CN218951487U - Cavity cover plate and coating equipment - Google Patents

Cavity cover plate and coating equipment Download PDF

Info

Publication number
CN218951487U
CN218951487U CN202320023922.9U CN202320023922U CN218951487U CN 218951487 U CN218951487 U CN 218951487U CN 202320023922 U CN202320023922 U CN 202320023922U CN 218951487 U CN218951487 U CN 218951487U
Authority
CN
China
Prior art keywords
cover plate
gas distribution
main body
cavity
plate main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202320023922.9U
Other languages
Chinese (zh)
Inventor
张勇
王正杰
王应斌
满小花
贾永建
赖智勇
左庆
覃鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Headquarter SC New Energy Technology Corp
Original Assignee
Shenzhen Headquarter SC New Energy Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Headquarter SC New Energy Technology Corp filed Critical Shenzhen Headquarter SC New Energy Technology Corp
Priority to CN202320023922.9U priority Critical patent/CN218951487U/en
Application granted granted Critical
Publication of CN218951487U publication Critical patent/CN218951487U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The utility model discloses a cavity cover plate and coating equipment, the cavity cover plate comprises: a cover plate main body; the gas distribution assembly is arranged on one side of the cover plate main body and comprises a plurality of gas distribution plates which are arranged in parallel along the thickness direction of the cover plate main body at intervals, a buffer cavity is formed between the gas distribution plate closest to the cover plate main body and the cover plate main body, a buffer cavity is also formed between every two adjacent gas distribution plates, and a plurality of gas distribution holes are formed in each gas distribution plate; and the vacuum breaking device is arranged on the cover plate main body and is used for filling gas into the buffer cavity between the gas distribution plate closest to the cover plate main body and the cover plate main body. The cavity apron of practicality can reduce the fragmentation rate of silicon chip.

