CN210778634U - Processing equipment for semiconductor or photovoltaic material - Google Patents
Processing equipment for semiconductor or photovoltaic material Download PDFInfo
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- CN210778634U CN210778634U CN201921180013.6U CN201921180013U CN210778634U CN 210778634 U CN210778634 U CN 210778634U CN 201921180013 U CN201921180013 U CN 201921180013U CN 210778634 U CN210778634 U CN 210778634U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The utility model discloses a processing equipment of semiconductor or photovoltaic material, including furnace body, furnace gate, set up the electrode structure on the furnace gate, the motor structure includes electrode post, electrode main part and insulating material, and the electrode post is connected with the electrode main part, and insulating material covers the electrode post side. The utility model provides a simple structure, electrode mechanism reasonable in design's semiconductor or photovoltaic material's processing equipment.
Description
Technical Field
The utility model relates to a semiconductor or photovoltaic material processing field, more specifically the saying so, it relates to a semiconductor or photovoltaic material's processing equipment.
Background
Semiconductor or photovoltaic material is widely applied to industries such as electronics, new energy and the like, the semiconductor and photovoltaic material can be applied to products generally through chemical treatment, the CVD technology is one of the treatment modes, CVD is chemical vapor deposition, the CVD technology is widely applied to semiconductor or photovoltaic material processing at present, common processing equipment comprises PECVD, LPCVD, APCVD and the like, diffusion processes such as phosphorus diffusion, boron diffusion and the like can be adopted to process raw materials except CVD, a plurality of related equipment exist in the industry at present, corresponding equipment can be selected to process according to specific processing requirements, the semiconductor or photovoltaic material processing is generally realized by feeding a sheet material into a furnace to react under the conditions of certain temperature and pressure, in the process of processing the semiconductor or photovoltaic material, devices are commonly used to load or move materials to be processed, in-process, or after-process, and such loaded or moved devices are commonly referred to in the industry as boats, graphite boats, or flower baskets.
The following problems exist in the current devices: the graphite boat is usually large in size, which can generally reach about 2 meters, and the electric field is transmitted from the tail to the front of the whole graphite boat to generate great difference, so that the uniform electric field is difficult to obtain. The graphite boat pieces are vertically arranged, and the flaky materials are vertically arranged between the graphite boat pieces and are attached to the graphite boat pieces. Because the flaky material needs to be vertically placed, the situation that the surface of the flaky material is not tightly attached to the surface of the graphite boat piece can occur, so that the flaky material is poor in electric conduction, the flaky material after the process is plated in a winding manner, black edges can be generated around the flaky material, and the risk of chipping exists, so that the defective product rate is increased.
Disclosure of Invention
The utility model overcomes prior art's is not enough, provides a simple structure, electrode mechanism reasonable in design's processing equipment.
The technical scheme of the utility model as follows:
the processing equipment for the semiconductor or photovoltaic material comprises a furnace body and a furnace door, wherein an electrode structure is arranged on the furnace door and comprises an electrode column, an electrode main body and an insulating material, the electrode column is connected with the electrode main body, and the insulating material covers the side face of the electrode column.
Furthermore, reinforcing ribs are arranged on the outer side of the furnace body.
Furthermore, the furnace body is made of high-temperature-resistant and pressure-resistant materials.
Furthermore, one end of the electrode column is connected with the electrode main body; the other end of the electrode column is exposed, and the contact area is enlarged.
Further, the electrode column comprises a connecting part, a jointing part and a fixing part; the connecting part is covered with an insulating and reinforcing material, the connecting part is covered with an insulating and stretchable material, and the fixing part is covered with an insulating material.
Furthermore, a conductive connecting piece is arranged between the electrode column and the electrode main body; one end of the conductive connecting piece is provided with a placing hole for placing the electrode column, and the other end of the conductive connecting piece is provided with a connecting hole for connecting the electrode main body.
Furthermore, the connecting part and the jointing part of the electrode column have the same diameter, and the diameter of the jointing part is larger than that of the fixing part.
Furthermore, an auxiliary fixing device is arranged on the side face of the joint part of the electrode column; the auxiliary fixing device is fixed on one side of the furnace door, which is far away from the furnace body; the auxiliary fixing device comprises a fixing column, an air cylinder, a telescopic rod and a clamping device; one end of the fixing column is fixed with the furnace door, and the other end of the fixing column is fixed with the air cylinder; one end of the cylinder, which is close to the electrode column, is provided with a telescopic rod which is controlled by the cylinder; the other end of the telescopic rod is fixed with the clamping device.
