CN211044036U - Temperature monitoring equipment for silicon wafer cleaning machine and silicon wafer cleaning machine - Google Patents
Temperature monitoring equipment for silicon wafer cleaning machine and silicon wafer cleaning machine Download PDFInfo
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- CN211044036U CN211044036U CN201922120114.0U CN201922120114U CN211044036U CN 211044036 U CN211044036 U CN 211044036U CN 201922120114 U CN201922120114 U CN 201922120114U CN 211044036 U CN211044036 U CN 211044036U
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Abstract
The utility model discloses a temperature monitoring equipment and silicon chip cleaning machine for silicon chip cleaning machine. The temperature monitoring device includes: the temperature probe device is arranged in each solution tank of the plurality of solution tanks of the silicon wafer cleaning machine and used for monitoring the liquid temperature in each solution tank; the temperature acquisition device is connected with the temperature probe device and is used for acquiring the liquid temperature in each solution tank obtained by the temperature probe device through monitoring; the temperature monitoring device is connected with the temperature acquisition device and is used for acquiring the liquid temperature in each solution tank and generating a temperature display instruction and/or an alarm interface display instruction; and the display device is connected with the temperature monitoring device and is used for displaying the liquid temperature in each solution tank and/or displaying the alarm interface corresponding to each solution tank according to the temperature display instruction and/or the alarm interface display instruction. The temperature monitoring equipment can automatically monitor the temperature in the solution tank, and reduces the manual inspection intensity of the silicon wafer cleaning machine.
Description
Technical Field
The utility model relates to a silicon chip makes technical field, concretely relates to temperature monitoring equipment and silicon chip cleaning machine for silicon chip cleaning machine.
Background
Solar energy is the cleanest, safe and reliable energy in the future, and the rapid cost reduction of the photovoltaic industry can accelerate the progress of photovoltaic power generation to replace thermal power generation. In the manufacturing process of the silicon wafer, the key step is to carry out cleaning operation on the silicon wafer inserted into the solution tank, and the key equipment used at the moment is a silicon wafer cleaning machine.
A general silicon wafer cleaning machine comprises 8 solution tanks, and each solution tank is heated for enhancing the cleaning effect. Specifically, the liquid temperature in each solution tank has a preset temperature standard and a preset temperature range. If the liquid temperature abnormality in a certain solution tank is not found in time, so that the silicon wafer is immersed in the liquid exceeding the specified temperature range for a long time, abnormal cleaning can be caused, and quality accidents of the silicon wafer can occur.
The temperature monitoring mode of the existing silicon wafer cleaning machine is mainly manual inspection, and quality control personnel or equipment inspection personnel regularly use thermometers to measure and record the liquid temperature in each solution tank so as to monitor a temperature curve and find abnormal temperature. The manual inspection efficiency is low, a large amount of working time of personnel is occupied, quality accidents are easily caused, and the quality of the silicon wafer and the working efficiency of the personnel are seriously influenced.
SUMMERY OF THE UTILITY MODEL
The utility model provides a temperature monitoring equipment and silicon chip cleaning machine for silicon chip cleaning machine aims at solving current silicon chip cleaning machine and patrols and examines the quality that intensity is big, can not in time discover the temperature, can not guarantee the silicon chip and personnel work efficiency low scheduling problem down.
In a first aspect, the utility model provides a temperature monitoring equipment for silicon chip cleaning machine, include:
the temperature probe device is arranged in each solution tank of the plurality of solution tanks of the silicon wafer cleaning machine and used for monitoring the liquid temperature in each solution tank;
the temperature acquisition device is connected with the temperature probe device and is used for acquiring the liquid temperature in each solution tank obtained by the temperature probe device through monitoring;
the temperature monitoring device is connected with the temperature acquisition device and is used for acquiring the liquid temperature in each solution tank and generating a temperature display instruction and/or an alarm interface display instruction;
the display device is connected with the temperature monitoring device and is used for displaying the liquid temperature in each solution tank and/or displaying the temperature of each solution tank and each solution tank according to the temperature display instruction and/or the alarm interface display instruction
In a second aspect, the utility model provides a silicon chip cleaning machine, include:
a plurality of solution tanks;
the temperature monitoring apparatus for a silicon wafer cleaning machine explained in the first aspect.