Description

Cavity cover plate and coating equipment
Technical Field
The utility model relates to the technical field of coating equipment, in particular to a cavity cover plate and coating equipment.
Background
In photovoltaic vacuum coating equipment, the fragmentation rate is one of the important criteria for checking whether an equipment is acceptable. With the continuous development of photovoltaic technology, the thickness of the silicon wafer is reduced continuously, and the silicon wafer is thinned and the breakage rate is increased.
In the RPD (Reactive Plasma Deposition) coating equipment, after the vacuum coating of the coating cavity is completed, the silicon wafer is subjected to vacuum breaking operation in the ULC (Unloading chamber, unloading cavity), and at the moment, the atmosphere rapidly enters the ULC through the air inlet hole of the cover plate. When the vacuum is broken, the silicon wafer is easily broken under the impact of the atmosphere due to the impact of external air flow, so that the breaking rate is increased, and the quality of the whole equipment is further affected.
Disclosure of Invention
The present utility model aims to solve at least one of the technical problems existing in the prior art. Therefore, the utility model provides the cavity cover plate which can reduce the breaking rate of the silicon wafer.
The utility model also provides a film plating device with the cavity cover plate.
According to an embodiment of the first aspect of the present utility model, a cavity cover plate includes: a cover plate main body; the gas distribution assembly is arranged on one side of the cover plate main body and comprises a plurality of gas distribution plates which are arranged in parallel along the thickness direction of the cover plate main body at intervals, a buffer cavity is formed between the gas distribution plate closest to the cover plate main body and the cover plate main body, a buffer cavity is also formed between every two adjacent gas distribution plates, and a plurality of gas distribution holes are formed in each gas distribution plate; and the vacuum breaking device is arranged on the cover plate main body and is used for filling gas into the buffer cavity between the gas distribution plate closest to the cover plate main body and the cover plate main body.
The cavity cover plate provided by the embodiment of the utility model has at least the following beneficial effects:
the cavity cover plate is used in coating equipment and can seal ULC, when the ULC needs to be subjected to vacuum breaking, the vacuum breaking device can be used for filling gas into the buffer cavity between the gas distribution plate and the cover plate main body, so that the gas flows to each buffer cavity through the gas distribution holes of each gas distribution plate, and then enters the ULC from the gas distribution holes on the gas distribution plate farthest from the cover plate main body, and the purpose of breaking the vacuum of the ULC is achieved. In the cavity cover plate, the number of the gas distribution plates is multiple, so that the multiple gas distribution plates can achieve the effect of multi-layer buffering on gas, and each gas distribution plate is provided with the multiple gas distribution holes, so that the pressure difference can be reduced in a multi-point layered gas inlet mode, the flow speed and the impact force of the gas flow are reduced, the risk of damaging silicon chips in ULC is reduced, and the fragmentation rate is reduced.
According to some embodiments of the utility model, in two adjacent gas distribution plates, the gas distribution holes on one gas distribution plate are staggered with the gas distribution holes on the other gas distribution plate.
According to some embodiments of the present utility model, a plurality of supporting members are disposed in each buffer chamber at intervals, and the plurality of supporting members are used for supporting the air distribution plate together.
According to some embodiments of the utility model, in the adjacent two buffer chambers, the plurality of supporting members of one buffer chamber are connected to the plurality of supporting members of the other buffer chamber in a one-to-one correspondence.
According to some embodiments of the utility model, one end of the supporting member is provided with a positioning protrusion, the other end is provided with a positioning hole, and in the two mutually connected supporting members, the positioning protrusion of one supporting member is penetrated in the positioning hole of the other supporting member.
According to some embodiments of the utility model, the air distribution plate is further provided with a first assembly hole through which the positioning protrusion passes.
According to some embodiments of the utility model, a second assembly hole is formed in a side, close to the air distribution plate, of the cover plate main body, and the support piece formed in the buffer cavity between the cover plate main body and the air distribution plate is arranged in the second assembly hole in a penetrating manner.
According to some embodiments of the utility model, a baffle is further provided around each buffer chamber.
According to some embodiments of the utility model, an inflation inlet is formed in one side, away from the air distribution assembly, of the cover plate main body, and the vacuum breaking device comprises an inflation tube communicated with the inflation inlet.
The coating equipment according to the embodiment of the second aspect of the utility model comprises the cavity cover plate.
The cavity cover plate is used in coating equipment and can seal ULC, when the ULC needs to be subjected to vacuum breaking, the vacuum breaking device can be used for filling gas into the buffer cavity between the gas distribution plate and the cover plate main body, so that the gas flows to each buffer cavity through the gas distribution holes of each gas distribution plate, and then enters the ULC from the gas distribution holes on the gas distribution plate farthest from the cover plate main body, and the purpose of breaking the vacuum of the ULC is achieved. In the cavity cover plate, the number of the gas distribution plates is multiple, so that the multiple gas distribution plates can achieve the effect of multi-layer buffering on gas, and each gas distribution plate is provided with the multiple gas distribution holes, so that the pressure difference can be reduced in a multi-point layered gas inlet mode, the flow speed and the impact force of the gas flow are reduced, the risk of damaging silicon chips in ULC is reduced, and the fragmentation rate is reduced.