Further, the furnace body adopts cylindrical or cuboid, and the furnace body adopts metal material or non-metallic material, and the exposed one end of electrode post is circular arc sphere.
Furthermore, the connecting part is covered by a ceramic insulating sleeve, the connecting part is covered by a corrugated pipe, and the fixing part is covered by a Teflon sleeve; and a conductive connecting piece is arranged between the electrode column and the electrode main body and adopts a flange.
The utility model has the advantages that:
this scheme simple structure, reasonable in design, adopt high temperature resistant, resistance to compression material with reaction equipment's furnace body to metal material selects as the preferred, improves the resistance to compression attribute and the life of itself. The selection of the metal conductive material is to cover an insulating material in the electrode structure to avoid the electric leakage in order to avoid the electrification of the furnace body. When the furnace body adopts a non-circular design or other materials, the pressure resistance is poor, so that the corresponding reinforcing rib design is added to improve the overall pressure resistance.
Electrode structure specifically adopts multiple insulating material, has insulating, reinforced ceramic insulation sleeve material, has insulating, tensile bellows material, cup joints the teflon sleeve material that has high temperature resistant and insulating properties easily, realizes being in different positions on the furnace body and adopts different insulating materials in the electrode post, reaches perfect insulating and furnace body's vacuum seal effect as far as possible.
The flange of connecting piece is selected, better connection electrode post and electrode main part, with the furnace gate because of setting up the part that electrode structure department takes place the electric leakage easily, strengthen the guarantee and can reach the requirement of vacuum state. The auxiliary fixing device arranged on the electrode column can flexibly adjust and control the electrode column.
Drawings
FIG. 1 is a schematic view of the present invention with a graphite boat;
FIG. 2 is a schematic view of the electrode structure of the conventional cylindrical reaction furnace of the present invention;
fig. 3 is an exploded view of an electrode structure according to the present invention;
fig. 4 is a cross-sectional view of fig. 3 according to the present invention;
fig. 5 is an exploded view of another electrode structure of the present invention;
fig. 6 is a cross-sectional view of fig. 5 according to the present invention.
The labels in the figure are: the furnace body 1, the furnace door 2, the auxiliary fixing device 3-1, the flange 3-2, the sealed cavity 3-21, the Teflon sleeve 3-3, the corrugated pipe 3-4, the electrode main body 3-5, the ceramic insulating sleeve 3-6, the electrode column 3-7, the gas input port 4 and the vacuum interface 5.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and the following detailed description. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
The first embodiment is as follows:
as shown in fig. 1 to 6, the processing equipment for semiconductor or photovoltaic materials comprises a furnace body 1 and a furnace door 2, wherein an electrode structure is arranged on the furnace door 2, and the electrode structure comprises electrode columns 3-7, electrode main bodies 3-5 and insulating materials. The electrode column 3-7 is connected with the electrode main body 3-5, and the insulating material covers the side surface of the electrode column 3-7. The electrode columns 3-7 are only exposed out of two ends through the insulation wrapping and covering of the electrode columns, so that the connection of the furnace door 2 and the electrode structure in the graphite boat is more convenient, an even electric field is more easily formed, and the plasma enhanced chemical vapor deposition is realized. As shown in fig. 1, graphite boats are disposed in parallel in the furnace body 1, and silicon wafers on the graphite boats are also disposed in parallel. The productivity that this placed the structure than the vertical graphite boat of placing of tradition is higher, and controls the height of graphite boat more easily, and the electric field difference that the graphite boat afterbody transmitted to anterior will be minimum. Each layer of graphite boat plate which is arranged in the graphite boat in parallel in the furnace body is easier to be arranged tightly, and the reject ratio of products can not be improved.
The furnace body 1 is in a regular shape such as a cylinder or a cuboid, or in an irregular shape such as a polygon or an internal angle shape, and the like, and can be matched with the overall shape of the graphite boat. When the furnace body 1 is designed to be non-cylindrical, the furnace body can be easily extruded and deformed in a vacuum state during the process treatment. In order to prevent the deformation of the furnace body 1 and prolong the service life, reinforcing ribs can be arranged outside the furnace body 1 so as to improve the pressure resistance of the whole furnace body in the using process. The furnace body 1 is made of high temperature resistant and pressure resistant materials, the furnace body 1 is made of metal materials (such as stainless steel, nickel-chromium alloy, aluminum alloy and the like) or non-metal materials (such as silicon carbide, zirconium oxide, aluminum oxide and other metal oxides), and the furnace body 1 is preferably made of metal materials, such as SUS310S stainless steel.
Specifically, as shown in fig. 3 to 6, the covered electrode column 3-7 includes a connecting portion, a joining portion, and a fixing portion; the connecting part is covered with an insulating and reinforcing material, the connecting part is covered with an insulating and stretchable material, and the fixing part is covered with an insulating material. The concrete connecting part is covered by a ceramic insulating sleeve 3-6, the connecting part is covered by a corrugated pipe 3-4, and the fixing part is covered by a Teflon sleeve 3-3. Naturally, other insulating materials that fulfill this function may be substituted as will occur to those skilled in the art. Taking the best material as an example, the corrugated pipes 3-4 realize dynamic sealing when the electrode structure is lifted. The ceramic insulating sleeve 3-6 further protects the electrode column 3-7 from being corroded by the process treatment gas in the furnace body 1. The Teflon sleeves 3-3 achieve the vacuum sealing and insulating effects when the furnace door 2 is combined with the furnace body 1. Thereby avoiding the electrification when the metal furnace body 1 is adopted, ensuring the safety of the equipment and providing a good environment for processing the graphite boat.
And a conductive connecting piece is arranged between the electrode column 3-7 and the electrode main body 3-5, and the conductive connecting piece adopts a flange 3-2. The connection of the flange 3-2 is facilitated, and the diameters of the connecting part and the connecting part of the electrode column 3-7 are the same, and naturally can be different. The diameter of the connecting part is larger than that of the fixing part, so that the electrode columns 3-7 can be fixed conveniently. Namely, the flange 3-2 is connected with the electrode column 3-7 and the electrode main body 3-5, one end of the flange 3-2 is provided with a placing hole for placing the electrode column 3-7, and the other end of the flange 3-2 is provided with a connecting hole for connecting the electrode main body 3-5. To ensure a perfect connection of the electrode shaft 3-7 to the electrode body 3-5. The specific flange 3-2 comprises an upper part and a lower part, and a sealing cavity 3-21 is arranged between the upper part and the lower part, so that the problem that the treatment effect of the graphite boat is influenced due to the non-sealing condition of the joint of the electrode column 3-7 and the electrode main body 3-5 is avoided.
Preferably, the exposed end of the electrode column 3-7 is in the shape of a circular arc sphere to increase the conduction area, and naturally, other shapes such as a rectangle, a diamond and the like can be adopted, so long as the conduction area is increased, thereby providing a better foundation for connecting with the graphite boat and improving the conduction probability.
In summary, the furnace body 1 and the furnace door 2 are both made of SUS310S stainless steel structure to enhance the pressure resistance. Wherein the oven door 2 can realize the automatic opening and closing of the oven door 2 by connecting a lifting module on the oven door 2. The electrode columns 3-7 arranged on the furnace door 2 do not avoid conducting the whole furnace body 1, and the insulating material is arranged to ensure that the two ends of the electrode columns 3-7 are connected with a power supply, so that the electric field is effectively controlled to be introduced from the electrodes at the two sides of the graphite boat at the same time, the electric field generated in the graphite boat is uniform, the film thickness uniformity of the silicon wafer is good, and the stable control on the product quality is realized.
Example two:
the second embodiment is basically the same as the first embodiment, except that an auxiliary fixing device 3-1 is arranged on the side surface of the joint part of the electrode column 3-7; the auxiliary fixing device 3-1 is fixed on one side of the furnace door 2 far away from the furnace body; the auxiliary fixing device 3-1 comprises a fixing column, an air cylinder, a telescopic rod and a clamping device; one end of the fixing column is fixed with the furnace door 2, and the other end of the fixing column is fixed with the air cylinder; one end of the cylinder, which is close to the electrode columns 3-7, is provided with a telescopic rod which is controlled by the cylinder; the other end of the telescopic rod is fixed with the clamping device, so that the movement of the electrode structure is controlled, and the adaptive graphite boat specification is enlarged. Or the connecting part of the electrode column 3-7 can be separated from the connecting part, and the conduction on-off of the electrode column 3-7 can be controlled by the auxiliary fixing device 3-1.
