CN210805808U - Even flow plate for etching groove and etching groove - Google Patents
Even flow plate for etching groove and etching groove Download PDFInfo
- Publication number
- CN210805808U CN210805808U CN201922351736.4U CN201922351736U CN210805808U CN 210805808 U CN210805808 U CN 210805808U CN 201922351736 U CN201922351736 U CN 201922351736U CN 210805808 U CN210805808 U CN 210805808U
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- etching
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- 238000005530 etching Methods 0.000 title claims abstract description 89
- 239000007788 liquid Substances 0.000 claims abstract description 141
- 239000003814 drug Substances 0.000 abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- 238000002347 injection Methods 0.000 abstract description 3
- 239000007924 injection Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a flow equalizing plate for an etching groove and the etching groove, which belong to the technical field of photovoltaic cell processing devices, the flow equalizing plate for the etching groove comprises a plate body, wherein a plurality of flow equalizing holes are formed on the plate body, each flow equalizing hole comprises a liquid inlet hole and a liquid outlet hole which are communicated with each other, and the area of the cross section of the liquid inlet hole is smaller than that of the cross section of the liquid outlet hole; the edge go out the liquid hole and keep away from the direction in feed liquor hole, go out the liquid hole and be the loudspeaker form of cross sectional area crescent. The utility model discloses make the hydraulic pressure of liquid outlet side be less than the hydraulic pressure of liquid inlet side, so set up, can make the liquid medicine enter into the sculpture inslot with the injection mode of formula of loosing for the liquid medicine is more even mixedly, thereby improves the sculpture inslot to the homogeneity of silicon chip sculpture.
Description
Technical Field
The utility model relates to a photovoltaic cell processingequipment technical field especially relates to an etching groove is with even flow board and etching groove.
Background
In the production flow of the photovoltaic cell, the silicon wafer needs to be cleaned, subjected to texturing, diffused, etched, printed, sintered and the like. The etching is used as an important process in the production of the photovoltaic cell, and the main function of the etching is to remove N-type silicon around the diffused silicon wafer and prevent electric leakage.
Generally, the etching process is performed in an etching bath of an etching apparatus. The etching tank is filled with etching liquid medicine. In order to ensure the uniformity of the liquid medicine in the etching tank, a flow-equalizing plate is generally arranged at the bottom of the etching tank, a plurality of flow-equalizing holes are formed in the flow-equalizing plate, and the liquid medicine passes through the flow-equalizing plate and then enters the etching tank, so that the uniformity of the liquid medicine in the etching tank is improved.
In the prior art, the uniform flow holes are round holes with unchanged section radiuses, and have the following disadvantages: when the liquid medicine at the liquid inlet side flows to the liquid outlet side, the flow velocity is slow, so that the uniform flow effect of the uniform flow plate is poor.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an etching groove is with uniform flow board and etching groove to solve the not good technical problem of uniform flow effect of the uniform flow board that exists among the prior art.
As the conception, the utility model adopts the technical proposal that:
a flow equalizing plate for an etching groove comprises a plate body, wherein a plurality of flow equalizing holes are formed in the plate body, each flow equalizing hole comprises a liquid inlet hole and a liquid outlet hole which are communicated with each other, and the area of the cross section of each liquid inlet hole is smaller than that of the cross section of each liquid outlet hole; the edge go out the liquid hole and keep away from the direction in feed liquor hole, go out the liquid hole and be the loudspeaker form of cross sectional area crescent.
Optionally, the cross sections of the liquid inlet hole and the liquid outlet hole are both circular;
the liquid inlet hole is a cylindrical hole, and the liquid outlet hole is a circular truncated cone-shaped hole.
Optionally, the diameter of the outlet end of the liquid outlet hole is two times to eight times the diameter of the liquid inlet hole.
Optionally, the cross sections of the liquid inlet hole and the liquid outlet hole are both of a runway type;
follow the length direction in even discharge orifice the both ends in feed liquor hole are provided with first circular arc portion the both ends in play liquid hole are provided with second circular arc portion, the radius of second circular arc portion is greater than the radius of first circular arc portion follows it keeps away from to go out the liquid hole the direction in feed liquor hole, the radius of second circular arc portion increases gradually.
Optionally, the uniform flow holes are provided with a plurality of uniform flow hole rows along a direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes along a direction of the other side edge of the uniform flow plate for the etching groove, and the uniform flow holes in two adjacent uniform flow hole rows correspond to one another.
Optionally, the cross sections of the liquid inlet hole and the liquid outlet hole are both quadrangles.
Optionally, the quadrilateral is a trapezoid;
the uniform flow holes are provided with a plurality of uniform flow hole rows along the direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes along the direction of the other side edge of the uniform flow plate for the etching groove, and the positions of the upper bottom edge and the lower bottom edge of the trapezoidal section of the uniform flow holes in the two adjacent uniform flow hole rows are opposite.
Optionally, the quadrilateral is a rhombus;
the uniform flow holes are provided with a plurality of uniform flow hole rows along the direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes along the direction of the other side edge of the uniform flow plate for the etching groove, and the uniform flow holes in the two adjacent uniform flow hole rows are staggered.
Optionally, the distance between two adjacent liquid outlet holes is 0.5-3.5 mm.
The etching groove is internally provided with the flow equalizing plate for the etching groove.
The utility model provides an etching is flow homogenizing plate and etching groove for groove, design the structure for the sectional type with flow homogenizing hole, flow direction along the liquid medicine, the cross-sectional area in feed liquor hole remains unchanged, go out the cross-sectional area crescent in liquid hole, make feed liquor hole and go out the hydraulic pressure difference that has between the liquid hole, when liquid medicine is carried to the feed liquor hole via the pump integument, the cross-sectional area in feed liquor hole is less than the cross-sectional area in liquid hole, make the hydraulic pressure of liquid hole side be less than the hydraulic pressure of feed liquor hole side, so set up, can make the liquid medicine enter into the etching inslot fast with the injection mode of distributing type, make the liquid medicine mix ground more even, thereby improve the homogeneity to the silicon chip sculpture inslot.
Drawings
FIG. 1 is a cross-sectional view of a uniform flow plate for an etching tank according to an embodiment of the present invention;
FIG. 2 is a right side view of the flow distribution plate for etching grooves of FIG. 1;
fig. 3 is a cross-sectional view of a uniform flow plate for an etching tank according to a second embodiment of the present invention;
fig. 4 is a schematic structural view of a flow equalizer for an etching tank according to a third embodiment of the present invention, when the flow equalizer is viewed from a liquid outlet to a liquid inlet;
fig. 5 is a schematic structural view of the flow equalizing plate for an etching tank according to the fourth embodiment of the present invention, when the flow equalizing plate is seen from the liquid outlet direction to the liquid inlet direction;
fig. 6 is a schematic structural view of a flow equalizer for an etching tank according to an embodiment of the present invention, when the flow equalizer is seen from the liquid outlet direction to the liquid inlet direction.
In the figure:
1. a plate body;
2. flow homogenizing holes; 21. a liquid inlet hole; 22. a liquid outlet hole;
3. and (7) installing holes.
Detailed Description
In order to make the technical problem solved by the present invention, the technical solution adopted by the present invention and the technical effect achieved by the present invention clearer, the technical solution of the present invention will be further explained by combining the drawings and by means of the specific implementation manner. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some but not all of the elements related to the present invention are shown in the drawings.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Wherein the terms "first position" and "second position" are two different positions.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection or a removable connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Example one
Referring to fig. 1 and fig. 2, the embodiment provides a flow equalizing plate for an etching tank, the flow equalizing plate for an etching tank includes a plate body 1, a plurality of flow equalizing holes 2 are formed in the plate body 1, the flow equalizing holes 2 include a liquid inlet hole 21 and a liquid outlet hole 22 which are communicated with each other, and the area of the cross section of the liquid inlet hole 21 is smaller than that of the cross section of the liquid outlet hole 22; the cross-sectional area of the outlet opening 22 increases gradually in the direction in which the outlet opening 22 is distant from the inlet opening 21. That is, when the etching bath is installed in the etching bath with the uniform flow plate, the opening area of the liquid outlet 22 in the direction toward the silicon wafer in the etching bath gradually increases.
Design even discharge orifice 2 for the structure of sectional type in this embodiment, thereby can set up the structure of different sections well, make the cross-sectional area of feed liquor hole 21 be less than out liquid hole 22's cross-sectional area, thereby the hydraulic pressure that goes out liquid hole 22 side is less than the hydraulic pressure of feed liquor hole 21 side, form the hydraulic pressure difference between feed liquor hole 21 and play liquid hole 22, when liquid medicine is carried to feed liquor hole 21 via the pump body, the cross-sectional area of feed liquor hole 21 is less than out liquid hole 22's cross-sectional area, make the hydraulic pressure that goes out liquid hole 22 side be less than the hydraulic pressure of feed liquor hole 21 side, so set up, can make the liquid medicine enter into the sculpture inslot with the injection mode of formula of loosing, make the liquid medicine mix ground more even, thereby improve the.
Specifically, in this embodiment, the cross-sections of the liquid inlet hole 21 and the liquid outlet hole 22 are both circular, the liquid inlet hole 21 is a cylindrical hole, and the liquid outlet hole 22 is a circular truncated cone-shaped hole, which facilitates manufacturing and processing. Optionally, the diameter of the outlet end of the liquid outlet hole 22 is two to eight times the diameter of the liquid inlet hole 21, i.e. the diameter of the large end face of the liquid outlet hole 22 is two to eight times, such as two, three, four, five, six, seven, eight times, optionally four times, the diameter of the small end face thereof.
Preferably, in the present embodiment, the dimension of the liquid inlet hole 21 along the axial direction thereof is greater than or equal to the dimension of the liquid outlet hole 22 along the axial direction thereof. The liquid inlet hole 21 has the function of narrowing the initial flow channel of the liquid medicine, the liquid outlet hole has the function of widening the flow channel outlet of the liquid medicine, the size of the liquid inlet hole 21 in the axial direction is set to be larger than or equal to the size of the liquid outlet hole 22 in the axial direction, the liquid medicine can store enough kinetic energy in the liquid inlet hole 21, and when the liquid medicine enters the liquid outlet hole 22, the liquid medicine can be rapidly sprayed out.
Optionally, in order to accelerate the flow rate of the liquid medicine in the liquid outlet hole 22, so as to enable the liquid medicine to be rapid and uniform, a plurality of saw teeth portions arranged along the axial direction of the liquid outlet hole 22 may be disposed on the inner wall of the liquid outlet hole 22, preferably, the saw teeth portions are annular, and the cross sections of the saw teeth portions are triangular or trapezoidal, so that the area of the cross section of the liquid outlet hole 22 on the top of each ring saw tooth portion is smaller than the area of the cross section of the liquid outlet hole 22 on the bottom of the ring saw tooth portion, that is, the top of each ring saw tooth portion can play a role of narrowing the flow channel, thereby further accelerating the flow rate of the liquid medicine in the liquid outlet.
Specifically, a plurality of uniform flow holes 2 are arranged along the direction of one side edge of the uniform flow plate for the etching groove, a plurality of uniform flow holes 2 form a uniform flow hole array, and a plurality of uniform flow hole arrays are arranged along the direction of the other side edge of the uniform flow plate for the etching groove. That is, the etching groove is arranged in an array by the uniform flow holes on the uniform flow plate.
In order to install the etching groove with the uniform flow plate into the etching groove, the plate body 1 is further provided with a mounting hole 3. When in installation, the bolt penetrates through the installation hole 3 to install the etching groove into the etching groove by using the uniform flow plate. Preferably, the mounting holes 3 are threaded holes, so that the mounting of the flow equalizing plate for the etching groove is more reliable. Optionally, a positioning hole may be further formed in the plate body 1, the plate body 1 is positioned first, and then the plate body 1 is mounted.
Example two
Referring to fig. 3, the present embodiment provides a uniform flow plate for an etching tank, which is different from the first embodiment in that the cross sections of the liquid inlet 21 and the liquid outlet 22 are both quadrilateral.
Specifically, the cross sections of the liquid inlet hole 21 and the liquid outlet hole 22 are both rectangular. That is, the uniform flow holes 2 are strip-shaped holes and are closely arranged on the plate body 1 according to an array so as to ensure the utilization rate of the plate body 1.
Optionally, the length of the liquid inlet hole 21 is two to ten times its width to ensure a uniform flow effect. Generally, the wider the flow channel, the less the flow velocity of the liquid within the flow channel. The length of the liquid inlet hole is set to be two to ten times of the width of the liquid inlet hole, and the larger the multiple is, the better the multiple is. The larger the multiple of the length to the width is, the narrower the flow channel of the liquid inlet hole 21 is, the faster the flow velocity of the liquid medicine is, and the better the uniform flow effect can be achieved.
Further, the liquid inlet 21 is rectangular, and the liquid outlet 22 is rectangular. Namely, when the etching groove is arranged in the etching groove by the uniform flow plate, the large-size bottom surface of the quadrangular frustum faces the silicon wafer.
Other features in this embodiment are the same as those in the first embodiment, and are not described again here.
EXAMPLE III
Referring to fig. 4, the present embodiment provides a uniform flow plate for an etching bath, which is different from the first embodiment in that the cross sections of the liquid inlet hole 21 and the liquid outlet hole 22 are both of a runner type.
Specifically, along the length direction of even discharge orifice 2, be provided with first circular arc portion at the both ends of feed liquor hole 21, be provided with second circular arc portion at the both ends of going out liquid hole 22, the radius of second circular arc portion is greater than the radius of first circular arc portion, and along the direction of going out liquid hole 22 and keeping away from feed liquor hole 21, the radius of second circular arc portion increases gradually. The arrangement of the first arc part and the second arc part can improve the flow velocity and the uniformity at two ends of the uniform flow hole 2, and the problem of poor uniformity of corners of the uniform flow hole 2 can not be generated.
The uniform flow holes 2 are provided with a plurality of uniform flow hole rows along the direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes 2 along the direction of the other side edge of the uniform flow plate for the etching groove, and the uniform flow holes 2 in two adjacent uniform flow hole rows are in one-to-one correspondence.
Referring to fig. 4, a plurality of uniform flow hole rows are arranged along the length direction of the uniform flow plate for the etching groove shown in fig. 4, each uniform flow hole row is provided with a plurality of uniform flow holes 2 along the width direction, the uniform flow holes 2 in two adjacent uniform flow hole rows correspond to each other one by one, that is, the uniform flow holes 2 in two adjacent uniform flow hole rows have the same shape and are arranged in alignment.
Preferably, the distance between two adjacent liquid outlet holes 22 is 0.5-3.5 mm. In fig. 4, the distance between two adjacent liquid outlet holes 22 is represented by a, and the strength of the plate body 1 can be maintained without damaging the distance while ensuring the opening ratio of the plate body 1.
Optionally, in this embodiment, the width of the liquid outlet hole 2 is 1-3cm, so as to prevent the influence of too large or too small width of the liquid outlet hole 2 on the uniform flow effect. The width of the exit opening 2 is indicated by b in fig. 4.
Other features in this embodiment are the same as those in the first embodiment, and are not described again here.
Example four
Referring to fig. 5, the present embodiment provides a uniform flow plate for an etching tank, which is different from the first embodiment in that the cross sections of the liquid inlet 21 and the liquid outlet 22 are both quadrilateral.
Specifically, the cross sections of the liquid inlet hole 21 and the liquid outlet hole 22 are both diamond-shaped.
The uniform flow holes 2 are provided with a plurality of uniform flow hole rows along the direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes 2 along the direction of the other side edge of the uniform flow plate for the etching groove, and the uniform flow holes of two adjacent rows of uniform flow hole rows are staggered.
The etching groove uniform flow plate shown in fig. 5 is explained, a plurality of uniform flow hole rows are provided along the width direction of the etching groove uniform flow plate in fig. 5, a plurality of uniform flow holes 2 are provided in each uniform flow hole row along the length direction of the etching groove uniform flow plate, and the uniform flow holes in two adjacent uniform flow hole rows are arranged in a staggered manner.
The left-most uniform flow hole row is called a first uniform flow hole row, and a row of uniform flow hole rows adjacent to the first uniform flow hole row is called a second uniform flow hole row; the even discharge orifice of first even discharge orifice row and second even discharge orifice row staggers the setting to make a plurality of even discharge orifice 2 arrange densely, improve the utilization ratio to plate body 1.
Other features in this embodiment are the same as those in the first embodiment, and are not described again here.
EXAMPLE five
Referring to fig. 6, the present embodiment provides a uniform flow plate for an etching tank, which is different from the first embodiment in that the cross sections of the liquid inlet 21 and the liquid outlet 22 are both quadrilateral.
Specifically, in the present embodiment, the cross sections of the liquid inlet hole 21 and the liquid outlet hole 22 are both trapezoidal; the uniform flow holes 2 are provided with a plurality of uniform flow hole rows along the direction of one side edge of the uniform flow plate for the etching groove, each uniform flow hole row is provided with a plurality of uniform flow holes 2 along the direction of the other side edge of the uniform flow plate for the etching groove, and the positions of the upper bottom edge and the lower bottom edge of the trapezoidal section of the uniform flow holes 2 of two adjacent rows of the uniform flow hole rows are opposite.
The etching groove shown in fig. 6 is explained by using a uniform flow plate. A plurality of uniform flow hole rows are provided along the width direction of the etching groove uniform flow plate in fig. 6, and a plurality of uniform flow holes 2 are provided in each of the uniform flow hole rows along the length direction of the etching groove uniform flow plate.
The left-most uniform flow hole row is called a first uniform flow hole row, and a row of uniform flow hole rows adjacent to the first uniform flow hole row is called a second uniform flow hole row; in the first row of uniform flow hole rows, the lower bottom edge of the trapezoidal section of the uniform flow hole 2 is below the upper bottom edge; in the second uniform flow hole array, the lower bottom edge of the trapezoidal section of the uniform flow holes 2 is above the upper bottom edge, so that the plurality of uniform flow holes 2 are densely arranged, and the utilization rate of the plate body 1 is improved.
Other features in this embodiment are the same as those in the first embodiment, and are not described again here.
EXAMPLE six
The embodiment provides an etching groove, wherein the flow equalizing plate for the etching groove is arranged in the etching groove.
The above embodiments have been described only the basic principles and features of the present invention, and the present invention is not limited by the above embodiments, and is not departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. A flow equalizing plate for an etching groove comprises a plate body (1), wherein a plurality of flow equalizing holes (2) are formed in the plate body (1), and the flow equalizing plate is characterized in that the flow equalizing holes (2) comprise a liquid inlet hole (21) and a liquid outlet hole (22) which are communicated with each other, and the area of the cross section of the liquid inlet hole (21) is smaller than that of the cross section of the liquid outlet hole (22); follow go out liquid hole (22) and keep away from the direction of feed liquor hole (21), go out liquid hole (22) and be the loudspeaker form that cross sectional area crescent.
2. The flow distribution plate for etching grooves according to claim 1, wherein the cross-sections of the liquid inlet hole (21) and the liquid outlet hole (22) are circular;
the liquid inlet hole (21) is a cylindrical hole, and the liquid outlet hole (22) is a circular truncated cone-shaped hole.
3. The flow distribution plate for etching grooves according to claim 2, wherein the diameter of the outlet end of the liquid outlet hole (22) is two to eight times the diameter of the liquid inlet hole (21).
4. The flow distribution plate for etching grooves of claim 1, wherein the cross-sections of the liquid inlet hole (21) and the liquid outlet hole (22) are both of a runner type;
follow the length direction of even discharge orifice (2) the both ends of feed liquor hole (21) are provided with first circular arc portion the both ends of going out liquid hole (22) are provided with second circular arc portion, the radius of second circular arc portion is greater than the radius of first circular arc portion follows it keeps away from to go out liquid hole (22) the direction of feed liquor hole (21), the radius of second circular arc portion increases gradually.
5. The flow distribution plate for the etching groove according to any one of claims 1 to 4, wherein the flow distribution hole (2) is provided with a plurality of flow distribution hole rows along a direction of one side edge of the flow distribution plate for the etching groove, each flow distribution hole row is provided with a plurality of flow distribution holes (2) along a direction of the other side edge of the flow distribution plate for the etching groove, and the flow distribution holes (2) in two adjacent flow distribution hole rows are in one-to-one correspondence.
6. The flow distribution plate for etching grooves according to claim 1, wherein the cross-sections of the liquid inlet hole (21) and the liquid outlet hole (22) are both quadrilateral.
7. The flow distribution plate for etching grooves according to claim 6, wherein the quadrangle is trapezoidal;
even discharge orifice (2) are provided with a plurality of even discharge orifice row along the direction of one side edge of even flow plate for the sculpture groove, follow the direction of another side edge of even flow plate for the sculpture groove, every even discharge orifice row is provided with a plurality of even discharge orifice (2), and adjacent two are even discharge orifice row's the position of the last base and the bottom base of the trapezoidal cross-section of even discharge orifice (2) is opposite.
8. The flow distribution plate for etching grooves according to claim 6, wherein the quadrangle is a rhombus;
even discharge orifice (2) are provided with a plurality of even discharge orifice row along the direction of one side edge of even flow plate for the sculpture groove, follow the direction of another side edge of even flow plate for the sculpture groove, every even discharge orifice row is provided with a plurality of even discharge orifice (2), adjacent two even discharge orifice row even discharge orifice stagger and set up.
9. The flow distribution plate for etching grooves of claim 4, wherein the distance between two adjacent liquid outlet holes (22) is 0.5-3.5 mm.
10. An etching tank, wherein the etching tank is provided with the flow equalizing plate for etching tank according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922351736.4U CN210805808U (en) | 2019-12-24 | 2019-12-24 | Even flow plate for etching groove and etching groove |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922351736.4U CN210805808U (en) | 2019-12-24 | 2019-12-24 | Even flow plate for etching groove and etching groove |
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| Publication Number | Publication Date |
|---|---|
| CN210805808U true CN210805808U (en) | 2020-06-19 |
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|---|---|---|---|
| CN201922351736.4U Expired - Fee Related CN210805808U (en) | 2019-12-24 | 2019-12-24 | Even flow plate for etching groove and etching groove |
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| CN (1) | CN210805808U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115261863A (en) * | 2022-08-02 | 2022-11-01 | 扬州国宇电子有限公司 | Metal particle corrosion liquid for fast recovery diode and metal corrosion method |
-
2019
- 2019-12-24 CN CN201922351736.4U patent/CN210805808U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115261863A (en) * | 2022-08-02 | 2022-11-01 | 扬州国宇电子有限公司 | Metal particle corrosion liquid for fast recovery diode and metal corrosion method |
| CN115261863B (en) * | 2022-08-02 | 2024-03-26 | 扬州国宇电子有限公司 | Metal particle corrosive liquid for fast recovery diode and metal corrosion method |
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Address after: No. 199, deer mountain road, Suzhou high tech Zone, Jiangsu Province Patentee after: CSI Cells Co.,Ltd. Patentee after: Atlas sunshine Power Group Co.,Ltd. Address before: No. 199, deer mountain road, Suzhou high tech Zone, Jiangsu Province Patentee before: CSI Cells Co.,Ltd. Patentee before: CSI SOLAR POWER GROUP Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200619 Termination date: 20211224 |
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| CF01 | Termination of patent right due to non-payment of annual fee |