Additional aspects and advantages of the utility model will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the utility model.
Drawings
The utility model is further described with reference to the accompanying drawings and examples, in which:
FIG. 1 is a schematic view of a cavity cover plate according to an embodiment of the present utility model;
FIG. 2 is a schematic diagram showing a partial cross-sectional structure of a chamber cover plate according to an embodiment of the present utility model;
FIG. 3 is a schematic view of an exploded view of a gas distribution assembly according to one embodiment of the present utility model;
FIG. 4 is a schematic diagram showing a partial cross-sectional structure of a cavity cover plate according to an embodiment of the present utility model;
fig. 5 is a schematic view of a partial enlarged structure at a in fig. 4.
Reference numerals:
100. a cover plate main body; 101. an inflation inlet; 102. a second fitting hole;
200. a gas distribution assembly; 201. a buffer chamber; 210. an air distribution plate; 211. air holes are distributed; 212. a first fitting hole; 220. a support; 221. positioning the convex; 222. positioning holes; 230. a surrounding baffle;
300. breaking a vacuum device; 310. and (5) an inflation tube.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the utility model.
In the description of the present utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present utility model and to simplify the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present utility model. Furthermore, features defining "first", "second" may include one or more such features, either explicitly or implicitly. In the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
As shown in fig. 1, an embodiment of the present utility model relates to a cavity cover plate, which is used in an RPD coating apparatus and can seal a ULC.
Of course, in other embodiments, the cavity cover plate of the present utility model may also be applied to other devices.
As shown in fig. 1 and 2, the chamber cover plate includes a cover plate main body 100, a gas distribution assembly 200, and a vacuum breaking device 300.
The cover main body 100 has a plate-like structure.
The cover plate main body 100 may have a square structure or a circular structure, and the shape of the cover plate main body 100 may be designed according to actual requirements.
The air distribution assembly 200 is disposed on one side of the cover plate main body 100, the air distribution assembly 200 includes a plurality of air distribution plates 210 arranged in parallel and at intervals along the thickness direction of the cover plate main body 100, a buffer cavity 201 is formed between the air distribution plate 210 closest to the cover plate main body 100 and the cover plate main body 100, and a buffer cavity 201 is also formed between every two adjacent air distribution plates 210.
Specifically, the gas distribution assembly 200 is disposed on the lower side of the cover plate body 100, the gas distribution assembly 200 includes a plurality of gas distribution plates 210, the plurality of gas distribution plates 210 are juxtaposed and spaced apart along the thickness direction of the cover plate body 100, and one gas distribution plate 210 closest to the cover plate body 100 is also juxtaposed and spaced apart from the cover plate body 100. In this way, a buffer chamber 201 is formed between the gas distribution plate 210 closest to the cover plate main body 100 and the cover plate main body 100, and a buffer chamber 201 is also formed between every two adjacent gas distribution plates 210.
It should be noted that, a fence 230 is disposed around each buffer chamber 201, and the fence 230 is used to block around the buffer chamber 201. In addition, the enclosure 230 also serves to connect the plurality of air distribution plates 210, so that the plurality of air distribution plates 210 are fixed.
Specifically, a fence 230 is disposed between the cover main body 100 and the gas distribution plate 210 closest to the cover main body 100, the fence 230 serves to connect the gas distribution plate 210 to the cover main body 100, and a fence 230 is also disposed between every two adjacent gas distribution plates 210, so that each gas distribution plate 210 is connected together and fixed to the cover main body 100.
As can be understood from fig. 2 and fig. 3, each air distribution plate 210 is provided with a plurality of air distribution holes 211, and the air distribution holes 211 can be ventilated, so that all the buffer cavities 201 are communicated under the action of the air distribution holes 211 of each air distribution plate 210.
Referring to fig. 1 and 2, a vacuum breaking device 300 is disposed on the cover main body 100, and the vacuum breaking device 300 is used for filling gas into the buffer chamber 201 between the gas distribution plate 210 closest to the cover main body 100 and the cover main body 100.
In particular, the vacuum breaking device 300 is used to break a vacuum on the ULC, i.e., to break the vacuum environment of the ULC. Specifically, after the vacuum breaking device 300 fills the buffer chamber 201 between the air distribution plate 210 and the cover plate main body 100 with air, the air flows to each buffer chamber 201 through the air distribution holes 211 of each air distribution plate 210, and then enters the ULC from the air distribution holes 211 on the air distribution plate 210 farthest from the cover plate main body 100, so as to achieve the purpose of breaking vacuum of the ULC.
It should be noted that, a through hole may be formed in the enclosure 230, so that the gas in the buffer chamber 201 may enter the ULC through the through hole of the enclosure 230.
The cavity cover plate is used in RPD coating equipment and can seal ULC, when the ULC needs to be broken in vacuum, the vacuum breaking device 300 can be utilized to charge air into the buffer cavity 201 between the air distribution plate 210 and the cover plate main body 100, so that the air flows into each buffer cavity 201 through the air distribution holes 211 of each air distribution plate 210, and then enters the ULC from the air distribution holes 211 on the air distribution plate 210 furthest from the cover plate main body 100, thereby achieving the purpose of breaking the vacuum of the ULC. In the cavity cover plate of the present utility model, since the number of the gas distribution plates 210 is plural, the plural gas distribution plates 210 can achieve a multilayer buffering effect on the gas, and since each gas distribution plate 210 has plural gas distribution holes 211, the pressure difference can be reduced by a multi-point layered gas inlet mode, the flow velocity and impact force of the gas flow can be reduced, thereby reducing the risk of damaging the silicon wafer in the ULC and reducing the fragmentation rate.
