CN210995606U - Ultrasonic monocrystalline silicon wafer cleaning tank - Google Patents
Ultrasonic monocrystalline silicon wafer cleaning tank Download PDFInfo
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- CN210995606U CN210995606U CN201921873971.1U CN201921873971U CN210995606U CN 210995606 U CN210995606 U CN 210995606U CN 201921873971 U CN201921873971 U CN 201921873971U CN 210995606 U CN210995606 U CN 210995606U
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Abstract
The utility model provides an ultrasonic monocrystalline silicon wafer cleaning tank, which comprises a screw rod, a nut block, a motor, an electric telescopic rod, an ultrasonic vibrator, a lifting plate, a connecting pipe, a vacuum sucker and a vacuum pump, wherein the motor is assembled on the upper side of the left end face of a supporting plate, the screw rod is installed on the right end face of the motor, the nut block is installed on the annular side face of the screw rod, the electric telescopic rod is assembled on the lower end face of the nut block, the lifting plate is fixed on the lower end face of the electric telescopic rod, the vacuum pump is assembled on the middle position of the upper end face of the lifting plate, the connecting pipe is installed on the left end face of the vacuum pump, the, this design has solved the inconvenient ultrasonic cleaning's of original monocrystalline silicon piece problem, the utility model discloses rational in infrastructure, make things convenient for the monocrystalline silicon piece pay-off to wash, the cleaning efficiency is high.
Description
Technical Field
The utility model relates to an ultrasonic monocrystalline silicon piece washing tank belongs to monocrystalline silicon piece technical field.
Background
Monocrystalline silicon piece: a single crystal of silicon is a crystal having a substantially complete lattice structure. Different directions have different properties and are good semiconducting materials. The purity requirement reaches 99.9999 percent, even more than 99.9999999 percent. For the manufacture of semiconductor devices, solar cells, and the like. The polycrystalline silicon is pulled in a single crystal furnace.
The traditional single crystal silicon wafer is inconvenient to ultrasonically clean, the single crystal silicon wafer is mostly fed manually when being ultrasonically cleaned, the single crystal silicon wafer is immersed into a cleaning tank for a period of time, the cleaning is not convenient enough, the cleaning efficiency is low, and the problem of the appearance of the cleaning tank is solved urgently by the aid of an ultrasonic single crystal silicon wafer cleaning tank.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide an ultrasonic wave monocrystalline silicon piece washing tank to solve the problem that proposes in the above-mentioned background art, the utility model discloses rational in infrastructure makes things convenient for the monocrystalline silicon piece pay-off to wash, and the cleaning efficiency is high.
In order to achieve the above purpose, the present invention is realized by the following technical solution: an ultrasonic monocrystalline silicon wafer cleaning tank comprises a top plate, a convenient cleaning mechanism, a supporting plate, a placing table, a bottom plate and a cleaning bucket, wherein the supporting plate is symmetrically arranged on the left side and the right side of the upper end face of the bottom plate, the top plate is arranged on the upper end face of the supporting plate, the placing table is fixed on the left side of the upper end face of the bottom plate, the cleaning bucket is arranged on the right side of the placing table, the convenient cleaning mechanism is arranged on the lower side of the top plate, the convenient cleaning mechanism comprises a screw rod, a nut block, a motor, an electric telescopic rod, an ultrasonic vibrator, a lifting plate, a connecting pipe, a vacuum chuck and a vacuum pump, the motor is assembled on the upper side of the left end face of the supporting plate, the screw rod is installed on the right end face of the motor, the nut block is installed on the annular side face, the vacuum pump is characterized in that a connecting pipe is installed on the left end face of the vacuum pump, a vacuum sucker is installed on the lower end face of the lifting plate, the vacuum pump is connected with the vacuum sucker through the connecting pipe, and the ultrasonic vibrator is installed on the inner wall of the cleaning bucket.
Further, the cross-sectional area of the lifting plate is smaller than that of the cleaning bucket.
Further, the end face is installed under the motor and is placed the board, place the board and install the bracing piece down the end face, and the bracing piece, place board and backup pad and constitute triangle bearing structure.
Further, a thread sleeve is arranged at the middle position in the nut block, and the thread sleeve is meshed with the screw rod.
Further, the motor, the electric telescopic rod, the vacuum pump and the ultrasonic vibrator are all connected with an external power supply through wires.
Further, the ultrasonic vibrator is equipped with a plurality ofly, and a plurality of ultrasonic vibrator specifications are the same, the nut piece is equipped with two sets ofly, and two kinds of nut block specifications are the same, vacuum chuck is equipped with the multiunit, and multiunit vacuum chuck specification is the same.
The utility model has the advantages that: the utility model discloses an ultrasonic wave monocrystalline silicon piece washing tank, because of the utility model discloses added lead screw, nut piece, motor, electric telescopic handle, ultrasonic vibrator, lifter plate, connecting pipe, vacuum chuck and vacuum pump, this design makes things convenient for the pay-off of monocrystalline silicon piece to wash, and then makes things convenient for the monocrystalline silicon piece to carry out ultrasonic cleaning, has solved the inconvenient ultrasonic cleaning's of original monocrystalline silicon piece problem, has improved the utility model discloses a cleaning efficiency.
Because of the lifter plate cross-sectional area is less than the washing and fights the cross-sectional area, make things convenient for the lifter plate to get into inside the washing fill, because of terminal surface mounting places the board under the motor, place the board under the terminal surface and install the bracing piece, and the bracing piece, place board and backup pad and constitute triangular supports structure, increase the stability in use of motor, install the thread bush because of nut block intermediate position, and the thread bush meshes with the lead screw mutually, make things convenient for the nut piece to slide along the lead screw, the utility model discloses rational in infrastructure, make things convenient for the monocrystalline silicon piece pay-off.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic structural view of an ultrasonic monocrystalline silicon wafer cleaning tank according to the present invention;
FIG. 2 is a cross-sectional view of a convenient cleaning mechanism in an ultrasonic monocrystalline silicon wafer cleaning tank according to the present invention;
FIG. 3 is an enlarged view of A in FIG. 2;
in the figure: 1-top plate, 2-convenient cleaning mechanism, 3-support plate, 4-placing table, 5-bottom plate, 6-cleaning bucket, 21-screw rod, 22-nut block, 23-motor, 24-electric telescopic rod, 25-ultrasonic vibrator, 26-lifting plate, 27-connecting pipe, 28-vacuum sucker and 29-vacuum pump.
Detailed Description
In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.
Referring to fig. 1-3, the present invention provides a technical solution: the utility model provides an ultrasonic wave monocrystalline silicon piece washing tank, includes roof 1, convenient wiper mechanism 2, backup pad 3, places platform 4, bottom plate 5 and washing fill 6, and 3 symmetries of backup pad are installed in 5 up end left and right sides of bottom plate, and roof 1 is installed in 3 up end of backup pad, places platform 4 and fixes on 5 up end left sides of bottom plate, and washing fill 6 is installed and is being placed 4 right sides, and convenient wiper mechanism 2 sets up at 1 downside of roof.
The cross section area of the lifting plate 26 is smaller than that of the cleaning bucket 6, the lifting plate 26 can conveniently enter the cleaning bucket 6, the lower end face of the motor 23 is provided with the placing plate, the lower end face of the placing plate is provided with the supporting rod, the placing plate and the supporting plate 3 form a triangular supporting structure, the use stability of the motor 23 is improved, the middle position in the nut block 22 is provided with the threaded sleeve, the threaded sleeve is meshed with the screw rod 21, the nut block 22 can conveniently slide along the screw rod 21, the motor 23, the electric telescopic rod 24, the vacuum pump 29 and the ultrasonic vibrators 25 are connected with an external power supply through wires, the motor 23, the electric telescopic rod 24, the vacuum pump 29 and the ultrasonic vibrators 25 can conveniently receive external electric energy, the ultrasonic vibrators 25 are provided with a plurality of groups, the specifications of the plurality of ultrasonic vibrators 25 are the same, the nut block, and the multiple groups of vacuum suction cups 28 have the same specification, so that the monocrystalline silicon wafer can be conveniently cleaned by ultrasonic waves.
As an embodiment of the present invention: the monocrystalline silicon piece is firstly placed on the placing table 4, the electric telescopic rod 24 is electrified to drive the lifting plate 26, the vacuum pump 29 and the vacuum sucker 28 to integrally descend until the vacuum sucker 28 is adsorbed on the upper end face of the monocrystalline silicon piece, the vacuum pump 29 works, the connecting pipe 27 sucks air in the vacuum sucker 28, the vacuum sucker 28 is firmly adsorbed on the upper end face of the monocrystalline silicon piece, the motor 23 is electrified to drive the screw rod 21 to run, the nut block 22 moves from left to right along the screw rod 21 until the nut block moves right above the cleaning bucket 6, the electric telescopic rod 24 drives the lifting plate 26 to descend, the monocrystalline silicon piece is immersed in the cleaning bucket 6, and the ultrasonic vibrators 25 work to clean the monocrystalline silicon piece.
