應單元10、20，使該些氣體供應單元10、20依據輸出流量值及輸出壓力值調節來自氣體供應單元10、20的混合氣體的流量。在本創作實施例中，氣體緩衝單元50連通於氣體穩壓裝置40。 Please refer to FIG. 2, which is a flowchart of creating a gas mixing output method according to a preferred embodiment. The gas mixing output method provided in this creative embodiment includes at least the following steps: Step S02, providing a plurality of gases; Step S04, mixing the gases into a mixed gas; Step S06, using the gas stabilizing device 40 to adjust the mixed gas within a preset pressure range, In step S08, using the gas buffer unit 50, the output flow value and output pressure value of the mixed gas are fed back to the plurality of gas supply units 10, 20 supplying the gases, so that the gas supply units 10, 20 are based on the output flow value and The output pressure value regulates the flow rate of the mixed gas from the gas supply units 10, 20. In this creative embodiment, the gas buffer unit 50 communicates with the gas voltage stabilizing device 40.

在本創作實施例中，氣體穩壓裝置40包括氣體壓力計42及壓力控制器44，氣體壓力計42係用以監測混合氣體的壓力值，且壓力控制器44係用以控制混合氣體的壓力值。壓力控制器44係訊號連接於氣體壓力計42。當來自氣體供應單元10、20的混合氣體的流量產生變化，且該氣體壓力計42監測來自氣體供應單元10、20的混合氣體的壓力值超出該預設壓力範圍時，壓力控制器44由氣體壓力計42接收第一調控訊號，且壓力控制器44根據第一調控訊號開始作動，使混合氣體的壓力值回歸預設壓力範圍。在本創作實施例中，氣體壓力計42可發出第一調控訊號，且直接傳遞至壓力控制器44；在實務上，氣體壓力計42可發出一數值監測訊號至一可程式化邏輯控制器(Programmable Logic Controller, PLC)(圖未繪示)，再由可程式化邏輯控制器發出第一調控訊號至壓力控制器44。In this creative embodiment, the gas pressure stabilizing device 40 includes a gas pressure gauge 42 and a pressure controller 44, the gas pressure gauge 42 is used to monitor the pressure value of the mixed gas, and the pressure controller 44 is used to control the pressure of the mixed gas value. The pressure controller 44 is a signal connected to the gas pressure gauge 42. When the flow rate of the mixed gas from the gas supply unit 10, 20 changes, and the gas pressure gauge 42 monitors the pressure value of the mixed gas from the gas supply unit 10, 20 exceeds the preset pressure range, the pressure controller 44 The pressure gauge 42 receives the first control signal, and the pressure controller 44 starts to operate according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range. In this creative embodiment, the gas pressure gauge 42 can send a first control signal and directly transmit it to the pressure controller 44; in practice, the gas pressure gauge 42 can send a numerical monitoring signal to a programmable logic controller ( Programmable Logic Controller (PLC) (not shown), and then the programmable logic controller sends a first control signal to the pressure controller 44.

在本創作實施例中，複數種氣體係分別由複數個氣體供應單元提供；舉例來說，複數個氣體供應單元包括第一氣體供應單元10及第二氣體供應單元20，其中第一氣體供應單元10供應第一氣體，而第二氣體供應單元20供應第二氣體。In this creative embodiment, a plurality of gas systems are provided by a plurality of gas supply units; for example, the plurality of gas supply units include a first gas supply unit 10 and a second gas supply unit 20, wherein the first gas supply unit 10 supplies the first gas, and the second gas supply unit 20 supplies the second gas.

第一氣體供應單元10包括第一氣體壓力計12及第一氣體質量流量控制器(MFC)14，而第二氣體供應單元20包括第二氣體壓力計22及第二氣體質量流量控制器(MFC)24。在本創作實施例中，第一氣體壓力計12係用以測量第一氣體的氣壓值，而第一氣體質量流量控制器(MFC)14係用以控制第一氣體的流量值。在本創作實施例中，第二氣體壓力計22係用以測量第二氣體的氣壓值，而第二氣體質量流量控制器(MFC)24係用以控制第二氣體的流量值。The first gas supply unit 10 includes a first gas pressure gauge 12 and a first gas mass flow controller (MFC) 14, and the second gas supply unit 20 includes a second gas pressure gauge 22 and a second gas mass flow controller (MFC) )twenty four. In this creative embodiment, the first gas pressure gauge 12 is used to measure the pressure value of the first gas, and the first gas mass flow controller (MFC) 14 is used to control the flow value of the first gas. In this creative embodiment, the second gas pressure gauge 22 is used to measure the gas pressure value of the second gas, and the second gas mass flow controller (MFC) 24 is used to control the flow value of the second gas.