The utility model provides a temperature monitoring device for a silicon wafer cleaning machine, which is characterized in that a temperature probe device is arranged in each solution tank of the silicon wafer cleaning machine in a production workshop to monitor the liquid temperature in each solution tank; a temperature acquisition device connected with the temperature probe device is arranged to acquire the liquid temperature in each solution tank; a temperature monitoring device connected with the temperature acquisition device is arranged to acquire the liquid temperature in each solution tank and generate a temperature display instruction and/or an alarm interface display instruction; and arranging a display device connected with the temperature monitoring device, and displaying the liquid temperature in each solution tank and the alarm interface corresponding to each solution tank.
The temperature monitoring equipment for the silicon wafer cleaning machine can monitor and set the liquid temperature in each solution tank of the silicon wafer cleaning machine in real time and display alarm information by combining the current liquid temperature. The temperature monitoring equipment for the silicon wafer cleaning machine automatically monitors the temperature in the solution tank, reduces the manual inspection intensity of the silicon wafer cleaning machine, ensures the quality of silicon wafers, and improves the working efficiency of equipment inspection personnel.
The silicon wafer cleaning machine with the temperature monitoring equipment can automatically detect the temperature in the solution tank, reduces the manual inspection intensity of the silicon wafer cleaning machine, ensures the quality of silicon wafers, and improves the working efficiency of equipment inspection personnel.
Drawings
A more complete understanding of exemplary embodiments of the present invention may be had by reference to the following drawings:
FIG. 1 is a schematic diagram showing the components of a temperature monitoring device for a silicon wafer cleaning machine according to a preferred embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a temperature monitoring device for a silicon wafer cleaning machine according to another preferred embodiment of the present invention;
fig. 3 is a schematic diagram of the components and applications of the temperature monitoring device according to the preferred embodiment of the present invention.
Detailed Description
The exemplary embodiments of the present invention will now be described with reference to the accompanying drawings, which, however, may be embodied in many different forms and are not limited to the embodiments described herein, which are provided for the purpose of thoroughly and completely disclosing the present invention and fully conveying the scope of the present invention to those skilled in the art. The terminology used in the exemplary embodiments presented in the accompanying drawings is not intended to be limiting of the invention. In the drawings, the same units/elements are denoted by the same reference numerals.
Unless otherwise defined, terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Further, it will be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense.
As shown in FIG. 1, the utility model discloses a temperature monitoring equipment for silicon chip cleaning machine, include:
a temperature probe device 10, provided in each solution tank 1000 of the plurality of solution tanks of the silicon wafer cleaning machine, for monitoring a liquid temperature in each solution tank;
the temperature acquisition device 20 is connected with the temperature probe device and is used for acquiring the liquid temperature in each solution tank obtained by monitoring the temperature probe device;
the temperature monitoring device 30 is connected with the temperature acquisition device and is used for acquiring the liquid temperature in each solution tank and generating a temperature display instruction and/or an alarm interface display instruction;
and the display device 40 is connected with the temperature monitoring device and is used for displaying the liquid temperature in each solution tank and/or displaying the alarm interface corresponding to each solution tank according to the temperature display instruction and/or the alarm interface display instruction.
The temperature monitoring equipment for the silicon wafer cleaning machine is characterized in that a temperature probe device is arranged in each solution tank of the silicon wafer cleaning machine in a production workshop, and the temperature of liquid in each solution tank is monitored; a temperature acquisition device connected with the temperature probe device is arranged to acquire the liquid temperature in each solution tank; a temperature monitoring device connected with the temperature acquisition device is arranged to acquire the liquid temperature in each solution tank and generate a temperature display instruction and/or an alarm interface display instruction; and arranging a display device connected with the temperature monitoring device, and displaying the liquid temperature in each solution tank and the alarm interface corresponding to each solution tank.