Wherein, still set up vacuum interface 5 on the furnace gate 2 and to the inside evacuation of furnace body 1, through setting up gas input port 4 to the inside input process gas of furnace body 1, this vacuum interface, gas input port 4 are guaranteeing the vacuum seal state in the furnace body 1, can set up according to actual need, also can set up on furnace gate 2 like figure 2 gas input port 4, and vacuum interface sets up on furnace body 1.
In conclusion, the auxiliary fixing device 3-1 is arranged on the furnace door 2 to control the electrode structure on the furnace door 2, and the electrode structure is connected with a power supply to form an electric field, so that the stable control of the product quality on the graphite boat is realized.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the concept of the present invention, and these improvements and decorations should also be considered as the protection scope of the present invention.
Claims (10)
1. Processing equipment of semiconductor or photovoltaic material, its characterized in that: the furnace comprises a furnace body and a furnace door, wherein an electrode structure is arranged on the furnace door and comprises an electrode column, an electrode main body and an insulating material, the electrode column is connected with the electrode main body, and the insulating material covers the side surface of the electrode column.
2. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: one end of the electrode column is connected with the electrode main body; the other end of the electrode column is exposed, and the contact area is enlarged.
3. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: the electrode column comprises a connecting part, a jointing part and a fixing part; the connecting part is covered with an insulating and reinforcing material, the connecting part is covered with an insulating and stretchable material, and the fixing part is covered with an insulating material.
4. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: a conductive connecting piece is arranged between the electrode column and the electrode main body; one end of the conductive connecting piece is provided with a placing hole for placing the electrode column, and the other end of the conductive connecting piece is provided with a connecting hole for connecting the electrode main body.
5. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 3, wherein: the connecting part and the joining part of the electrode column have the same diameter, and the diameter of the joining part is larger than that of the fixing part.
6. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 3, wherein: an auxiliary fixing device is arranged on the side face of the joint part of the electrode column; the auxiliary fixing device is fixed on one side of the furnace door, which is far away from the furnace body; the auxiliary fixing device comprises a fixing column, an air cylinder, a telescopic rod and a clamping device; one end of the fixing column is fixed with the furnace door, and the other end of the fixing column is fixed with the air cylinder; one end of the cylinder, which is close to the electrode column, is provided with a telescopic rod which is controlled by the cylinder; the other end of the telescopic rod is fixed with the clamping device.
7. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: the furnace body adopts cylindrical or cuboid, and the furnace body adopts metal material or non-metallic material, and the naked one end of electrode post is circular arc sphere.
8. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 3, wherein: the connecting part is covered by a ceramic insulating sleeve, the connecting part is covered by a corrugated pipe, and the fixing part is covered by a Teflon sleeve; and a conductive connecting piece is arranged between the electrode column and the electrode main body and adopts a flange.
9. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: the outside of the furnace body is provided with a reinforcing rib.
10. The apparatus for processing semiconductor or photovoltaic material as claimed in claim 1, wherein: the furnace body is made of high-temperature resistant and pressure resistant materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921180013.6U CN210778634U (en) | 2019-07-25 | 2019-07-25 | Processing equipment for semiconductor or photovoltaic material |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921180013.6U CN210778634U (en) | 2019-07-25 | 2019-07-25 | Processing equipment for semiconductor or photovoltaic material |
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| Publication Number | Publication Date |
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| CN210778634U true CN210778634U (en) | 2020-06-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201921180013.6U Active CN210778634U (en) | 2019-07-25 | 2019-07-25 | Processing equipment for semiconductor or photovoltaic material |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110931339A (en) * | 2019-10-23 | 2020-03-27 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
| CN112563162A (en) * | 2019-07-30 | 2021-03-26 | 深圳市拉普拉斯能源技术有限公司 | Semiconductor processing equipment based on novel electrode structure |
-
2019
- 2019-07-25 CN CN201921180013.6U patent/CN210778634U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112563162A (en) * | 2019-07-30 | 2021-03-26 | 深圳市拉普拉斯能源技术有限公司 | Semiconductor processing equipment based on novel electrode structure |
| CN112563162B (en) * | 2019-07-30 | 2024-05-03 | 拉普拉斯新能源科技股份有限公司 | Semiconductor processing equipment based on novel electrode structure |
| CN110931339A (en) * | 2019-10-23 | 2020-03-27 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
| CN110931339B (en) * | 2019-10-23 | 2022-04-22 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
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Address after: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province Patentee after: Laplace New Energy Technology Co.,Ltd. Address before: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN LAPLACE ENERGY TECHNOLOGY Co.,Ltd. |