氣體混合裝置30連通於第一氣體供應單元10及第二氣體供應單元20，使第一氣體及第二氣體於氣體混合裝置30內混合成一混合氣體。在本創作實施例中，第一氣體供應單元10的第一氣體質量流量控制器(MFC)14及第二氣體供應單元20的第二氣體質量流量控制器(MFC)24係分別連通於氣體混合裝置30。在本創作實施例中，第一氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b具有第一壓力差值，且第一壓力差值在15-20 psi以內時，第一氣體質量流量控制器(MFC)14對於第一氣體具有最佳的流量調控能力；第二氣體在第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b具有第二壓力差值，且第二壓力差值在15-20 psi以內時，第二氣體質量流量控制器(MFC)24對於第二氣體具有最佳的流量調控能力。整體來說，當第一壓力差值及第二壓力差值皆在15-20 psi以內時，第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24可精確地調控第一氣體及第二氣體的流量及混合氣體的濃度精度。在本創作實施例中，第一氣體在第一氣體質量流量控制器(MFC)14的第一側14a具有壓力值為110 psi，而第二氣體在第二氣體質量流量控制器(MFC)24的第一側24a具有壓力值為110 psi。The gas mixing device 30 communicates with the first gas supply unit 10 and the second gas supply unit 20 so that the first gas and the second gas are mixed into a mixed gas in the gas mixing device 30. In this creative embodiment, the first gas mass flow controller (MFC) 14 of the first gas supply unit 10 and the second gas mass flow controller (MFC) 24 of the second gas supply unit 20 are respectively connected to the gas mixture装置30。 The device 30. In this creative embodiment, the first gas has a first pressure difference on the first side 14a and the second side 14b of the first gas mass flow controller (MFC) 14, and the first pressure difference is between 15-20 psi When within, the first gas mass flow controller (MFC) 14 has the best flow control capability for the first gas; the second gas is on the first side 24a and the second side of the second gas mass flow controller (MFC) 24 24b has a second pressure difference, and when the second pressure difference is within 15-20 psi, the second gas mass flow controller (MFC) 24 has the best flow control capability for the second gas. Overall, when the first pressure difference and the second pressure difference are within 15-20 psi, the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 can be accurate The flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas are regulated. In this creative embodiment, the first gas has a pressure value of 110 psi on the first side 14a of the first gas mass flow controller (MFC) 14, and the second gas has a second gas mass flow controller (MFC) 24 The first side 24a has a pressure value of 110 psi.

氣體穩壓裝置40連通於氣體混合裝置30，用以調控混合氣體於預設壓力範圍。在本創作實施例中，氣體穩壓裝置40係設置於氣體混合裝置30與氣體緩衝單元50之間，且連通於氣體混合裝置30與氣體緩衝單元50。在本創作另一實施例中，氣體穩壓裝置40係設置於氣體供應單元10、20與氣體混合裝置30之間，且連通於氣體供應單元10、20與氣體混合裝置30。在本創作實施例中，氣體穩壓裝置40包括氣體壓力計42及壓力控制器44，其中氣體壓力計42係用以監測混合氣體的壓力值，而壓力控制器44係用以控制混合氣體的壓力值。在本創作實施例中，壓力控制器44係訊號連接於氣體壓力計42；當氣體壓力計42監測出混合氣體的壓力值超出預設壓力範圍時，氣體壓力計42傳遞第一調控訊號至壓力控制器44，且壓力控制器44根據第一調控訊號開始作動，使混合氣體的壓力值回歸預設壓力範圍。The gas stabilizing device 40 is connected to the gas mixing device 30 for regulating the mixed gas within a preset pressure range. In this creative embodiment, the gas pressure stabilizing device 40 is disposed between the gas mixing device 30 and the gas buffer unit 50 and communicates with the gas mixing device 30 and the gas buffer unit 50. In another embodiment of the present invention, the gas pressure stabilizing device 40 is disposed between the gas supply units 10, 20 and the gas mixing device 30, and communicates with the gas supply unit 10, 20 and the gas mixing device 30. In this creative embodiment, the gas pressure stabilizing device 40 includes a gas pressure gauge 42 and a pressure controller 44, wherein the gas pressure gauge 42 is used to monitor the pressure value of the mixed gas, and the pressure controller 44 is used to control the mixed gas Pressure value. In this creative embodiment, the pressure controller 44 is connected to the gas pressure gauge 42; when the gas pressure gauge 42 detects that the pressure of the mixed gas exceeds the preset pressure range, the gas pressure gauge 42 transmits the first control signal to the pressure The controller 44 and the pressure controller 44 start to operate according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range.

在本創作實施例中，當混合氣體在氣體供應單元10、20的流量變大時，壓力控制器44的開度隨之變大，使混合氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b、第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b的壓力差值保持在預定範圍內(例如：預定範圍為15-20psi)。當混合氣體在氣體供應單元10、20的流量變小時，壓力控制器44的開度隨之變小，使混合氣體在第一氣體質量流量控制器(MFC)14的第一側14a及第二側14b、第二氣體質量流量控制器(MFC)24的第一側24a及第二側24b的壓力差值保持在預定範圍(例如：預定範圍為15-20psi)內。舉例來說，假設混合氣體的預設壓力範圍為90~95 psi，當氣體壓力計42監測出混合氣體的壓力值超出90~95psi時，則氣體壓力計42傳遞第一調控訊號至壓力控制器44，且壓力控制器44根據第一調控訊號開始作動，使混合氣體的壓力值回到90~95psi。在本創作實施例中，氣體穩壓裝置40可調控混合氣體的壓力值，使第一氣體在第一氣體質量流量控制器(MFC)14的第一壓力差值15-20 psi範圍內，且第二氣體在第二氣體質量流量控制器(MFC)24的第二壓力差值15-20 psi範圍內。In this creative embodiment, when the flow rate of the mixed gas in the gas supply units 10 and 20 becomes larger, the opening degree of the pressure controller 44 also becomes larger, so that the mixed gas is in the first gas mass flow controller (MFC) 14 The pressure difference between the first side 14a and the second side 14b and the first side 24a and the second side 24b of the second gas mass flow controller (MFC) 24 is kept within a predetermined range (for example: the predetermined range is 15-20psi ). When the flow rate of the mixed gas in the gas supply units 10 and 20 becomes smaller, the opening degree of the pressure controller 44 becomes smaller, so that the mixed gas is on the first side 14a and the second side of the first gas mass flow controller (MFC) 14 The pressure difference between the side 14b, the first side 24a and the second side 24b of the second gas mass flow controller (MFC) 24 is maintained within a predetermined range (eg, the predetermined range is 15-20 psi). For example, assuming that the preset pressure range of the mixed gas is 90~95 psi, when the gas pressure gauge 42 detects that the pressure value of the mixed gas exceeds 90~95 psi, the gas pressure gauge 42 transmits the first control signal to the pressure controller 44 and the pressure controller 44 starts to operate according to the first control signal, so that the pressure value of the mixed gas returns to 90~95 psi. In this creative embodiment, the gas pressure stabilizing device 40 can adjust the pressure value of the mixed gas so that the first gas is within the first pressure difference of the first gas mass flow controller (MFC) 14 within a range of 15-20 psi, and The second gas is within the second pressure difference of the second gas mass flow controller (MFC) 24 in the range of 15-20 psi.

另一方面，當混合氣體的流量變大時，氣體穩壓裝置40會自動擴大開度，避免混合氣體的氣壓值累積在第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24二次側的位置。反之，當混合氣體的流量變小時，氣體穩壓裝置40會自動縮小開度，以維持第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24二次側的氣體的壓力值為90~95 psi，使第一壓力差值及第二壓力差值保持在15-20 psi ，進而使第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24能準確地控制第一氣體及第二氣體的流量及混合氣體的濃度精度。在本創作實施例中，壓力控制器44包括質量流量控制器(MFC)、自動背壓調控器(BPR)或壓力控制閥(PCV)。在本創作實施例中，當來自氣體供應單元10、20的混合氣體的流量產生變化，且氣體壓力計42監測來自氣體供應單元10、20的混合氣體的壓力值超出預設壓力範圍(例如90~95 psi)時，壓力控制器44與氣體壓力計42循環回授且調節混合氣體的壓力值，直到混合氣體的壓力值回歸且維持在該預設壓力範圍。On the other hand, when the flow rate of the mixed gas becomes larger, the gas pressure stabilizing device 40 will automatically expand the opening degree to prevent the gas pressure value of the mixed gas from accumulating in the first gas mass flow controller (MFC) 14 and the second gas mass flow control (MFC) 24 secondary side position. Conversely, when the flow rate of the mixed gas becomes smaller, the gas regulator 40 will automatically reduce the opening degree to maintain the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 on the secondary side. The gas pressure value is 90~95 psi, so that the first pressure difference and the second pressure difference are maintained at 15-20 psi, and then the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 can accurately control the flow rate of the first gas and the second gas and the concentration accuracy of the mixed gas. In the present authoring embodiment, the pressure controller 44 includes a mass flow controller (MFC), an automatic back pressure regulator (BPR), or a pressure control valve (PCV). In this creative embodiment, when the flow rate of the mixed gas from the gas supply unit 10, 20 changes, and the gas pressure gauge 42 monitors the mixed gas from the gas supply unit 10, 20, the pressure value exceeds the preset pressure range (such as 90 ~95 psi), the pressure controller 44 and the gas pressure gauge 42 loop back and adjust the mixed gas pressure value until the mixed gas pressure value returns and maintains within the preset pressure range.

氣體緩衝單元50連通於氣體穩壓裝置40，用以調控混合氣體的輸出流量值及輸出壓力值。氣體緩衝單元50訊號連接至第一氣體供應單元10及第二氣體供應單元20；當氣體緩衝單元50輸出的混合氣體的輸出壓力值大於或小於一輸出預設值時，氣體緩衝單元50傳遞第二調控訊號至第一氣體供應單元10及第二氣體供應單元20中之至少一者，第一氣體供應單元10及第二氣體供應單元20中之至少一者根據第二調控訊號調控第一氣體及第二氣體中之至少一者的輸出流量。The gas buffer unit 50 communicates with the gas voltage stabilizing device 40 for regulating the output flow value and output pressure value of the mixed gas. The signal of the gas buffer unit 50 is connected to the first gas supply unit 10 and the second gas supply unit 20; when the output pressure value of the mixed gas output by the gas buffer unit 50 is greater than or less than an output preset value, the gas buffer unit 50 transmits the Two control signals to at least one of the first gas supply unit 10 and the second gas supply unit 20, at least one of the first gas supply unit 10 and the second gas supply unit 20 controls the first gas according to the second control signal And the output flow rate of at least one of the second gases.

詳言之，第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量係依據氣體緩衝單元50內氣體壓力的變化作為控制條件。當氣體緩衝單元50內氣體的壓力產生變化時，氣體緩衝單元50發送訊號至一自動控制器(未繪示)，再藉由自動控制器下指令，以自動調整第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量。舉例來說，藉由上述操作方法，可使氣體緩衝單元50之混合氣體壓力值維持在 75~85 psi 內。在本創作實施例中，若氣體緩衝單元50之混合氣體壓力值小於設定值 (如80 psi) ，則第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量增加；反之，若氣體緩衝單元50之混合氣體壓力值大於設定值 (如80 psi) ，則第一氣體質量流量控制器(MFC)14及第二氣體質量流量控制器(MFC)24之第一氣體及第二氣體的流量減少。在本創作實施例中，氣體緩衝單元50係連通於製造機台M，以提供預定濃度及預定流量的混合氣體至製造機台M；製造機台M例如可為半導體製造機台。In detail, the flow of the first gas and the second gas of the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 is based on the change of the gas pressure 力 in the gas buffer unit 50 as a control condition. When the pressure 力 of the gas buffer unit 50 changes, the gas buffer unit 50 sends a signal to an automatic controller (not shown), and then commands the automatic controller to automatically adjust the first gas mass flow controller ( MFC) 14 and the second gas mass flow controller (MFC) 24 flow of the first gas and the second gas 量. For example, through the above operation method, the mixed gas pressure 力 value of the gas buffer unit 50 can be maintained within 75~85 psi. In this creative embodiment, if the mixed gas pressure value of the gas buffer unit 50 is less than the set value (such as 80 psi), the first gas mass flow controller (MFC) 14 and the second gas mass flow controller (MFC) 24 The flow of the first gas and the second gas increases; conversely, if the mixed gas pressure value of the gas buffer unit 50 is greater than the set value (such as 80 psi), the first gas mass flow controller (MFC) 14 and the second gas mass The flow of the first gas and the second gas of the flow controller (MFC) 24 decreases. In this creative embodiment, the gas buffer unit 50 is connected to the manufacturing machine M to provide a mixed gas with a predetermined concentration and a predetermined flow rate to the manufacturing machine M; the manufacturing machine M may be, for example, a semiconductor manufacturing machine.

藉由本創作實施例的設計，本創作實施例所提供的氣體混合輸出系統及氣體混合輸出方法，其利用氣體穩壓裝置依據所需的混合氣體的流量調整氣體穩壓裝置的開度，以維持氣體供應單元於一次側及二次側的壓力差值位於一預設範圍內，確保氣體供應單元正常運作，準確控制氣體的濃度及流量，進而維持混合氣體的濃度精度。Through the design of the authoring embodiment, the gas mixing output system and the gas mixing output method provided by the authoring embodiment use the gas stabilizing device to adjust the opening of the gas stabilizing device according to the required flow rate of the mixed gas to maintain The pressure difference between the primary and secondary sides of the gas supply unit is within a preset range to ensure the normal operation of the gas supply unit, accurately control the gas concentration and flow rate, and maintain the concentration accuracy of the mixed gas.

以上所述僅為本創作較佳可行實施例而已，舉凡應用本創作說明書及申請專利範圍所為之等效變化，理應包含在本創作之專利範圍內。The above is only the preferred and feasible embodiment of the creation, and any equivalent changes in the application of the specification and the scope of patent application should be included in the scope of the patent of the creation.

1:氣體混合輸出系統 10:第一氣體供應單元 12:第一氣體壓力計 14:第一氣體質量流量控制器(MFC) 14a:第一側 14b:第二側 20:第二氣體供應單元 22:第二氣體壓力計 24:第二氣體質量流量控制器(MFC) 24a:第一側 24b:第二側 30:氣體混合裝置 40:氣體穩壓裝置 42:氣體壓力計 44:壓力控制器 50:氣體緩衝單元 52:氣體壓力計 M:製造機台 S02、S04、S06、S08:步驟1: Gas mixing output system 10: The first gas supply unit 12: The first gas pressure gauge 14: First gas mass flow controller (MFC) 14a: first side 14b: Second side 20: Second gas supply unit 22: Second gas pressure gauge 24: Second gas mass flow controller (MFC) 24a: first side 24b: Second side 30: Gas mixing device 40: Gas regulator 42: Gas pressure gauge 44: Pressure controller 50: gas buffer unit 52: Gas pressure gauge M: Manufacturing machine S02, S04, S06, S08: steps

圖１為本創作一較佳實施例的氣體混合輸出系統的示意圖； 圖２為本創作一較佳實施例的氣體混合輸出方法的流程圖。 1 is a schematic diagram of a gas mixing output system of a preferred embodiment; FIG. 2 is a flowchart of creating a gas mixing output method according to a preferred embodiment.

1:氣體混合輸出系統 1: Gas mixing output system

10:第一氣體供應單元 10: The first gas supply unit

12:第一氣體壓力計 12: The first gas pressure gauge

14:第一氣體質量流量控制器(MFC) 14: First gas mass flow controller (MFC)

14a:第一側 14a: first side

14b:第二側 14b: Second side

20:第二氣體供應單元 20: Second gas supply unit

22:第二氣體壓力計 22: Second gas pressure gauge

24:第二氣體質量流量控制器(MFC) 24: Second gas mass flow controller (MFC)

24a:第一側 24a: first side

24b:第二側 24b: Second side

30:氣體混合裝置 30: Gas mixing device

40:氣體穩壓裝置 40: Gas regulator

42:氣體壓力計 42: Gas pressure gauge

44:壓力控制器 44: Pressure controller

50:氣體緩衝單元 50: gas buffer unit

52:氣體壓力計 52: Gas pressure gauge

M:製造機台 M: Manufacturing machine

Claims (7)

一種氣體混合輸出系統，包括： 複數個氣體供應單元，用以供應複數種氣體，且該些氣體係混合成一混合氣體； 一氣體穩壓裝置，連通於該些氣體供應單元，用以調控該混合氣體於一預設壓力範圍；以及 一氣體緩衝單元，連通於該氣體穩壓裝置，用以回授該混合氣體的一輸出流量值及一輸出壓力值至該些氣體供應單元，使該些氣體供應單元依據該輸出流量值及該輸出壓力值調節來自該些氣體供應單元的該混合氣體的流量； 其中，該氣體穩壓裝置包括一氣體壓力計及一壓力控制器，該氣體壓力計係用以監測該混合氣體的壓力值，且該壓力控制器係用以控制該混合氣體的壓力值；該壓力控制器係訊號連接於該氣體壓力計；當來自該些氣體供應單元的該混合氣體的流量產生變化，且該氣體壓力計監測來自該些氣體供應單元的該混合氣體的壓力值超出該預設壓力範圍時，該壓力控制器由該氣體壓力計接收一第一調控訊號，且該壓力控制器根據該第一調控訊號開始作動，使該混合氣體的壓力值回歸該預設壓力範圍。 A gas mixing output system, including: A plurality of gas supply units for supplying a plurality of gases, and the gas systems are mixed into a mixed gas; A gas pressure stabilizing device connected to the gas supply units for regulating the mixed gas within a preset pressure range; and A gas buffer unit is connected to the gas voltage stabilizing device for feeding back an output flow value and an output pressure value of the mixed gas to the gas supply units, so that the gas supply units are based on the output flow value and the The output pressure value adjusts the flow rate of the mixed gas from the gas supply units; Wherein, the gas pressure stabilizing device includes a gas pressure gauge and a pressure controller, the gas pressure gauge is used to monitor the pressure value of the mixed gas, and the pressure controller is used to control the pressure value of the mixed gas; The pressure controller signal is connected to the gas pressure gauge; when the flow rate of the mixed gas from the gas supply units changes, and the gas pressure gauge monitors the pressure value of the mixed gas from the gas supply units exceeds the pre- When setting the pressure range, the pressure controller receives a first control signal from the gas pressure gauge, and the pressure controller starts to act according to the first control signal, so that the pressure value of the mixed gas returns to the preset pressure range. 如請求項1所述之氣體混合輸出系統，包括一氣體混合裝置，連通於該些氣體供應單元，使該些氣體於該氣體混合裝置內混合成該混合氣體。The gas mixing output system according to claim 1, comprising a gas mixing device connected to the gas supply units, so that the gases are mixed into the mixed gas in the gas mixing device. 如請求項2所述之氣體混合輸出系統，其中該氣體穩壓裝置係設置於該氣體混合裝置與該氣體緩衝單元之間，且連通於該氣體混合裝置與該氣體緩衝單元。The gas mixing output system according to claim 2, wherein the gas pressure stabilizing device is disposed between the gas mixing device and the gas buffer unit, and communicates with the gas mixing device and the gas buffer unit. 如請求項2所述之氣體混合輸出系統，其中該氣體穩壓裝置係設置於該些氣體供應單元與該氣體混合裝置之間，且連通於該些氣體供應單元與該氣體混合裝置。The gas mixing output system according to claim 2, wherein the gas voltage stabilizing device is disposed between the gas supply units and the gas mixing device, and communicates with the gas supply units and the gas mixing device. 如請求項1所述之氣體混合輸出系統，其中當該混合氣體在該些氣體供應單元的流量變大時，該壓力控制器的開度隨之變大，使該混合氣體在該些氣體供應單元的一次側及二次側的壓力差值保持在一預定範圍內；當該混合氣體在該些氣體供應單元的流量變小時，該壓力控制器的開度隨之變小，使該混合氣體在該些氣體供應單元的一次測及二次側的壓力差值保持在該預定範圍內。The gas mixing output system according to claim 1, wherein when the flow rate of the mixed gas in the gas supply units becomes larger, the opening degree of the pressure controller becomes larger, so that the mixed gas is supplied in the gas The pressure difference between the primary side and the secondary side of the unit is kept within a predetermined range; when the flow rate of the mixed gas in the gas supply units becomes smaller, the opening degree of the pressure controller becomes smaller, so that the mixed gas The pressure difference between the primary and secondary sides of the gas supply units remains within the predetermined range. 如請求項1所述之氣體混合輸出系統，其中該氣體緩衝單元訊號連接至該些氣體供應單元，當該氣體緩衝單元輸出的該混合氣體的該輸出壓力值大於或小於一輸出預設值時，該氣體緩衝單元傳遞一第二調控訊號至該些氣體供應單元中之至少一者，使該些氣體供應單元中之至少一者根據該第二調控訊號調控該些氣體中之至少一者的輸出流量。The gas mixing output system according to claim 1, wherein the signal of the gas buffer unit is connected to the gas supply units, when the output pressure value of the mixed gas output by the gas buffer unit is greater than or less than an output preset value , The gas buffer unit transmits a second control signal to at least one of the gas supply units, so that at least one of the gas supply units controls at least one of the gases according to the second control signal Output flow. 如請求項1所述之氣體混合輸出系統，其中當來自該些氣體供應單元的該混合氣體的流量產生變化，且該氣體壓力計監測來自該些氣體供應單元的該混合氣體的壓力值超出該預設壓力範圍時，該壓力控制器與該氣體壓力計循環回授且調節該混合氣體的壓力值，直到該混合氣體的壓力值回歸且維持在該預設壓力範圍。The gas mixing output system according to claim 1, wherein when the flow rate of the mixed gas from the gas supply units changes, and the gas pressure gauge monitors that the pressure value of the mixed gas from the gas supply units exceeds the During the preset pressure range, the pressure controller and the gas pressure gauge circulate feedback and adjust the pressure value of the mixed gas until the pressure value of the mixed gas returns and maintains in the preset pressure range.
TW108213572U 2019-10-15 2019-10-15 Gas mixing output system TWM593285U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW108213572U TWM593285U (en) 2019-10-15 2019-10-15 Gas mixing output system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW108213572U TWM593285U (en) 2019-10-15 2019-10-15 Gas mixing output system

Publications (1)

Publication Number Publication Date
TWM593285U true TWM593285U (en) 2020-04-11

Family

ID=71133593

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108213572U TWM593285U (en) 2019-10-15 2019-10-15 Gas mixing output system

Country Status (1)

Country Link
TW (1) TWM593285U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114686852A (en) * 2020-12-28 2022-07-01 江苏菲沃泰纳米科技股份有限公司 Coating system, feeding device and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114686852A (en) * 2020-12-28 2022-07-01 江苏菲沃泰纳米科技股份有限公司 Coating system, feeding device and method

Similar Documents

Publication Publication Date Title
JP3830670B2 (en) Semiconductor manufacturing equipment
KR20080100379A (en) System and method for controlled mixing of fluids and multiplexing setpoints
JP2006074027A (en) Device and method for mixing and feeding chemical liquid
TWM593285U (en) Gas mixing output system
CN103974760B (en) Mist preparation method and gas mixer
ES2761775T3 (en) Control method of fluid pressure in a closed system
CN211260360U (en) Gas mixing output system
US20220266417A1 (en) Cleaning liquid supply device, cleaning unit, and storage medium storing program
US10409297B2 (en) Dynamic gas blending system and process for producing mixtures with minimal variation within tolerance limits and increased gas utilization
TW201930638A (en) Concentration controller, gas control system, deposition apparatus, concentration control method, and program recording medium for concentration controller
TWM462748U (en) Mixed gas generating apparatus
JP5483600B2 (en) Gas supply method
CN108363429B (en) Point-of-use mixing system and method for controlling temperature of liquid dispensed on a substrate
TW201816170A (en) Gas control system and film formation device provided with gas control system
US10940447B2 (en) Control circuit for stopping the flow of fluid in a primary circuit, and related methods and devices
CN112780947A (en) Gas mixing output system and method
US11377335B2 (en) Method for filling containers with a filling product
CN110275561A (en) Equipment for controlling the fuel-oxidant mixture of premixed gas burner
CN201194219Y (en) Semiconductor device manufacturing equipment and system
US20120092950A1 (en) Low pressure drop blender
JP5760373B2 (en) Mixed gas production apparatus and mixed gas production method
JP5968836B2 (en) Gas supply system and method for controlling gas supply system
TWI693965B (en) Chemical liquid dilution method
CN106980329A (en) A kind of glass furnace for pure oxygen combustion oxygen flow automatic control system
JP2016198814A (en) Gas cutting method and gas cutting device