The temperature monitoring equipment for the silicon wafer cleaning machine can monitor and set the liquid temperature in each solution tank of the silicon wafer cleaning machine in real time and display alarm information by combining the current liquid temperature. The temperature monitoring equipment for the silicon wafer cleaning machine automatically monitors the temperature in the solution tank, reduces the manual inspection intensity of the silicon wafer cleaning machine, ensures the quality of silicon wafers, and improves the working efficiency of equipment inspection personnel.
Specifically, the display device 40 displays the liquid temperature in each solution tank on the screen in the corresponding color corresponding to the different temperature zones according to the temperature display instruction.
Preferably, the temperature monitoring apparatus for a silicon wafer cleaning machine further comprises:
a heating device 50 provided in each of the plurality of solution tanks of the silicon wafer cleaning machine;
the cold water valve is arranged on a pipeline for conveying cold water to each solution tank of the silicon wafer cleaning machine;
the display device is also used for acquiring a heating instruction or a cooling instruction picked up by the keyboard device and sending the heating instruction or the cooling instruction to the temperature monitoring device;
the temperature monitoring device is also used for controlling the start and stop of the heating device in the corresponding solution tank according to the acquired temperature-rising instruction;
the temperature monitoring device is also used for controlling the opening and closing of a cold water valve correspondingly arranged with the corresponding solution tank according to the obtained cooling instruction.
The temperature monitoring equipment for the silicon wafer cleaning machine is characterized in that a heating device is arranged in each solution tank of the silicon wafer cleaning machine, a cold water valve is arranged on a pipeline for conveying cold water to each solution tank, and the display device acquires a heating instruction or a cooling instruction picked up by a keyboard device and sends the heating instruction or the cooling instruction to the temperature monitoring device; the temperature monitoring device controls the start and stop of a heating device in the corresponding solution tank according to the acquired temperature rise instruction; the temperature monitoring device controls the opening and closing of a cold water valve correspondingly arranged with the corresponding solution tank according to the acquired cooling instruction. The liquid temperature in the solution tank is adjusted by combining the current liquid temperature and by heating or providing cooling liquid in the cleaning tank, so that the temperature in the solution tank is automatically monitored, the liquid temperature is controlled within a preset temperature interval, the manual inspection intensity of the silicon wafer cleaning machine is further reduced, the quality of a silicon wafer is guaranteed, and the working efficiency of equipment inspection personnel is improved.
In specific implementation, the temperature monitoring device controls a heating device in the corresponding solution tank to start according to the obtained temperature rise instruction, so that the heating device heats the liquid in the solution tank; controlling a cold water valve correspondingly arranged with the corresponding solution tank to be opened according to the acquired temperature reduction instruction, so that cold water flows into the solution tank; generating a heating device closing instruction according to the obtained liquid temperature in the solution tank so as to control the heating device in the corresponding solution tank to be closed; and generating a cold water valve closing instruction according to the obtained liquid temperature in the solution tank so as to control the cold water valve correspondingly arranged in the corresponding solution tank to be closed.
In specific implementation, the keyboard device may be a virtual keyboard or a soft keyboard displayed on the display device, or may be a physical keyboard integrally arranged with the display device, or a physical keyboard connected to the display device through a cable.
Preferably, the temperature monitoring apparatus for a silicon wafer cleaning machine further comprises:
the alarm device is arranged near each solution tank of the silicon wafer cleaning machine or near the temperature monitoring device and is connected with the temperature monitoring device;
the temperature monitoring device is also used for controlling the corresponding alarm device to be lightened according to the temperature display instruction.
The temperature monitoring equipment for the silicon wafer cleaning machine is characterized in that an alarm device connected with the temperature monitoring device is arranged near each solution tank or near the temperature monitoring device, and the temperature monitoring device controls the corresponding alarm device to be lightened according to the temperature display instruction. The lighted alarm device can attract the attention of patrolmen, measures for actively interfering the liquid temperature are taken, the temperature in the solution tank is automatically monitored, meanwhile, the liquid temperature which is not in a preset temperature range is alarmed, the manual patrol intensity of the silicon wafer cleaning machine is further reduced, the quality of the silicon wafer is ensured, and the working efficiency of equipment patrol personnel is improved.