The number of the air distribution plates 210 is two or more, and in this embodiment, the number of the air distribution plates 210 is 3.
Referring to fig. 2 and 3, in one embodiment, in two adjacent gas distribution plates 210, gas distribution holes 211 on one gas distribution plate 210 are staggered from gas distribution holes 211 on the other gas distribution plate 210. Thus, the air flow which is concentrated and high in speed is blocked by the air distribution plate 210 to be scattered when rushing to the lower layer, so that the risk that the high-speed and concentrated air flow directly impacts the silicon wafer is reduced, and the breaking rate is reduced.
In the adjacent two gas distribution plates 210, the staggered arrangement of the gas distribution holes 211 on one gas distribution plate 210 and the gas distribution holes 211 on the other gas distribution plate 210 means that the gas distribution holes 211 of the gas distribution plate 210 located above and the gas distribution holes 211 of the gas distribution plate 210 located below are avoided from each other. The arrangement of the air distribution holes 211 of each air distribution plate 210 is shown in fig. 3, however, in other embodiments, the arrangement of the air distribution holes 211 of each air distribution plate 210 may also be changed according to specific requirements.
As shown in fig. 2, in one embodiment, a plurality of supporting members 220 are disposed in each buffer cavity 201 at intervals, and the plurality of supporting members 220 are used for supporting the air distribution plate 210 together, so as to reduce the risk of deformation of the air distribution plate 210 under the impact of air flow.
Specifically, each buffer chamber 201 is provided with two rows of supports 220, the two rows of supports 220 are spaced apart and disposed, and each row of supports 220 includes 3 supports 220.
It should be noted that the number of the supporting members 220 in each buffer chamber 201 may be set according to the specific situation.
As shown in fig. 4 and 5, further, in the adjacent two buffer chambers 201, the plurality of supporting members 220 of one buffer chamber 201 are connected to the plurality of supporting members 220 of the other buffer chamber 201 in a one-to-one correspondence. In this way, the stability of each support 220 may be improved, thereby increasing the stability of the gas distribution plate 210, further reducing the risk of deformation of the gas distribution plate 210 under the impact of the gas flow.
Specifically, one end of the supporting member 220 is provided with a positioning protrusion 221, and the other end is provided with a positioning hole 222, and in the two supporting members 220 connected to each other, the positioning protrusion 221 of one supporting member 220 is inserted into the positioning hole 222 of the other supporting member 220.
Further, the air distribution plate 210 is further provided with a first assembly hole 212 through which the positioning protrusion 221 penetrates, and the first assembly hole 212 has an avoidance function on one hand and a positioning function on the other hand, so that the air distribution plate 210 and the supporting piece 220 are positioned.
Further, the cover main body 100 is provided with a second assembly hole 102 at a side close to the air distribution plate 210, and the supporting member 220 in the buffer cavity 201 formed between the cover main body 100 and the air distribution plate 210 is inserted into the second assembly hole 102, so that the supporting member 220 and the cover main body 100 can be positioned.
Wherein the first assembly hole 212 is a through hole, and the second assembly hole 102 is a blind hole.
Referring to fig. 1 and 2, in one embodiment, an inflation port 101 is disposed on a side of the cover main body 100 away from the gas distribution assembly 200, and the vacuum breaking device 300 includes an inflation tube 310 that communicates with the inflation port 101, so that gas can enter into each buffer chamber 201 through the inflation tube 310.
Further, the number of the air charging ports 101 is plural, the air charging tube 310 is provided with a plurality of air outlets, and the air outlets are communicated with the air charging ports 101 in a one-to-one correspondence manner, so that multi-point air inlet can be realized, and the air flow is more gentle and uniform.
The utility model also relates to a coating device comprising the cavity cover plate.
Wherein, the coating equipment can be RPD coating equipment.
The cavity cover plate is used in RPD coating equipment and can seal ULC, when the ULC needs to be broken in vacuum, the vacuum breaking device 300 can be utilized to charge air into the buffer cavity 201 between the air distribution plate 210 and the cover plate main body 100, so that the air flows into each buffer cavity 201 through the air distribution holes 211 of each air distribution plate 210, and then enters the ULC from the air distribution holes 211 on the air distribution plate 210 furthest from the cover plate main body 100, thereby achieving the purpose of breaking the vacuum of the ULC. In the cavity cover plate of the present utility model, since the number of the gas distribution plates 210 is plural, the plural gas distribution plates 210 can achieve a multilayer buffering effect on the gas, and since each gas distribution plate 210 has plural gas distribution holes 211, the pressure difference can be reduced by a multi-point layered gas inlet mode, the flow velocity and impact force of the gas flow can be reduced, thereby reducing the risk of damaging the silicon wafer in the ULC and reducing the fragmentation rate.
In the description of the present specification, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the utility model. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present utility model have been shown and described, it will be understood by those of ordinary skill in the art that: many changes, modifications, substitutions and variations may be made to the embodiments without departing from the spirit and principles of the utility model, the scope of which is defined by the claims and their equivalents.