The basic principles and the main features of the invention and the advantages of the invention have been shown and described above, it will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, but that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (6)
1. The utility model provides an ultrasonic wave monocrystalline silicon piece washing tank, includes roof, convenient wiper mechanism, backup pad, places platform, bottom plate and washing fill, its characterized in that: the convenient cleaning mechanism comprises a bottom plate, a supporting plate, a top plate, a placing table, a cleaning bucket and a convenient cleaning mechanism, wherein the supporting plate is symmetrically arranged on the left side and the right side of the upper end surface of the bottom plate;
convenient wiper mechanism includes lead screw, nut piece, motor, electric telescopic handle, ultrasonic vibrator, lifter plate, connecting pipe, vacuum chuck and vacuum pump, the backup pad left end face upside is equipped with the motor, the lead screw is installed to motor right-hand member face, lead screw annular side-mounting has the nut piece, terminal surface is equipped with electric telescopic handle under the nut piece, electric telescopic handle lower extreme face is fixed with the lifter plate, lifter plate up end intermediate position is equipped with the vacuum pump, the connecting pipe is installed to vacuum pump left end face, vacuum chuck is installed to terminal surface under the lifter plate, the vacuum pump is connected with vacuum chuck through the connecting pipe, the ultrasonic vibrator is installed and is being washd the fill inner wall.
2. The ultrasonic monocrystalline silicon wafer cleaning tank according to claim 1, wherein: the cross-sectional area of the lifting plate is smaller than that of the cleaning hopper.
3. The ultrasonic monocrystalline silicon wafer cleaning tank according to claim 1, wherein: the motor lower end face is installed and is placed the board, place the board lower end face and install the bracing piece, and the bracing piece, place board and backup pad and constitute triangle bearing structure.
4. The ultrasonic monocrystalline silicon wafer cleaning tank according to claim 1, wherein: and a threaded sleeve is arranged in the middle of the inner part of the nut block and is meshed with the screw rod.
5. The ultrasonic monocrystalline silicon wafer cleaning tank according to claim 1, wherein: the motor, the electric telescopic rod, the vacuum pump and the ultrasonic vibrator are all connected with an external power supply through wires.
6. The ultrasonic monocrystalline silicon wafer cleaning tank according to claim 1, wherein: the ultrasonic vibrator is provided with a plurality of ultrasonic vibrators, the specifications of the ultrasonic vibrators are the same, the nut blocks are provided with two groups, the specifications of the two nut blocks are the same, the vacuum suction cups are provided with a plurality of groups, and the specifications of the plurality of groups of vacuum suction cups are the same.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921873971.1U CN210995606U (en) | 2019-11-01 | 2019-11-01 | Ultrasonic monocrystalline silicon wafer cleaning tank |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921873971.1U CN210995606U (en) | 2019-11-01 | 2019-11-01 | Ultrasonic monocrystalline silicon wafer cleaning tank |
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| Publication Number | Publication Date |
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| CN210995606U true CN210995606U (en) | 2020-07-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201921873971.1U Active CN210995606U (en) | 2019-11-01 | 2019-11-01 | Ultrasonic monocrystalline silicon wafer cleaning tank |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113503572A (en) * | 2021-06-30 | 2021-10-15 | 宁波方太厨具有限公司 | Self-cleaning protection system for protecting camera in range hood and cleaning method thereof |
| CN113649354A (en) * | 2021-10-18 | 2021-11-16 | 凯瑞电子(诸城)有限公司 | Controllable over-and-under type ultrasonic cleaning device of multistage |
| CN114669544A (en) * | 2022-03-30 | 2022-06-28 | 徐州中辉光伏科技有限公司 | Single crystal groove type alkali polishing cleaning machine |
-
2019
- 2019-11-01 CN CN201921873971.1U patent/CN210995606U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113503572A (en) * | 2021-06-30 | 2021-10-15 | 宁波方太厨具有限公司 | Self-cleaning protection system for protecting camera in range hood and cleaning method thereof |
| CN113503572B (en) * | 2021-06-30 | 2023-03-14 | 宁波方太厨具有限公司 | Self-cleaning protection system for protecting camera in range hood and cleaning method thereof |
| CN113649354A (en) * | 2021-10-18 | 2021-11-16 | 凯瑞电子(诸城)有限公司 | Controllable over-and-under type ultrasonic cleaning device of multistage |
| CN113649354B (en) * | 2021-10-18 | 2022-02-01 | 凯瑞电子(诸城)有限公司 | Controllable over-and-under type ultrasonic cleaning device of multistage |
| CN114669544A (en) * | 2022-03-30 | 2022-06-28 | 徐州中辉光伏科技有限公司 | Single crystal groove type alkali polishing cleaning machine |
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