In specific implementation, the temperature monitoring device controls the corresponding alarm device to be lightened according to the temperature display instruction so as to display that the temperature of the liquid in the corresponding solution tank is lower than a normal temperature range, is within the normal temperature range or is higher than the normal temperature range according to corresponding colors corresponding to different temperature intervals.
Preferably, the temperature monitoring device comprises an upper computer and a programmable controller which are connected in sequence;
the upper computer is also connected with the temperature acquisition device;
the programmable controller is also connected to the heating device.
Preferably, the cold water valve comprises a solenoid valve;
the programmable controller is also connected with the electromagnetic valve.
According to the temperature monitoring equipment for the silicon wafer cleaning machine, the temperature monitoring devices are respectively arranged on the upper computer and the programmable controller, and generation, sending and receiving of power level signals and instruction level signals are respectively realized, so that the control device is separated from the execution and driving device, and the independence and reliability of the equipment are further improved.
Preferably, the method further comprises the following steps:
an AC contactor;
the programmable controller is connected with the alternating current contactor, and the starting and stopping of the heating device are controlled through the alternating current contactor.
The temperature monitoring equipment for the silicon wafer cleaning machine is provided with the alternating current contactor connected with the programmable controller, and the heating device is controlled to be started or stopped through the alternating current contactor, so that the driving device is separated from the instruction device, and the independence and the reliability of the equipment are further improved.
Preferably, the heating device is a heating pipe which is arranged in each solution tank in a flange manner;
the heating pipe comprises a stainless steel pipe and an electric heating assembly, and the electric heating assembly is positioned inside the stainless steel pipe.
According to the temperature monitoring equipment for the silicon wafer cleaning machine, the heating pipe arranged in a flange manner is selected as a heating device, so that the sealing of a solution tank is convenient to realize; the heating pipe comprises a stainless steel pipe and an electric heating assembly positioned inside the stainless steel pipe, and the electric heating assembly is immersed in the solution, so that the contact area with the solution is increased, heat is fully contacted with the solution, and the heat conduction efficiency is increased.
Preferably, the temperature probe device is made of PT100 material;
the temperature probe device is connected with the temperature acquisition device through a shielded twisted pair.
According to the temperature monitoring equipment for the silicon wafer cleaning machine, the temperature probe device made of PT100 materials is selected, the temperature monitoring equipment is sensitive to temperature change, and the obtained ambient temperature is high in precision and good in accuracy; the temperature probe device is connected with the temperature acquisition device through the shielded twisted pair, so that noise introduced into a power supply line or a sensitive signal in a signal transmission process is reduced, interference of surrounding electromagnetic environment and electric environment is reduced, and the precision and accuracy of a temperature signal are improved.
The PT100 material is a linear negative temperature coefficient thermistor, and the resistance at zero degrees is 100 ohms.
Preferably, the temperature probe means is mounted in a screw-tight manner in the middle of the side wall of each solution tank.
According to the temperature monitoring equipment for the silicon wafer cleaning machine, the temperature probe device is installed in the middle of the side wall of each solution tank in a threaded sealing mode, so that the obtained solution temperature can accurately reflect the temperature in the whole solution tank, and the accuracy of temperature measurement is improved.
The utility model discloses a silicon chip cleaning machine of embodiment, include:
a plurality of solution tanks;
the temperature monitoring apparatus for a wafer cleaning machine as hereinbefore described.
The silicon wafer cleaning machine is provided with the temperature monitoring equipment, so that the temperature in the solution tank can be automatically detected, the manual inspection strength of the silicon wafer cleaning machine is reduced, the quality of silicon wafers is guaranteed, and the working efficiency of equipment inspection personnel is improved.
As shown in FIG. 2, the temperature monitoring device of the cleaning machine of an embodiment of the present invention comprises a temperature probe, a temperature acquisition module, an upper computer, a Programmable logic Controller (Programmable L organic Controller, abbreviated as P L C), a heater and a cold water valve, wherein the temperature probe, the temperature acquisition module and the upper computer are connected in sequence, when the upper computer runs, a plurality of human-computer interaction interfaces are displayed on a display screen, configuration software is stored and run in the upper computer, and is used for displaying and monitoring the temperature through the human-computer interaction interface displayed on the display screen, the heater, the cold water valve and a three-color alarm lamp are respectively connected with the P L C, when a program is stored and run in the P L C, the three-color alarm lamp, the heater and the cold water valve are respectively controlled to work, an RS485 communication mode is adopted between the P L C and the upper computer, the upper computer controls the corresponding execution mechanism to work through the P L C, and the execution mechanism controlled by the P L C comprises a red-blue-white alarm lamp, a heater and a cold.
Fig. 3 illustrates the composition and application scenario of a temperature monitoring device by taking a solution tank as an example, the heater shown in fig. 3 is a heating pipe, the heating pipe is flange-mounted at the bottom inside the solution tank, specifically, the heating pipe includes a stainless steel pipe and an electric heating wire, the electric heating wire is located inside the stainless steel pipe, and P L C controls the start and stop of the heating pipe through an ac contactor.
Specifically, the cold water valve comprises a solenoid valve, and the P L C controls the on-off of the solenoid valve through a relay, and the on-off of the solenoid valve controls the flow of cold water into the solution tank.
Specifically, the temperature probe is made of PT material. The resistance value of the temperature probe can be increased at an approximately constant speed along with the temperature rise, and the ambient temperature of the temperature probe can be equivalently determined by measuring the resistance value of the temperature probe. Here, the temperature of the liquid in the solution tank is shown. The temperature probe is electrically connected with the temperature acquisition module through the shielded twisted pair. In order to obtain the temperature of the liquid in the solution tank more accurately, the effective working part of the temperature probe should be located in the middle of the liquid in the solution tank, and in fig. 3, the temperature probe is installed in the middle of the side wall of the solution tank in a threaded sealing manner to prevent the liquid in the solution tank from leaking.
During specific implementation, the temperature acquisition module which is arranged aiming at the silicon wafer cleaning machine comprising 8 solution tanks has 8 channels, can convert output signals of 8 paths of temperature probes into temperature measurement values, transmits the temperature measurement values to an upper computer in an RS485 communication mode, and displays the temperature measurement values on a display screen through running configuration software according to a preset display strategy. Preferably, the real-time measured temperature value and the historical temperature curve of each solution tank can be displayed, and the liquid temperature in 8 solution tanks can be synchronously monitored in real time.
The configuration software controls the display of an alarm interface on the display screen, and simultaneously the configuration software controls the corresponding alarm lamp of the solution tank to flash (for example, flash red light or alternatively display blue light and red light) through P L C so as to remind an equipment inspector to check the reason of the over-temperature.
It should be understood that the "cold water" herein may be tap water, or industrial tap water, or a pre-prepared solution.
Similarly, when the real-time measured temperature value of the liquid in a certain solution tank is lower than the set normal temperature range, the real-time measured temperature value is represented by a blue font, at the same time, the configuration software controls a display screen to display an alarm interface, and simultaneously controls a corresponding alarm lamp of the solution tank to flash (such as flash red light or alternatively display blue light and red light) through P L C to remind an equipment inspector to inspect the reason of insufficient temperature.
The temperature probe, the heater, the cold water valve and other measurement and control devices are adopted, the upper computer is combined with the P L C, the liquid temperatures in a plurality of solution tanks of the silicon wafer cleaning machine arranged in a production workshop are monitored, the inspection strength of the silicon wafer cleaning machine is reduced, and control measures are taken in time when abnormal temperature is found, so that the liquid temperatures in the solution tanks are kept in a normal temperature range for a long time, the quality of silicon wafers is guaranteed, and the working efficiency of equipment inspection personnel is improved.
The invention has been described above by reference to a few embodiments. However, other embodiments of the invention than the above disclosed are equally possible within the scope of the invention, as would be apparent to a person skilled in the art, as defined by the appended patent claims.
Generally, all terms used in the claims are to be interpreted according to their ordinary meaning in the technical field, unless explicitly defined otherwise herein. All references to "a// the [ device, component, etc ]" are to be interpreted openly as at least one instance of a device, component, etc., unless explicitly stated otherwise. The steps of any method disclosed herein do not have to be performed in the exact order disclosed, unless explicitly stated.
Claims (10)
1. A temperature monitoring device for a silicon wafer cleaning machine, comprising:
the temperature probe device is arranged in each solution tank of the plurality of solution tanks of the silicon wafer cleaning machine and used for monitoring the liquid temperature in each solution tank;
the temperature acquisition device is connected with the temperature probe device and is used for acquiring the liquid temperature in each solution tank obtained by monitoring the temperature probe device;
the temperature monitoring device is connected with the temperature acquisition device and is used for acquiring the liquid temperature in each solution tank and generating a temperature display instruction and/or an alarm interface display instruction;
and the display device is connected with the temperature monitoring device and is used for displaying the liquid temperature in each solution tank and/or displaying the alarm interface corresponding to each solution tank according to the temperature display instruction and/or the alarm interface display instruction.
2. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 1, further comprising:
the heating device is arranged in each solution tank of the plurality of solution tanks of the silicon wafer cleaning machine;
the cold water valve is arranged on a pipeline for conveying cold water to each solution tank of the silicon wafer cleaning machine;
the display device is also used for acquiring a heating instruction or a cooling instruction picked up by the keyboard device and sending the heating instruction or the cooling instruction to the temperature monitoring device;
the temperature monitoring device is also used for controlling the start and stop of the heating device in the corresponding solution tank according to the obtained temperature-rising instruction;
and the temperature monitoring device is also used for controlling the opening and closing of a cold water valve correspondingly arranged with the corresponding solution tank according to the obtained cooling instruction.
3. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 1, further comprising:
the alarm device is arranged near each solution tank of the silicon wafer cleaning machine or near the temperature monitoring device and is connected with the temperature monitoring device;
and the temperature monitoring device is also used for controlling the corresponding alarm device to be lightened according to the temperature display instruction.
4. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 2,
the temperature monitoring device comprises an upper computer and a programmable controller which are connected in sequence;
the upper computer is also connected with the temperature acquisition device;
the programmable controller is also connected with the heating device.
5. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 4,
the cold water valve comprises an electromagnetic valve;
the programmable controller is also connected with the electromagnetic valve.
6. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 4, further comprising:
an AC contactor;
the programmable controller is connected with the alternating current contactor, and the starting and stopping of the heating device are controlled through the alternating current contactor.
7. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 5,
the heating device is a heating pipe and is arranged in each solution tank in a flange manner;
the heating pipe comprises a stainless steel pipe and an electric heating assembly, and the electric heating assembly is located inside the stainless steel pipe.
8. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 1,
the temperature probe device is made of PT100 materials;
the temperature probe device is connected with the temperature acquisition device through a shielded twisted pair.
9. The temperature monitoring apparatus for a silicon wafer cleaning machine as set forth in claim 8,
the temperature probe device is installed in the middle of the side wall of each solution tank in a thread sealing mode.
10. A silicon wafer cleaning machine is characterized by comprising:
a plurality of solution tanks;
a temperature monitoring apparatus for a silicon wafer cleaning machine as claimed in any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922120114.0U CN211044036U (en) | 2019-11-29 | 2019-11-29 | Temperature monitoring equipment for silicon wafer cleaning machine and silicon wafer cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922120114.0U CN211044036U (en) | 2019-11-29 | 2019-11-29 | Temperature monitoring equipment for silicon wafer cleaning machine and silicon wafer cleaning machine |
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| Publication Number | Publication Date |
|---|---|
| CN211044036U true CN211044036U (en) | 2020-07-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922120114.0U Active CN211044036U (en) | 2019-11-29 | 2019-11-29 | Temperature monitoring equipment for silicon wafer cleaning machine and silicon wafer cleaning machine |
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| CN (1) | CN211044036U (en) |
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