CN210560730U - Microelectrode sample heating table of vacuum deposition system - Google Patents
Microelectrode sample heating table of vacuum deposition system Download PDFInfo
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- CN210560730U CN210560730U CN201920918796.7U CN201920918796U CN210560730U CN 210560730 U CN210560730 U CN 210560730U CN 201920918796 U CN201920918796 U CN 201920918796U CN 210560730 U CN210560730 U CN 210560730U
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- microelectrode
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Abstract
A vacuum deposition system microelectrode sample heating table is characterized by comprising an insulation sample table and a microelectrode array heating device, wherein the microelectrode array heating device comprises a microelectrode array heating plate, a temperature sensor and a temperature control device, and a support is arranged at the bottom of the insulation sample table; the microelectrode array heating plate is laid on the insulating sample table; the temperature sensor of the microelectrode array heating device is arranged on the insulating sample table, the temperature control device is respectively connected with the microelectrode array heating plate and the temperature sensor, and the temperature control device controls the microelectrode array heating plate through the temperature sensor to control the temperature of the insulating sample table to be in a certain range.
Description
Technical Field
The utility model relates to a vacuum deposition system microelectrode sample warm table.
Background
Heating of an insulating sample table in a vacuum deposition system to a sample can be beneficial to the crystal growth of organic micromolecules, and then control, a traditional heating wire is generally separated from the space of the insulating sample table, the insulating sample table is heated by the heating wire firstly, and then the insulating sample table is heated to be arranged on a substrate on the insulating sample table, so that the defects of low heating efficiency, overhigh temperature of the heating wire and high energy consumption are caused. In addition, the traditional heating wire is easy to deform and has short circuit with other parts around due to less space constraint.
SUMMERY OF THE UTILITY MODEL
For solving the problem in the prior art, the utility model provides a following technical scheme: a vacuum deposition system microelectrode sample heating table is characterized by comprising an insulation sample table and a microelectrode array heating device, wherein the microelectrode array heating device comprises a microelectrode array heating plate, a temperature sensor and a temperature control device, and a support is arranged at the bottom of the insulation sample table; the microelectrode array heating plate is laid on the insulating sample table; the temperature sensor of the microelectrode array heating device is arranged on the insulating sample table.
Furthermore, the temperature control device is respectively connected with the microelectrode array heating plate and the temperature sensor, and the temperature control device controls the microelectrode array heating plate through the temperature sensor so that the temperature of the insulating sample stage is controlled in a certain range.
Further, the sample heating table is arranged in a vacuum cavity, and the microelectrode array heating plate and the temperature sensor are connected with an external temperature control device and a power supply through a vacuum flange on the vacuum cavity.
Further, the insulation sample stage is made of heat-resistant insulation materials.
The beneficial effects of the utility model reside in that: the utility model discloses in, microelectrode array can directly heat the sample, has the heating efficiency height, and the characteristics that the energy consumption is low because microelectrode array hot plate is laid in insulating sample bench, can not warp at the heating in-process to lead to phenomena such as short circuit to take place, in addition, still be equipped with temperature control device, the temperature of ability real-time supervision and control insulating sample platform is applicable to the heating of multiple organic micromolecule.
Drawings
FIG. 1 is a schematic structural view of the present invention;
description of reference numerals: the device comprises an insulation sample table 1, a bracket 2, a microelectrode array heating plate 3, a temperature sensor 4 and a temperature control device 5.
Detailed Description
The utility model will be further explained with reference to the attached drawings, and the utility model provides the following technical scheme: a vacuum deposition system microelectrode sample heating table is characterized by comprising an insulation sample table 1 and a microelectrode array heating device, wherein the microelectrode array heating device comprises a microelectrode array heating plate 3, a temperature sensor 4 and a temperature control device 5, and a support 2 is arranged at the bottom of the insulation sample table 1; the microelectrode array heating plate 3 is laid on the insulating sample table 1; the temperature sensor 4 of the microelectrode array heating device is arranged on the insulating sample table 1; the temperature control device 5 is respectively connected with the microelectrode array heating plate 3 and the temperature sensor 4, the temperature control device 5 controls the microelectrode array heating plate 3 through the temperature sensor 4 to control the temperature of the insulating sample table 1 in a certain interval, different temperature values are set for different organic small molecule samples, and the temperature control device can also be connected with a computer and a data register to record and analyze the change condition of the samples under different temperature states; the sample heating table is arranged in a vacuum cavity, the microelectrode array heating plate 3 and the temperature sensor 4 are connected with a temperature control device 5 arranged outside through a vacuum flange on the vacuum cavity and are connected with a power supply, so that the integration degree of the equipment is improved; the insulating sample table 1 is made of a heat-resistant insulating material, and the insulating sample table 1 is prevented from being heated and deformed in a long-time heating process.
Claims (4)
1. A vacuum deposition system microelectrode sample heating table is characterized by comprising an insulation sample table (1) and a microelectrode array heating device, wherein the microelectrode array heating device comprises a microelectrode array heating plate (3), a temperature sensor (4) and a temperature control device (5), and a support (2) is arranged at the bottom of the insulation sample table (1); the microelectrode array heating plate (3) is laid on the insulating sample table (1); the temperature sensor (4) of the microelectrode array heating device is arranged on the insulating sample table (1).
2. The microelectrode sample heating table of claim 1, wherein the temperature control device (5) is connected to the microelectrode array heating plate (3) and the temperature sensor (4), and the temperature control device (5) controls the microelectrode array heating plate (3) through the temperature sensor (4) to control the temperature of the insulating sample table (1) within a certain range.
3. A vacuum deposition system microelectrode sample heating platform according to claim 1, wherein the sample heating platform is arranged in a vacuum chamber, and the microelectrode array heating plate (3) and the temperature sensor (4) are connected with an external temperature control device (5) and a power supply through a vacuum flange on the vacuum chamber.
4. The vacuum deposition system microelectrode sample heating stage of claim 1, wherein the insulating sample stage (1) is a heat resistant insulating material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920918796.7U CN210560730U (en) | 2019-06-19 | 2019-06-19 | Microelectrode sample heating table of vacuum deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920918796.7U CN210560730U (en) | 2019-06-19 | 2019-06-19 | Microelectrode sample heating table of vacuum deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210560730U true CN210560730U (en) | 2020-05-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201920918796.7U Active CN210560730U (en) | 2019-06-19 | 2019-06-19 | Microelectrode sample heating table of vacuum deposition system |
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| CN (1) | CN210560730U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022193501A1 (en) * | 2021-03-19 | 2022-09-22 | 李镇宜 | Microelectrode element, microfluidic wafer, and microfluidic test method |
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2019
- 2019-06-19 CN CN201920918796.7U patent/CN210560730U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022193501A1 (en) * | 2021-03-19 | 2022-09-22 | 李镇宜 | Microelectrode element, microfluidic wafer, and microfluidic test method |
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