Claims (10)

1. A cavity cover plate, comprising:
a cover plate main body;
the gas distribution assembly is arranged on one side of the cover plate main body and comprises a plurality of gas distribution plates which are arranged in parallel along the thickness direction of the cover plate main body at intervals, a buffer cavity is formed between the gas distribution plate closest to the cover plate main body and the cover plate main body, a buffer cavity is also formed between every two adjacent gas distribution plates, and a plurality of gas distribution holes are formed in each gas distribution plate; and
the vacuum breaking device is arranged on the cover plate main body and is used for filling gas into the buffer cavity between the gas distribution plate closest to the cover plate main body and the cover plate main body.
2. The cavity cover plate according to claim 1, wherein in two adjacent gas distribution plates, the gas distribution holes on one gas distribution plate are staggered from the gas distribution holes on the other gas distribution plate.
3. The cavity cover plate according to claim 1, wherein a plurality of supporting members are arranged in each buffer cavity at intervals, and the plurality of supporting members are used for supporting the air distribution plate together.
4. A cavity cover plate according to claim 3, wherein in two adjacent buffer cavities, the plurality of supporting members of one buffer cavity are connected with the plurality of supporting members of the other buffer cavity in a one-to-one correspondence.
5. The cavity cover plate according to claim 4, wherein one end of the supporting member is provided with a positioning protrusion, and the other end is provided with a positioning hole, and the positioning protrusion of one supporting member is penetrated in the positioning hole of the other supporting member in the two mutually connected supporting members.
6. The cavity cover plate according to claim 5, wherein the air distribution plate is further provided with a first assembly hole through which the positioning protrusion passes.
7. A cavity cover plate according to claim 3, wherein a second assembly hole is formed in a side of the cover plate main body, which is close to the air distribution plate, and the support member formed in the buffer cavity between the cover plate main body and the air distribution plate is inserted into the second assembly hole.
8. The cavity cover plate according to claim 1, wherein a fence is further provided around each buffer cavity.
9. The cavity cover plate according to claim 1, wherein an inflation port is formed in one side of the cover plate main body away from the air distribution assembly, and the vacuum breaking device comprises an inflation tube communicated with the inflation port.
10. A coating apparatus comprising a chamber cover plate as claimed in any one of claims 1 to 9.
CN202320023922.9U 2023-01-03 2023-01-03 Cavity cover plate and coating equipment Active CN218951487U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202320023922.9U CN218951487U (en) 2023-01-03 2023-01-03 Cavity cover plate and coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202320023922.9U CN218951487U (en) 2023-01-03 2023-01-03 Cavity cover plate and coating equipment

Publications (1)

Publication Number Publication Date
CN218951487U true CN218951487U (en) 2023-05-02

Family

ID=86139594

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202320023922.9U Active CN218951487U (en) 2023-01-03 2023-01-03 Cavity cover plate and coating equipment

Country Status (1)

Country Link
CN (1) CN218951487U (en)

Similar Documents

Publication Publication Date Title
KR102035826B1 (en) Multi-row simultaneous coating slot die
WO2003054913A3 (en) Gas distribution plate electrode for a plasma reactor
CA2482025A1 (en) Symmetrically actuated ink ejection components for an ink jet printhead chip
CN101668696A (en) Microfluidic device and comprise the fluid ejection device of this microfluidic device
KR20050123483A (en) Secondary battery module
US11142074B2 (en) Explosion-proof valve, battery pack, and electric vehicle
WO2023087909A1 (en) Battery pack
TW201343412A (en) Micro-extrusion printhead with offset orifices for generating gridlines on non-square substrates
CN218951487U (en) Cavity cover plate and coating equipment
CA2680137A1 (en) Fuel cell and gas separator for fuel cell
CA2342493A1 (en) Liquid discharge recording head, liquid discharge recording apparatus, and method for manufacturing liquid discharge head
KR101646946B1 (en) Suction chuck and transferring apparatus
CN211112215U (en) Coating device and coating equipment
CN213042931U (en) Manifold for fuel cell stack and fuel cell stack having the same
CN101091951B (en) Clean head
EP1055518A3 (en) Liquid discharge head and method of manufacturing the same
KR101449193B1 (en) Fuel cell integrated porous body and gasket
CN111180362B (en) Gas treatment furnace and method for improving uniformity of gas treatment on surface of wafer
US10611153B2 (en) Printing head and inkjet printing device
CN102080218B (en) Gas distribution plate and treatment chamber equipped therewith
TW201344933A (en) Method for generating gridlines on non-square substrates
CN210805808U (en) Even flow plate for etching groove and etching groove
CN101453822B (en) Nozzle and reaction cavity
CN213445089U (en) Vacuum suction tool
JPH11268830A (en) Air flow conveying cell

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant