CN211125601U

CN211125601U - Chemical cleaning tool for semiconductor display substrate

Info

Publication number: CN211125601U
Application number: CN202020133395.3U
Authority: CN
Inventors: 陆雄; 王文彬; 魏航; 陶金; 周文
Original assignee: Chongqing Xinjie Technology Co ltd
Current assignee: Chongqing Xinjie Technology Co ltd
Priority date: 2020-01-20
Filing date: 2020-01-20
Publication date: 2020-07-28
Anticipated expiration: 2030-01-20

Abstract

The utility model belongs to the technical field of the semiconductor substrate, a chemical cleaning tool of semiconductor display substrate is provided, including installation frame, two backup pads, a plurality of structure and the locking structure of placing, two backup pads set up respectively at the both ends of the inboard of installing frame and with installing frame sliding connection, a plurality of structures of placing set up along vertically interval in proper order, place including a plurality of first connecting axles, a plurality of first gyro wheels, a plurality of second connecting axles and a plurality of second gyro wheels of structure, the locking structure is used for locking the backup pad. The utility model provides a semiconductor display substrate's chemical cleaning tool, the cleaning efficiency is higher.

Description

Chemical cleaning tool for semiconductor display substrate

Technical Field

The utility model relates to a semiconductor substrate technical field, concretely relates to semiconductor display substrate's chemical cleaning tool.

Background

The semiconductor display substrate is subjected to a plurality of cleaning processes, such as chemical cleaning, ultrasonic cleaning, and ultra-high pressure water cleaning, during the manufacturing process. The chemical cleaning is a cleaning method for removing dirt on the surface of the semiconductor display substrate by soaking the semiconductor display substrate in a chemical reagent for a period of time.

However, in the existing chemical cleaning technology for semiconductor display substrates, a plurality of semiconductor display substrates are stacked, and a pad is arranged between two adjacent semiconductor display substrates so that a chemical reagent can be in contact with the semiconductor substrates.

In this manner, the semiconductor display substrates are cleaned, and not only are the semiconductor display substrates stacked one on another in the cleaning tank, but also a spacer is provided between two adjacent semiconductor display substrates. After the cleaning, the semiconductor display substrate and the gasket need to be taken out of the cleaning tank one by one, which is time-consuming and labor-consuming, and results in low cleaning efficiency.

SUMMERY OF THE UTILITY MODEL

To the defect among the prior art, the utility model aims at providing a semiconductor display substrate's chemical cleaning tool to improve cleaning efficiency.

In order to achieve the above object, the present invention provides a chemical cleaning fixture for semiconductor display substrates, comprising a mounting frame, two supporting plates, a plurality of placing structures and a locking structure, wherein the two supporting plates are respectively disposed at two ends of the inner side of the mounting frame and slidably connected with the mounting frame, the plurality of placing structures are sequentially disposed at intervals along the longitudinal direction,

the placing structure comprises a plurality of first connecting shafts, a plurality of first rollers, a plurality of second connecting shafts and a plurality of second rollers, the plurality of first connecting shafts are divided into two groups on average, each group is provided with a plurality of first connecting shafts and is arranged symmetrically along the transverse direction, one end of any one first connecting shaft is connected with the supporting plate, the other end of any one first connecting shaft extends to one side opposite to the two supporting plates, the plurality of first rollers are respectively connected with the plurality of first connecting shafts,

the second connecting shafts are divided into two groups on average, each group is provided with the second connecting shafts and is arranged symmetrically along the transverse direction, one end of any one second connecting shaft is connected with the supporting plate, the other end of the second connecting shaft extends to one side opposite to the two supporting plates, the second rollers are respectively connected with the second connecting shafts, and the second rollers are positioned above the first rollers and keep a certain distance with the first rollers,

the locking structure is used for locking the supporting plate.

Furthermore, a guide groove is formed in the supporting plate and extends longitudinally, a guide block is fixedly arranged at one end of the second connecting shaft and is arranged in the guide groove in a sliding mode, a guide rod is arranged above the guide block and is located in the guide groove, a reset spring is sleeved on the guide rod, and two ends of the reset spring are respectively abutted to the inner wall of the guide block and the inner wall of the guide groove.

Further, the locking structure includes spout, screw and bolt, the spout sets up on the installation frame, the screw sets up in the backup pad, just the screw with the spout is corresponding, the screw end of bolt pass behind the spout with screw threaded connection.

The utility model has the advantages that:

1. the utility model provides a semiconductor display substrate's chemical cleaning tool through set up the first gyro wheel and the second gyro wheel of mutually supporting in the backup pad, places semiconductor display substrate between first gyro wheel and second gyro wheel during the use, the placing of the semiconductor display substrate of being convenient for to the cleaning efficiency has been improved.

2. The utility model provides a semiconductor display substrate's chemical cleaning tool is through being connected the second gyro wheel with the second connecting axle that can follow longitudinal sliding to can change the distance between first gyro wheel and the second gyro wheel, and then can adapt to the semiconductor display substrate of different thickness.

3. The utility model provides a semiconductor display substrate's chemical cleaning tool utilizes the gyro wheel to support semiconductor display substrate, make full use of the less principle of cylindrical side and plane area of contact to the cleaning performance has been improved.

4. The utility model provides a semiconductor display substrate's chemical cleaning tool is through will placing the structure setting in the backup pad that can be close to each other or keep away from to can adapt to the semiconductor display substrate of different length or width.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below. Throughout the drawings, like elements or portions are generally identified by like reference numerals. In the drawings, elements or portions are not necessarily drawn to scale.

Fig. 1 is a perspective view of a chemical cleaning tool for a semiconductor display lining plate according to an embodiment of the present invention;

FIG. 2 is a cross-sectional view of the semiconductor display substrate shown in FIG. 1 taken along the direction A-A;

FIG. 3 is an enlarged view of the semiconductor display substrate shown in FIG. 2 at position C;

fig. 4 is a cross-sectional view of the chemical cleaning tool for a semiconductor display substrate shown in fig. 1, taken along the direction B-B.

Reference numerals:

1-mounting frame, 2-supporting plate, 21-guiding groove, 3-placing structure, 31-first connecting shaft, 32-first roller, 33-second connecting shaft, 331-guiding block, 332-guiding rod, 34-second roller, 35-reset spring, 4-locking structure, 401-sliding groove, 402-screw hole and 403-bolt.

Detailed Description

Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The following examples are only for illustrating the technical solutions of the present invention more clearly, and therefore are only examples, and the protection scope of the present invention is not limited thereby.

It is to be noted that unless otherwise specified, technical or scientific terms used herein shall have the ordinary meaning as understood by those skilled in the art to which the present invention belongs.

In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience of description and simplicity of description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting.

Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. In the description of the present invention, "a plurality" means two or more unless specifically limited otherwise.

In this application, unless expressly stated or limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can include, for example, fixed connections, removable connections, or integral parts; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through intervening media. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

As shown in fig. 1-4, the present invention provides a chemical cleaning tool for semiconductor display substrates, which comprises a mounting frame 1, two supporting plates 2, a plurality of placing structures 3 and locking structures 4.

The mounting frame 1 is a rectangular parallelepiped structure composed of twelve connecting rods. Thus, the mounting of other structures can be ensured, and the semiconductor display substrate can be ensured to be fully contacted with the cleaning solution.

The two supporting plates 2 are respectively arranged at two ends of the inner side of the mounting frame and are in sliding connection with the mounting frame. Preferably, the support plate 2 is clamped at the periphery in an opening of the mounting frame 1, so that the mounting frame 1 supports and guides the support plate 2.

A plurality of placing structures 3 are sequentially arranged at intervals along the longitudinal direction. Therefore, the semiconductor display lining plates can be placed layer by layer, the placing quantity of the semiconductor display lining plates is increased, and the cleaning efficiency is improved.

Placing structure 3 includes a plurality of first connecting axles 31, a plurality of first gyro wheels 32, a plurality of second connecting axles 33 and a plurality of second gyro wheels 34, a plurality of first connecting axles 31 averagely divide into two sets ofly, and every group still has a plurality of first connecting axles 31 equally, two sets of first connecting axles 31 are installed respectively in two relative one sides of backup pad 2, and along horizontal symmetric distribution, the one end and the backup pad 2 of arbitrary one first connecting axle 31 are connected, the other end extends in two relative one sides of backup pad 2, a plurality of first gyro wheels 32 are connected with a plurality of first connecting axles 31 respectively. When the first connecting shaft 31 is rotatably connected with the supporting plate 2, the first roller 32 is fixedly connected with the supporting plate 2, and when the first connecting shaft 31 is fixedly connected with the supporting plate 2, the first roller 32 is rotatably connected with the first connecting shaft 31. I.e. the first roller 32 is to be able to rotate.

The plurality of second connecting shafts 33 are equally divided into two groups, each group also has a plurality of second connecting shafts 33, the two groups of second connecting shafts 33 are respectively arranged on one side opposite to the two support plates 2 and are symmetrically distributed along the transverse direction, one end of any one second connecting shaft 33 is connected with the support plates 2, the other end of the any one second connecting shaft extends to one side opposite to the two support plates 2, the plurality of second rollers 34 are respectively connected with the plurality of second connecting shafts 33 in a rotating manner, the second rollers 34 are positioned above the first rollers 32 and keep a certain distance from the first rollers 32, namely, a certain gap is formed between the first rollers 32 and the second rollers 34.

Preferably, the first roller 32 and the second roller 34 are sleeved with bushings for increasing friction force, the bushings are made of flexible materials, and the bushings made of flexible materials can prevent the semiconductor display lining plate from being in rigid contact with the rollers to damage the semiconductor display lining plate.

The locking structure 4 is used for locking the support plate 2.

In one embodiment, the support plate 2 is provided with a guide groove 21, the guide groove 21 extends in the longitudinal direction, one end of the second connecting shaft 33 is fixedly provided with a guide block 331, the guide block 331 is slidably mounted in the guide groove 21, a guide rod 332 is arranged above the guide block 331, the guide rod 332 is located in the guide groove 21, the guide rod 332 is sleeved with a return spring 35, two ends of the return spring 35 are respectively abutted to inner walls of the guide block 331 and the guide groove 21, and in a natural state, the return spring 35 bears pressure to keep the second connecting shaft 33 at the lowest point.

In the using process, when a thicker semiconductor display lining plate is placed between the first roller 32 and the second roller 34, the second roller 34 is interfered with the semiconductor display lining plate, and then the semiconductor display lining plate moves upwards against the pressure of the return spring 35, and the gap between the first roller 32 and the second roller 34 is increased. With this structure, semiconductor display substrates of different thicknesses can be used.

In one embodiment, locking structure 4 comprises a sliding groove 401, a screw hole 402 and a bolt 403, wherein sliding groove 401 is opened on mounting frame 1, screw hole 402 is opened on support plate 2, screw hole 402 corresponds to sliding groove 401, and a threaded end of bolt 403 is threaded with screw hole 402 after passing through sliding groove 401.

The locking structure 4 of this structure can both lock the support plate 2, can also lock the support plate 2 in arbitrary position, has the function of leading to the support plate 2 simultaneously.

The working principle of the utility model is as follows:

in use, the semiconductor display substrate is placed by inserting the semiconductor display substrate from the gap between the first roller 32 and the second roller 34. When the thickness of the semiconductor display substrate is large, the semiconductor display substrate pushes the second roller 34 upward, thereby changing the gap between the first roller 32 and the second roller 34, and also can be placed between the first roller 32 and the second roller 34. When the length of the semiconductor display substrate is small, the semiconductor display substrate can be placed by changing the distance between the support plates 2.

In the specification of the present invention, a large number of specific details are explained. It is understood, however, that embodiments of the invention may be practiced without these specific details. In some instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the scope of the embodiments of the present invention, and are intended to be covered by the claims and the specification.

Claims

1. A chemical cleaning tool for semiconductor display substrates is characterized in that: comprises an installation frame, two supporting plates, a plurality of placing structures and a locking structure, wherein the two supporting plates are respectively arranged at two ends of the inner side of the installation frame and are in sliding connection with the installation frame, the placing structures are sequentially arranged at intervals along the longitudinal direction,

the locking structure is used for locking the supporting plate.

2. The chemical cleaning tool of claim 1, wherein: the supporting plate is provided with a guide groove, the guide groove extends along the longitudinal direction, one end of the second connecting shaft is fixedly provided with a guide block, the guide block is arranged in the guide groove in a sliding mode, a guide rod is arranged above the guide block and located in the guide groove, a reset spring is sleeved on the guide rod, and two ends of the reset spring are respectively abutted to the inner wall of the guide groove and the guide block.

3. The chemical cleaning tool of claim 1, wherein: the locking structure comprises a sliding groove, a screw hole and a bolt, the sliding groove is arranged on the installation frame, the screw hole is arranged on the supporting plate and corresponds to the sliding groove, and the threaded end of the bolt penetrates through the sliding groove and then is in threaded connection with the screw hole.